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JP2557515B2 - Steam dryer - Google Patents
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JP2557515B2 - Steam dryer - Google Patents

Steam dryer

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Publication number
JP2557515B2
JP2557515B2 JP1003742A JP374289A JP2557515B2 JP 2557515 B2 JP2557515 B2 JP 2557515B2 JP 1003742 A JP1003742 A JP 1003742A JP 374289 A JP374289 A JP 374289A JP 2557515 B2 JP2557515 B2 JP 2557515B2
Authority
JP
Japan
Prior art keywords
steam
sample
drying
heated
dried
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1003742A
Other languages
Japanese (ja)
Other versions
JPH02185031A (en
Inventor
光義 大竹
正博 渡辺
恵 浜野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1003742A priority Critical patent/JP2557515B2/en
Publication of JPH02185031A publication Critical patent/JPH02185031A/en
Application granted granted Critical
Publication of JP2557515B2 publication Critical patent/JP2557515B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、水蒸気乾燥装置に係り、特に半導体ウエ
ハ、磁気ディスク基板、ガラス基板等の洗浄後の乾燥に
好適な水蒸気乾燥装置に関する。
The present invention relates to a steam dryer, and more particularly to a steam dryer suitable for drying semiconductor wafers, magnetic disk substrates, glass substrates and the like after cleaning.

〔従来の技術〕[Conventional technology]

従来のこの種の水蒸気乾燥装置については、例えば、
特開昭60−231329号に記載のように、水素と酸素とを混
合し燃焼させて発生させた水蒸気を試料の載置された乾
燥容器内に送給して乾燥する装置が、また水蒸気による
乾燥ではないがその他関連するものとして乾燥窒素ガス
を用いて乾燥させるものとして特開昭57−42121号に記
載のように、水洗された試料をバスケットごと加熱され
たチャンバー内に載置し、先ず超音波振動により発生さ
せた純水からの水蒸気をこのチャンバー内に送給し、し
ばらく水蒸気洗浄した後、雰囲気を窒素ガスのごとき乾
燥ガスに切り替えて乾燥する装置等が知られている。
For this type of conventional steam dryer, for example,
As described in JP-A-60-231329, a device for feeding and drying water vapor generated by mixing and burning hydrogen and oxygen into a drying container on which a sample is placed, As described in JP-A-57-42121 as a non-drying but related to drying by using dry nitrogen gas, the washed sample is placed in a heated chamber together with a basket, and first, There is known a device in which water vapor generated from pure water generated by ultrasonic vibration is fed into this chamber, washed with water vapor for a while, and then the atmosphere is changed to a dry gas such as nitrogen gas for drying.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

しかしながら、上記従来の技術に紹介した前者の水素
ガスを燃焼させて水蒸気を発生させる方式の装置では、
残留酸素ガスが試料上で水蒸気と反応して例えばウエハ
表面にシミを発生させる要因となり、また水素ガスを燃
焼させて水蒸気を発生させるものであるため取扱が複雑
となり、安全管理上の問題もある。また、後者の窒素ガ
スで乾燥させる方式では、水蒸気に比較して窒素ガスの
熱容量が数分の一と小さいため乾燥スピードが遅いとい
う問題があった。
However, in the former type of device that burns hydrogen gas to generate water vapor, which is introduced in the above conventional technique,
The residual oxygen gas reacts with the water vapor on the sample and causes, for example, a stain on the wafer surface, and since hydrogen gas is burned to generate water vapor, handling becomes complicated and there is a safety management problem. . Further, in the latter method of drying with nitrogen gas, there is a problem that the drying speed is slow because the heat capacity of nitrogen gas is as small as a fraction of that of water vapor.

本発明の目的は、上記問題を解決することに有り、安
全かつ高速で、シミが発生し難い低コストな改良された
水蒸気乾燥装置を提供することにある。
It is an object of the present invention to solve the above problems, and to provide an improved steam drying apparatus which is safe and high-speed, is less likely to cause spots, and is low in cost.

