JP7783508B2 - Electrolyte membrane manufacturing method - Google Patents
Electrolyte membrane manufacturing methodInfo
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- C25B3/25—Reduction
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- C25B3/00—Electrolytic production of organic compounds
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- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
- C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
- C25B9/23—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
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- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/50—Cells or assemblies of cells comprising photoelectrodes; Assemblies of constructional parts thereof
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Description
本発明は、電解質膜、及び、電解質膜の製造方法に関する。 The present invention relates to an electrolyte membrane and a method for manufacturing an electrolyte membrane.
地球温暖化の主因として大気中の二酸化炭素濃度の増加が挙げられている。二酸化炭素の排出量の削減は、世界的規模で長期的な課題になっている。一方、エネルギー問題として中長期的に、化石燃料に頼ったエネルギー供給の見直しが迫られ、次世代のエネルギー供給源の創出が求められている。 The increase in carbon dioxide concentrations in the atmosphere is cited as the main cause of global warming. Reducing carbon dioxide emissions has become a long-term challenge on a global scale. Meanwhile, in the medium to long term, energy issues necessitate a reassessment of energy supplies that rely on fossil fuels, and the creation of next-generation energy sources is required.
二酸化炭素の排出を抑制してエネルギーを得る手段としては、排熱、雪氷熱、振動、電磁波等の未使用エネルギーや太陽光等の再生可能エネルギーを活用する技術開発が進められている。これらの発電技術は、電気エネルギーを創出するに留まり、エネルギーを貯蓄できない。また、化石燃料を原料とした化学製品を創ることもできない。 To obtain energy while reducing carbon dioxide emissions, technological development is underway to utilize unused energy sources such as exhaust heat, snow and ice heat, vibrations, and electromagnetic waves, as well as renewable energy sources such as sunlight. However, these power generation technologies are limited to generating electrical energy and cannot store energy. Furthermore, they cannot be used to create chemical products from fossil fuels.
これらの課題を同時に解決する方法として、光エネルギーを用いて二酸化炭素を還元する技術が注目されている。例えば、非特許文献1は、光照射による二酸化炭素の還元装置を開示している。酸化槽では、酸化電極に光が照射されると、その酸化電極で電子・正孔対の生成及び分離が生じ、電解液内の水の酸化反応により酸素及びプロトン(H+)が生成する。プロトンは電解質膜を通過して還元槽に到達し、電子は導線を介して還元電極に流れる。還元槽では、溶液内の還元電極で、プロトンと電子と溶液に溶解した二酸化炭素とによる二酸化炭素の還元反応が引き起こされる。この還元反応により、エネルギー資源として利用できる一酸化炭素、ギ酸、及びメタン等が生成される。 As a method for simultaneously solving these problems, technology that uses light energy to reduce carbon dioxide has attracted attention. For example, Non-Patent Document 1 discloses a carbon dioxide reduction device that uses light irradiation. In an oxidation tank, when light is irradiated onto an oxidation electrode, electron-hole pairs are generated and separated at the oxidation electrode, and oxygen and protons (H + ) are generated by an oxidation reaction of water in the electrolyte. The protons pass through the electrolyte membrane to reach the reduction tank, and the electrons flow to the reduction electrode via a conductor. In the reduction tank, a reduction reaction of carbon dioxide occurs at the reduction electrode in the solution, involving the protons, electrons, and carbon dioxide dissolved in the solution. This reduction reaction produces carbon monoxide, formic acid, methane, and other substances that can be used as energy resources.
非特許文献1の二酸化炭素還元装置では、還元電極を溶液に浸漬させ、二酸化炭素を当該溶液中に溶解することで、二酸化炭素を還元電極へ供給していた。しかしながら、この二酸化炭素の還元方法では、還元電極が溶液に浸漬しているため、溶液での二酸化炭素の溶解濃度や溶液中での二酸化炭素の拡散係数に限界があり、二酸化炭素の還元電極への供給量が制限される。In the carbon dioxide reduction device described in Non-Patent Document 1, the reduction electrode is immersed in a solution, and carbon dioxide is dissolved in the solution, thereby supplying carbon dioxide to the reduction electrode. However, because this carbon dioxide reduction method requires the reduction electrode to be immersed in the solution, there are limitations to the concentration of carbon dioxide dissolved in the solution and the diffusion coefficient of carbon dioxide in the solution, which limits the amount of carbon dioxide that can be supplied to the reduction electrode.
そこで、二酸化炭素の還元電極への供給量を増加させるため、還元槽内の溶液を排除し、二酸化炭素を還元電極へ直接供給する研究が進められている。非特許文献2では、還元電極に対して気相の二酸化炭素を直接供給する構造の還元槽を用いることで、二酸化炭素の還元電極への供給量を増大させ、二酸化炭素の還元反応を促進させている。Therefore, in order to increase the amount of carbon dioxide supplied to the reduction electrode, research is being conducted into removing the solution from the reduction tank and supplying carbon dioxide directly to the reduction electrode. In Non-Patent Document 2, a reduction tank designed to directly supply gaseous carbon dioxide to the reduction electrode is used, thereby increasing the amount of carbon dioxide supplied to the reduction electrode and promoting the carbon dioxide reduction reaction.
しかしながら、還元反応が進行すると、還元電極の反応表面において、二酸化炭素の還元生成物が生成し、気体である水素、一酸化炭素、メタンだけでなく、液体であるギ酸、メタノール、エタノール等も生成する。また、時間経過に伴い、酸化槽内の電解液が電解質膜を通過して還元槽に徐々に滲出する。そのため、これらの液体で還元電極の反応表面(反応サイト)が被覆されてしまい、二酸化炭素の還元反応が進行しなくなる。それゆえ、従来の二酸化炭素還元装置は、数十時間で二酸化炭素の還元反応効率が低下するという課題があった。However, as the reduction reaction progresses, carbon dioxide reduction products are produced on the reaction surface of the reduction electrode, producing not only gaseous hydrogen, carbon monoxide, and methane, but also liquids such as formic acid, methanol, and ethanol. Furthermore, over time, the electrolyte in the oxidation chamber gradually seeps into the reduction chamber through the electrolyte membrane. As a result, the reaction surface (reaction site) of the reduction electrode becomes covered with these liquids, preventing the carbon dioxide reduction reaction from proceeding. Therefore, conventional carbon dioxide reduction devices had the problem of a decline in the efficiency of the carbon dioxide reduction reaction within a few tens of hours.
本発明は、上記事情に鑑みてなされたものであり、本発明の目的は、二酸化炭素の還元反応効率を改善可能な技術を提供することである。 The present invention was made in consideration of the above circumstances, and its object is to provide technology that can improve the efficiency of carbon dioxide reduction reactions.
本発明の一態様の電解質膜は、酸化槽内の電解液と還元槽内の還元電極との間にそれぞれに接触して配置され、前記還元電極に二酸化炭素を直接接触させて二酸化炭素の還元反応を行う二酸化炭素還元装置に用いられる電解質膜において、前記電解液に接触する表面の一部に撥水膜を備える。 One embodiment of the electrolyte membrane of the present invention is an electrolyte membrane used in a carbon dioxide reduction device that is placed between and in contact with an electrolyte solution in an oxidation cell and a reduction electrode in a reduction cell, and that performs a carbon dioxide reduction reaction by directly contacting carbon dioxide with the reduction electrode, and is provided with a water-repellent film on a portion of its surface that comes into contact with the electrolyte solution.
本発明の一態様の電解質膜の製造方法は、上記電解質膜を製造する電解質膜の製造方法において、電解質膜の片面に水溶性高分子を塗布する工程と、前記水溶性高分子内の水分を除去する工程と、前記電解質膜の両面に撥水処理を行う工程と、前記電解質膜の片面から前記水溶性高分子を除去する工程と、を行う。 One aspect of the present invention is a method for manufacturing an electrolyte membrane, which comprises the steps of applying a water-soluble polymer to one side of the electrolyte membrane, removing moisture from the water-soluble polymer, applying a water-repellent treatment to both sides of the electrolyte membrane, and removing the water-soluble polymer from one side of the electrolyte membrane.
