JP3976018B2 - Optical hermetic package - Google Patents
Optical hermetic package Download PDFInfo
- Publication number
- JP3976018B2 JP3976018B2 JP2004033079A JP2004033079A JP3976018B2 JP 3976018 B2 JP3976018 B2 JP 3976018B2 JP 2004033079 A JP2004033079 A JP 2004033079A JP 2004033079 A JP2004033079 A JP 2004033079A JP 3976018 B2 JP3976018 B2 JP 3976018B2
- Authority
- JP
- Japan
- Prior art keywords
- metal film
- lens
- optical
- hermetic package
- optical member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/804—Containers or encapsulations
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Light Receiving Elements (AREA)
Description
本発明はキャップの一部に光学部材が設けられかつ気密性を有する光学用気密パッケージ、たとえば雰囲気を制御した気密封止が必要な光学センサ等を気密に封止する光学用気密パッケージ、特に遠赤外線イメージセンサ等の光学部材に脆弱な光学材料を使用しなければならない光学素子の実装に用いる光学用気密パッケージに関するものである。 The present invention relates to an optical hermetic package in which an optical member is provided on a part of a cap and has airtightness, for example, an optical hermetic package that hermetically seals an optical sensor or the like that requires airtight control with controlled atmosphere. The present invention relates to an optical hermetic package used for mounting an optical element in which a fragile optical material must be used for an optical member such as an infrared image sensor.
遠赤外線光の入射エネルギーを熱として検出するサーモパイル型等の遠赤外線イメージセンサにおいては、感度を向上させるために光学センサを熱伝導率の劣るXe等のガスを封入したり高真空に排気するなどの光学用気密パッケージに収納している。この場合、遠赤外線イメージセンサとして成立させるためには、遠赤外光を透過させることができる材料からなる窓材、レンズ等の光学部材をセンサ受光面の前面に気密封着することが必須の条件である。この光学部材としては無ドープのGe、SiやZnSe、ZnS、KBr等が用いられている。そして、GeやSiを用いた場合には、特許文献1に示されるように、光学部材の周辺部の下面に蒸着等によりハンダと濡れる金属膜を形成しておき、光学部材とキャップとをハンダ接合している。 In a far-infrared image sensor such as a thermopile type that detects incident energy of far-infrared light as heat, the optical sensor is sealed with a gas such as Xe having a low thermal conductivity or exhausted to a high vacuum in order to improve sensitivity. It is housed in an optical hermetic package. In this case, in order to be established as a far-infrared image sensor, it is essential that an optical member such as a window material or a lens made of a material capable of transmitting far-infrared light is hermetically sealed on the front surface of the sensor light-receiving surface. It is a condition. As this optical member, undoped Ge, Si, ZnSe, ZnS, KBr, or the like is used. When Ge or Si is used, as shown in Patent Document 1, a metal film that gets wet with solder by vapor deposition or the like is formed on the lower surface of the peripheral portion of the optical member, and the optical member and the cap are soldered together. It is joined.
しかし、このような光学用気密パッケージにおいてZnSe、ZnS、KBr等の脆弱材料からなる光学部材を用いる場合には、光学部材を接合したパッケージ部材から印加される力によって光学部材が破壊されて、気密破壊が生ずることがある。 However, when an optical member made of a fragile material such as ZnSe, ZnS, or KBr is used in such an optical hermetic package, the optical member is broken by the force applied from the package member to which the optical member is joined, and the airtight Destruction can occur.
本発明は上述の課題を解決するためになされたもので、気密破壊が生ずるのを防止することができる光学用気密パッケージを提供することを目的とする。 The present invention has been made to solve the above-described problems, and an object of the present invention is to provide an optical hermetic package that can prevent hermetic failure.
この目的を達成するため、本発明においては、Fe−Ni系合金からなる金属膜をZnSからなる上記光学部材の周辺部の上面、下面および側面に形成し、上記光学部材を上記金属膜を介してキャップと接合する。 In order to achieve this object, in the present invention, a metal film made of Fe-Ni alloy is formed on the upper, lower and side surfaces of the peripheral part of the optical member made of ZnS , and the optical member is interposed through the metal film. Join the cap.
