JPS5827490B2 - Spray type ultra-quick treatment method - Google Patents
Spray type ultra-quick treatment methodInfo
- Publication number
- JPS5827490B2 JPS5827490B2 JP1461176A JP1461176A JPS5827490B2 JP S5827490 B2 JPS5827490 B2 JP S5827490B2 JP 1461176 A JP1461176 A JP 1461176A JP 1461176 A JP1461176 A JP 1461176A JP S5827490 B2 JPS5827490 B2 JP S5827490B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- processing
- photosensitive material
- room temperature
- type ultra
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 9
- 239000007921 spray Substances 0.000 title description 5
- 239000000463 material Substances 0.000 claims description 27
- 239000007788 liquid Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 description 4
- 238000003672 processing method Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Description
【発明の詳細な説明】
本発明は感光材料例えばフィルム、印画紙に処理液を噴
射して現像、定着等の処理を迅速に行なうスプレィ式超
迅速処理方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a spray-type ultra-quick processing method in which a processing liquid is sprayed onto a photosensitive material, such as a film or photographic paper, to rapidly perform processing such as development and fixing.
カメラプロセサーにおいては、撮影から定着処理に至る
各工程が一貫したプロセスで連続的に行なわれるように
なっているため、各工程が迅速かつ一定時間内で処理さ
れることが要求される。In camera processors, each step from photographing to fixing is performed continuously in a consistent process, and therefore each step is required to be processed quickly and within a certain amount of time.
この理由から、カメラプロセサーの現像、定着処理等に
、スプレィ式迅速処理方法が用いられている。For this reason, a spray type rapid processing method is used for developing, fixing, etc. in camera processors.
このスプレィ式超迅速処理は、一定温度に加熱した一定
量の現像液等の処理液を、感光材料に噴射して現像処理
等を行なうものである。This spray-type ultra-rapid processing involves spraying a certain amount of a processing solution such as a developer heated to a certain temperature onto a photosensitive material to perform development processing and the like.
第1図は室温A(約20℃)、B(約15℃)、C(約
10℃)のもとで、従来のスプレィ式超迅速処理を行な
った場合の処理液(現像液)の温度変化を示すグラフで
ある。Figure 1 shows the temperature of the processing solution (developer) when conventional spray-type ultra-rapid processing is performed at room temperature A (approximately 20°C), B (approximately 15°C), and C (approximately 10°C). It is a graph showing changes.
処理液は噴射された瞬間には一定の温度t1 になっ
ているが、すぐに冷却が始まり、室温に応じた温度曲線
を描いて、各室温A、B、Cまで温度が低下する。The processing liquid is at a constant temperature t1 at the moment it is injected, but it immediately begins to cool down, drawing a temperature curve according to the room temperature, and the temperature decreases to each room temperature A, B, and C.
室温が低いほど急激に温度が低下することになる。The lower the room temperature, the more rapidly the temperature will drop.
このように、スプレィ式迅速処理方法は少量の処理液を
感光材料に噴射して現像処理等を行なうため、従来の方
法のように単に処理液を処理し適した温度(約30℃〜
40℃)に保って噴射するだけでは、感光材料に付着し
た処理液の温度変化が室温によって著しく影響されるこ
とになる。In this way, the spray type rapid processing method sprays a small amount of processing liquid onto the photosensitive material to perform development processing, etc., so unlike the conventional method, the processing liquid is simply processed and heated to an appropriate temperature (approximately 30°C to
If the temperature of the processing liquid is maintained at 40° C. and sprayed, the temperature change of the processing liquid attached to the photosensitive material will be significantly affected by the room temperature.
一定の現像効果を得るためには、処理温度の積分値が一
定であることが要求されるが、上記のように室温が低い
ときには速く温度が低下し、また室温が高いときにはゆ
っくりと比較的高い温度まで下がるような場合には、一
定の積分値を得るために現像等の処理時間を相当変えな
げればならなくなる。In order to obtain a certain development effect, the integral value of the processing temperature is required to be constant, but as mentioned above, when the room temperature is low, the temperature decreases quickly, and when the room temperature is high, the temperature decreases slowly and relatively high. If the temperature drops to a certain level, processing times such as development must be changed considerably in order to obtain a constant integral value.
本発明は上記問題に鑑み、室温に影響されることなく、
一定時間内に一定の処理温度の積分値が得られるように
なし、これによって一定のサイクルを繰返すだけで同調
子の処理効果を得るようにしたスプレィ式超迅速処理方
法を提供することを目的とするものである。In view of the above problems, the present invention has been developed to
The purpose of the present invention is to provide a spray-type ultra-quick treatment method that allows a constant integral value of treatment temperature to be obtained within a constant time, thereby obtaining the same treatment effect just by repeating a constant cycle. It is something to do.
