JP4493204B2 - Single layer metal bond grindstone and manufacturing method thereof - Google Patents
Single layer metal bond grindstone and manufacturing method thereof Download PDFInfo
- Publication number
- JP4493204B2 JP4493204B2 JP2000377535A JP2000377535A JP4493204B2 JP 4493204 B2 JP4493204 B2 JP 4493204B2 JP 2000377535 A JP2000377535 A JP 2000377535A JP 2000377535 A JP2000377535 A JP 2000377535A JP 4493204 B2 JP4493204 B2 JP 4493204B2
- Authority
- JP
- Japan
- Prior art keywords
- abrasive grains
- super hard
- plating layer
- grindstone
- hard abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、超硬質砥粒(ダイヤモンド粒、CBN粒等)をメッキ処理により砥石ベース上に取り付けるようにしたメタルボンド砥石に関するものである。
【0002】
【従来の技術】
従来の技術について図4を基に説明する。超硬質砥粒(ダイヤモンド粒、CBN粒等)2を金属製部材で主にスチール材から成る砥石ベース1の表面から脱落しない程度の薄いメッキ層3で仮付けし、それをよく攪拌されている無電解メッキ(Ni−P等)溶内に浸し、所定時間後、砥石ベース1を取り出し、水洗いをする。
【0003】
この製造方法によると、超硬質砥粒2を仮付けメッキ層3で砥石ベース1の表面に仮付けし、その後、仮付けメッキ層3の上に超硬質砥粒2の高さを半分位埋める厚さになるまで本メッキ層4を無電解メッキ処理で施し、その本メッキ層4で超硬質砥粒2を砥石ベース1の表面上に電着させる。
【0004】
【発明が解決しようとする課題】
上記の従来の製造方法では、超硬質砥粒と本メッキ層との界面は、ぬれ性が悪く窪みが形成される。このため、超硬質砥粒と本メッキ層との付着性は不十分で、研削抵抗に対抗できるだけの超硬質砥粒の保持力が十分に得られない。
【0005】
また、超硬質砥粒の保持力を増すために、本メッキ層を超硬質砥粒の高さ50〜70%の層厚とすると、超硬質砥粒が本メッキ層から露出している突き出し高さが小さくなる。したがって、超硬質砥粒の使用範囲が小さくなり、研削抵抗の増加や砥石寿命の低下につながる。
【0006】
また、無電解メッキは、電解メッキよりも被覆材表面に均一にメッキ処理ができる利点はあるが、メッキを施すのに時間が大幅にかかるという欠点がある。
【0007】
本発明の目的は、超硬質砥粒の突き出し量が大きく、且つ、超硬質砥粒保持力が高い単層メタルボンド砥石及びその製造方法を提供することである。
【0008】
【課題を解決するための手段】
上記課題を解決するために、本発明においては次のような手段を講ずることとした。すなわち、超硬質砥粒を砥石ベースの表面上に固定させるために仮付けする工程と、超硬質砥粒が仮付けされた状態の砥石ベースに超音波振動を付加しながら無電解メッキ処理を用いて本メッキ層を析出させ超硬質砥粒を砥石ベースの表面上に電着させる工程と、からなるようにした。
【0009】
【発明の実施の形態】
本発明の実施の形態について、図1及び図2を基に説明する。図1(a)で示すように、砥石ベース1の表面上に超硬質砥粒(ダイヤモンド粒、CBN粒等)2を仮付けする。この砥石ベース1に超硬質砥粒2を仮付けする方法はいくつもある。例えば、従来から行われている接着剤を用いて仮付けする方法や、銅や亜鉛などを用いて仮付けする方法などがある。
ここでは、電解メッキ処理又は無電解メッキ処理により超硬質砥粒2が砥石ベース1から脱落しない程度の薄いメッキ層3を形成するものとする。砥石ベース1は、仮付けメッキ層3との接合性をよくするために、金属製部材で主にスチール材からできている。
【0010】
次に、上記の仮付けメッキ処理を施した砥石ベース1に本メッキ処理を施す。本メッキ処理を施す方法として、無電解メッキ処理を採用する。砥石ベース1に本メッキ処理を施すための装置図を図2に示す。
【0011】
図2に示す装置は、鉛直上下方向に動かすことのできるジャッキ11の上に攪拌機12が、さらにその上にはメッキ(Ni−P等)液で満たされたメッキ槽14が水平に置かれている。そのメッキ槽内には攪拌子13が入れられており、攪拌機12、攪拌子13によりメッキ槽内を攪拌できるようになっている。一方、その隣にメッキ槽14よりも高い位置に圧電超音波加振機15が水平に固定され、その一端には超音波ホーン16が取り付けられている。その先端には鉛直下向きに振動板17が取り付けられ、その振動板17の先端に上記砥石ベース1を取り付けることができる。圧電超音波加振機15は周波数発生器などの制御装置18により任意に振幅、周波数を与えることができる。
