JPH0825045B2 - Iridescent color processing method - Google Patents
Iridescent color processing methodInfo
- Publication number
- JPH0825045B2 JPH0825045B2 JP5002781A JP278193A JPH0825045B2 JP H0825045 B2 JPH0825045 B2 JP H0825045B2 JP 5002781 A JP5002781 A JP 5002781A JP 278193 A JP278193 A JP 278193A JP H0825045 B2 JPH0825045 B2 JP H0825045B2
- Authority
- JP
- Japan
- Prior art keywords
- laser light
- waveguide
- thin film
- fine irregularities
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Lasers (AREA)
- Laser Beam Processing (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、金属を始めとする種々
の材料表面に入射光の角度や見る方向によって反射光沢
の色合いが虹色様に多彩に変化する模様ないし領域を形
成する虹色発色加工方法に関するものであり、例えば装
飾品、家庭電化用品、工業用品等の表面加飾手段として
好適に利用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rainbow color which forms a pattern or region in which the hue of the reflection gloss varies in a rainbow-like manner on the surface of various materials such as metal depending on the angle of incident light and the viewing direction. The present invention relates to a coloring method and is suitably used as a surface decorating means for, for example, ornaments, household electrical appliances, industrial articles and the like.
【0002】[0002]
【従来の技術】金属等の材料表面に可視光の波長域に近
い1μm程度あるいはそれ以下といった微細な凹凸を密
に形成した場合、該表面が回折格子と同様に作用して入
射光を分光して反射するため、反射光沢の色合いが入射
光の方向や見る角度によって虹色様に多彩に変化するこ
とになる。従って、このような微細凹凸加工は、材料表
面に塗装や化学的着色では不可能な美麗な多色可変発色
を与える加飾手段として極めて有望である。2. Description of the Related Art When fine irregularities of about 1 μm or less close to the wavelength range of visible light are densely formed on the surface of a material such as metal, the surface acts like a diffraction grating to disperse incident light. Since it is reflected by the reflected light, the hue of the reflected gloss changes in various colors like rainbow depending on the direction of the incident light and the viewing angle. Therefore, such fine concavo-convex processing is extremely promising as a decorating means for giving a beautiful multicolor variable coloring which cannot be achieved by painting or chemical coloring on the material surface.
【0003】しかるに、近年において金属を始めとする
各種材料の加工に多用されている通常のレーザ加工手段
では、一般に集光レンズにて収束可能な最小スポット径
が数μm〜10μm程度であるため、上述のような1μ
m以下といった微細な凹凸は形成不能である。また仮に
上記スポット径を1μm程度に絞り込めたとしても、一
回の走査で一本の溝を形成できるだけであるから、凹凸
部分を肉眼で見える幅あるいは面状に形成するには膨大
な加工時間を要することになる。However, in the usual laser processing means which has been frequently used for processing various materials such as metal in recent years, the minimum spot diameter which can be converged by the condenser lens is generally several μm to 10 μm. 1μ as above
It is impossible to form fine irregularities of m or less. Even if the spot diameter is narrowed down to about 1 μm, one groove can be formed by one scanning, so it takes a huge amount of processing time to form the concave and convex portions in a width or a surface shape visible to the naked eye. Will be required.
【0004】そこで、本発明者らは先に、特開平2−2
63589号および特開平3−94986号として、レ
ーザの干渉光の照射によって金属表面に該干渉光の干渉
縞の強度分布に対応した微細凹凸を形成するという画期
的な手段を提案している。すなわち、これら提案手段に
よれば、レーザ光の強さを干渉縞の明部で金属が溶融、
蒸発するパワー密度に設定することにより、金属表面に
該明部を凹、暗部を凸とした凹凸が形成されるため、1
回の走査で相互の間隔が1μm程度あるいはそれ以下と
いった微細な数百本もの凹凸条を一挙に形成できる。Therefore, the inventors of the present invention first disclosed in Japanese Patent Laid-Open No. 2-2
No. 63589 and Japanese Patent Laid-Open No. 3-94986 propose an epoch-making means of forming fine unevenness corresponding to the intensity distribution of the interference fringes of the interference light on the metal surface by irradiating the interference light of the laser. That is, according to these proposed means, the intensity of the laser light is melted in the bright part of the interference fringes,
By setting the power density to evaporate, unevenness is formed on the metal surface with the bright portion being concave and the dark portion being convex.
It is possible to form hundreds of minute ridges and valleys with a mutual spacing of about 1 μm or less by one scan.
【0005】[0005]
【発明が解決しようとする課題】ところが、上記の提案
手段では、レーザ光を干渉光として照射することから、
低次のマルチモードのレーザビームにおける明パターン
成分相互を重ねたり、単一のレーザビームより分割され
た複数本のビーム相互を重ねる(特願平1−84326
号)か、あるいはレーザビームの一部を横ずれ変位させ
て元のビーム成分に重ねる(特願平1−229567
号)必要があり、そのために使用するレーザ発振器の機
種や装置構成上の制約が大きい上、上記の分割や変位を
行うための光学系の調整が難しく、且つ可干渉性のよい
レーザ光を選択しても干渉パターンの明瞭性を充分に高
められず、虹色発色の鮮明度向上に限界があり、また虹
色発色部を広面積に形成したり緻密な模様に構成する場
合には加工に相当な時間がかかるため、加飾加工物の製
造効率及びコスト面より加工時間の短縮が課題となって
いる。However, in the above-mentioned proposed means, since the laser light is emitted as the interference light,
Bright pattern components in a low-order multimode laser beam are overlapped with each other, or a plurality of beams divided from a single laser beam are overlapped with each other (Japanese Patent Application No. 1-84326).
No.) or a part of the laser beam is laterally displaced and superimposed on the original beam component (Japanese Patent Application No. 1-229567).
No.), and the restrictions on the model and device configuration of the laser oscillator used for that purpose are large, and it is difficult to adjust the optical system to perform the above division and displacement, and a laser beam with good coherence is selected. However, the clarity of the interference pattern cannot be sufficiently increased, and there is a limit to the improvement in the clarity of the rainbow color.In addition, when forming the rainbow color part in a large area or forming a dense pattern, it is necessary to process it. Since it takes a considerable amount of time, shortening the processing time is an issue in terms of manufacturing efficiency and cost of the decorated processed product.
【0006】しかるに、本発明者らの更に引き続く研究
の結果、被加工物の表面が特定の状態にあれば、レーザ
光を干渉光として照射しなくとも照射面で干渉を生じ、
前記同様に干渉縞の明部を凹、暗部を凸とした微細凹凸
が形成され、反射光沢の色合いが入射光の方向や見る角
度によって虹色様に多彩に変化する模様を描画でき、し
かもレーザ光の干渉性が極めて良好であり、非常に鮮明
な虹色発色を生じる加飾加工を施せる上、加工時間の大
幅な短縮が可能となることを究明し、本発明をなすに至
った。However, as a result of further studies by the present inventors, if the surface of the work piece is in a specific state, interference occurs on the irradiation surface without irradiating the laser light as interference light,
In the same manner as above, fine irregularities are formed in which the bright part of the interference fringe is concave and the dark part is convex, and it is possible to draw a rainbow-colored pattern in which the hue of the reflective gloss changes in various directions depending on the direction of the incident light and the viewing angle. The inventors have found that the light interference is extremely good, and that it is possible to perform decoration processing that produces a very vivid rainbow color, and that the processing time can be significantly shortened, and the present invention has been completed.