本発明の処理方法は感光材料を室温に応じて加熱するこ
とにより、感光材料に付着した処理液の温度が低下しな
いようにし、これによって温度の積分値が一定になるよ
うにしたことを特徴とするものである。The processing method of the present invention is characterized in that by heating the photosensitive material according to the room temperature, the temperature of the processing liquid attached to the photosensitive material does not drop, thereby making the integral value of the temperature constant. It is something to do.
感光材料が加熱される温度は、約30℃〜40℃である
が、この温度は、室温が低い場合はど高く加熱されるよ
うに調節される。The temperature at which the photosensitive material is heated is approximately 30° C. to 40° C., but this temperature is adjusted to be higher when the room temperature is low.
加熱手段としてはヒーターカ使用され、このヒーターの
温度は、室温と感光材料の温度とを考慮して常に制御さ
れる。A heater is used as the heating means, and the temperature of this heater is always controlled in consideration of the room temperature and the temperature of the photosensitive material.
第2図は本発明の方法による処理液の温度変化を示すグ
ラフである。FIG. 2 is a graph showing the temperature change of the processing liquid according to the method of the present invention.
室温が低いC(約10℃)のときは、処理液の温度もC
であるため、感光材料に付着した瞬間には、感光材料の
温度も温度Cに下がるが、感光材料が加熱されるため、
温度が上昇する。When the room temperature is low C (approx. 10℃), the temperature of the processing solution is also low C.
Therefore, the temperature of the photosensitive material drops to temperature C at the moment it adheres to the photosensitive material, but since the photosensitive material is heated,
Temperature rises.
そして約40℃まで急速に温度が上昇された後、感光材
料に充分噴射された処理液によって温度が下降する。After the temperature is rapidly raised to about 40° C., the temperature is lowered by the processing liquid sufficiently sprayed onto the photosensitive material.
室温が高いA(約20℃)のときには、処理液の噴射後
、約30°Cまで徐々に加熱され、ゆるい温度曲線を描
く、また室温が中間のB(約15℃)の場合には前記室
温AとCの中間に相当する温度曲線を描いて約35℃程
度まで加熱される。When the room temperature is high A (approximately 20°C), the treatment liquid is gradually heated to approximately 30°C after injection, creating a gentle temperature curve, and when the room temperature is intermediate B (approximately 15°C), the above-mentioned It is heated to about 35° C., drawing a temperature curve corresponding to the middle of room temperatures A and C.
上記のように本発明では室温が低い場合には高い処理温
度に急速に加熱され、また室温が高い場合には、低い処
理温度までゆっくりと加熱されるため、その処理温度の
一定時間内の積分値が一定になる。As mentioned above, in the present invention, when the room temperature is low, it is rapidly heated to a high processing temperature, and when the room temperature is high, it is heated slowly to a low processing temperature, so the integral of the processing temperature within a certain time The value becomes constant.
これにより、一定の現像処理が行なわれるとともに、室
温に関係なく一定時間で同等の現像処理が行なわれるた
め、カメラプロセザーのように撮影から現像まで一貫し
たプロセスで行なわれるような装置においては、同一サ
イクルを単に繰返すことによって同一の処理効果が得ら
れるから好適である。As a result, a certain level of development processing is carried out, and the same level of development processing is carried out in a fixed amount of time regardless of the room temperature, so in devices such as camera processors that perform a consistent process from photography to development, This is preferable because the same processing effect can be obtained by simply repeating the same cycle.
次に本発明の方法に使用する装置について第3図を参照
して説明する。Next, the apparatus used in the method of the present invention will be explained with reference to FIG.
感光材料10は、ヒーター11に保持または載置され、
内蔵された熱線12によって背後から加熱されるように
なっている。The photosensitive material 10 is held or placed on a heater 11,
It is heated from behind by a built-in heating wire 12.
この感光材料10は、連続的または間欠的に一定方向に
順次移動し、その間に現像処理が行なわれるようになっ
ている。The photosensitive material 10 is sequentially moved in a fixed direction, either continuously or intermittently, and development processing is performed during this period.
前記ヒーター11の熱線12は、増幅器13に接続され
、加熱温度を調節するために電流が制御されるようにな
っている。The hot wire 12 of the heater 11 is connected to an amplifier 13 so that the current is controlled to adjust the heating temperature.
増幅器13には、感光材料10の温度を検知する温度検
知器14と室温を検知する温度検知器15からの出力信
号が入力され、その出力電流を制御してヒーター11の
温度を調節するようになっている。The amplifier 13 receives output signals from a temperature sensor 14 that detects the temperature of the photosensitive material 10 and a temperature sensor 15 that detects the room temperature, and controls the output current to adjust the temperature of the heater 11. It has become.
