JP5079375B2 - Surface treatment method for hydrogen embrittlement resistance evaluation test piece - Google Patents
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本発明は、金属材料、特に鋼材の耐水素脆化特性を評価する方法、特に、限界拡散性水素量を測定する方法に関するものである。 The present invention relates to a method for evaluating the hydrogen embrittlement resistance of a metal material, particularly a steel material, and particularly to a method for measuring the amount of critical diffusible hydrogen.
金属材料は高強度であるほど水素脆化を引き起こす可能性が高い。特に、高強度鋼の開発では、水素脆化の一種である遅れ破壊特性の優れた鋼材に関する提案がなされている(例えば、特許文献1〜3)。
The higher the strength of the metal material, the higher the possibility of causing hydrogen embrittlement. In particular, in the development of high-strength steel, proposals have been made regarding steel materials having excellent delayed fracture characteristics, which is a kind of hydrogen embrittlement (for example,
また、様々の耐水素脆化特性の評価方法が提案されており、特許文献1には限界拡散性水素量を測定する方法が、特許文献2は遅れ破壊強度を求める方法が、および特許文献3には、定荷重試験により破断時間を求める方法が用いられている。耐水素脆化特性の評価では、試験片に水素を強制的に含有させるため、電解や高温高圧の水素雰囲気内で保持する水素チャージが施される。その後、めっきを施すことによって試験中に試験片からの水素の放出を抑制する。
Various evaluation methods for hydrogen embrittlement resistance have been proposed.
特許文献1では、水素の放出の防止にカドミウムめっきが用いられている。しかし、カドミウムは有害であることから、安全および環境の観点からその取扱には細心の注意を必要とする短所がある。これに対し、亜鉛めっきによって水素の放散を抑制する方法が提案されている(例えば、非特許文献1、特許文献4)。非特許文献1では硫酸亜鉛浴による亜鉛めっきを利用した方法、特許文献4では塩化アンモン浴による亜鉛めっきを利用した方法が提案されている。
In
本発明者らが、これらの亜鉛めっき方法を検討した結果、従来の方法では、鋼種や試験片形状によっては水素放出防止能力が不充分であることが判明した。本発明は、水素脆化が発生しない最大の水素量である限界拡散性水素量の測定、定荷重負荷による遅れ破壊特性の評価など、耐水素脆化特性を評価する方法において、試験片の材質、形状に影響を受けることなく、試験中の水素放出量が極めて少ない亜鉛めっきを試験片の表面に効率良く施す方法の提供を課題とする。 As a result of studying these galvanizing methods by the present inventors, it has been found that the conventional method has insufficient hydrogen release preventing ability depending on the steel type and the shape of the test piece. The present invention relates to a method for evaluating the resistance to hydrogen embrittlement, such as measurement of critical diffusible hydrogen, which is the maximum amount of hydrogen that does not cause hydrogen embrittlement, and evaluation of delayed fracture characteristics under constant load loading. It is an object of the present invention to provide a method for efficiently applying galvanizing to the surface of a test piece, which is not affected by the shape and has an extremely small amount of hydrogen release during the test.