【0007】[0007]
【課題を解決するための手段】すなわち、本発明の請求
項1に係る虹色発色加工方法は、被加工物Wの表面にレ
ーザ光の導波路となる薄膜Pを形成したのち、この薄膜
Pを形成した表面に、収束したパルスレーザ光Lを同位
置に多数回のパルスが当たるように照射することによ
り、上記薄膜Pを伝搬するレーザ光Laと照射レーザ光
Lとを干渉させ、その干渉縞の強度分布に対応した微細
凹凸Gを前記被加工物Wの表面に形成することを特徴と
する構成を採用したものである。That is, in the iridescent color processing method according to claim 1 of the present invention, after forming a thin film P serving as a waveguide of laser light on the surface of a workpiece W, the thin film P is formed. The converged pulsed laser light L is irradiated onto the surface where the laser beam is formed so that multiple pulses are applied to the same position, so that the laser light La propagating through the thin film P and the irradiated laser light L interfere with each other, and the interference occurs. The structure employs a feature that fine irregularities G corresponding to the intensity distribution of stripes are formed on the surface of the workpiece W.
【0008】また本発明の請求項2は、上記請求項1の
虹色発色加工方法において、パルスレーザ光Lを収束手
段Sの焦点Fよりも深浅一方向にずれた位置で照射する
構成を採用したものである。A second aspect of the present invention, in the iridescent color processing method according to the first aspect, employs a configuration in which the pulsed laser light L is irradiated at a position shallower than the focal point F of the converging means S in one direction. It was done.
【0009】また本発明の請求項3は、上記請求項1又
は2の虹色発色加工方法において、レーザ光の導波路と
なる薄膜Pを、被加工物Wの表面変成によって形成する
構成を採用したものである。Further, a third aspect of the present invention is the method for forming an iridescent color according to the first or second aspect, wherein the thin film P serving as a waveguide of the laser light is formed by surface modification of the workpiece W. It was done.
【0010】本発明の請求項4は、上記請求項3の虹色
発色加工方法における被加工物Wとして金属材料を用
い、これを反応性ガス中で熱処理することにより、素材
金属とガス成分との反応物からなる被膜を形成してレー
ザ光の導波路となる薄膜Pとする構成を採用したもので
ある。According to a fourth aspect of the present invention, a metal material is used as the workpiece W in the iridescent color processing method of the above-mentioned third aspect, and a heat treatment is performed in a reactive gas to obtain a raw material metal and a gas component. The thin film P serving as the waveguide of the laser light is formed by forming a film made of the reaction product.
【0011】本発明の請求項5は、上記請求項3又は4
の虹色発色加工方法における反応性ガス中での熱処理
を、微細凹凸形成用のレーザ光Lとは別のレーザ光Lp
を照射することによって行う構成を採用したものであ
る。A fifth aspect of the present invention is the third or fourth aspect of the invention.
Laser light Lp different from the laser light L for forming fine irregularities in the heat treatment in the reactive gas in the iridescent color processing method
The structure is adopted by irradiating with.
【0012】本発明の請求項6は、上記請求項1〜5の
いずれかの虹色発色加工方法において、レーザ光の導波
路となる薄膜Pを50オングストローム以上の厚みとす
る構成を採用したものである。According to a sixth aspect of the present invention, in the iridescent color processing method according to any of the first to fifth aspects, a configuration is adopted in which the thin film P serving as the waveguide of the laser light has a thickness of 50 angstroms or more. Is.
【0013】本発明の請求項7は、上記請求項1〜6の
いずれかの虹色発色加工方法において、微細凹凸形成用
のレーザ光Lの光路にシリンドリカルレンズSLを介在
させることにより、該レーザ光Lの円形ビームをビーム
走査方向に対して直交する方向に長いビームパターンに
変換する構成を採用したものである。According to a seventh aspect of the present invention, in the iridescent color processing method according to any one of the first to sixth aspects, the cylindrical lens SL is interposed in the optical path of the laser beam L for forming the fine irregularities, whereby the laser is produced. A configuration is adopted in which a circular beam of light L is converted into a long beam pattern in a direction orthogonal to the beam scanning direction.
【0014】[0014]
【発明の細部構成と作用】図1(A)に示すように被加
工物Wの表面にレーザ光の導波路となる薄膜Pが存在す
る場合、この表面にパルスレーザ光Lを同位置に多数回
のパルスが当たるように照射すると、同図(B)の矢印
で示すようにそのレーザ光の一部Laが該薄膜Pの微小
な傷や結晶粒界から当該薄膜P内に侵入して面方向に進
み、この面方向に進むレーザ光Laと照射しているレー
ザ光Lとが干渉して被加工物Wの表面で干渉縞を生じ
る。このとき、レーザ光Lの強さを干渉縞の明部で表面
の溶融・蒸発するに充分なパワー密度に設定することに
より、図1(C)で示すように、被加工物Wの表面に干
渉縞の明部を凹、暗部を凸とした微細凹凸Gが形成され
る。Detailed Configuration and Operation of the Invention As shown in FIG. 1 (A), when a thin film P serving as a waveguide of laser light is present on the surface of a workpiece W, a large number of pulsed laser light L are provided at the same position on this surface. When irradiation is performed so that a single pulse is applied, a portion La of the laser light enters the thin film P from minute scratches or crystal grain boundaries of the thin film P as shown by an arrow in FIG. The laser light La that travels in the direction of the surface and the laser light L that is radiating in the surface interfere with each other to generate interference fringes on the surface of the workpiece W. At this time, the intensity of the laser light L is set to a power density sufficient to melt and evaporate the surface in the bright portion of the interference fringes, so that the surface of the workpiece W is exposed as shown in FIG. Fine irregularities G are formed in which the bright portion of the interference fringe is concave and the dark portion is convex.
【0015】この微細凹凸Gの溝間隔Δxは、共に波長
λのレーザ光LとLaが角度θで交差して干渉するとす
れば、Δx=λ/sinθで与えられ、この場合の交差
角度θは90度であるからsinθ=1となり、Δx=
λ、つまり照射レーザ光の波長と同じとなる。従って、
この微細凹凸Gは可視光の波長域に近い1μm程度ある
いはそれ以下といった非常に細かいピッチの凹凸条より
構成されることになり、回折格子として入射光を分光し
て反射し、反射光沢の色合いが入射光の方向や見る角度
によって多彩に変化する虹色発色を生じることになる。
なお、上記の微細凹凸Gの形成は、図2に示すように照
射位置を連続移動させる走査方式によって行うことが可
能であり、通常の描画パターンでは該走査方式が採用さ
れる。The groove spacing Δx of the fine concavities and convexities G is given by Δx = λ / sin θ, assuming that the laser beams L and La having the wavelength λ intersect at an angle θ and interfere with each other. Since it is 90 degrees, sin θ = 1, and Δx =
λ, that is, the same as the wavelength of the irradiation laser beam. Therefore,
The fine irregularities G are composed of irregular stripes having a very fine pitch of about 1 μm or less, which is close to the wavelength range of visible light, and are used as a diffraction grating to disperse and reflect incident light to give a reflection gloss shade. Iridescent color is generated that varies in various ways depending on the direction of incident light and the viewing angle.
The formation of the fine irregularities G can be performed by a scanning method in which the irradiation position is continuously moved as shown in FIG. 2, and the scanning method is adopted in a normal drawing pattern.
【0016】しかして、上記の面方向に進むレーザ光L
aと照射しているレーザ光Lとはレーザ光源から干渉位
置までの光路差(距離差)が殆どないために極めて干渉
性がよい上、形成初期の微細凹凸Gがグレーティングカ
プラとして導波路の薄膜P中へのレーザ光Laの導入効
率を高めるように作用し、しかもシングルモードのレー
ザビームを使用できるので、照射スポット全体に非常に
明瞭な干渉縞を生じさせることが可能となり、形成され
る微細凹凸Gは鮮明度の高い虹色発色が得られるものと
なる。Therefore, the laser light L traveling in the above plane direction
Since there is almost no optical path difference (distance difference) from the laser light source to the interference position between the laser light L and the irradiating laser light L, the microscopic unevenness G at the initial stage of formation serves as a grating coupler and is a thin film of the waveguide. Since it acts so as to enhance the efficiency of introducing the laser light La into P, and a single mode laser beam can be used, it is possible to generate very clear interference fringes in the entire irradiation spot, and to form a fine pattern. The unevenness G provides a highly vivid rainbow color.