本発明に係る光学用気密パッケージにおいては、外部からの応力を金属膜で受けさせることができるから、光学部材に作用する応力を分散し破壊を防ぐことができるので、気密破壊が生ずるのを防止することができる。 In the optical hermetic package according to the present invention, since a stress from the outside can be received by the metal film, the stress acting on the optical member can be dispersed and the destruction can be prevented, thereby preventing the occurrence of the hermetic failure. can do.
(第1の実施の形態)
図1は本発明に係る光学用気密パッケージすなわち赤外線イメージセンサチップを真空実装したレンズ付きセンサ(カメラ)を示す断面図、図2は図1に示した光学用気密パッケージのレンズ部を示す断面図である。図に示すように、円板状のステム1はTO−8と呼ばれる絶縁された接続端子2を有し、ステム1の表面に遠赤外線イメージセンサチップ3がダイボンドされ、センサチップ3と接続端子2との間はワイヤ4を用いたワイヤボンディングにより電気的に接続されている。また、ステム1のセンサチップ3の実装側が金属キャップ6で覆われ、金属キャップ6は50アロイと呼ばれるNiの含有率が50%の50Ni−Fe合金からなり、厚さは0.3mmである。また、センサチップ3の表面に対向する金属キャップ6の上面には円形の開口部7が形成され、開口部7に硫化亜鉛(ZnS)製のレンズ9がハンダからなる接合層10を介して気密封止され、レンズ9の周辺部11の上面、下面および側面にNiの含有率が42%の42Ni−Fe合金からなりかつ厚さが150μmの金属膜8が形成されている。すなわち、熱膨張係数がレンズ9の熱膨張係数と同程度の金属膜8がレンズ9の周辺部11の上面、下面および側面に形成され、レンズ9が金属膜8を介して金属キャップ6に接合されている。そして、金属膜8は電気メッキ法すなわち電解合金メッキ法により形成されている。たとえば、NiSO4・6H2O 0.95mol/L(250g/L)、NiCl2・6H2O 0.17mol/L(40g/L)、ほう酸0.49mol/L(30g/L)の組成のワットNiメッキ浴にマロン酸を0.05mol/L、C7H4NNaO3S・2H2O(サッカリンナトリウム)を0.008mol/L(2g/L)およびFeSO4・7H2Oを0.35mol/L以下(0〜97g/L以下)を添加してNi−Fe合金メッキ浴を調製し、この合金メッキ浴をpH2.5、50℃で使用し、電流密度を1〜9A/dm2として、金属膜8が形成されている。なお、電解合金メッキ法に関する公知技術の一例としては、近畿地域産業技術連携推進会議・第7回テクノリサーチコンファレンスでの京都市工業試験場、永山氏らの研究報告がある。
(First embodiment)
1 is a sectional view showing an optical hermetic package according to the present invention, that is, a sensor with a lens (camera) in which an infrared image sensor chip is vacuum-mounted, and FIG. 2 is a sectional view showing a lens portion of the optical hermetic package shown in FIG. It is. As shown in the figure, the disc-shaped stem 1 has an insulated connection terminal 2 called TO-8, and a far-infrared image sensor chip 3 is die-bonded on the surface of the stem 1 so that the sensor chip 3 and the connection terminal 2 are connected. Are electrically connected by wire bonding using the wire 4. Further, the mounting side of the sensor chip 3 of the stem 1 is covered with a metal cap 6, and the metal cap 6 is made of a 50Ni—Fe alloy having a Ni content of 50% called 50 alloy, and has a thickness of 0.3 mm. A circular opening 7 is formed on the upper surface of the metal cap 6 facing the surface of the sensor chip 3, and a zinc sulfide (ZnS) lens 9 is formed in the opening 7 through a bonding layer 10 made of solder. A metal film 8 made of 42Ni—Fe alloy having a Ni content of 42% and having a thickness of 150 μm is formed on the upper surface, the lower surface, and the side surfaces of the peripheral portion 11 of the lens 9. That is, the metal film 8 having the same thermal expansion coefficient as that of the lens 9 is formed on the upper surface, the lower surface, and the side surface of the peripheral portion 11 of the lens 9, and the lens 9 is bonded to the metal cap 6 through the metal film 8. Has been. The metal film 8 is formed by electroplating, that is, electrolytic alloy plating. For example, the composition of NiSO 4 · 6H 2 O 0.95 mol / L (250 g / L), NiCl 2 · 6H 2 O 0.17 mol / L (40 g / L), boric acid 0.49 mol / L (30 g / L) In a watt Ni plating bath, 0.05 mol / L of malonic acid, 0.008 mol / L (2 g / L) of C 7 H 4 NNaO 3 S · 2H 2 O (sodium saccharin) and 0.35 mol of FeSO 4 · 7H 2 O / L or less (0 to 97 g / L or less) is added to prepare a Ni—Fe alloy plating bath, the alloy plating bath is used at pH 2.5 and 50 ° C., and the current density is set to 1 to 9 A / dm 2. A metal film 8 is formed. In addition, as an example of the publicly known technique related to the electrolytic alloy plating method, there is a research report by Mr. Nagayama, Kyoto City Industrial Experiment Station, etc. at the 7th Techno Research Conference of the Kinki Regional Industrial Technology Cooperation Promotion Conference.