本発明の耐水素脆化特性評価試験片の表面処理方法は、金属材料、特に鋼材からなる試験片に陰極チャージによって水素をチャージした後、水素の放散を抑制するために、適正な条件で亜鉛めっきを施すものである。また、この試験片を用いれば、引張強度の数十パーセントの定荷重引張応力を負荷し、破断に至る最大の拡散性水素量を決定することができる。本発明の要旨とするところは以下のとおりである。
(1) 水素を含有させた金属材料からなる試験片に、
ZnCl2:80g/l超300g/l以下、
光沢剤:10〜50ml/l、
NH4Cl、KClの一方または双方の合計:100〜300g/l
を含むめっき浴中で電気めっきを施した後、水素脆化特性評価試験を行うことを特徴とする耐水素脆化特性評価試験片の表面処理方法。
(2) 試験片が、ねじ部を有することを特徴とする上記(1)に記載の耐水素脆化特性評価試験片の表面処理方法。
(3) 試験片が切欠き部、穴の一方または双方を有することを特徴とする上記(1)または(2)記載の耐水素脆化特性評価試験片の表面処理方法。
(4) 陰極電流密度が0.5〜50A/dm2であることを特徴とする上記(1)〜(3)の何れか1項に記載の耐水素脆化特性評価試験片の表面処理方法。
(5) めっき浴の温度が10〜60℃であることを特徴とする上記(1)〜(4)の何れか1項に記載の耐水素脆化特性評価試験片の表面処理方法。
(6) めっき浴のpHが4.5〜6.5であることを特徴とする上記(1)〜(5)の何れか1項に記載の耐水素脆化特性評価試験片の表面処理方法。
(7) めっき時間が1〜30分であることを特徴とする上記(1)〜(6)の何れか1項に記載の耐水素脆化特性評価試験片の表面処理方法。
(8) 試験片が鋼材からなることを特徴とする上記(1)〜(7)の何れか1項に記載の耐水素脆化特性評価試験片の表面処理方法。
According to the surface treatment method of the hydrogen embrittlement resistance evaluation test piece of the present invention, a test piece made of a metal material, particularly a steel material, is charged with hydrogen by cathodic charging, and then zinc is applied under appropriate conditions in order to suppress hydrogen diffusion. Plating is performed. Moreover, if this test piece is used, the maximum amount of diffusible hydrogen leading to fracture can be determined by applying a constant load tensile stress of several tens of percent of the tensile strength. The gist of the present invention is as follows.
(1) To a test piece made of a metal material containing hydrogen,
ZnCl 2 : more than 80 g / l and 300 g / l or less,
Brightener: 10-50 ml / l,
Sum of one or both of NH 4 Cl and KCl: 100 to 300 g / l
A surface treatment method for a hydrogen embrittlement characteristic evaluation test piece, characterized by performing a hydrogen embrittlement characteristic evaluation test after electroplating in a plating bath containing.
(2) The surface treatment method for a hydrogen embrittlement resistance evaluation test piece according to (1) above, wherein the test piece has a threaded portion.
(3) The surface treatment method for a hydrogen embrittlement resistance evaluation test piece according to the above (1) or (2), wherein the test piece has one or both of a notch and a hole.
(4) The surface treatment method for hydrogen embrittlement resistance evaluation test piece according to any one of (1) to (3) above, wherein the cathode current density is 0.5 to 50 A / dm 2. .
(5) The surface treatment method for a hydrogen embrittlement resistance evaluation test piece according to any one of (1) to (4) above, wherein the temperature of the plating bath is 10 to 60 ° C.
(6) The surface treatment method for hydrogen embrittlement resistance evaluation test piece according to any one of (1) to (5) above, wherein the pH of the plating bath is 4.5 to 6.5 .
(7) The surface treatment method for a hydrogen embrittlement resistance evaluation test piece according to any one of (1) to (6) above, wherein the plating time is 1 to 30 minutes.
(8) The surface treatment method for a hydrogen embrittlement resistance evaluation test piece according to any one of (1) to (7) above, wherein the test piece is made of a steel material.
本発明によれば、カドミウムめっきを用いた方法より安全かつ環境負荷が低く、かつ従来よりも試験中の水素放出防止能力が高い亜鉛めっきを施した試験片を用いた限界拡散性水素量の測定、定荷重試験などの遅れ破壊試験を、高精度かつ高効率で行うことが可能な、耐水素脆化特性の評価方法を提供することが可能になり、産業上の貢献が極めて顕著である。 According to the present invention, the measurement of the critical diffusible hydrogen amount using a galvanized test piece which is safer and less burdensome on the environment than the method using cadmium plating and has a higher ability to prevent hydrogen release during the test than before. In addition, it is possible to provide a method for evaluating hydrogen embrittlement resistance capable of performing delayed fracture tests such as constant load tests with high accuracy and high efficiency, and the industrial contribution is extremely remarkable.
本発明の耐水素脆化特性評価試験片の表面処理方法は、水素チャージなどによって水素を吸蔵させた試験片の表面に亜鉛めっきを施すものである。これにより、試験前および試験中に試験片からの水素の放出を防止し、耐水素脆化特性を正確に求めることができる。 The surface treatment method for a hydrogen embrittlement resistance evaluation test piece of the present invention is to perform galvanization on the surface of a test piece that has occluded hydrogen by hydrogen charging or the like. Thereby, the release of hydrogen from the test piece can be prevented before and during the test, and the hydrogen embrittlement resistance can be accurately obtained.
