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JPH0827403B2 - Diffraction grating - Google Patents
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JPH0827403B2 - Diffraction grating - Google Patents

Diffraction grating

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Publication number
JPH0827403B2
JPH0827403B2 JP23215386A JP23215386A JPH0827403B2 JP H0827403 B2 JPH0827403 B2 JP H0827403B2 JP 23215386 A JP23215386 A JP 23215386A JP 23215386 A JP23215386 A JP 23215386A JP H0827403 B2 JPH0827403 B2 JP H0827403B2
Authority
JP
Japan
Prior art keywords
diffraction grating
recording
grating
pattern
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP23215386A
Other languages
Japanese (ja)
Other versions
JPS6385503A (en
Inventor
英行 野田
雅人 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP23215386A priority Critical patent/JPH0827403B2/en
Publication of JPS6385503A publication Critical patent/JPS6385503A/en
Publication of JPH0827403B2 publication Critical patent/JPH0827403B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)

Description

【発明の詳細な説明】 (イ) 産業上の利用分野 本発明はホログラフィによって製作された回折格子に
関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a diffraction grating manufactured by holography.

(ロ) 従来技術 凹面回折格子を用いる分光器では,凹面回折格子の結
像性に収差が現われるが,このような収差を補正するた
めにホログラフィを用いて凹面回折格子の格子パターン
として特殊なパターンを製作することが実施されてい
る。しかし従来は,格子基板上に格子パターンを形成す
るための記録光に球面波を用いていたので,格子パター
ンは回転双曲線群と格子基板との交線群に限定され,充
分な収差補正ができなかった。特に写真乾燥やアレイ検
出器を用いる分光器では分散方向の収差の補正,結像面
をより平面に近くすること,結像面の中心が概略回折格
子中心方向と垂直であることなど,使用上の必要条件を
満たすための結像特性の補正をはかる必要があるため,
例えば非点収差など,実効効率が低下するにもかかわら
ず,この方面の収差補正は行われていないのが実状であ
る。
(B) Conventional technology In a spectroscope using a concave diffraction grating, aberration appears in the image forming property of the concave diffraction grating. To correct such aberration, holography is used to create a special pattern as the grating pattern of the concave diffraction grating. Is being implemented. However, in the past, spherical waves were used as the recording light for forming the grating pattern on the grating substrate, so the grating pattern is limited to the group of intersecting lines of the rotating hyperbola group and the grating substrate, and sufficient aberration correction is possible. There wasn't. In particular, in the case of photodrying or a spectroscope using an array detector, the aberration in the dispersion direction is corrected, the image plane is made closer to the plane, and the center of the image plane is substantially perpendicular to the diffraction grating center direction. Since it is necessary to correct the imaging characteristics to meet the requirement of
For example, although the effective efficiency is lowered due to astigmatism, the aberration is not corrected in this direction.

また,平面回折格子は,従来機械切りで格子溝を作っ
ており,格子パターンは等間隔直線格子であって,この
型の回折格子はそれ自身は収差を持っていないが,コリ
メータ素子とテレメータ素子に凹面鏡を用いる分光器で
は,凹面鏡に球面鏡を用い軸外し状態で使うため,これ
らの凹面鏡によって収差が発生していた。この収差を補
正するためには,平面回折格子の格子パターンを特殊な
ものにして、回折格子にコリメータ鏡及びカメラ鏡によ
って発生する収差を打消すような収差を発生させればよ
いが、この場合にもホログラフィの利用によってそのよ
うな特殊な格子パターンが製作される。しかし,やはり
記録光に球面波を用いていたので収差補正は不充分なも
のであった。
Further, the plane diffraction grating has conventionally been formed by mechanical cutting to form a grating groove, and the grating pattern is a linear grating with equal intervals. This type of diffraction grating has no aberration by itself, but collimator element and telemeter element In spectroscopes that use concave mirrors, the spherical mirrors are used as the concave mirrors and they are used off-axis, so aberrations are generated by these concave mirrors. In order to correct this aberration, the grating pattern of the plane diffraction grating may be made special so that the diffraction grating has an aberration that cancels the aberration generated by the collimator mirror and the camera mirror. Also, by using holography, such a special grid pattern is produced. However, aberration correction was inadequate because spherical waves were used as the recording light.

