JPS6212620B2 - - Google Patents
Info
- Publication number
- JPS6212620B2 JPS6212620B2 JP8795377A JP8795377A JPS6212620B2 JP S6212620 B2 JPS6212620 B2 JP S6212620B2 JP 8795377 A JP8795377 A JP 8795377A JP 8795377 A JP8795377 A JP 8795377A JP S6212620 B2 JPS6212620 B2 JP S6212620B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- transmittance
- correction filter
- center
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 6
- 238000012937 correction Methods 0.000 description 37
- 238000002834 transmittance Methods 0.000 description 33
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910001179 chromel Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 101100063942 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) dot-1 gene Proteins 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Landscapes
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Control Of Non-Electrical Variables (AREA)
Description
【発明の詳細な説明】
本発明は、光源と被露光面との間で光学フイル
タを回転させる形式の露光装置に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an exposure apparatus that rotates an optical filter between a light source and a surface to be exposed.
カラー受像管の螢光面形成工程では、フエース
パネルの内面に一様に塗布形成された螢光体感光
層を、装着されたシヤドウマスクを介して柴外光
により露光し、現像その他の処理工程を繰り返す
ことによつて多数のドツトまたはストライプを有
する螢光面を作製している。 In the process of forming a fluorescent surface of a color picture tube, the fluorescent photosensitive layer uniformly coated on the inner surface of the face panel is exposed to external light through an attached shadow mask, and development and other processing steps are repeated. A fluorescent surface having a large number of dots or stripes is produced by this method.
第1図に示すようにフエースパネル1は、その
内面に塗布形成された螢光体感光層2を有し、シ
ヤドウマスク3を装着している。光源4から放射
された露光用光線は、補正レンズ5、補正フイル
タ6およびシヤドウマスク3を通じて螢光体感光
層2に至るのであり、露光量分布を調整するため
の補正フイルタ6は、第2図に示すように中央部
で低く、周辺部へゆくに従つて高い透過率を有し
ている。この補正フイルタ6は、ガラス等の透明
基板7にニツケル,クロム,クロメル,インコネ
ル,白金,ロジウム,ルビジウム等の金属薄膜8
を蒸着することにより形成していた。 As shown in FIG. 1, a face panel 1 has a fluorescent photosensitive layer 2 coated on its inner surface, and a shadow mask 3 is attached thereto. The exposure light beam emitted from the light source 4 reaches the phosphor photosensitive layer 2 through a correction lens 5, a correction filter 6, and a shadow mask 3. The correction filter 6 for adjusting the exposure dose distribution is shown in FIG. As shown, the transmittance is low in the center and increases toward the periphery. This correction filter 6 consists of a transparent substrate 7 made of glass or the like and a metal thin film 8 made of nickel, chromium, chromel, inconel, platinum, rhodium, rubidium, etc.
It was formed by vapor deposition.
従来の補正フイルタ6には次のような欠点があ
つた。蒸着材料にニツケル,クロム,クロメル,
インコネルを用いると、その金属薄膜8に酸化に
よつて透過率が上昇するという経時変化が大きく
また白金,ロジウム,ルビジウムではガラス基板
との密着性が悪く取り扱いに難があつた。また製
造する場合にも、蒸発源の形状や第2図のような
透過率分布を得るための蒸着マスクの設計がむず
かしく、実際には試行錯誤であつたり、蒸着条件
の設定が困難で、再現性に乏しく、また一枚ずつ
しか作れないという工業的には非常に損失の大き
いものであつた。 The conventional correction filter 6 has the following drawbacks. Nickel, chromium, chromel, vapor deposition materials
When Inconel is used, the metal thin film 8 undergoes a large change in transmittance over time due to oxidation, and platinum, rhodium, and rubidium have poor adhesion to the glass substrate and are difficult to handle. Furthermore, in the case of manufacturing, it is difficult to design the shape of the evaporation source and the evaporation mask to obtain the transmittance distribution shown in Figure 2, and in practice it is a process of trial and error, and it is difficult to set the evaporation conditions, making it difficult to reproduce. It was poor in quality and could only be made one piece at a time, resulting in a huge loss from an industrial perspective.
