JP3062279B2 - Ceramic electronic component and method of manufacturing the same - Google Patents
Ceramic electronic component and method of manufacturing the sameInfo
- Publication number
- JP3062279B2 JP3062279B2 JP3094320A JP9432091A JP3062279B2 JP 3062279 B2 JP3062279 B2 JP 3062279B2 JP 3094320 A JP3094320 A JP 3094320A JP 9432091 A JP9432091 A JP 9432091A JP 3062279 B2 JP3062279 B2 JP 3062279B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- alloy
- external electrode
- external
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000919 ceramic Substances 0.000 title claims description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 62
- 238000007747 plating Methods 0.000 claims description 40
- 229910052759 nickel Inorganic materials 0.000 claims description 31
- 239000000956 alloy Substances 0.000 claims description 26
- 229910045601 alloy Inorganic materials 0.000 claims description 26
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- 239000002003 electrode paste Substances 0.000 claims description 14
- 239000010953 base metal Substances 0.000 claims description 12
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 238000005245 sintering Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 87
- 239000003985 ceramic capacitor Substances 0.000 description 22
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 14
- 229910052709 silver Inorganic materials 0.000 description 14
- 239000004332 silver Substances 0.000 description 14
- 238000007689 inspection Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 238000010304 firing Methods 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- GSJBKPNSLRKRNR-UHFFFAOYSA-N $l^{2}-stannanylidenetin Chemical compound [Sn].[Sn] GSJBKPNSLRKRNR-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010344 co-firing Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Details Of Resistors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、外部電極に改良を施し
たセラミック電子部品及びその製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic electronic component having improved external electrodes and a method of manufacturing the same.
【0002】[0002]
【従来の技術】外部電極を有するセラミック電子部品と
して、図4に示すような積層セラミックコンデンサがあ
る。2. Description of the Related Art As a ceramic electronic component having external electrodes, there is a multilayer ceramic capacitor as shown in FIG.
【0003】この積層セラミックコンデンサは、内部電
極21aを有する柱状のセラミックチップ21と、セラ
ミックチップ21の両端部に設けられた一対の外部電極
22とから構成されている。内部電極21aはニッケル
から成り、セラミックを介して多層に積層されその端縁
を交互に露出している。また、外部電極22は3層構造
を有しており、チップ側の第1層22aがニッケルで、
第2層22bがニッケルで、第3層22cが半田(錫−
鉛合金)から成る。This multilayer ceramic capacitor includes a columnar ceramic chip 21 having an internal electrode 21a, and a pair of external electrodes 22 provided at both ends of the ceramic chip 21. The internal electrodes 21a are made of nickel, are laminated in multiple layers via ceramics, and have their edges alternately exposed. The external electrode 22 has a three-layer structure, and the first layer 22a on the chip side is made of nickel,
The second layer 22b is nickel, and the third layer 22c is solder (tin-tin).
Lead alloy).
【0004】この積層セラミックコンデンサは、まず、
ニッケルを主成分とする電極ペ−ストを所定パタ−ンで
印刷した未焼成セラミックシ−トを複数枚積層し、これ
を所定の大きさに切断して柱状の未焼成チップを得た
後、該未焼成チップの両端部にニッケルを主成分とする
電極ペ−ストを塗布してこれを焼成して、未焼成セラミ
ックの焼成と各電極ペ−ストの焼付けを行なって内部電
極21aと第1層22aを形成し、そして第1層22a
を形成した後の部品を空気中で300〜900℃の温度
で加熱した後、第1層22aの表面にニッケルをメッキ
して第2層を形成し、該第2層22bの表面に半田をメ
ッキして第3層22cを形成して製造されている。[0004] This multilayer ceramic capacitor firstly
After stacking a plurality of unfired ceramic sheets on which an electrode paste containing nickel as a main component is printed in a predetermined pattern, and cutting this into a predetermined size, a columnar unfired chip is obtained. An electrode paste containing nickel as a main component is applied to both ends of the unfired chip and fired. The unfired ceramic is fired and each electrode paste is fired to form the internal electrode 21a and the first electrode paste. Forming a layer 22a and a first layer 22a
After the components after the formation are heated in air at a temperature of 300 to 900 ° C., nickel is plated on the surface of the first layer 22a to form a second layer, and solder is formed on the surface of the second layer 22b. It is manufactured by plating to form the third layer 22c.