(ハ) 発明が解決しようとする問題点 本発明は,ホログラフィを用いた回折格子の格子パタ
ーンの形成に改善を行って,より完全な収差補正を可能
にしようとするものである。
(C) Problems to be Solved by the Invention The present invention is intended to improve the formation of the grating pattern of the diffraction grating using holography to enable more complete aberration correction.

(ニ) 問題解決のための手段 本発明の回折格子は,ホログラフィによって回折格子
基板に回折格子パターンを記録するための記録光の光線
方向上で,回折格子の水平,垂直方向の発散光源点から
回折格子基板までの距離を実質的に変えたことを特徴と
する。
(D) Means for Solving the Problem The diffraction grating of the present invention is a holographically divergent light source point in the horizontal and vertical directions of the recording light for recording the diffraction grating pattern on the diffraction grating substrate. It is characterized in that the distance to the diffraction grating substrate is substantially changed.

(ホ) 作用 ホログラフィによる回折格子パターンの製作法は,回
折格子基板に互に干渉可能な二光束の光を投影して回折
格子パターンを形成させ,この干渉パターンを基板面に
焼付け記録するもので,上記二光束を記録光,その光源
を記録光源と云う。従来は,上記した二つの記録光とし
て平面波域或は球面波を用いていた。これに対して本発
明では,記録光の光線方向上で回折格子の水平,垂直方
向の発散光源点から回折格子基板までの距離を実質的に
変えるため,水平,垂直方向の焦点が異なる光(アステ
ィグマティック光,astingmatic光)を記録光としたもの
である。これにより干渉パターンを形成する記録条件の
パラメータが増加し,得られる干渉パターンも変化に富
み,干渉パターンの選択の自由度が増すので,記録条件
の選択によって従来に比較し収差補正がより完全にでき
るようになった。
(E) Action In the method of manufacturing a diffraction grating pattern by holography, two beams of light that can interfere with each other are projected onto the diffraction grating substrate to form a diffraction grating pattern, and this interference pattern is printed and recorded on the substrate surface. The two light fluxes are referred to as recording light, and the light source is referred to as recording light source. Conventionally, a plane wave region or a spherical wave is used as the above two recording lights. On the other hand, according to the present invention, since the distance from the divergent light source point in the horizontal and vertical directions of the diffraction grating to the diffraction grating substrate is substantially changed in the ray direction of the recording light, the light having different focal points in the horizontal and vertical directions ( The recording light is astigmatic light. As a result, the parameters of the recording conditions that form the interference pattern are increased, the obtained interference patterns are rich in variation, and the degree of freedom in selecting the interference pattern is increased. I can do it now.

記録条件のパラメータが増加すると云うのは球面波を
用いる場合,パラメータは点光源の位置のデータだけで
あるが,アスティグマティック光を用いると,水平方向
と垂直方向との点光源の位置が実質的に異なることにな
り,特に垂直方向の結像条件に関係する記録条件のパラ
メータが増加したことになるので,それによって分光器
の光学系全体としての収差,特に非点収差を効果的に補
正できることになるのである。
When spherical waves are used, the only parameter that increases the parameters of the recording conditions is the data of the position of the point light source. However, when the astigmatic light is used, the position of the point light source in the horizontal and vertical directions is substantially the same. Since the parameters of the recording condition related to the vertical imaging condition are increased, the aberration of the entire optical system of the spectroscope, especially the astigmatism is effectively corrected. It will be possible.

