Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5826768B2 - Manufacturing method of impregnated cathode - Google Patents
[go: Go Back, main page]

JPS5826768B2 - Manufacturing method of impregnated cathode - Google Patents

Manufacturing method of impregnated cathode

Info

Publication number
JPS5826768B2
JPS5826768B2 JP53073969A JP7396978A JPS5826768B2 JP S5826768 B2 JPS5826768 B2 JP S5826768B2 JP 53073969 A JP53073969 A JP 53073969A JP 7396978 A JP7396978 A JP 7396978A JP S5826768 B2 JPS5826768 B2 JP S5826768B2
Authority
JP
Japan
Prior art keywords
particle size
sintering
cathode
impregnated
porosity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53073969A
Other languages
Japanese (ja)
Other versions
JPS551028A (en
Inventor
長吉郎 柴田
功 櫻井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINNIPPON MUSEN KK
Original Assignee
SHINNIPPON MUSEN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINNIPPON MUSEN KK filed Critical SHINNIPPON MUSEN KK
Priority to JP53073969A priority Critical patent/JPS5826768B2/en
Publication of JPS551028A publication Critical patent/JPS551028A/en
Publication of JPS5826768B2 publication Critical patent/JPS5826768B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Solid Thermionic Cathode (AREA)

Description

【発明の詳細な説明】 本発明は、含浸型陰極の製造方法に関し、特にCRTの
陰極等小型陰極に用いるに最適な含浸型陰極の製造方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an impregnated cathode, and particularly to a method for manufacturing an impregnated cathode that is most suitable for use in small cathodes such as CRT cathodes.

従来、含浸型陰極の製造方法は、陰極形状の所要量より
はるかに大きい焼結体(例えば20X20X500m7
M)に機械加工を容易にするために銅又はプラスチック
類を溶融含浸させ、所定の陰極形状に機械加工し、その
後、真空中において、加熱又は酸による溶解等の方法で
銅又はプラスチック類を除去り、−tの加工体に電子放
射性物質を溶融含浸して製造はいた。
Conventionally, the manufacturing method of an impregnated cathode requires a sintered body that is much larger than the required amount of the cathode shape (for example, 20 x 20 x 500 m7).
M) is melted and impregnated with copper or plastic to facilitate machining, machined into a predetermined cathode shape, and then the copper or plastic is removed by heating or dissolving with acid in a vacuum. It was manufactured by melting and impregnating a processed body of -t with an electron radioactive substance.

υ社高融点金属粉末を直接陰極形状に焼結すると端部の
焼結が一様でないこと、収縮率が場所により異なり寸法
上変形を生じるといった理由によるものである。
This is because, when υ company's high melting point metal powder is directly sintered into the cathode shape, the sintering at the edges is not uniform, and the shrinkage rate varies depending on the location, resulting in dimensional deformation.

この従来の製造方法が第1図に示されている。This conventional manufacturing method is shown in FIG.

まず、工程1において適当な粒度分布をもった高融点の
金属粉末を準備する。
First, in step 1, a high melting point metal powder with an appropriate particle size distribution is prepared.

次に工程1において準備した金属粉末を工程2において
機械プレス、静水圧プレスあるいは鋳込み等の方法によ
って適当な形状に成形する。
Next, in step 2, the metal powder prepared in step 1 is molded into an appropriate shape by a method such as mechanical pressing, isostatic pressing, or casting.

工程2において成形すると、次に工程3において直接通
電や炉中あるいはホットプレス等により焼結する。
After molding in step 2, sintering is performed in step 3 by direct current application, in a furnace, hot press, or the like.

成形体を焼結すると次に工程4において溶融した銅の中
に焼結体を浸漬し、多孔質体の孔に銅を含浸する。
After the molded body is sintered, the sintered body is then immersed in molten copper in step 4 to impregnate the pores of the porous body with copper.

銅を含浸すると、工程5において旋盤等通常の機械加工
によって所定の陰極形状に加工する。
Once impregnated with copper, in step 5 it is processed into a predetermined cathode shape by ordinary machining such as a lathe.

所定の陰極形状に加工すると、工程6において機械加工
を容易にするため工程4において含浸した銅を真空中加
熱により除去するいわゆる脱銅する。
After processing into a predetermined cathode shape, in step 6, in order to facilitate machining, the copper impregnated in step 4 is removed by heating in a vacuum, so-called decopper removal.