上記のような補正フイルタ6は、露光時に螢光
体感光層2での光量分布を調整するのが目的であ
るから、この目的を実現させるためには従来の金
属蒸着膜のようにある透過率を持つ半透膜でなく
てもよい。例えば第3図のような、全く光を通さ
ない物質からなる遮光部9を基板10の一部に設
けたフイルタ11を形成し、これを光源4とフエ
ースパネル1との間で回転させれば、半透膜と同
様な光量制限効果を得ることができる。 The purpose of the correction filter 6 as described above is to adjust the light intensity distribution on the phosphor photosensitive layer 2 during exposure, so in order to realize this purpose, it is necessary to use a certain transmittance like that of a conventional metal vapor deposited film. It does not have to be a semipermeable membrane with a For example, as shown in FIG. 3, if a filter 11 is formed in which a light shielding part 9 made of a substance that does not transmit any light is provided on a part of the substrate 10, and this filter 11 is rotated between the light source 4 and the face panel 1. , it is possible to obtain the same light amount limiting effect as a semi-transparent membrane.
このフイルタ11についてさらに考察すれば、
前記遮光部9は、中心からの距離γに対して幅が
ω(γ)であり、これを回転させると距離γでの
実効的な透過率(γ)は、γ≠0で
(γ)=(1−ω(γ)/2πγ)×100〔%〕…
…式1
となる。即ち目標とする透過率分布を得るにはω
(γ)の幅を定めればよいことになる。 If we consider this filter 11 further,
The light shielding part 9 has a width ω(γ) with respect to the distance γ from the center, and when it is rotated, the effective transmittance (γ) at the distance γ becomes γ≠0 and (γ)= (1-ω(γ)/2πγ)×100[%]...
...Equation 1 is obtained. In other words, to obtain the target transmittance distribution, ω
It is sufficient to determine the width of (γ).
γ=0の回転中心では、ここに透過率0%の遮
光物があると螢光体感光層2へ到達する光は0と
なり、また遮光物がなければ到達する光が100%
となり目標とする透過率分布の特異点となる。こ
のように上述のフイルタ11は中心部付近に大き
な問題点があつたため、実用化には至つていなか
つた。 At the rotation center where γ=0, if there is a light shield with a transmittance of 0%, the light reaching the phosphor photosensitive layer 2 will be 0, and if there is no light shield, the light reaching the photosensitive layer 2 will be 100%.
This becomes the singular point of the target transmittance distribution. As described above, the above-described filter 11 had a major problem near the center, so it was not put into practical use.
本発明は、中心部付近での透過率を含め、全体
の透過率分布を任意に実現可能とした光学フイル
タとその製造方法で、第4図以下の図面とともに
その一実施例を補正フイルタの場合について詳し
く説明する。 The present invention is an optical filter that can arbitrarily realize the entire transmittance distribution, including the transmittance near the center, and a method for manufacturing the same. I will explain in detail.
補正フイルタの回転中心は、静止しているのと
同一であるから遮光部があれば透過率は0とな
る。しかし螢光体感光層2の表面である光量分布
が得られればよく、補正フイルタとフエースパネ
ル1との間には十分な距離があるから、多数のド
ツト状の遮光部を設け、光の真影、半影の効果を
利用して遮光部の真裏の位置にも光を導くことが
可能である。第4図に本実施例の補正フイルタ1
2を示す。この補正フイルタ12は、遮光部を多
数の小さな正方形の遮光ドツト13により形成し
ている。上記ドツト状となした遮光部は、逆にド
ツト状の透光部でもよく、また形状も様々に変え
ることができ、これらについては後に他の実施例
として述べることにする。 Since the center of rotation of the correction filter is the same as if it were stationary, the transmittance would be 0 if there was a light shielding part. However, since it is sufficient to obtain the light amount distribution on the surface of the phosphor photosensitive layer 2, and there is a sufficient distance between the correction filter and the face panel 1, a large number of dot-shaped light shielding parts are provided to block the light beam. By utilizing the effects of shadows and penumbra, it is possible to guide light even to the position directly behind the light shielding part. FIG. 4 shows the correction filter 1 of this embodiment.
2 is shown. This correction filter 12 has a light shielding portion formed by a large number of small square light shielding dots 13. The above-mentioned dot-shaped light-shielding part may be a dot-shaped light-transmitting part, and its shape can be changed in various ways, and these will be described later as other embodiments.