【0005】上記の積層セラミックコンデンサでは、外
部電極22の第1層22aを内部電極21aと同じニッ
ケルから形成することで、内部電極21と外部電極22
との導通性の向上を図り、また外部電極22の第1層2
2aにニッケルメッキ(第2層22b)と半田メッキ
(第3層22c)を施すことで、防錆性と半田濡れ性を
付与している。また、第1層22aを形成した後の熱処
理で、コンデンサの電気的特性、例えば静電容量やta
nδの劣化防止を図っている。In the above-mentioned multilayer ceramic capacitor, the first layer 22a of the external electrode 22 is formed of the same nickel as the internal electrode 21a, so that the internal electrode 21 and the external electrode 22 are formed.
With the first layer 2 of the external electrode 22.
By applying nickel plating (second layer 22b) and solder plating (third layer 22c) to 2a, rust prevention and solder wettability are imparted. In addition, the heat treatment after the formation of the first layer 22a causes the electrical characteristics of the capacitor, for example, the capacitance and ta
The purpose is to prevent the deterioration of nδ.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、上記の
積層セラミックコンデンサでは、半田付け時に外部電極
22に急激に熱が加わると、その第2層22bであるニ
ッケルのメッキ皮膜に内部応力が働いてセラミックチッ
プ22にクラックを発生する欠点がある。このクラック
発生の問題は積層セラミックコンデンサに限らず、外部
電極として同構成を採用するセラミック電子部品に同様
に生じ得る。However, in the above-described multilayer ceramic capacitor, when heat is suddenly applied to the external electrode 22 at the time of soldering, internal stress acts on the nickel plating film as the second layer 22b, so that the ceramic is not applied. The chip 22 has a disadvantage of generating cracks. This problem of crack generation is not limited to a multilayer ceramic capacitor, but can also occur in a ceramic electronic component employing the same configuration as an external electrode.
【0007】また、上記の製造方法では、外部電極22
の第1層22aを形成した後の熱処理で該第1層22a
の表面が酸化されてしまうため、その後に行なうニッケ
ルメッキの付着性が悪化してその密着強度が落ち、外部
電極22の強度が著しく低下する欠点がある。In the above-mentioned manufacturing method, the external electrode 22
The first layer 22a is formed by a heat treatment after the first layer 22a is formed.
Is oxidized, so that the adhesion of nickel plating performed thereafter deteriorates, the adhesion strength decreases, and the strength of the external electrode 22 decreases significantly.
【0008】本発明は上記問題点に鑑みてなされたもの
で、その目的とするところは、半田付け時におけるクラ
ック発生を防止できると共に外部電極の強度を高めるこ
とができるセラミック電子部品とその製造方法を提供す
ることにある。[0008] The present invention has been made in view of the above problems, this increasing the strength of the external electrodes with and has as its object can be prevented cracking during soldering
DOO is to provide a a manufacturing method thereof ceramic electronic component can.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するた
め、請求項1では、卑金属またはその合金から成る内部
電極を内在したセラミックチップと、内部電極と導通す
る一対の外部電極とを具備したセラミック電子部品にお
いて、上記外部電極を、卑金属またはその合金から成
り、未焼成セラミックチップ及び内部電極用の電極ペー
ストと同時焼成されて形成された第1層と、パラジウム
のメッキ膜から成り第1層の表面を覆う第2層と、ニッ
ケルまたはその合金のメッキ膜から成り第2層の表面を
覆う第3層と、錫またはその合金のメッキ膜から成り第
3層の表面を覆う第4層とから構成している。In order to achieve the above object, according to the present invention, there is provided a ceramic comprising a ceramic chip having an internal electrode made of a base metal or an alloy thereof, and a pair of external electrodes electrically connected to the internal electrode. In the electronic component, the external electrode is made of a base metal or an alloy thereof, and is provided with an unfired ceramic chip and an electrode page for an internal electrode.
A first layer formed by co-firing with a strike, and palladium
A second layer covering the surface of the first layer , comprising a plating film of nickel, a third layer covering the surface of the second layer , comprising a plating film of nickel or an alloy thereof , and a third layer comprising a plating film of tin or an alloy thereof , And a fourth layer that covers the surface of the second layer.
