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JPS5939809B2 - magnetic memory - Google Patents
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JPS5939809B2 - magnetic memory - Google Patents

magnetic memory

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Publication number
JPS5939809B2
JPS5939809B2 JP2124877A JP2124877A JPS5939809B2 JP S5939809 B2 JPS5939809 B2 JP S5939809B2 JP 2124877 A JP2124877 A JP 2124877A JP 2124877 A JP2124877 A JP 2124877A JP S5939809 B2 JPS5939809 B2 JP S5939809B2
Authority
JP
Japan
Prior art keywords
magnetic
head
coated
thin film
inorganic oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2124877A
Other languages
Japanese (ja)
Other versions
JPS53106101A (en
Inventor
雅廣 柳澤
守正 永尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP2124877A priority Critical patent/JPS5939809B2/en
Publication of JPS53106101A publication Critical patent/JPS53106101A/en
Publication of JPS5939809B2 publication Critical patent/JPS5939809B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は磁気的記憶装置(磁気ディスクの装置および磁
気ドラム装置等)に用いられる磁気記憶体に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic storage body used in magnetic storage devices (magnetic disk devices, magnetic drum devices, etc.).

一般に記録再生磁気ヘッド(以下ヘッドと呼ぶ)と磁気
記憶体とを構成部とする磁気記憶装置の記録再生方法に
は大別して次のような二種類の方法がある。
In general, there are two types of recording/reproducing methods for a magnetic storage device that includes a recording/reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body, as follows.

第一の方法は操作開始時にヘッドと磁気記憶体面とを接
触状態でセットした後、前記磁気記憶体に所要の回転を
与えることにより前記ヘッドと前記磁気記憶体面との間
に空気層分の空間を作り、この状態で記録再生をする方
法である。この方法では操作終了時に磁気記憶体の回転
が止まり、この時ヘッドと磁気記憶体面は操作開始時と
同様に接触摩擦状態にある。第二の方法は磁気記憶体に
予め所要の回転を与えておき、急激にヘッドを磁気記憶
体面上に押しつけることにより前記ヘッドと前記記憶体
面との間に空気層分の空間をつくり、この状態で記録再
生する方法である。このように第一の方法では操作開始
時および終了時にヘッドと磁気記憶体面は接触摩擦状態
にあり、第二の方法ではヘッドを磁気記憶体面に押しつ
ける際に接触摩擦状態にある。これらの接触摩擦状態に
おけるヘッドと磁気記憶体の間に生じる摩擦力は、ヘッ
ドおよび磁気記憶体を摩耗させ、ついにはヘッドおよび
金属磁性薄膜媒体に傷を生じせしめることがある。また
前記接触摩擦状態においてヘッドのわずかな姿勢の変化
がヘッドにかかる荷重を不均一にさせヘッドおよび磁気
記憶体表面に傷を作ることもある。また、更に記録再生
中に突発的にヘッドが磁気記憶体に接触し、ヘッドと磁
気記憶体間に大きな摩擦力が働き、ヘッドおよび磁気記
憶体が破壊されることがしぱしば起こる。この様なヘッ
ドと磁気記憶体との接触摩擦接触摩耗および接触破壊か
らヘッドおよび磁気記憶体を保護するために磁気記憶体
の表面に保護被膜を被覆することが必要である。従来か
ら保護被膜として金属メッキ膜(例えばCr、Rh、N
i−P等)を被覆する方法、あるいは金属磁性薄膜媒体
の表面を酸化して酸化物を形成させて保護膜とする方法
などがあるがいずれも上記の接触摩擦現象に対して有力
な手段とはならない。本発明者らは、すでにこれらの欠
点をなくしたポリ硅酸からなる保護被膜を提案している
(特願昭50−81201)。このポリ硅酸からなる保
護被膜はヘツドと磁気記憶体の接触摩擦に十分耐え、ま
たヘツドの突発的な磁気記憶体への接触に十分耐え、さ
らにまた高温高湿状態においても前記金属磁性薄膜を十
分保護し、磁気記憶体を含む下地金属体の磁気特性を損
なわないなど保護被膜としては十分な性能を有している
。ところがヘツドによつてはヘツドと磁気記憶体の間に
ごみを引き込み易く、そのごみが研磨剤の働きをしてヘ
ツドおよび磁気記憶体を摩耗し、その摩耗によつて生じ
た摩耗粉がさらにヘツドおよび磁気記憶体を摩耗させる
ものがある。
The first method is to set the head and the magnetic storage surface in contact at the start of operation, and then apply a required rotation to the magnetic storage to create an air space between the head and the magnetic storage surface. This is a method for recording and playing in this state. In this method, the magnetic storage body stops rotating at the end of the operation, and at this time the head and the magnetic storage body surface are in the same frictional state as at the start of the operation. The second method is to apply a required rotation to the magnetic storage body in advance, and then suddenly press the head onto the magnetic storage body surface to create a space equivalent to an air layer between the head and the storage body surface. This is a method of recording and playing back. As described above, in the first method, the head and the magnetic storage surface are in a frictional contact state at the start and end of the operation, and in the second method, the head and the magnetic storage surface are in a frictional contact state when the head is pressed against the magnetic storage surface. The frictional force generated between the head and the magnetic storage body in these contact friction states causes wear on the head and the magnetic storage body, and may eventually cause scratches on the head and the metal magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head may cause the load applied to the head to become uneven, causing scratches on the surface of the head and the magnetic storage body. Furthermore, during recording and reproducing, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, which often causes the head and the magnetic storage body to be destroyed. In order to protect the head and the magnetic storage body from such contact friction, contact wear and contact breakage between the head and the magnetic storage body, it is necessary to coat the surface of the magnetic storage body with a protective film. Traditionally, metal plating films (e.g. Cr, Rh, N) have been used as protective films.
There are two methods: coating the surface of a metal magnetic thin film medium (i-P, etc.), or oxidizing the surface of a metal magnetic thin film medium to form an oxide to form a protective film. Must not be. The present inventors have already proposed a protective coating made of polysilicic acid that eliminates these drawbacks (Japanese Patent Application No. 81201/1982). This protective film made of polysilicic acid can sufficiently withstand the contact friction between the head and the magnetic memory, and can withstand sudden contact of the head with the magnetic memory, and can also protect the metal magnetic thin film even under high temperature and high humidity conditions. It has sufficient performance as a protective film, providing sufficient protection and not impairing the magnetic properties of the underlying metal body containing the magnetic storage body. However, depending on the head, it is easy to draw dust between the head and the magnetic memory, and this dust acts as an abrasive and wears down the head and the magnetic memory, and the abrasion powder generated by that abrasion can further damage the head. and some that wear out the magnetic memory.