〔課題を解決するための手段〕[Means for solving the problem]

上記目的は、水蒸気発生器と、この水蒸気発生器に連
結されたキャリアガス供給部と、このキャリアガスによ
り搬送された水蒸気をフィルタを介して送給される水蒸
気加熱器とを有して成る加熱乾燥された水蒸気供給部
と;試料予熱部と、加熱手段の設けられた水蒸気吹き付
け部と、加熱手段の設けられた乾燥室とが順次隣接して
設けられ、しかも試料を順次移動させる搬送移動機構と
を有して成る試料乾燥部と;前記水蒸気供給部からの加
熱乾燥された水蒸気を前記水蒸気吹き付け部に接続供給
する手段とを有して成り;これにより予熱された試料
が、前記水蒸気吹き付け部を移動する間にキャリアガス
により搬送された加熱乾燥水蒸気に吹き付けられ熱せら
れて水分を蒸発させ、さらに乾燥室にて乾燥される構成
を有して成る水蒸気乾燥装置により、達成される。
The above-mentioned object includes a steam generator, a carrier gas supply unit connected to the steam generator, and a steam heater for sending steam carried by the carrier gas through a filter. A dried water vapor supply unit; a sample preheating unit, a water vapor spraying unit provided with a heating unit, and a drying chamber provided with a heating unit are sequentially provided adjacent to each other, and a transport moving mechanism for sequentially moving the sample And a means for connecting and supplying heated and dried steam from the steam supply section to the steam spraying section; whereby a preheated sample is sprayed with the steam. Steam drying, which has a structure in which it is sprayed on heated dry steam carried by a carrier gas while it is being moved to heat it to evaporate water and then dried in a drying chamber. The location, is achieved.

〔作用〕[Action]

水蒸気発生器は試料乾燥に用いる水蒸気を発生し、キ
ャリアガス供給部から供給される窒素等の不活性ガスに
より水蒸気加熱器に向かって運ばれ、その途中でフィル
ターにより水蒸気中の微小粒子、ミストが除去され、更
に水蒸気加熱器で、100℃以上、好ましくは150〜300℃
程度に加熱されてから、試料乾燥部の水蒸気吹き付け部
に供給される。一方、ウエハやディスク基板等の試料
は、例えば温浴からなる試料予熱部で温められた後、水
蒸気吹き付け部に移動しここでキャリアガスにより搬送
された加熱乾燥水蒸気に吹き付けられる。試料に吹き付
けられた水蒸気は、試料及びその表面に付着する水滴に
連続的に熱を与えることにより試料表面の水分を蒸発さ
せ酸素と反応してシミを発生するのを妨げる。水蒸気吹
き付け部における加熱手段は、吹き付けられた水蒸気が
凝集しないように加熱するものである。また、試料の移
動は、搬送移動機構により行なわれるが、試料全面にく
まなく蒸気が吹き付けられ試料は乾燥される。更に乾燥
室内で蒸気が凝集ミストとなって試料に付着するのを防
止するため、加熱ヒータ等の加熱手段により乾燥室内の
蒸気は100℃以上に保たれ、ミストの付着によるシミの
発生を防ぎつつ乾燥される。なお、水蒸気発生器と水蒸
気加熱器との間に設けるフィルターは、水蒸気中の微小
粒子やミスト等を除去するためのものであり、例えばグ
ラスファイバーや合成繊維等を充填したものから構成さ
れる。
The water vapor generator generates water vapor used for drying the sample and is carried toward the water vapor heater by an inert gas such as nitrogen supplied from the carrier gas supply unit. Removed and steam steam heater, more than 100 ℃, preferably 150 ~ 300 ℃
After being heated to a certain degree, it is supplied to the steam spraying section of the sample drying section. On the other hand, a sample such as a wafer or a disk substrate is warmed in a sample preheating section consisting of a hot bath, for example, and then moved to a steam spraying section where it is sprayed on the heated dry steam carried by a carrier gas. The water vapor sprayed on the sample continuously heats the water droplets attached to the sample and its surface to evaporate the water on the sample surface and react with oxygen to prevent generation of stains. The heating means in the steam spraying section heats the sprayed steam so that it does not aggregate. Further, although the sample is moved by the transfer moving mechanism, the sample is dried by spraying the steam all over the sample. Furthermore, in order to prevent the vapor from becoming agglomerated mist in the drying chamber and adhering to the sample, the vapor in the drying chamber is kept at 100 ° C or higher by a heating means such as a heater, while preventing the generation of stains due to the mist attachment. To be dried. The filter provided between the steam generator and the steam heater is for removing fine particles, mist and the like in the steam, and is composed of, for example, glass fibers or synthetic fibers filled therein.

