JP3928741B2 - Method for producing silica glass for laser - Google Patents
Method for producing silica glass for laser Download PDFInfo
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- JP3928741B2 JP3928741B2 JP27372695A JP27372695A JP3928741B2 JP 3928741 B2 JP3928741 B2 JP 3928741B2 JP 27372695 A JP27372695 A JP 27372695A JP 27372695 A JP27372695 A JP 27372695A JP 3928741 B2 JP3928741 B2 JP 3928741B2
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- rare earth
- silica glass
- zeolite
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 67
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 60
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 27
- 229910021536 Zeolite Inorganic materials 0.000 claims description 26
- 239000010457 zeolite Substances 0.000 claims description 26
- 239000012013 faujasite Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 15
- 239000002994 raw material Substances 0.000 claims description 11
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052779 Neodymium Inorganic materials 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229910052691 Erbium Inorganic materials 0.000 claims 1
- 229910052689 Holmium Inorganic materials 0.000 claims 1
- 229910052775 Thulium Inorganic materials 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 238000002189 fluorescence spectrum Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 150000002910 rare earth metals Chemical class 0.000 description 4
- 229910017090 AlO 2 Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000004071 soot Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000000087 laser glass Substances 0.000 description 2
- 239000013081 microcrystal Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000005365 phosphate glass Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229920000858 Cyclodextrin Polymers 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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- Lasers (AREA)
Description
【0001】
【産業上の利用分野】
本発明は、希土類元素含有組成物の製造方法、さらに詳しくは光学特性、非線形光学特性、電気又は磁気特性等の特性を有する希土類元素を含有する希土類元素含有組成物の製造方法に関する。
【0002】
【従来の技術】
近年、ガラス、セラミックス等の媒質に機能性元素を含有させ、光学特性、非線形光学特性、電気又は磁気特性等の特性を付与した組成物が多数開発され、各種の用途に供されている。例えばアルカリ土類酸化物等を含む多成分系ケイ酸塩又はリン酸塩ガラス或はシリカガラスにNd、Ce等の希土類元素をドープしたレーザーガラス、ガラスにCs+,Tl+,Pb2+等をドーピングした高屈折率ガラス、さらには機能性元素を含有させたセラミック発光素子、フェライト、セラミックス光アイソレーター、PZT素子等を挙げることができる。
【0003】
【発明が解決しようとする課題】