【0017】また、前記従来の提案に係る加工手段で
は、例えば金属表面に干渉縞をなすパルスレーザ光Lを
照射した場合、該干渉縞に対応した微細凹凸は同一照射
面における照射パルス数がある回数に達した後に急速に
形成され、それまでの照射エネルギーは専ら微細凹凸形
成の準備段階としての表面性状の改変に消費されること
が判明している。しかるに、本発明方法では、特に被加
工物が金属である場合、その表面に予め形成される導波
路としての薄膜Pが上記表面性状の改変後の表面部と同
様に機能するため、照射エネルギーの殆どを微細凹凸の
形成に利用でき、もってパルスレーザ光の同位置に対す
る照射パルス数を少なく(一般に70%以下)でき、そ
れだけレーザ加工の速度を速めて加工時間の短縮を図り
得る。Further, in the processing means according to the above-mentioned conventional proposal, for example, when the metal surface is irradiated with the pulsed laser light L forming interference fringes, the fine irregularities corresponding to the interference fringes have the number of irradiation pulses on the same irradiation surface. It has been found that it is formed rapidly after reaching the number of times, and the irradiation energy up to that time is exclusively consumed for modification of the surface properties as a preparatory step for forming fine irregularities. However, in the method of the present invention, particularly when the workpiece is a metal, since the thin film P as a waveguide formed in advance on the surface thereof functions similarly to the surface portion after the modification of the surface texture, the irradiation energy Almost all of them can be used to form fine irregularities, and thus the number of irradiation pulses of the pulsed laser light at the same position can be reduced (generally 70% or less), and the laser processing speed can be increased and the processing time can be shortened.
【0018】前記したレーザ光の導波路となる薄膜P
は、レーザ光Laを面方向に伝搬させるのであり、言わ
ば光ファイバーの導波路(コア部)を平面化(板状化)
したものに相当するから、両側を低屈折率の物質で囲ま
れた高屈折率層の形態をとることになり、従って加工時
の当該薄膜P表面に接する物質(気相中加工では気体、
液相中では液体)と被加工物Wの素材のどららよりも高
屈折率の物質となるが、通常の空気(屈折率1)中での
加工では被加工物素材よりも高い屈折率に設定すればよ
い。なお、このような薄膜Pが存在しない場合は、言う
までもなく照射したレーザ光Lの非吸収分は単にスネル
の法則にしたがって反射するだけであり、面方向へ伝搬
しないために干渉を生じない。A thin film P which serves as a waveguide for the laser light described above.
Means that the laser light La is propagated in the surface direction, so to speak, the waveguide (core portion) of the optical fiber is made flat (plate-shaped).
Since it corresponds to the above, it takes the form of a high refractive index layer surrounded on both sides by a substance with a low refractive index, and therefore a substance in contact with the surface of the thin film P at the time of processing (gas in the gas phase processing,
It becomes a substance with a higher refractive index than the material and the material of the workpiece W in the liquid phase, but when processed in normal air (refractive index 1), it has a higher refractive index than the workpiece material. Just set it. When such a thin film P does not exist, needless to say, the non-absorbed portion of the irradiated laser beam L simply reflects according to Snell's law and does not propagate in the surface direction, so that no interference occurs.
【0019】しかして、理論的には薄膜Pを伝搬するレ
ーザ光Laが干渉縞の1ピッチ分さえ面方向に進行すれ
ば照射レーザ光Lと干渉を生じることになり、この1ピ
ッチは1μm程度あるいはそれ以下といった短い幅であ
るから、この幅内では通常不透明とされる殆どの材料が
透光性として振る舞う。従って導波路とする薄膜Pは、
通常の概念でいう透明性物質である必要はないが、当然
に照射レーザ光Lと導波路を進むレーザ光Laの強度比
が1:1の場合に最も強い干渉を生じることになるか
ら、あまりに光減衰の大きい物質では良好な干渉縞が得
られない。However, theoretically, even if the laser light La propagating through the thin film P travels in the plane direction by one pitch of the interference fringes, it will interfere with the irradiation laser light L, and this one pitch is about 1 μm. Or, since the width is short such as less than that, most materials that are normally opaque within this width behave as translucent. Therefore, the thin film P used as the waveguide is
It does not have to be a transparent substance in the ordinary concept, but naturally, the strongest interference occurs when the intensity ratio of the irradiation laser beam L and the laser beam La propagating in the waveguide is 1: 1, so too much. Good interference fringes cannot be obtained with substances with large light attenuation.
【0020】導波路となる薄膜Pの厚みは、50オング
ストローム以上、より好ましくは100μm以上とする
のがよく、薄過ぎてはレーザ光Laの伝搬が不充分とな
って良好な干渉性が得られず、例えば金属材料の表面に
自然に形成される不動態膜程度(研磨した鉄の不動態酸
化膜の厚みは最高30〜40オングストローム程度)で
は薄過ぎて導波路として機能しない。The thickness of the thin film P serving as the waveguide is preferably 50 angstroms or more, more preferably 100 μm or more. If it is too thin, the propagation of the laser light La is insufficient and good coherence can be obtained. On the other hand, for example, a passivation film naturally formed on the surface of a metal material (a polished passivation oxide film of iron has a maximum thickness of about 30 to 40 Å) is too thin to function as a waveguide.
【0021】しかして、特に走査方式で溝加工を行う際
には、形成初期の微細凹凸Gaによる導波路へのレーザ
光Laの導入(カップリング)効率より、照射レーザ光
Lの波長と導波路の薄膜Pを伝搬するレーザ光Laの見
掛けの波長とが余り変わらないようにする必要がある。
しかるに、導波路の屈折率が加工雰囲気の屈折率(空気
ではn=1)に比べて格段に高い場合、面方向に伝搬す
るレーザ光Laが導波路に閉じ込められて進むとすれ
ば、伝搬速度が低下する(見掛けの波長が短くなる)の
で形成される干渉縞の間隔が照射レーザ光Lの波長から
大幅にずれるため、導波路へのカップリングが悪くなっ
て良好な微細凹凸を形成できない。However, particularly when performing groove processing by the scanning method, the wavelength of the irradiation laser beam L and the waveguide are determined by the efficiency of introducing (coupling) the laser beam La into the waveguide by the fine irregularities Ga at the initial stage of formation. It is necessary to prevent the apparent wavelength of the laser light La propagating through the thin film P from changing substantially.
However, when the refractive index of the waveguide is significantly higher than the refractive index of the processing atmosphere (n = 1 in air), if the laser light La propagating in the plane direction is confined in the waveguide and travels, the propagation speed is Is decreased (the apparent wavelength is shortened), and the interval of the interference fringes formed is largely deviated from the wavelength of the irradiation laser beam L, so that the coupling to the waveguide is deteriorated and good fine irregularities cannot be formed.
