JPS5924753B2 - porcelain composition - Google Patents
porcelain compositionInfo
- Publication number
- JPS5924753B2 JPS5924753B2 JP54113870A JP11387079A JPS5924753B2 JP S5924753 B2 JPS5924753 B2 JP S5924753B2 JP 54113870 A JP54113870 A JP 54113870A JP 11387079 A JP11387079 A JP 11387079A JP S5924753 B2 JPS5924753 B2 JP S5924753B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- mgo
- sio
- strength
- srtio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title claims description 21
- 229910052573 porcelain Inorganic materials 0.000 title claims description 10
- 238000010586 diagram Methods 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 27
- 239000000395 magnesium oxide Substances 0.000 description 18
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 18
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 18
- 229910052681 coesite Inorganic materials 0.000 description 13
- 229910052906 cristobalite Inorganic materials 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 13
- 229910052682 stishovite Inorganic materials 0.000 description 13
- 229910052905 tridymite Inorganic materials 0.000 description 13
- 239000000758 substrate Substances 0.000 description 11
- 239000003990 capacitor Substances 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 229910002370 SrTiO3 Inorganic materials 0.000 description 6
- 229910052593 corundum Inorganic materials 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 229910001845 yogo sapphire Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 5
- 230000001066 destructive effect Effects 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001973 epigenetic effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Insulating Materials (AREA)
Description
【発明の詳細な説明】
本発明は、コンデンサを形成することが可能な絶縁回路
基板を形成するのに好適な酸化物磁器組成物に関し、更
に詳細には、コンデンサを形成する時に要求される特性
を有していると共に、IC等の回路基板を咋る時に要求
される特性も有している磁器に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an oxide ceramic composition suitable for forming an insulated circuit board capable of forming a capacitor. The present invention relates to porcelain that has properties required for manufacturing circuit boards such as ICs.
Al2O3、MgO、及ひSiO2から成る絶縁性磁器
は、IC基板、ICパッケージ等の耐熱性絶縁部品に既
に多く利用されている。Insulating porcelain made of Al2O3, MgO, and SiO2 is already widely used for heat-resistant insulating parts such as IC boards and IC packages.
近年、IC関連の技術が著しく進歩し、諸回路のIC化
が増々進められている中で、基板に対し、従来とは異つ
たさまざまな特性が要求される。例えば、回路の高密度
化及ひ低コスト化のために、例えば発振回路の温度補償
の目的のための負の温度係数を有するコンデンサを形成
することが可能な回路基板が要求されている。ところが
、従来公知の例えばフェノール基板においては、Qは5
00以下と低く、温度係数も100ppM以上である為
、目的に適さない。又、アルミナ基板の場合には、Qは
500以上あわ、機械的強度、耐熱強度も優れているが
、誘電率の温度係数が+100ppM以上である為、目
的に適さない。一方、従来よりある温度補償用コンデン
サ材料を用いて基板を構成することもあるが、この場合
には、Qは1000以上と高く盃度係数も+100〜−
4700ppMの間で自由に選択出来るが、反面機械的
強度、耐熱強度が小さく、強度の点で基板材料としての
特性を満足出来ない。従つて、コンデンサを昨るために
要求される特性と、基板を住るために要求される特性と
の両方を満足する磁器組成物は現存していない。そこで
、本発明の目的は、比較的比誘電率が小さく、Qが高く
、機械的強度及び耐熱強度が大きく、誘電率の温度係数
が+100〜−2200ppMの間で自由に選択するこ
とが可能な磁器組成物を提供することにある。上記目的
を達成するための本発明は、Al(アルミニウム)、B
r(ストロンチウム)、Ti(チタン)、Mg(マグネ
シウム)、Si(シリコン)がこれ等の化合物であるA
l2O3(酸化アルミニウム)、SrTiO3(チタン
酸ストロンチウム)、MgO(酸化マグネシウム)、S
iO2(酸化シリコン)に換算した状態で、Al2O3
、SrTiO3、MgO+SiO2の三元図に訃ける、
Al2O396重量?、SrTiO32重量%、MgO
+SiO22重量?を示す点Aと、Al2O38O重量
%、SrTiO3lO重量?、MgO+SlO2lO重
量%を示す点Bと、Al2O34O重量%、SrTlO
3lO重量%、MgO+SiO25O重量?を示す点C
5と、Al2O34O重量?、MgO+SiO22重量
?を示す点D1と、を順次に結ぶ直線で囲まれた範囲に
含まれ且つMgOとSiO2とのモル比がMgO/Si
O2≧2となる範囲に含まれ且つSiO2が0.5重量
%以上の範囲に含まれるような割合で混合されたものを
焼結した磁器組成物に係わるものである。2. Description of the Related Art In recent years, as IC-related technology has made remarkable progress and the use of ICs in various circuits is increasing, substrates are required to have various characteristics different from those of the past. For example, in order to increase the density and reduce the cost of circuits, there is a need for circuit boards that are capable of forming capacitors with negative temperature coefficients, for example for the purpose of temperature compensation of oscillation circuits. However, in conventionally known phenol substrates, for example, Q is 5.
