JPS5938649B2 - Magnetic memory and its manufacturing method - Google Patents
Magnetic memory and its manufacturing methodInfo
- Publication number
- JPS5938649B2 JPS5938649B2 JP15538376A JP15538376A JPS5938649B2 JP S5938649 B2 JPS5938649 B2 JP S5938649B2 JP 15538376 A JP15538376 A JP 15538376A JP 15538376 A JP15538376 A JP 15538376A JP S5938649 B2 JPS5938649 B2 JP S5938649B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- head
- thin film
- coating
- polysilicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000010408 film Substances 0.000 claims description 27
- 239000011248 coating agent Substances 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 18
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 12
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000003860 storage Methods 0.000 description 32
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 239000011253 protective coating Substances 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- IGOJDKCIHXGPTI-UHFFFAOYSA-N [P].[Co].[Ni] Chemical compound [P].[Co].[Ni] IGOJDKCIHXGPTI-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- HEXHLHNCJVXPNU-UHFFFAOYSA-N 2-(trimethoxysilylmethyl)butane-1,4-diamine Chemical compound CO[Si](OC)(OC)CC(CN)CCN HEXHLHNCJVXPNU-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 210000000936 intestine Anatomy 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- -1 silane compound Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は磁気的記憶装置(磁気ディスクの装置および磁
気ドラム装置等)に用いられる磁気記憶体に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic storage body used in magnetic storage devices (magnetic disk devices, magnetic drum devices, etc.).
一般に記録再生磁気ヘッド(以下ヘッドと呼ぶ)と磁気
記憶体とを構成部とする磁気記憶装置の記録再生方法に
は大別して次のような二種類の方法がある。In general, there are two types of recording/reproducing methods for a magnetic storage device that includes a recording/reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body, as follows.
第一の方法は、操作開始時にヘッドと磁気記憶体面とを
接触状態でセットした後、前記磁気記憶体に所要の回転
を与えることにより前記ヘッドと前記磁気記憶体面との
間に空気層分の空間を作りこの状態で記録再生をする方
法である。The first method is to set the head and the magnetic storage surface in contact at the start of operation, and then apply a required rotation to the magnetic storage to create an air layer between the head and the magnetic storage surface. This method creates a space and records and plays in this state.
この方法では、操作終了時に磁気記憶体の回転が止まり
、この時ヘッドと磁気記憶体面は操作開始時と同様に接
触摩擦状態にある。第二の方法は、磁気記憶体に予め所
要の回転を与えておき、急激にヘッドを磁気記憶体面上
に押し付けることにより、前記ヘッドと前記磁気記憶体
面との間に空気層分の空間をつくり、この状態で記録再
生する方法である。In this method, the rotation of the magnetic storage body stops at the end of the operation, and at this time the head and the surface of the magnetic storage body are in the same frictional state as at the start of the operation. The second method is to apply a required rotation to the magnetic storage body in advance, and then suddenly press the head onto the magnetic storage body surface, thereby creating a space equivalent to an air layer between the head and the magnetic storage body surface. , this is a method of recording and reproducing in this state.