〔実施例〕〔Example〕

以下本発明に係る水蒸気乾燥装置の一実施例を図面を
用いて説明する。第1図は本発明の水蒸気乾燥装置の要
部構成概略図である。
An embodiment of a steam drying device according to the present invention will be described below with reference to the drawings. FIG. 1 is a schematic view of a main configuration of a steam drying apparatus of the present invention.

水蒸気乾燥装置の基本構成は、乾燥処理前に熱容量の
大きい試料(例えばウエハもしくはディスク基板)1を
予熱する温浴槽2、この温浴槽2に50〜90℃のきれいな
熱媒体、例えば純水を供給するための液供給部3、予熱
された試料1を乾燥させるための蒸気ノズル4及び蒸気
の凝集によるミスト発生を防止するためのヒータ5を有
した乾燥室6、蒸気ノズル4に150〜300℃のきれいな水
蒸気を供給するための水蒸気供給部7、試料1をパルス
モータを用いて上下搬送する搬送機構部8から成る。温
浴槽2には熱媒体である液体、例えば純水が満たされて
おり、また液溜りによる汚染を防止するため温浴槽の構
造はオーバーフロー型で純水を下部から供給することが
出来る液供給部3に連通されている。乾燥室6は外気が
中に入らないような密閉構造とし、また蒸気が外に漏れ
ないようにシャツタ10、排気口11を設け、蒸気ノズル4
からの水蒸気を排気する。試料1は搬送機構部8に連結
されたアーム12に取付けられて温浴槽2内の液体9に浸
漬される。一定時間浸漬を行ない、試料1の温度が所定
温度まで上昇した後、試料1はアーム12によってゆっく
り上部へ搬送され、試料1の表面に蒸気ノズル4から水
蒸気が吹き付けられる。その結果、試料1の表面に付着
していた水や熱媒体である液体9は水蒸気と置換し除去
され、試料1は乾燥装置上部まで搬送されて乾燥処理が
終了する。
The basic structure of the steam drying device is a warm bath 2 for preheating a sample (for example, a wafer or a disk substrate) 1 having a large heat capacity before the drying process, and a clean heat medium at 50 to 90 ° C., for example, pure water, is supplied to this warm bath 2. A liquid supply unit 3 for drying, a steam nozzle 4 for drying the preheated sample 1, and a drying chamber 6 having a heater 5 for preventing mist generation due to the agglomeration of steam, and the steam nozzle 4 at 150 to 300 ° C. 2 includes a water vapor supply unit 7 for supplying clean water vapor and a transport mechanism unit 8 for vertically transporting the sample 1 using a pulse motor. The hot tub 2 is filled with a liquid which is a heat medium, for example, pure water, and the structure of the hot tub is an overflow type in order to prevent contamination due to the liquid pool, and a liquid supply unit capable of supplying pure water from the lower portion. It is connected to 3. The drying chamber 6 has a closed structure that prevents outside air from entering inside, and a shirt 10 and an exhaust port 11 are provided to prevent steam from leaking outside, and the steam nozzle 4
Exhaust water vapor from. The sample 1 is attached to an arm 12 connected to the transport mechanism 8 and immersed in the liquid 9 in the warm bath 2. After immersing for a certain period of time and the temperature of the sample 1 rises to a predetermined temperature, the sample 1 is slowly transported to the upper part by the arm 12 and the steam is sprayed from the steam nozzle 4 onto the surface of the sample 1. As a result, water attached to the surface of the sample 1 and the liquid 9 which is the heat medium are replaced with steam and removed, and the sample 1 is conveyed to the upper part of the drying device and the drying process is completed.