図1に示した光学用気密パッケージにおいては、レンズ9の周辺部11の上面、下面および側面の金属膜8を形成しているから、外部からの応力を金属膜8で受けさせることができる。このため、レンズ9に作用する応力を分散し破壊を防ぐことができるから、気密破壊が生ずるのを確実に防止することができる。また、図3に示すように、万が一周辺部11にクラック12が入った場合でも、クラック12の発生が考えられる場所は応力が集中する周辺部11の上面あるいは下面と側面との接合部付近であり、ここはクラック12が生じても金属膜8に覆われているため気密破壊に繋がらないから、気密破壊が生ずるのを確実に防止することができる。また、レンズ9の材料である硫化亜鉛(ZnS)は焼結品で熱膨張係数が7.5ppm/k程度であるのに合わせて、レンズ9の材料の熱膨張係数と同程度の熱膨張係数を有する金属膜8を形成しているから、レンズ9に引張応力が作用しない。したがって、上述のように一般にセラミックス系の材料の特性として知られている引張力に対する強度が圧縮される力に対する強度と比較すると数分の1倍程度と小さいことにおいて、その引張応力がレンズ9に作用しない構造とすることで、気密破壊が生ずるのをより確実に防止できる。さらに、特にセンサチップ3の寸法に対してレンズ9の大きさに余裕がない場合などに、センサチップ3の撮像エリアの周縁付近に靄がかかって像のS/N比が低下する現象が発生することがあるが、この現象は周辺部11に入射した光がそのままセンサチップ3側に透過することにより生じているものであり、周辺部11の上面、下面および側面の金属膜8を形成したときには、金属膜8によって周辺部11の光の透過を遮断するので、レンズ9が小さな場合でもS/N比が向上してクリアな像が得られる。 In the optical hermetic package shown in FIG. 1, the metal film 8 is formed on the upper surface, the lower surface, and the side surface of the peripheral portion 11 of the lens 9, so external stress can be received by the metal film 8. For this reason, stress acting on the lens 9 can be dispersed to prevent breakage, so that airtight breakage can be reliably prevented. Further, as shown in FIG. 3, even if a crack 12 is generated in the peripheral portion 11, the place where the crack 12 may be generated is near the joint portion between the upper surface or the lower surface and the side surface of the peripheral portion 11 where stress is concentrated. Yes, even if a crack 12 occurs, it is covered with the metal film 8 and thus does not lead to hermetic failure, so that it is possible to reliably prevent the hermetic failure from occurring. In addition, zinc sulfide (ZnS), which is the material of the lens 9, is a sintered product and has a thermal expansion coefficient of about 7.5 ppm / k. Since the metal film 8 having the above is formed, tensile stress does not act on the lens 9. Therefore, as described above, the tensile stress, which is generally known as a characteristic of the ceramic material, is about several times smaller than the strength against the compressive force. By adopting a structure that does not act, it is possible to more reliably prevent the occurrence of airtight destruction. Further, particularly when the lens 9 is not large enough with respect to the dimensions of the sensor chip 3, a phenomenon occurs in which the S / N ratio of the image is lowered due to wrinkles near the periphery of the imaging area of the sensor chip 3. However, this phenomenon is caused by the fact that light incident on the peripheral portion 11 is transmitted to the sensor chip 3 side as it is, and the metal film 8 on the upper surface, the lower surface and the side surface of the peripheral portion 11 is formed. In some cases, the metal film 8 blocks the transmission of light in the peripheral portion 11, so that even when the lens 9 is small, the S / N ratio is improved and a clear image can be obtained.