本発明の一態様の電解質膜の製造方法は、上記電解質膜を製造する電解質膜の製造方法において、電解質膜の片面に撥水性高分子を塗布する工程と、前記撥水性高分子内の溶媒を除去する工程と、を行う。 One aspect of the present invention is a method for manufacturing an electrolyte membrane, which comprises the steps of applying a water-repellent polymer to one side of the electrolyte membrane and removing the solvent from the water-repellent polymer.
本発明の一態様の電解質膜の製造方法は、上記電解質膜を製造する電解質膜の製造方法において、電解質膜の片面に水溶性高分子を塗布する工程と、前記水溶性高分子内の水分を除去する工程と、前記電解質膜の両面に撥水性低分子を加熱して蒸着させる撥水処理を行う工程と、前記電解質膜の片面から前記水溶性高分子を除去する工程と、を行う。 One aspect of the present invention is a method for manufacturing an electrolyte membrane, which comprises the steps of applying a water-soluble polymer to one side of the electrolyte membrane, removing moisture from the water-soluble polymer, performing a water-repellent treatment on both sides of the electrolyte membrane by heating and depositing a water-repellent small molecule, and removing the water-soluble polymer from one side of the electrolyte membrane.
本発明の一態様の電解質膜の製造方法は、上記電解質膜を製造する電解質膜の製造方法において、電解質膜の片面に撥水性低分子を加熱して蒸着させる撥水処理を行う工程、を行う。 One aspect of the present invention is a method for manufacturing an electrolyte membrane, which includes a step of performing a water-repellent treatment on one side of the electrolyte membrane by heating and evaporating a water-repellent small molecule.
本発明によれば、二酸化炭素の還元反応効率を改善できる。 The present invention can improve the efficiency of the carbon dioxide reduction reaction.
以下、図面を参照して、本発明の実施形態を説明する。図面の記載において同一部分には同一符号を付し説明を省略する。 An embodiment of the present invention will be described below with reference to the drawings. In the description of the drawings, identical parts are designated by the same reference numerals and their description will be omitted.
[第1実施形態]
図1は、第1実施形態に係る二酸化炭素還元装置100の構成例を示す図である。二酸化炭素還元装置100は、図1に示すように、酸化電極1と、酸化槽2と、電解液3と、還元電極4と、還元槽5と、電解質膜6と、導線7と、光源8と、撥水膜9と、を備える。
[First embodiment]
Fig. 1 is a diagram showing an example of the configuration of a carbon dioxide reduction device 100 according to the first embodiment. As shown in Fig. 1 , the carbon dioxide reduction device 100 includes an oxidation electrode 1, an oxidation tank 2, an electrolyte 3, a reduction electrode 4, a reduction tank 5, an electrolyte membrane 6, a conducting wire 7, a light source 8, and a water-repellent film 9.
酸化電極1は、酸化槽2内の電解液3に浸漬されている。酸化電極1は、所定の面積を持つ基板上に半導体を形成することで形成される。酸化電極1は、例えば、サファイア基板の表面上に、窒化物半導体、酸化チタン、アモルファスシリコン、ルテニウム錯体やレニウム錯体等の光活性やレドックス活性を示す化合物を成膜することにより、形成される。 The oxidation electrode 1 is immersed in the electrolyte 3 in the oxidation tank 2. The oxidation electrode 1 is formed by forming a semiconductor on a substrate of a predetermined area. For example, the oxidation electrode 1 is formed by forming a film of a photoactive or redox-active compound, such as a nitride semiconductor, titanium oxide, amorphous silicon, ruthenium complex, or rhenium complex, on the surface of a sapphire substrate.
酸化槽2は、酸化電極1が浸漬される電解液3を保持する。 The oxidation tank 2 holds the electrolyte 3 in which the oxidation electrode 1 is immersed.
電解液3は、酸化槽2内に入れられている。電解液3は、例えば、炭酸水素カリウム水溶液、炭酸水素ナトリウム水溶液、塩化カリウム水溶液、塩化ナトリウム水溶液、水酸化カリウム水溶液、水酸化ルビジウム水溶液、水酸化セシウム水溶液である。 The electrolyte 3 is placed in the oxidation tank 2. The electrolyte 3 is, for example, an aqueous solution of potassium bicarbonate, an aqueous solution of sodium bicarbonate, an aqueous solution of potassium chloride, an aqueous solution of sodium chloride, an aqueous solution of potassium hydroxide, an aqueous solution of rubidium hydroxide, or an aqueous solution of cesium hydroxide.
還元電極4は、還元槽5内に配置されている。還元電極4は、酸化電極1と同様に所定の面積を持つ基板上に形成される。還元電極4は、例えば、銅、白金、金、銀、インジウム、パラジウム、ガリウム、ニッケル、錫、カドミウム、それらの合金の多孔質体である。その他、還元電極4は、酸化銀、酸化銅、酸化銅(II)、酸化ニッケル、酸化インジム、酸化錫、酸化タングステン、酸化タングステン(VI)、酸化銅等の化合物、金属イオンとアニオン性配位子を有する多孔質金属錯体でもよい。The reduction electrode 4 is placed in the reduction tank 5. Like the oxidation electrode 1, the reduction electrode 4 is formed on a substrate with a predetermined area. The reduction electrode 4 is a porous body made of, for example, copper, platinum, gold, silver, indium, palladium, gallium, nickel, tin, cadmium, or an alloy thereof. The reduction electrode 4 may also be a compound such as silver oxide, copper oxide, copper(II) oxide, nickel oxide, indium oxide, tin oxide, tungsten oxide, tungsten(VI) oxide, or copper oxide, or a porous metal complex having a metal ion and anionic ligand.
還元槽5は、還元電極4を内部に配置し、配管を介して外部から供給される気相の二酸化炭素を保持する。 The reduction tank 5 has a reduction electrode 4 placed inside and holds gaseous carbon dioxide supplied from the outside via piping.
電解質膜6は、酸化槽2と還元槽5との間に配置されている。正確には、電解質膜6は、電解液3と還元電極4との間にそれぞれに接触して配置されている。電解質膜6は、例えば、炭素-フッ素から成る骨格を持つ電解質膜であるナフィオン(登録商標)、フォアブルー、アクイビオン、炭素水素系骨格を持つ電解質膜であるセレミオン、ネオセプタである。 The electrolyte membrane 6 is disposed between the oxidation cell 2 and the reduction cell 5. More precisely, the electrolyte membrane 6 is disposed between the electrolyte solution 3 and the reduction electrode 4, in contact with each of them. The electrolyte membrane 6 is, for example, an electrolyte membrane with a carbon-fluorine skeleton, such as Nafion (registered trademark), ForeBlue, or Aquivion, or an electrolyte membrane with a hydrocarbon skeleton, such as Selemion or Neocepta.
導線7は、酸化電極1と還元電極4とを物理的電気的に接続する。 The conducting wire 7 physically and electrically connects the oxidation electrode 1 and the reduction electrode 4.
光源8は、酸化槽2に近接配置されている。光源8は、例えば、太陽光、キセノンランプ、疑似太陽光源、ハロゲンランプ、水銀ランプ、これらを組み合わせた光源である。 The light source 8 is arranged close to the oxidation tank 2. The light source 8 is, for example, sunlight, a xenon lamp, a solar simulant, a halogen lamp, a mercury lamp, or a combination of these.
なお、還元電極4及び電解質膜6は、一体の材料を用いて構成してもよい。例えば、多孔性機材と触媒とで構成されたガス拡散電極(GDE(登録商標))を用いて実現可能である。ガス拡散電極は、液体と気体とを分離でき、電極内をカチオンが移動できるので、還元電極4と電解質膜6との両方の作用と同等の作用を有する。 The reduction electrode 4 and electrolyte membrane 6 may be constructed using a single material. For example, this can be achieved using a gas diffusion electrode (GDE (registered trademark)) composed of a porous substrate and a catalyst. A gas diffusion electrode can separate liquid and gas and allows cations to move within the electrode, so it has the same effect as both the reduction electrode 4 and the electrolyte membrane 6.
また、図1では、還元電極4及び電解質膜6を、それぞれ、紙面の横方向で大きく幅を持つように描画したが、紙面の横方向の幅を薄くし、紙面の奥行方向に平面を持たせた薄い板状の形状にしてもよい。還元電極4と電解質膜6とを互いの平面で貼り合わせることで、その接触面の反応場を最大化できる。 In addition, in Figure 1, the reduction electrode 4 and electrolyte membrane 6 are each drawn to have a large width in the horizontal direction of the page, but they may also be shaped like a thin plate with a smaller width in the horizontal direction and a flat surface in the depth direction of the page. By bonding the reduction electrode 4 and electrolyte membrane 6 together at their flat surfaces, the reaction field at their contact surfaces can be maximized.