ところが、希土類元素は、そのイオン価数が高いところから、一般に非極性の媒質中では会合し易く、局所的な微結晶を生じる。このような局所的な微結晶が生じると、例えばレーザー発振のような特性を媒質に付与しようとすると、希土類元素が発光に関与せず、専ら光の吸収体として働き、レーザー発振の効率を著しく低下させる上に、極端な場合には局所的な結晶化により組成物の機能を阻害することが起こる。例えばガラスにあっては白濁や散乱体の発生で透明性等が阻害されることになる。このような希土類元素の会合を防ぐ手段として、媒質中に希土類元素の会合防止剤としてAlやPを共ドープする方法が特開昭60ー11245号公報等で提案された。前記公報等に記載の方法では、希土類元素化合物と珪素化合物の混合ガスにAl化合物又はP化合物の混合ガスを酸化プラズマ炎で反応させてガラス化する方法であり、AlやPが希土類元素に配位することで希土類元素同志の会合を防止している。前記公報記載の方法以外にも、NdCl3を固体のまま酸水素火炎中に導入して珪素化合物の火炎加水分解で生じるシリカ微粒子中にドープするCVD法、スートを希土類元素塩の水溶液中にドブ漬けするスタッフィング法等の希土類元素含有組成物の製造方法が提案されている。
【0004】
しかしながら、上記方法のうち溶融方法やCVD法では溶融する際の希土類元素が固体である場合には、既に会合状態で含有されているため、そのまま溶融されるので会合を生じ易く、会合防止剤を存在させても十分な効果を発揮させるこことができない。また、プラズマ法では原料化合物の反応が速いためNdの会合が生じる確率が高く会合のない希土類元素含有組成物を製造することは困難である。さらに、スタッフィング法ではドープされたスートの乾燥段階でドープした元素が析出しそれが会合し会合のない希土類元素含有組成物を製造することができない。こうした希土類元素の会合による機能低下は前記ガラスに限らず、希土類元素を含有し、それらの特性を利用するセラミックスにおいても同様に起こる現象である。
【0005】
こうした現状に鑑み、本発明者等は鋭意研究を重ねた結果、予め希土類元素を、ゼオライトの安定した配位場に固定しその状態で媒質中にドープすることで、高濃度であっても会合がない希土類元素含有組成物が製造できることを見出し、本発明を完成したものである。すなわち
【0006】
本発明は、希土類元素が会合することなく含有される希土類元素含有組成物の製造方法を提供することを目的とする。
【0007】
本発明は、希土類元素が会合することなく含有される希土類元素含有シリカガラスの製造方法を提供することを目的とする。
【0008】
本発明は、希土類元素が会合することなく高濃度で含有されるレーザーシリカガラスの製造方法を提供することを目的とする。
【0009】
本発明は、大型で高出力のレーザーを発振できるレーザーシリカガラスの製造方法を提供することを目的とする。
【0010】
【課題を解決するための手段】
上記目的を達成する本発明は、希土類元素が固定されたゼオライトと媒質原料とを混合し焼成することを特徴とする希土類元素含有組成物の製造方法に係る。
【0011】
上記希土類元素とは、微量のドープで光学特性、非線形光学特性、電気又は磁気特性等の特性を発揮する周期律表III〜V族の金属元素であって、ゼオライトのアルカリイオンとイオン交換可能な元素をいう。また、希土類元素が固定されるとは、ゼオライトのサイトに固定されることをいう。特にゼオライトのSIサイトは安定した配位場を形成しそこに固定された希土類元素は安定した状態で固定される。前記固定方法としては、希土類元素の塩化物、硝酸塩、水酸化物等の水溶性化合物とゼオライトとを水中で加熱しゼオライトのアルカリ元素と希土類元素とをイオン交換させる方法がある。前記固定方法において固定個数が所期の目的の個数以上である場合には、塩化アンモニア溶液で処理しその個数を制御するのがよい。最適な固定個数である9個の場合には、飽和塩化アンモニウム溶液で処理するのがよい。前記固定において、希土類元素とそれより鈍感な元素とを併用すると、前記塩化アンモニア処理なしで固定個数を制御できる。
【0012】
本発明の製造方法で使用するゼオライトとしてはフォージャサイトタイプのゼオライトや該フォージャサイトと性質が類似のシクロデキストリン等が挙げられる。特にフォージャサイトが好ましく、フォージャサイトA{(Na2,K2,Ca,Mg)29.5[(AlO2)59(SiO2)132]・235H2O}、フォージャサイトX{Na86[(AlO2)86(SiO2)106]・246H2O}又はフォージャサイトY{Na56[(AlO2)56(SiO2)136]・250H2O}が利用される。前記フォージャサイトタイプのゼオライトは図1にみるようにD6Rという六角柱が不完全な八面体を正四面体状につないだ形になっている。フォージャサイトタイプのゼオライトのサイトにはSI、SII、SII´等5サイトがあり、SIサイトの数は単位セル当り16個存在する。このフォージャサイトに固定される希土類元素の最大数は28.7個である。希土類元素を前記フォージャサイトに安定に固定するには該ゼオライトに16個あるSIサイトに固定するのがよいが、全SIサイトに希土類元素を固定するとその離脱が起こり、結果的に希土類元素の会合が生じるのでSIサイトの3〜14個、好ましくは9個の希土類元素を固定するのがよい。
【0013】
上記のように希土類元素をゼオライトのSIサイトに固定、すなわちアルミノシロキサンの6角柱構造(12個の頂点のうち6個がAl、残り6個がSiが占めている構造)で構成される籠の中央のSIサイトに固定し、それとシリカ原料とを焼成することで前記籠構造が1つのユニット、すなわち希土類元素の周辺を他の元素で覆った状態でシリカガラス中にドープされ、Nd−Nd間距離が9.3Å以上となり会合することがない。前記希土類元素を固定したゼオライトを使用すると0.1〜4wt%の範囲で希土類元素を会合することなくドープすることができる。ドープ濃度が0.1wt%未満では希土類元素の特性が発揮できず、またドープ濃度が4wt%を超えるとガラス化領域を越えシリカガラスとならなくなる。
【0014】