また、金属膜8は電解合金メッキ法により形成されており、メッキしたままの42Ni−Fe合金は8.5ppm/kの熱膨張係数を有するが、金属膜8に引張応力が残留しており、これがレンズ9に対して圧縮応力を印加しているので、たとえばゆっくり350℃まで昇温すると、レンズ9が割れることなく金属膜8に締め付けられたまま図4に示すように42Ni−Fe合金の熱膨張係数が7ppm/k程度まで低下し、その後冷却すると、初期状態と変わらずレンズ9が金属膜8に軽く締め付けられ、レンズ9が金属膜8によって保護された状態となる。なお、金属キャップ6の材料として50Ni−Fe合金を選択し、金属キャップ6の厚さを0.3mmとしているから、後の接合層10によるハンダ接合時に金属膜8に圧縮応力が発生する。そして、金属膜8の厚さを金属キャップ6の金属材料の応力に整合させておけば、レンズ9に圧縮応力を生じさせることができ、この場合レンズ9に引張力が作用しても、その引張力が所定値よりも小さいときには、レンズ9には引張応力が作用せず、しかも硫化亜鉛のような非金属材料の場合には、上述のように一般的に引張応力よりも圧縮応力に対しては強度が数倍程度以上高いから、レンズ9は外力から保護されて破損することがなくなる。 The metal film 8 is formed by electrolytic alloy plating, and the as-plated 42Ni-Fe alloy has a coefficient of thermal expansion of 8.5 ppm / k, but tensile stress remains in the metal film 8. Since this applies a compressive stress to the lens 9, for example, when the temperature is slowly raised to 350 ° C., the heat of the 42Ni—Fe alloy remains as shown in FIG. When the expansion coefficient is reduced to about 7 ppm / k and then cooled, the lens 9 is lightly clamped to the metal film 8 without changing from the initial state, and the lens 9 is protected by the metal film 8. Since a 50Ni—Fe alloy is selected as the material of the metal cap 6 and the thickness of the metal cap 6 is 0.3 mm, a compressive stress is generated in the metal film 8 at the time of solder bonding by the subsequent bonding layer 10. If the thickness of the metal film 8 is matched to the stress of the metal material of the metal cap 6, a compressive stress can be generated in the lens 9. In this case, even if a tensile force acts on the lens 9, When the tensile force is smaller than a predetermined value, no tensile stress acts on the lens 9, and in the case of a non-metallic material such as zinc sulfide, as described above, generally, the tensile stress is less than the tensile stress. Since the strength is about several times higher, the lens 9 is protected from external force and is not damaged.
また、電解メッキは基本的に内部に引張応力を残留させているので、多少の熱膨張係数の逆転は自身の応力で吸収する。また、応力は熱処理条件で調整することも可能であり、さらに応力調整手段のバリエーションが広くなる。 In addition, since electrolytic plating basically leaves a tensile stress inside, some reversal of the thermal expansion coefficient is absorbed by its own stress. In addition, the stress can be adjusted by heat treatment conditions, and variations of the stress adjusting means are further widened.
また、金属膜8の材料としてFe−Ni系合金を用いており、かつ電解合金メッキ法により金属膜8を形成しているから、金属膜8の材料の組成をメッキ条件で設定することができ、金属膜8の材料の組成から容易に熱膨張整数を調整することができるので、開発期間やコストを同時に大きく低減できる。 In addition, since the Fe—Ni alloy is used as the material of the metal film 8 and the metal film 8 is formed by the electrolytic alloy plating method, the composition of the material of the metal film 8 can be set by the plating conditions. Since the integer of thermal expansion can be easily adjusted from the composition of the material of the metal film 8, the development period and cost can be greatly reduced at the same time.