上記の二酸化炭素還元装置100において、酸化槽2では、電解液3と電解液3に浸漬させた半導体の酸化電極1とを用いて光源8からの照射光(光エネルギー)により電解液3内の水の酸化反応が行われる。還元槽5では、酸化電極1に導線7を介して接続された還元電極4と還元電極4に直接接触させた二酸化炭素とを用いて二酸化炭素の還元反応が行われる。In the carbon dioxide reduction device 100, in the oxidation tank 2, an oxidation reaction of water in the electrolyte 3 is carried out by irradiation with light (light energy) from a light source 8 using an electrolyte 3 and a semiconductor oxidation electrode 1 immersed in the electrolyte 3. In the reduction tank 5, a carbon dioxide reduction reaction is carried out using a reduction electrode 4 connected to the oxidation electrode 1 via a lead 7 and carbon dioxide in direct contact with the reduction electrode 4.
具体的には、光源8が酸化槽2の底から光を照射すると、その照射光を受光した酸化槽2内の酸化電極1で電子・正孔対の生成及び分離が生じ、電解液3内の水の酸化反応により酸素及びプロトンが生成する。プロトンは、電解質膜6を通過して酸化槽2内の電解液3から還元槽5内の還元電極4に到達する。電子は、導線7を介して酸化槽2内の酸化電極1から還元槽5内の還元電極4に流れる。還元槽5では、還元電極4において、プロトンと電子と還元電極4に直接接触された気相の二酸化炭素とによる二酸化炭素の還元反応が引き起こされる。この酸化還元反応により、エネルギー資源として利用できる一酸化炭素、ギ酸、及びメタン等が生成される。Specifically, when light source 8 irradiates the oxidation chamber 2 from the bottom, electron-hole pairs are generated and separated at oxidation electrode 1 in oxidation chamber 2, which receives the irradiated light. Oxidation reaction of water in electrolyte 3 generates oxygen and protons. The protons pass through electrolyte membrane 6 and reach reduction electrode 4 in reduction chamber 5 from electrolyte 3 in oxidation chamber 2. Electrons flow via conductor 7 from oxidation electrode 1 in oxidation chamber 2 to reduction electrode 4 in reduction chamber 5. In reduction chamber 5, a carbon dioxide reduction reaction occurs at reduction electrode 4 between the protons, electrons, and gaseous carbon dioxide that is in direct contact with reduction electrode 4. This oxidation-reduction reaction generates carbon monoxide, formic acid, methane, and other energy resources.
このとき、酸化槽2内の電解液3として強アルカリ水溶液、例えば1.0mol/Lの水酸化ナトリウム水溶液を用いた場合、電解質膜6が膨潤し、電解液3が当該電解質膜6の細孔を通過して還元槽5内の還元電極4の表面に滲出する。このような電解液3の電解質膜6からの滲出を防ぐためには、電解液3に接触する酸化槽2側の電解質膜6の表面を撥水処理すればよいが、還元反応の原料であるプロトンを電解質膜6内の水を媒体として移動させる必要があるため、電解質膜6の表面を完全に覆ってしまうと、還元槽5側で還元反応が進行しない恐れがある。In this case, if a strong alkaline aqueous solution, such as a 1.0 mol/L sodium hydroxide aqueous solution, is used as the electrolyte solution 3 in the oxidation tank 2, the electrolyte membrane 6 swells, and the electrolyte solution 3 passes through the pores of the electrolyte membrane 6 and seeps onto the surface of the reduction electrode 4 in the reduction tank 5. To prevent this seepage of the electrolyte solution 3 from the electrolyte membrane 6, the surface of the electrolyte membrane 6 on the oxidation tank 2 side that comes into contact with the electrolyte solution 3 can be treated to be water-repellent. However, because protons, the raw material for the reduction reaction, need to be transported using the water in the electrolyte membrane 6 as a medium, completely covering the surface of the electrolyte membrane 6 could prevent the reduction reaction from proceeding on the reduction tank 5 side.
そこで、本実施形態では、図1に示し、図2に拡大したように、電解質膜6の表面全部を覆わないように、電解質膜6の電解液3に接触する表面一部に撥水膜9を備える。例えば、その表面に複数の撥水膜9を所定の間隔で形成する。このような撥水膜9を形成したことで、その撥水性により、酸化槽2内の電解液3が電解質膜6の内部に侵入することを抑制でき、電解液3の還元電極4への液漏れを抑制でき、還元電極4の反応サイトが電解液3で埋まらなくなる。また、撥水膜9を電解質膜6の表面全部ではなく表面一部に形成したので、プロトンが電解質膜6を通過可能な状態を維持できる。その結果、二酸化炭素の還元反応を進行でき、その還元反応効率の低下を抑制できる。 In this embodiment, as shown in FIG. 1 and enlarged in FIG. 2, a water-repellent film 9 is provided on only a portion of the surface of the electrolyte membrane 6 that comes into contact with the electrolyte solution 3, rather than covering the entire surface of the electrolyte membrane 6. For example, multiple water-repellent films 9 are formed on the surface at predetermined intervals. By forming such a water-repellent film 9, its water-repellent properties prevent the electrolyte solution 3 in the oxidation tank 2 from penetrating into the electrolyte membrane 6, suppressing leakage of the electrolyte solution 3 to the reduction electrode 4 and preventing the reaction sites of the reduction electrode 4 from becoming filled with the electrolyte solution 3. Furthermore, because the water-repellent film 9 is formed on only a portion of the surface of the electrolyte membrane 6, rather than the entire surface, the electrolyte membrane 6 remains able to pass protons. As a result, the carbon dioxide reduction reaction can proceed, and a decrease in the reduction reaction efficiency can be suppressed.
次に、撥水膜9の製造方法を説明する。 Next, we will explain the manufacturing method of the water-repellent film 9.
撥水膜9を製造するための撥水処理には、液相法と気相法とがある。液相法は、撥水剤であるフッ素系高分子を溶解させたフッ素系溶媒に対象物をディップコート法等で浸漬した後、その対象物を加熱等して溶媒を除去することでフッ素系高分子を析出する手法である。液相法のその他の方法としては、対象物の表面に上記フッ素系溶媒をキャストコート法やスピンコート法等で製膜を行った後、その対象物を加熱等して溶媒を除去することでフッ素系高分子を析出する手法である。気相法は、対象物と撥水剤であるフッ素系低分子(シランカップリング剤)とを同一密閉空間に入れ、そのフッ素系低分子を加熱して蒸気にした後、その対象物の表面にフッ素系低分子を蒸着させる手法である。There are two types of water-repellent treatments for producing the water-repellent film 9: liquid-phase and gas-phase. The liquid-phase method involves immersing an object in a fluorine-based solvent containing a fluorine-based polymer (water-repellent agent) using a dip coating method or other method, and then heating the object to remove the solvent, thereby precipitating the fluorine-based polymer. An alternative to the liquid-phase method is to form a film of the fluorine-based solvent on the surface of the object using a cast coating method or spin coating method, and then heating the object to remove the solvent, thereby precipitating the fluorine-based polymer. The gas-phase method involves placing the object and a fluorine-based low-molecular-weight water-repellent agent (silane coupling agent) in the same sealed space, heating the fluorine-based low-molecular-weight water-repellent agent to vaporize it, and then depositing the fluorine-based low-molecular-weight water-repellent agent on the surface of the object.
図3は、撥水膜9の第1製造方法を示す図である。第1製造方法は、液相法による撥水膜9の製造方法である。電解質膜6にはナフィオンを用いた。撥水剤にはオプツールDSXを用いた。 Figure 3 shows the first manufacturing method for the water-repellent film 9. The first manufacturing method is a liquid-phase method for manufacturing the water-repellent film 9. Nafion was used for the electrolyte membrane 6. Optool DSX was used as the water-repellent agent.