第2図は、前記第1図の水蒸気乾燥装置において試料
1を乾燥するために使用する水蒸気供給部7の内部構造
を示す。水蒸気供給部7内の水蒸気発生器13の内部には
異物を除くためのフイルタ14を介して不純物イオン等の
ない液、例えば純水が外部から供給され、その一部は液
の汚染を防ぐためドレン16から定量バルブ17を通って一
定量排出されている。水蒸気発生器13には加熱ヒータ18
が設けられ、一定速度で水蒸気19が発生されている。こ
の水蒸気19は、異物を除くためのフィルタ20を介して供
給される不活性なキャリアガス、例えば窒素ガス等によ
り、ミスト及び水蒸気中の微粒子を除くためのフィルタ
21を通って水蒸気加熱器22に運ばれ、ヒータ23で100℃
以上、好ましくは150〜300℃に加熱され蒸気ノズル4ま
での間に蒸気の凝集を防ぐための保温ヒータ24を有した
蒸気輸送パイプ25で蒸気ノズルに蒸気を輸送する。
FIG. 2 shows the internal structure of the steam supply unit 7 used for drying the sample 1 in the steam drying apparatus of FIG. The inside of the steam generator 13 in the steam supply unit 7 is supplied with a liquid without impurity ions, for example, pure water, from the outside through a filter 14 for removing foreign matters, and part of it is for preventing the liquid from being contaminated. A certain amount is discharged from the drain 16 through the metering valve 17. A heater 18 is attached to the steam generator 13.
Is provided, and the steam 19 is generated at a constant speed. The water vapor 19 is a filter for removing fine particles in the mist and water vapor by an inert carrier gas, for example, nitrogen gas, which is supplied through a filter 20 for removing foreign matters.
It is transported to the steam heater 22 through 21 and heated to 100 ° C by the heater 23.
As described above, the steam is transported to the steam nozzle by the steam transport pipe 25 which is heated to preferably 150 to 300 ° C. and has the heat retention heater 24 for preventing the steam from agglomerating up to the steam nozzle 4.

第3図は、第1図の装置において熱容量の大きい試料
を予熱するために使用する液供給部3の内部構成を示
す。液供給部3は熱交換器26と液加熱槽27から成り、液
の供給系は液溜りによる汚染、例えばバクテリア等の発
生が生じないようにフロー型としてある。フィルタ28を
介してきた純水は熱交換器26により温浴槽2から廃液と
なった温水で加温し、次いで液加熱槽27のヒータ29で50
〜90℃までに加熱後、乾燥装置に供給する。液加熱槽27
では気泡30が発生し、温浴槽2で飛沫となりシミの生じ
る原因となるため、温浴槽2に供給する前に脱泡器31を
入れ、気泡のない温水を供給する。脱泡器31は上部が大
気開放状態とし、温水が温浴槽2に流れ込む程度に脱泡
器31の液面の水位を温浴槽2の水面より高く設置する。
FIG. 3 shows the internal structure of the liquid supply unit 3 used for preheating a sample having a large heat capacity in the apparatus of FIG. The liquid supply unit 3 is composed of a heat exchanger 26 and a liquid heating tank 27, and the liquid supply system is of a flow type so as to prevent contamination by the liquid pool, for example, generation of bacteria and the like. The pure water that has passed through the filter 28 is heated by the waste water from the warm bath 2 by the heat exchanger 26, and then heated by the heater 29 of the liquid heating tank 27.
After heating to ~ 90 ° C, supply to a drying device. Liquid heating tank 27
In this case, bubbles 30 are generated, which causes splashes in the hot tub 2 to cause spots. Therefore, before supplying to the hot tub 2, the deaerator 31 is inserted to supply hot water without bubbles. The upper portion of the defoamer 31 is open to the atmosphere, and the water level of the liquid level of the defoamer 31 is set higher than the water level of the hot tub 2 so that hot water flows into the hot tub 2.