Since it has a low temperature coefficient of 0.00 or less and a temperature coefficient of 100 ppM or more, it is not suitable for the purpose. In addition, in the case of an alumina substrate, the Q value is 500 or more, and although it has excellent mechanical strength and heat resistance, it is not suitable for the purpose because the temperature coefficient of dielectric constant is +100 ppM or more. On the other hand, the board may be constructed using a conventional temperature-compensating capacitor material, but in this case, the Q is as high as 1000 or more, and the heating coefficient is also +100 to -
It can be freely selected between 4,700 ppM, but on the other hand, the mechanical strength and heat resistance strength are low, and the properties as a substrate material cannot be satisfied in terms of strength. Therefore, there is currently no ceramic composition that satisfies both the properties required for capacitors and the properties required for substrates. Therefore, the purpose of the present invention is to have a relatively low dielectric constant, high Q, high mechanical strength and heat resistance strength, and to be able to freely select the temperature coefficient of the dielectric constant between +100 and -2200 ppM. An object of the present invention is to provide a porcelain composition. The present invention to achieve the above object is based on Al (aluminum), B
r (strontium), Ti (titanium), Mg (magnesium), Si (silicon) are these compounds A
l2O3 (aluminum oxide), SrTiO3 (strontium titanate), MgO (magnesium oxide), S
Al2O3 in terms of iO2 (silicon oxide)
, SrTiO3, falls into the ternary diagram of MgO + SiO2,
Al2O396 weight? , SrTiO32% by weight, MgO
+SiO22 weight? Point A indicating the weight percentage of Al2O38O and SrTiO3lO weight? , point B showing MgO+SlO2lO wt%, Al2O34O wt%, SrTlO
3lO weight%, MgO+SiO25O weight? Point C showing
5 and Al2O34O weight? , MgO+SiO22 weight? , and the molar ratio of MgO and SiO2 is MgO/Si
This relates to a porcelain composition obtained by sintering a mixture of O2≧2 and SiO2 in a proportion of 0.5% by weight or more.
上記本発明によれば、比誘電率が小さく、Qが高く、誘
電率の温度係数が+100〜−2200ppMであるに
も拘らず、機械的強度及ひ耐熱強度が大きく且つ絶縁抵
抗も十分に高い磁器を提供することが出来る。According to the present invention, although the dielectric constant is small, the Q is high, and the temperature coefficient of the dielectric constant is +100 to -2200 ppM, the mechanical strength and heat resistance strength are large, and the insulation resistance is also sufficiently high. We can provide porcelain.
従つて、ICの回路基板等にコンデンサを形成すること
が可能になる。又強度の大きいコンデンサを提供するこ
とが可能になる。以下、本発明の実施例について述べる
。まず98%以上の純度を有するAl2O3,MgO,
SlO2,SrTiO3を夫々用意し、第1表〜第7表
に示す配合比になるように秤量した。Therefore, it becomes possible to form a capacitor on an IC circuit board or the like. Furthermore, it becomes possible to provide a capacitor with high strength. Examples of the present invention will be described below. First, Al2O3, MgO with a purity of 98% or more,
SlO2 and SrTiO3 were each prepared and weighed so as to have the compounding ratios shown in Tables 1 to 7.