まず、水溶性高分子を純水に溶解して1%濃度のポリビニルアルコール水溶液を作成する(第1工程S101)。次に、スピンコート法を用いて、そのポリビニルアルコール水溶液をナフィオン膜の片面に滴下し、その片面にポリビニルアルコールを成膜する(第2工程S102)。First, a water-soluble polymer is dissolved in pure water to prepare a 1% polyvinyl alcohol aqueous solution (first step S101). Next, the polyvinyl alcohol aqueous solution is dropped onto one side of a Nafion membrane using a spin coating method, forming a polyvinyl alcohol film on that side (second step S102).
次に、そのナフィオン膜を60℃のオーブンに1時間静置し、ポリビニルアルコール内の水分を蒸発させる(第3工程S103)。この工程により、ナフィオン膜の片面に高分子膜(水溶性高分子)が形成される。次に、そのナフィオン膜をオプツールDSX溶液(撥水性高分子)に1分間浸漬して引き上げるディップコートを行う(第4工程S104)。この工程により、ナフィオン膜の両面に撥水膜が形成される。Next, the Nafion membrane is placed in a 60°C oven for one hour to evaporate the water in the polyvinyl alcohol (third step S103). This step forms a polymer film (water-soluble polymer) on one side of the Nafion membrane. Next, the Nafion membrane is dip-coated by immersing it in Optool DSX solution (water-repellent polymer) for one minute and then pulling it out (fourth step S104). This step forms a water-repellent film on both sides of the Nafion membrane.
最後に、そのナフィオン膜を純水で洗浄する(第5工程S105)。この工程により、撥水膜が塗布されたポリビニルアルコール(水溶性高分子)を除去できる。つまり、ナフィオン膜の片面から高分子膜(水溶性高分子)が除去され、その高分子膜上の撥水膜も除去される。Finally, the Nafion membrane is washed with pure water (step S105). This step removes the polyvinyl alcohol (water-soluble polymer) on which the water-repellent film is applied. In other words, the polymer film (water-soluble polymer) is removed from one side of the Nafion membrane, and the water-repellent film on that polymer film is also removed.
これらの工程により、ナフィオン膜の片面にのみ撥水膜を形成できる。このようなディップコート法を用いて撥水膜を形成する方法では、マイクロメートルオーダの比較的厚い撥水膜を形成できる。 These processes allow a water-repellent film to be formed on only one side of the Nafion membrane. This method of forming a water-repellent film using dip coating can produce a relatively thick water-repellent film on the order of micrometers.
図4は、撥水膜9の第2製造方法を示す図である。第2製造方法は、他の液相法による撥水膜9の製造方法である。電解質膜6にはナフィオンを用いた。撥水剤にはオプツールDSXを用いた。 Figure 4 shows a second manufacturing method for the water-repellent film 9. The second manufacturing method is a method for manufacturing the water-repellent film 9 using another liquid phase method. Nafion was used for the electrolyte membrane 6. Optool DSX was used as the water-repellent agent.
まず、スピンコート法を用いて、ナフィオン膜の片面にオプツールDSX(撥水性高分子)を滴下する(第1工程S201)。その後、そのナフィオン膜を静置し、オプツールDSX内の溶媒を蒸発させる(第2工程S202)。この工程により、ナフィオン膜の片面に高分子膜(撥水膜)が形成される。First, Optool DSX (a water-repellent polymer) is dropped onto one side of the Nafion membrane using the spin coating method (first step S201). The Nafion membrane is then left to stand, and the solvent in the Optool DSX is allowed to evaporate (second step S202). This process forms a polymer film (water-repellent film) on one side of the Nafion membrane.
これらの工程により、ナフィオン膜の片側にのみ撥水膜を形成できる。このようなスピンコート法を用いて撥水膜を形成する方法では、遠心力を用いるので、原理上サブマイクロメートルオーダの薄い撥水膜を形成できる。 Through these processes, a water-repellent film can be formed on only one side of the Nafion membrane. This spin-coating method for forming a water-repellent film uses centrifugal force, so in principle, it is possible to form a thin water-repellent film on the order of submicrometers.
図5は、撥水膜9の第3製造方法を示す図である。第3製造方法は、気相法による撥水膜9の製造方法である。電解質膜6にはナフィオンを用いた。撥水剤にはフッ素系シランカップリング剤(例えば、ヘプタデカフルオロ-1,1,2,2-テトラヒドロデシルトリメトキシシラン)を用いた。 Figure 5 shows a third manufacturing method for the water-repellent film 9. The third manufacturing method is a gas-phase method for manufacturing the water-repellent film 9. Nafion was used for the electrolyte membrane 6. A fluorine-based silane coupling agent (e.g., heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane) was used as the water-repellent agent.
まず、水溶性高分子を純水に溶解して1%濃度のポリビニルアルコール水溶液を作成する(第1工程S301)。次に、スピンコート法を用いて、そのポリビニルアルコール水溶液をナフィオン膜の片面に滴下し、その片面にポリビニルアルコールを成膜する(第2工程S302)。First, a water-soluble polymer is dissolved in pure water to prepare a 1% polyvinyl alcohol aqueous solution (first step S301). Next, the polyvinyl alcohol aqueous solution is dropped onto one side of a Nafion membrane using a spin coating method, forming a polyvinyl alcohol film on that side (second step S302).
次に、そのナフィオン膜を60℃のオーブンに1時間静置し、ポリビニルアルコール内の水分を蒸発させる(第3工程S303)。この工程により、ナフィオン膜の片面に高分子膜(水溶性高分子)が形成される。次に、そのナフィオン膜とフッ素系シランカップリング剤(撥水性低分子)とをテフロン容器に入れて密封する(第4工程S304)。Next, the Nafion membrane is placed in a 60°C oven for one hour to evaporate the water in the polyvinyl alcohol (third step S303). This step forms a polymer film (water-soluble polymer) on one side of the Nafion membrane. Next, the Nafion membrane and a fluorine-based silane coupling agent (water-repellent low-molecular-weight compound) are placed in a Teflon container and sealed (fourth step S304).
次に、そのテフロン容器をオーブンに入れて150℃で加熱する(第5工程S305)。この工程により、フッ素系シランカップリング剤が蒸発し、ナフィオン膜の両面に撥水膜が形成される。最後に、そのナフィオン膜を純水で洗浄する(第6工程S306)。この工程により、撥水膜が塗布されたポリビニルアルコール(水溶性高分子)を除去できる。つまり、ナフィオン膜の片面から高分子膜(水溶性高分子)が除去され、その高分子膜上の撥水膜も除去される。Next, the Teflon container is placed in an oven and heated to 150°C (step S305). This step evaporates the fluorine-based silane coupling agent, forming a water-repellent film on both sides of the Nafion membrane. Finally, the Nafion membrane is washed with pure water (step S306). This step removes the polyvinyl alcohol (water-soluble polymer) on which the water-repellent film was applied. In other words, the polymer film (water-soluble polymer) is removed from one side of the Nafion membrane, and the water-repellent film on that polymer film is also removed.
これらの工程により、ナフィオン膜の片側にのみ撥水膜を形成できる。この気相法では、ナフィオン表面に単分子膜を形成するので、ナノメートルオーダの極薄の撥水膜を形成できる。 Through these processes, a water-repellent film can be formed on only one side of the Nafion membrane. This vapor-phase method forms a monolayer on the Nafion surface, allowing for the formation of an extremely thin water-repellent film on the order of nanometers.
図6は、撥水膜9の第4製造方法を示す図である。第4製造方法は、他の気相法による撥水膜9の製造方法である。電解質膜6にはナフィオンを用いた。撥水剤にはフッ素系シランカップリング剤(例えば、ヘプタデカフルオロ-1,1,2,2-テトラヒドロデシルトリメトキシシラン)を用いた。 Figure 6 shows a fourth manufacturing method for the water-repellent film 9. The fourth manufacturing method is a method for manufacturing the water-repellent film 9 using another vapor phase method. Nafion was used for the electrolyte membrane 6. A fluorine-based silane coupling agent (e.g., heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane) was used as the water-repellent agent.
