JP2551767B2 - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JP2551767B2 JP2551767B2 JP61260270A JP26027086A JP2551767B2 JP 2551767 B2 JP2551767 B2 JP 2551767B2 JP 61260270 A JP61260270 A JP 61260270A JP 26027086 A JP26027086 A JP 26027086A JP 2551767 B2 JP2551767 B2 JP 2551767B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- heating resistor
- thermal head
- film electrode
- control circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は感熱記録装置に用いられるサーマルヘッドに
関し,特に,その印字部における発熱抵抗体を駆動制御
するための制御用ICを搭載したサーマルヘッドに関する
ものである。The present invention relates to a thermal head used in a thermal recording apparatus, and more particularly to a thermal head equipped with a control IC for driving and controlling a heating resistor in a printing section of the thermal head. It is about.
(従来の技術とその問題点) 絶縁性セラミック基板上にグレーズ層を設け,このグ
レーズ層上に発熱抵抗体層,電極層,保護層を真空蒸着
法やスパッタリング法等の薄膜方式を用いて順次積層し
てなる薄膜型サーマルヘッドは,厚膜型サーマルヘッド
に比べ,印字の高密度化及び熱応答性の点で有利である
ことより近年その主流を占めている。(Prior art and its problems) A glaze layer is provided on an insulating ceramic substrate, and a heating resistor layer, an electrode layer, and a protective layer are sequentially formed on the glaze layer by using a thin film method such as a vacuum deposition method or a sputtering method. Stacked thin-film thermal heads have become the mainstream in recent years because they are more advantageous than thick-film thermal heads in terms of higher printing density and thermal response.
而してかような薄膜型サーマルヘッドにおいては,印
字の高速化に対応すべく,また構成の複雑化を避けるた
めに,印字部における発熱素子の発熱制御のための回
路,即ち,発熱素子への通電を制御するドライバー,通
電すべき発熱素子を選択制御するシフトレジスター,ラ
ッチ回路等を集積化したICチップを搭載したものが知ら
れている。In such a thin film type thermal head, in order to cope with the speeding up of printing and to avoid complication of the configuration, a circuit for controlling heat generation of the heating element in the printing portion, that is, a heating element is provided. It is known that a driver that controls the energization of the device, a shift register that selectively controls the heating element to be energized, and an IC chip that integrates a latch circuit are mounted.
この様な制御用IC搭載型のサーマルヘッドにおいて,
その制御回路部を印字部の作製方法と同様に薄膜方式で
作製すると,薄膜電極のシート抵抗が大きいために十分
な電流容量が得られず,印字濃度にバラツキを生ずると
いう問題がある。更には印字部のみにグレーズ層を設け
た,所謂,メサ状グレーズ層を用いた場合には,制御回
路部においてICチップをワイヤボンディングする際に薄
膜電極表面はセラミック基板と略同程度に粗であるため
ワイヤボンディングの付着強度が十分に得られず,信頼
性の点で期待できないという問題があった。In such a thermal head equipped with a control IC,
If the control circuit part is manufactured by the thin film method similarly to the method of manufacturing the printing part, there is a problem that a sufficient current capacity cannot be obtained due to the large sheet resistance of the thin film electrode and the print density varies. Furthermore, when a so-called mesa-shaped glaze layer is used in which only the printed part is provided, the surface of the thin-film electrode is as rough as the ceramic substrate when the IC chip is wire-bonded in the control circuit part. Therefore, there is a problem in that the adhesive strength of wire bonding cannot be sufficiently obtained, and reliability cannot be expected.
そこで制御回路部のみを印字部とは別の基板上に金ペ
ーストを用いた厚膜方式で作製し,その後,この制御回
路部を薄膜方式で作製した印字部に接続することが考え
られているが,この場合接続のための新たな工程が増す
ことやサーマルヘッドの小型化が困難であるなど別の問
題が生ずることより,最近では,同一絶縁性セラミック
基板上に印字部は薄膜方式で,また,制御回路部は厚膜
方式で作製する一体型のサーマルヘッドが提案されてい
る。Therefore, it is considered that only the control circuit section is manufactured on a substrate different from the printing section by a thick film method using gold paste, and then this control circuit section is connected to the printing section manufactured by the thin film method. However, in this case, another problem such as an increase in new steps for connection and difficulty in downsizing of the thermal head occurs. Therefore, recently, the printing unit is a thin film type on the same insulating ceramic substrate, In addition, an integrated thermal head has been proposed in which the control circuit section is manufactured by a thick film method.
