surface reaction rateとは 意味・読み方・使い方

To provide a substrate processing method which can drastically improve a reaction rate of a substrate surface treatment by a treated solution, and its apparatus.例文帳に追加

処理液による基板表面処理の反応速度を格段に向上させることができる基板処理方法およびその装置を提供する。 - 特許庁

To provide a method for decreasing the stress corrosion cracking sensitiveness of a material of a reaction vessel, by which the stress corrosion cracking sensitiveness can be decreased and the corrosion rate of the whole inside surface of the reaction vessel can be restrained from being accelerated.例文帳に追加

応力腐食割れ感受性を低減するとともに、内部全面の腐食速度上昇を抑制し得る、反応容器材料の応力腐食割れ感受性低減方法を提供する。 - 特許庁

The method for producing the chlorinated vinyl chloride-based resin is characterized by conducting the chlorination reaction by increasing the rate of agitating the aqueous suspension during the reaction in order to increase the frequency of the vinyl chloride-based resin particles in the aqueous suspension coming to the surface of a mercury lamp as the photochlorination reaction field.例文帳に追加

水性懸濁液中の塩化ビニル樹脂粒子が、光塩素化の反応場である水銀ランプ表面への到達頻度を増加させるために、水性懸濁液の攪拌数を反応途中で増加し、塩素化反応を実施するものである。 - 特許庁

To suppress an uneven power-generation distribution caused by an uneven flow-rate distribution of reaction gas flowing on the surface of a membrane-electrode assembly in a fuel cell.例文帳に追加

燃料電池において、膜電極接合体の表面を流れる反応ガスの流量分布に起因した発電分布の不均一を抑制する。 - 特許庁

When the photosensitive resin composition is exposed until the rate of reaction of an ethylenically unsaturated compound contained as a photosensitive component in the surface to be exposed reaches 90%, the rate of reaction of the entire ethylenically unsaturated compound is 10-40%.例文帳に追加

露光表面における感光成分として含まれるエチレン性不飽和化合物の反応率が９０％に到達するまで露光した際に、全エチレン性不飽和化合物の反応率が１０％〜４０％であることを特徴とする感光性樹脂組成物。 - 特許庁

To provide polishing equipment and a polishing method in which variation in chemical reaction rate due to temperature rise on the surface of a metal film through metal based exothermic reaction is suppressed on a polishing surface when planarization polishing of wafer surface having a metallization film is performed by CMP.例文帳に追加

金属配線膜を有するウェーハ表面のＣＭＰ法による平坦化研磨を行うにあたり、メタル系の発熱反応で金属膜表面の温度が上昇し、加工面の化学的反応速度にばらつきが生じることを抑制した研磨装置、及び研磨方法を提供すること。 - 特許庁

To provide a film deposition apparatus, and a film deposition method having the high rate of film deposition on a surface of an object for film deposition by the reaction of sputter particles or evaporation particles.例文帳に追加

スパッタ粒子または蒸発粒子を反応させることによる成膜対象物表面の成膜の成膜速度が速い成膜装置および成膜方法の提供。 - 特許庁

To increase the rate of hydrogen generation by suppressing heterogenization and formation of a magnesium hydroxide film (Mg(OH)_2 film) formed on a surface of a hydrogen storage material by a chemical reaction such as a hydrolysis reaction.例文帳に追加

本発明は、加水分解反応などの化学反応によって水素貯蔵材料の表面に生じる水酸化マグネシウム膜（Ｍｇ（ＯＨ）_２膜）の不均一化及び生成の抑制を図ることにより、水素発生率を向上させる。 - 特許庁