上記補正フイルタ12を用いた露光状態を第5
図に示す。補正フイルタ12の中央部において隣
りあう2つの透光部a,bに関し、螢光体感光層
2の表面に達する光路を考えると、それぞれの透
光部a,bの半影にならない部分a′,b′が一部重
なり合うようにすれば、中央部でも透過率を制御
することができる。このときの条件を遮光ドツト
13の大きさdとピツチpで表わせば
p〈1/2(d+h/L・C) ……式2
である。ここでLは光源4から螢光体感光層2ま
での距離、hは補正フイルタ12から螢光体感光
層2までの距離、Cは光源4の大きさである。な
おこの光源4の大きさCは、高圧水銀灯の光をコ
ルツで導いている場合にはそのコルツ先端の大き
さ、また高圧水銀灯にスリツトを組み合せて回転
させるものではその実効直径で、ほぼ0.5〜5.0mm
である。 The exposure state using the correction filter 12 is
As shown in the figure. Considering the optical path reaching the surface of the phosphor photosensitive layer 2 regarding the two adjacent transparent parts a and b in the center of the correction filter 12, the part a' that does not become the penumbra of the respective transparent parts a and b , b' partially overlap, the transmittance can be controlled even in the center. The conditions at this time can be expressed by the size d and pitch p of the light-shielding dots 13 as follows: p<1/2 (d+h/L·C)...Formula 2. Here, L is the distance from the light source 4 to the phosphor photosensitive layer 2, h is the distance from the correction filter 12 to the phosphor photosensitive layer 2, and C is the size of the light source 4. The size C of this light source 4 is the size of the tip of a high-pressure mercury lamp when the light is guided by a colt, or the effective diameter of a rotating high-pressure mercury lamp with a slit, which is approximately 0.5~ 5.0mm
It is.
前記遮光ドツト13の大きさdとピツチpを用
いて、補正フイルタ12の中央部の透過率TMo
を求めると、
TMo=(1−d2/p2)×100〔%〕……式3となる
。 Using the size d and pitch p of the light shielding dot 13, the transmittance TMo of the central part of the correction filter 12 is calculated.
When calculated, TMo=(1- d2 / p2 )×100[%]...Equation 3 is obtained.
第6図に(式3)のTMo線図を示す。例えば
20インチ90゜偏向カラー受像管用の補正フイルタ
を求めると、L=290mm、h=100mm、C=2.0mm
とすれば(式2)は第6図中の直線A―Bの左側
を表わし、この範囲で中心部透過率TMo=40%
の一例として点p(p=0.4mm.d=0.31mm)が
得られる。 FIG. 6 shows a TMo diagram of (Equation 3). for example
To find the correction filter for a 20 inch 90° deflection color picture tube, L = 290 mm, H = 100 mm, C = 2.0 mm.
Then, (Equation 2) represents the left side of the straight line A-B in Figure 6, and in this range, the central transmittance TMo = 40%.
As an example, a point p (p=0.4 mm, d=0.31 mm) is obtained.
一方中心からγの距離の透過率TM〓は(式
1)の考え方から
TM〓=100−ω(γ)/2πγ(100−TMo)〔%〕
……式4
である。ω(γ)の値が定まつても第4図のよう
に破線で示した遮光部存在部形状14は任意に選
ぶことができるが、一般には点対称に近い図形が
設計し易い。 On the other hand, the transmittance TM at a distance of γ from the center is expressed as TM=100−ω(γ)/2πγ(100−TMo) [%]...Equation 4 based on the concept of (Formula 1). Even if the value of ω(γ) is determined, the shape 14 of the light shielding portion existing portion shown by the broken line as shown in FIG. 4 can be arbitrarily selected, but in general, it is easier to design a shape that is close to point symmetry.
次に第4図に示した補正フイルタ12の製造方
法について一実施例を工程順に述べる。 Next, an embodiment of a method for manufacturing the correction filter 12 shown in FIG. 4 will be described in order of process.
まず前記遮光ドツト13の形状が定められるネ
ガのドツトパターン15を形成する。一方前記遮
光部存在部形状14が定められるネガのグレード
パターン16を形成する。次にこの2つのネガパ
ターン15,16から写真法により第4図と同一
なポジパターンを形成しておく。透明なガラス基
板に重クロム酸アンモニウムのポリビニルアルコ
ール溶液を塗り、上記ポジパターンを密着して露
光する。その未露光部分を現像して除去し、ドツ
ト状に露出したガラス面をフツ酸でエツチングし
て凹部を形成する。そしてこの凹部に光を通さな
い顔料等を充填して補正フイルタ12が得られ
る。 First, a negative dot pattern 15 in which the shape of the light-shielding dots 13 is determined is formed. On the other hand, a negative grade pattern 16 in which the shape 14 of the light-shielding portion existing portion is determined is formed. Next, a positive pattern identical to that shown in FIG. 4 is formed from these two negative patterns 15 and 16 by a photographic method. A polyvinyl alcohol solution of ammonium dichromate is applied to a transparent glass substrate, and the positive pattern is closely exposed to light. The unexposed portions are developed and removed, and the dot-shaped exposed glass surface is etched with hydrofluoric acid to form recesses. Then, the correction filter 12 is obtained by filling this recess with a pigment or the like that does not transmit light.