然るにこの一体型のサーマルヘッドは,第3図に示す
通り,絶縁性セラミック基板1上に順次薄膜方式により
積層された発熱抵抗体層2,薄膜電極層3,保護層4のうち
の保護層4の端部が,制御回路部の厚膜電極6上に直接
接続しており,而して該保護層4はセラミックよりな
り,また,厚膜電極6は金を主成分の一つとするもので
あるため即ち,基本的にはセラミックと金との接続とな
るため,両者の結合力はこれよりして非常に弱いものと
なり,従ってこの箇所から保護層4の剥離を招いたり,
印字部と制御回路部との接触不良を惹起するという問題
を有しているものである。However, as shown in FIG. 3, this integrated thermal head has a heating resistor layer 2, a thin film electrode layer 3, and a protective layer 4 of a protective layer 4 which are sequentially laminated on an insulating ceramic substrate 1 by a thin film method. Is connected directly to the thick film electrode 6 of the control circuit portion, and thus the protective layer 4 is made of ceramic, and the thick film electrode 6 has gold as one of its main components. There is a certain reason, that is, basically, the ceramic and the gold are connected to each other, so that the bonding force between the two becomes much weaker than that, so that the protective layer 4 may be peeled from this portion.
It has a problem of causing a contact failure between the printing section and the control circuit section.
(問題点を解決するための手段) 本発明は以上の知見に鑑みなされたもので,制御用IC
搭載型のサーマルヘッドにおける印字部の保護層と制御
回路部の厚膜電極との接着に際し,新たな接着層を設け
ることなく既存の発熱抵抗体層や薄膜電極層を接着層と
して利用することにより従来の諸問題を一掃した信頼性
の高いサーマルヘッドを提供せんとするものである。(Means for Solving Problems) The present invention has been made in view of the above knowledge, and is a control IC.
By using the existing heating resistor layer or thin film electrode layer as an adhesive layer without providing a new adhesive layer when bonding the protective layer of the printed part and the thick film electrode of the control circuit part in the on-board thermal head The purpose of the present invention is to provide a highly reliable thermal head that eliminates the conventional problems.
即ち本発明は,薄膜方式により形成された印字部と,
該印字部における発熱抵抗体を駆動制御するための制御
用ICを実装する厚膜方式により形成された制御回路部と
が同一絶縁性基板上に構成されたサーマルヘッドにおい
て,該制御回路部の金を主成分の一つとする厚膜電極と
該印字部における保護層との間に印字部の発熱抵抗体層
及び/又は薄膜電極層を介在せしめたことを特徴とする
サーマルヘッドを要旨とするものである。That is, the present invention is a printing unit formed by a thin film method,
In a thermal head in which a control circuit unit formed by a thick film method for mounting a control IC for driving and controlling a heating resistor in the printing unit is formed on the same insulating substrate, A thermal head characterized in that a heating resistor layer and / or a thin film electrode layer of a printing portion are interposed between a thick film electrode containing one of the main components and a protective layer in the printing portion. Is.
(実施例) 以下,本発明を実施例に基づき詳述する。(Example) Hereinafter, the present invention will be described in detail based on examples.
