JP5191682B2 - Phenol derivative having anthracene residue in side chain and method for producing the same - Google Patents
Phenol derivative having anthracene residue in side chain and method for producing the same Download PDFInfo
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- JP5191682B2 JP5191682B2 JP2007103805A JP2007103805A JP5191682B2 JP 5191682 B2 JP5191682 B2 JP 5191682B2 JP 2007103805 A JP2007103805 A JP 2007103805A JP 2007103805 A JP2007103805 A JP 2007103805A JP 5191682 B2 JP5191682 B2 JP 5191682B2
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- phenol derivative
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- 150000002989 phenols Chemical class 0.000 title claims description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 125000005577 anthracene group Chemical group 0.000 title description 4
- 238000006243 chemical reaction Methods 0.000 claims description 33
- 230000003287 optical effect Effects 0.000 claims description 28
- 150000001875 compounds Chemical class 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 23
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 125000000962 organic group Chemical group 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052794 bromium Inorganic materials 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 7
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 6
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 claims description 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical group II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 239000012788 optical film Substances 0.000 claims description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052740 iodine Chemical group 0.000 claims description 2
- 239000011630 iodine Chemical group 0.000 claims description 2
- 238000002211 ultraviolet spectrum Methods 0.000 description 37
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 30
- 238000006317 isomerization reaction Methods 0.000 description 26
- 239000002904 solvent Substances 0.000 description 25
- 229920000642 polymer Polymers 0.000 description 24
- 238000006116 polymerization reaction Methods 0.000 description 22
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 20
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 229910052739 hydrogen Inorganic materials 0.000 description 18
- 239000007787 solid Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 10
- 150000002148 esters Chemical class 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 238000000746 purification Methods 0.000 description 8
- 238000001226 reprecipitation Methods 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 235000002597 Solanum melongena Nutrition 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 5
- 238000007699 photoisomerization reaction Methods 0.000 description 5
- XGWFJBFNAQHLEF-UHFFFAOYSA-N 9-anthroic acid Chemical compound C1=CC=C2C(C(=O)O)=C(C=CC=C3)C3=CC2=C1 XGWFJBFNAQHLEF-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 239000002274 desiccant Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000003446 ligand Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- RZRJYURCNBXIST-UHFFFAOYSA-N 2-anthroic acid Chemical compound C1=CC=CC2=CC3=CC(C(=O)O)=CC=C3C=C21 RZRJYURCNBXIST-UHFFFAOYSA-N 0.000 description 3
- YOCIJWAHRAJQFT-UHFFFAOYSA-N 2-bromo-2-methylpropanoyl bromide Chemical compound CC(C)(Br)C(Br)=O YOCIJWAHRAJQFT-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical class OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003708 ampul Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000011907 photodimerization Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- -1 calixarene compound Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical class C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 125000000468 ketone group Chemical group 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 2
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 238000001542 size-exclusion chromatography Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 238000010257 thawing Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- MTCFGRXMJLQNBG-REOHCLBHSA-N (2S)-2-Amino-3-hydroxypropansäure Chemical compound OC[C@H](N)C(O)=O MTCFGRXMJLQNBG-REOHCLBHSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- MXZROAOUCUVNHX-UHFFFAOYSA-N 2-Aminopropanol Chemical compound CCC(N)O MXZROAOUCUVNHX-UHFFFAOYSA-N 0.000 description 1
- RQMWVVBHJMUJNZ-UHFFFAOYSA-N 4-chloropyridin-2-amine Chemical group NC1=CC(Cl)=CC=N1 RQMWVVBHJMUJNZ-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- 241001120493 Arene Species 0.000 description 1
- 229930008564 C01BA04 - Sparteine Natural products 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical class NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- SLRCCWJSBJZJBV-UHFFFAOYSA-N alpha-isosparteine Natural products C1N2CCCCC2C2CN3CCCCC3C1C2 SLRCCWJSBJZJBV-UHFFFAOYSA-N 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical compound C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- VTJUKNSKBAOEHE-UHFFFAOYSA-N calixarene Chemical group COC(=O)COC1=C(CC=2C(=C(CC=3C(=C(C4)C=C(C=3)C(C)(C)C)OCC(=O)OC)C=C(C=2)C(C)(C)C)OCC(=O)OC)C=C(C(C)(C)C)C=C1CC1=C(OCC(=O)OC)C4=CC(C(C)(C)C)=C1 VTJUKNSKBAOEHE-UHFFFAOYSA-N 0.000 description 1
- YVGKLVZOQWYWTI-UHFFFAOYSA-N calixresorc[4]arene Chemical compound C1C(C(=CC=2O)O)=CC=2CC(C(=CC=2O)O)=CC=2CC(=C2)C(O)=CC(O)=C2CC2=CC1=C(O)C=C2O YVGKLVZOQWYWTI-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 239000002739 cryptand Substances 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229920000587 hyperbranched polymer Polymers 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical class CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- SLRCCWJSBJZJBV-AJNGGQMLSA-N sparteine Chemical compound C1N2CCCC[C@H]2[C@@H]2CN3CCCC[C@H]3[C@H]1C2 SLRCCWJSBJZJBV-AJNGGQMLSA-N 0.000 description 1
- 229960001945 sparteine Drugs 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は、側鎖にアントラセン残基を有するフェノール誘導体及びその製造方法に関する。 The present invention relates to a phenol derivative having an anthracene residue in the side chain and a method for producing the same.
高度情報化社会の到来に伴い、携帯電話やパソコン等、情報通信機器の普及が進んでいる。情報通信機器に要求される特性として、情報処理能力や情報伝達速度が挙げられる。
これまでの情報通信システムは、電気信号、又は光信号と電気信号を相互に変換することにより行われている。しかしながら、より大容量の情報を扱うには、このシステムでは限界がくるものと予想される。そのため、光信号と電気信号を変換せずに光信号のまま通信するシステムが検討されている。
With the advent of an advanced information society, information communication devices such as mobile phones and personal computers are spreading. Information processing capability and information transmission speed are listed as characteristics required for information communication equipment.
Conventional information communication systems are performed by mutually converting electrical signals or optical signals and electrical signals. However, it is expected that this system will be limited to handle larger amounts of information. Therefore, a system that communicates with an optical signal without converting the optical signal and the electrical signal has been studied.
検討事項の1つとして、光信号のままスイッチを行う、光スイッチングシステムが注目されている。光は、電気的にスイッチングが困難である広帯域の信号のスイッチングだけでなく、電気的には取り扱うことのできない数ギガヘルツ以上の信号も高速にスイッチングすることができる。その中で、光異性化及び光二量化を用いた屈折率変換型の系が注目されている。屈折率変換材料には、Lorentz−Lorentzの式より、光反応前後の分子屈折と密度変化が大きいものが求められている。 As one of the considerations, attention is focused on an optical switching system in which an optical signal is switched as it is. Light can switch not only wide-band signals that are electrically difficult to switch, but also high-speed signals of several gigahertz or more that cannot be handled electrically. Among them, a refractive index conversion type system using photoisomerization and photodimerization has attracted attention. As a refractive index conversion material, a material having large molecular refraction and density change before and after the photoreaction is required from the Lorentz-Lorentz equation.