次にポリエチレンポツト及ひアルミナボールを用いて、
夫々の組成の材料を湿式混合した。次に混合物の脱水S
及ひ乾媚を行つた後、約125『Cで3時間の仮焼成を
行い、その後粉砕した。次に有機質のバインダーを加え
た。電気的特姓を測定する試料を得るために上記混合物
を直径16mm、厚さ1mmの円板に、約1000k9
/dで加圧成型し、この成型体を電気炉によつて約12
00圧C〜1650℃、3時間本焼成した。Next, using a polyethylene pot and an alumina ball,
The materials of each composition were wet mixed. Then the mixture is dehydrated
After drying, it was pre-calcined at about 125°C for 3 hours, and then pulverized. Next, an organic binder was added. In order to obtain a sample for measuring electrical characteristics, the above mixture was poured into a disk with a diameter of 16 mm and a thickness of about 100 k9.
/d, and this molded body is heated to approximately 12 mm in an electric furnace.
Main firing was performed at 00 pressure C to 1650° C. for 3 hours.
次に、第1図に示す如く本焼成した円板伏磁器基板1の
両主面に銀ペーストを塗布し、760℃、20分間の焼
付け処理を施して電極2,3を形成,し、夫々の試料を
完成させた。その後、夫々の試料の比誘電率εs、誘電
率の泥度変化率、絶縁抵抗を測定した。一方、抗析強度
を測定する試料を得るために、上記混合物を縦幅10m
7!L、横幅20m77!、厚み1mmくの角板に約1
000kg/dで加圧成型し7、この成型体を電気炉に
て約1200でC〜1600、C1約3時間本焼成した
。Next, as shown in FIG. 1, silver paste is applied to both main surfaces of the final fired disc porcelain substrate 1, and baked at 760°C for 20 minutes to form electrodes 2 and 3, respectively. completed the sample. Thereafter, the relative permittivity εs, rate of change in dielectric constant muddyness, and insulation resistance of each sample were measured. On the other hand, in order to obtain a sample for measuring the anti-destructive strength, the above mixture was
7! L, width 20m77! , about 1 on a square plate with a thickness of 1 mm
The molded body was press-molded at 000 kg/d7, and this molded body was fired in an electric furnace at a temperature of about 1,200 C to 1,600 C1 for about 3 hours.
次に、例えば岡崎清著の「セラミツク誘電体工学」の第
413頁に記載されているような原理に基つく市販の抗
析強度測定装置を用いて破壊強度を求め、次式によつて
抗折強度を算出した。また耐熱強度を測定する試料を得
るために、上記混合物を湿式成型法により本焼成をした
基板寸法が60m7!1.×60mTIL><0.6m
mになるように成型し、成型体を電気炉で約120『C
〜1650℃、約6時間本焼成した。Next, the breaking strength is determined using a commercially available anti-deflection strength measuring device based on the principle described on page 413 of ``Ceramic Dielectric Engineering'' by Kiyoshi Okazaki, and the anti-destructive strength is calculated using the following formula. The bending strength was calculated. In addition, in order to obtain a sample for measuring heat resistance strength, the above mixture was subjected to final firing using a wet molding method.The substrate size was 60m7!1. ×60m TIL><0.6m
m, and heat the molded body in an electric furnace at approximately 120°C.
Main firing was performed at ~1650°C for about 6 hours.
次に、焼結体を電気オーブンの中で所定温度に10分間
予熱し、予熱した試料を市販の墳流半田装置(半田温度
30『C)に通した。半田中に浸した時点で破壊したも
のはそのまま不良とし、又破壊しなかつた試料は、螢光
剤に含浸させ、クラツクに螢光剤が入り込むことを利用
してクラツクの有無を調べた。そして、このような試1
験を電気オーブンによる予熱温度を種々変えて行つた。
そして、同一組成の20枚の試料グループの20枚全部
が全く破壊及ひクラツクを発生しない場合の予熱泥度を
求めた。そして、半田渦度(30『C)と破壊及ひクラ
ツクを発生しない最高予熱渦度との差を非破壊最大温度
差Rとした。第1表〜第7表は、種々の試料の組成、焼
成温度、特姓を示すものである。Next, the sintered body was preheated to a predetermined temperature in an electric oven for 10 minutes, and the preheated sample was passed through a commercially available dead-flow soldering device (soldering temperature: 30°C). Samples that broke when immersed in solder were considered defective, and samples that did not break were impregnated with a fluorescent agent, and the presence or absence of cracks was examined using the fact that the fluorescent agent penetrated into the cracks. And such trial 1
Experiments were conducted by varying the preheating temperature using an electric oven.