試験前にあらかじめ水素チャージし、めっきを施した後の耐水素脆化特性を評価する試験方法の一例として限界拡散性水素量の測定方法を説明する。陰極チャージによって水素を試験片に吸蔵させ、亜鉛めっきを施した後、定荷重負荷試験を行い、破断または一定時間経過後(例えば100時間後)直ちに回収し、ガスクロマトグラフィー等によって鋼中水素量を求める。陰極チャージ時に電流密度を変化させることにより吸蔵水素量を変化させ、破断しない最大の水素量を限界拡散性水素量と定義し、耐水素脆化特性を評価する。 A method for measuring the amount of critical diffusible hydrogen will be described as an example of a test method for evaluating the hydrogen embrittlement resistance after hydrogen charging and plating before the test. Hydrogen is occluded in the test piece by cathodic charging, galvanized, and then subjected to a constant load test, recovered immediately after breaking or after a certain time (for example, after 100 hours), and the amount of hydrogen in steel by gas chromatography etc. Ask for. The amount of occluded hydrogen is changed by changing the current density during cathode charging, and the maximum amount of hydrogen that does not break is defined as the critical diffusible hydrogen amount, and the hydrogen embrittlement resistance is evaluated.
本発明の表面処理方法におけるめっき浴組成の限定理由について述べる。 The reason for limiting the plating bath composition in the surface treatment method of the present invention will be described.
ZnCl2は、亜鉛めっきの主成分である亜鉛を供給するために添加するが、添加量が80g/l以下であると、めっきの付着量が不均一になり、特に、付着量が少ない部分では、つき廻りや被覆力が低下するため、水素放出防止能力が低い。一方、ZnCl2の添加量が、300g/lを超えると均一電着性が劣化するため、均一なめっきを付与することができず、水素放出防止能力が低下するため、80g/l超300g/l以下の範囲に限定した。 ZnCl 2 is added to supply zinc, which is the main component of galvanizing, but if the amount added is 80 g / l or less, the amount of plating deposited becomes non-uniform, especially in parts where the amount of adhesion is small. , Since the throwing power and covering power are reduced, the hydrogen release preventing ability is low. On the other hand, when the addition amount of ZnCl 2 exceeds 300 g / l, the uniform electrodeposition deteriorates, so that uniform plating cannot be applied, and the ability to prevent hydrogen release decreases, so that over 80 g / l and over 300 g / l. The range was limited to 1 or less.
光沢剤は、均一電着性を向上させるために添加するものであり、汎用の光沢剤を用いれば良いが、添加量が10ml/l未満であると均一電着性が劣るため均一なめっきを付与することができず、水素放出防止能力が低下する。一方、50ml/lを越えて光沢剤を添加するとめっきがもろくなり水素放出防止能力が低下するため、10〜50ml/lの範囲に限定した。 The brightener is added to improve the throwing power, and a general-purpose brightening agent may be used. However, if the added amount is less than 10 ml / l, the throwing power is inferior and uniform plating is required. Cannot be imparted, and the ability to prevent hydrogen release is reduced. On the other hand, if the brightener is added in excess of 50 ml / l, the plating becomes brittle and the ability to prevent hydrogen release decreases, so it was limited to the range of 10-50 ml / l.
更に、KCl、NH4Clの一方または双方を、めっき液の電導性をよくするために加える。KCl、NH4Clの一方または双方の添加量が、100g/l未満であるとつき廻りや被覆力が低下するため十分な水素放出防止能力が得られず、300g/lを超えてもつき廻りや被覆力が低下することによって水素放出防止能力が低下するため、100〜300g/lの範囲に限定した。 Further, one or both of KCl and NH 4 Cl are added to improve the conductivity of the plating solution. If the amount of one or both of KCl and NH 4 Cl added is less than 100 g / l, the throwing power and covering power will be reduced, so that sufficient hydrogen release preventing ability cannot be obtained. In addition, since the ability to prevent hydrogen release decreases due to a decrease in covering power, the amount is limited to a range of 100 to 300 g / l.