(第2の実施の形態)
図5は本発明に係る他の光学用気密パッケージのレンズ部を示す断面図である。図に示すように、レンズ9の周辺部11の上面に金属の蒸着層13が設けられており、蒸着層13は20nmのTi層およびその上の100nmのNi層からなる。
(Second Embodiment)
FIG. 5 is a cross-sectional view showing a lens portion of another optical hermetic package according to the present invention. As shown in the figure, a metal vapor deposition layer 13 is provided on the upper surface of the peripheral portion 11 of the lens 9, and the vapor deposition layer 13 is composed of a 20 nm Ti layer and a 100 nm Ni layer thereon.
図5に示したレンズ部を有する光学用気密パッケージにおいては、レンズ9の周辺部11の上面に金属の蒸着層13が設けられているから、信頼性を向上させることができる。すなわち、電解メッキにおいては、近年コンパクトディスク等の記録媒体でのエラーを排除するためなどの要求から無欠陥化が進行してきた。しかしながら、確率的には欠陥は存在し、本発明の適用分野のひとつである遠赤外線イメージセンサの製造では、使用部品が比較的高価であるために気密を損なうガスリークは徹底的に排除する必要がある。このガスリークが発生する場合は、本発明のように厚メッキ(金属膜8)を前提とした場合には、金属膜8を抜ける経路は少なく、レンズ9と金属膜8との間の界面の不連続性に起因する場合が多い。したがって、レンズ9の表から裏への経路のいずれかで経路を遮断することができればよく、レンズ9の周辺部11の上面に蒸着法によりメッキ下地層となる金属の蒸着層13を形成した後に、メッキを施すことにより金属膜8を形成すれば、レンズ9と金属膜8との界面のわずかな欠陥で気密が劣化するのを防止することができ、信頼性を向上させることができる。 In the optical hermetic package having the lens portion shown in FIG. 5, since the metal vapor deposition layer 13 is provided on the upper surface of the peripheral portion 11 of the lens 9, the reliability can be improved. In other words, in electroplating, in recent years, the elimination of defects has progressed due to demands for eliminating errors in recording media such as compact disks. However, there are probabilistic defects, and in the manufacture of far-infrared image sensors, one of the application fields of the present invention, it is necessary to thoroughly eliminate gas leaks that impair airtightness because the parts used are relatively expensive. is there. When this gas leak occurs, when thick plating (metal film 8) is used as in the present invention, there are few paths through the metal film 8, and the interface between the lens 9 and the metal film 8 is not satisfactory. Often due to continuity. Accordingly, it is sufficient that the path can be blocked by any one of the paths from the front side to the back side of the lens 9, and after the metal deposition layer 13 serving as the plating base layer is formed on the upper surface of the peripheral portion 11 of the lens 9 by the deposition method. If the metal film 8 is formed by plating, it is possible to prevent the airtightness from being deteriorated by a slight defect at the interface between the lens 9 and the metal film 8 and to improve the reliability.
なお、各図は工程の説明を容易にするためにデフォルメされており、正確な寸法比を示さない部分がある。また、実施の形態中の数値は本実施の形態を説明するための一例であり、これに限定されるものではなく、設計条件の変動により当然変化するものである。 Each drawing is deformed for easy explanation of the process, and there is a portion that does not show an accurate dimensional ratio. The numerical values in the embodiments are examples for explaining the present embodiment, and are not limited to these, and naturally change due to variations in design conditions.
また、上述実施の形態においては、光学部材がレンズ9の場合について説明したが、光学部材が窓材等の場合にも本発明を適用することができる。また、上述実施の形態においては、レンズ9の周辺部11の上面に金属の蒸着層13を設けたが、光学部材の周辺部の上面、下面の少なくとも一方と金属膜との間に蒸着層を設ければよい。 In the above-described embodiment, the case where the optical member is the lens 9 has been described. However, the present invention can also be applied to the case where the optical member is a window member or the like. In the above-described embodiment, the metal vapor deposition layer 13 is provided on the upper surface of the peripheral portion 11 of the lens 9. However, the vapor deposition layer is provided between at least one of the upper and lower surfaces of the peripheral portion of the optical member and the metal film. What is necessary is just to provide.