このような現象は前部にテーパのついたヘツドにおいて
著しい。本発明の目的は上述のごみを引き込み易いヘツ
ドによつても十分に金属磁性薄膜媒体を保護する保護被
膜を有する磁気記憶体を提供することにある。
This phenomenon is more pronounced in heads with a tapered front. SUMMARY OF THE INVENTION An object of the present invention is to provide a magnetic storage body having a protective coating that sufficiently protects a metal magnetic thin film medium even from the above-mentioned heads that tend to attract dust.

この発明の磁気記憶体は鏡面研摩された非磁性円盤状基
体上に金属磁性薄膜媒体が被覆されこの金属磁性薄膜媒
体上に非晶質無機酸化物が被覆され、その上に必要なら
ば前処理層が被覆され、さらにその上に、シランカツプ
リング剤を含む、または含まないポリ硅酸被膜が被覆さ
れて構成されている。
In the magnetic storage body of the present invention, a metal magnetic thin film medium is coated on a mirror-polished non-magnetic disc-shaped substrate, an amorphous inorganic oxide is coated on the metal magnetic thin film medium, and if necessary, pretreatment is performed on the metal magnetic thin film medium. A layer is coated, and a polysilicic acid film containing or not containing a silane coupling agent is further coated thereon.

次に図面を参照して本発明を詳細に説明する。Next, the present invention will be explained in detail with reference to the drawings.