ところで、スターポリマーは、ハイパーブランチポリマーやデンドリマーと共に分岐ポリマーとして位置づけられ、その特性も対応する直鎖状ポリマーとは異なることが知られている。また、スターポリマーは、コア部に近くなるほどセグメント密度が高く、腕の長さが短いスターポリマーにおいては直鎖状ポリマーよりも分子密度が高いことから、屈折率も高くなることが報告されている(非特許文献1)。従って、スターポリマーを屈折率変換材料へと応用した場合、直鎖状ポリマーよりも大きな屈折率変化が期待できる。 By the way, it is known that a star polymer is positioned as a branched polymer together with a hyperbranched polymer and a dendrimer, and its characteristics are also different from the corresponding linear polymer. In addition, it is reported that the star polymer has a higher segment density as it is closer to the core part, and a star polymer having a short arm length has a higher molecular density than a linear polymer, and therefore has a higher refractive index. (Non-Patent Document 1). Therefore, when a star polymer is applied to a refractive index conversion material, a larger refractive index change can be expected than a linear polymer.
本発明者らは、カリックスアレーン化合物に光反応性基としてノルボルナジエンやアントラセンを導入し、熱安定性に優れたカリックス誘導体類を提案している。これらのカリックス誘導体は、光照射によって屈折率が大きく変化する特性を有することを報告している(特許文献1、特許文献2)。
また、上記のカリックス誘導体類は、これまでの直鎖状ポリマーと比較して大きな屈折率変化を示すことを報告している。
さらに、光二量化に伴う屈折率変化はノルボルナジエンやアゾベンゼンの光異性化よりも大きくなることも明らかとしている(非特許文献2)。
Moreover, it has been reported that the above calix derivatives show a large change in refractive index as compared with conventional linear polymers.
Furthermore, it is also clear that the refractive index change accompanying photodimerization is larger than that of norbornadiene or azobenzene (see Non-Patent Document 2).
本発明の目的は、上記の知見に基づき光通信分野等の光学用材料として好適に使用できる材料を提供することである。 An object of the present invention is to provide a material that can be suitably used as an optical material in the field of optical communication or the like based on the above findings.
本発明者らは、側鎖にアントラセン残基を有するフェノール誘導体が高い屈折率を有し、また、光学用材料として使用できることを見出した。
本発明によれば、以下のフェノール誘導体及びその製造方法等が提供される。
1.下記式(1)又は(2)で表されるフェノール誘導体。
2.下記式(4)又は式(5)で表わされる化合物と、下記式(6a)又は式(6b)で表わされる化合物を反応させる1に記載のフェノール誘導体の製造方法。
3.上記1のフェノール誘導体を含有し、その屈折率が1.500〜1.900の範囲である光学用材料。
4.上記3に記載の光学用材料からなる光導波路。
5.上記3に記載の光学用材料からなる光学フィルム。
6.上記3に記載の光学用材料からなる屈折率変換材料。
The present inventors have found that a phenol derivative having an anthracene residue in the side chain has a high refractive index and can be used as an optical material.
According to the present invention, the following phenol derivatives and methods for producing the same are provided.
1. A phenol derivative represented by the following formula (1) or (2).
2. 2. The method for producing a phenol derivative according to 1, wherein a compound represented by the following formula (4) or formula (5) is reacted with a compound represented by the following formula (6a) or formula (6b).
3. An optical material containing the phenol derivative of 1 above and having a refractive index in the range of 1.500 to 1.900.
4). 4. An optical waveguide made of the optical material as described in 3 above.
5. 4. An optical film comprising the optical material as described in 3 above.
6). 4. A refractive index conversion material comprising the optical material described in 3 above.
本発明によれば、光学用材料として有用なフェノール誘導体及びその製造方法が提供できる。 ADVANTAGE OF THE INVENTION According to this invention, the phenol derivative useful as an optical material and its manufacturing method can be provided.
本発明のフェノール誘導体は、下記式(1)又は(2)で表される。
式中、mは4〜10の整数であり、nは1〜1000の整数である。R1は水素、水酸基(−OH)又は炭素数1〜10のアルキル基であり、R2は炭素数1〜20の2価の有機基であり、R3はアントラセン構造を有する基であり、Xは塩素、臭素又はヨウ素である。 In the formula, m is an integer of 4 to 10, and n is an integer of 1 to 1000. R 1 is hydrogen, a hydroxyl group (—OH) or an alkyl group having 1 to 10 carbon atoms, R 2 is a divalent organic group having 1 to 20 carbon atoms, and R 3 is a group having an anthracene structure, X is chlorine, bromine or iodine.
本発明のフェノール誘導体は、その構造単位中に光反応性基を有するため、特定の光、例えば、紫外線を受けることによってその特性が変化する光反応特性を有する。また、式(2)のフェノール誘導体は、カリックスアレーン骨格を有するため、式(1)のフェノール誘導体である線状化合物に比べ、分子密度が高く、屈折率が高いという特性が得られる。 Since the phenol derivative of the present invention has a photoreactive group in its structural unit, it has a photoreactive characteristic that changes its characteristics when it receives specific light, for example, ultraviolet rays. Moreover, since the phenol derivative of the formula (2) has a calixarene skeleton, the characteristics that the molecular density is higher and the refractive index is higher than the linear compound that is the phenol derivative of the formula (1) are obtained.
上記式(1)及び(2)において、R1が示す炭素数1〜10のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基等がある。
R1は、好ましくは水素又は炭素数1〜4のアルキル基である。
In the above formulas (1) and (2), examples of the alkyl group having 1 to 10 carbon atoms represented by R 1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, There are sec-butyl group, t-butyl group and the like.
R 1 is preferably hydrogen or an alkyl group having 1 to 4 carbon atoms.
R2が示す炭素数1〜20の2価の有機基としては、例えば、メチレン基、エチレン基、プロピレン基、イソプロピリデン基、エチリデン基、アセチレン基や、フェニレン基等の芳香族基等が挙げられる。また、これらの有機基にハロゲン原子、ニトロ基、カルボキシル基、アミノ基等の置換基が結合した基でもよい。R2は好ましくは、イソプロピリデン基、プロピレン基、エチリデン基である。 Examples of the divalent organic group having 1 to 20 carbon atoms represented by R 2 include an methylene group, an ethylene group, a propylene group, an isopropylidene group, an ethylidene group, an acetylene group, and an aromatic group such as a phenylene group. It is done. In addition, a group in which a substituent such as a halogen atom, a nitro group, a carboxyl group, or an amino group is bonded to these organic groups may be used. R 2 is preferably an isopropylidene group, a propylene group, or an ethylidene group.
R3は下記式(3a)、又は式(3b)で表わされる基である。
式中、R4は炭素数1〜20の2価の有機基である。
R4が示す2価の有機基としては、例えばメチレン基、エチレン基、アセチレン基;フェニレン基等の芳香族基;エステル基、ケトン基、アセチル基、チオケトン基、−CH2−OCO−(CH2)2−CO−、−CH2−CO−等が挙げられる。
R4は好ましくは、ケトン基、−CH2−OCO−(CH2)2−CO−、−CH2−CO−である。
In the formula, R 4 is a divalent organic group having 1 to 20 carbon atoms.
Examples of the divalent organic group represented by R 4 include an methylene group, an ethylene group, an acetylene group; an aromatic group such as a phenylene group; an ester group, a ketone group, an acetyl group, a thioketone group, —CH 2 —OCO— (CH 2) 2 -CO -, - CH 2 -CO- , and the like.