上記実施例では、ひとつのネガのドツトパター
ン15に対し、何種類かのネガのグレードパター
ン16を組み合せることが可能である。これは中
央部の透過率TMoが同じで補正フイルタ12の
大きさが違う場合、即ち、フエースパネル1の大
きさが20インチ〜14インチと異なるときや偏向角
の異なるときなどでは遮光部存在形状14を定め
るネガのグレードパターン16の径を変えるだけ
で容易に対処できることになり、実際の製造工程
では非常に有利である。 In the embodiment described above, it is possible to combine several types of negative grade patterns 16 for one negative dot pattern 15. This is because when the transmittance TMo of the center part is the same but the size of the correction filter 12 is different, that is, when the size of the face panel 1 is different from 20 inches to 14 inches, or when the deflection angle is different, the shape of the light shielding part is different. This can be easily solved by simply changing the diameter of the negative grade pattern 16 that defines the grade pattern 14, which is very advantageous in the actual manufacturing process.
また第9図に示すように、中央部透過率TMo
=40%が得られるドツトパターン15を用いて中
心からγの点で透過率が0%になるネガのグレー
ドパターン16を組み合わせると実線の透過率曲
線17の補正フイルタが得られるが、同じネガの
ドツトパターン15に対し、中心からrの点で透
過率が20%となるようなネガのグレードパターン
16を組み合せると破線の透過率曲線18の補正
フイルタとなる。しかし後者の補正フイルタを中
心からγまでの範囲で用いる限りでは、実効的に
一点鎖線の透過率曲線19となり中央部透過率
TMo=50%の補正フイルタが得られる。これ
は、螢光体感光層2が受ける光の量の比に関する
ので中央部40%、周縁部80%の補正フイルタと中
央部50%、周縁部100%の補正フイルタとは実質
的に等価になるためである。 In addition, as shown in Figure 9, the central transmittance TMo
If you combine the dot pattern 15 that gives 40% with the negative grade pattern 16 where the transmittance is 0% at the point γ from the center, you will get a correction filter with the solid line transmittance curve 17. When a negative grade pattern 16 such that the transmittance is 20% at a point r from the center is combined with the dot pattern 15, a correction filter having a transmittance curve 18 indicated by a broken line is obtained. However, as long as the latter correction filter is used in the range from the center to γ, the effective transmittance curve 19 shown by the dashed dot line becomes the transmittance at the center.
A correction filter with TMo=50% is obtained. This is related to the ratio of the amount of light received by the phosphor photosensitive layer 2, so a correction filter with a center area of 40% and a peripheral area of 80% is substantially equivalent to a correction filter with a center area of 50% and a peripheral area of 100%. To become.
以上のように本実施例の補正フイルタ12は、
小さな遮光ドツト13を多数形成することによつ
て特に中央部の透過率を任意に実現可能とし、さ
らに周辺部への透過率分布曲線も遮光部存在部形
状14として任意に得られることになつた。この
補正フイルタ12は、金属薄膜を蒸着した従来の
補正フイルタのような経時変化を起こさず、蒸着
工程での一般的な再現性が悪く、精度が高いもの
を多数形成できないという欠点を克服して、十分
精度よく量産可能となつた。この透過率分布を高
精度に実現できたのは、上記製造方法中にも述べ
たように、ドツトパターン15とグレードパター
ン16の2つの成分の組み合せが可能なためで、
さらにカラー受像管の大きさの変化に対しても即
座に同程度の精度で対処できる点など高品質でコ
ストの低いカラー受像管が得られることになる。 As described above, the correction filter 12 of this embodiment is
By forming a large number of small light shielding dots 13, it is possible to arbitrarily achieve the transmittance especially in the central part, and furthermore, the transmittance distribution curve to the peripheral part can also be arbitrarily obtained as the shape 14 of the light shielding part existing part. . This correction filter 12 does not change over time like conventional correction filters made of vapor-deposited metal thin films, and overcomes the drawbacks of poor reproducibility in the vapor deposition process and the inability to form large numbers of highly accurate filters. , mass production was possible with sufficient precision. This transmittance distribution was achieved with high precision because, as mentioned in the above manufacturing method, it is possible to combine the two components of the dot pattern 15 and the grade pattern 16.