このように、第一の方法では操作開始時および操作終了
時にヘッドと磁気記憶体面は接触摩擦状態にあり、第二
の方法ではヘッドを磁気記憶体面に押し付ける際に接触
摩擦状態にある。これらの接触摩擦状態におけるヘッド
と磁気記憶体の間に生じる摩擦力は、ヘッドおよび磁気
記憶体を摩耗させ、ついにはヘッドおよび金属磁性薄膜
媒体に傷を生じせしめることがある。また前記接触摩擦
状態においてヘッドのわずかな姿勢の変化がヘッドにか
ゝる荷重を不均一にさせ、ヘッドおよび磁気記憶体表面
に傷を作ることもある。また更に記録再生中に突発的に
ヘッドが磁気記憶体に接触し、ヘッドと磁気記憶体間に
大きな摩擦力が働き、ヘッドおよび磁気記憶体が破壊さ
れることがしばしば起こる。この様なヘッドと磁気記憶
体との接触摩擦、接触摩耗および接触破壊からヘッドお
よび磁気記憶体を保護するために磁気記憶体の表面に保
護被膜を被覆することが必要である。従来から保護被膜
として金属メッキ膜(例えばCr、Rh、Ni−P等)
を被覆する方法あるいは金層磁性薄膜媒体の表面を酸化
して酸化物を形成させて保護膜とする方法などがあるが
いずれも上記の接触摩擦現象に対して有力な手段とはな
らない。本発明者はすでにこれらの欠点をなくしたポリ
珪酸からなる保護膜を提案している(特願昭50−81
201)。このポリ珪酸からなる保護被膜はヘツドと磁
気記憶体の接触摩擦に十分耐え、またヘツドの突発的な
磁気記憶体への接触に十分耐え、さらにまた高温高湿状
態においても前記金属磁性薄膜を十分保護し、磁気記憶
体を含む下地金属体の磁気特性を損なわないなど保護被
膜としては十分な性態を有している。Thus, in the first method, the head and the magnetic storage surface are in a frictional contact state at the start and end of the operation, and in the second method, the head and the magnetic storage surface are in a frictional contact state when the head is pressed against the magnetic storage surface. The frictional force generated between the head and the magnetic storage body in these contact friction states causes wear on the head and the magnetic storage body, and may eventually cause scratches on the head and the metal magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head causes the load applied to the head to become uneven, which may cause scratches on the surface of the head and the magnetic storage body. Furthermore, during recording and reproduction, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, often resulting in destruction of the head and the magnetic storage body. In order to protect the head and the magnetic memory from such contact friction, contact wear and contact breakdown between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film. Traditionally, metal plating films (e.g. Cr, Rh, Ni-P, etc.) have been used as protective films.
There are methods such as coating the gold-layered magnetic thin film medium with oxides, or oxidizing the surface of the gold-layered magnetic thin film medium to form an oxide to form a protective film, but neither of these methods is effective against the above-mentioned contact friction phenomenon. The present inventor has already proposed a protective film made of polysilicic acid that eliminates these drawbacks (Japanese Patent Application No. 50-81).
201). This protective film made of polysilicate sufficiently withstands the contact friction between the head and the magnetic memory, and also withstands sudden contact of the head with the magnetic memory, and also protects the metal magnetic thin film even under high temperature and high humidity conditions. It has sufficient properties as a protective film, such as protecting and not impairing the magnetic properties of the underlying metal body containing the magnetic storage body.
ところが、ヘツドによつてはヘツドと磁気記憶体の間に
ごみを引き込み易くそのごみが研磨剤の働きをしてヘツ
ドおよび磁気記憶体を摩耗し、その摩耗によつて生じた
摩耗粉がさらにヘツドおよび磁気記憶体を摩耗させるも
のがある。However, some heads tend to draw dust between the head and the magnetic memory, and the dust acts as an abrasive and wears down the head and the magnetic memory, and the abrasion particles generated by the abrasion further abrade the head. and some that wear out the magnetic memory.
このような現象は前部にテーパのついたヘツドにおいて
著しい。本発明の目的は上述のごみを引き込み易いヘツ
ドによつても十分に金属磁性薄膜媒体を保護する保護被
膜を有する磁気記憶体およびその製造方法を提供するこ
とにある。This phenomenon is more pronounced in heads with a tapered front. SUMMARY OF THE INVENTION An object of the present invention is to provide a magnetic memory having a protective coating that sufficiently protects a metal magnetic thin film medium even from the above-mentioned heads that tend to attract dust, and a method for manufacturing the same.
この発明の磁気記憶体は鏡面研磨された非磁性円盤状基
体上に金属磁性薄膜媒体が被覆され、この金属磁性薄膜
媒体上にポリ珪酸被膜が二重あるいはそれ以上に被覆さ
れて構成されている。The magnetic storage body of the present invention is constructed by coating a metal magnetic thin film medium on a mirror-polished non-magnetic disk-shaped substrate, and coating the metal magnetic thin film medium with double or more polysilicate films. .