【0022】従って、屈折率の高い導波路では、図3に
示すように、面方向に伝搬するレーザ光Laの殆どが導
波路をはみ出して進むように薄い膜厚に設定し、等価屈
折率を小さくして加工雰囲気の屈折率に近づけることが
望ましい。この観点からすれば、導波路の屈折率が加工
雰囲気の屈折率より少し高い程度の場合、導波路を面方
向に伝搬するレーザ光Laが完全に閉じ込められて進む
厚みにしてもよいことになるが、照射レーザ光Lの波長
より厚くなって伝搬するレーザ光Laが全反射して進む
状態になると、やはり形成される干渉縞の間隔が照射レ
ーザ光Lの波長からずれ、走査方式では導波路へのカッ
プリングが悪くなる。ただし、定位置でスポット状に溝
加工する方式では、形成される微細凹凸Gの溝間隔が変
わっても問題は少ないため、導波路の屈折率に関わら
ず、その厚みを照射レーザ光Lの波長の数倍程度に設定
しても差し支えない。Therefore, in the waveguide having a high refractive index, as shown in FIG. 3, a thin film thickness is set so that most of the laser light La propagating in the surface direction goes out of the waveguide and the equivalent refractive index is set. It is desirable to make it small to approach the refractive index of the processing atmosphere. From this point of view, when the refractive index of the waveguide is slightly higher than the refractive index of the processing atmosphere, the thickness may be set so that the laser light La propagating in the surface direction of the waveguide is completely confined. However, when the propagating laser light La becomes thicker than the wavelength of the irradiating laser light L and travels by total reflection, the interval of the interference fringes formed also deviates from the wavelength of the irradiating laser light L, and the waveguide in the scanning method is used. Coupling to is bad. However, in the method of forming a groove in a spot shape at a fixed position, there is little problem even if the groove interval of the fine irregularities G to be formed is changed. Therefore, regardless of the refractive index of the waveguide, the thickness of the irradiation laser beam L It can be set to about several times.
【0023】このような導波路となる薄膜Pを被加工物
Wの表面に形成するには、その構成材料に応じ、被加工
物W自体の表層部を化学的あるいは物理的に高屈折率の
導波路に変成するか、被加工物Wの表面に導波路となる
高屈折率の物質を被着すればよい。前者の変成手段とし
ては、被加工物Wを反応性雰囲気中で熱処理して気相反
応による化合物膜を形成する方法、被加工物Wの表面を
反応性溶液と接触させて化合物膜を形成する方法、適当
な元素を被加工物Wの表層部にドーピングする方法等が
挙げられる。また後者の被着手段としては、一般に薄膜
形成技術として知られる真空蒸着,スパッタリング,イ
オンプレーティング,化学的気相成長法等の高真空中で
の堆積による方法、スプレーやLB膜法(液面に形成し
た目的物質の膜を液中からの被加工物Wの引き上げによ
って表面に移着させる方法)にて膜を形成したのちに熱
処理によって付着力を高める方法、鍍金による方法等が
挙げられる。In order to form such a thin film P serving as a waveguide on the surface of the workpiece W, the surface layer of the workpiece W itself has a high refractive index either chemically or physically depending on its constituent material. It may be transformed into a waveguide, or a material having a high refractive index to serve as a waveguide may be applied to the surface of the workpiece W. As the former transformation means, there is a method of forming a compound film by a gas phase reaction by heat-treating the workpiece W in a reactive atmosphere, and a compound film is formed by bringing the surface of the workpiece W into contact with a reactive solution. A method, a method of doping an appropriate element into the surface layer portion of the workpiece W, and the like can be mentioned. As the latter deposition means, methods such as vacuum deposition, sputtering, ion plating, and chemical vapor deposition, which are generally known as thin film forming techniques, are used for deposition in a high vacuum, spraying and LB film methods (liquid level). A method of increasing the adhesion by heat treatment after forming a film by the method of transferring the film of the target substance formed in the above to the surface by pulling up the workpiece W from the liquid), a method by plating, and the like.
【0024】上述の薄膜形成方法のうちでも反応性雰囲
気中で熱処理して気相反応による化合物膜を形成する方
法が最も簡易であり、特に被加工物Wが金属材料である
場合は表面の酸化や窒化等によって良好な導波路となる
薄膜Pを簡単に形成できる利点がある。しかして、この
ような気相反応による化合物膜の形成においては、電気
炉や赤外線ランプ等を利用した通常の加熱手段により被
加工物Wの加工面全体ないし広領域に導波路を形成する
方法の他に、微細凹凸形成用のレーザ光Lとは別のレー
ザ光を被加工物Wの表面に照射して雰囲気中のガス成分
と被加工物Wの素材成分とを反応させる方法も採用でき
る。Of the above-mentioned thin film forming methods, the method of forming a compound film by a gas phase reaction by heat-treating in a reactive atmosphere is the simplest, and particularly when the workpiece W is a metal material, the surface is oxidized. There is an advantage that the thin film P which becomes a good waveguide can be easily formed by nitriding or the like. Therefore, in forming a compound film by such a gas phase reaction, there is a method of forming a waveguide on the entire processed surface or a wide area of the workpiece W by a normal heating means using an electric furnace, an infrared lamp or the like. In addition, a method of irradiating the surface of the workpiece W with a laser beam different from the laser beam L for forming the fine irregularities to cause the gas component in the atmosphere and the material component of the workpiece W to react can be adopted.
【0025】上記のレーザ光を利用する反応方法によれ
ば、図4に示すように、レーザ加工装置において導波路
形成用のレーザ光Lpを微細凹凸形成用のレーザ光Lに
先導して被加工物W表面に照射するように配置構成する
ことにより、導波路の薄膜Pの形成と微細凹凸Gの形成
を連続して行うことができると共に、両レーザ光Lp,
Lの走査パターンが同じになるように制御すれば、微細
凹凸Gの形成を要する領域のみに導波路の薄膜Pを形成
することが可能となる。また、被加工物Wの表面を反応
性溶液と接触させて導波路となる化合物膜を形成する場
合においても、レーザ光照射による加熱を利用し、目的
領域のみに化学反応を生起させて導波路を形成すること
が可能である。なお、このような導波路形成用のレーザ
光Lpは、単に加熱を行うだけであるから、高次のマル
チモード等の可干渉性の悪いレーザ光や連続発振のレー
ザ光でも支障なく利用できる。According to the above reaction method utilizing laser light, as shown in FIG. 4, the laser light Lp for forming a waveguide is led to the laser light L for forming fine irregularities in a laser processing apparatus to be processed. By arranging so as to irradiate the surface of the object W, it is possible to continuously form the thin film P of the waveguide and the fine concavities and convexities G, and at the same time, the laser light Lp,
If the scanning pattern of L is controlled to be the same, it becomes possible to form the thin film P of the waveguide only in the region where the fine irregularities G need to be formed. Further, when the surface of the workpiece W is brought into contact with a reactive solution to form a compound film to serve as a waveguide, heating by laser light irradiation is used to cause a chemical reaction only in a target region to cause a waveguide. Can be formed. Since such a laser light Lp for forming a waveguide simply heats, it is possible to use a laser light with poor coherence such as a high-order multimode or a continuous wave laser light without any trouble.
【0026】被加工物Wとしてはステンレス鋼等の金属
材料が一般的であるが、セラミックスや半導体の如き種
々の非金属材料も加工対象とでき、また通常概念の透明
材料(肉眼で透明)であっても、炭酸ガスレーザの如き
赤外線レーザ光やエキシマレーザの如き紫外線レーザ光
を吸収し得る材料であれば加工可能となる。更に、形成
される微細凹凸Gが導波路の薄膜Pのみに及ぶ深さであ
っても虹色発色が得られるため、導波路の薄膜Pが被加
工物Wの素材よりも低融点であっても差支えないと共
に、加工に用いるレーザ光Lの吸収性が悪い材料やレー
ザ加工を適用しにくい材料でも、レーザ加工性のよい物
質を導波路の薄膜Pとして被着すれば虹色発色加工を施
せることになり、従って本発明における加工対象には殆
ど制約がない。A metal material such as stainless steel is generally used as the workpiece W, but various non-metal materials such as ceramics and semiconductors can also be processed, and a transparent material (transparent to the naked eye) of a general concept is used. Even if there is a material, it can be processed as long as it is a material that can absorb an infrared laser light such as a carbon dioxide gas laser and an ultraviolet laser light such as an excimer laser. Furthermore, since the iridescent color can be obtained even if the formed fine irregularities G reach only the thin film P of the waveguide, the thin film P of the waveguide has a lower melting point than the material of the workpiece W. Even if a material having poor absorption of the laser light L used for processing or a material to which laser processing is difficult to apply is applied as a thin film P of the waveguide, iridescent coloring processing can be performed. Therefore, there are almost no restrictions on the object to be processed in the present invention.