上記実施例において試料予熱部を構成する温浴槽2の
熱媒体となる液体は、水、アルコール類、ハロゲン系有
機溶媒などの使用が可能であり、加熱によりその液体の
粘度が低下する液体が好ましい。特にコスト、安全性、
環境衛生面などを考慮すると水の使用が望ましい。また
試料1を乾燥する蒸気としては、水蒸気が好ましいが、
その他場合によってはアルコール類、ハロゲン系有機溶
媒などの蒸気によって置換することもでき、蒸気でなく
加温された窒素ガスなどの不活性ガスでも可能である。
しかし、上述のようにコスト、安全性、環境衛生面など
を考慮すると水蒸気にキャリアガスとして窒素ガスの混
合ガスが好ましい。また、熱媒体で使用する液体と蒸気
の成分は同一のものを使用することが好ましい。キャリ
アガスとして空気を用いることは、空気中の酸素と水と
試料とが反応してシミを生成するため好ましくない。
As the liquid serving as the heat medium of the hot tub 2 that constitutes the sample preheating unit in the above-described examples, water, alcohols, halogenated organic solvents, and the like can be used, and a liquid whose viscosity decreases by heating is preferable. . Especially cost, safety,
Considering environmental hygiene, it is desirable to use water. As the vapor for drying the sample 1, steam is preferable,
In other cases, it may be replaced by a vapor of alcohols, halogenated organic solvents, etc., and an inert gas such as heated nitrogen gas may be used instead of the vapor.
However, as described above, in consideration of cost, safety, environmental hygiene, etc., a mixed gas of water vapor and nitrogen gas as a carrier gas is preferable. Further, it is preferable to use the same liquid and vapor components as the heat medium. It is not preferable to use air as the carrier gas because oxygen in the air reacts with water and the sample to generate spots.

この第1図の構成の装置で、水を熱媒体及び蒸気、キ
ャリアガスを窒素ガスとして使用し、温浴槽の温度85
℃、乾燥室の温度250℃とした場合、試料として直径約1
3cmの磁気ディスク基板を例にとれば、乾燥時間の短い
遠心乾燥でも乾燥に30秒以上要するところを、本発明の
装置では15秒以下で乾燥でき、しかもシミの発生が全く
見られなかった。また、水蒸気使用のため、同じ体積の
窒素ガスを200〜300℃に加熱する場合に比べ、コストも
1/10以下となった。更にアルコール等の可燃性蒸気を用
いないので安全な乾燥が行える。
In the device having the configuration shown in FIG. 1, water is used as a heat medium and steam, and carrier gas is used as nitrogen gas.
When the temperature in the drying chamber is 250 ° C, the diameter of the sample is approximately 1
Taking a 3 cm magnetic disk substrate as an example, the apparatus of the present invention was able to dry in 15 seconds or less, even though centrifugal drying, which has a short drying time, required 30 seconds or more to dry, and no stain was observed. In addition, since steam is used, the cost is lower than when heating the same volume of nitrogen gas to 200 to 300 ° C.
It became less than 1/10. Furthermore, since flammable vapor such as alcohol is not used, safe drying can be performed.