R 4 is preferably a ketone group, —CH 2 —OCO— (CH 2 ) 2 —CO—, —CH 2 —CO—.
nは重合度であり、1〜1000の整数である。用途にもよるが、nは樹脂として使用できるため、10〜500の範囲であることが好ましい。
mは、4〜10の整数であり、好ましくは4〜6である。
n is a polymerization degree and is an integer of 1-1000. Although it depends on the application, n can be used as a resin, and is preferably in the range of 10 to 500.
m is an integer of 4 to 10, preferably 4 to 6.
続いて、本発明のフェノール誘導体の製造方法について説明する。
本発明のフェノール誘導体の製造方法は、下記式(4)又は式(5)で表わされる化合物と、式(6a)又は式(6b)で表わされる化合物を反応させる。
In the method for producing a phenol derivative of the present invention, a compound represented by the following formula (4) or formula (5) is reacted with a compound represented by formula (6a) or formula (6b).
式中、m、n、R1、R2及びR4は、それぞれ上記式(1)〜(3b)のものと同様の基を表す。
上記式(1)のフェノール誘導体を製造する場合は、式(4)と式(6a)又は式(6b)の化合物を、上記式(2)のフェノール誘導体を製造する場合は、式(5)と式(6a)又は式(6b)の化合物を反応させる。
In the formula, m, n, R 1 , R 2 and R 4 represent the same groups as those in the above formulas (1) to (3b), respectively.
In the case of producing the phenol derivative of the above formula (1), the compound of the formula (4) and the formula (6a) or the formula (6b) is used. In the case of producing the phenol derivative of the above formula (2), the formula (5) And a compound of formula (6a) or formula (6b) are reacted.
尚、式(4)又は(5)の化合物は、下記式(7)、(8)で示される開始剤にグリジルメタクリレートを反応させることにより得ることができる。
上記式(7)、(8)で示される開始剤とグリジルメタクリレートの反応は、好ましくは、遷移金属、リガンドの存在下で反応を行う。この方法は、国際公開第97/18247号において例証されている。
還元段階に関与可能な遷移金属を含む化合物は、式:Mn+X’n(式中、MはCu、Au、Ag、Hg、Ni、Pd、Pt、Rh、Co、Ir、Fe、Ru、Os、Re、Mn、Cr、Mo、W、V、Nb、Ta及びZnから選択することができ、−X’はハロゲン(特に臭素又は塩素)、OH、(O)1/2、1〜6の炭素原子を有するアルコキシ基、(SO4)1/2、(PO4)1/3、(HPO4)1/2、(H2PO4)、トリフレート、ヘキサフルオロホスファート、メタンスルホナート、アリールスルホナート、SeR、CN、NC、SCN、CNS、OCN、CNO、N3及びR’CO2基で、R’がH、又は直鎖状又は分枝状で1〜6の炭素原子を有するアルキル基、又は一又は複数のハロゲン原子、特にフッ素及び/又は塩素原子で置換されていてもよいアリール基を示すことができ、nは金属の電荷である)に相当するものから選択することができる。
好ましくは、Mが銅又はルテニウムを表し、X’が臭素又は塩素を表すものが選択される。特に塩化銅を挙げることができる。
The reaction between the initiator represented by the above formulas (7) and (8) and glycidyl methacrylate is preferably carried out in the presence of a transition metal and a ligand. This method is illustrated in WO 97/18247.
The compound containing a transition metal that can participate in the reduction step has the formula: M n + X ′ n (where M is Cu, Au, Ag, Hg, Ni, Pd, Pt, Rh, Co, Ir, Fe, Ru, Os, Re, Mn, Cr, Mo, W, V, Nb, Ta and Zn can be selected, and -X 'is halogen (especially bromine or chlorine), OH, (O) 1/2 , 1-6 Alkoxy groups having the following carbon atoms: (SO 4 ) 1/2 , (PO 4 ) 1/3 , (HPO 4 ) 1/2 , (H 2 PO 4 ), triflate, hexafluorophosphate, methanesulfonate , Aryl sulfonate, SeR, CN, NC, SCN, CNS, OCN, CNO, N 3 and R′CO 2 groups, wherein R ′ is H, or linear or branched and contains 1 to 6 carbon atoms An alkyl group having one or more halogen atoms, in particular An aryl group optionally substituted with a nitrogen and / or chlorine atom can be shown, and n can be selected from those corresponding to a metal charge.
Preferably, one is selected wherein M represents copper or ruthenium and X ′ represents bromine or chlorine. Mention may be made especially of copper chloride.
さらにリガンドとして、一酸化炭素;置換されていてもよいポルフィリン類及びポルフィセン類;置換されていてもよいエチレンジアミン及びプロピレンジアミン;第3級アミンを有するポリアミン類、例えばペンタメチルジエチレントリアミン;置換されていてもよいアミノプロパノール及びアミノエタノール等のアミノアルコール類;置換されていてもよいエチレングリコール又はプロピレングリコール等のグリコール類;置換されていてもよいベンゼン等のアレーン類;置換されていてもよいシクロペンタジエン;置換されていてもよいピリジン類及びビピリジン類;アセトニトリル;1,10−フェナントロリン;クリプタンド類及びクラウンエーテル類;又はスパルテインを挙げることができる。
好ましいリガンドは、C2−C15アルキル基、特にC6−C12基、中でもノニル基で置換されていてもよいピリジン類及びビピリジン類;又は第3級アミンを有するポリアミン類、例えばペンタメチルジエチレントリアミンから特に選択される。
Further, as a ligand, carbon monoxide; optionally substituted porphyrins and porphycenes; optionally substituted ethylenediamine and propylenediamine; tertiary amine-containing polyamines such as pentamethyldiethylenetriamine; optionally substituted Good amino alcohols such as aminopropanol and aminoethanol; glycols such as optionally substituted ethylene glycol or propylene glycol; arenes such as optionally substituted benzene; optionally substituted cyclopentadiene; substituted Mention may be made of pyridines and bipyridines which may have been prepared; acetonitrile; 1,10-phenanthroline; cryptands and crown ethers; or sparteine.
Preferred ligands, C 2 -C 15 alkyl group, in particular C 6 -C 12 group, among them good pyridines substituted with nonyl and bipyridines; or polyamines having a tertiary amine, e.g. pentamethyldiethylenetriamine Especially selected from.
式(7)、(8)の開始剤、遷移金属を含有する化合物及び活性剤として作用するリガンドの存在下において、モノマーであるグリシジルメタクリレートを重合させることにより、結果として式(4)、(5)により表すことのできる構造を有するフェノール誘導体が得られる。 Polymerization of the monomer glycidyl methacrylate in the presence of an initiator of formulas (7), (8), a compound containing a transition metal and a ligand acting as an activator results in formulas (4), (5 A phenol derivative having a structure that can be represented by:
反応に用いる溶剤は、ジエチルエーテルやテトラヒドロフラン等のエーテル類、ジクロロメタンやクロロホルム等のハロゲン系溶媒、ヘキサンやトルエン等の炭化水素系溶媒、N,N−ジメチルホルムアミド、N−メチルピロリドンやN−ジメチルアセトアミド等の非プロトン性極性溶媒、アセトンやシクロヘキサノン等のケトン系溶媒、酢酸エチル等のエステル類を用いることができる。また、無溶媒でも反応させることができる。 Solvents used in the reaction are ethers such as diethyl ether and tetrahydrofuran, halogen solvents such as dichloromethane and chloroform, hydrocarbon solvents such as hexane and toluene, N, N-dimethylformamide, N-methylpyrrolidone and N-dimethylacetamide. An aprotic polar solvent such as acetone, ketone solvents such as acetone and cyclohexanone, and esters such as ethyl acetate can be used. Moreover, it can be made to react even without solvent.