【0027】微細凹凸Gを形成するために上記導波路の
薄膜Pを有する被加工物W表面に照射するレーザ光L
は、一般的にレーザ発振器より出射したレーザビームを
凸レンズや凹面鏡等の収束手段を介して収束した形で用
いるが、照射面を収束手段の焦点近傍に位置させると通
常の溝切り加工のように照射スポットの領域全体が一様
に溶融・蒸発してしまうため、干渉縞に対応した明瞭な
微細凹凸Gを形成するには上記焦点よりも深浅一方向に
ずれた位置で照射されるように設定する必要がある。図
5は上記の加工条件を例示したもので、レーザ光Lを収
束するレンズSの焦点Fを含むZ0 の範囲がダメージ領
域であり、その上下に好適な加工領域Z1,Z2 があ
る。ただし、強力なパルスレーザ光が得られるなら、収
束手段を介さずに照射して微細凹凸Gを形成することも
可能である。A laser beam L for irradiating the surface of the workpiece W having the thin film P of the waveguide to form the fine irregularities G.
Is generally used in a form in which a laser beam emitted from a laser oscillator is converged through a converging means such as a convex lens or a concave mirror.However, when the irradiation surface is positioned near the focus of the converging means, it is like a normal grooving process. Since the entire area of the irradiation spot is uniformly melted and evaporated, in order to form clear fine irregularities G corresponding to the interference fringes, the irradiation is set at a position shifted in the depth direction from the above focal point. There is a need to. FIG. 5 exemplifies the above processing conditions. The range of Z 0 including the focal point F of the lens S that converges the laser beam L is the damaged area, and the suitable processing areas Z 1 and Z 2 are above and below the damaged area. . However, if a strong pulsed laser beam can be obtained, it is possible to form fine irregularities G by irradiating without passing through the converging means.
【0028】また、この微細凹凸Gの形成にはパルスレ
ーザ光を用い、照射位置を連続移動しつつ溝加工する走
査方式、ならびに定位置でスポット状に溝加工する方式
のいずれにおいても、多数回のパルスが被加工物表面の
同位置に多数回(通常は数十回)繰り返し照射されるよ
うに設定する。更にレーザ発振器としては、鮮明な干渉
縞を形成する上で、ビームパターンがシングルモード
(TEM00)となるものが望ましい。Further, pulse laser light is used to form the fine irregularities G, and a large number of times are used in both the scanning method of grooving while continuously moving the irradiation position and the method of grooving into spots at a fixed position. The pulse is set to be repeatedly irradiated to the same position on the surface of the workpiece many times (usually several tens of times). Further, as the laser oscillator, it is desirable that the beam pattern has a single mode (TEM 00 ) in order to form a clear interference fringe.
【0029】なお、鮮明な虹色発色を得るには被加工物
表面の同位置に繰り返し照射されるパルスの最終段階で
明瞭な微細凹凸Gを形成するような加工条件が望まし
い。しかして、照射位置を連続移動しつつ溝加工する走
査方式においては、レーザ光Lのパルスが被加工物の同
位置に多数回当たるように走査速度を設定するが、図2
に示すように、レーザ光Laは微小な傷や結晶粒界から
薄膜Pへ潜り込まなくても、後半部分で既に出来上がっ
た微細凹凸Gをグレーティングカプラとして非常に効率
よく該薄膜P内に入り込めるため、照射スポットを停止
した状態で加工する方式よりも干渉が強くなり、より明
瞭な微細凹凸Gを形成できる。In order to obtain a clear iridescent color, it is desirable that the processing conditions are such that clear fine irregularities G are formed at the final stage of the pulse repeatedly applied to the same position on the surface of the workpiece. Then, in the scanning method in which the irradiation position is continuously moved and the groove is processed, the scanning speed is set so that the pulse of the laser light L strikes the same position of the workpiece many times.
As shown in, even if the laser light La does not penetrate into the thin film P from minute scratches or crystal grain boundaries, the fine unevenness G already formed in the latter half portion can enter the thin film P very efficiently as a grating coupler. The interference becomes stronger than that of the method of processing with the irradiation spot stopped, and more clear fine irregularities G can be formed.
【0030】ところで、レーザ発振器より出射されるレ
ーザ光Lは一般に円形断面のビームパターンであるた
め、走査方式の加工においては、加工ラインの中央部ほ
どレーザ光が広い幅で当たりつつ通過するので、中央部
と両側部では溝形成条件が異なることになり、ビーム強
度が強い場合は加工ライン中央部の微細凹凸がエネルギ
ー過多により潰れ易くなる一方、ビーム強度が弱い場合
は加工ライン周辺部の微細凹凸がエネルギー不足により
不明瞭になる傾向があり、加工ライン全体に均一な微細
凹凸を形成しにくい。しかるに、図6の如く、微細凹凸
形成用のレーザ光Lの光路にシリンドリカルレンズSL
を、その長手方向がビーム走査方向と直交する形で介在
させれば、円形のビームパターンが走査方向に対して直
交する方向に長いビームパターンに変換されるから、加
工ラインの中央部と両側部とで照射スポットの走査方向
に沿う幅の差が小さくなり、ライン幅方向の照射エネル
ギーが均等化すると共に、照射スポット全体としても走
査方向に沿う幅が狭いため、走査中に形成された微細凹
凸に必要以上のレーザ光が当たるのを防止でき、もって
加工ラインの幅全体に均一で且つ明瞭な微細凹凸Gを形
成することが可能となる。By the way, since the laser beam L emitted from the laser oscillator generally has a beam pattern with a circular cross section, in the processing of the scanning method, the laser beam passes with a wider width toward the central portion of the processing line. The groove formation conditions are different between the central part and both sides. When the beam intensity is strong, the fine irregularities in the central part of the processing line tend to be crushed due to excess energy, while when the beam intensity is weak, the fine irregularities in the peripheral part of the processing line. Tends to become unclear due to lack of energy, and it is difficult to form uniform fine irregularities on the entire processing line. However, as shown in FIG. 6, the cylindrical lens SL is provided in the optical path of the laser beam L for forming the fine irregularities.
, The circular beam pattern is converted into a long beam pattern in the direction orthogonal to the scanning direction by interposing the longitudinal direction orthogonal to the beam scanning direction. The difference between the widths of the irradiation spots along the scanning direction is reduced, the irradiation energy in the line width direction is equalized, and the width of the irradiation spots along the scanning direction is narrow, resulting in fine irregularities formed during scanning. Therefore, it is possible to prevent the laser light from being irradiated more than necessary, and thus it is possible to form uniform and clear fine irregularities G over the entire width of the processing line.
【0031】なお、図6中のDPはレーザ光の光路中に
介在させたドーペプリズムであり、その回転により偏光
面を回転させずに透過像を2倍の角度で回転させる機能
を持つ。しかして、上記シリンドリカルレンズSLを介
在させて走査方式で微細凹凸Gを形成する際、レーザビ
ームのX−Y方向の移動指令に基づいて移動のベクトル
方向を演算し、これに基づいてドーペプリズムDPを回
転制御することにより、シリンドリカルレンズSLによ
る長いビームパターンの長径方向が走査方向と常に直交
するように調整することができる。Incidentally, DP in FIG. 6 is a Dope prism interposed in the optical path of the laser beam, and has the function of rotating the transmitted image at a double angle without rotating the plane of polarization by the rotation thereof. Therefore, when the fine irregularities G are formed by the scanning method with the cylindrical lens SL interposed, the vector direction of movement is calculated based on the movement command in the XY directions of the laser beam, and the dope prism DP is set based on this. By controlling the rotation, it is possible to adjust such that the major axis direction of the long beam pattern formed by the cylindrical lens SL is always orthogonal to the scanning direction.