そしてこのポリ珪酸被膜の少くとも一層にシランカツプ
リング剤が含まれた構成も包含される。この発明の磁気
記憶体の製造方法においては、鏡面研磨された非磁性円
盤状基体上に金属磁性薄膜媒体を被覆し更にこの上に、
シランカツプリング剤を含む、または含まないテトラア
ルコキシシランの加水分解物であるテトラヒドロキシシ
ランの溶液を塗布した後、全体を室温以上かつ前記金属
磁性薄膜媒体の磁気的性質の変化が記録および再生に影
響を与えない温度で処理することにより形成したシラン
カツプリング剤を含むまたは含まないポリ珪酸被膜の上
に前記溶液を再び塗布し前と同様な温度で処理すること
を繰り返すことにより二重またはそれ以上のシランカツ
プリング剤を含むまたは含まないポリ珪酸被膜を前記金
属磁性薄膜媒体上に形成させて磁気記憶体を製造する。Also included is a structure in which at least one layer of this polysilicate film contains a silane coupling agent. In the method for manufacturing a magnetic storage body of the present invention, a metal magnetic thin film medium is coated on a mirror-polished nonmagnetic disc-shaped substrate, and further,
After applying a solution of tetrahydroxysilane, which is a hydrolyzate of tetraalkoxysilane, with or without a silane coupling agent, the entire body is heated to a temperature above room temperature and changes in the magnetic properties of the metal magnetic thin film medium are observed for recording and reproduction. The solution can be reapplied onto a polysilicic acid coating with or without a silane coupling agent formed by treatment at a temperature that does not affect the coating, and double or double A magnetic storage body is manufactured by forming a polysilicate film containing or not containing the above-mentioned silane coupling agent on the metal magnetic thin film medium.
次に図面を参照して本発明を詳細に説明する。図はこの
発明の磁気記憶体の一実施例を示す断面図である。図に
おいて、本発明の磁気記憶体7は合金円盤1とその上に
被覆された非磁性合金層2とで構成される非磁性円盤状
基体と、この非磁性合金層2の鏡面研磨面上に被覆され
た金属磁性薄膜媒体3と、この金属磁性薄膜媒体3上に
形成されたポリ珪酸からなる保護被膜6から構成されて
おり、この保護被膜6は下層4と上層5の2層から成つ
ている。Next, the present invention will be explained in detail with reference to the drawings. The figure is a cross-sectional view showing one embodiment of the magnetic storage body of the present invention. In the figure, the magnetic storage body 7 of the present invention has a nonmagnetic disk-shaped base body composed of an alloy disk 1 and a nonmagnetic alloy layer 2 coated thereon, and a mirror-polished surface of the nonmagnetic alloy layer 2. It consists of a coated metal magnetic thin film medium 3 and a protective coating 6 made of polysilicate formed on the metal magnetic thin film medium 3, and this protective coating 6 consists of two layers, a lower layer 4 and an upper layer 5. There is.
合金円盤1は十分小さなうねりを持つた面に仕上げられ
ていなければならない(円周方向で50μm以下および
半径方向で100μm以下)。The alloy disk 1 must be finished with a surface having sufficiently small waviness (50 μm or less in the circumferential direction and 100 μm or less in the radial direction).
これはうねりが大きいと記録および再生時に磁気記憶体
上に浮揚しているヘツドが磁気記憶体面の上下の動きに
追従できずにヘツドと磁気記憶体間の距離が変化し記録
再生特性が変化するからである。この合金円盤1の上に
めつきにより被覆された非磁性合金層は機械的研磨によ
り表面粗さ0.04μm以下に鏡面仕上げされている。
なお、合金円盤1に鏡面研磨が可能な金属を用いれば、
非磁性合金層2は不用となる。非磁性合金層2の上に高
密度記録用の金属磁性薄膜媒体3がめつきにより被覆さ
れている。この金属磁性薄膜媒体3をヘツドの接触など
の物理的変化または湿気や温度による化学的変化から十
分に保護する保護被膜6はポリ珪酸から成つている。ま
たこの保護被膜6は下層4と上層5のポリ珪酸の二重膜
になつていることが特徴である〇上記保護被膜6はテト
ラアルコキシシランの加水分解物であるテトラヒドロキ
シシランの溶液を−体となつた下地体1,2および3を
回転させつつこの溶液を吐出して塗布した後、電気炉に
て焼成冷却して下層4を形成しその上に同様lこして上
層5を形成させることにより形成される。This is because if the waviness is large, the head floating above the magnetic storage body during recording and playback will not be able to follow the vertical movement of the magnetic storage surface, and the distance between the head and the magnetic storage body will change, changing the recording and playback characteristics. It is from. The nonmagnetic alloy layer coated on the alloy disk 1 by plating is mirror-finished to a surface roughness of 0.04 μm or less by mechanical polishing.