(ヘ) 実施例 (球面回折格子基板を用いた場合) 第2図は,従来の球面回折格子の格子パターン記録時
の配置を示す図であって,4はホログラフィック干渉縞を
記録し,回折格子に仕立てる感光剤を塗布した球面回折
格子基板,5,6は球面波を発生するレーザ光源点である。
この場合,光原点5,6を焦点とする回転双曲線群と基板
との交線に縞を生ずる。この場合の具体的な記録条件
は,波長441.6nmのレーザ光を用いる場合, rC=0.9896,γ=−4.764゜ rD=0.9908,δ=10.101゜ である。
(F) Example (when a spherical diffraction grating substrate is used) FIG. 2 is a diagram showing the arrangement of a conventional spherical diffraction grating during recording of a grating pattern, in which 4 is a holographic interference fringe recorded and diffracted. Spherical diffraction grating substrates 5, 6 coated with a photosensitizer for the grating are laser light source points for generating spherical waves.
In this case, stripes are generated on the line of intersection between the substrate and the rotating hyperbolic group whose focal points are the optical origins 5, 6. In this case, specific recording conditions are r C = 0.9896, γ = −4.764 ° r D = 0.9088, δ = 10.101 ° when using a laser beam having a wavelength of 441.6 nm.

第1図は第2図で示した従来の回折格子と同一の水平
(分散)方向焦線を持ち,非点収差を補正するため,垂
直方向の焦線が水平方向の焦線のほぼ中心で交じわるよ
うな回折格子の格子パターン(第3図参照)を形成する
本発明の回折格子の格子パターン記録時の配置を示した
図である。7は球面回折格子基板,8は曲率半径0.6132の
球面鏡,9は水平方向の曲率半径0.6132,垂直方向の曲率
半径0.5852のトロイダル鏡であり,10,11は球面波を発す
るレーザ光源点である。この場合の具体的な記録条件
は,レーザ波長441.6nmのレーザ光を用いる場合 PC=1.5819,qC=0.5923,τ=15.000゜ PD=1.5831,qD=0.5923,τ=15,000゜ である。図中 はそれぞれ水平,垂直方向のレーザ光源点10,11の凹面
鏡8,9による焦点であり,これによりアスティグマティ
ッ光による記録,すなわち記録光の光線方向上で回折格
子の水平,垂直方向の光源点から格子基板までの距離を
実質的に変えて格子パターンの記録ができることにな
る。
FIG. 1 has the same horizontal (dispersion) direction focal line as the conventional diffraction grating shown in FIG. 2, and in order to correct astigmatism, the vertical focal line is almost at the center of the horizontal focal line. FIG. 6 is a diagram showing an arrangement when recording a grating pattern of the diffraction grating of the present invention that forms a grating pattern (see FIG. 3) of diffraction gratings that intersect with each other. Reference numeral 7 is a spherical diffraction grating substrate, 8 is a spherical mirror having a curvature radius of 0.6132, 9 is a toroidal mirror having a horizontal curvature radius of 0.6132 and a vertical curvature radius of 0.5852, and 10 and 11 are laser light source points for emitting spherical waves. The specific recording conditions in this case are: P C = 1.5819, q C = 0.5923, τ C = 15.000 ° P D = 1.5831, q D = 0.5923, τ D = 15,000 ° when using laser light with a laser wavelength of 441.6 nm Is. In the figure Are the focal points by the concave mirrors 8 and 9 of the laser light source points 10 and 11 in the horizontal and vertical directions, respectively, so that the recording by the astigmatic light, that is, the light source points in the horizontal and vertical directions of the diffraction grating in the beam direction of the recording light. The lattice pattern can be recorded by substantially changing the distance from the substrate to the lattice substrate.

上記実施例の回折格子を用いた分光系の一例を第3図
に示す。1が入口スリット,2が本発明による回折格子,3
は写真乾板又はアレイ検出器面であり,波長域350nm〜7
50nmにおいて水平(分散)方向焦線とのずれが最小にな
る位置に設置する。分光系の配置は,第3図において r=0.9514,α=19.268゜ r′=1.0035,β=−7.164゜ r′=1.0104,β=6.309゜ であり,回折格子2の水平方向の曲率半径は1.000であ
る。
An example of a spectroscopic system using the diffraction grating of the above embodiment is shown in FIG. 1 is an entrance slit, 2 is a diffraction grating according to the present invention, 3
Is the photographic plate or array detector surface, wavelength range 350nm ~ 7
It should be installed at a position where the deviation from the horizontal (dispersion) direction focal line is minimized at 50 nm. Arrangement of the spectroscopic system, r = 0.9514 In FIG. 3, alpha = 19.268 ° r '1 = 1.0035, β 1 = -7.164 ° r' 2 = 1.0104, a beta 2 = 6.309 °, the horizontal direction of the diffraction grating 2 Has a radius of curvature of 1.000.