【0012】
次に、図2に示した装置を使用して砥石ベース1に本メッキ処理を施す方法を説明する。上記砥石ベース1を振動板17の先端に取り付け、取り付けられた砥石ベース1を、攪拌機12、攪拌子13でよく攪拌されている無電解メッキ槽14内に浸す。圧電超音波加振機15、超音波ホーン16を用いてある特定の振幅、周波数の超音波振動を振動板17に付加しながら、仮付けメッキ層3の上に本メッキ層4を析出させる。所定時間(本メッキ層4が超硬質砥粒2の高さの30〜50%の層厚になるように実験的に求められた時間)後、メッキ槽14から砥石ベース1を取り出し、水洗いをする。
【0013】
上記のようにして製造することにより図1(b)で示すように、超硬質砥粒2と本メッキ層4との界面のメッキ層が隆起し、本メッキ層4が超硬質砥粒2を包み込むように砥石ベース1の表面に超硬質砥粒2を電着する単層メタルボンド砥石が製造されることとなる。
【0014】
上記製造方法により超硬質砥粒と本メッキ層との界面のメッキ層が隆起し、砥石ベースの表面に超硬質砥粒が電着することを確認するために次の実験を試みた。
【0015】
まず、本発明の上記製造方法にしたがって、砥石ベースの表面上に超硬質砥粒を仮付けメッキ層により仮付けする。実験では、超硬質砥粒は粒度80/100のCBN砥石を使用し、砥石ベースは安価で形状加工がしやすくてメッキが容易なS45Cを用いた。この砥石ベースに超硬質砥粒を仮付けする方法は通常、電解メッキ処理で行うが本実験では無電解メッキ処理を用いた。次に、無電解Ni−Pメッキ処理を用いて、仮付けメッキ処理を施した砥石ベースに本メッキ処理を施す。そして、砥石ベースに付加する超音波振動は共振周波数18.3Hzに固定し、振幅の大きさは圧電超音波加振機への入力電圧を変化させることによって制御し、振幅を0μm、すなわち超音波振動を加えない場合と、振幅を8μmとして超音波振動を加えた場合とで、仮付けメッキ層の上に本メッキ層を析出させた。また、メッキ液の温度は90±1℃に保った。
【0016】
上記実験の結果として次の結果が得られた。すなわち、超音波振動を加えないで作製した試料(振幅0μm)と8μmの振幅の超音波を付加して作製した試料について、振幅0μmの試料では超硬質砥粒の周りが窪んでいるのに対して、振幅8μmの試料では超音波振動が超硬質砥粒と本メッキ層との界面に影響を与え、超硬質砥粒周辺に約10μmほどの盛り上がりを確認できた。
【0017】
また、超音波振動の振幅を0〜16μmと変化させて本メッキ層の成膜速度を測定した。その結果を図3に示す。つまり、超音波振動の振幅が8μmまでは振幅の増加に伴い成膜速度は向上し、振幅が8μmにおいて成膜速度は最大となり、通常の無電解メッキ処理工程と比べて本メッキ層の成膜速度は1.6倍となり、約2時間の時間短縮となる。しかし、振幅が8μmを越えると逆に成膜速度は低下し、振幅が14μm以降での成膜速度は振幅0μmのときより低下している。したがって、超音波振動の振幅が8μm前後にすることにより、本メッキ処理の成膜速度を最大とすることができ、振幅を0μmより大きく14μmより小さくすれば成膜速度を向上させることができる。
【0018】
なお、砥石ベースの形状は、板状、リング状外周、リング状内周、カップ型、総型砥石等あらゆる形状においても適応可能である。
【0019】
【発明の効果】
以上述べたように本発明によると、超音波振動を付加しながら本メッキ層を析出させることで、超硬質砥粒を包み込むように本メッキ層が析出するため、超硬質砥粒は研削抵抗に対して高い保持力が得られる。それゆえ、本メッキ層の層厚を薄くすることができる。
【0020】
また、本メッキ層の層厚を薄くすることができたことにより、超硬質砥粒が本メッキ層から露出している突き出し高さが大きくなる。したがって、超硬質砥粒の使用範囲が大きくなり、研削抵抗の低減や砥石寿命の向上につながる。
【0021】
さらに、振幅が0μmより大きく14μmより小さい超音波振動を付加しながら本メッキ層を析出させることにより、超硬質砥粒界面が活性化され、本メッキ層が析出しやすくなるので従来の無電解メッキ処理よりも短時間で超硬質砥粒を電着できる。
【図面の簡単な説明】
【図1】本発明方法において、(a)は超硬質砥粒を砥石ベースに仮付けした状態の説明図、(b)は砥石ベースの表面に超硬質砥粒が電着した状態の説明図
【図2】本発明方法におけて本メッキ処理を行うための装置図
【図3】本発明方法における実験結果で、振幅と本メッキ層の成膜速度の関係のグラフ
【図4】従来方法による砥石ベースの表面に超硬質砥粒を本メッキ処理した状態の説明図
【符号の説明】
1 砥石ベース
2 超硬質砥粒
3 仮付けメッキ層
4 本メッキ層
5 窪み
11 ジャッキ
12 攪拌機
13 攪拌子
14 メッキ槽
15 圧電超音波加振機
16 超音波ホーン
17 振動板
18 制御装置[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a metal bond grindstone in which superhard abrasive grains (diamond grains, CBN grains, etc.) are mounted on a grindstone base by plating.