第1図は本発明によるサーマルヘッドの一例を示す要
部断面図で,参照符号1はアルミナセラミック等の絶縁
性基板,1aは該絶縁性基板1上に形成されたメサ状のガ
ラスグレーズ層,2はチタン,クロム,タンタル等の高融
点金属シリサイドやこれらの窒化物,炭化物,酸化物,
また窒化タンタル,ニクロム等からなる発熱抵抗体層,3
はアルミニウム,アルミニウム合金,金等からなる薄膜
電極層,そして4はシリコンの酸化物,窒化物,炭化
物,酸化タンタル等からなる保護層であり,これらによ
って印字部Aが構成されており,更にこの絶縁性基板1
上には制御回路部Bが形成されている。この制御回路B
は制御用IC5を実装すると共に厚膜電極6を有してお
り,制御用IC5は絶縁性基板1上にダイボンディングに
て接着され,また厚膜電極6に対してワイヤボンディン
グにて接続されている。FIG. 1 is a sectional view of an essential part showing an example of a thermal head according to the present invention. Reference numeral 1 is an insulating substrate such as alumina ceramic, 1a is a mesa-shaped glass glaze layer formed on the insulating substrate 1, 2 is a refractory metal silicide such as titanium, chromium or tantalum, or their nitrides, carbides, oxides,
In addition, a heating resistor layer made of tantalum nitride, nichrome, etc., 3
Is a thin-film electrode layer made of aluminum, aluminum alloy, gold, etc., and 4 is a protective layer made of silicon oxide, nitride, carbide, tantalum oxide, etc., which constitutes the printing portion A. Insulating substrate 1
A control circuit portion B is formed on the top. This control circuit B
Has a thick film electrode 6 mounted on it, and the control IC 5 is bonded to the insulating substrate 1 by die bonding and connected to the thick film electrode 6 by wire bonding. There is.
而して本発明の特徴点である印字部Aと制御回路部B
との接続部Cについて述べれば,前記厚膜電極6の一端
6aは前記印字部Aにおける発熱抵抗体層2のみに直に接
続しており,保護層4とは接していないものである。即
ち換言すれば,厚膜電極6と保護層4との間には発熱抵
抗体層2が介在している為,保護層4と発熱抵抗体層2
との付着強度は十分であり,また発熱抵抗体層2と厚膜
電極6との付着強度も十分であることより,該接続部C
を起点としての保護層4の剥離や,印字部Aと制御回路
部Bとの接触不良が生じることは無く,従って所期の目
的が達成し得るわけである。Thus, the printing section A and the control circuit section B, which are the features of the present invention,
As for the connecting portion C, the one end of the thick film electrode 6
6a is directly connected to only the heating resistor layer 2 in the printing portion A and is not in contact with the protective layer 4. In other words, in other words, since the heating resistor layer 2 is interposed between the thick film electrode 6 and the protective layer 4, the protective layer 4 and the heating resistor layer 2 are
Since the adhesion strength between the heating resistor layer 2 and the thick film electrode 6 is sufficient,
The peeling of the protective layer 4 from the starting point and the contact failure between the printing portion A and the control circuit portion B do not occur, and therefore the intended purpose can be achieved.
本実施例に於いては,保護層4と厚膜電極6との間に
発熱抵抗体層2を介在せしめ,これをもって保護層4の
付着不良を防止しているが,発熱抵抗体層2に代わり,
薄膜電極層3を延設して両者間にこれを介在せしめても
よく,また発熱抵抗体層2及び薄膜電極層3の二層を共
に保護層4と厚膜電極6間に介在せしめてもよいもので
あるが,特に好ましいのは,高融点金属シリサイドもし
くはこれらの窒化物,炭化物,酸化物よりなる発熱抵抗
体層を介在させることである。何故ならば,高融点金属
シリサイド系の発熱抵抗体は,その薄膜方式による形成
過程において,或はその形成後に,真空中もしくは非酸
化ガス雰囲気中にて400℃以上に加熱することによりそ
の膜(発熱抵抗体層)を結晶化させ抵抗値を安定させる
必要があり,この加熱時に高融点金属シリサイド中のシ
リコンと厚膜電極中の金とが共晶を形成する(シリコン
と金との共晶点は370℃)結果,より強固な付着強度が
得られるためである。In the present embodiment, the heating resistor layer 2 is interposed between the protective layer 4 and the thick film electrode 6 to prevent the adhesion failure of the protective layer 4. Instead,
The thin film electrode layer 3 may be provided so as to be interposed therebetween, or the two layers of the heating resistor layer 2 and the thin film electrode layer 3 may both be interposed between the protective layer 4 and the thick film electrode 6. Although it is good, it is particularly preferable to interpose a heating resistor layer made of a refractory metal silicide or a nitride, carbide, or oxide thereof. The reason for this is that the refractory metal silicide-based heating resistor is heated to 400 ° C. or higher in a vacuum or in a non-oxidizing gas atmosphere during or after its formation by the thin film method. It is necessary to crystallize the heating resistor layer) to stabilize the resistance value, and during this heating, silicon in the refractory metal silicide and gold in the thick film electrode form a eutectic (eutectic of silicon and gold). This is because a stronger bond strength can be obtained as a result.