【0010】また、上記目的を達成するため、請求項2
では、卑金属またはその合金を主成分とする内部電極用
の電極ペースト部位を内在する未焼成セラミックチップ
に、卑金属またはその合金を主成分とする外部電極第1
層用の電極ペーストを塗布し、これを未焼成セラミック
チップ及び内部電極用の電極ペーストと同時焼成して外
部電極の第1層を形成する工程と、外部電極の第1層形
成後に、外部電極の第1層の表面にパラジウムをメッキ
して外部電極の第2層を形成する工程と、外部電極の第
2層形成後に、外部電極の第2層の表面にニッケルまた
はその合金をメッキして外部電極の第3層を形成する工
程と、外部電極の第3層形成後に、外部電極の第3層の
表面に錫またはその合金をメッキして外部電極の第4層
を形成する工程とからセラミック電子部品を製造してい
る。[0010] In order to achieve the above object, a second aspect is provided.
Then, an unfired ceramic chip having an electrode paste portion for an internal electrode containing a base metal or an alloy thereof as a main component is attached to an external electrode first material containing a base metal or an alloy thereof as a main component .
A step of applying an electrode paste for a layer and simultaneously firing the same with an unfired ceramic chip and an electrode paste for an internal electrode to form a first layer of an external electrode;
After formation , palladium is plated on the surface of the first layer of the external electrode
Forming a second layer of the external electrode, and the outer electrode
After two layers formed, and forming a third layer of the external electrode by plating nickel or an alloy thereof on the surface of the second layer of the external electrodes, after the third layer formation of the external electrodes, the third layer of the external electrode Forming a fourth layer of the external electrode by plating the surface with tin or an alloy thereof to produce a ceramic electronic component.
【0011】請求項1記載のセラミック電子部品では、
ペースト焼成によって形成された卑金属またはその合金
から成る外部電極の第1層の表面に、パラジウムのメッ
キ膜から成る第2層を形成してあるので、卑金属または
その合金とパラジウムとの馴染みが良いこともあって、
外部電極の第1層と第2層の相互間に高い密着度を得る
ことできる。また、パラジウムのメッキ膜から成る第2
層の表面に、第2層金属と馴染みの良いニッケルまたは
その合金のメッキ膜を形成してあるので、パラジウムと
ニッケルまたはその合金との馴染みが良いこともあっ
て、第2層と第3層の相互間に高い密着度を得ることで
きる。 In the ceramic electronic component according to the first aspect,
Base metal or its alloy formed by paste firing
Palladium plating on the surface of the first layer of the external electrode composed of
Since the second layer made of a metal film is formed, the base metal or
Partly familiar with the alloy and palladium,
High adhesion between the first and second layers of the external electrode
I can do it. Also, a second palladium plating film
On the surface of the layer, nickel or nickel which is familiar with the second layer metal
Since a plating film of the alloy is formed, palladium and
Good compatibility with nickel or its alloys
To obtain a high degree of adhesion between the second and third layers.
Wear.
【0012】また、請求項2記載のセラミック電子部品
の製造方法では、請求項1記載のセラミック電子部品を
的確に形成することができる。 According to a second aspect of the present invention, there is provided a method of manufacturing a ceramic electronic component.
It can be formed accurately.
【0013】[0013]
【実施例】図1は本発明に係る積層セラミックコンデン
サを示すもので、該積層セラミックコンデンサは、内部
電極1aを有する柱状のセラミックチップ1と、セラミ
ックチップ1の両端部に設けられた一対の外部電極2と
から構成されている。FIG. 1 shows a multilayer ceramic capacitor according to the present invention. The multilayer ceramic capacitor includes a columnar ceramic chip 1 having an internal electrode 1a and a pair of external ceramic chips provided at both ends of the ceramic chip 1. And an electrode 2.
【0014】内部電極1aは、ニッケル,銅,鉛,亜
鉛,鉄,錫,アルミニウム,コバルト,クロム等の卑金
属から選択される1種またはその合金から成り、セラミ
ックを介して多層(図中は4層)に積層されその端縁を
交互に露出している。The internal electrode 1a is made of one or more of base metals such as nickel, copper, lead, zinc, iron, tin, aluminum, cobalt, and chromium, or an alloy thereof. ) And the edges thereof are alternately exposed.