In addition, if a metal that can be mirror polished is used for the alloy disk 1,
The nonmagnetic alloy layer 2 becomes unnecessary. A metal magnetic thin film medium 3 for high-density recording is coated on the nonmagnetic alloy layer 2 by plating. The protective coating 6, which sufficiently protects the metal magnetic thin film medium 3 from physical changes such as head contact or chemical changes due to moisture and temperature, is made of polysilicic acid. This protective coating 6 is characterized by being a double layer of polysilicic acid, the lower layer 4 and the upper layer 5. The protective coating 6 is made of a solution of tetrahydroxysilane, which is a hydrolyzate of tetraalkoxysilane. After applying this solution by discharging it while rotating the base bodies 1, 2 and 3, which have now become base bodies 1, 2 and 3, the solution is fired and cooled in an electric furnace to form a lower layer 4, and on top of that, the upper layer 5 is formed by straining in the same manner. formed by.
上記ポリ珪酸膜はテトラヒドロキシシランの重合時のス
トレスおよび下地の金属磁性媒体との熱膨張率の違いに
よるストレスを含んでおり、大きな外力が繰り返し加わ
つた時に、膜にひび割れや剥離が生じることがある。The above-mentioned polysilicate film contains stress due to the polymerization of tetrahydroxysilane and stress due to the difference in coefficient of thermal expansion with the underlying metal magnetic medium, and cracks or peeling may occur in the film when large external forces are repeatedly applied. be.
下地金属磁性媒体との熱膨張率の違いによるストレスは
ポリ珪酸膜を多重にすることによりかなり緩和できる〇
例えば、前述のように下層4と上層5と二重にすること
によりストレスは下層4にとどまらせ、上層5に伝わら
ないようにすることによつて保護被膜6のひび割れおよ
び剥離を防ぎ、ヘツドとの耐摩耗性を向上させることが
できる。Stress due to the difference in thermal expansion coefficient with the underlying metal magnetic medium can be considerably alleviated by layering the polysilicate film. For example, by layering the lower layer 4 and the upper layer 5 as described above, stress can be reduced to the lower layer 4. By holding the protective coating 6 in place and preventing it from being transmitted to the upper layer 5, cracking and peeling of the protective coating 6 can be prevented and the abrasion resistance with the head can be improved.
また下層4と上層5の両方またはどちらか一方にシラン
カツプリング剤を混入することにより、さらにストレス
を緩和し、耐摩耗性を向上させることができる。Furthermore, by incorporating a silane coupling agent into both or one of the lower layer 4 and the upper layer 5, stress can be further alleviated and wear resistance can be improved.
こ\でいうシランカツプリング剤は下記の一般式で示さ
れるシラン化合物の一種である。The silane coupling agent referred to here is a type of silane compound represented by the following general formula.
RcSi(Xa)n(Xb)3−N,nはO〜3の整数
。RcSi(Xa)n(Xb)3-N, n is an integer of O to 3.
式中において、XbおよびXaはCl,Brなどのバネ
またこの他に詳細な化学式は明らかでないが、Rcの部
分に+ぐ一ぐ一堡今の単位を繰り返し、1級、2級、3
級の各アミノ基をもつ有機基が複雑に枝分れして下図の
ようなマトリツクスを形成しているポリアミノシランも
含まれる。(ロゲン原子、0Rdまたは0C0Rd(R
dは例えばCH3,C2H5,CH2CH2OCH3の
如き基である。In the formula, Xb and Xa are springs such as Cl, Br, etc.Although the detailed chemical formula is not clear, in the Rc part, the same unit as above is repeated, and 1st class, 2nd class, 3rd class, etc.
It also includes polyaminosilanes in which organic groups with amino groups of various classes branch in a complex manner to form a matrix as shown in the figure below. (Rogen atom, 0Rd or 0C0Rd(R
d is, for example, a group such as CH3, C2H5, CH2CH2OCH3.
)′^(を持つ有機物からなる部分を表わす。)′^(represents a part consisting of organic matter.