第1図、第2図はこの発明の磁気記憶体の実施例を示す
断面図である。第1図において本発明の磁気記憶体7は
合金円盤1とその上に被覆された非磁性合金層2とで構
成される非磁性円盤状再体と、前記非磁性合金層2の研
磨面上に被覆された金属磁性薄膜媒体3と、この金属磁
性薄膜媒体3上の非晶質無機酸化物4とその上に被覆さ
れたシランカツプリング剤を含む、または含まないポリ
硅酸からなる保護被膜5から構成されている。第2図に
おける本発明の磁気記憶体は第1図における非晶質無機
酸化物4と、シランカツプリング剤を含む、または含ま
ないポリ硅酸からなる保護被膜5の間に前処理層6が設
けられて構成されている。合金円盤1は十分小さなうね
りを持つた面に仕上げられていなければならない(円周
方向で50μm以下および半径方向で100μm以下)
FIGS. 1 and 2 are cross-sectional views showing embodiments of the magnetic storage body of the present invention. In FIG. 1, a magnetic storage body 7 of the present invention includes a nonmagnetic disc-shaped re-body composed of an alloy disc 1 and a non-magnetic alloy layer 2 coated thereon, and a polished surface of the non-magnetic alloy layer 2. a protective coating consisting of a metal magnetic thin film medium 3 coated with a metal magnetic thin film medium 3, an amorphous inorganic oxide 4 on the metal magnetic thin film medium 3, and a polysilicic acid coated thereon with or without a silane coupling agent. It consists of 5. The magnetic memory of the present invention shown in FIG. 2 has a pretreatment layer 6 between the amorphous inorganic oxide 4 shown in FIG. It is set up and configured. The alloy disk 1 must be finished with a surface with sufficiently small waviness (50 μm or less in the circumferential direction and 100 μm or less in the radial direction).
.

これはうねりが大きいと記録および再生時に磁気記憶体
上に浮揚しているヘツドが磁気記憶体面の上下の動きに
追従できずにヘツドと磁気記憶体間の距離が変化し、記
録再生が変化するからであるからである。この合金円盤
1の上にめつきにより被覆された非磁性合金層は機械的
研磨により表面粗さ0.04μm以下に鏡面仕上げされ
ている。なお、合金円盤1に鏡面研磨が可能な金属を用
いれば非磁性合金層2は不用となる。非磁性合金層2の
上に高密度記録用の金属磁性薄膜媒体3がめつきにより
被覆されている。この金属磁性薄膜媒体3をヘツドの接
触または湿気や温度による変化から十分に保護する保護
被膜は硬さと、金属磁性薄膜媒体との密着性を保証する
非晶質無機酸化物4と、耐クラツシユ性および潤滑性お
よび耐環境性を保証するシランカツプリング剤を含む、
または含まないポリ硅酸被膜5、また、ある場合には非
晶質無機酸化物と上記ポリ硅酸被膜の間の密着性を保証
する前処理層6から成つている。次に本発明を実施例及
び比較例を挙げて詳細に説明する。
This is because if the waviness is large, the head floating above the magnetic storage body cannot follow the vertical movement of the magnetic storage surface during recording and playback, and the distance between the head and the magnetic storage body changes, causing changes in recording and playback. Because it is from. The nonmagnetic alloy layer coated on the alloy disk 1 by plating is mirror-finished to a surface roughness of 0.04 μm or less by mechanical polishing. Note that if the alloy disk 1 is made of a metal that can be mirror-polished, the non-magnetic alloy layer 2 becomes unnecessary. A metal magnetic thin film medium 3 for high-density recording is coated on the nonmagnetic alloy layer 2 by plating. The protective coating that sufficiently protects the metal magnetic thin film medium 3 from head contact or changes due to humidity and temperature is made of an amorphous inorganic oxide 4 that guarantees hardness and adhesion to the metal magnetic thin film medium, and has crush resistance. and a silane coupling agent to ensure lubricity and environmental resistance.
or a polysilicate film 5 containing no polysilicate, and, in some cases, a pretreatment layer 6 that guarantees adhesion between the amorphous inorganic oxide and the polysilicate film. Next, the present invention will be explained in detail by giving Examples and Comparative Examples.

比較例 合金円盤1として施盤加工および熱矯正によつて十分小
さなうねり(円周方向および半径方向でそれぞれ50μ
mおよび1001tm以下)をもつた面に仕上げられた
デイスク状アルミニウム合金基盤上に非磁性合金層2と
してニツケル一燐(Ni一P)合金を約50Itmの厚
さにめつきし、このニツケル一燐めつき膜を機械的研磨
により表面粗さ0.04μm以下、厚さ約301!,m
まで鏡面仕上げしたのち、その上に金属磁性薄膜媒体3
としてコバルトーニツケル一燐(CO−Ni−P)合金
を約0.05μmの厚さにめつきした。
Comparative Example Alloy Disk 1 had sufficiently small waviness (50μ in each of the circumferential and radial directions) by lathe machining and thermal straightening.
A nickel-phosphorus (Ni-P) alloy is plated to a thickness of about 50 Itm as a non-magnetic alloy layer 2 on a disk-shaped aluminum alloy substrate finished with a surface having a surface area of 100 m and 1001 tm or less. The plating film is mechanically polished to a surface roughness of 0.04μm or less and a thickness of approximately 30mm! ,m
After mirror-finishing the metal magnetic thin film medium 3
Cobalt-nickel-phosphorus (CO--Ni--P) alloy was plated to a thickness of about 0.05 μm.