(トロイダル回折格子基板を用いた場合) 第4図は第3図の分光系と同一の分光系に用いられる
本発明の他の実施例の回折格子の格子パターン記録時の
配置を示す図で,第2図で示した従来の回折格子の水平
方向の焦線上に水平方向焦線,垂直方向焦線を持ち(第
3図参照),全波長域にわたって非点収差を補正したも
のである。図において12はトロイダル面回折格子基板,1
3は曲率半径1.000の球面鏡,14,15は波長441.6nmの球面
波を発するレーザ光源点である。具体的な記録条件は PC=1.9854,qC=0.9957,τ=5.288゜ rD=0.9908,γ=−4.764゜,δ=10.134゜ である。図中 はそれぞれレーザ光源点14による水平,垂直方向の焦点
であり,これにより,アスティグマティック光による記
録,すなわち記録光の光線方向上で回折格子の水平,垂
直方向の光源点から格子基板までの距離を実質的に変え
て格子パターンの記録ができることになる。
(When Toroidal Diffraction Grating Substrate is Used) FIG. 4 is a diagram showing the arrangement of a diffraction grating of another embodiment of the present invention used in the same spectroscopic system of FIG. It has a horizontal focal line and a vertical focal line on the horizontal focal line of the conventional diffraction grating shown in FIG. 2 (see FIG. 3), and astigmatism is corrected over the entire wavelength range. In the figure, 12 is a toroidal plane diffraction grating substrate, 1
3 is a spherical mirror having a radius of curvature of 1.000, and 14 and 15 are laser light source points which emit spherical waves having a wavelength of 441.6 nm. The specific recording conditions are P C = 1.9854, q C = 0.9957, τ C = 5.288 ° r D = 0.9908, γ = -4.764 °, δ = 10.134 °. In the figure Are the focal points in the horizontal and vertical directions by the laser light source point 14, respectively, and this enables recording by the astigmatic light, that is, the distance from the light source point in the horizontal and vertical directions of the diffraction grating to the grating substrate in the ray direction of the recording light. It is possible to record a grid pattern by substantially changing

(平面回折格子基板を用いた場合) 第5図は本発明のさらに他の実施例の回折格子の格子
パターン記録時の配置を示す図である。24は平面回折格
子基板,20,22は記録光源点,21は曲率半径1.0000の球面
鏡,23は水平方向の曲率半径1.0000垂直方向の曲率半径
0.9388のトロイダル鏡である。この場合の具体的な記録
条件はレーザ波長441.6nmのレーザ光を用いる場合, pC=1.9724,qC=0.9767,τ=5.121゜ pD=2.0799,qD=0.9879,τ=4.956゜ γ=33.438゜ δ=1.210゜ である。図中 はそれぞれレーザ光源点20,22の凹面鏡21,23による水
平,垂直方向の焦点であり,これよりアスティグマティ
ック光による記録,すなわち記録光の光線方向上で回折
格子の水平,垂直方向の光源点から格子基板までの距離
を実質的に変えて格子パターンの記録ができることにな
る。
(When a Planar Diffraction Grating Substrate is Used) FIG. 5 is a diagram showing an arrangement of a diffraction grating of still another embodiment of the present invention when recording a grating pattern. 24 is a plane diffraction grating substrate, 20 and 22 are recording light source points, 21 is a spherical mirror with a radius of curvature of 1.0000, 23 is a horizontal radius of curvature 1.0000, a vertical radius of curvature.
It is a 0.9388 toroidal mirror. The specific recording conditions in this case are: p C = 1.9724, q C = 0.9767, τ C = 5.121 ° p D = 2.0799, q D = 0.9879, τ D = 4.956 ° when using laser light with a laser wavelength of 441.6 nm γ = 33.438 ° δ = 1.210 °. In the figure Are the focal points in the horizontal and vertical directions by the concave mirrors 21 and 23 of the laser light source points 20 and 22, respectively. From this, recording by stigmatic light, that is, the light source points in the horizontal and vertical directions of the diffraction grating in the beam direction of the recording light The lattice pattern can be recorded by substantially changing the distance from the substrate to the lattice substrate.