【0015】外部電極2は4層構造を有しており、チッ
プ側の第1層2aは、内部電極1aと同様の卑金属から
選択される1種またはその合金から成り、内部電極1a
に接続されている。第2層2bは、金,銀,パラジウ
ム,白金,ロジウム等の貴金属から選択される1種また
はその合金から成り、第1層2aを覆っている。第3層
2cは、ニッケルまたはその合金から成り、第2層2b
を覆っている。第4層2dは、錫またはその合金のメッ
キ膜から成り、第3層を覆っている。The external electrode 2 has a four-layer structure, and the first layer 2a on the chip side is made of one kind selected from the same base metals as the internal electrode 1a or an alloy thereof.
It is connected to the. The second layer 2b is made of one or more alloys selected from noble metals such as gold, silver, palladium, platinum, and rhodium, and covers the first layer 2a. The third layer 2c is made of nickel or an alloy thereof, and the second layer 2b
Is covered. The fourth layer 2d is made of a plating film of tin or an alloy thereof, and covers the third layer.
【0016】以下に、上記積層セラミックコンデンサの
好適な具体例をその製造方法と共に説明する。Hereinafter, preferred examples of the above-mentioned multilayer ceramic capacitor will be described together with a method of manufacturing the same.
【0017】まず、非還元性のセラミック組成物から成
る厚さ数十μmの未焼成セラミックシ−トの一面に、ニ
ッケルを主成分とする内部電極用の電極ペ−ストを数μ
mの厚みで所定パタ−ンで印刷する。そして、印刷後の
未焼成セラミックシ−トを、その印刷面側に未印刷の未
焼成セラミックシ−トをおき数十枚積層して相互に圧着
させ、これを積層方向に所定の大きさで切断して柱状の
未焼成チップを得る。この未焼成チップの両端面にはニ
ッケル層が露出している。First, an electrode paste for an internal electrode containing nickel as a main component is coated on a surface of an unfired ceramic sheet having a thickness of several tens of μm made of a non-reducing ceramic composition.
Printing is performed in a predetermined pattern with a thickness of m. After printing, several tens of unprinted unfired ceramic sheets are stacked on the printing surface side of the unprinted unfired ceramic sheets and pressed together, and are pressed together with a predetermined size in the stacking direction. It is cut to obtain columnar unfired chips. The nickel layer is exposed at both end surfaces of the unfired chip.
【0018】次に、この未焼成チップの両端面にその周
面に及んで、ニッケルを主成分とする第1層用の電極ペ
−ストを数μm〜数十μmの厚みをもって浸漬等の方法
によって付着し、この未焼成チップを中性または還元性
雰囲気中で1300℃程度の温度で焼成する。この焼成
によって、未焼成セラミックの焼成と、内部電極1a及
び第1層2a用の各電極ペ−ストの焼付けが行なわれ
る。Next, a method of immersing the electrode paste for the first layer containing nickel as a main component with a thickness of several μm to several tens μm on both end surfaces of the unfired chip over the peripheral surface. The unfired chips are fired at a temperature of about 1300 ° C. in a neutral or reducing atmosphere. By this firing, firing of the unfired ceramic and firing of each electrode paste for the internal electrode 1a and the first layer 2a are performed.
【0019】次に、第1層2aの表面に、第2層2bと
なる銀の皮膜を無電解メッキ等のメッキによって形成す
る。ここで形成されるメッキ皮膜の厚みは0.2μm〜
5μmである。そして、第2層2bを形成した後の部品
を自然雰囲気(空気)中で300〜900℃の温度で加
熱する。Next, a silver film to be the second layer 2b is formed on the surface of the first layer 2a by plating such as electroless plating. The thickness of the plating film formed here is 0.2 μm or more.
5 μm. Then, the component after the formation of the second layer 2b is heated at a temperature of 300 to 900 ° C. in a natural atmosphere (air).
【0020】次に、熱処理後の部品の第2層2bの表面
に、第3層2cとなるニッケルの皮膜をメッキによって
形成し、そして第3層2cの表面に、第4層2dとなる
半田(錫−鉛合金)の皮膜をメッキによって形成する。
両層2c,2dのメッキ皮膜の厚みは0.2μm〜5μ
mである。Next, a nickel film to be the third layer 2c is formed on the surface of the second layer 2b of the heat-treated component by plating, and the solder to be the fourth layer 2d is formed on the surface of the third layer 2c. A film of (tin-lead alloy) is formed by plating.
The thickness of the plating film of both layers 2c and 2d is 0.2 μm to 5 μm.
m.