このようなシランカツプリング剤の例としては次のもの
が上げられる。本発記の磁気記憶体の特徴を比較例と比
べながら実施例により説明する。Examples of such silane coupling agents include the following: The characteristics of the magnetic storage body of the present invention will be explained by examples while comparing with comparative examples.
比較例
旋盤加工および熱矯正によつて十分小さなうねり(円周
方向で50μm以下および半径方向で100μm以下)
をもつた面に仕上げられたデイスク状アルミニウム合金
盤上にニツケル一燐(Ni−P)非磁性合金を約50μ
mの厚さにめつきし、このニツケル一燐めつき膜を機械
的研磨により表面粗さ0.04μm以下、厚さ約30μ
mまで鏡面仕上げしたのち、その上に磁気記憶媒体とし
てコバルトーニツケル一燐(CO−Ni−P)金属磁性
合金を約0.05μmの厚さにめつきした。Comparative example Sufficiently small waviness (50 μm or less in the circumferential direction and 100 μm or less in the radial direction) due to lathe processing and thermal straightening
Approximately 50 μm of nickel-phosphorus (Ni-P) non-magnetic alloy is placed on a disc-shaped aluminum alloy disk with a finished surface.
This nickel-phosphorus plated film was mechanically polished to a surface roughness of 0.04 μm or less and a thickness of approximately 30 μm.
After mirror finishing up to m, a cobalt-nickel-monophosphorus (CO--Ni--P) metal magnetic alloy was plated thereon to a thickness of about 0.05 μm as a magnetic storage medium.
さらにこの上に下に示した組成の溶液を十分に混合した
後、回転塗布法により塗布した。すなわち、前記アルミ
ニウム合金盤上にニツケル一燐被膜、その上にコバルト
ーニツケル一燐被膜がそれぞれめつきにより被覆された
デイスク状円盤を200rpm(毎分の回転数)より大
きい速度で水平面内で回転させ、前述の組成の溶液をデ
イスク状円盤の面上に容器より吐出すると、吐出された
溶液は遠心力によつてディング状円盤の外側ヘデイスク
状円盤の面上を濡らしつ\広がる。Further, a solution having the composition shown below was thoroughly mixed thereon and then applied by spin coating. That is, the disc-shaped disc, in which the aluminum alloy disc is coated with a nickel-phosphorus film and the cobalt-nickel-phosphorus film is coated thereon, is rotated in a horizontal plane at a speed greater than 200 rpm (revolutions per minute). When a solution having the above-mentioned composition is discharged from the container onto the surface of the disk-shaped disk, the discharged solution wets and spreads on the surface of the disk-shaped disk toward the outside of the ding-shaped disk due to centrifugal force.
前記デイスク状円盤の面上に吐出された溶液の溶媒(エ
チルアルコールおよびブチルアルコール)が蒸発するに
つれ、ポリ珪酸の被膜が前記デイスク状円盤の面上に形
成された。このようにして0.1μmの膜厚にポリ珪酸
の被膜が被覆された前記デイスク状円盤を200℃の温
度で3時間電気炉中で焼成したものを磁気デイスクとし
た。実施例 1従来例と同様な方法でアルミニウム合金
盤上にニツケル一燐被膜、その上にコバルトーニツケル
ー燐被膜、その上に0.1μm厚のポリ珪酸が被覆され
て焼成された磁気デイスク上に従来例と同様な方法で再
びポリ珪酸の被膜を0.1μmの膜厚に被覆してデイス
ク状焼成したものを磁気デイスクとした。As the solvent (ethyl alcohol and butyl alcohol) of the solution discharged onto the surface of the disk-like disk evaporated, a film of polysilicic acid was formed on the surface of the disk-like disk. The disc-shaped disk thus coated with a polysilicate film having a thickness of 0.1 μm was fired in an electric furnace at a temperature of 200° C. for 3 hours to obtain a magnetic disk. Example 1 A magnetic disk was prepared by coating an aluminum alloy disk with a nickel-monophosphorous coating, a cobalt-nickel phosphorus coating on top of the nickel-phosphorus coating, and a 0.1 μm thick polysilicate coating on top of the nickel-phosphorus coating in the same manner as in the conventional example, and firing the same. Then, a polysilicic acid film was applied again to a thickness of 0.1 .mu.m in the same manner as in the conventional example and fired into a disk shape to obtain a magnetic disk.