まず、ナフィオン膜をテフロン容器の底に密着させて静置し、その上からヘフッ素系シランカップリング剤(撥水性低分子)を入れて密封する(第1工程S401)。最後に、その状態を維持したまま当該テフロン容器をオーブンに入れて150℃で加熱する(第2工程S402)。この工程により、フッ素系シランカップリング剤が蒸発し、ナフィオン膜の片面に撥水膜が形成される。First, the Nafion membrane is placed in close contact with the bottom of a Teflon container and left to stand. A fluorine-based silane coupling agent (water-repellent low-molecular weight) is then poured on top and the container is sealed (first step S401). Finally, while maintaining this state, the Teflon container is placed in an oven and heated to 150°C (second step S402). This step evaporates the fluorine-based silane coupling agent, forming a water-repellent film on one side of the Nafion membrane.
これらの工程により、ナフィオン膜の片側にのみ撥水膜を形成できる。この気相法では、ナフィオン表面に単分子膜を形成するので、ナノメートルオーダの極薄の撥水膜を形成できる。 Through these processes, a water-repellent film can be formed on only one side of the Nafion membrane. This vapor-phase method forms a monolayer on the Nafion surface, allowing for the formation of an extremely thin water-repellent film on the order of nanometers.
次に、上記の二酸化炭素還元装置100による電気化学測定及びその測定結果を説明する。 Next, we will explain the electrochemical measurements and measurement results using the above-mentioned carbon dioxide reduction device 100.
まず、サファイア基板上にn型半導体である窒化ガリウム(GaN)の薄膜と窒化アルミニウムガリウム(AlGaN)とをその順にエピタキシャル成長させ、その上にニッケル(Ni)を真空蒸着して熱処理を行うことで、酸化ニッケル(NiO)の助触媒薄膜を形成した。そして、その助触媒薄膜を酸化電極1とし、その酸化電極1を酸化槽2内の1.0mol/Lの水酸化カリウム水溶液の電解液3に浸漬させた。First, a thin film of n-type semiconductor gallium nitride (GaN) and aluminum gallium nitride (AlGaN) were epitaxially grown in that order on a sapphire substrate, and then nickel (Ni) was vacuum-deposited on top of that and heat-treated to form a nickel oxide (NiO) promoter thin film. This promoter thin film was then used as the oxidation electrode 1, and the oxidation electrode 1 was immersed in an electrolyte 3 of a 1.0 mol/L potassium hydroxide aqueous solution in an oxidation tank 2.
また、銅の多孔体を用いて還元電極4を形成し、その還元電極4を導線7で酸化電極1に接続し、その還元電極4を還元槽5内に設置した。 In addition, a reduction electrode 4 was formed using a porous copper body, and the reduction electrode 4 was connected to the oxidation electrode 1 with a conductor 7, and the reduction electrode 4 was placed in the reduction tank 5.
また、酸化槽2と還元槽5と物理的に分離する電解質膜6には、ナフィオンを用いた。その電解質膜6の両面のうち、撥水膜9が形成されている片面を酸化槽2内の電解液3に接触するように配置し、他方の片面を還元槽5内の還元電極4に接触するように配置した。 Nafion was used for the electrolyte membrane 6, which physically separates the oxidation tank 2 and the reduction tank 5. Of the two surfaces of the electrolyte membrane 6, one surface on which a water-repellent film 9 is formed is positioned so as to contact the electrolyte solution 3 in the oxidation tank 2, and the other surface is positioned so as to contact the reduction electrode 4 in the reduction tank 5.
また、光源8には、300Wのキセノンランプを用いた。450nm以上の波長をフィルターでカットし、照度を6.6mW/cm2とした。酸化電極1の照射面を2.5cm2とした。 A 300 W xenon lamp was used as the light source 8. Wavelengths of 450 nm or more were cut off with a filter, and the illuminance was set to 6.6 mW/cm 2. The irradiated surface of the oxidation electrode 1 was set to 2.5 cm 2 .
そして、酸化槽2と還元槽5とに窒素と二酸化炭素とをそれぞれ流量5ml/min、かつ、圧力0.5MPaで供給した。酸化槽2への窒素のバブリングは、反応生成物を分析する目的で行った。酸化槽2と還元槽5との各内部をそれぞれ窒素と二酸化炭素とで十分に置換し、光源8から光を照射した。その後、還元電極4である銅多孔体の表面で二酸化炭素の還元反応が進行した。Nitrogen and carbon dioxide were then supplied to the oxidation tank 2 and reduction tank 5 at a flow rate of 5 ml/min and a pressure of 0.5 MPa, respectively. Nitrogen was bubbled into the oxidation tank 2 for the purpose of analyzing the reaction products. The interiors of the oxidation tank 2 and reduction tank 5 were thoroughly replaced with nitrogen and carbon dioxide, respectively, and light was then irradiated from the light source 8. The carbon dioxide reduction reaction then proceeded on the surface of the porous copper body, which served as the reduction electrode 4.
このとき、照射光により酸化電極1と還元電極4との間に流れる電流を電気化学測定装置(Solartron社製、1287型ポテンショガルバノスタット)で測定した。また、酸化槽2と還元槽5とで生じるガスと液体を採取し、ガスクロマトグラフ、液体クロマトグラフ、ガスクロマトグラフ質量分析計を用いて反応生成物を分析した。 The current flowing between the oxidation electrode 1 and the reduction electrode 4 due to the irradiated light was measured using an electrochemical measurement device (Solartron, Model 1287 potentiogalvanostat). In addition, the gas and liquid produced in the oxidation tank 2 and the reduction tank 5 were sampled, and the reaction products were analyzed using a gas chromatograph, a liquid chromatograph, and a gas chromatograph mass spectrometer.
特に、本実施形態では、二酸化炭素還元反応のファラデー効率を求めることで、電解質膜6の表面に形成した撥水膜9の効果を検討した。なお、二酸化炭素還元反応のファラデー効率の計算方法は、後述する。In particular, in this embodiment, the effect of the water-repellent film 9 formed on the surface of the electrolyte membrane 6 was examined by calculating the Faraday efficiency of the carbon dioxide reduction reaction. The method for calculating the Faraday efficiency of the carbon dioxide reduction reaction will be described later.
実施例1では、電解質膜6にはナフィオンを用い、撥水剤にはオプツールDSXを用い、水溶性高分子には純水に溶解した1%濃度のポリビニルアルコール水溶液を用いて、製造方法1で製造した撥水膜9を用いた。 In Example 1, Nafion was used as the electrolyte membrane 6, Optool DSX was used as the water-repellent agent, and a 1% concentration aqueous solution of polyvinyl alcohol dissolved in pure water was used as the water-soluble polymer, and a water-repellent film 9 manufactured by manufacturing method 1 was used.
実施例2では、電解質膜6にはナフィオンを用い、撥水剤にはオプツールDSXを用いて、製造方法2で製造した撥水膜9を用いた。 In Example 2, Nafion was used as the electrolyte membrane 6, Optool DSX was used as the water repellent agent, and a water-repellent film 9 manufactured by manufacturing method 2 was used.
実施例3では、電解質膜6にはナフィオンを用い、撥水剤にはヘプタデカフルオロ-1,1,2,2-テトラヒドロデシルトリメトキシシランを用い、水溶性高分子には純水に溶解した1%濃度のポリビニルアルコール水溶液を用いて、製造方法3で製造した撥水膜9を用いた。 In Example 3, Nafion was used as the electrolyte membrane 6, heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane was used as the water-repellent agent, and a 1% aqueous solution of polyvinyl alcohol dissolved in pure water was used as the water-soluble polymer, and a water-repellent film 9 manufactured by manufacturing method 3 was used.
実施例4では、電解質膜6にはナフィオンを用い、撥水剤にはヘプタデカフルオロ-1,1,2,2-テトラヒドロデシルトリメトキシシランを用いて、製造方法4で製造した撥水膜9を用いた。 In Example 4, Nafion was used as the electrolyte membrane 6, heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane was used as the water repellent agent, and a water-repellent film 9 manufactured by manufacturing method 4 was used.
比較例では、撥水膜9を形成していないナフィオンをそのまま電解質膜6として用いた。 In the comparative example, Nafion without a water-repellent film 9 was used as the electrolyte membrane 6.