〔発明の効果〕〔The invention's effect〕

本発明によれば、安全かつ従来の蒸気乾燥に比べ2倍
以上高速で清浄な乾燥処理ができるため汚染付着などに
起因する試料表面のシミ等の不良の発生を低減できる効
果がある。
According to the present invention, since a safe and clean drying process can be performed at a speed more than twice as fast as the conventional vapor drying, it is possible to reduce the occurrence of defects such as stains on the sample surface due to adhesion of contaminants.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例となる装置全体構成の要部概
略説明図、第2図は水蒸気供給部の構成図、第3図は試
料予熱部の温浴を構成する液供給部の構成図である。 1…試料(ディスク基板),2…温浴槽、3…温水供給
部,4…蒸気ノズル,5…ヒータ,6…乾燥室,7…蒸気供給
部,8…搬送機構部,9…液体(純水),10…シャッタ,11…
排気口,12…アーム,13…水蒸気発生器,14…フィルタ,15
…液体(純水),16…ドレン,17…定流量バルブ,18…加
熱ヒータ,19…蒸気(水蒸気),20、21…フィルタ,22…
水蒸気加熱器,23…ヒータ,24…保温ヒータ,25…蒸気輸
送パイプ,26…熱交換器,27…液加熱槽,28…フィルタ,29
…ヒータ,30…気泡,31…脱泡器
FIG. 1 is a schematic explanatory view of a main part of the overall configuration of an apparatus according to an embodiment of the present invention, FIG. 2 is a configuration diagram of a steam supply unit, and FIG. 3 is a configuration of a liquid supply unit which constitutes a warm bath of a sample preheating unit. It is a figure. 1 ... Sample (disk substrate), 2 ... Hot tub, 3 ... Hot water supply part, 4 ... Steam nozzle, 5 ... Heater, 6 ... Drying room, 7 ... Steam supply part, 8 ... Transport mechanism part, 9 ... Liquid (pure) Water), 10 ... Shutter, 11 ...
Exhaust port, 12 ... Arm, 13 ... Steam generator, 14 ... Filter, 15
… Liquid (pure water), 16… Drain, 17… Constant flow valve, 18… Heater, 19… Steam (steam), 20, 21… Filter, 22…
Steam heater, 23 ... Heater, 24 ... Heat insulation heater, 25 ... Steam transport pipe, 26 ... Heat exchanger, 27 ... Liquid heating tank, 28 ... Filter, 29
… Heater, 30… Bubbles, 31… Defoamer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭62−173720(JP,A) 特開 昭63−4616(JP,A) 特開 昭63−36533(JP,A) 特開 昭63−307742(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP 62-173720 (JP, A) JP 63-4616 (JP, A) JP 63-36533 (JP, A) JP 63- 307742 (JP, A)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】水蒸気発生器と、この水蒸気発生器に連結
されたキャリアガス供給部と、このキャリアガスにより
搬送された水蒸気をフィルタを介して送給される水蒸気
加熱器とを有して成る加熱乾燥された水蒸気供給部と;
試料予熱部と、加熱手段の設けられた水蒸気吹き付け部
と、加熱手段の設けられた乾燥室とが順次隣接して設け
られ、しかも試料を順次移動させる搬送移動機構とを有
して成る試料乾燥部と;前記水蒸気供給部からの加熱乾
燥された水蒸気を前記水蒸気吹き付け部に接続供給する
手段とを有して成り;これにより予熱された試料が、前
記水蒸気吹き付け部を移動する間にキャリアガスにより
搬送された加熱乾燥水蒸気に吹き付けられ熱せられて水
分を蒸発させ、さらに乾燥室にて乾燥される構成を有し
て成る水蒸気乾燥装置。
1. A steam generator, a carrier gas supply unit connected to the steam generator, and a steam heater for supplying the steam carried by the carrier gas through a filter. A heated and dried steam supply unit;
Sample drying comprising a sample preheating unit, a steam spraying unit provided with a heating unit, and a drying chamber provided with a heating unit, which are sequentially adjacent to each other, and further has a transport moving mechanism for sequentially moving the sample. Part and; means for connecting and supplying heated and dried steam from the steam supply part to the steam spraying part; carrier gas during which the preheated sample moves through the steam spraying part. A steam drying apparatus having a structure in which the steam is heated by being heated by the heated and dried steam conveyed by the above method to evaporate moisture, and further dried in a drying chamber.
【請求項2】上記試料乾燥部の試料予熱部を、温水の循
環する温浴で構成し、試料をこの温浴中に浸漬すること
により予熱する構成とした請求項1記載の水蒸気乾燥装
置。
2. The steam drying apparatus according to claim 1, wherein the sample preheating section of the sample drying section is constituted by a warm bath in which warm water is circulated, and the sample is preheated by being immersed in the warm bath.
JP1003742A 1989-01-12 1989-01-12 Steam dryer Expired - Lifetime JP2557515B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1003742A JP2557515B2 (en) 1989-01-12 1989-01-12 Steam dryer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1003742A JP2557515B2 (en) 1989-01-12 1989-01-12 Steam dryer

Publications (2)

Publication Number Publication Date
JPH02185031A JPH02185031A (en) 1990-07-19
JP2557515B2 true JP2557515B2 (en) 1996-11-27

Family

ID=11565661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1003742A Expired - Lifetime JP2557515B2 (en) 1989-01-12 1989-01-12 Steam dryer

Country Status (1)

Country Link
JP (1) JP2557515B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146469A (en) * 1998-02-25 2000-11-14 Gamma Precision Technology Apparatus and method for cleaning semiconductor wafers
JP5138515B2 (en) 2008-09-05 2013-02-06 東京エレクトロン株式会社 Steam generator, steam generating method and substrate processing apparatus
JP5405955B2 (en) * 2009-09-18 2014-02-05 大日本スクリーン製造株式会社 Substrate processing equipment

Also Published As

Publication number Publication date
JPH02185031A (en) 1990-07-19

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