さらに、このコバルトーニツケル一燐(CO−Ni−P
)合金膜の上に、下に示した組成の溶液を十分に混合し
た後、回転塗布法(回転数200rpりにより500A
の膜厚に塗布したデイスク状円盤を200℃の温度で3
時間電気炉中で焼成したものを磁気デイスクとした。テ
トラヒドキシシラン11% エチルアルコール溶液 10重量%n−ブチルア
ルコール 90重量%実施例 1比較例と同様
な方法でアルミニウム合金盤上にニツケル一燐被膜、そ
の上にコバルトーニツケル一燐被膜が被覆されたデイス
ク状円盤上にホウケイ酸ガラスをスパツタ法により0.
05μmの厚さに設け、その上に下に示した組成の溶液
を十分に混合した後、回転塗布法(回転数200rpり
により0.05μmの膜厚に塗布したデイスク状円盤を
20『Cの温度で3時間電気炉中で焼成したものを磁気
デイスクとした。
Furthermore, this cobalt nickel monophosphorus (CO-Ni-P
) After thoroughly mixing the solution with the composition shown below on the alloy film, apply it by spin coating method (500A at 200rpm).
A disc-shaped disc coated with a film thickness of
A magnetic disk was made by firing in an electric furnace for an hour. Tetrahydroxysilane 11% ethyl alcohol solution 10% by weight n-butyl alcohol 90% by weight Example 1 A nickel-monophosphorus coating was coated on an aluminum alloy disc in the same manner as in Comparative Example, and a cobalt-nickel-monophosphorous coating was coated on top of that. Borosilicate glass was deposited on the prepared disk-shaped disk by a sputtering method.
After thoroughly mixing a solution having the composition shown below on it, a disc-shaped disc coated with a film thickness of 0.05 μm using a spin coating method (rotation speed of 200 rpm) was coated with a film of 20 cm. A magnetic disk was obtained by firing the disk in an electric furnace at a high temperature for 3 hours.

テトラヒドロキシシラン1101) エチルアルコール溶液 10重量% n−ブチルアルコール 90重量%実施例 2
実施例1と同様な方法で、但し、コバルトーニツケル一
燐(CO−Ni−P)合金膜の土に非晶質SiO2をス
パツタ法により0.05μmの厚さに設け、その上に下
に示した組成の溶液を実施例1と同様な方法で塗布、焼
成したものを磁気デイスクとした。
Tetrahydroxysilane 1101) Ethyl alcohol solution 10% by weight n-butyl alcohol 90% by weight Example 2
Using the same method as in Example 1, except that amorphous SiO2 was applied to a thickness of 0.05 μm by sputtering on the soil of the cobalt-nickel-phosphorus (CO-Ni-P) alloy film, and then A magnetic disk was prepared by applying and baking a solution having the composition shown in the same manner as in Example 1.

テトラヒドロキシシラン110/) エチルアルコール溶液 10重量% ポリアミノシラン(シランカツ プリンク剤) 0.03重量%n−ブチル
アルコール 残 部実施例 3実施例1と
同様な方法で、但しコバルトーニツケル一燐(CO−N
i−P)合金膜の上にホウケイ酸ガラスをスパツタ法に
より0.05μmの厚さに設け、その上に前処理液とし
てガンマアミノプロピルトリエトキシシランの0.1f
)n−ブチルアルコール溶液を回転塗布してそのまま1
0分間回転を続けて溶媒を蒸発させ、乾燥させてガンマ
アミノフ治ピルトリエトキシシランからなる非常に薄い
前処理層を形成させる。
Tetrahydroxysilane 110/) Ethyl alcohol solution 10% by weight Polyaminosilane (silane coupling agent) 0.03% by weight n-butyl alcohol Balance Example 3 In the same manner as in Example 1, except that cobalt nickel monophosphorus ( CO-N
i-P) Borosilicate glass is provided on the alloy film to a thickness of 0.05 μm by sputtering, and 0.1f of gamma-aminopropyltriethoxysilane is applied as a pretreatment liquid on top of it.
) Spin coat the n-butyl alcohol solution and apply it as it is 1
Continue spinning for 0 minutes to evaporate the solvent and dry to form a very thin pretreatment layer of gamma-aminophyltriethoxysilane.