6…金属キャップ
8…金属膜
9…レンズ
11…周辺部
13…蒸着層
6 ... Metal cap 8 ... Metal film 9 ... Lens 11 ... Peripheral part 13 ... Deposition layer
Claims (3)
Fe−Ni系合金からなる金属膜をZnSからなる上記光学部材の周辺部の上面、下面および側面に形成し、
上記光学部材を上記金属膜を介して上記キャップと接合した
ことを特徴とする光学用気密パッケージ。 In an optical hermetic package in which an optical member is provided in a part of a cap and has airtightness,
Forming a metal film made of Fe-Ni alloy on the upper surface, the lower surface and the side surface of the peripheral portion of the optical member made of ZnS ;
An optical hermetic package, wherein the optical member is bonded to the cap via the metal film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004033079A JP3976018B2 (en) | 2004-02-10 | 2004-02-10 | Optical hermetic package |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004033079A JP3976018B2 (en) | 2004-02-10 | 2004-02-10 | Optical hermetic package |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005228775A JP2005228775A (en) | 2005-08-25 |
| JP3976018B2 true JP3976018B2 (en) | 2007-09-12 |
Family
ID=35003275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004033079A Expired - Lifetime JP3976018B2 (en) | 2004-02-10 | 2004-02-10 | Optical hermetic package |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3976018B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010175304A (en) * | 2009-01-27 | 2010-08-12 | Panasonic Electric Works Co Ltd | Method for manufacturing infrared sensor |
| JP5123225B2 (en) * | 2009-01-28 | 2013-01-23 | パナソニック株式会社 | Infrared sensor element package |
| WO2020217943A1 (en) * | 2019-04-22 | 2020-10-29 | 日本板硝子株式会社 | Radiation angle conversion element and light-emitting device |
| CN114815003A (en) * | 2022-03-17 | 2022-07-29 | 成都国泰真空设备有限公司 | Optical film edge metallization treatment process |
-
2004
- 2004-02-10 JP JP2004033079A patent/JP3976018B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005228775A (en) | 2005-08-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0089044B1 (en) | A semiconductor device having a container sealed with a solder of low melting point | |
| WO2005086229A1 (en) | Light transmitting window member, semiconductor package provided with light transmitting window member and method for manufacturing light transmitting window member | |
| US20110114840A1 (en) | Encapsulating package, printed circuit board, electronic device and method for manufacturing encapsulating package | |
| US9157805B2 (en) | Infrared ray sensor package, infrared ray sensor module, and electronic device | |
| US9829391B2 (en) | Temperature sensor element | |
| US20090096048A1 (en) | Optical device and manufacturing method thereof and semiconductor device | |
| CN102997999A (en) | Infrared focal plane array detector | |
| JP2014142387A (en) | Package for optical element storage, optical filter device, optical module and electronic equipment | |
| JP3976018B2 (en) | Optical hermetic package | |
| JP2014082348A (en) | Package for storing optical element, optical filter device, optical module, and electronic apparatus | |
| JP4864364B2 (en) | Imaging unit for electronic endoscope | |
| US9484372B2 (en) | Substrate for embedding imaging device and method for manufacturing same, and imaging apparatus | |
| US20100078191A1 (en) | Hermetic seal and a method of manufacturing hermetic seal | |
| CN102956661B (en) | A kind of chip packaging method and encapsulating structure thereof | |
| US20060102923A1 (en) | Optical element housing package | |
| JP6279857B2 (en) | Electronic device, multi-cavity frame and multi-cavity electronic device | |
| KR20200108849A (en) | Ion-sensitive electrode, measuring unit and manufacturing method | |
| KR20200111690A (en) | Measuring unit and ion-sensitive electrode for ion-sensitive solid-state electrodes | |
| US6992844B2 (en) | System and method for providing a hermetically sealed lens and window assembly | |
| JP2008311429A (en) | Package and manufacturing method thereof | |
| JP6141684B2 (en) | Semiconductor device and method for manufacturing semiconductor device | |
| JPH05259420A (en) | Solid-state image sensor | |
| JP2019155566A (en) | MEMS element and its mounting structure | |
| JP2010175304A (en) | Method for manufacturing infrared sensor | |
| JPS6120379A (en) | Gas laser tube and its manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070227 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070426 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070529 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070611 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100629 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 3976018 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110629 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120629 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120629 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130629 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140629 Year of fee payment: 7 |
|
| EXPY | Cancellation because of completion of term |