[0002]
[Prior art]
A conventional technique will be described with reference to FIG. Super hard abrasive grains (diamond grains, CBN grains, etc.) 2 are temporarily attached with a thin plated
[0003]
According to this manufacturing method, the super hard abrasive grains 2 are temporarily attached to the surface of the grindstone base 1 with the
[0004]
[Problems to be solved by the invention]
In the above-described conventional manufacturing method, the interface between the superhard abrasive grains and the main plating layer has poor wettability and a dent is formed. For this reason, the adhesion between the super hard abrasive grains and the present plating layer is insufficient, and the holding power of the super hard abrasive grains that can counter the grinding resistance cannot be obtained sufficiently.
[0005]
Further, in order to increase the holding power of the super hard abrasive grains, when the plating layer has a layer thickness of 50 to 70% of the super hard abrasive grains, the protruding height at which the super hard abrasive grains are exposed from the main plating layer. Becomes smaller. Therefore, the use range of super hard abrasive grains is reduced, leading to an increase in grinding resistance and a reduction in the life of the grinding wheel.
[0006]
In addition, electroless plating has an advantage that the surface of the coating material can be uniformly plated over electrolytic plating, but has a drawback that it takes much time to perform plating.
[0007]
An object of the present invention is to provide a single-layer metal bond grindstone having a large amount of protrusion of superhard abrasive grains and a high retention strength of ultrahard abrasive grains, and a method for producing the same.
[0008]
[Means for Solving the Problems]
In order to solve the above problems, the following measures are taken in the present invention. That is, a process of temporarily attaching super hard abrasive grains to fix the surface of the grindstone base, and an electroless plating process while applying ultrasonic vibration to the grindstone base with the superhard abrasive grains temporarily attached. And the step of depositing the present plating layer and electrodepositing super hard abrasive grains on the surface of the grindstone base.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
An embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 1A, superhard abrasive grains (diamond grains, CBN grains, etc.) 2 are temporarily attached on the surface of the grindstone base 1. There are various methods for temporarily attaching the superhard abrasive grains 2 to the grindstone base 1. For example, there are a conventional method of temporary attachment using an adhesive and a method of temporary attachment using copper, zinc, or the like.
Here, it is assumed that the thin plated
[0010]
Next, the main plating process is performed on the grindstone base 1 subjected to the above-described temporary plating process. An electroless plating process is adopted as a method for performing the main plating process. An apparatus diagram for performing the main plating process on the grindstone base 1 is shown in FIG.
[0011]
In the apparatus shown in FIG. 2, a
[0012]
Next, a method for performing the main plating process on the grindstone base 1 using the apparatus shown in FIG. 2 will be described. The grindstone base 1 is attached to the tip of the
[0013]
By manufacturing as described above, as shown in FIG. 1B, the plating layer at the interface between the superhard abrasive grains 2 and the
[0014]
In order to confirm that the plating layer at the interface between the superhard abrasive grains and the main plating layer was raised by the above manufacturing method and the superhard abrasive grains were electrodeposited on the surface of the grindstone base, the following experiment was attempted.