反応温度は、通常、−50〜100℃の間で行うが、好ましくは0〜70℃、より好ましくは0〜40℃である。反応温度が−50℃未満だと反応時間が長くなる恐れがあり、また反応温度が100℃を超えると副反応が起こる恐れがある。 The reaction temperature is usually between −50 to 100 ° C., preferably 0 to 70 ° C., more preferably 0 to 40 ° C. If the reaction temperature is less than −50 ° C., the reaction time may be prolonged, and if the reaction temperature exceeds 100 ° C., side reactions may occur.
式(4)又は(5)の化合物と、式(6a)又は式(6b)の化合物を反応させる工程においては、溶媒中において、必要により触媒を用いて行うことができる。 The step of reacting the compound of the formula (4) or (5) with the compound of the formula (6a) or the formula (6b) can be performed in a solvent using a catalyst as necessary.
触媒としては、テトラブチルアンモニウムブロミドやテトラエチルアンモニウムクロリド等の4級アンモニウム塩や、リチウムクロリド、リチウムブロミド等の金属塩を使用できる。 As the catalyst, quaternary ammonium salts such as tetrabutylammonium bromide and tetraethylammonium chloride, and metal salts such as lithium chloride and lithium bromide can be used.
触媒の量は、式(4)又は式(5)の化合物が有するエポキシ基に対し、好ましくは0.1〜10mol%、より好ましくは3〜7mol%用いる。 The amount of the catalyst is preferably 0.1 to 10 mol%, more preferably 3 to 7 mol%, based on the epoxy group of the compound of formula (4) or formula (5).
溶媒としては、ジエチルエーテルやテトラヒドロフラン等のエーテル類、ジクロロメタンやクロロホルム等のハロゲン系溶媒、ヘキサンやトルエン等の炭化水素系溶媒、N,N−ジメチルホルムアミド、1−メチル−2−ピロリドンやN−ジメチルアセトアミド等の非プロトン性極性溶媒、アセトンやシクロヘキサノン等のケトン系溶媒、酢酸エチル等のエステル類を用いることができ、好ましくは1−メチル−2−ピロリドンである。 Solvents include ethers such as diethyl ether and tetrahydrofuran, halogen solvents such as dichloromethane and chloroform, hydrocarbon solvents such as hexane and toluene, N, N-dimethylformamide, 1-methyl-2-pyrrolidone and N-dimethyl. Aprotic polar solvents such as acetamide, ketone solvents such as acetone and cyclohexanone, and esters such as ethyl acetate can be used, and 1-methyl-2-pyrrolidone is preferred.
反応温度は、通常、30〜100℃の間で行うが、好ましくは50〜80℃である。反応温度が30℃未満だと反応時間が長くなるおそれがあり、また反応温度が100℃を超えると副反応が起こるおそれがある。また、反応時間は、24〜48時間で行うことが望ましい。
尚、反応はアンプル封管等、水分を除去できる状態で行うのが望ましい。
The reaction temperature is usually 30 to 100 ° C., preferably 50 to 80 ° C. If the reaction temperature is less than 30 ° C, the reaction time may be longer, and if the reaction temperature exceeds 100 ° C, side reactions may occur. The reaction time is preferably 24 to 48 hours.
The reaction is desirably performed in a state where moisture can be removed, such as an ampoule sealed tube.
本発明のフェノール誘導体は、単独で、又は各種添加剤や樹脂等を混合した状態で、光学用材料として好適に使用できる。
本発明の光学用材料の屈折率は1.500〜1.900であることが好ましい。本発明では、このような高い屈折率を有する材料を得ることができる。
The phenol derivative of the present invention can be suitably used as an optical material alone or in a state in which various additives, resins and the like are mixed.
The refractive index of the optical material of the present invention is preferably 1.500 to 1.900. In the present invention, a material having such a high refractive index can be obtained.
本発明の光学用材料は、溶媒に溶解して溶液とし、任意の支持体上に塗布して乾燥処理することにより、成膜することができる。
本発明のフェノール誘導体を溶解するための溶媒としては、メチルセルソルブアセテート、テトラヒドロフラン、1−メチル−2−ピロリドン、ジメチルホルムアルデヒド、クロロホルム、塩化メチレン等を用いることができる。
溶液を使用することにより、例えば、基板等に光導波路を形成することができる。
The optical material of the present invention can be formed into a film by dissolving in a solvent to form a solution, applying the solution on an arbitrary support, and drying.
As a solvent for dissolving the phenol derivative of the present invention, methyl cellosolve acetate, tetrahydrofuran, 1-methyl-2-pyrrolidone, dimethylformaldehyde, chloroform, methylene chloride and the like can be used.
By using the solution, for example, an optical waveguide can be formed on a substrate or the like.
また、フェノール誘導体が樹脂の場合、射出成形や押出成形等、公知の成形方法により、光学フィルム等の成形品を製造できる。 When the phenol derivative is a resin, a molded product such as an optical film can be produced by a known molding method such as injection molding or extrusion molding.
本発明のフェノール誘導体は、光照射により光二量化生成物が得られることから、光記憶素子や光スイッチシステム等に用いられる屈折率変換材料として極めて有用である。 The phenol derivative of the present invention is extremely useful as a refractive index conversion material used in an optical storage element, an optical switch system, and the like because a photodimerization product is obtained by light irradiation.
以下、本発明の具体的な実施例について説明するが、本発明はこれらに限定されるものではない。 Hereinafter, specific examples of the present invention will be described, but the present invention is not limited thereto.
実施例1
下記式(1a)で示される化合物(以下(1a)と略す)を合成した。
A compound represented by the following formula (1a) (hereinafter abbreviated as (1a)) was synthesized.
ナスフラスコに、下記式(4a)の化合物を0.057g(0.02mmol)、9−アントラセンカルボン酸(以下9−ATCと略す)を0.120g(0.54mmol)、テトラブチルアンモニウムブロミド(以下TBABと略す)を0.006g(0.018mmol)加え、1−メチル−2−ピロリドン1.8mLに溶解させた。その後、70℃、48時間反応させた。
尚、(4a)の合成は、後述する合成例1で説明する。
反応終了後、反応母液をクロロホルムで希釈し、NaHCO3溶液で2回、水で2回洗浄を行い、有機層を、無水硫酸マグネシウムを用いて乾燥した。
乾燥剤をろ別後、溶液を濃縮し、両溶媒としてクロロホルム、貧溶媒としてジエチルエーテルを用いて再沈精製を2回行った。析出した固体を回収し、減圧乾燥させることにより、(1a)を淡黄色固体として0.11g(収率85.0%)得た。
得られた化合物の赤外分光分析(IR)及び1H−NMR測定の結果を以下に示す。
・IR(KRS,cm−1):
3485(νO−H)、1727(νC=O ester)、1447(νC=C aromatic)、1201、1151(νC−O−C ester)、892(νC−O−C epoxy)
・1H NMR(600MHz,DMSO−d6,TMS) δ(ppm):
0.85−1.40(m,Ha)、1.76−1.91(m,Hb)、4.00−4.17(m,Hc,d)、4.55−4.65(m,He)、5.53(br,Hf)、7.44(br,Hg)、8.02(br,Hh)、8.55(br,Hi)
1H−NMR測定による水素原子の同定結果を下記に示す。
After completion of the reaction, the reaction mother liquor was diluted with chloroform, washed twice with NaHCO 3 solution and twice with water, and the organic layer was dried using anhydrous magnesium sulfate.