【0032】[0032]
【実施例】実施例1 電気炉を用い、加工面を鏡面研磨したステンレス鋼板を
空気中(1気圧)において下表の各温度で30分間加熱
処理し、該鋼板の表面に導波路となる酸化被膜を形成し
た。この酸化被膜はCr2 O3 を主体(NiOを含む)
とするものであり、その膜厚と屈折率を測定波長0.6
328μmにて測定(酸化被膜の減衰係数kは膜厚が薄
いため0として計算)したところ、次表の結果が得られ
た。なお、処理前のステンレス鋼板では減衰係数k=
4.3、表面部の屈折率n=2.3であった。Example 1 A stainless steel plate having a machined surface mirror-polished in an electric furnace was heat-treated in air (1 atm) at each temperature shown in the table below for 30 minutes to oxidize a surface of the steel plate into a waveguide. A film was formed. This oxide film is mainly Cr 2 O 3 (including NiO)
And the film thickness and refractive index are measured at a wavelength of 0.6.
When the measurement was performed at 328 μm (the attenuation coefficient k of the oxide film was calculated as 0 because the film thickness is thin), the results in the following table were obtained. The damping coefficient k =
The refractive index of the surface portion was 4.3 and the refractive index n was 2.3.
【0033】[0033]
【表1】 [Table 1]
【0034】次に、上記の酸化被膜からなる導波路を形
成したステンレス鋼板A〜Cの各表面に、空気中におい
て、直線偏光のQスイッチNd:YAGレーザ(シング
ルモード、波長1.06μm、パルス幅100ns、レ
ーザ出力0.5mJ)のパルスレーザ光を、対物レンズ
で集光した焦点よりも上方8mmに照射位置を設定し
て、同位置に約40回のパルスが当たる走査速度で連続
的に照射し、所定パターンの線画を描いたところ、いず
れの場合も約0.1mmのライン幅全体に幅約0.5μ
mの溝が約1μmのピッチで密に集合した微細凹凸が形
成された。この線画は、太陽光及び室内照明光の何れの
照明下でも、虹色の多彩な反射光沢を示すラインより構
成され、しかも該反射光沢の色合いが照明方向及び見る
角度によって様々に変化するものであったが、特に試料
Bのステンレス鋼板の線画が最も鮮明な反射光沢を示し
た。Next, linearly polarized Q-switched Nd: YAG laser (single mode, wavelength 1.06 μm, pulsed) in air on each surface of the stainless steel plates A to C on which the waveguide made of the oxide film is formed. A pulsed laser beam with a width of 100 ns and a laser output of 0.5 mJ) is set 8 mm above the focus focused by the objective lens, and the irradiation position is continuously set at a scanning speed at which a pulse is applied about 40 times. When a line drawing of a predetermined pattern was drawn by irradiation, the width was about 0.5μ over the entire line width of about 0.1mm in each case.
Fine irregularities in which m grooves were densely aggregated at a pitch of about 1 μm were formed. This line drawing is composed of lines showing a variety of iridescent reflection gloss under both sunlight and indoor illumination light, and the shade of the reflection gloss changes variously depending on the illumination direction and the viewing angle. However, the line image of the stainless steel plate of Sample B showed the clearest reflection gloss.
【0035】実施例2 実施例1と同じQスイッチNd:YAGレーザを用い、
そのレーザ光の光路中に図6の如くシリンドリカルレン
ズSL及びドーペプリズムDPを介在させた構成とし、
実施例1の試料Bと同様にして加工面に酸化被膜の導波
路を形成したステンレス鋼板の表面に実施例1と同条件
でパルスレーザ光を走査しつつ照射する際、制御装置に
より上記ドーペプリズムを回転制御して長楕円形の照射
ビームパターンの長軸方向が常に走査方向に直交するよ
うに走査し、所定パターンの線画を描いた。その結果、
約0.3mmのライン幅全体に幅約0.5μmの溝が全
てライン幅方向に平行に約1μmのピッチで配置した溝
集団からなる微細凹凸が形成され、実施例1よりも更に
鮮明な虹色に変化する反射光沢を示すラインより構成さ
れた線画が得られた。Example 2 Using the same Q-switched Nd: YAG laser as in Example 1,
As shown in FIG. 6, a cylindrical lens SL and a dope prism DP are interposed in the optical path of the laser light,
When the surface of the stainless steel plate on which the waveguide of the oxide film was formed on the processed surface was irradiated with the pulsed laser light while scanning the same under the same conditions as in Example 1, the Dope prism was controlled by the control device in the same manner as in Sample B of Example 1. The rotation was controlled and scanning was performed so that the major axis direction of the oblong irradiation beam pattern was always orthogonal to the scanning direction, and a line image of a predetermined pattern was drawn. as a result,
A finer concavo-convex pattern is formed over the entire line width of about 0.3 mm, in which grooves each having a width of about 0.5 μm are arranged parallel to the line width direction at a pitch of about 1 μm. A line drawing was obtained which consisted of lines showing reflective gloss which changed to color.
【0036】実施例3 実施例1と同様のQスイッチNd:YAGレーザ2基を
用い、その一方のパルスレーザ光の照射軌跡を他方のパ
ルスレーザ光が1mm離れて辿るように装置構成し、両
パルスレーザ光の照射位置を共に対物レンズで集光した
焦点よりも上方8mmの位置に設定し、且つQスイッチ
の調整によって同位置に先導するレーザビームのパルス
が40回、後続するレーザビームのパルスが40回、そ
れぞれ当たる走査速度として、空気中(1気圧)におい
て鏡面研磨したステンレス鋼板の表面に連続的に照射
し、所定パターンの線画を描いたところ、約0.1mm
のライン幅全体に幅約0.5μmの溝が約1μmのピッ
チで密に集合した溝集団からなる微細凹凸が形成され
た。この線画は、実施例1の加工物と同様に虹色に多彩
に変化する反射光沢を示すラインより構成されたもので
あった。また、この場合の先導するレーザビームのみの
照射軌跡を調べたところ、約150オングストロームの
酸化被膜を生じていた。Example 3 Two Q-switched Nd: YAG lasers similar to those in Example 1 were used, and the irradiation track of one pulse laser beam was configured so that the other pulse laser beam traced 1 mm apart. The irradiation position of the pulsed laser light is set to a position 8 mm above the focus focused by the objective lens, and the laser beam pulse leading to the same position is adjusted 40 times by adjusting the Q switch, and the pulse of the subsequent laser beam is set. At a scanning speed of 40 times each, the surface of the stainless steel plate mirror-polished in the air (1 atm) was continuously irradiated and a line image of a predetermined pattern was drawn.
Fine irregularities composed of a groove group in which grooves each having a width of about 0.5 μm were densely gathered at a pitch of about 1 μm were formed on the entire line width. This line drawing was composed of lines exhibiting reflective gloss that was variably changed to rainbow colors, as in the case of the processed product of Example 1. In addition, when the irradiation trajectory of only the leading laser beam in this case was examined, an oxide film of about 150 angstrom was formed.
【0037】比較例1 鏡面研磨したステンレス鋼板を熱処理せず、その表面に
実施例1と同じQスイッチNd:YAGレーザを用いて
実施例と同一条件でパルスレーザ光を連続的に照射し、
所定パターンの線画を描いた。しかるに、この線画のラ
インには明瞭な微細凹凸が形成されておらず、地肌の金
属光沢と異なる鈍い金色の反射光沢を示すだけであっ
た。Comparative Example 1 A mirror-polished stainless steel plate was not heat-treated, and its surface was continuously irradiated with pulsed laser light under the same conditions as in Example 1, using the same Q-switched Nd: YAG laser as in Example 1,
A line drawing of a predetermined pattern was drawn. However, no clear fine irregularities were formed on the line of this line drawing, and it showed only a dull gold reflection gloss different from the metallic gloss of the background.