[0015]
First, according to the manufacturing method of the present invention, superhard abrasive grains are temporarily attached to the surface of the grindstone base with a temporary plating layer. In the experiment, a CBN grindstone having a particle size of 80/100 was used as the superhard abrasive, and S45C was used as the grindstone base, which was inexpensive, easy to shape and easy to plate. The method of temporarily attaching super hard abrasive grains to the grindstone base is usually performed by electrolytic plating, but electroless plating was used in this experiment. Next, a main plating process is performed on the grindstone base that has been subjected to the temporary plating process using an electroless Ni-P plating process. The ultrasonic vibration applied to the grindstone base is fixed at a resonance frequency of 18.3 Hz, the amplitude is controlled by changing the input voltage to the piezoelectric ultrasonic vibrator, and the amplitude is 0 μm, that is, the ultrasonic wave The main plating layer was deposited on the temporary plating layer when no vibration was applied and when ultrasonic vibration was applied with an amplitude of 8 μm. The temperature of the plating solution was kept at 90 ± 1 ° C.
[0016]
The following results were obtained as a result of the above experiment. That is, a sample prepared without applying ultrasonic vibration (
[0017]
Further, the deposition rate of the present plating layer was measured by changing the amplitude of the ultrasonic vibration from 0 to 16 μm. The result is shown in FIG. That is, when the amplitude of the ultrasonic vibration is up to 8 μm, the film forming speed is improved as the amplitude is increased, and when the amplitude is 8 μm, the film forming speed is maximized, and this plating layer is formed as compared with the normal electroless plating process. The speed is 1.6 times, which is a time reduction of about 2 hours. However, when the amplitude exceeds 8 μm, the film forming speed is conversely reduced, and the film forming speed after the amplitude of 14 μm or later is lower than when the amplitude is 0 μm. Therefore, by setting the amplitude of the ultrasonic vibration to around 8 μm, the film forming speed of the main plating process can be maximized, and when the amplitude is made larger than 0 μm and smaller than 14 μm, the film forming speed can be improved.
[0018]
The shape of the grindstone base can be applied to all shapes such as a plate shape, a ring-shaped outer periphery, a ring-shaped inner periphery, a cup shape, and a general-purpose grindstone.
[0019]
【The invention's effect】
As described above, according to the present invention, by depositing the main plating layer while applying ultrasonic vibration, the main plating layer is deposited so as to wrap the super hard abrasive grains. On the other hand, high holding power can be obtained. Therefore, the layer thickness of the present plating layer can be reduced.
[0020]
Further, since the thickness of the main plating layer can be reduced, the protruding height at which the superhard abrasive grains are exposed from the main plating layer is increased. Therefore, the range of use of the super hard abrasive grains is increased, leading to a reduction in grinding resistance and an improvement in the grinding wheel life.
[0021]
Furthermore, by depositing the main plating layer while applying ultrasonic vibration with an amplitude larger than 0 μm and smaller than 14 μm, the interface of the super hard abrasive grains is activated and the main plating layer is likely to be deposited. Superhard abrasive grains can be electrodeposited in a shorter time than the treatment.
[Brief description of the drawings]
1A is an explanatory diagram of a state in which superhard abrasive grains are temporarily attached to a grindstone base, and FIG. 1B is an explanatory diagram of a state in which superhard abrasive grains are electrodeposited on the surface of a grindstone base. FIG. 2 is an apparatus diagram for performing the main plating process in the method of the present invention. FIG. 3 is a graph showing the relationship between the amplitude and the deposition rate of the main plating layer in the experimental results of the method of the present invention. Explanatory diagram of the state of the main plating treatment of the super hard abrasive grains on the surface of the grindstone base
DESCRIPTION OF SYMBOLS 1 Grinding wheel base 2 Super hard
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000377535A JP4493204B2 (en) | 2000-12-12 | 2000-12-12 | Single layer metal bond grindstone and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000377535A JP4493204B2 (en) | 2000-12-12 | 2000-12-12 | Single layer metal bond grindstone and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002178266A JP2002178266A (en) | 2002-06-25 |
| JP4493204B2 true JP4493204B2 (en) | 2010-06-30 |
Family