この脱銅の方法は真空中加熱の他に酸による方法もある
が、銅が完全に除去できないため後で真空中での加熱除
去を行うのが一般である。
In addition to heating in a vacuum, there are other methods for removing copper, but since the copper cannot be completely removed, it is common to remove the copper by heating in a vacuum afterwards.

脱銅がなされると、工程7において焼結体の微細孔の量
を測定し、良否を判定する。
Once the copper has been removed, the amount of micropores in the sintered body is measured in step 7 to determine whether the sintered body is good or bad.

次に工程8において酸化バリウムを主とした酸化物の混
合物又はその原料である炭酸塩を含む混合物を脱銅した
焼結体に塗布し、還元性雰囲気中又は真空中で溶融し焼
結体の微細孔に電子放射性物質を含浸する。
Next, in step 8, a mixture of oxides mainly containing barium oxide or a mixture containing carbonate, which is a raw material thereof, is applied to the decoppered sintered body, and melted in a reducing atmosphere or vacuum to form a sintered body. Impregnate the micropores with an electron radioactive substance.

電子放射性物質の含浸が終ると、次に工程9において焼
結体の表面に付着した余剰電子放射性物質を除去する。
After the impregnation with the electron radioactive material is completed, in step 9, excess electron radioactive material adhering to the surface of the sintered body is removed.

以上の工程により従来は含浸型陰極を製造していた。Conventionally, an impregnated cathode has been manufactured through the above steps.

しかし、この製造方法によると、工程数が多く機械加工
が入るため材料の無駄が多く、材料歩留が非常に低い。
However, this manufacturing method involves a large number of steps and involves machining, resulting in a large amount of wasted material and a very low material yield.

また従来の製造方法によると高価な無酸素銅を無駄にし
、量産性に乏しく、端部の焼結が十分でなかったり、場
所により気孔率が異なり材料に無駄が生じていた。
In addition, conventional manufacturing methods waste expensive oxygen-free copper, are not suitable for mass production, are not sufficiently sintered at the edges, and have different porosity depending on the location, resulting in wasted material.

例えば、通電焼結の方法によると両端部各約176は使
用できず、中心部の気孔率も小さくなる。
For example, if the electric sintering method is used, approximately 176 mm of each end portion cannot be used, and the porosity of the center portion is also reduced.

したがって、陰極が高価となり、テレビのブラウン管用
陰極等安価な陰極を必要とするCRT用陰極に高電流密
度を得られる含浸型陰極を使用できず、画面の分解像等
の進展を阻止され、ひいては影像の伝送にも制限を課さ
れているのが現状であった。
Therefore, the cathode becomes expensive, and an impregnated cathode that can obtain a high current density cannot be used for a CRT cathode that requires an inexpensive cathode, such as a cathode for a television's cathode ray tube. This prevents the development of separated images on the screen, and even Currently, there are restrictions on the transmission of images.

本発明の目的は、上記欠点を除去し安価で量産可能な含
浸型陰極の製造方法を提供することにある。
An object of the present invention is to provide a method for manufacturing an impregnated cathode that eliminates the above-mentioned drawbacks and can be mass-produced at low cost.

以下図示実施例に基づき本発明を説明する。The present invention will be explained below based on illustrated embodiments.

第2図には、本発明に係る含浸型陰極の製造方法の工程
が示されている。
FIG. 2 shows the steps of the method for manufacturing an impregnated cathode according to the present invention.

工程Aにおいて、粒径10μ以下で、かつ、平均粒径が
4〜7μの高融点金属粉末でしかも、2μ以下の粒子が
重量で3%以下の粒度分布を持つ高融点金属粉末を準備
する。
In step A, a high melting point metal powder having a particle size of 10 μm or less, an average particle size of 4 to 7 μm, and a particle size distribution in which particles of 2 μm or less are 3% or less by weight is prepared.

これは、粒径が上記より大きかったり、小さい粒子が多
いと焼結が一様に行われなく、不足したり、過剰になっ
たり希望の気孔率が得られず、また、変形の原因となる
からである。
This is because if the particle size is larger than the above or there are many small particles, sintering will not be done uniformly, and the desired porosity may not be obtained due to insufficient or excessive porosity, and may also cause deformation. It is from.