After the desiccant was filtered off, the solution was concentrated, and reprecipitation purification was performed twice using chloroform as both solvents and diethyl ether as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain 0.11 g (yield: 85.0%) of (1a) as a pale yellow solid.
The results of infrared spectroscopic analysis (IR) and 1 H-NMR measurement of the obtained compound are shown below.
IR (KRS, cm −1 ):
3485 (νO—H), 1727 (νC═O ester), 1447 (νC = C aromatic), 1201, 1151 (νC—O—C ester), 892 (νC—O—C epoxy).
1 H NMR (600 MHz, DMSO-d 6 , TMS) δ (ppm):
0.85-1.40 (m, H a ), 1.76-1.91 (m, H b ), 4.00-4.17 (m, H c, d ), 4.55-4. 65 (m, H e ), 5.53 (br, H f ), 7.44 (br, H g ), 8.02 (br, H h ), 8.55 (br, H i )
The identification result of the hydrogen atom by 1 H-NMR measurement is shown below.
また、重合度(n)の異なる(4a)を用いて同様に反応を行った。(4a)への9−アントラセンカルボン酸の導入率を1H−NMRより算出した。結果を表1に示す。 Moreover, it reacted similarly using (4a) from which polymerization degree (n) differs. The introduction rate of 9-anthracenecarboxylic acid into (4a) was calculated from 1 H-NMR. The results are shown in Table 1.
実施例2
下記式(1b)で示される化合物(以下(1b)と略す)を合成した。
A compound represented by the following formula (1b) (hereinafter abbreviated as (1b)) was synthesized.
ナスフラスコに、(4a)の化合物を0.057g(0.02mmol)、2−アントラセンカルボン酸(以下、2−ATCと略す)を0.12g(0.54mmol、エポキシ基に対して1.5倍)、テトラブチルアンモニウムブロミドを0.006g(5mol%,0.018mmol)加え、1−メチル−2−ピロリドン1.8mLに溶解させ、70℃、48時間反応させた。
良溶媒としてテトラヒドロフラン、貧溶媒としてメタノールとジエチルエーテルの混合溶媒(1:4)を用いて再沈精製を2回行った。析出した固体を回収し、減圧乾燥させることにより、淡黄色固体を収量0.10g(82%)得た。構造確認はIR、1H NMRにより行った。
・IR(KRS,cm−1):
3429(νO−H)、1719(νC=O ester)、1582(νC=C aromatic)、1234、1151(νC−O−C ester)、890(νC−O−C epoxy)
・1H NMR(600MHz,DMSO−d6,TMS) δ(ppm):
0.82−1.37(m,Ha)、1.86−2.17(m,Hb)、4.01−4.28(m,Hc,d,e)、5.44(br,Hf)、7.32(br,Hg)、7.73(br,Hh)、8.19−8.43(m,Hi)
1H−NMR測定による水素原子の同定結果を下記に示す。
Reprecipitation purification was performed twice using tetrahydrofuran as a good solvent and a mixed solvent of methanol and diethyl ether (1: 4) as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain a pale yellow solid in a yield of 0.10 g (82%). The structure was confirmed by IR and 1 H NMR.
IR (KRS, cm −1 ):
3429 (νO—H), 1719 (νC═O ester), 1582 (νC = C aromatic), 1234, 1151 (νC—O—C ester), 890 (νC—O—C epoxy)
1 H NMR (600 MHz, DMSO-d 6 , TMS) δ (ppm):
0.82-1.37 (m, H a ), 1.86-2.17 (m, H b ), 4.01-4.28 (m, H c, d, e ), 5.44 ( br, H f), 7.32 ( br, H g), 7.73 (br, H h), 8.19-8.43 (m, H i)
The identification result of the hydrogen atom by 1 H-NMR measurement is shown below.
また、重合度(n)の異なる(4a)を用いて同様に反応を行った。(4a)への2−アントラセンカルボン酸の導入率を1H−NMRより算出した。結果を表2に示す。 Moreover, it reacted similarly using (4a) from which polymerization degree (n) differs. The introduction rate of 2-anthracenecarboxylic acid into (4a) was calculated from 1 H-NMR. The results are shown in Table 2.
実施例3
下記式(2a)で示されるフェノール誘導体(以下(2a)と略す)を合成した。
A phenol derivative represented by the following formula (2a) (hereinafter abbreviated as (2a)) was synthesized.
ナスフラスコに下記式(5a)の化合物を0.046g(0.002mmol)、9−アントラセンカルボン酸を0.10g(0.45mmol)、TBABを0.005g(0.015mmol)加え、1−メチル−2−ピロリドン1.5mLに溶解させた。その後、70℃、48時間反応させた。
尚、(5a)の合成は、後述する合成例2で説明する。
反応終了後、反応母液をクロロホルムで希釈し、NaHCO3溶液で2回、水で2回洗浄を行い、有機層を、無水硫酸マグネシウムを用いて乾燥した。乾燥剤をろ別後、溶液を濃縮し、両溶媒としてクロロホルム、貧溶媒としてジエチルエーテルを用いて再沈精製を2回行った。析出した固体を回収し、減圧乾燥させることにより、(2a)を淡黄色固体として0.081g(収率:76.0%)得た。
得られた高分子化合物のIR分析結果及び1H−NMR測定の結果を以下に示す。
・IR(KRS,cm−1):
3484(νO−H)、1726(νC=O ester)、1450(νC=C aromatic)、1200、1149(νC−O−C ester)、893(νC−O−C epoxy)
・1H NMR(600MHz,DMSO−d6,TMS) δ(ppm):
0.91−1.40(m,Ha)、1.76−1.91(m,Hb)、3.97−4.12(m,Hc,d)、4.51−4.61(m,He)、5.48(br,Hf)、7.39(br,Hg)、7.97(br,Hh)、8.51(br,Hi)
1H−NMR測定による水素原子の同定結果を下記に示す。
After completion of the reaction, the reaction mother liquor was diluted with chloroform, washed twice with NaHCO 3 solution and twice with water, and the organic layer was dried using anhydrous magnesium sulfate. After the desiccant was filtered off, the solution was concentrated, and reprecipitation purification was performed twice using chloroform as both solvents and diethyl ether as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain 0.081 g (yield: 76.0%) of (2a) as a pale yellow solid.
The results of IR analysis and 1 H-NMR measurement of the obtained polymer compound are shown below.