ID=18846243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000377535A Expired - Fee Related JP4493204B2 (en) | 2000-12-12 | 2000-12-12 | Single layer metal bond grindstone and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4493204B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4871543B2 (en) * | 2005-08-01 | 2012-02-08 | 株式会社アライドマテリアル | Electrodeposition grinding wheel manufacturing method |
| WO2007039934A1 (en) * | 2005-12-27 | 2007-04-12 | Japan Fine Steel Co., Ltd. | Fixed abrasive wire |
| KR100806371B1 (en) * | 2006-05-22 | 2008-02-27 | 재팬 파인 스틸 컴퍼니 리미티드 | Fixed abrasive wire |
| JP2008155362A (en) * | 2006-12-01 | 2008-07-10 | Shinshu Univ | Electrodeposited diamond tool and manufacturing method thereof |
| JP5066508B2 (en) * | 2008-11-19 | 2012-11-07 | 株式会社リード | Fixed abrasive wire saw |
| JP5629851B2 (en) * | 2010-10-01 | 2014-11-26 | 山形県 | Composite plating processing method and processing apparatus |
| JP6194529B2 (en) * | 2014-04-10 | 2017-09-13 | 株式会社竹沢精機 | Honing reamer, processing device using the same, and manufacturing method of honing reamer |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61226269A (en) * | 1985-03-29 | 1986-10-08 | Matsutani Seisakusho:Kk | Abrasive grain sticking method |
| JPH02125850A (en) * | 1988-11-02 | 1990-05-14 | Kawasaki Steel Corp | Continuous hot dip galvanizing method |
| JPH0569330A (en) * | 1991-09-12 | 1993-03-23 | Toyoda Mach Works Ltd | Manufacture of electrodeposited grinding wheel |
| JPH0639729A (en) * | 1992-05-29 | 1994-02-15 | Canon Inc | Fine grinding wheel and method for manufacturing the same |
| JPH06114739A (en) * | 1992-10-09 | 1994-04-26 | Mitsubishi Materials Corp | Electroplated whetstone |
| JPH06212441A (en) * | 1993-01-20 | 1994-08-02 | Hitachi Cable Ltd | Electroless plating method and electroless plating apparatus |
| JPH10146763A (en) * | 1996-11-15 | 1998-06-02 | Toyota Banmotsupusu Kk | Metal bond grinding wheel and manufacture thereof |
| JP2000198072A (en) * | 1999-01-08 | 2000-07-18 | Mitsubishi Materials Corp | Whetstone |
-
2000
- 2000-12-12 JP JP2000377535A patent/JP4493204B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002178266A (en) | 2002-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0639729A (en) | Fine grinding wheel and method for manufacturing the same | |
| JP4493204B2 (en) | Single layer metal bond grindstone and manufacturing method thereof | |
| JPH06114739A (en) | Electroplated whetstone | |
| CN104032342B (en) | A kind of method improving Sintered NdFeB magnet and electrodeposited coating adhesion | |
| JP2003532549A (en) | Nickel / diamond coated saw wire with improved fixation of diamond particles | |
| CN104152972A (en) | Manufacturing method for diamond wire saw | |
| US4302300A (en) | Method of manufacture of abrasive tools having metal galvanic bond material | |
| JP5734730B2 (en) | Polishing cloth dresser | |
| JP5957317B2 (en) | Dresser for polishing cloth and method for producing the same | |
| Okumiya et al. | Creation of high strength bonded abrasive wheel with ultrasonic aided composite plating | |
| JP2504418B2 (en) | Grinding stone manufacturing method | |
| JP2001107260A (en) | Electrodepositing tool | |
| US2505196A (en) | Method for making abrasive articles | |
| US5312540A (en) | Method of and apparatus for producing a grinder used for a grinding machine and grinding-particles packing apparatus | |
| US3588992A (en) | Manufacturing process for a metal bonded porous substance, particularly a tool made of said substance | |
| JP2002166370A (en) | Electrodeposited grinding wheel and method of manufacturing the same | |
| JP2009101441A (en) | Electroformed carrier and manufacturing method thereof | |
| CN1238573C (en) | Method for making electroplated diamond tool by diamond surface activation | |
| KR100367927B1 (en) | Manufacturing process for grinder in planting diamond | |
| JP4470569B2 (en) | Electrodeposition grinding wheel manufacturing method | |
| CN116160061B (en) | Manufacturing method of diamond improved wire | |
| JP2806674B2 (en) | Method and apparatus for manufacturing grinding wheel for grinding machine | |
| JP2634985B2 (en) | Whetstone manufacturing method and abrasive grain filling device | |
| JP5665558B2 (en) | Method for manufacturing fixed abrasive wire | |
| JP3295575B2 (en) | Cubic BN fine particles with two-layer metal plating and method for producing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20060228 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071107 |
|
| TRDD | Decision of grant or rejection written | ||
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100325 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100330 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100406 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4493204 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130416 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140416 Year of fee payment: 4 |
|
| LAPS | Cancellation because of no payment of annual fees |