更に詳述すると粒径の小さいものは焼結し易く温度と時
間との関係を非常に厳格に制御しなげれば焼結が進み過
ぎて気孔率が一定しないなどの欠点が生じ、また逆に粒
径が余り太き過ぎると焼結し難く必要以上に湿度を上げ
なげればならず、しかも温度を非常に高くすることは困
難であると共に焼結炉の保守にも不都合が生じると共に
焼結自体でもやはり気孔率が一定しないという欠点が生
じる。
To explain in more detail, particles with small diameters are easily sintered, and if the relationship between temperature and time is not very strictly controlled, sintering will proceed too much, resulting in problems such as uneven porosity, and vice versa. If the particle size is too large, it will be difficult to sinter and the humidity will have to be raised more than necessary.In addition, it will be difficult to raise the temperature very high, and it will be difficult to maintain the sintering furnace. This also has the drawback that the porosity is not constant.

これら細かい粒子と大きい粒子が混合していると温度、
時間の条件をいかに制御しても細かい粒子と大きい粒子
とでは焼結条件が異なり均一な焼結体を得ることができ
ないのは言う迄もない。
When these fine particles and large particles are mixed, the temperature
Needless to say, no matter how the time conditions are controlled, the sintering conditions for fine particles and large particles are different and it is impossible to obtain a uniform sintered body.

例えば平均粒径2μのタングステン粉末と平均粒径6μ
のタングステン粉末とでそれぞれ気孔率が25%となる
ように条件を設定して焼結した結果の気孔率のバラつき
を第3図に示す。
For example, tungsten powder with an average particle size of 2μ and an average particle size of 6μ
Figure 3 shows the variation in porosity as a result of sintering under conditions such that the porosity was 25% with the tungsten powder.

この場合粒径の小さいタングステン粉末は粒径の大きい
ものより焼結し易く、焼結し過ぎると気孔率が小さくな
るため焼結条件を変えて、即ち本実験では粒径の小さい
タングステン粉末の焼結温度を粒径の太きいものより下
げて焼結時間はほぼ同じ条件で焼結したものである。
In this case, tungsten powder with a small particle size is easier to sinter than one with a large particle size, and if the tungsten powder is sintered too much, the porosity decreases, so we changed the sintering conditions. The particles were sintered at a lower sintering temperature than those for larger particles, and under approximately the same sintering time.

同図aが平均粒径2μのもので、同図すは平均粒径6μ
のもので、同図からも明らかなように平均粒径2μのも
のは平均粒径6μのものより気孔率のバラつきの大きい
ことがわかる。
The figure a shows the average particle size of 2μ, and the figure shows the mean particle size of 6μ.
As is clear from the figure, those with an average particle size of 2μ have a greater variation in porosity than those with an average particle size of 6μ.

従って粒子はほぼ均一な粒子に選定されることが必要で
、しかも焼結時の条件制御が比較的ゆるやかでしかも気
孔率の一定した焼結体を得るための粒径の範囲を実験的
に求めたのが上記数値範囲となる。
Therefore, it is necessary to select particles that are almost uniform, and to obtain a sintered body with relatively gentle sintering conditions and a constant porosity, we experimentally determined the particle size range. This is the above numerical range.

工程Aにおいて高融点金属粉末の準備が終ると、工程B
において機械プレス、静水圧等によす0,5〜2.O1
/crriの圧力で焼結時の収縮を考慮し焼結後、陰極
形状によるように成形する。
After the preparation of the high melting point metal powder in step A, step B
0.5 to 2.0 by mechanical press, hydrostatic pressure, etc. O1
After sintering, taking into account shrinkage during sintering at a pressure of /crri, it is shaped into the shape of the cathode.

また、鋳型等により多数の成形用型を使用すれば、一時
に多数を成形でき量産が可能である。
Further, by using a large number of molds such as molds, a large number of molds can be molded at the same time, and mass production is possible.

工程Bにおいて成形されると、次に工程Cにおいて焼結
を行なう。
Once molded in step B, sintering is then performed in step C.

焼結は、成形された素材を還元性雰囲気又は、真空中で
2000℃〜2600℃で行なう。
Sintering is performed on the shaped material at 2000°C to 2600°C in a reducing atmosphere or in a vacuum.