【0021】以上で、内部電極1a及び外部電極2の第
1層2aがニッケルで、第2層2bが銀で、第3層2c
がニッケルで、第4層2dが半田から成る積層セラミッ
クコンデンサが製造される。第2層2bを形成した後の
熱処理は、コンデンサの電気的特性、例えば静電容量や
tanδの劣化防止を図るためのものである。また、熱
処理の前段階で第1層2aの表面に第2層2bとなる銀
のメッキ皮膜を形成しているので、熱処理時に第1層2
aは勿論、第2層も酸化されることがなく、第3層2c
となるニッケルのメッキ皮膜を該第2層2bの表面に良
好に密着させることができる。As described above, the first layer 2a of the internal electrode 1a and the external electrode 2 is made of nickel, the second layer 2b is made of silver, and the third layer 2c is made of silver.
Is nickel, and the fourth layer 2d is made of solder to manufacture a multilayer ceramic capacitor. The heat treatment after the formation of the second layer 2b is for preventing deterioration of electrical characteristics of the capacitor, for example, capacitance and tan δ. In addition, since the silver plating film to be the second layer 2b is formed on the surface of the first layer 2a before the heat treatment, the first layer 2
a of course, the second layer is not oxidized, and the third layer 2c is not oxidized.
The nickel plating film to be formed can be satisfactorily adhered to the surface of the second layer 2b.
【0022】図2には、従来品と上記の製造方法で得ら
れた積層セラミックコンデンサの半田付け後のクラック
検査結果を示してある。この検査では、発明品として第
2層2bとなる銀のメッキ皮膜と第3層2cとなるニッ
ケルのメッキ皮膜の厚みが夫々0.2μmと2μmと5
μmに形成された計9種類の積層セラミックコンデンサ
を夫々200個宛用意し、従来品として銀のメッキ皮膜
がないものを200個用意した。検査では実際の半田付
けと同じ温度状態を作るため、各積層セラミックコンデ
ンサを2分以上の予備加熱をはさんで260℃程度に加
熱し、該温度を3秒程度維持した後に自然冷却させてか
ら、各積層セラミックコンデンサの断面を光学顕微鏡で
視認しクラックの発生を識別した。FIG. 2 shows the results of crack inspection after soldering of the conventional product and the multilayer ceramic capacitor obtained by the above manufacturing method. In this inspection, the thickness of the silver plating film to be the second layer 2b and the thickness of the nickel plating film to be the third layer 2c were 0.2 μm, 2 μm and 5 μm, respectively.
A total of nine types of multilayer ceramic capacitors each having a thickness of μm were prepared for each of 200 pieces, and 200 pieces each having no silver plating film were prepared as conventional products. In the inspection, in order to make the same temperature state as actual soldering, each multilayer ceramic capacitor was heated to about 260 ° C with preheating of 2 minutes or more, and after maintaining the temperature for about 3 seconds, it was allowed to cool naturally. Then, the cross section of each multilayer ceramic capacitor was visually observed with an optical microscope to identify occurrence of cracks.
【0023】同図から判るように、銀のメッキ皮膜を有
しない従来品ではニッケルのメッキ皮膜が0.2μmと
2μmと5μmの場合で夫々クラックが発生し、該クラ
ックはニッケルのメッキ皮膜が厚くなるほど増加するこ
とが確認された。一方、銀のメッキ皮膜を第2層2bと
して有する発明品では、第3層2cのニッケルのメッキ
皮膜の厚みに関係なくクラックの発生が全く見られなか
った。尚、検査結果を示していないが、外部電極2の第
1層2aが銅から成る積層セラミックコンデンサの場合
も上記の発明品と同様の好結果が得られた。As can be seen from the figure, in the conventional product having no silver plating film, cracks occur when the nickel plating film is 0.2 μm, 2 μm, and 5 μm, respectively. The cracks are thicker in the nickel plating film. It was confirmed that it increased. On the other hand, in the invention product having the silver plating film as the second layer 2b, no crack was generated regardless of the thickness of the nickel plating film of the third layer 2c. Although no test results are shown, good results similar to those of the invention described above were obtained also in the case of a multilayer ceramic capacitor in which the first layer 2a of the external electrode 2 was made of copper.