本発明で使用するシリカ原料としては、珪酸アルカリをシリカ源としたシリカ、アルコキシシランをシリカ源としたシリカ、Si(CH3)Cl3、SiCl4等のシラン化合物をシリカ源としCVD法、VAD法で製造したシリカ、天然結晶質石英等を挙げることができる。特にアルコキシシランをシリカ源とするシリカ原料の場合、アルコキシシランを加水分解して得たシリカゾルに機能性希土類元素を固定したゼオライトを混合しゲル化することでゼオライトが均一に混合されたガラス原料が得られ、それを焼成或は他のシリカ原料と混合焼成することで希土類元素が均質にドープしたシリカガラスが得られる。前記製造において、得られたゲルを100〜400℃で乾燥したのち、予備焼成した上で粉砕し粒度を50〜250μmの範囲とするのがよい。また、予備焼成温度としては1400〜1600℃の範囲が選ばれる。前記シリカガラスの焼成は1700〜1800℃の範囲で行うが、媒質がセラミックスの場合には、通常の焼成温度が採用される。特にシリカガラスの焼成においてはベルヌイ法を採用すると希土類元素が均一に分散したシリカガラスが製造でき好ましい。
【0015】
本発明の製造方法では、希土類元素を均質に含有することができるにとどまらず、ドープの仕方、例えば周方向に希土類元素の濃度を変える等ドープする組成物の使用目的に応じて希土類元素をドープすることができる。その結果、周方向で屈折率が異なる板状レンズの作製もできる。
【0016】
【実施の形態】
以下、実施例に基づいて本発明を具体的に説明するが、本発明はこれに限定されるものではない。
【0017】
【実施例】
実施例1
フォージャサイトX156gとNdCl3477gとを水中でよく攪拌しながら100℃で還流させながら2週間保持した。ついで得られたNd置換フォージャサイトXを取り出し、それを飽和塩化アンモニウム溶液で4時間処理し、SIサイトの9個にNd+3を配位した。前記フォージャサイトXを乾燥したのち、シリカ粉100gに対してフォージャサイトXを4.59g、9.61g、21.27g及び35.71gの割合でそれぞれ均一に混合し1750℃で焼結し、透明なシリカガラスを作製した。前記シリカガラス中のNdのドープ量はそれぞれ0.5wt%、1wt%、2.0wt%及び3.0wt%であった。Ndのドープ量が1wt%のシリカガラスについてその蛍光スペクトル強度を測定したところ図2に示すとおり1063nmの励起光に対する相対的蛍光スペクトル強度は9.38[a.u.]であった。またNdドープシリカガラスについてそのライフタイムを測定したところ図3に示すように、400μs以上であった。
【0018】
一方、溶融法でNdを1.2wt%ドープしたシリカガラスについて上記と同様に1063nmの励起光に対する相対的蛍光スペクトル強度を測定したところ0.668[a.u.]であった。また、レーザーガラスとして一般的に使用されるリン酸系ガラスのライフタイム及び相対的蛍光スペクトル強度を測定したところ、それぞれ300μs及び5.81[a.u.]であった。
【0019】
実施例2
フォージャサイトX156gとNdCl3477gとを水中でよく攪拌しながら100℃で還流させながら2週間保持したのち、Nd置換フォージャサイトXを取り出し、それを飽和塩化アンモニウム溶液で4時間処理し、SIサイトの9個にNd+3を配位したフォージャサイトXを含有する水溶液にテトラエチルオルソシリケート(tetra−ethylorthosilicate; 以下TEOSという)をTEOS:水:1N塩酸=208g:180g:1gの割合で混合攪拌し1相となったものを、少量のアンモニア水を触媒として、0.2〜1.0μmのコロイダルシリカとNd固定フォージャサイトXとの混合物を製造した。次いで前記混合物とTEOSを混合しゲル化したのち300℃で乾燥した。該乾燥体をさらに1500℃で予備焼成したのち50〜250μmの粒径に調製し、天然水晶粉と混合し粉砕しベルヌイ法でシリカガラスを合成した。Ndの濃度は0.2wt%であり、その蛍光スペクトル強度は励起光1063nmに対して1.11[a.u.]であった。
【0020】
実施例3
実施例1においてNdの代わりにCeを使用した以外は実施例1と同様にしてCeを3.0wt%ドープするシリカガラスを作成した。該シリカガラスの蛍光スペクトル強度は図4に示すとおりであった。
【0021】
【発明の効果】
本発明の製造方法では、希土類元素をゼオライトに安定に固定した上で、媒質原料と混合し、焼成するところから、前記希土類元素の会合がなく、希土類元素特性が十分発揮する組成物が得られる。前記製造方法は、ゼオライトと希土類元素とをイオン交換させ、必要に応じて塩化アンモニウム溶液で処理するという簡単な方法であるので工業的にも有利な製造方法である。
【図面の簡単な説明】
【図1】 ゼオライトXが6角柱構造(D6R)を有することを示す模式図である。
【図2】 本発明のNdドープシリカガラスの蛍光スペクトル強度を示すグラフである。
【図3】 本発明のNdドープシリカガラスのライフタイムを示すグラフである。
【図4】 本発明のCeドープシリカガラスの蛍光スペクトル強度を示すグラフである。[0001]
[Industrial application fields]
The present invention relates to a method for producing a rare earth-containing composition, more particularly optical characteristics, nonlinear optical properties, a method for manufacturing of electrical or rare earth-containing composition containing a rare earth element having characteristics such as a magnetic characteristic.