Furthermore, a color picture tube of high quality and low cost can be obtained in that it can immediately respond to changes in the size of the color picture tube with the same degree of precision.
上記実施例の補正フイルタ12は遮光ドツト1
3の形状を小さな正方形としたが、本発明では小
さな遮光部または透光部を多数設けるのであるか
ら、様々な形状に形成可能である。次に他の実施
例のいくつかを第10図以下の図面とともに簡単
に説明する。 The correction filter 12 of the above embodiment has a light shielding dot 1.
Although the shape of No. 3 is a small square, since the present invention provides a large number of small light-shielding parts or light-transmitting parts, it can be formed into various shapes. Next, some other embodiments will be briefly described with reference to the drawings from FIG. 10 onwards.
第10図は遮光ドツト20の形状が小さな円で
ある場合の補正フイルタ21で、上記(式3)に
対応する中央部透過率は、
となる。ただしdは遮光ドツト20の直径、pは
そのピツチである。中心からγの距離の透過率
TM〓は(式4)で与えられる。 FIG. 10 shows the correction filter 21 when the shape of the light-shielding dot 20 is a small circle, and the central transmittance corresponding to the above (formula 3) is: becomes. However, d is the diameter of the light-shielding dot 20, and p is its pitch. Transmittance at distance γ from center
TM〓 is given by (Equation 4).
第11図の補正フイルタ22は、格子縞の遮光
部23を形成したもので、透光部が正方形のドツ
ト状となつている。この透光部の一辺をd′、ピツ
チをpとすれば、中央部透過率は
TMo=d′2/p2×100〔%〕 ……式6
である。 The correction filter 22 shown in FIG. 11 has a checkered light-shielding portion 23, and the light-transmitting portion has a square dot shape. If one side of this light-transmitting part is d' and the pitch is p, the transmittance at the center is TMo=d' 2 /p 2 ×100 [%] . . . Equation 6.
第12図の補正フイルタ24は、同一径の円形
の遮光ドツトを、中央部で密(ピツチp)に、周
辺にゆくに従つてピツチを大とするものである。
中央部での透過率は(式5)と同一となり、ピツ
チの変化は(式4)に準じて定めることができ
る。 The correction filter 24 shown in FIG. 12 has circular light-shielding dots of the same diameter arranged densely (pitch p) in the center and increasing in pitch toward the periphery.
The transmittance at the center is the same as (Equation 5), and the change in pitch can be determined according to (Equation 4).
第13図の補正フイルタ25は、遮光ドツトの
ピツチが均一で、周辺にゆくに従つて遮光ドツト
の大きさが小さくなるものである。この場合も
(式5)と(式4)から容易に求めることができ
る。 In the correction filter 25 shown in FIG. 13, the pitch of the light-shielding dots is uniform, and the size of the light-shielding dots becomes smaller toward the periphery. In this case as well, it can be easily determined from (Equation 5) and (Equation 4).
なお上記ではカラー受像管の製造時に用いられ
る補正フイルタを例に挙げて説明したが、特に光
量を制限する光学フイルタ等で全て実現可能であ
り、十分な効果を発揮することができる。 Although the above explanation has been given by taking as an example the correction filter used in the manufacture of color picture tubes, it is possible to realize the present invention by using an optical filter that particularly limits the amount of light, and a sufficient effect can be achieved.