室温は変動しない方が望ましいが、室温を検知する温度
検知器15が設げられているから、変動した場合はこれ
に応じてヒーター11が自動的に調節される。Although it is preferable that the room temperature does not change, since a temperature sensor 15 is provided to detect the room temperature, if the room temperature changes, the heater 11 is automatically adjusted accordingly.
感光材料10の前面に処理液を噴射するノズル16が配
置されており、約1〜10秒間処理液を噴射するように
なっている。A nozzle 16 for spraying a processing liquid is arranged in front of the photosensitive material 10, and is designed to spray the processing liquid for about 1 to 10 seconds.
室温に応じて感光材料10を加熱し、ノズル16から処
理液を感光材料100表面に噴霧する。The photosensitive material 10 is heated according to the room temperature, and a processing liquid is sprayed onto the surface of the photosensitive material 100 from the nozzle 16.
この処理液が感光材料10に付着すると、第2図のよう
に温度が一旦常温まで低下するが、ヒーター12によっ
て感光材料10が加熱されているため、すぐに」−昇す
る。When this processing liquid adheres to the photosensitive material 10, the temperature temporarily drops to room temperature as shown in FIG. 2, but since the photosensitive material 10 is heated by the heater 12, it immediately rises.
この上昇温度は室温と感光材料10自身の温度に応じて
第2図のようになる。This temperature rise varies depending on the room temperature and the temperature of the photosensitive material 10 itself, as shown in FIG.
このような各室温における温度サイクルを繰り返して行
ない、感光材料10を連続的に現像処理する。Such temperature cycles at each room temperature are repeated, and the photosensitive material 10 is continuously developed.
上記したように本発明は、感光材料を室温に応じて加熱
して現像処理等を行なうものであるから、処理温度の一
定時間内の積分値を室温に関係なく一定にすることがで
き、それによって一定の現像効果を得ることができ、所
期の目的を達成することができる。As described above, in the present invention, since the photosensitive material is heated according to the room temperature and subjected to development processing, etc., the integral value of the processing temperature within a certain period of time can be made constant regardless of the room temperature. Accordingly, a certain developing effect can be obtained and the desired purpose can be achieved.
第1図は従来の方法による処理液の温度変化を示すグラ
フ、第2図は本発明の方法による同様なグラフ、第3図
は本発明の方法を実施する装置例の説明図である。
10・・・・パ感光材料、11・・・・・・ヒーター、
13・・・・・−増幅器、14・・・・・・感光材料の
温度を検知する温度検知器、15・・・・・・室温を検
知する温度検知器、16・・・°°°スフレイノズル。FIG. 1 is a graph showing the temperature change of the processing liquid according to the conventional method, FIG. 2 is a similar graph according to the method of the present invention, and FIG. 3 is an explanatory diagram of an example of an apparatus for carrying out the method of the present invention. 10... photosensitive material, 11... heater,
13...-Amplifier, 14...Temperature detector for detecting the temperature of photosensitive material, 15...Temperature detector for detecting room temperature, 16...°°° Souffle nozzle .
Claims (1)
ようにしたスプレィ式超迅速処理において、処理温度の
積分値が一定になるように感光材料を加熱し、その温度
を室温に応じて調節するようにしたことを特徴とするス
プレィ式超迅速処理方法。1 In spray-type ultra-rapid processing in which processing liquid is sprayed onto a photosensitive material to perform processing such as development, the photosensitive material is heated so that the integral value of the processing temperature is constant, and the temperature is adjusted according to room temperature. A spray-type ultra-quick treatment method characterized by being adjustable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1461176A JPS5827490B2 (en) | 1976-02-13 | 1976-02-13 | Spray type ultra-quick treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1461176A JPS5827490B2 (en) | 1976-02-13 | 1976-02-13 | Spray type ultra-quick treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5298526A JPS5298526A (en) | 1977-08-18 |
| JPS5827490B2 true JPS5827490B2 (en) | 1983-06-09 |
Family
ID=11865985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1461176A Expired JPS5827490B2 (en) | 1976-02-13 | 1976-02-13 | Spray type ultra-quick treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5827490B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH067257B2 (en) * | 1986-12-23 | 1994-01-26 | 富士写真フイルム株式会社 | Photosensitive material developing device |
| JP2946255B2 (en) * | 1992-03-25 | 1999-09-06 | 富士写真フイルム株式会社 | Photosensitive material processing equipment |
-
1976
- 1976-02-13 JP JP1461176A patent/JPS5827490B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5298526A (en) | 1977-08-18 |
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