実施例 2
実施例1と同様な方法で、但し塗布する溶液を下記の組
成のものに変えて下層、上層のポリ珪酸の膜厚をそれぞ
れ0.05μmとして磁気デイスクとした。Example 2 A magnetic disk was prepared in the same manner as in Example 1, except that the coating solution was changed to one having the composition shown below, and the film thicknesses of the lower and upper layers of polysilicic acid were each 0.05 μm.
実施例 3
従来例と同様な方法でアルミニウム合金盤上にニツケル
一燐被膜、その上にコバルトーニツケル一燐被膜、その
上に従来例と同様な組成の溶液をム一/r−1−Jヨ齣
揩P11+誌柚漕ナ皿士l 腸q嘔上八I〜L乾燥させ
、引き続きその上に前記組成の溶液を再び前記方法で塗
布し、200℃の温度で3時間電気炉中で焼成したもの
を磁気デイスクとした。Example 3 A nickel monophosphorous coating was applied to an aluminum alloy plate in the same manner as in the conventional example, a cobalt nickel monophosphorous coating was applied on top of the nickel monophosphorous coating, and a solution having the same composition as in the conventional example was applied on top of the nickel/r-1-J. YO 齣揩P11 + 書漚行な板士1 Intestines q vo 8 I to L were dried, then a solution of the above composition was again applied thereon by the above method, and baked in an electric furnace at a temperature of 200°C for 3 hours. This was used as a magnetic disk.
実施例 4従来例と同様な方法でアルミニウム合金盤上
にニツケル一燐被膜、その上にコバルトーニツケルー燐
被膜、その上に下に示した組成の溶液を塗布してシラン
カツプリング剤としてポリアミノシランを含んだポリ珪
酸被膜を形成し、常温で10分以上乾燥させ、ひき続き
その上に下記の組成の溶液を再び前記方法で塗布し、2
00℃の温度で3時間電気炉中で焼成したものを磁気デ
イスクとした。Example 4 In the same manner as in the conventional example, a nickel monophosphorus coating was applied to an aluminum alloy plate, a cobalt nickel phosphorus coating was applied on top of the nickel phosphorus coating, and a solution having the composition shown below was coated on top of the nickel monophosphorus coating, and polyester was applied as a silane coupling agent. A polysilicic acid film containing aminosilane is formed, dried at room temperature for 10 minutes or more, and then a solution having the following composition is applied again by the above method, 2
A magnetic disk was obtained by firing in an electric furnace at a temperature of 00° C. for 3 hours.
実施例 5
従来例と同様な方法でアルミニウム合金盤上にニツケル
一燐被膜、その上にコバルトーニツケル一燐被膜、その
上に下に示した組成の溶液を塗布してシランカツプリン
グ剤としてN−ベーター(アミノエチル)−ガンマ−ア
ミノプロピルトリメトキシシランを含んだポリ珪酸膜を
形成し、常温で10分以上乾燥させ、引続きその上に下
記の組成の溶液を再び前記方法で塗布し、200℃の温
度で3時間、電気炉中で焼成したものを磁気デイスクと
した。Example 5 In the same manner as in the conventional example, a nickel monophosphorus coating was applied to an aluminum alloy plate, a cobalt nickel monophosphorus coating was applied on top of the nickel monophosphorus coating, and a solution having the composition shown below was coated on top of the nickel monophosphorous coating, and N was applied as a silane coupling agent. - A polysilicate film containing beta(aminoethyl)-gamma-aminopropyltrimethoxysilane is formed, dried at room temperature for 10 minutes or more, and then a solution having the following composition is applied thereon again by the above method. A magnetic disk was produced by firing the product in an electric furnace at a temperature of 30°C for 3 hours.
比較例および実施例1〜5に示した各磁気デイスクを用
いて、ヘツドと磁気デイスク面とが操作開始時および操
作終了時に常に接触状態にある記録再生方法において、
この操作開始と操作終了の繰り返し操作試験を前部にテ
ーパのついたゴミを引込み易いヘツドを用いて10,0
00回繰り返し行なつたところ比較例の磁気デイスクで
はヘツドの摩擦跡の約10%が剥離したが、実施例1〜
5の各磁気デイスクでは剥離は皆無であつた。In a recording and reproducing method using each of the magnetic disks shown in Comparative Example and Examples 1 to 5, the head and the magnetic disk surface are always in contact at the start and end of operation.