その後このガンマアミノプロピルトリエトキシシランの
前処理層の上に実施例2と同様な組成の溶液を塗布、焼
成したものを磁気デイスクとした。
Thereafter, a solution having the same composition as in Example 2 was coated on the gamma-aminopropyltriethoxysilane pretreatment layer and baked to obtain a magnetic disk.

比較例および実施例1〜3に示した各磁気デイスクを用
いてヘツドと磁気デイスク面とが操作開始時および操作
終了時に常に接触状態にある記録再生方法において、こ
の操作開始と操作終了の繰り返し操作試験を、前部にテ
ーパのついたゴミを引込み易いヘツドを用いて25,0
00回繰り返しを行なつたところ比較例の磁気デイスク
ではヘツドの摩擦跡の約35%が剥離したが、実施例1
〜3の各磁気デイスクでは剥離は皆無であつた。また実
施例2の磁気デイスクについては30,000回の繰り
返しにおいても剥離は皆無であり、実施例3の磁気デイ
スクでは40,000回の繰り返しにおいても剥離は皆
無であつた。以上比較例および実施例1〜3で示された
様に、金属磁性薄膜媒体上に非晶質無機酸化物を被覆し
た上にポリ硅酸からなる保護膜を有する磁気デイスクは
非晶質無機酸化物を被覆しないポリ硅酸単体の保護膜を
有する磁気デイスクに比べて、ヘツドに対する耐摩耗性
が向上していることが分る。また非晶質無機酸化物の上
にシランカツプリング剤を含むポリ硅酸からなる保護膜
を有する磁気デイスクは耐摩耗性がさらに向土している
ことが分る。また、さらに非晶質無機酸化物上に前処理
層が被覆され、その上にシランカツプリング剤を含むポ
リ硅酸からなる保護膜を有する磁気デイスクはさらに耐
摩耗性が向上していることが分る。なお、本発明による
非晶質無機酸化物の上にシランカツプリング剤を含む、
または含まないポリ硅酸からなる保護被膜または非晶質
無機酸化物の上に前処理層を被覆した上にシランカツプ
リング剤を含む、または含まないポリ硅酸からなる保護
被膜はポリ硅酸だけからなる保護被膜に比べ耐摩耗性が
向上したが、その他の性能すなわち、耐ヘツドクラツシ
ユ性、潤滑性、耐環境性、下地金属体の磁気特性などは
全く変らなかつた。
In the recording and reproducing method using each of the magnetic disks shown in Comparative Example and Examples 1 to 3, in which the head and the magnetic disk surface are always in a state of contact at the start and end of the operation, this operation start and end are repeated. The test was carried out using a tapered front head that easily pulled in dirt.
After 00 repetitions, about 35% of the friction marks on the head of the magnetic disk of the comparative example were peeled off, but in Example 1
There was no peeling in each of the magnetic disks No. 3 to 3. Furthermore, the magnetic disk of Example 2 showed no peeling even after 30,000 repetitions, and the magnetic disk of Example 3 showed no peeling even after 40,000 repetitions. As shown in Comparative Examples and Examples 1 to 3 above, a magnetic disk having a protective film made of polysilicic acid on which an amorphous inorganic oxide is coated on a metal magnetic thin film medium is made of an amorphous inorganic oxide. It can be seen that the wear resistance of the head is improved compared to a magnetic disk having a protective film of polysilicate alone that does not cover any material. It can also be seen that a magnetic disk having a protective film made of polysilicic acid containing a silane coupling agent on an amorphous inorganic oxide has even better wear resistance. Additionally, magnetic disks that have a pretreatment layer coated on an amorphous inorganic oxide and a protective film made of polysilicic acid containing a silane coupling agent have further improved wear resistance. I understand. Note that a silane coupling agent is included on the amorphous inorganic oxide according to the present invention.
Or a protective coating made of polysilicic acid that does not contain it, or a protective coating made of polysilicic acid that contains or does not contain a silane coupling agent on top of a pretreatment layer coated on an amorphous inorganic oxide, is only polysilicic acid. Although the abrasion resistance was improved compared to the protective coating made of the above, other properties such as head crushing resistance, lubricity, environmental resistance, and magnetic properties of the underlying metal body remained unchanged.