この2000℃〜2600℃において行なう焼結法によ
れば、原料粉末の粒度分布の選択と関係して希望の気孔
率を得ることができる。
According to this sintering method carried out at 2000°C to 2600°C, a desired porosity can be obtained by selecting the particle size distribution of the raw material powder.

工程Cにおいて希望の気孔率をもった焼結体を得ると次
に工程りにおいて、酸化バリウムを主とした酸化物混合
粉末又は、その原料である炭酸塩混合物からなる電子放
射性物質を焼結体に塗布し還元性雰囲気または、真空中
で溶融含浸する。
After obtaining a sintered body with the desired porosity in step C, in the next step, an electron-radioactive substance made of an oxide mixed powder mainly containing barium oxide or a carbonate mixture as its raw material is added to the sintered body. It is melted and impregnated in a reducing atmosphere or in a vacuum.

次に工程Eにおいて焼結体表面の余剰電子放射性物質を
除去する。
Next, in step E, excess electron radioactive material on the surface of the sintered body is removed.

したがって、本実施例によれば。Therefore, according to this embodiment.

焼結工程において、従来の通電方式による焼結法では、
温度は十分に上がるが成形された素材の両端の焼結が不
十分で材料歩留が低く、焼結度が一様でないという欠点
を有し、また、従来の炉中加熱焼結では温度が低く、焼
結不十分であり、かつ、気孔率が高い等の欠点を除去す
ることができる。
In the sintering process, in the conventional sintering method using an electric current method,
Although the temperature can be raised sufficiently, the sintering at both ends of the formed material is insufficient, resulting in a low material yield and uneven sintering degree. It is possible to eliminate disadvantages such as low porosity, insufficient sintering, and high porosity.

すなわち、本実施例によれば高融点金属の粉末を厳選し
、炉中適温焼結を行なうことにより高融点金属粉末の成
形体全体を充分焼結することができる。
That is, according to this embodiment, by carefully selecting high melting point metal powder and sintering it in a furnace at an appropriate temperature, the entire compact of high melting point metal powder can be sufficiently sintered.

また、材料歩留が高く、しかも焼結度が一様になった。In addition, the material yield was high and the degree of sintering was uniform.

さらに、気孔率にあっても含浸型陰極として使用するに
最適な20%〜30%の範囲のものを得ることかできる
Furthermore, it is possible to obtain a porosity in the range of 20% to 30%, which is optimal for use as an impregnated cathode.

さらにまた、本実施例によれば、従来の製造方法の銅含
浸工程、機械加工工程、気孔率の測定工程、脱銅工程を
省略することができ、量産が可能であり、高価な無酸素
銅を無駄に使用することがない。
Furthermore, according to this embodiment, the copper impregnation process, machining process, porosity measurement process, and copper removal process of the conventional manufacturing method can be omitted, and mass production is possible. Never waste it.

以上説明したように、本発明によれば工程数が大幅に減
少し、かつ量産ができ、しかも原料に無駄がなく、材料
歩留が著しく向上するため、安価に製造することができ
品質も安定する。
As explained above, according to the present invention, the number of steps is significantly reduced, mass production is possible, there is no wastage of raw materials, and the material yield is significantly improved, so it can be manufactured at low cost and the quality is stable. do.

従って、安価な陰極が要求されるテレビのブラウン管用
陰極等CRT用陰極に利用することができ、テレビ等の
高解像度が得られ、色の鮮明、画質の向上、画面の大型
化等が可能となり、その利用分野は極めて広いものであ
る。
Therefore, it can be used for cathodes for CRTs such as cathodes for cathode ray tubes in televisions, which require inexpensive cathodes, and can provide high resolution for televisions, etc., making it possible to achieve clearer colors, improved image quality, and larger screens. , its application fields are extremely wide.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、従来の製造方法の流れ図、第2図は、本発明
に係る実施例の工程流れ図、第3図は気孔率が25%と
なるように条件を設定して焼結した結果の気孔率のバラ
つきを示す図である。 A・・・金属粉末の準備工程、B・・・成形工程、C・
・・焼結工程、D・・・電子放射性物質の含浸工程、E
・・・余剰電子放射性物質の除去工程。
Figure 1 is a flowchart of the conventional manufacturing method, Figure 2 is a process flowchart of an example according to the present invention, and Figure 3 is the result of sintering with conditions set so that the porosity is 25%. FIG. 3 is a diagram showing variations in porosity. A... Metal powder preparation process, B... Molding process, C.
...Sintering process, D...Electron radioactive substance impregnation process, E
...Removal process of surplus electron radioactive materials.