[0002]
[Prior art]
In recent years, many compositions have been developed that contain functional elements in a medium such as glass or ceramics and have been imparted with properties such as optical properties, nonlinear optical properties, electrical or magnetic properties, and are being used for various applications. For example, a multi-component silicate or phosphate glass containing alkaline earth oxide or the like, a laser glass doped with rare earth elements such as Nd and Ce on silica glass, Cs + , Tl + , Pb 2+ etc. on the glass Examples thereof include a doped high refractive index glass, a ceramic light emitting device containing a functional element, a ferrite, a ceramic optical isolator, and a PZT device.
[0003]
[Problems to be solved by the invention]
However , since rare earth elements have a high ionic valence, they are generally easily associated in a non-polar medium, resulting in local microcrystals. When such local microcrystals are generated, for example, when trying to impart characteristics such as laser oscillation to a medium, rare earth elements do not participate in light emission, and work exclusively as light absorbers, and the efficiency of laser oscillation is remarkably increased. In addition to lowering, in extreme cases, local crystallization occurs that inhibits the function of the composition. For example, in the case of glass, transparency and the like are hindered by the occurrence of cloudiness and scatterers. As means for preventing such rare earth element association, a method of co-doping Al or P as a rare earth element association inhibitor in a medium has been proposed in JP-A-60-11245. The method described in the above publications is a method of reacting a mixed gas of a rare earth element compound and a silicon compound with a mixed gas of an Al compound or a P compound with an oxidation plasma flame to vitrify, and Al or P is distributed to the rare earth element. To prevent the rare earth elements from meeting together. In addition to the method described in the above publication, a CVD method in which NdCl 3 is introduced into an oxyhydrogen flame in the form of a solid and doped into silica fine particles generated by flame hydrolysis of a silicon compound, and soot is doped in an aqueous solution of a rare earth element salt. A method for producing a rare earth element-containing composition such as a stuffing method for pickling has been proposed.
[0004]
However, among the above methods, in the melting method or the CVD method, when the rare earth element at the time of melting is a solid, it is already contained in an associated state, so that it is melted as it is, so that the association is likely to occur. Even if it exists, sufficient effect cannot be exhibited. Further, in the plasma method, since the reaction of the raw material compound is fast, it is difficult to produce a rare earth element-containing composition having a high probability of Nd association and no association. Furthermore, the stuffing method cannot produce a rare earth element-containing composition in which doped elements are deposited in the drying stage of the doped soot and are associated with each other. Such functional degradation due to the association of rare earth elements is not limited to the glass, but is also a phenomenon that occurs in ceramics containing rare earth elements and utilizing their characteristics.
[0005]
In view of the current situation, the present inventors have conducted extensive research, and as a result, the rare earth element was previously fixed in a stable coordination field of the zeolite and doped into the medium in that state, so that it could be associated even at high concentrations. The present invention has been completed by finding that a rare earth element-containing composition can be produced. That is, [0006]
The present invention aims to provide a method for producing a rare earth-containing composition contained no rare earth element is associated.
[0007]
The present invention aims at providing a method for producing rare earth-containing silica glass contained no rare earth element is associated.
[0008]
An object of this invention is to provide the manufacturing method of the laser silica glass in which rare earth elements are contained in high concentration without associating.
[0009]
An object of this invention is to provide the manufacturing method of the laser silica glass which can oscillate a large sized high output laser.
[0010]
[Means for Solving the Problems]
The present invention for achieving the above object relates to a method for producing a rare earth element-containing composition, characterized by mixing and firing a zeolite in which a rare earth element is fixed and a medium raw material.