図7は、第1実施形態に係るギ酸のファラデー効率の測定結果を示す図である。撥水膜9を形成していない比較例では、ファラデー効率が6時間以降減少した。一方、撥水膜9を形成した実施例1~実施例4では、6時間以降でもファラデー効率は減少しなかった。これは、ナフィオン膜に撥水膜9を導入した結果、電解液3の還元電極4への液漏れが抑制され、還元電極4の反応サイトが電解液3で埋まらなくなったためである。 Figure 7 shows the measurement results of the Faraday efficiency of formic acid in the first embodiment. In the comparative example in which the water-repellent film 9 was not formed, the Faraday efficiency decreased after 6 hours. On the other hand, in Examples 1 to 4 in which the water-repellent film 9 was formed, the Faraday efficiency did not decrease even after 6 hours. This is because the introduction of the water-repellent film 9 into the Nafion membrane suppressed leakage of the electrolyte 3 to the reduction electrode 4, and the reaction sites of the reduction electrode 4 were no longer filled with the electrolyte 3.
また、ナフィオン膜に対する撥水膜9の被覆率をCassie-Baxterの式を用いて見積もった。撥水膜9を塗布したナフィオン膜の接触角をθ、ナフィオン膜表面の接触角をθ1、ナフィオン膜表面の割合をf1、撥水膜9表面の接触角をθ2、撥水膜9表面の割合をf2とすると、式(1)の関係がある。 The coverage rate of the water-repellent film 9 relative to the Nafion film was also estimated using the Cassie-Baxter equation. If the contact angle of the Nafion film coated with the water-repellent film 9 is θ, the contact angle of the Nafion film surface is θ1, the proportion of the Nafion film surface is f1, the contact angle of the water-repellent film 9 surface is θ2, and the proportion of the water-repellent film 9 surface is f2, then the relationship shown in equation (1) holds.
cosθ=f1×cosθ1+f2×cosθ2・・・(1)
実施例1~実施例4のそれぞれにおいて、撥水膜9を塗布したナフィオン膜の接触角θは、それぞれ、100°、95°、75°、70°であった。また、ナフィオン膜に対する撥水膜9の被覆率は、それぞれ、84%、79%、64%、60%と見積もられた。これは、電解質膜6の表面を全て覆わない撥水膜9を形成できたことを示唆している。
cosθ=f1×cosθ1+f2×cosθ2...(1)
In each of Examples 1 to 4, the contact angle θ of the Nafion membrane coated with the water-repellent film 9 was 100°, 95°, 75°, and 70°, respectively. The coverage of the water-repellent film 9 with respect to the Nafion membrane was estimated to be 84%, 79%, 64%, and 60%, respectively. This suggests that a water-repellent film 9 that did not completely cover the surface of the electrolyte membrane 6 was successfully formed.
ここで、二酸化炭素還元反応のファラデー効率の計算方法を説明する。二酸化炭素のファラデー効率は、光照射や電流電圧印加によって酸化電極1と還元電極4との間を移動した電子数に対して、二酸化炭素還元反応に使われた電子数の割合を示すものであり、式(2)で計算できる。Here, we will explain how to calculate the Faraday efficiency of the carbon dioxide reduction reaction. The Faraday efficiency of carbon dioxide indicates the ratio of the number of electrons used in the carbon dioxide reduction reaction to the number of electrons transferred between the oxidation electrode 1 and the reduction electrode 4 due to light irradiation or application of current and voltage, and can be calculated using equation (2).
ファラデー効率={還元反応の電子数}/{電極間を移動した電子数}・・・(2)
式(2)の「還元反応の電子数」は、二酸化炭素の還元生成物の積算生成量の測定値を、その生成反応に必要な電子数に換算することで求める。例えば、還元生成物が気体の場合の「還元反応の電子数」は、式(3)で計算できる。
Faraday efficiency = {number of electrons in the reduction reaction} / {number of electrons transferred between electrodes} (2)
The "number of electrons in the reduction reaction" in formula (2) is calculated by converting the measured cumulative amount of carbon dioxide reduction product produced into the number of electrons required for the production reaction. For example, when the reduction product is a gas, the "number of electrons in the reduction reaction" can be calculated using formula (3).
各還元反応の電子数(C)={(A×B×Z×F×T×10-6)}/Vg・・・(3)
Aは、還元反応生成物の濃度(ppm)である。Bは、キャリアガスの流量(L/sec)である。Zは、還元反応に必要な電子数である。Fは、ファラデー定数(C/mol)である。Tは、光照射時間又は電流電圧印加時間を(sec)である。Vgは、気体のモル体積(L/mol)である。
Number of electrons in each reduction reaction (C)={(A×B×Z×F×T×10 −6 )}/V g (3)
A is the concentration (ppm) of the reduction reaction product. B is the flow rate (L/sec) of the carrier gas. Z is the number of electrons required for the reduction reaction. F is the Faraday constant (C/mol). T is the light irradiation time or current/voltage application time (sec). V g is the molar volume of the gas (L/mol).
還元生成物が液体の場合の「還元反応の電子数」は、式(4)で計算できる。 The "number of electrons in the reduction reaction" when the reduction product is liquid can be calculated using equation (4).
各還元反応の電子数(C)=C×Vl×Z×F・・・(4)
Cは、還元反応生成物の濃度(mol/L)である。Vlは、液体サンプルの体積(L)である。Zは、還元反応に必要な電子数である。Fは、ファラデー定数(C/mol)である。
Number of electrons in each reduction reaction (C) = C × V l × Z × F (4)
C is the concentration of the reduction reaction product (mol/L); V 1 is the volume of the liquid sample (L); Z is the number of electrons required for the reduction reaction; F is the Faraday constant (C/mol).
以上、第1実施形態を説明した。第1実施形態に係る二酸化炭素還元装置100によれば、ファラデー効率を落とすことなく、二酸化炭素還元反応を進行させられる二酸化炭素還元装置100を提供できる。The first embodiment has been described above. The carbon dioxide reduction device 100 according to the first embodiment can provide a carbon dioxide reduction device 100 that can proceed with the carbon dioxide reduction reaction without reducing the Faraday efficiency.
すなわち、第1実施形態では、電解液3と電解液3に浸漬させる半導体の酸化電極1とを用いて光源8からの照射光により水の酸化反応を行う酸化槽2と、酸化電極1に導線7を介して接続される還元電極4と還元電極4に直接接触させる二酸化炭素とを用いて二酸化炭素の還元反応を行う還元槽5と、酸化槽2内の電解液3と還元槽5内の還元電極4との間にそれぞれに接触して配置される電解質膜6と、を備えた二酸化炭素還元装置100において、電解質膜6が、電解液3に接触する表面一部に撥水膜9を備える。 That is, in the first embodiment, the carbon dioxide reduction device 100 includes an oxidation tank 2 that performs a water oxidation reaction by irradiating light from a light source 8 using an electrolyte solution 3 and a semiconductor oxidation electrode 1 immersed in the electrolyte solution 3, a reduction tank 5 that performs a carbon dioxide reduction reaction using a reduction electrode 4 connected to the oxidation electrode 1 via a lead wire 7 and carbon dioxide that is in direct contact with the reduction electrode 4, and an electrolyte membrane 6 that is arranged in contact with the electrolyte solution 3 in the oxidation tank 2 and the reduction electrode 4 in the reduction tank 5, respectively, and the electrolyte membrane 6 has a water-repellent film 9 on a portion of its surface that comes into contact with the electrolyte solution 3.
そのため、電解液3の表面に備わる撥水膜9の撥水性により、酸化槽2内の電解液3が電解質膜6の内部に侵入することを抑制でき、電解液3の還元電極4への液漏れを抑制でき、還元電極4の反応サイトが電解液3で埋まらなくなる。また、撥水膜9を電解質膜6の表面一部に備えるので、プロトンが電解質膜6を通過可能な状態を維持できる。その結果、二酸化炭素の還元反応を進行でき、その還元反応効率の低下を抑制できる。Therefore, the water-repellent properties of the water-repellent film 9 on the surface of the electrolyte solution 3 prevent the electrolyte solution 3 in the oxidation tank 2 from penetrating into the electrolyte membrane 6, preventing leakage of the electrolyte solution 3 to the reduction electrode 4 and preventing the reaction sites of the reduction electrode 4 from becoming clogged with the electrolyte solution 3. Furthermore, since the water-repellent film 9 is provided on only a portion of the surface of the electrolyte membrane 6, it is possible to maintain a state in which protons can pass through the electrolyte membrane 6. As a result, the carbon dioxide reduction reaction can proceed and a decrease in the efficiency of the reduction reaction can be prevented.