Then, the preheat mudness was determined when all 20 specimens of a group of 20 specimens having the same composition did not break or crack at all. The difference between the solder vorticity (30'C) and the highest preheating vorticity that does not cause damage or cracks was defined as the maximum non-destructive temperature difference R. Tables 1 to 7 show the composition, firing temperature, and characteristics of various samples.
但し、試験のために形成した3種類の試料は、同一配合
比であるから同一試料とした。尚これ等の表に卦ける比
誘電率ε及ひQは常温にて周波数1MHzで測定した結
果を示し、誘電率の温度係数TCはで求めた。However, since the three types of samples formed for the test had the same compounding ratio, they were considered to be the same sample. Note that the relative permittivity ε and Q in these tables are the results of measurement at room temperature and a frequency of 1 MHz, and the temperature coefficient TC of the permittivity was determined by.
但し、C2Oは2『Cに訃ける容量、C35は85゜C
にあ・ける容量、ΔTは85゜C−20゜C−65゜C
である。Rは前述した如く非破壊最大温度差である。尚
この表には記載されていないが、総ての基板で直流10
0に訃いて107MΩ程度であつた。また第1表〜第7
表に示す配合点は第2図の三元図の配合点A,B,C等
及ひイロハ等を示す。また第1表〜第5表は本発明に属
するものの特姓を示し、第6表及ひ第7表は本発明に属
さないものの特註を示す。尚第6〜7表で記入されてい
ない特姓ぱ、他の不良で測定しなかつた。第2図は第1
〜第7表に訃ける代表的な試料の組成を示す三元図であ
る。この三元図におけるA,B,C,D点を結ぶ直線内
即ち斜線を付した領域が本発明に係わる組成領域である
。次に、各成分を限定した理由について述べる。However, C2O has a capacity of 2'C, and C35 has a capacity of 85°C.
Capacity and ΔT are 85°C - 20°C - 65°C
It is. As mentioned above, R is the maximum non-destructive temperature difference. Although it is not listed in this table, all boards have DC 10
The resistance was approximately 107 MΩ. Also, Tables 1 to 7
The blending points shown in the table indicate blending points A, B, C, etc., and ABCs of the ternary diagram in FIG. 2. Further, Tables 1 to 5 show the characteristics of the products that belong to the present invention, and Tables 6 and 7 show the notes of the products that do not belong to the present invention. It should be noted that the characteristics not recorded in Tables 6 and 7 were not measured due to other defects. Figure 2 is the first
~ FIG. 7 is a ternary diagram showing the composition of representative samples shown in Table 7. The area within the straight line connecting points A, B, C, and D in this ternary diagram, that is, the area marked with diagonal lines, is the composition area according to the present invention. Next, the reason for limiting each component will be described.
第1表〜第5表の試料/F6.l〜49即ち第2図の斜
線部の範囲の試料は、Qが高く、誘電率の渦度係数(T
C)を自由に選択出来、又抗折力は1400K9/ml
以上、非破壊温度差(R)は12『C以上であり、コン
デンサとして使用することが可能であると共に基板とし
て使用可能な特性を有する。これに対して、本発明の範
囲外の試料./V).50,51即ち配合点(イ)に示
すものは、機械的強度、熱的強度は極めて優れているが
、TCが+100ppMを越え、目的とする特性から外
れる。また配合点口 ・・、ホ、トは、SrTiO3の
含有率が配合点A,B,Cを結ぶ線よ沙少ない場合を示
し、第6表の試料滝52,53,54,58,59から
明らかなようにTCが+100ppMを越え、目的に反
する。Samples in Tables 1 to 5/F6. The samples in the shaded area in Figure 2 have a high Q and a high dielectric constant vorticity coefficient (T
C) can be freely selected, and the transverse rupture strength is 1400K9/ml.
As mentioned above, the non-destructive temperature difference (R) is 12'C or more, and it has characteristics that it can be used as a capacitor and as a substrate. In contrast, samples outside the scope of the present invention. /V). 50 and 51, that is, those shown in blending point (a) have extremely excellent mechanical strength and thermal strength, but the TC exceeds +100 ppM, which deviates from the desired properties. In addition, the blending points . As is clear, TC exceeds +100 ppM, which is against the purpose.