試験片の形状は特に限定せず、丸棒、更に、ねじ部、ノッチを有する試験片の何れでも良い。上述の本発明のめっき浴はつき廻り性が良好であるため、特に、形状が不均一な試験片、例えば、ねじ部、ノッチ、穴を有する試験片でも、特定の部位のめっき付着量が減少することがなく、試験片の形状に依らず、水素の放散を確実に抑制することができる。特に、ねじ部や穴を有する試験片を用いれば、様々な定荷重負荷形式の試験の実施が可能になる。さらに、ノッチを有する試験片での遅れ破壊試験は応力集中率の異なる試験を実施することができ、実際の部品を模擬した試験が可能となる。 The shape of the test piece is not particularly limited, and any of a round bar, a test piece having a threaded portion, and a notch may be used. Since the plating bath of the present invention described above has good throwing power, the amount of plating deposited on a specific part is reduced even in the case of a test piece having a non-uniform shape, for example, a test piece having a threaded portion, a notch or a hole. Therefore, it is possible to reliably suppress hydrogen emission regardless of the shape of the test piece. In particular, if a test piece having a threaded portion or a hole is used, various types of constant load test can be performed. Further, the delayed fracture test with a test piece having a notch can perform tests with different stress concentration rates, and a test simulating an actual part can be performed.
陰極電流密度は、0.5A/dm2未満でめっきを行うと均一電着性が劣化するため、めっきが不均一になり、水素放出防止能力が低下することがある。また、50A/dm2を超える陰極電流密度でめっきを行うとめっき中にピンホールを生じ、十分な水素放出防止能力が得られないことがある。そのため、緻密で均一なめっきを付与するには、陰極電流密度を0.5〜50A/dm2の範囲とすることが好ましい。 When the cathode current density is less than 0.5 A / dm 2 , the uniform electrodeposition deteriorates, so that the plating becomes non-uniform and the ability to prevent hydrogen release may decrease. Further, if plating is performed at a cathode current density exceeding 50 A / dm 2 , pinholes may be generated during plating, and sufficient hydrogen release preventing ability may not be obtained. Therefore, to impart a dense and uniform plating is preferably in the range of cathode current density of 0.5~50A / dm 2.
めっき浴の浴温は、10℃未満、または60℃超でめっきを行うと、均一電着性が低下する。そのため、めっきが不均一になり、水素放出防止能力が低下することがある。したがって、めっき浴の浴温は10〜60℃の範囲とすることが好ましい。 When plating is performed at a bath temperature of less than 10 ° C. or more than 60 ° C., the throwing power decreases. Therefore, the plating becomes non-uniform, and the ability to prevent hydrogen release may be reduced. Therefore, the bath temperature of the plating bath is preferably in the range of 10 to 60 ° C.
めっき浴のpHは、4.5未満であるとつき廻りや被覆力が低下し、水素放出防止能力が不十分になることがある。また、めっき浴のpHが6.5を超えてもつき廻りや被覆力が低下したり、白色沈殿が生じることがあるため、4.5〜6.5の範囲とすることが好ましい。 If the pH of the plating bath is less than 4.5, the throwing power and covering power may be reduced, and the hydrogen release preventing ability may be insufficient. Further, even if the pH of the plating bath exceeds 6.5, the throwing power and covering power may be reduced, and white precipitation may occur. Therefore, the range of 4.5 to 6.5 is preferable.
めっき時間は、1分未満であるとめっき浴の組成によっては、水素放出防止のための十分な亜鉛めっきの被覆が得られないことがあるため、1分以上とすることが好ましい。また、めっき時間が30分を超えると水素放出防止能力は飽和し作業効率が悪くなる。さらに、ねじ部を有する試験片では、めっき厚が適正値を超えると試験片をねじ込み治具に取り付けられなくなる不具合も生じる。したがって、めっき時間は30分以下が望ましい。 If the plating time is less than 1 minute, depending on the composition of the plating bath, a sufficient galvanized coating for preventing hydrogen release may not be obtained. On the other hand, when the plating time exceeds 30 minutes, the ability to prevent hydrogen release is saturated and the work efficiency deteriorates. Furthermore, in the test piece having a threaded portion, if the plating thickness exceeds an appropriate value, there is a problem that the test piece cannot be attached to the screwing jig. Therefore, the plating time is desirably 30 minutes or less.