第6図は上記実施例の回折格子を用いる分光系の一例
を示す図で,16が入口スリット,17が凹面鏡,18が本発明
による回折格子,19が出口スリットである。回折格子18
は,波長域300〜900nmにおいて,水平(分散)方向焦点
とのずれが最小になる位置に設置する。分光系の配置は
図において,凹面鏡17を曲率半径1.000の球面鏡,回折
格子18を格子定数1/1200mm使用次数−1次の回折格子と
した場合, r=0.7755,D=0.6204,r′=0.7064 θ=10゜,2K=20゜ である。
FIG. 6 is a view showing an example of a spectroscopic system using the diffraction grating of the above embodiment, in which 16 is an entrance slit, 17 is a concave mirror, 18 is a diffraction grating according to the present invention, and 19 is an exit slit. Diffraction grating 18
Is installed at the position where the deviation from the horizontal (dispersion) direction focus is minimized in the wavelength range of 300 to 900 nm. When the concave mirror 17 is a spherical mirror having a radius of curvature of 1.000 and the diffraction grating 18 is a grating constant of 1/1200 mm and the order of use is minus the first order in the figure, r = 0.7755, D = 0.6204, r '= 0.7064 θ = 10 °, 2K = 20 °.

上記実施例では,二つの記録光とアスティグマティッ
ク光を使用しているが,設計上は二つの記録光のうち,
少なくとも一方についてだけアスティグマティック光,
すなわち光源点から格子基板までの距離を変えておけば
充分なことが多い。
In the above embodiment, two recording lights and an astigmatic light are used, but of the two recording lights in terms of design,
Astigmatic light for at least one,
That is, it is often sufficient to change the distance from the light source point to the grid substrate.

(ト) 効果 本発明による回折格子は,従来のホログラフィック回
折格子に比し,記録光にアスティグマティック光を用
い,記録光線方向上で回折格子の水平,垂直方向の光源
点から格子基板までの距離を実質的に変えて格子パター
ンを形成したので,分光器(回折格子)が発生する収差
の補正が従来のホログラフィック回折格子に比し一層良
好になった。特に非点収差の補正に対して著しい効果が
ある。第7図はこの効果を示す図で,凹面回折格子の水
平方向の曲率半径を200mmとし,第3図に示した乾板面
3でのいくつかの波長を持つ単色光を入口スリット1の
中心から入射させた場合の収差による広がりを示したも
のである。
(G) Effect The diffraction grating according to the present invention uses astigmatic light as the recording light as compared with the conventional holographic diffraction grating, and from the light source points in the horizontal and vertical directions of the diffraction grating in the recording beam direction to the grating substrate. Since the grating pattern is formed by substantially changing the distance of, the correction of the aberration generated by the spectroscope (diffraction grating) becomes better than that of the conventional holographic diffraction grating. In particular, it has a remarkable effect on the correction of astigmatism. FIG. 7 is a diagram showing this effect. The radius of curvature of the concave diffraction grating in the horizontal direction is 200 mm, and monochromatic light having several wavelengths on the dry plate surface 3 shown in FIG. 3 is emitted from the center of the entrance slit 1. It shows the spread due to aberration when incident.