配合点り及びヌは、Al2O3含有率が配合点DとCと
を結ぶ線より少ない場合を示す。Blend points and N indicate cases where the Al2O3 content is less than the line connecting blending points D and C.
この場合は第7表の試料/F6.66,67,68,6
9から明らかなように抗折力は1400kg/(71以
下、非破壊渦度差(ト)は12『C以下とな虱基板とし
て使用する際に機械的破壊、サーマルシヨツクによるク
ラツクが発生する可能性がある。配合点二、へ、チは(
MgO+SiO2)含有率が配合点D.!:1Aとを結
ぶ線より少ない場合を示す。In this case, the sample in Table 7/F6.66, 67, 68, 6
As is clear from 9, the transverse rupture strength is 1400 kg/(71 or less, and the non-destructive vorticity difference (T) is 12'C or less.) When used as a substrate, mechanical breakage and cracks due to thermal shock may occur. There is a property. The second compounding point is (
MgO+SiO2) content is blending point D. ! : Indicates the case where the number is less than the line connecting 1A.
この場合は第6表及び第7表の試料滝56,57,61
,62,64,65に示すように、Qが低く、暁成温度
に対しTCが敏感に動き非常に不安定である。またMg
OとSlO2のモル比がMgO/SiO2〈2のときは
、第6表の試料滝55,60及び第7表の試料腐70,
71,73,74に示すように焼結巾が狭くて焼成不良
となジ、ち密な焼結体を得る事が非常に困難となB.焼
結体のQも低く、抗折強度も小さくなる。In this case, sample waterfalls 56, 57, 61 in Tables 6 and 7
, 62, 64, and 65, the Q is low and the TC moves sensitively to the epigenetic temperature, making it extremely unstable. Also Mg
When the molar ratio of O and SlO2 is MgO/SiO2 <2, sample taki 55, 60 in Table 6 and sample rot 70, table 7
B. As shown in Nos. 71, 73, and 74, the sintering width is narrow, resulting in poor sintering and making it extremely difficult to obtain a dense sintered body. The Q of the sintered body is also low, and the bending strength is also low.
従つてMgO/SiO2≧であることが望ましい。また
第7表の試料滝72は、SiO2の含有率が0.5以下
を示す。Therefore, it is desirable that MgO/SiO2≧. Further, sample waterfall 72 in Table 7 shows a SiO2 content of 0.5 or less.
SiO2の添加量が少ないと、焼結性は悪くなb、その
結果Qが低くなり、抗折力も小さくなる。従つて焼結性
改善のために、0.5重量%以上のSiO2を混入する
ことが望ましい。以上、本発明の実施例について述べた
が、本発明は上述の実施例に限定されるものではなく、
更に変形可能なものである。例えば、上記実施例ではA
l2O3,SrTiO3,MgO,SiO2を出発原料
としたが、出発原料を、例えばAl,Sr,Ti,Mg
,Si又はこれ等の炭酸塩、水酸化物、 酸塩等とし、
Al,Sr,Ti,Mg,SiがAl2O3,SrTi
O3,MgO,SiO2に換算して本発明で特定する範
囲に含まれるようにしても勿論差支えない。尚、本発明
に係わる完成した磁器の組成を正確に測定することは困
難であるが、Al2O3,SrTiO3,MgO,Si
O2を、第2図のA,B,C,D点を結ぶ直線で囲まれ
る範囲内の比率でほぼ含んでいる。また本発明に係わる
目的、効果を損わない範囲で、別な成分を付加しても勿
論差支えなく、これも本発明の技術的範囲に属する。If the amount of SiO2 added is small, the sinterability will be poor, resulting in a low Q and a low transverse rupture strength. Therefore, in order to improve sinterability, it is desirable to mix 0.5% by weight or more of SiO2. Although the embodiments of the present invention have been described above, the present invention is not limited to the above-mentioned embodiments.
It is also deformable. For example, in the above embodiment, A
Although l2O3, SrTiO3, MgO, and SiO2 were used as starting materials, starting materials such as Al, Sr, Ti, Mg
, Si or their carbonates, hydroxides, acid salts, etc.
Al, Sr, Ti, Mg, Si are Al2O3, SrTi
Of course, it may be converted into O3, MgO, or SiO2 and included in the range specified in the present invention. Although it is difficult to accurately measure the composition of the completed porcelain according to the present invention, Al2O3, SrTiO3, MgO, Si
O2 is almost included in the ratio within the range surrounded by the straight line connecting points A, B, C, and D in FIG. Furthermore, it is of course possible to add other components to the extent that the objects and effects of the present invention are not impaired, and this also falls within the technical scope of the present invention.