【0038】比較例2 実施例1の試料Bと同様にして加工面に酸化被膜の導波
路を形成したステンレス鋼板の表面に、実施例1と同じ
QスイッチNd:YAGレーザを用い、照射位置を対物
レンズで集光した焦点に設定した以外は実施例1と同様
にして、パルスレーザ光を連続的に照射し、所定パター
ンの線画を描いた。しかるに、この線画のラインは全体
が一本の深い溝状をなすだけであり、虹色の反射光沢は
全く示さなかった。Comparative Example 2 The same Q-switched Nd: YAG laser as in Example 1 was used on the surface of a stainless steel plate having an oxide film waveguide formed on the processed surface in the same manner as in Sample B of Example 1, and the irradiation position was changed. Pulse laser light was continuously irradiated in the same manner as in Example 1 except that the focus was set by the objective lens, and a line image having a predetermined pattern was drawn. However, the line of this line drawing had only one deep groove, and did not show any iridescent reflection gloss.
【0039】実施例4 電気炉を用い、加工面を鏡面研磨した金属チタン板を窒
素雰囲気中(1気圧)において700℃にて30分間加
熱処理したところ、その表面に厚さ約150オングスト
ローム、屈折率n=3.1の導波路となる窒化被膜(T
iN)が形成された。なお、処理前では減衰係数k=
3.6、表面部の屈折率n=2.8であった。次に、こ
の窒化被膜を有する金属チタン板の表面に、空気中にお
いて、実施例1と同じQスイッチNd:YAGレーザを
用いて実施例と同一条件でパルスレーザ光を連続的に照
射し、所定パターンの線画を描いたところ、約0.1m
mのライン幅全体に幅約0.5μmの溝が約1μmのピ
ッチで密に集合した溝集団からなる微細凹凸が形成され
た。この線画は、実施例1の加工物と同様に虹色に多彩
に変化する反射光沢を示すラインより構成されたもので
あった。Example 4 Using an electric furnace, a metal titanium plate having a machined surface mirror-polished was heat-treated at 700 ° C. for 30 minutes in a nitrogen atmosphere (1 atm). The surface had a thickness of about 150 Å and was refracted. Nitride film (T
iN) was formed. Before processing, the damping coefficient k =
The refractive index n of the surface portion was 3.6. Next, the surface of the metal titanium plate having the nitrided film was continuously irradiated with pulsed laser light in air using the same Q-switched Nd: YAG laser as in Example 1 under the same conditions as in Example 1 When I drew a line drawing of the pattern, it was about 0.1 m
Fine concavo-convex formed of a groove group in which grooves having a width of about 0.5 μm were densely gathered at a pitch of about 1 μm was formed over the entire line width of m. This line drawing was composed of lines exhibiting reflective gloss that was variably changed to rainbow colors, as in the case of the processed product of Example 1.
【0040】なお、本発明は、上記実施例に限定される
ものではなく、これら実施例で用いた以外の金属材料、
セラミックスや半導体の如き種々の非金属材料も加工対
象とできると共に、例示した熱処理以外の手段で導波路
の薄膜を形成することも可能であり、また微細凹凸形成
用として例示したQスイッチNd:YAGレーザ以外の
種々のパルスレーザ発振器(好適にはパルス幅の短いレ
ーザ光が得られるもの)を使用できることは言うまでも
ない。The present invention is not limited to the above-mentioned embodiments, and metal materials other than those used in these embodiments,
Various non-metal materials such as ceramics and semiconductors can be processed, and the thin film of the waveguide can be formed by means other than the heat treatment as illustrated, and the Q switch Nd: YAG illustrated as an example for forming fine unevenness. It goes without saying that various pulsed laser oscillators other than lasers (preferably ones that can obtain laser light with a short pulse width) can be used.
【0041】[0041]
【発明の効果】請求項1の虹色発色加工方法によれば、
被加工物の表面にレーザ光の干渉縞に対応した相互間隔
1μm程度あるいはそれ以下といった微細で密な溝の集
合からなる凹凸を容易に短時間で形成可能であり、この
微細凹凸に基づき反射光沢が入射光の方向や見る角度に
よって虹色様に多彩に変化する線や面からなる美麗な装
飾を有する加工品を安価に提供できる。また、この加工
方法では、被加工物表面の導波路により照射レーザ光の
一部を面方向に伝搬させ、この伝搬するレーザ光と照射
レーザ光との干渉により、その干渉縞の強度分布に対応
した微細凹凸を形成することから、レーザ光の光路やレ
ーザ発振器自体に格別な干渉機構を介在させる必要がな
く、レーザ加工の装置構成が簡素になる上、干渉性が高
く、形成される微細凹凸が非常に鮮明度の高い虹色発色
を生じるものとなり、しかも従来の予め干渉光としたレ
ーザ光を照射する場合に比較して加工速度を速めて加工
時間を大幅に短縮できる。According to the iridescent color processing method of claim 1,
It is possible to easily form irregularities consisting of a collection of minute and dense grooves with a mutual spacing of about 1 μm or less corresponding to the interference fringes of laser light on the surface of the work piece in a short time, and based on these minute irregularities, reflection gloss It is possible to inexpensively provide a processed product having a beautiful decoration made up of lines and surfaces that change in a rainbow-like manner depending on the direction of incident light and the viewing angle. Further, in this processing method, a part of the irradiation laser light is propagated in the surface direction by the waveguide on the surface of the workpiece, and the interference between the propagating laser light and the irradiation laser light corresponds to the intensity distribution of the interference fringes. By forming the fine concavo-convex pattern, it is not necessary to intervene a special interference mechanism in the optical path of the laser beam or the laser oscillator itself, and the laser processing apparatus configuration is simple, and the coherence is high. Results in iridescent coloring with a very high degree of sharpness, and the processing speed can be increased and the processing time can be greatly shortened as compared with the conventional case of irradiating with laser light that has been previously made as interference light.
【0042】請求項2の虹色発色加工方法によれば、パ
ルスレーザ光の照射スポット内の溶融による一様化を回
避して、干渉縞に対応した良好な微細凹凸を形成できる
という利点がある。According to the iridescent coloring method of the second aspect, there is an advantage that it is possible to avoid the uniformization due to the melting in the irradiation spot of the pulsed laser light and to form fine fine irregularities corresponding to the interference fringes. .
【0043】請求項3の虹色発色加工方法によれば、被
加工物を反応性ガス又は反応性液中で処理することによ
って導波路となる薄膜を能率よく短時間で形成でき、一
行程で多数の被加工物の表面に同時に該薄膜を形成する
ことも可能である。According to the iridescent coloring method of claim 3, the thin film to be the waveguide can be efficiently formed in a short time by treating the object to be processed in the reactive gas or the reactive liquid. It is also possible to simultaneously form the thin film on the surfaces of many workpieces.
【0044】請求項4の虹色発色加工方法によれば、被
加工物が金属材料である場合に、気相中で熱処理を施す
だけで良好な導波路となる酸化被膜や窒化被膜等を容易
に確実に形成できるという利点がある。According to the iridescent coloring method of the fourth aspect, when the object to be processed is a metal material, it is easy to form an oxide film, a nitride film, or the like, which becomes a good waveguide, simply by performing heat treatment in the vapor phase. There is an advantage that it can be reliably formed.