回折格子の面積は40×40mm2とした。(a)図は従来
の回折格子(第2図)を用いた場合,(b)図は第1図
に示した本発明の実施例の回折格子を用いた場合,
(c)図は第4図に示した本発明の他の実施例の回折格
子を用いた場合である。(a)図に比較して,本発明に
よる(b)図および(c)図では垂直方向の収差。すな
わち非点収差が著しく補正されていることが認められ
る。
The area of the diffraction grating was 40 × 40 mm 2 . (A) is a case where the conventional diffraction grating (FIG. 2) is used, (b) is a case where the diffraction grating of the embodiment of the present invention shown in FIG. 1 is used,
FIG. 6C shows the case where the diffraction grating of another embodiment of the present invention shown in FIG. 4 is used. Aberrations in the vertical direction in the figures (b) and (c) according to the present invention as compared with the figure (a). That is, it is recognized that the astigmatism is significantly corrected.

【図面の簡単な説明】[Brief description of drawings]

第1図は,本発明による回折格子の格子パターン記録時
の配置を示す平面図,第2図は,従来の回折格子の格子
パターン記録時の配置を示す平面図,第3図は,本発明
の実施例の回折格子を用いた分光器の平面図,第4図
は,本発明よる他の回折格子の格子パターン記録時の配
置を示す平面図,第5図は,本発明によるさらに他の回
折格子の格子パターン記録時の配置を示す平面図,第6
図は第5図実施例の回折格子を用いた分光器の平面図,
第7図は,本発明による回折格子の性能,効果を示すグ
ラフである。 1,16……入口スリット、2,18……回折格子 3……乾板(検出器)面 4,7,12,24……回折格子基板 5,6,10,11,14,15,20,22……記録光源点 8,23……トロイダル鏡、9,13,21……球面鏡 17……凹面鏡、19……出口スリット
FIG. 1 is a plan view showing the arrangement of a diffraction grating according to the present invention during recording of a grating pattern, FIG. 2 is a plan view showing the arrangement of a conventional diffraction grating during recording of a grating pattern, and FIG. FIG. 4 is a plan view of a spectroscope using the diffraction grating of the embodiment of FIG. 4, FIG. 4 is a plan view showing the arrangement of another diffraction grating according to the present invention when recording a grating pattern, and FIG. FIG. 6 is a plan view showing the arrangement of the diffraction grating when recording the grating pattern.
FIG. 5 is a plan view of a spectroscope using the diffraction grating of FIG.
FIG. 7 is a graph showing the performance and effect of the diffraction grating according to the present invention. 1,16 …… Inlet slit, 2,18 …… Diffraction grating 3 …… Dry plate (detector) surface 4,7,12,24 …… Diffraction grating substrate 5,6,10,11,14,15,20, 22 …… Recording light source point 8,23 …… Toroidal mirror, 9,13,21 …… Spherical mirror 17 …… Concave mirror, 19 …… Exit slit

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】回折格子基板面に二つの干渉し得る光束を
投影して干渉パターンを形成させ,この干渉パターンを
基板面に記録して製作された格子パターンを有する回折
格子において,二つの干渉光束の主光線方向上で,回折
格子の水平,垂直方向の発散光源点から回折格子基板ま
での距離を実質的に変えたことを特徴とする回折格子。
1. A diffraction grating having a grating pattern manufactured by projecting two interfering light beams on a diffraction grating substrate surface to form an interference pattern and recording the interference pattern on the substrate surface. A diffraction grating characterized in that the distance from the divergent light source point in the horizontal and vertical directions of the diffraction grating to the diffraction grating substrate is substantially changed in the direction of the principal ray of the light flux.
JP23215386A 1986-09-29 1986-09-29 Diffraction grating Expired - Lifetime JPH0827403B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23215386A JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23215386A JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Publications (2)

Publication Number Publication Date
JPS6385503A JPS6385503A (en) 1988-04-16
JPH0827403B2 true JPH0827403B2 (en) 1996-03-21

Family

ID=16934825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23215386A Expired - Lifetime JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Country Status (1)

Country Link
JP (1) JPH0827403B2 (en)

Also Published As

Publication number Publication date
JPS6385503A (en) 1988-04-16

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