なお、上記の実験では、酸化電極1に対する光の照射量を定量的に管理するために光をキセノンランプで生じさせたが、太陽光等を用いて酸化反応を起こすことも可能である。 In the above experiment, light was generated using a xenon lamp in order to quantitatively control the amount of light irradiated onto the oxidation electrode 1, but it is also possible to induce the oxidation reaction using sunlight, etc.
[第2実施形態]
第1実施形態では、光源8と半導体で構成される酸化電極1とを用いる場合を説明した。第2実施形態では、それらに代えて、外部電源及び金属で構成される酸化電極1を用いて酸化・還元反応を進行させる。
Second Embodiment
In the first embodiment, a case where a light source 8 and an oxidation electrode 1 made of a semiconductor are used has been described. In the second embodiment, instead of these, an external power source and an oxidation electrode 1 made of a metal are used to cause an oxidation-reduction reaction to proceed.
図8は、第2実施形態に係る二酸化炭素還元装置100の構成例を示す図である。酸化電極1は、白金である。その他、酸化電極1は、例えば、金、銀でもよい。外部の電源10は、電気化学測定装置であり、酸化電極1と還元電極4とを接続している導線7に直列接続される。電源10は、その他の電源装置でもよい。その他の構成要素は、第1実施形態と同一である。 Figure 8 is a diagram showing an example configuration of a carbon dioxide reduction device 100 according to the second embodiment. The oxidation electrode 1 is platinum. Alternatively, the oxidation electrode 1 may be made of, for example, gold or silver. The external power supply 10 is an electrochemical measurement device, and is connected in series to the conductor 7 connecting the oxidation electrode 1 and the reduction electrode 4. The power supply 10 may be any other power supply device. The other components are the same as those of the first embodiment.
本実施形態に係る二酸化炭素還元装置100において、酸化槽2では、電解液3と電解液3に浸漬させた白金(金属)の酸化電極1とを用いて電源10からの電流電圧(電機エネルギー)により電解液3内の水の酸化反応が行われる。還元槽5では、電源10(電気エネルギーの源)に接続された還元電極4と還元電極4に直接接触させた二酸化炭素とを用いて二酸化炭素の還元反応が行われる。In the carbon dioxide reduction device 100 according to this embodiment, in the oxidation tank 2, an oxidation reaction of water in the electrolyte 3 is carried out by current and voltage (electrical energy) from a power source 10 using an electrolyte 3 and a platinum (metal) oxidation electrode 1 immersed in the electrolyte 3. In the reduction tank 5, a carbon dioxide reduction reaction is carried out using a reduction electrode 4 connected to the power source 10 (a source of electrical energy) and carbon dioxide in direct contact with the reduction electrode 4.
具体的には、電源10が電流電圧を導線7に印加すると、酸化槽2内の酸化電極1で電子・正孔対の生成及び分離が生じ、電解液3内の水の酸化反応により酸素及びプロトンが生成する。プロトンは、電解質膜6を通過して酸化槽2内の電解液3から還元槽5内の還元電極4に到達する。電子は、導線7を介して電源10から還元槽5内の還元電極4に流れる。還元槽5では、還元電極4において、プロトンと電子と還元電極4に直接接触された気相の二酸化炭素とによる二酸化炭素の還元反応が引き起こされる。 Specifically, when power supply 10 applies a current and voltage to conductor 7, electron-hole pairs are generated and separated at oxidation electrode 1 in oxidation tank 2, and oxygen and protons are generated by an oxidation reaction of water in electrolyte 3. The protons pass through electrolyte membrane 6 and reach reduction electrode 4 in reduction tank 5 from electrolyte 3 in oxidation tank 2. Electrons flow from power supply 10 via conductor 7 to reduction electrode 4 in reduction tank 5. In reduction tank 5, a carbon dioxide reduction reaction occurs at reduction electrode 4 between the protons, electrons, and gaseous carbon dioxide that is in direct contact with reduction electrode 4.
第2実施形態においても、第1実施形態と同様に、電解質膜6の表面全部を覆わないように、電解質膜6の電解液3に接触する表面一部に撥水膜9を備える。例えば、その表面に複数の撥水膜9を所定の間隔で形成する。また、撥水膜9の製造方法は、第1実施形態と同様に、第1製造方法~第4製造方法を用いる。 In the second embodiment, as in the first embodiment, a water-repellent film 9 is provided on only a portion of the surface of the electrolyte membrane 6 that comes into contact with the electrolyte solution 3, so as not to cover the entire surface of the electrolyte membrane 6. For example, multiple water-repellent films 9 are formed on the surface at predetermined intervals. Furthermore, as in the first embodiment, the water-repellent film 9 is manufactured using the first to fourth manufacturing methods.
図9は、第2実施形態に係るギ酸のファラデー効率の測定結果を示す図である。第1実施形態で説明した実施例1~実施例4のそれぞれと同一の電解質膜6を用いたそれぞれの実施例を実施例5~実施例8としている。撥水膜9を形成していないナフィオンをそのまま電解質膜6として用いた比較例も記載している。 Figure 9 shows the measurement results of the Faraday efficiency of formic acid in the second embodiment. Examples 5 to 8 are examples that use the same electrolyte membrane 6 as Examples 1 to 4 described in the first embodiment. A comparative example is also shown in which Nafion without a water-repellent film 9 is used as the electrolyte membrane 6.
実施例5~実施例8では、6時間経過以降でもファラデー効率が減少しなかった。これは、ナフィオン膜に撥水膜9を導入した結果、電解液3の還元電極4への液漏れが抑制され、還元電極4の反応サイトが電解液3で埋まらなくなったためである。In Examples 5 to 8, the Faraday efficiency did not decrease even after 6 hours. This is because the introduction of the water-repellent film 9 to the Nafion membrane suppressed leakage of the electrolyte 3 to the reduction electrode 4, preventing the reaction sites of the reduction electrode 4 from becoming filled with the electrolyte 3.
以上、第2実施形態を説明した。第2実施形態に係る二酸化炭素還元装置100によれば、ファラデー効率を落とすことなく、二酸化炭素還元反応を進行させられる二酸化炭素還元装置100を提供できる。The second embodiment has been described above. The carbon dioxide reduction device 100 according to the second embodiment can provide a carbon dioxide reduction device 100 that can proceed with the carbon dioxide reduction reaction without reducing the Faraday efficiency.
すなわち、第2実施形態では、電解液3と電解液3に浸漬させる白金(金属)の酸化電極1とを用いて電源10からの電流電圧により水の酸化反応を行う酸化槽2と、電源10に接続される還元電極4と還元電極4に直接接触させる二酸化炭素とを用いて二酸化炭素の還元反応を行う還元槽5と、酸化槽2内の電解液3と還元槽5内の還元電極4との間にそれぞれに接触して配置される電解質膜6と、を備えた二酸化炭素還元装置100において、電解質膜6が、電解液3に接触する表面一部に撥水膜9を備える。 That is, in the second embodiment, a carbon dioxide reduction device 100 is provided which includes an oxidation tank 2 that performs a water oxidation reaction using an electrolytic solution 3 and a platinum (metal) oxidation electrode 1 immersed in the electrolytic solution 3 by current and voltage from a power source 10, a reduction tank 5 that performs a carbon dioxide reduction reaction using a reduction electrode 4 connected to the power source 10 and carbon dioxide that is in direct contact with the reduction electrode 4, and an electrolyte membrane 6 that is arranged in contact with the electrolytic solution 3 in the oxidation tank 2 and the reduction electrode 4 in the reduction tank 5, respectively, and the electrolyte membrane 6 is provided with a water-repellent film 9 on a portion of its surface that comes into contact with the electrolytic solution 3.
そのため、電解液3の表面に備わる撥水膜9の撥水性により、酸化槽2内の電解液3が電解質膜6の内部に侵入することを抑制でき、電解液3の還元電極4への液漏れを抑制でき、還元電極4の反応サイトが電解液3で埋まらなくなる。また、撥水膜9を電解質膜6の表面一部に備えるので、プロトンが電解質膜6を通過可能な状態を維持できる。その結果、二酸化炭素の還元反応を進行でき、その還元反応効率の低下を抑制できる。Therefore, the water-repellent properties of the water-repellent film 9 on the surface of the electrolyte solution 3 prevent the electrolyte solution 3 in the oxidation tank 2 from penetrating into the electrolyte membrane 6, preventing leakage of the electrolyte solution 3 to the reduction electrode 4 and preventing the reaction sites of the reduction electrode 4 from becoming clogged with the electrolyte solution 3. Furthermore, since the water-repellent film 9 is provided on only a portion of the surface of the electrolyte membrane 6, it is possible to maintain a state in which protons can pass through the electrolyte membrane 6. As a result, the carbon dioxide reduction reaction can proceed and a decrease in the efficiency of the reduction reaction can be prevented.