[0011]
The rare earth element is a metal element of Group III to V of the periodic table that exhibits optical characteristics, nonlinear optical characteristics, electrical or magnetic characteristics, etc. with a small amount of dope, and can be ion-exchanged with alkali ions of zeolite. An element. Moreover, that the rare earth element is fixed means that it is fixed at the site of the zeolite. In particular, the SI site of zeolite forms a stable coordination field, and the rare earth element fixed thereto is fixed in a stable state. As the fixing method, there is a method in which a water-soluble compound such as a rare earth element chloride, nitrate, hydroxide or the like and zeolite are heated in water to ion-exchange the alkali element and rare earth element of the zeolite. In the fixing method, when the fixed number is equal to or more than the desired number, it is preferable to control the number by treating with ammonia chloride solution. In the case of 9 which is the optimum fixed number, it is better to treat with a saturated ammonium chloride solution. In the fixing, when a rare earth element and an insensitive element are used in combination, the number of fixings can be controlled without the ammonia chloride treatment.
[0012]
Examples of the zeolite used in the production method of the present invention include faujasite type zeolite and cyclodextrin having similar properties to the faujasite. In particular, faujasite is preferable, and faujasite A {(Na 2 , K 2 , Ca, Mg) 29.5 [(AlO 2 ) 59 (SiO 2 ) 132 ] · 235H 2 O}, faujasite X {Na 86 [(AlO 2 ) 86 (SiO 2 ) 106 ] · 246H 2 O} or faujasite Y {Na 56 [(AlO 2 ) 56 (SiO 2 ) 136 ] · 250H 2 O} is used. As shown in FIG. 1, the faujasite type zeolite has a hexagonal column of D6R in an incomplete octahedron shape connected to a regular tetrahedron. There are 5 sites such as SI, SII, SII ′, etc. in the site of the faujasite type zeolite, and there are 16 SI sites per unit cell. The maximum number of rare earth elements fixed to this faujasite is 28.7. Although it is preferable rare earth element stably fixed to the faujasite is fixed to SI sites 16 in the zeolite, when in all SI site to fix the rare earth elements occur that withdrawal of the resulting rare-earth elements Since association occurs, it is preferable to fix 3 to 14, preferably 9 rare earth elements of the SI site.
[0013]
As described above, the rare earth element is fixed to the SI site of the zeolite, that is, composed of an aluminosiloxane hexagonal column structure (a structure in which 6 out of 12 vertices are Al and the remaining 6 are occupied by Si). By fixing it to the central SI site and firing the silica raw material, the soot structure is doped into silica glass in a state where the periphery of the rare earth element is covered with another element, and between Nd and Nd The distance is over 9.3 km and there will be no meetings. When the zeolite to which the rare earth element is fixed is used, the rare earth element can be doped without associating in the range of 0.1 to 4 wt%. When the doping concentration is less than 0.1 wt%, the characteristics of rare earth elements cannot be exhibited, and when the doping concentration exceeds 4 wt%, the vitreous region is exceeded and no silica glass is formed.
[0014]
As silica raw materials used in the present invention, silica using an alkali silicate as a silica source, silica using an alkoxysilane as a silica source, a silane compound such as Si (CH 3 ) Cl 3 , SiCl 4 as a silica source, a CVD method, VAD Examples thereof include silica produced by the method and natural crystalline quartz. In particular, in the case of a silica raw material using alkoxysilane as a silica source, a glass raw material in which zeolite is uniformly mixed by mixing and gelling a zeolite in which a functional rare earth element is fixed to a silica sol obtained by hydrolyzing alkoxysilane. The obtained silica glass is fired or mixed and fired with other silica raw materials to obtain a silica glass in which a rare earth element is homogeneously doped. In the said manufacture, after drying the obtained gel at 100-400 degreeC, after prebaking, it is good to grind | pulverize and make a particle size into the range of 50-250 micrometers. In addition, a range of 1400 to 1600 ° C. is selected as the pre-baking temperature. The silica glass is fired in the range of 1700 to 1800 ° C. When the medium is ceramic, a normal firing temperature is employed. In particular, in the firing of silica glass, it is preferable to employ the Bernoulli method because a silica glass in which rare earth elements are uniformly dispersed can be produced.
[0015]
In the production method of the present invention, not only can be homogeneously containing a rare earth element, how doping, doped with a rare earth element according to the intended use etc. doped compositions varying the concentration of the rare earth element, for example the circumferential direction can do. As a result, it is possible to produce a plate lens having a different refractive index in the circumferential direction.