【0024】また、図3には、従来品と上記の製造方法
で得られた積層セラミックコンデンサの外部電極強度の
検査結果を示してある。この検査では、発明品1として
第2層2bとなる銀のメッキ皮膜の厚みが3μmに形成
された積層セラミックコンデンサを10個、従来品とし
て銀のメッキ皮膜がないものを10個用意した。また、
第1層2aが銅から成る発明品1と同様の積層セラミッ
クコンデンサを発明品2として10個用意した。検査で
は各積層セラミックコンデンサの各外部電極の中央にリ
−ド線を半田付けし、一方のリ−ド線を固定して他方の
リ−ド線を引張ったときに外部電極部分が破壊される強
度をゲ−ジによって測定した。FIG. 3 shows the results of inspection of the strength of the external electrodes of the conventional product and the multilayer ceramic capacitor obtained by the above-described manufacturing method. In this inspection, 10 invention multilayer ceramic capacitors having a silver plating film having a thickness of 3 μm to be the second layer 2b were prepared as invention product 1, and 10 conventional ceramic capacitors having no silver plating film were prepared. Also,
Ten multilayer ceramic capacitors similar to the invention 1 having the first layer 2a made of copper were prepared as the invention 2. In the inspection, a lead wire is soldered to the center of each external electrode of each multilayer ceramic capacitor, and when one lead wire is fixed and the other lead wire is pulled, the external electrode portion is destroyed. The strength was measured by gauge.
【0025】同図から判るように、銀のメッキ皮膜を有
しない従来品では引張り強度の平均値が1.48kgf
であるのに対し、銀のメッキ皮膜を有する発明品1では
引張り強度の平均値が4.51kgfと大幅に向上し
た。また、外部電極2の第1層2aが銅から成る発明品
2でも、引張り強度の平均値が4.90kgfと大幅に
向上した。As can be seen from the figure, in the conventional product having no silver plating film, the average value of the tensile strength is 1.48 kgf.
On the other hand, in the invention product 1 having the silver plating film, the average value of the tensile strength was significantly improved to 4.51 kgf. Also, in the invention product 2 in which the first layer 2a of the external electrode 2 was made of copper, the average value of the tensile strength was significantly improved to 4.90 kgf.
【0026】尚、外部電極の第2層として銀以外の貴金
属またはその合金のメッキ皮膜を採用する場合でも、上
記と同様の効果を得ることができる。The same effect as described above can be obtained even when a plating film of a noble metal other than silver or an alloy thereof is used as the second layer of the external electrode.
【0027】[0027]
【発明の効果】以上詳述したように、請求項1記載のセ
ラミック電子部品によれば、外部電極の第1層と第2層
の相互間、また、第2層と第3層の相互間に高い密着度
を得て、外部電極の強度を格段高めることができ、半田
付け時に外部電極に内部応力が生じた場合でもこの応力
によって外部電極にクラックを発生することを確実に防
止できる。 As described in detail above, according to the ceramic electronic component of the first aspect, the first and second layers of the external electrode are provided.
High degree of adhesion between each other and between the second and third layers
And the strength of the external electrode can be greatly increased.
Even if internal stress occurs in the external electrode during
Cracks on the external electrodes
Can be stopped.
【0028】また、請求項2記載のセラミック電子部品
の製造方法によれば、請求項1記載のセラミック電子部
品を的確に製造でき、製造部品に前記同様の作用効果を
得ることができる。 According to a second aspect of the present invention, there is provided a ceramic electronic component according to the first aspect.
Products can be manufactured accurately, and the same effects
Obtainable.
【図1】本発明に係る積層セラミックコンデンサの断面
図FIG. 1 is a sectional view of a multilayer ceramic capacitor according to the present invention.
【図2】半田付け後のクラック検査結果を示す図FIG. 2 is a diagram showing crack inspection results after soldering.
【図3】外部電極強度の検査結果を示す図FIG. 3 is a diagram showing an inspection result of external electrode strength.
【図4】従来の積層セラミックコンデンサの断面図FIG. 4 is a cross-sectional view of a conventional multilayer ceramic capacitor.