IR (KRS, cm −1 ):
3484 (νO—H), 1726 (νC═O ester), 1450 (νC = C aromatic), 1200, 1149 (νC—O—C ester), 893 (νC—O—C epoxy)
1 H NMR (600 MHz, DMSO-d 6 , TMS) δ (ppm):
0.91-1.40 (m, H a ), 1.76-1.91 (m, H b ), 3.97-4.12 (m, H c, d ), 4.51-4. 61 (m, H e ), 5.48 (br, H f ), 7.39 (br, H g ), 7.97 (br, H h ), 8.51 (br, H i )
The identification result of the hydrogen atom by 1 H-NMR measurement is shown below.
また、重合度(n)の異なる(5a)を用いて同様に反応を行った。(5a)への9−アントラセンカルボン酸の導入率を表3に示す。 Moreover, it reacted similarly using (5a) from which polymerization degree (n) differs. Table 3 shows the introduction ratio of 9-anthracenecarboxylic acid into (5a).
実施例4
下記式(2b)で示されるフェノール誘導体(以下(2b)と略す)を合成した。
A phenol derivative represented by the following formula (2b) (hereinafter abbreviated as (2b)) was synthesized.
ナスフラスコに、(5a)の化合物を0.046g(0.002mmol)、2−ATCを0.10g(0.46mmol、エポキシに対して1.5倍)、TBABを0.005g(5mol%,0.015mmol)加え、NMP 1.6mLに溶解させ、70℃、48時間反応させた。
良溶媒としてTHF、貧溶媒としてメタノールとジエチルエーテルの混合溶媒(1:4)を用いて再沈精製を2回行った。析出した固体を回収し、減圧乾燥させることにより、淡黄色固体を0.086g(収率:83%)得た。構造確認はIR、1H NMRにより行った。
・IR(KRS,cm−1):
3429(νO−H)、1717(νC=O ester)、1582(νC=C aromatic)、1234、1151(νC−O−C ester)、890(νC−O−C epoxy)
・1H NMR(600MHz,DMSO−d6,TMS) δ(ppm):
0.90−1.37(m,Ha)、1.74−2.16(m,Hb)、4.08−4.29(m,Hc,d,e)、5.43(br,Hf)、7.29(br,Hg)、7.70(br,Hh)、8.17−8.41(m,Hi)
1H−NMR測定による水素原子の同定結果を下記に示す。
Reprecipitation purification was performed twice using THF as a good solvent and a mixed solvent of methanol and diethyl ether (1: 4) as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain 0.086 g (yield: 83%) of a pale yellow solid. The structure was confirmed by IR and 1 H NMR.
IR (KRS, cm −1 ):
3429 (νO—H), 1717 (νC═O ester), 1582 (νC = C aromatic), 1234, 1151 (νC—O—C ester), 890 (νC—O—C epoxy)
1 H NMR (600 MHz, DMSO-d 6 , TMS) δ (ppm):
0.90-1.37 (m, H a ), 1.74-2.16 (m, H b ), 4.08-4.29 (m, H c, d, e ), 5.43 ( br, H f), 7.29 ( br, H g), 7.70 (br, H h), 8.17-8.41 (m, H i)
The identification result of the hydrogen atom by 1 H-NMR measurement is shown below.
また、重合度(n)の異なる(5a)を用いて同様に反応を行った。(2b)への2−アントラセンカルボン酸の導入率を表4に示す。 Moreover, it reacted similarly using (5a) from which polymerization degree (n) differs. Table 4 shows the introduction rate of 2-anthracenecarboxylic acid into (2b).
評価例1
実施例1で合成したポリマー(1a)(n=20、30、40)の光異性化反応を、以下の方法で評価した。
(1a)をTHFに溶解させ、石英セルに塗布してフィルムを作製した後、室温で減圧乾燥した。このフィルムに、光源として500Wキセノンランプを用いて光照射[1.8−2.0mW/cm2(313nm)]を行い、UVスペクトルを用いて9−ATC残基に基づく吸収波長の減少を追跡した。光照射の時間は0秒〜3600秒とした。
Evaluation Example 1
The photoisomerization reaction of the polymer (1a) (n = 20, 30, 40) synthesized in Example 1 was evaluated by the following method.
(1a) was dissolved in THF, applied to a quartz cell to produce a film, and then dried under reduced pressure at room temperature. This film was irradiated with light [1.8-2.0 mW / cm 2 (313 nm)] using a 500 W xenon lamp as a light source, and the decrease in absorption wavelength based on 9-ATC residues was traced using the UV spectrum. did. The light irradiation time was 0 to 3600 seconds.
各光照射時間におけるUVスペクトルを図1に示す。図1aは重合度nが20の(1a)のUVスペクトルであり、図1bはnが30の(1a)のUVスペクトルであり、図1cはnが40の(1a)のUVスペクトルである。
いずれの図においても、光照射時間が長くなるにつれて、9−ATC残基に起因する吸収が減少し、光照射60分後で光定常状態に達したことが確認できた。
得られたUVスペクトルから算出した9−ATC残基の光照射時間と異性化率の関係及び反応初期の異性化率を一次速度式にプロットした結果をそれぞれ図1d、図1eに示す。
さらに、一次速度プロットから算出した異性化速度を表5に示す。その結果、異性化率はすべて同様の値となった。
The UV spectrum at each light irradiation time is shown in FIG. FIG. 1a is the UV spectrum of (1a) with a polymerization degree n of 20, FIG. 1b is the UV spectrum of (1a) with n = 30, and FIG. 1c is the UV spectrum of (1a) with n = 40.
In any of the figures, as the light irradiation time increased, the absorption due to the 9-ATC residue decreased, and it was confirmed that the light steady state was reached 60 minutes after the light irradiation.
The relationship between the light irradiation time of the 9-ATC residue calculated from the obtained UV spectrum and the isomerization rate and the results of plotting the isomerization rate at the initial stage of the reaction in the first-order rate equation are shown in FIGS. 1d and 1e, respectively.
Furthermore, Table 5 shows the isomerization rate calculated from the primary rate plot. As a result, all the isomerization rates were the same value.
評価例2
実施例2で合成したポリマー(1b)(n=20、30、40)の光異性化反応を、評価例1と同様にして評価した。
各光照射時間におけるUVスペクトルを図2に示す。図2aは重合度nが20の(1b)のUVスペクトルであり、図2bはnが30の(1b)のUVスペクトルであり、図2cはnが40の(1b)のUVスペクトルである。
いずれの図においても、光照射時間が長くなるにつれて、2−ATC残基に起因する吸収が減少し、光照射60分後で光定常状態に達したことが確認できた。
得られたUVスペクトルから算出した2−ATC残基の光照射時間と異性化率の関係及び反応初期の異性化率を一次速度式にプロットした結果をそれぞれ図2d、図2eに示す。
一次速度プロットから算出した異性化速度を表6に示す。その結果、異性化率はすべて同様の値となった。
Evaluation example 2
The photoisomerization reaction of the polymer (1b) (n = 20, 30, 40) synthesized in Example 2 was evaluated in the same manner as in Evaluation Example 1.
The UV spectrum at each light irradiation time is shown in FIG. 2a is the UV spectrum of (1b) with a polymerization degree n of 20, FIG. 2b is the UV spectrum of (1b) with n being 30, and FIG. 2c is the UV spectrum of (1b) with n being 40.
In any of the figures, as the light irradiation time became longer, the absorption due to the 2-ATC residue decreased, and it was confirmed that the light steady state was reached 60 minutes after the light irradiation.