次に本発明によるサーマルヘッドの製造方法を上記実
施例に基づき説明する。Next, a method of manufacturing a thermal head according to the present invention will be described based on the above embodiment.
先ず,絶縁性基板1上にガラスペースト及び金ペース
トをスクリーン印刷して空気中で焼成し,メサ状グレー
ズ層1a及び厚膜電極6を形成する。次に第2図に示す如
く金属マスク7によって制御回路部Bにおける厚膜電極
6の印字部Aとの接続部を残してマスクしておき,上述
した発熱抵抗体層2を200〜2000Å程度スパッタリング
法や真空蒸着法等の薄膜方式にて形成する。この際,そ
の形成時もしくは形成後に真空槽内にて400℃以上に加
熱する必要が有る。次に金属マスク7′を用いてアルミ
ニウム合金等の薄膜電極層3を薄膜方式にて作製する。
尚,この場合,他の方法として発熱抵抗体層2形成の場
合と同様の金属マスク7を用いて薄膜電極層3を作製
し,この後不要部を各種エッチングにより除去して発熱
抵抗体層2を一部露出させても構わない。次いで,接続
部Cにおいて厚膜電極6パターンと同一ピッチになる様
レジスタパターンを薄膜電極層3上に形成し,この薄膜
電極層3及び発熱抵抗体層2の不要部分をエッチング除
去する。ここで発熱抵抗体層2のエッチングに際しては
サイドエッチを考慮してドライエッチングを利用するの
が好ましい。次に,金属マスク7″を用いて例えばSiNx
(5≦x≦40)よりなる保護層4を反応性スパッタリン
グ法により形成し,最後に制御用IC5をダイボンディン
グにより絶縁性基板1上に固定し,更にワイヤボンディ
ングにて厚膜電極6へ接続し,そして制御用IC5を保護
するためシリコン系樹脂8でこれを被覆して完成する。First, a glass paste and a gold paste are screen-printed on the insulating substrate 1 and baked in air to form the mesa-shaped glaze layer 1a and the thick film electrode 6. Next, as shown in FIG. 2, a metal mask 7 is used to mask the connection portion of the thick film electrode 6 in the control circuit portion B with the printing portion A, and the above-mentioned heating resistor layer 2 is sputtered by about 200 to 2000Å. And a thin film method such as a vacuum deposition method. At this time, it is necessary to heat to 400 ° C or higher in the vacuum chamber during or after the formation. Next, the thin film electrode layer 3 made of aluminum alloy or the like is formed by the thin film method using the metal mask 7 '.
In this case, as another method, the thin-film electrode layer 3 is manufactured by using the same metal mask 7 as in the case of forming the heating resistor layer 2, and thereafter unnecessary portions are removed by various etchings to remove the heating resistor layer 2. May be partially exposed. Next, a register pattern is formed on the thin-film electrode layer 3 so that the connection portion C has the same pitch as the thick-film electrode 6 pattern, and unnecessary portions of the thin-film electrode layer 3 and the heating resistor layer 2 are removed by etching. Here, when etching the heating resistor layer 2, it is preferable to use dry etching in consideration of side etching. Next, using a metal mask 7 ″, for example, SiNx
A protective layer 4 composed of (5 ≦ x ≦ 40) is formed by a reactive sputtering method, and finally a control IC 5 is fixed on the insulating substrate 1 by die bonding, and further connected to a thick film electrode 6 by wire bonding. Then, in order to protect the control IC 5, it is completed by coating it with a silicon-based resin 8.