1…セラミックチップ、1a…内部電極、2…外部電
極、2a…第1層、2b…第2層、2c…第3層、2d
…第4層。DESCRIPTION OF SYMBOLS 1 ... Ceramic chip, 1a ... Internal electrode, 2 ... External electrode, 2a ... 1st layer, 2b ... 2nd layer, 2c ... 3rd layer, 2d
... 4th layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 新井 正浩 東京都台東区上野6丁目16番20号 太陽 誘電株式会社内 (56)参考文献 特開 昭59−16323(JP,A) 実開 昭59−44031(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01G 4/00 - 4/42 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Masahiro Arai 6-16-20 Ueno, Taito-ku, Tokyo Taiyo Yuden Co., Ltd. (56) References JP-A-59-16323 (JP, A) Shokai Sho-59 −44031 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) H01G 4/00-4/42
Claims (2)
を内在したセラミックチップと、内部電極と導通する一
対の外部電極とを具備したセラミック電子部品におい
て、 上記外部電極を、 卑金属またはその合金から成り、未焼成セラミックチッ
プ及び内部電極用の電極ペーストと同時焼成されて形成
された第1層と、パラジウムのメッキ膜 から成り第1層の表面を覆う第2
層と、 ニッケルまたはその合金のメッキ膜から成り第2層の表
面を覆う第3層と、 錫またはその合金のメッキ膜から成り第3層の表面を覆
う第4層とから構成した、 ことを特徴とするセラミック電子部品。1. An internal electrode made of a base metal or an alloy thereof.
A ceramic chip that inherent in the ceramic electronic component and a pair of external electrodes which conduct to the internal electrodes, the external electrodes made of a base metal or an alloy thereof, green ceramic chip
Formed by simultaneous baking with electrode paste for pumps and internal electrodes
And a second layer made of a palladium plating film and covering the surface of the first layer.
Table of the second layer comprises a layer of nickel or plated film of the alloy
A third layer covering the surface of tin or a ceramic electronic component that consists plating film of an alloy covering the surface of the third layer was composed of the fourth layer, characterized in that.
部電極用の電極ペースト部位を内在する未焼成セラミッ
クチップに、卑金属またはその合金を主成分とする外部
電極第1層用の電極ペーストを塗布し、これを未焼成セ
ラミックチップ及び内部電極用の電極ペーストと同時焼
成して外部電極の第1層を形成する工程と、外部電極の第1層形成後に、 外部電極の第1層の表面に
パラジウムをメッキして外部電極の第2層を形成する工
程と、外部電極の第2層形成後に、 外部電極の第2層の表面に
ニッケルまたはその合金をメッキして外部電極の第3層
を形成する工程と、外部電極の第3層形成後に、 外部電極の第3層の表面に
錫またはその合金をメッキして外部電極の第4層を形成
する工程とを具備した、 ことを特徴とするセラミック電子部品の製造方法。2. An unfired ceramic chip having an electrode paste portion for an internal electrode containing a base metal or its alloy as a main component, and an external ceramic containing a base metal or its alloy as a main component.
A step of applying an electrode paste for the first electrode layer and simultaneously sintering this with an unfired ceramic chip and an electrode paste for the internal electrode to form a first layer of the external electrode; After forming the first layer, the surface of the first layer of the external electrode is
Forming a second layer of the external electrode by plating palladium ; and, after forming the second layer of the external electrode, plating a third layer of the external electrode by plating nickel or an alloy thereof on the surface of the second layer of the external electrode. Forming a third layer of the external electrode, and forming a fourth layer of the external electrode by plating tin or its alloy on the surface of the third layer of the external electrode after forming the third layer of the external electrode. Manufacturing method of ceramic electronic components.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3094320A JP3062279B2 (en) | 1991-04-24 | 1991-04-24 | Ceramic electronic component and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3094320A JP3062279B2 (en) | 1991-04-24 | 1991-04-24 | Ceramic electronic component and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04324609A JPH04324609A (en) | 1992-11-13 |
| JP3062279B2 true JP3062279B2 (en) | 2000-07-10 |
Family
ID=14106990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3094320A Expired - Fee Related JP3062279B2 (en) | 1991-04-24 | 1991-04-24 | Ceramic electronic component and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3062279B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013135096A (en) * | 2011-12-27 | 2013-07-08 | Tdk Corp | Electrode sintered body, laminated electronic component, internal electrode paste, method for manufacturing electrode sintered body, and method for manufacturing laminated electronic component |
| JP2013135094A (en) * | 2011-12-27 | 2013-07-08 | Tdk Corp | Electrode sintered body, laminated electronic component, internal electrode paste, method for manufacturing electrode sintered body, and method for manufacturing laminated electronic component |
| JP2023155957A (en) * | 2022-04-12 | 2023-10-24 | 太陽誘電株式会社 | Multilayer ceramic electronic component and its manufacturing method, and circuit board |
-
1991
- 1991-04-24 JP JP3094320A patent/JP3062279B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04324609A (en) | 1992-11-13 |
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