[0016]
[Embodiment]
EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to this.
[0017]
【Example】
Example 1
156 g of faujasite X and 477 g of NdCl 3 were kept for 2 weeks while refluxing at 100 ° C. with good stirring in water. Subsequently, the obtained Nd-substituted faujasite X was taken out, treated with a saturated ammonium chloride solution for 4 hours, and Nd +3 was coordinated to 9 SI sites. After drying the faujasite X, the faujasite X is uniformly mixed at a ratio of 4.59 g, 9.61 g, 21.27 g, and 35.71 g with respect to 100 g of silica powder, and sintered at 1750 ° C. A transparent silica glass was prepared. The doped amounts of Nd in the silica glass were 0.5 wt%, 1 wt%, 2.0 wt% and 3.0 wt%, respectively. When the fluorescence spectrum intensity of silica glass having a Nd doping amount of 1 wt% was measured, the relative fluorescence spectrum intensity with respect to the excitation light of 1063 nm was 9.38 [a. u. ]Met. Further, when the lifetime of the Nd-doped silica glass was measured, it was 400 μs or more as shown in FIG.
[0018]
On the other hand, when the relative fluorescence spectrum intensity for the excitation light of 1063 nm was measured in the same manner as described above for silica glass doped with 1.2 wt% Nd by the melting method, 0.668 [a. u. ]Met. Further, when the lifetime and relative fluorescence spectrum intensity of a phosphate glass generally used as a laser glass were measured, 300 μs and 5.81 [a. u. ]Met.
[0019]
Example 2
156 g of faujasite X and 477 g of NdCl 3 were kept for 2 weeks while being refluxed at 100 ° C. with good stirring in water. Then, Nd-substituted faujasite X was taken out and treated with saturated ammonium chloride solution for 4 hours. Tetra-ethyl orthosilicate (hereinafter referred to as TEOS) is mixed and stirred in an aqueous solution containing faujasite X coordinated with Nd +3 at 9 sites in a ratio of TEOS: water: 1N hydrochloric acid = 208 g: 180 g: 1 g. Then, a mixture of 0.2 to 1.0 μm colloidal silica and Nd-fixed faujasite X was produced using a small amount of aqueous ammonia as a catalyst. Next, the mixture and TEOS were mixed and gelled, and then dried at 300 ° C. The dried product was further pre-baked at 1500 ° C., adjusted to a particle size of 50 to 250 μm, mixed with natural quartz powder and pulverized to synthesize silica glass by the Bernoulli method. The concentration of Nd is 0.2 wt%, and the fluorescence spectrum intensity is 1.11 [a. u. ]Met.
[0020]
Example 3
A silica glass doped with 3.0 wt% of Ce was prepared in the same manner as in Example 1 except that Ce was used instead of Nd in Example 1. The fluorescence spectrum intensity of the silica glass was as shown in FIG.
[0021]
【The invention's effect】
In the production method of the present invention, after the rare earth element stably fixed to the zeolite, was mixed with medium material, from where the firing, there is no association of the rare earth elements, composition rare earth element characteristics are sufficiently exhibited is obtained . The production method is an industrially advantageous production method because it is a simple method in which zeolite and rare earth elements are ion-exchanged and treated with an ammonium chloride solution as necessary.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing that zeolite X has a hexagonal prism structure (D6R).
FIG. 2 is a graph showing the fluorescence spectrum intensity of the Nd-doped silica glass of the present invention.
FIG. 3 is a graph showing the lifetime of the Nd-doped silica glass of the present invention.
FIG. 4 is a graph showing the fluorescence spectrum intensity of the Ce-doped silica glass of the present invention.
Claims (11)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27372695A JP3928741B2 (en) | 1995-09-28 | 1995-09-28 | Method for producing silica glass for laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27372695A JP3928741B2 (en) | 1995-09-28 | 1995-09-28 | Method for producing silica glass for laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0986951A JPH0986951A (en) | 1997-03-31 |
| JP3928741B2 true JP3928741B2 (en) | 2007-06-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27372695A Expired - Fee Related JP3928741B2 (en) | 1995-09-28 | 1995-09-28 | Method for producing silica glass for laser |
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| Country | Link |
|---|---|
| JP (1) | JP3928741B2 (en) |
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1995
- 1995-09-28 JP JP27372695A patent/JP3928741B2/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JPH0986951A (en) | 1997-03-31 |
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