1000MPa級鋼材を図1または図2に示す試験片に加工し、電界陰極チャージによって鋼中に水素をチャージした。陰極電界チャージは3% NaCl+3g/l NH4SCN水溶液中に試験片を浸し、0.5mA/cm2の電流密度で18hr行った。その後、表1に示す条件にて亜鉛めっきを施した。めっきの光沢剤は汎用の塩化亜鉛浴用光沢剤を用いた。めっき後、100hr室温にて放置した後にめっきを除去し、ただちにガスクロマトグラフィーを用いた昇温水素分析によって鋼中に残存する水素量を測定した。また、予備試験として、めっき後放置せずにただちにめっき除去し昇温水素分析をした結果、残存する水素量は2.6ppmであった。 A 1000 MPa class steel material was processed into the test piece shown in FIG. 1 or FIG. 2, and hydrogen was charged into the steel by field cathode charging. The cathode electric field charge was performed for 18 hours at a current density of 0.5 mA / cm 2 by immersing the test piece in a 3% NaCl + 3 g / l NH 4 SCN aqueous solution. Thereafter, galvanization was performed under the conditions shown in Table 1. As the plating brightener, a general-purpose zinc chloride bath brightener was used. After plating, the plate was removed after standing at room temperature for 100 hr, and immediately, the amount of hydrogen remaining in the steel was measured by temperature-programmed hydrogen analysis using gas chromatography. Further, as a preliminary test, the plating was immediately removed without leaving after plating, and the temperature rising hydrogen analysis was performed. As a result, the amount of remaining hydrogen was 2.6 ppm.
本発明を検討する際に、陰極水素チャージ後、非特許文献1に記載されているような硫酸亜鉛浴や特許文献4に記載されている条件の塩化アンモン浴を用いてめっきを行い、100hr室温放置後の水素量を測定したが、いずれも2.6ppm未満の水素量であり、水素放出防止能力が不十分であった。その原因としては、マクロな外観観察からねじ部や切欠き部および穴において亜鉛めっきのつき廻りが不十分であることが考えられる。すなわち、これらのめっき浴はつき廻り特性が不十分であることが明らかとなった。これを踏まえ、つき廻り特性に優れ、水素放出防止能力に優れる浴組成およびめっき条件を探索した結果を以下に示す。
In studying the present invention, after cathodic hydrogen charging, plating is performed using a zinc sulfate bath as described in
表1のNo.1〜17は本発明例であり、残存する水素量は2.6ppmで減少しておらず、すなわち水素放出防止能力が十分優れている。 No. in Table 1 1 to 17 are examples of the present invention, and the remaining hydrogen amount is not reduced at 2.6 ppm, that is, the hydrogen release preventing ability is sufficiently excellent.
No.18〜24は、本発明例ではあるが、めっきの浴温、pH、陰極電流密度、めっき時間のうち少なくとも1つを好ましい範囲外とした例である。No.18は浴温が10℃未満であり、No.19は浴温が60℃を超えているため、残存する水素量がやや減少している。No.20はめっき浴のpHが4.5未満であり、No.21はめっき浴のpHが6.5を超えているため、残存する水素量がやや減少している。No.22は、めっきの陰極電流密度を0.5A/dm2未満とした例である。No.23はめっきの陰極電流密度が50A/dm2を超えており、No.24は、めっき時間が1分よりも短く、残存する水素量がやや減少している。 No. 18 to 24 are examples of the present invention, but are examples in which at least one of the plating bath temperature, pH, cathode current density, and plating time is out of the preferred range. No. No. 18 has a bath temperature of less than 10 ° C. Since the bath temperature of No. 19 exceeds 60 ° C., the amount of remaining hydrogen is slightly reduced. No. No. 20 has a plating bath pH of less than 4.5. In No. 21, since the pH of the plating bath exceeds 6.5, the amount of remaining hydrogen is slightly reduced. No. No. 22 is an example in which the cathode current density of plating is less than 0.5 A / dm 2 . No. No. 23 has a cathode current density of plating exceeding 50 A / dm 2 . In No. 24, the plating time is shorter than 1 minute, and the amount of remaining hydrogen is slightly reduced.