[その他]
本発明は、二酸化炭素の再資源化に関する分野に広く利用できる。第1実施形態では光エネルギーを用い、第2実施形態では電気エネルギーを用いたが、その他の再生可能エネルギーを用いてもよい。また、第1実施形態と第2実施形態とを組み合わせることも可能である。
[others]
The present invention can be widely used in the field of carbon dioxide recycling. Although light energy is used in the first embodiment and electrical energy is used in the second embodiment, other renewable energy may also be used. Furthermore, the first and second embodiments can be combined.
本発明は、酸化槽2内の電解液3と還元槽5内の還元電極4との間にそれぞれに接触して配置され、還元電極4に二酸化炭素を直接接触させて二酸化炭素の還元反応を行う二酸化炭素還元装置100に用いられる電解質膜6であれば、任意の電解質膜にも適用可能である。 The present invention can be applied to any electrolyte membrane 6 used in a carbon dioxide reduction device 100 that is placed in contact with the electrolyte solution 3 in the oxidation tank 2 and the reduction electrode 4 in the reduction tank 5, and that directly contacts carbon dioxide with the reduction electrode 4 to perform a carbon dioxide reduction reaction.
1:酸化電極
2:酸化槽
3:電解液
4:還元電極
5:還元槽
6:電解質膜
7:導線
8:光源
9:撥水膜
10:電源
100:二酸化炭素還元装置
1: Oxidation electrode 2: Oxidation tank 3: Electrolyte 4: Reduction electrode 5: Reduction tank 6: Electrolyte membrane 7: Conducting wire 8: Light source 9: Water-repellent film 10: Power source 100: Carbon dioxide reduction device
Claims (4)
電解質膜の片面に水溶性高分子を塗布する工程と、
前記水溶性高分子内の水分を除去する工程と、
前記電解質膜の両面に撥水処理を行う工程と、
前記電解質膜の片面から前記水溶性高分子を除去する工程と、
を行う電解質膜の製造方法。 A method for manufacturing an electrolyte membrane for use in a carbon dioxide reduction device that is disposed between an electrolytic solution in an oxidation tank and a reduction electrode in a reduction tank in contact with each other , and that performs a carbon dioxide reduction reaction by directly contacting carbon dioxide with the reduction electrode , the method comprising:
applying a water-soluble polymer to one side of the electrolyte membrane;
removing water from the water-soluble polymer;
a step of performing a water-repellent treatment on both surfaces of the electrolyte membrane;
removing the water-soluble polymer from one surface of the electrolyte membrane;
A method for manufacturing an electrolyte membrane comprising the steps of:
電解質膜の片面に撥水性高分子を塗布する工程と、
前記撥水性高分子内の溶媒を除去する工程と、
を行う電解質膜の製造方法。 A method for manufacturing an electrolyte membrane for use in a carbon dioxide reduction device that is disposed between an electrolytic solution in an oxidation tank and a reduction electrode in a reduction tank in contact with each other, and that performs a carbon dioxide reduction reaction by directly contacting carbon dioxide with the reduction electrode, the method comprising:
applying a water-repellent polymer to one side of the electrolyte membrane;
removing the solvent from the water-repellent polymer;
A method for manufacturing an electrolyte membrane comprising the steps of:
電解質膜の片面に水溶性高分子を塗布する工程と、
前記水溶性高分子内の水分を除去する工程と、
前記電解質膜の両面に撥水性低分子を加熱して蒸着させる撥水処理を行う工程と、
前記電解質膜の片面から前記水溶性高分子を除去する工程と、
を行う電解質膜の製造方法。 A method for manufacturing an electrolyte membrane for use in a carbon dioxide reduction device that is disposed between an electrolytic solution in an oxidation tank and a reduction electrode in a reduction tank in contact with each other, and that performs a carbon dioxide reduction reaction by directly contacting carbon dioxide with the reduction electrode, the method comprising:
applying a water-soluble polymer to one side of the electrolyte membrane;
removing water from the water-soluble polymer;
a step of performing a water-repellent treatment on both surfaces of the electrolyte membrane by heating and vapor-depositing a water-repellent low-molecular-weight material;
removing the water-soluble polymer from one surface of the electrolyte membrane;
A method for manufacturing an electrolyte membrane comprising the steps of:
電解質膜の片面に撥水性低分子を加熱して蒸着させる撥水処理を行う工程、
を行う電解質膜の製造方法。 A method for manufacturing an electrolyte membrane for use in a carbon dioxide reduction device that is disposed between an electrolytic solution in an oxidation tank and a reduction electrode in a reduction tank in contact with each other, and that performs a carbon dioxide reduction reaction by directly contacting carbon dioxide with the reduction electrode, the method comprising:
a step of applying a water-repellent treatment to one side of the electrolyte membrane by heating and depositing a water-repellent low-molecular-weight material;
A method for manufacturing an electrolyte membrane comprising the steps of:
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018090838A (en) | 2016-11-30 | 2018-06-14 | 昭和シェル石油株式会社 | Carbon dioxide reduction apparatus |
| JP2018153173A (en) | 2017-03-16 | 2018-10-04 | 株式会社東芝 | Carbon dioxide fixing device and fuel production system |
| WO2020121556A1 (en) | 2018-12-10 | 2020-06-18 | 日本電信電話株式会社 | Carbon dioxide gas-phase reduction device and carbon dioxide gas-phase reduction method |
| US20210079538A1 (en) | 2017-07-12 | 2021-03-18 | Siemens Aktiengesellschaft | Membrane-Coupled Cathode for the Reduction of Carbon Dioxide in Acid-Based Electrolytes Without Mobile Cations |
| JP2021059760A (en) | 2019-10-08 | 2021-04-15 | 株式会社豊田中央研究所 | Co2 reductive reaction apparatus |
| WO2021078635A1 (en) | 2019-10-25 | 2021-04-29 | Siemens Energy Global GmbH & Co. KG | Electrolyser device and method for carbon dioxide reduction |
| WO2021117164A1 (en) | 2019-12-11 | 2021-06-17 | 日本電信電話株式会社 | Gas-phase carbon dioxide reduction apparatus, and gas-phase carbon dioxide reduction method |
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- 2021-11-11 JP JP2023559297A patent/JP7783508B2/en active Active
- 2021-11-11 WO PCT/JP2021/041514 patent/WO2023084682A1/en not_active Ceased
- 2021-11-11 US US18/699,379 patent/US20240410068A1/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018090838A (en) | 2016-11-30 | 2018-06-14 | 昭和シェル石油株式会社 | Carbon dioxide reduction apparatus |
| JP2018153173A (en) | 2017-03-16 | 2018-10-04 | 株式会社東芝 | Carbon dioxide fixing device and fuel production system |
| US20210079538A1 (en) | 2017-07-12 | 2021-03-18 | Siemens Aktiengesellschaft | Membrane-Coupled Cathode for the Reduction of Carbon Dioxide in Acid-Based Electrolytes Without Mobile Cations |
| WO2020121556A1 (en) | 2018-12-10 | 2020-06-18 | 日本電信電話株式会社 | Carbon dioxide gas-phase reduction device and carbon dioxide gas-phase reduction method |
| JP2021059760A (en) | 2019-10-08 | 2021-04-15 | 株式会社豊田中央研究所 | Co2 reductive reaction apparatus |
| WO2021078635A1 (en) | 2019-10-25 | 2021-04-29 | Siemens Energy Global GmbH & Co. KG | Electrolyser device and method for carbon dioxide reduction |
| WO2021117164A1 (en) | 2019-12-11 | 2021-06-17 | 日本電信電話株式会社 | Gas-phase carbon dioxide reduction apparatus, and gas-phase carbon dioxide reduction method |
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| US20240410068A1 (en) | 2024-12-12 |
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