This operation start and end operation test was repeated for 10,0 minutes using a tapered head that easily pulled in dirt at the front.
After repeating this process 00 times, about 10% of the friction marks on the head of the magnetic disk of the comparative example were peeled off, but in Examples 1-
There was no peeling in each of the magnetic disks No. 5.
Claims (1)
膜媒体が被覆されこの金属磁性薄膜媒体上にポリ珪酸被
膜が二重、或いはそれ以上に被覆されて構成されたこと
を特徴とする磁気記憶体。 2 二重、或いはそれ以上に被覆されたポリ珪酸被膜の
うち少なくとも一層にシランカップリング剤が含まれて
いる特許請求の範囲第1項記載の磁気記憶体。 3 非磁性円盤状基体を鏡面研磨したものの上に、金層
磁性薄膜媒体を被覆し、さらにこの上にテトラヒドロキ
シシランの溶液またはシランカップリング剤を含んだテ
トラヒドロキシシランの溶液を塗布した後、全体を常温
以上かつ前記金属磁性薄膜媒体の磁気的性質の変化が記
録および再生に影響を与えない温度で処理することによ
り形成したポリ珪酸被膜またはシランカップリング剤を
含んだポリ珪酸被膜の上に更に同一方法でこの被膜の形
成を繰り返してこの被膜を2層あるいはそれ以上に形成
させることを特徴とする磁気記憶体およびその製造方法
。[Claims] 1. A metal magnetic thin film medium is coated on a mirror-polished non-magnetic disc-shaped substrate, and the metal magnetic thin film medium is coated with two or more polysilicate films. A magnetic memory body characterized by: 2. The magnetic memory body according to claim 1, wherein at least one layer of the polysilicate coating coated in two or more layers contains a silane coupling agent. 3. A gold-layered magnetic thin film medium is coated on a mirror-polished non-magnetic disc-shaped substrate, and a tetrahydroxysilane solution or a tetrahydroxysilane solution containing a silane coupling agent is applied on top of this, and then A polysilicate film or a polysilicate film containing a silane coupling agent is formed by treating the entire body at a temperature above room temperature at which changes in the magnetic properties of the metal magnetic thin film medium do not affect recording and reproduction. A magnetic memory and a method for manufacturing the same, characterized in that the film is formed in two or more layers by repeating the formation of the film using the same method.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15538376A JPS5938649B2 (en) | 1976-12-22 | 1976-12-22 | Magnetic memory and its manufacturing method |
| US05/860,832 US4152487A (en) | 1976-12-17 | 1977-12-15 | Magnetic record member |
| DE2759817A DE2759817C2 (en) | 1976-12-17 | 1977-12-16 | Magnetic recording element |
| DE2756254A DE2756254C3 (en) | 1976-12-17 | 1977-12-16 | Magnetic recording element |
| DE2759985A DE2759985C2 (en) | 1976-12-17 | 1977-12-16 | Magnetic recording element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15538376A JPS5938649B2 (en) | 1976-12-22 | 1976-12-22 | Magnetic memory and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5378807A JPS5378807A (en) | 1978-07-12 |
| JPS5938649B2 true JPS5938649B2 (en) | 1984-09-18 |
Family
ID=15604736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15538376A Expired JPS5938649B2 (en) | 1976-12-17 | 1976-12-22 | Magnetic memory and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5938649B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56124130A (en) * | 1980-03-04 | 1981-09-29 | Hitachi Maxell Ltd | Magnetic recording medium |
| JPS56159840A (en) * | 1980-05-14 | 1981-12-09 | Hitachi Maxell Ltd | Magnetic recording medium |
| JPS59135628A (en) * | 1983-01-21 | 1984-08-03 | Ulvac Corp | Wear resistant magnetic recording body |
| JPS6032126A (en) * | 1983-08-02 | 1985-02-19 | Hitachi Condenser Co Ltd | Production of magnetic recording medium |
-
1976
- 1976-12-22 JP JP15538376A patent/JPS5938649B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5378807A (en) | 1978-07-12 |
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