以上に詳しく述べたように、本発明によれば、
光源と被露光面との間で回転する光学フイルタ
が、その透光性基板の板面に多数の斑点状または
格子状の遮光部を有し、上記光学フイルタの中央
部での遮光部分の幅およびピツチをそれぞれd,
p、上記光源から上記被露光面までの距離をL、
上記光学フイルタから上記被露光面までの距離を
h、上記光源の直径をCとするとき、p<(1/2)
(d+h/L・C)の関係が成立するように構成する
のであり、光の真影および半影の作用を利用し
て、被露光面の中央部での実質的露光量を所定値
に設定することが容易となり、とくにカラー受像
管の螢光面形成に適用してすぐれた効果を奏す
る。 As described in detail above, according to the present invention,
An optical filter that rotates between a light source and a surface to be exposed has a large number of spot-like or lattice-like light-shielding parts on the surface of its transparent substrate, and the width of the light-shielding part at the center of the optical filter is and pitch are respectively d,
p, the distance from the light source to the exposed surface is L,
When the distance from the optical filter to the exposed surface is h, and the diameter of the light source is C, p<(1/2)
The structure is configured so that the relationship (d+h/L・C) is established, and the effective exposure amount at the center of the exposed surface is set to a predetermined value by utilizing the effects of the true shadow and penumbra of light. This method is particularly effective when applied to the formation of fluorescent surfaces in color picture tubes.
第1図は露光状態を示す断面図、第2図は透過
率分布曲線図、第3図は遮光部を有するフイルタ
の上面図、第4図は本発明を実施した露光装置の
光学フイルタの上面図、第5図は第4図の光学フ
イルタを用いた露光状態の正面図、第6図は第4
図の光学フイルタの形状と中央部透過率との関係
線図、第7図はドツトパターンの上面図、第8図
はグレードパターンの上面図、第9図は透過率分
布曲線図、第10図、第11図、第12図、第1
3図は他の実施例を示す上面図である。
12……補正フイルタ、13……遮光ドツト、
20……遮光ドツト、21……補正フイルタ、2
2……補正フイルタ、23……格子縞の遮光部、
24,25……補正フイルタ。
FIG. 1 is a cross-sectional view showing the exposure state, FIG. 2 is a transmittance distribution curve diagram, FIG. 3 is a top view of a filter having a light shielding part, and FIG. 4 is a top view of an optical filter of an exposure apparatus in which the present invention is implemented. Figure 5 is a front view of the exposure state using the optical filter shown in Figure 4, and Figure 6 is a front view of the exposure state using the optical filter shown in Figure 4.
Figure 7 is a top view of the dot pattern, Figure 8 is a top view of the grade pattern, Figure 9 is a transmittance distribution curve diagram, and Figure 10 is a diagram of the relationship between the shape of the optical filter and the central transmittance. , Fig. 11, Fig. 12, Fig. 1
FIG. 3 is a top view showing another embodiment. 12... Correction filter, 13... Light shielding dot,
20... Light shielding dot, 21... Correction filter, 2
2...Correction filter, 23...Checkered light shielding part,
24, 25...Correction filter.
Claims (1)
タが、その透光性基板の板面に多数の斑点状また
は格子状の遮光部を有し、上記光学フイルタの中
央部での遮光部分の幅およびピツチをそれぞれ
d,p、上記光源から上記被露光面までの距離を
L、上記光学フイルタから上記被露光面までの距
離をh、上記光源の直径をCとするとき、 p<(1/2)(d+h/L・C) の関係が成立することを特徴とする露光装置。[Scope of Claims] 1. An optical filter that rotates between a light source and a surface to be exposed has a large number of spot-like or lattice-like light-shielding parts on the plate surface of a transparent substrate, and the center of the optical filter Let d and p be the width and pitch of the light-shielding portion at the section, respectively, L be the distance from the light source to the exposed surface, h be the distance from the optical filter to the exposed surface, and C be the diameter of the light source. An exposure apparatus characterized in that the following relationship holds true: p<(1/2)(d+h/L・C).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8795377A JPS5422844A (en) | 1977-07-21 | 1977-07-21 | Optical filter and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8795377A JPS5422844A (en) | 1977-07-21 | 1977-07-21 | Optical filter and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5422844A JPS5422844A (en) | 1979-02-21 |
| JPS6212620B2 true JPS6212620B2 (en) | 1987-03-19 |
Family
ID=13929234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8795377A Granted JPS5422844A (en) | 1977-07-21 | 1977-07-21 | Optical filter and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5422844A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6024345B2 (en) * | 1981-10-29 | 1985-06-12 | 本田技研工業株式会社 | Lubrication system for shift fork in transmission |
| US4838266A (en) * | 1986-09-08 | 1989-06-13 | Koziol Jeffrey E | Lens shaping device using a laser attenuator |
-
1977
- 1977-07-21 JP JP8795377A patent/JPS5422844A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5422844A (en) | 1979-02-21 |
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