また磁器の製法を変形しても差支えない。また基板に限
らず機械的強兜の大きいコンデンサにも使用可能である
。Also, there is no problem in changing the manufacturing method of porcelain. Moreover, it can be used not only for substrates but also for capacitors with large mechanical strength.
第1図は本発明の実施例に係わる磁器組成物の電気的特
性を調べるためのコンデンサを示す断面図、第2図はA
l2O3,SrTiO3,MgO+SiO2の三元図で
ある。
尚図面に用いられている符号に訃いて、1は磁器基板、
2,3は電極、A,B,C,Dは組成を示す点である。FIG. 1 is a sectional view showing a capacitor for investigating the electrical characteristics of a ceramic composition according to an embodiment of the present invention, and FIG.
It is a ternary diagram of l2O3, SrTiO3, MgO+SiO2. In addition, according to the symbols used in the drawings, 1 is a ceramic substrate,
2 and 3 are electrodes, and A, B, C, and D are points indicating the composition.
Claims (1)
あるAl_2O_3、SrTiO_3、MgO、SiO
_2に換算した状態で、Al_2O_3、SrTiO_
3、MgO+SiO_2の三元図における、Al_2O
_396重量%、SrTiO_32重量%、MgO+S
iO_22重量%を示す点Aと、Al_2O_380重
量%、SrTiO_310重量%、MgO+SiO_2
10重量%を示す点Bと、Al_2O_340重量%、
SrTiO_310重量%、MgO+SiO_250重
量%を示す点Cと、Al_2O_340重量%、SrT
iO_358重量%、MgO+SiO_22重量%を示
す点Dと、を順次に結ぶ直線で囲まれた範囲に含まれ且
つMgOとSiO_2とのモル比がMgO/SiO_2
≧2となる範囲に含まれ且つSiO_2が0.5重量%
以上の範囲に含まれるような割合で混合されたものを焼
結した磁器組成物。1 Al, Sr, Ti, Mg, Si are these compounds Al_2O_3, SrTiO_3, MgO, SiO
Al_2O_3, SrTiO_
3. Al_2O in the ternary diagram of MgO+SiO_2
_396% by weight, SrTiO_32% by weight, MgO+S
Point A indicating iO_22% by weight, Al_2O_380% by weight, SrTiO_310% by weight, MgO+SiO_2
Point B indicating 10% by weight and Al_2O_340% by weight,
Point C showing SrTiO_310% by weight, MgO+SiO_250% by weight, Al_2O_340% by weight, SrT
It is included in the range surrounded by a straight line that sequentially connects point D indicating iO_358% by weight and MgO + SiO_22% by weight, and the molar ratio of MgO and SiO_2 is MgO/SiO_2.
≧2 and SiO_2 is 0.5% by weight
A porcelain composition made by sintering a mixture of proportions falling within the above range.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54113870A JPS5924753B2 (en) | 1979-09-04 | 1979-09-04 | porcelain composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54113870A JPS5924753B2 (en) | 1979-09-04 | 1979-09-04 | porcelain composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5637274A JPS5637274A (en) | 1981-04-10 |
| JPS5924753B2 true JPS5924753B2 (en) | 1984-06-12 |
Family
ID=14623164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54113870A Expired JPS5924753B2 (en) | 1979-09-04 | 1979-09-04 | porcelain composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5924753B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6182944U (en) * | 1984-10-31 | 1986-06-02 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2568722B1 (en) * | 1984-08-03 | 1987-10-23 | Thomson Csf | DIELECTRIC CERAMIC SUBSTRATE AND PROCESS FOR OBTAINING |
| FR3058256B1 (en) * | 2016-11-02 | 2021-04-23 | Thales Sa | ELECTRICAL INSULATION BASED ON ALUMINA CERAMIC, PROCESS FOR REALIZING THE INSULATION AND VACUUM TUBE INCLUDING THE INSULATION |
-
1979
- 1979-09-04 JP JP54113870A patent/JPS5924753B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6182944U (en) * | 1984-10-31 | 1986-06-02 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5637274A (en) | 1981-04-10 |
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