Claims (1)

【特許請求の範囲】[Claims] 1 タングステン、モリブデン等の高融点金属の多孔質
体に電子放射性物質を溶融含浸された含浸型陰極の製造
方法において、粒径10μ以下で平均粒径が4〜7μ、
かつ粒径2μ以下の粒子が3重量%以下の高融点金属粉
末を準備する工程と、前記高融点金属粉末を0.5〜2
t/cvzの圧力で所望陰極形状に成形する工程と、前
記成形した素材を還元性雰囲気中又は真空中で2000
℃〜2600℃で焼成する工程と、前記工程で形成され
た焼結体に直接電子放射性物質な溶融含浸させる工程と
、からなることを特徴とする含浸型陰極の製造方法。
1. In a method for producing an impregnated cathode in which a porous body of a high melting point metal such as tungsten or molybdenum is melted and impregnated with an electron radioactive substance, the particle size is 10 μm or less and the average particle size is 4 to 7 μm;
and a step of preparing a high melting point metal powder containing 3% by weight or less of particles with a particle size of 2μ or less;
A step of molding into a desired cathode shape at a pressure of t/cvz, and a step of molding the molded material in a reducing atmosphere or vacuum for 2000
A method for producing an impregnated cathode, comprising the steps of firing at a temperature of .degree. C. to 2,600.degree. C., and directly melting and impregnating the sintered body formed in the step with an electron emissive material.
JP53073969A 1978-06-19 1978-06-19 Manufacturing method of impregnated cathode Expired JPS5826768B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53073969A JPS5826768B2 (en) 1978-06-19 1978-06-19 Manufacturing method of impregnated cathode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53073969A JPS5826768B2 (en) 1978-06-19 1978-06-19 Manufacturing method of impregnated cathode

Publications (2)

Publication Number Publication Date
JPS551028A JPS551028A (en) 1980-01-07
JPS5826768B2 true JPS5826768B2 (en) 1983-06-04

Family

ID=13533406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53073969A Expired JPS5826768B2 (en) 1978-06-19 1978-06-19 Manufacturing method of impregnated cathode

Country Status (1)

Country Link
JP (1) JPS5826768B2 (en)

Also Published As

Publication number Publication date
JPS551028A (en) 1980-01-07

Similar Documents

Publication Publication Date Title
US3144328A (en) Method of producing porous sintered tantalum anodes
CN117066523A (en) A binder jet 3D printing preparation method of sponge tungsten matrix for cathodes in microwave vacuum electronic devices
JPS5826768B2 (en) Manufacturing method of impregnated cathode
KR100419346B1 (en) Method for preparing porous yttria stabilized zirconia
US3323879A (en) Powdered metal films
EP0525646B1 (en) Preparation of cathode structures for impregnated cathodes
JPH0785782A (en) Impregnation-type-cathode manufacturing method, and cathode obtained thereby
JPH05186804A (en) Tungsten multiple powder, tungsten composite sheet and their production
JP3378275B2 (en) Porous sintered substrate, method for producing the same, and impregnated cathode using the same
JPS5826769B2 (en) Manufacturing method of impregnated cathode
JPH04308048A (en) Production of porous tungsten material
JP3205638B2 (en) Manufacturing method of impregnated cathode
JP3472882B2 (en) Oxide dispersion type alloy and method for producing the same
US3653883A (en) Method of fabricating a porous tungsten body for a dispenser cathode
US3166836A (en) Manufacture of electron tube cathodes
DE3873830T2 (en) METHOD FOR PRODUCING A Sintered Shaped Body Made Of Silicon Nitride.
JP2001003104A (en) Method for molding a compact from powder
US2169007A (en) Method of making hard metal bodies
JP2957004B2 (en) Manufacturing method of sintered type cathode
JPS612226A (en) Impregnated cathode
JP2775261B2 (en) Manufacturing method of cathode
KR960012870B1 (en) Method of manufacturing thorium-tungsten wire (ThO₂-W Wire)
JPS62273809A (en) Manufacturing method of thin-walled green ceramic tube
JPS6053454B2 (en) Manufacturing method of sintered capacitor element
JP2000002779A (en) Method for producing particle-dispersed ceramics