一方、No.25〜33は比較例であり、ZnCl2、光沢剤、NH4Cl、KClのうち少なくとも1つの濃度が本発明の範囲外である。No.25は、ZnCl2濃度が80g/l未満であり、残存する水素量が減少している。No.26はZnCl2濃度が80g/l未満およびめっきの陰極電流密度が0.5A/dm2未満であるため、残存する水素量が減少している。No.27はZnCl2濃度が300g/l超およびめっきの陰極電流密度が50A/dm2を超えており、めっき時間が1分未満のため、残存する水素量が少なかった。 On the other hand, no. 25-33 are comparative examples, ZnCl 2, brighteners, NH 4 Cl, at least one concentration of the KCl which is outside the scope of the present invention. No. No. 25 has a ZnCl 2 concentration of less than 80 g / l, and the amount of remaining hydrogen is reduced. No. In No. 26, since the ZnCl 2 concentration is less than 80 g / l and the cathode current density of plating is less than 0.5 A / dm 2 , the amount of remaining hydrogen is reduced. No. In No. 27, the ZnCl 2 concentration exceeded 300 g / l, the cathode current density of plating exceeded 50 A / dm 2 , and the plating time was less than 1 minute, so the amount of remaining hydrogen was small.
No.28はNH4Cl濃度が100g/l未満であり、No.29はNH4Cl濃度が300g/lを超えているため、残存する水素量が少なかった。No.30はKCl濃度が100g/l未満であり、No.31はNH4Cl濃度が300g/lを超えているため、残存する水素量が少なかった。No.32は光沢剤の量が10ml/l未満であり、No.33は光沢剤の量が50ml/lを超えているため、残存する水素量が少なかった。 No. No. 28 has an NH 4 Cl concentration of less than 100 g / l. In No. 29, the NH 4 Cl concentration exceeded 300 g / l, so the amount of remaining hydrogen was small. No. No. 30 has a KCl concentration of less than 100 g / l. Since the NH 4 Cl concentration of No. 31 exceeded 300 g / l, the amount of remaining hydrogen was small. No. No. 32 has a brightener amount of less than 10 ml / l. Since the amount of brightener No. 33 exceeded 50 ml / l, the amount of remaining hydrogen was small.
表1のNo.6のめっき液を用いて、1000MPa級の本試験材の遅れ破壊試験を実施した。試験片形状は図1と図2に示すものを用い、陰極チャージ後にめっきを行い、引張強さの90%の定荷重を負荷し、破断しない最大の水素量(限界拡散性水素量HC)を求めた。その結果、この条件における当該材の限界拡散性水素量HCは1.2ppmであり、また図3に示した破断したA点と未破断のB点において水素量の差が鋼中の水素量の10%以内であることから、試験中に水素は放出しておらず、的確に限界拡散性水素量が求められているものと考えられる。 No. in Table 1 Using the plating solution No. 6, a 1000 MPa class test material was subjected to a delayed fracture test. The specimen shape shown in FIGS. 1 and 2 is used. After the cathode is charged, plating is performed, a constant load of 90% of the tensile strength is applied, and the maximum hydrogen amount that does not break (limit diffusible hydrogen amount H C ) Asked. As a result, the critical diffusible hydrogen amount H C of the material under this condition is 1.2 ppm, and the difference in hydrogen amount between the broken point A and the unbroken point B shown in FIG. 3 is the amount of hydrogen in the steel. Therefore, it is considered that hydrogen was not released during the test, and that the amount of limit diffusible hydrogen was precisely required.
Claims (8)
ZnCl2:90g/l以上300g/l以下、
光沢剤:10〜50ml/l、
NH4Cl、KClの一方または双方を合計で100〜300g/l
を含むめっき浴中で
陰極電流密度が0.4〜55A/dm2、めっき浴の温度が5〜70℃、めっき浴のpHが4.0〜6.6、めっき時間が0.9分以上で、
電気めっきを施すことを特徴とする耐水素脆化特性評価試験片の表面処理方法。 To a test piece made of a metal material containing hydrogen,
ZnCl 2 : 90 g / l or more and 300 g / l or less,
Brightener: 10-50 ml / l,
One or both of NH 4 Cl and KCl in total 100 to 300 g / l
Cathode current density is 0.4 to 55 A / dm 2 , plating bath temperature is 5 to 70 ° C., plating bath pH is 4.0 to 6.6, and plating time is 0.9 minutes or more. so,
A surface treatment method for a hydrogen embrittlement resistance evaluation test piece, characterized by performing electroplating.
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