The relationship between the light irradiation time and the isomerization rate of the 2-ATC residue calculated from the obtained UV spectrum and the results of plotting the isomerization rate at the initial stage of the reaction in the first-order rate equation are shown in FIGS. 2d and 2e, respectively.
The isomerization rate calculated from the primary rate plot is shown in Table 6. As a result, all the isomerization rates were the same value.
評価例3
実施例3で合成したポリマー(2a)(n=20、30、40)の光異性化反応を、評価例1と同様にして評価した。
各光照射時間におけるUVスペクトルを図3に示す。図3aは重合度nが20の(2a)のUVスペクトルであり、図3bはnが30の(2a)のUVスペクトルであり、図3cはnが40の(2a)のUVスペクトルである。
いずれの図においても、光照射時間が長くなるにつれて、9−ATC残基に起因する吸収が減少し、光照射45分後で光定常状態に達したことが確認できた。
得られたUVスペクトルから算出した9−ATC残基の光照射時間と異性化率の関係及び反応初期の異性化率を一次速度式にプロットした結果をそれぞれ図3d、図3eに示す。
さらに、一次速度プロットから算出した異性化速度を表7に示す。その結果、異性化率はすべて同様の値となった。また、異性化速度は9−ATC残基を有するポリマーの方が速かった。
Evaluation Example 3
The photoisomerization reaction of the polymer (2a) (n = 20, 30, 40) synthesized in Example 3 was evaluated in the same manner as in Evaluation Example 1.
The UV spectrum at each light irradiation time is shown in FIG. 3a is the UV spectrum of (2a) with a polymerization degree n of 20, FIG. 3b is the UV spectrum of (2a) with n = 30, and FIG. 3c is the UV spectrum of (2a) with n = 40.
In any of the figures, as the light irradiation time increased, the absorption due to the 9-ATC residue decreased, and it was confirmed that the light steady state was reached 45 minutes after the light irradiation.
The relationship between the light irradiation time of the 9-ATC residue calculated from the obtained UV spectrum and the isomerization rate and the results of plotting the isomerization rate at the initial stage of the reaction in the first-order rate equation are shown in FIGS. 3d and 3e, respectively.
Furthermore, Table 7 shows the isomerization rate calculated from the primary rate plot. As a result, all the isomerization rates were the same value. In addition, the isomerization rate was faster for the polymer having 9-ATC residues.
評価例4
実施例4で合成したポリマー(2b)(n=20、30、40)の光異性化反応を、評価例1と同様にして評価した。
各光照射時間におけるUVスペクトルを図4に示す。図4aは重合度nが20の(2b)のUVスペクトルであり、図4bはnが30の(2b)のUVスペクトルであり、図4cはnが40の(2b)のUVスペクトルである。
いずれの図においても、光照射時間が長くなるにつれて、2−ATC残基に起因する吸収が減少し、光照射45分後で光定常状態に達したことが確認できた。
得られたUVスペクトルから算出した2−ATC残基光照射時間と異性化率の関係及び反応初期の異性化率を一次速度式にプロットした結果をそれぞれ図4d、図4eに示す。
さらに、一次速度プロットから算出した異性化速度を表8に示す。その結果、腕の長さの短いポリマーほど、高い異性化率と高い異性化速度を示した。
Evaluation Example 4
The photoisomerization reaction of the polymer (2b) (n = 20, 30, 40) synthesized in Example 4 was evaluated in the same manner as in Evaluation Example 1.
The UV spectrum at each light irradiation time is shown in FIG. 4a is the UV spectrum of (2b) with a degree of polymerization n of 20, FIG. 4b is the UV spectrum of (2b) with n = 30, and FIG. 4c is the UV spectrum of (2b) with n = 40.
In any of the figures, as the light irradiation time increased, the absorption due to the 2-ATC residue decreased, and it was confirmed that the light steady state was reached 45 minutes after the light irradiation.
The relationship between the 2-ATC residue light irradiation time calculated from the obtained UV spectrum and the isomerization rate and the results of plotting the isomerization rate at the initial stage of the reaction in the first-order rate equation are shown in FIGS. 4d and 4e, respectively.
Furthermore, Table 8 shows the isomerization rate calculated from the primary rate plot. As a result, the shorter the arm length, the higher the isomerization rate and the higher isomerization rate.
評価例5
上記実施例1−4で合成したポリマー(1a)、(1b)、(2a)、(2b)の光照射前後の屈折率変化を測定した。具体的には、シリコンウエハー上に各ポリマーのフィルムを作製し、光照射前のフィルムについてエリプソメータ(波長632.8nm)を用いて屈折率を測定した。
その後、光源として500Wキセノンランプ((1.8−2.0mW/cm2(313nm))を用いて光照射を行った。光照射後にフィルムの屈折率を測定した。また、光照射前のフィルムのガラス転移点(Tg)を測定した。表9に測定結果を示す。
Evaluation Example 5
The refractive index change before and after the light irradiation of the polymers (1a), (1b), (2a), and (2b) synthesized in Example 1-4 was measured. Specifically, a film of each polymer was prepared on a silicon wafer, and the refractive index of the film before light irradiation was measured using an ellipsometer (wavelength 632.8 nm).
Thereafter, light irradiation was performed using a 500 W xenon lamp ((1.8-2.0 mW / cm 2 (313 nm)) as a light source. After the light irradiation, the refractive index of the film was measured. The glass transition point (Tg) was measured, and the measurement results are shown in Table 9.
表9の結果から、Δnの値は、スターポリマー(2a、2b)と直鎖状ポリマー(1a、1b)で異なり、腕の長さが短いほどスターポリマーのΔnの値は直鎖状ポリマーよりも大きな値を示すことが判明した。従って、腕の長さの短いスターポリマーは、直鎖状ポリマーよりも光反応前後の密度変化が大きいことが明らかとなった。 From the results in Table 9, the value of Δn is different between the star polymer (2a, 2b) and the linear polymer (1a, 1b), and as the arm length is shorter, the value of Δn of the star polymer is higher than that of the linear polymer. Was also found to show a large value. Therefore, it was clarified that the star polymer having a short arm length has a larger density change before and after the photoreaction than the linear polymer.
合成例1[式(4a)の合成]
(1)単官能性開始剤[4−tert−ブチル−2−ブロモイソブチリルオキシベンゼン]の合成
三つ口ナスフラスコに、4−tert−ブチルフェノール(4−tert−BuPhOH) 3.0g(20mmol)をTHF 80mLに溶解させ、系内を窒素雰囲気下にした。続いてトリエチルアミン(NEt3)を3.0g(30mmol)加えた後、氷冷下、2−ブロモイソブチリルブロミド(BIB)6.9g(30mmol)をTHF 20mLで希釈した溶液をゆっくり滴下し、室温下、24時間反応させた。析出した塩をろ別し、溶液を減圧留去した後、クロロホルムで希釈し、1N塩酸で1回、飽和重曹水で3回、水で2回洗浄を行い、有機層を無水硫酸マグネシウムを用いて乾燥させた。乾燥剤をろ別後、溶液を減圧留去し、析出した固体をn−ヘキサンを用いて再結晶を行うことにより白色針状結晶を得た。
収量は4.3g(72%)、融点は59.2−60.0℃であった。
Synthesis Example 1 [Synthesis of Formula (4a)]
(1) Synthesis of monofunctional initiator [4-tert-butyl-2-bromoisobutyryloxybenzene] In a three-necked eggplant flask, 3.0 g (20 mmol) of 4-tert-butylphenol (4-tert-BuPhOH) ) Was dissolved in 80 mL of THF, and the system was placed in a nitrogen atmosphere. Subsequently, after adding 3.0 g (30 mmol) of triethylamine (NEt 3 ), a solution obtained by diluting 6.9 g (30 mmol) of 2-bromoisobutyryl bromide (BIB) with 20 mL of THF was slowly added dropwise under ice cooling, The reaction was allowed to proceed for 24 hours at room temperature. The precipitated salt was filtered off, the solution was distilled off under reduced pressure, diluted with chloroform, washed once with 1N hydrochloric acid, three times with saturated aqueous sodium bicarbonate, and twice with water, and the organic layer was dried over anhydrous magnesium sulfate. And dried. After the desiccant was filtered off, the solution was distilled off under reduced pressure, and the precipitated solid was recrystallized using n-hexane to obtain white needle crystals.