【0045】請求項5の虹色発色加工方法によれば、レ
ーザ加工装置において導波路形成用のレーザ光を微細凹
凸形成用のレーザ光に先導して被加工物表面に照射する
ように配置構成して導波路の薄膜形成と微細凹凸の形成
を連続して行うことができ、もって非常に短時間で能率
よく虹色発色加工を施せると共に、両レーザ光の走査パ
ターンが同じになるように制御して微細凹凸の形成を要
する領域のみに導波路を設けることが可能となる。According to the iridescent color processing method of the fifth aspect, the laser processing apparatus is arranged so that the laser beam for forming the waveguide is directed to the laser beam for forming the fine irregularities and irradiates the surface of the workpiece. By doing so, it is possible to continuously form the thin film of the waveguide and the formation of fine irregularities, so that it is possible to perform rainbow color development processing efficiently in a very short time and control so that the scanning patterns of both laser beams are the same. As a result, the waveguide can be provided only in the region where the fine irregularities need to be formed.
【0046】請求項6の虹色発色加工方法によれば、導
波路へのレーザ光のカップリング効率を充分に高めるこ
とができ、もってより鮮明な虹色発色を生じる微細凹凸
を形成できるという利点がある。According to the iridescent color processing method of the sixth aspect, the coupling efficiency of the laser light to the waveguide can be sufficiently enhanced, so that fine irregularities for producing a more vivid iridescent color can be formed. There is.
【0047】請求項7の虹色発色加工方法によれば、特
に走査方式により連続的に微細凹凸を形成する場合に、
加工物ラインの幅方向の照射エネルギーを均等化できる
と共に、走査中に形成された微細凹凸に必要以上のレー
ザ光が当たるのを防止でき、もって加工ラインの幅全体
に均一で且つ明瞭な微細凹凸を形成することが可能とな
る。According to the iridescent color processing method of claim 7, particularly when fine irregularities are continuously formed by a scanning method,
Irradiation energy in the width direction of the workpiece line can be equalized, and more than necessary laser light can be prevented from hitting the fine irregularities formed during scanning, and thus uniform and clear fine irregularities over the entire width of the processing line. Can be formed.
【図1】 本発明の虹色発色加工方法における微細凹凸
の形成機構をA〜Cの工程順に説明する概略縦断面図。FIG. 1 is a schematic vertical cross-sectional view for explaining a mechanism of forming fine irregularities in the iridescent color processing method of the present invention in the order of steps A to C.
【図2】 同加工方法における微細凹凸の走査方式によ
る形成工程を示す概略縦断面図。FIG. 2 is a schematic vertical cross-sectional view showing a forming process of a fine unevenness by a scanning method in the processing method.
【図3】 同加工方法における導波路によるレーザ光の
伝搬状態を示す概略縦断面図。FIG. 3 is a schematic vertical sectional view showing a propagation state of laser light through a waveguide in the same processing method.
【図4】 同加工方法においてレーザ光による導波路形
成と微細凹凸の形成を連続的に行う方式を示す概略縦断
面図。FIG. 4 is a schematic vertical sectional view showing a method of continuously forming a waveguide and fine irregularities by laser light in the same processing method.
【図5】 同加工方法における微細凹凸の形成に用いる
レーザ光の加工領域を示す模式図。FIG. 5 is a schematic diagram showing a processing region of laser light used for forming fine irregularities in the processing method.
【図6】 同加工方法における微細凹凸の形成にシリン
ドリカルレンズを利用した例を示す概略正面図。FIG. 6 is a schematic front view showing an example in which a cylindrical lens is used to form fine irregularities in the processing method.
W 被加工物 P レーザ光の導波路となる薄膜 L 照射レーザ光 La 導波路を伝搬するレーザ光 Lb 導波路形成用のレーザ光 S レンズ(収束手段) F 焦点 G 微細凹凸 SL シリンドリカルレンズ W Workpiece P Thin film used as waveguide for laser light L Irradiated laser light La Laser light propagating in waveguide Lb Laser light for forming waveguide S Lens (converging means) F Focus G Fine unevenness SL Cylindrical lens
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大島 時彦 兵庫県尼崎市常光寺1丁目9番1号 大阪 富士工業株式会社内 (72)発明者 平田 繁一 兵庫県尼崎市常光寺1丁目9番1号 大阪 富士工業株式会社内 (72)発明者 岡野 良和 兵庫県尼崎市常光寺1丁目9番1号 大阪 富士工業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Tokhiko Oshima, 1-9-1, Jokoji Temple, Amagasaki City, Hyogo Prefecture, Osaka Fuji Kogyo Co., Ltd. (72) Inventor, Shigekazu Hirata 1-9-1, Jokoji Temple, Amagasaki City, Hyogo Prefecture In Osaka Fuji Industry Co., Ltd. (72) Inventor Yoshikazu Okano 1-9-1, Jokoji Temple, Amakosaki City, Hyogo Prefecture Inside Fuji Fuji Industry Co., Ltd.
Claims (7)
る薄膜を形成したのち、この薄膜を形成した表面に、収
束したパルスレーザ光を同位置に多数回のパルスが当た
るように照射することにより、上記薄膜を伝搬するレー
ザ光と照射レーザ光とを干渉させ、その干渉縞の強度分
布に対応した微細凹凸を前記被加工物の表面に形成する
ことを特徴とする虹色発色加工方法。1. A thin film that serves as a waveguide for laser light is formed on the surface of a workpiece, and then the converged pulsed laser light is irradiated onto the surface on which the thin film is formed so that multiple pulses strike the same position. By causing the laser light propagating through the thin film and the irradiation laser light to interfere with each other, fine irregularities corresponding to the intensity distribution of the interference fringes are formed on the surface of the workpiece, iridescent coloring processing. Method.
深浅一方向にずれた位置で照射する請求項1記載の虹色
発色加工方法。2. The rainbow color developing method according to claim 1, wherein the pulsed laser light is applied at a position shifted in one direction in a depth direction from a focus of the converging means.
物の表面変成によって形成する請求項1記載の虹色発色
加工方法。3. The rainbow color developing method according to claim 1, wherein the thin film serving as the waveguide of the laser light is formed by surface modification of the workpiece.
性ガス中で熱処理することにより、素材金属とガス成分
との反応物からなる被膜を形成してレーザ光の導波路と
なる薄膜とする請求項3記載の虹色発色加工方法。4. A thin film which serves as a waveguide for laser light by forming a coating film made of a reaction product of a material metal and a gas component by heat-treating the work material in a reactive gas. The rainbow color processing method according to claim 3.
成用のレーザ光とは別のレーザ光を照射することによっ
て行う請求項3又は4に記載の虹色発色加工方法。5. The iridescent color processing method according to claim 3, wherein the heat treatment in the reactive gas is performed by irradiating a laser beam different from the laser beam for forming the fine irregularities.
グストローム以上の厚みとする請求項1〜5のいずれか
に記載の虹色発色加工方法。6. The rainbow color developing method according to claim 1, wherein the thin film serving as a waveguide for the laser light has a thickness of 50 angstroms or more.
ンドリカルレンズを介在させることにより、該レーザ光
の円形ビームをビーム走査方向に対して直交する方向に
長いビームパターンに変換する請求項1〜6のいずれか
に記載の虹色発色加工方法。7. The circular beam of the laser light is converted into a long beam pattern in a direction orthogonal to the beam scanning direction by interposing a cylindrical lens in the optical path of the laser light for forming fine irregularities. 6. The iridescent color processing method according to any one of 6 above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5002781A JPH0825045B2 (en) | 1993-01-11 | 1993-01-11 | Iridescent color processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5002781A JPH0825045B2 (en) | 1993-01-11 | 1993-01-11 | Iridescent color processing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06198465A JPH06198465A (en) | 1994-07-19 |
| JPH0825045B2 true JPH0825045B2 (en) | 1996-03-13 |
Family
ID=11538885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5002781A Expired - Lifetime JPH0825045B2 (en) | 1993-01-11 | 1993-01-11 | Iridescent color processing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0825045B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018131681A1 (en) * | 2017-01-12 | 2018-07-19 | 新日鐵住金株式会社 | Coated metal plate |
-
1993
- 1993-01-11 JP JP5002781A patent/JPH0825045B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06198465A (en) | 1994-07-19 |
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