JPS5928046B2 - spinner head - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for applying a viscous fluid onto the surface of a substrate using centrifugal force, that is, a spinner head, and is used for forming a photoresist thin film on a substrate in a photo-etching process, for example. It is something.

Conventional spinner heads of this type have a structure in which the center of the rotation axis coincides with the center of the substrate, and therefore has the disadvantage that a bulge of resist is formed near the outer periphery of the substrate. For this reason, there was a problem that the degree of adhesion with the original plate deteriorated during contact exposure, resulting in a decrease in resolution. Also, original plates and substrates. Even with exposure methods that do not bring the substrate into close contact with each other, the bulge of the resist becomes an obstacle, and the disadvantage is that it cannot be used close to the outer periphery of the substrate. It is an object of the present invention to provide a spinner head in which the swelling of viscous fluid (for example, photoresist) that causes these defects is minimized.

The present invention will be described below based on embodiments shown in the drawings. Figure 1 is a plan view of an embodiment of the present invention, and Figure 2 is A of Figure 1.
It is a diagram in which the substrate is placed on the -A cross-sectional view.

A disk 3 is fixed to a rotating shaft 2 rotated by a drive mechanism 1. The disk 3 rotates about its central axis 0 as its rotation center. A tilting table 4 is fixed on the disk 3 at a position offset from its central axis 0 and inclined downward toward its rotational center axis. The surface of the inclined table 4 is formed into a flat surface, and a substrate 5 is placed thereon as shown in FIG. After the photoresist is dropped onto the substrate 5, when the disk 3 is rotated by the drive mechanism 1, the photoresist is spread thinly on the substrate 5 due to the action of centrifugal force, and the excess photoresist is cut off from the substrate 5.

Note that, since the substrate 5 is placed on the inclined table 4 that is inclined downward toward the rotation center axis, the substrate 5 will not jump out from the inclined table 4 due to centrifugal force. To give an example of an experiment, the diameter L of the disc 3 is 30 mm) the diameter l of the inclined table 4 is 10 m77E) the inner height of the inclined table 4 is 1 mWL)
When the outer height 2 of the inclined table 4 was set to 3 mm, the rotation speed of the disc 3 was suitably 2000 to 5000 PPM. In this case, at a rotation speed lower than 2000 RPM, some of the photoresist bulges out in the peripheral area as shown in FIG. 3, and at a rotation speed higher than 5000 RPM, the number of pinholes becomes noticeable. However, even in the case of the one shown in FIG. 3, since conventionally the photoresist bulge 6 occurred in the entire peripheral area as shown in FIG. 4, this is a natural improvement. Note that the number of protrusions and pinholes in the photoresist is as follows when the size of the substrate 5 is constant.
It changes depending on the inclination angle of the tilt table 4, the number of rotations of the disc 3, and the position where the substrate 5 is placed, so it is necessary to set it appropriately.

When the size of the substrate 5 and the position where the substrate 5 is placed are constant, the degree of spread of the photoresist dropped onto the substrate 5 on the tilt table 4 depends on the inclination angle of the tilt table 4 and the rotation of the rotating member. Since it depends on the number of rotations, it has a greater degree of freedom in design and is easier to use than a conventional device (with one adjustment element) that adjusts the degree of spread of the photoresist only by the number of rotations. Furthermore, in this embodiment, a plurality of inclined tables are provided at equal distances from the central axis 0 on the disk 3 in order to apply photoresist onto a large number of substrates at once.

As described above, according to the present invention, it is possible to obtain a spinner head that has a simple structure, is easy to use, and has a large degree of freedom in design. Since the swelling of viscous fluids such as viscous fluids can be almost completely eliminated, even the outer periphery of the substrate can be used effectively.

[Brief explanation of the drawing]

FIG. 1 is a plan view of the spinner head of the present invention. FIG. 2 is a diagram showing an example in which a substrate 5 is placed on the cross-sectional view. FIG. 3 is a plan view showing the state after the photoresist film is formed according to the present invention. FIG. 4 is a plan view showing the state after forming a conventional photoresist film. Explanation of symbols of main parts, 2...rotating shaft, 3...disk, 4
・・・・・・Slope.

Claims (1)

[Claims] 1. In a spinner head that applies a viscous fluid to the surface of a substrate using centrifugal force, a rotating member is provided, and a rotation member is placed on the member at a position away from the center axis of rotation. A spinner head characterized by forming a flat substrate mounting table that slopes downward toward the direction of the spinner head. 2. The spinner head according to claim 1, wherein the viscous fluid is a photoresist.