The yield was 4.3 g (72%), and the melting point was 59.2-60.0 ° C.
(2)式(4a)の合成
アンプル管に、上記(1)で合成した開始剤を0.030g(0.1mmol)、2,2’−ビピリジン(bpy)を0.032g(0.2mmol)、グリシジルメタクリレート(GMA)を0.315g(2.22mmol)、CuClを0.010g(0.1mmol)量り取り、DMF 2mLに溶解させた。その後、二方コックを取り付け凍結・脱気を数回行い、封管した。室温にて解凍後、室温下、48時間反応させた。反応終了後、良溶媒としてTHF、貧溶媒として水を用いて再沈精製を行った。析出した固体を回収後、再びTHFに溶解し、貧溶媒としてn−ヘキサンを用いて再沈精製を行った。析出した固体を回収し、減圧乾燥することにより白色粉末固体を得た。
収量は0.28g(83%)、数平均分子量(Mn)=3700、分子量分布(Mw/Mn)=1.24であった。
尚、MnおよびMw/Mnは下記の条件で測定した。
・サイズ排除クロマトグラフィー(SEC):東ソー(株)製 HLC−8020(カラム:TSKgelG1000H、溶媒:THF、標準:ポリスチレン)
(2) Synthesis of Formula (4a) 0.030 g (0.1 mmol) of the initiator synthesized in (1) above and 0.032 g (0.2 mmol) of 2,2′-bipyridine (bpy) in an ampule tube In addition, 0.315 g (2.22 mmol) of glycidyl methacrylate (GMA) and 0.010 g (0.1 mmol) of CuCl were weighed and dissolved in 2 mL of DMF. After that, a two-way cock was attached, frozen and degassed several times, and sealed. After thawing at room temperature, the reaction was allowed to proceed at room temperature for 48 hours. After completion of the reaction, reprecipitation purification was performed using THF as a good solvent and water as a poor solvent. The precipitated solid was recovered and then dissolved again in THF, and reprecipitation purification was performed using n-hexane as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain a white powder solid.
The yield was 0.28 g (83%), the number average molecular weight (M n ) = 3700, and the molecular weight distribution (M w / M n ) = 1.24.
Mn and Mw / Mn were measured under the following conditions.
Size exclusion chromatography (SEC): HLC-8020 manufactured by Tosoh Corporation (column: TSKgel G1000H, solvent: THF, standard: polystyrene)
合成例2[式(5a)の合成]
(1)8官能性開始剤の合成
三つ口ナスフラスコに、カリックス[4]レゾルシンアレーンを0.544g(1mmol)、NEt3を1.21g(12mmol)加え、THF 25mLに溶解させた。その後、BIB 2.75g(12mmol)をTHF 5 mLで希釈し、窒素雰囲気下、氷冷下で徐々に滴下しながら加え、30分撹拌し、50℃で48時間反応させた。反応終了後、析出した塩をろ別し、溶液をクロロホルムで希釈し、炭酸水素ナトリウム水溶液で2回、1N塩酸で1回、水で3回洗浄を行い、有機層を無水硫酸マグネシウムを用いて乾燥させた。乾燥剤をろ別後、溶液を濃縮し、大量のメタノールに注いで固体を析出させた。これを2回繰り返し、得られた白色粉末固体をクロロホルムを用いて再結晶を行うことにより白色板状結晶を得た。
収量は1.2g(68%)、融点は337.2−337.9℃であった。
Synthesis Example 2 [Synthesis of Formula (5a)]
(1) Synthesis of 8-functional initiator To a three-necked eggplant flask, 0.544 g (1 mmol) of calix [4] resorcinarene and 1.21 g (12 mmol) of NEt 3 were added and dissolved in 25 mL of THF. Thereafter, 2.75 g (12 mmol) of BIB was diluted with 5 mL of THF, added dropwise gradually under ice cooling under a nitrogen atmosphere, stirred for 30 minutes, and reacted at 50 ° C. for 48 hours. After completion of the reaction, the precipitated salt is filtered off, the solution is diluted with chloroform, washed twice with aqueous sodium hydrogen carbonate solution, once with 1N hydrochloric acid and three times with water, and the organic layer is washed with anhydrous magnesium sulfate. Dried. After the desiccant was filtered off, the solution was concentrated and poured into a large amount of methanol to precipitate a solid. This was repeated twice, and the resulting white powder solid was recrystallized using chloroform to obtain white plate crystals.
The yield was 1.2 g (68%) and the melting point was 337.2-337.9 ° C.
(2)式(5a)の合成
アンプル管に、上記(1)で合成した開始剤を0.022g(0.0125mmol)、CuClを0.010g(0.1mmol)、bpyを0.032g(0.2mmol)、GMAを0.473g(3.33mmol)量りとり、DMF 5mLに溶解させた。その後、二方コックを取り付け凍結・脱気を数回行い、封管した。室温にて解凍後、室温下、24時間反応させた。反応終了後、良溶媒としてTHF、貧溶媒として水を用いて再沈精製を行った。析出した固体を回収後、再びTHFに溶解し、貧溶媒としてn−ヘキサンを用いて再沈精製を行った。析出した固体を回収し、減圧乾燥することにより白色粉末固体を得た。
収量は0.30(61%)、Mn=17200、Mw/Mn=1.21であった。
(2) Synthesis of Formula (5a) Into an ampule tube, 0.022 g (0.0125 mmol) of the initiator synthesized in the above (1), 0.010 g (0.1 mmol) of CuCl, and 0.032 g (0 of bpy) 0.2 mmol) and 0.473 g (3.33 mmol) of GMA were weighed and dissolved in 5 mL of DMF. After that, a two-way cock was attached, frozen and degassed several times, and sealed. After thawing at room temperature, the reaction was allowed to proceed at room temperature for 24 hours. After completion of the reaction, reprecipitation purification was performed using THF as a good solvent and water as a poor solvent. The precipitated solid was recovered and then dissolved again in THF, and reprecipitation purification was performed using n-hexane as a poor solvent. The precipitated solid was collected and dried under reduced pressure to obtain a white powder solid.
Yield was 0.30 (61%), M n = 17200, M w / M n = 1.21.
本発明のフェノール誘導体は、光記憶素子や光スイッチングシステム等に用いられる光学用材料として極めて有用であると考えられる。 The phenol derivative of the present invention is considered to be extremely useful as an optical material used for an optical storage element, an optical switching system, or the like.
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