(発明の効果) この様に本発明は,薄膜方式により形成された印字部
と,該印字部における発熱抵抗体を駆動制御するための
制御用ICを実装する厚膜方式により形成された制御回路
部とが同一絶縁性基板上に構成されたサーマルヘッドに
おいて,該制御回路部の金を主成分の一つとする厚膜電
極と該印字部における保護層との間に印字部の発熱抵抗
体層及び/又は薄膜電極層を介在せしめたので,制御用
ICを搭載したサーマルヘッドとしての長所を発揮し得る
のは勿論の事,印字部における保護層の剥離の心配や印
字部と制御回路部との接触不良が生じることを極力低減
でき極めて信頼性の高いサーマルヘッドが提供し得るも
のである。(Effects of the Invention) As described above, the present invention is a control circuit formed by a thick film system in which a printing unit formed by a thin film system and a control IC for driving and controlling a heating resistor in the printing unit are mounted. In a thermal head in which a portion is formed on the same insulative substrate, a heating resistor layer of a printing portion is provided between a thick film electrode of the control circuit portion containing gold as one of the main components and a protective layer of the printing portion. And / or because a thin film electrode layer is interposed, for control
Not only can the advantages of a thermal head with an IC be exhibited, but it is also possible to reduce the risk of peeling of the protective layer in the printed area and contact failure between the printed area and the control circuit as much as possible. This is what a high thermal head can provide.
第1図は本発明によるサーマルヘッドの一例を示す要部
断面図,第2図は第1図記載のサーマルヘッドの製造過
程を示す要部断面図,第3図はサーマルヘッドの従来例
を示す要部断面図である。 1……絶縁性基板,1a……グレーズ層,2……発熱抵抗体
層,3……薄膜電極層,4……保護層,5……制御用IC,6……
厚膜電極,A……印字部,B……制御回路部,C……接続部FIG. 1 is a sectional view of an essential part showing an example of a thermal head according to the present invention, FIG. 2 is a sectional view of an essential part showing a manufacturing process of the thermal head shown in FIG. 1, and FIG. 3 shows a conventional example of a thermal head. FIG. 1 ... Insulating substrate, 1a ... Glaze layer, 2 ... Heating resistor layer, 3 ... Thin film electrode layer, 4 ... Protective layer, 5 ... Control IC, 6 ...
Thick film electrode, A …… printing part, B …… control circuit part, C …… connecting part
Claims (2)
字部における発熱抵抗体を駆動制御するための制御用IC
を実装する厚膜方式により形成された制御回路部とが同
一絶縁性基板上に構成されたサーマルヘッドにおいて、
該制御回路部の金を主成分の一つとする厚膜電極と該印
字部における保護層との間に、両者が直に接触すること
の無いように、印字部の発熱抵抗体層及び/又は薄膜電
極層を介在せしめたことを特徴とするサーマルヘッド。1. A printing section formed by a thin film method, and a control IC for driving and controlling a heating resistor in the printing section.
In the thermal head in which the control circuit section formed by the thick film method for mounting is configured on the same insulating substrate,
Between the thick film electrode containing gold as one of the main components of the control circuit section and the protective layer of the printing section, the heating resistor layer and / or the heating resistor layer of the printing section are provided so that the two do not come into direct contact with each other. A thermal head having a thin film electrode layer interposed.
もしくはこれらの窒化物、炭化物、酸化物よりなるもの
であることを特徴とする特許請求の範囲第1項記載のサ
ーマルヘッド。2. The thermal head according to claim 1, wherein the heating resistor layer is made of a refractory metal silicide or a nitride, carbide or oxide thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61260270A JP2551767B2 (en) | 1986-10-31 | 1986-10-31 | Thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61260270A JP2551767B2 (en) | 1986-10-31 | 1986-10-31 | Thermal head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63114669A JPS63114669A (en) | 1988-05-19 |
| JP2551767B2 true JP2551767B2 (en) | 1996-11-06 |
Family
ID=17345723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61260270A Expired - Lifetime JP2551767B2 (en) | 1986-10-31 | 1986-10-31 | Thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2551767B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021206169A1 (en) * | 2020-04-10 | 2021-10-14 | ローム株式会社 | Thermal print head and manufacturing method therefor and thermal printer |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5876286A (en) * | 1981-10-31 | 1983-05-09 | Mitsubishi Electric Corp | Thermal head |
| JPS60112461A (en) * | 1983-11-25 | 1985-06-18 | Fujitsu Ltd | Thermal head and manufacture thereof |
-
1986
- 1986-10-31 JP JP61260270A patent/JP2551767B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63114669A (en) | 1988-05-19 |
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