また、本発明の比較例、実施例において非磁性円盤状基
体として金属を用いたが、例えばプラスチツクなども使
用可能であり、基体の種類を問わないことは明らかであ
る。
Further, in the comparative examples and examples of the present invention, metal was used as the non-magnetic disc-shaped substrate, but it is clear that plastic or the like can also be used, and the type of the substrate is not limited.

なお、本発明において前処理剤およびポリ硅酸中の添加
剤にシランカツプリング剤を用いたが、非晶質無機酸化
物とポリ硅酸との密着性を増強させ、あるいはポリ硅酸
中の応力を緩和する様な物質、例えばクロム系シランカ
ツプリング剤(ウエルナ一型クロム錯体)も用いられる
ことは明らかである。
In addition, in the present invention, a silane coupling agent was used as a pretreatment agent and an additive in polysilicic acid, but it may enhance the adhesion between the amorphous inorganic oxide and polysilicic acid, or Obviously, stress-relieving substances such as chromium-based silane coupling agents (Werna type 1 chromium complexes) may also be used.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明の磁気記憶体の実施例を示す
断面図である。 図において、1は合金円盤、2は鏡面仕上げされた非磁
性合金層、3は金属磁性薄膜媒体、4は非晶質無機酸化
物層、5はシランカツプリング剤を含む、または含まな
いポリ硅酸被膜、6は前処理層である。
FIGS. 1 and 2 are cross-sectional views showing embodiments of the magnetic storage body of the present invention. In the figure, 1 is an alloy disk, 2 is a mirror-finished nonmagnetic alloy layer, 3 is a metal magnetic thin film medium, 4 is an amorphous inorganic oxide layer, and 5 is a polysilicon with or without a silane coupling agent. Acid film 6 is a pretreatment layer.

Claims (1)

【特許請求の範囲】 1 鏡面研磨された非磁性円盤状基体上に金属磁性薄膜
媒体が被覆され、この金属磁性薄膜媒体上に非晶質無機
酸化物が被覆され、更にその上にポリ硅酸被膜もしくは
シランカップリング剤を含むポリ硅酸被膜が被覆された
ことを特徴とする磁気記憶体。 2 ポリ硅酸被膜もしくはシランカップリング剤を含む
ポリ硅酸被膜は前処理層を介して非晶質無機酸化物上に
被覆されている特許請求の範囲第1項記載の磁気記憶体
。 3 非晶質無機酸化物が非晶質アルミナ、石英ガラン硅
酸塩ガラスまたは硼硅酸ガラスである特許請求の範囲第
2項記載の磁気記憶体。 4 前処理層がシランカップリング剤層である特許請求
の範囲第2項記載の磁気記憶体。
[Claims] 1. A metal magnetic thin film medium is coated on a mirror-polished nonmagnetic disk-shaped substrate, an amorphous inorganic oxide is coated on the metal magnetic thin film medium, and polysilicate is further applied on top of the metal magnetic thin film medium. A magnetic memory body characterized by being coated with a film or a polysilicate film containing a silane coupling agent. 2. The magnetic memory according to claim 1, wherein the polysilicic acid coating or the polysilicic acid coating containing a silane coupling agent is coated on the amorphous inorganic oxide via a pretreatment layer. 3. The magnetic memory according to claim 2, wherein the amorphous inorganic oxide is amorphous alumina, quartz galane silicate glass, or borosilicate glass. 4. The magnetic memory according to claim 2, wherein the pretreatment layer is a silane coupling agent layer.
JP2124877A 1977-02-28 1977-02-28 magnetic memory Expired JPS5939809B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2124877A JPS5939809B2 (en) 1977-02-28 1977-02-28 magnetic memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2124877A JPS5939809B2 (en) 1977-02-28 1977-02-28 magnetic memory

Publications (2)

Publication Number Publication Date
JPS53106101A JPS53106101A (en) 1978-09-14
JPS5939809B2 true JPS5939809B2 (en) 1984-09-26

Family

ID=12049749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2124877A Expired JPS5939809B2 (en) 1977-02-28 1977-02-28 magnetic memory

Country Status (1)

Country Link
JP (1) JPS5939809B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56124118A (en) * 1980-03-06 1981-09-29 Nec Corp Magnetic recording material
JPS5862823A (en) * 1981-10-08 1983-04-14 Nec Corp Vertical magnetic storage body
JPS61117728A (en) * 1984-11-13 1986-06-05 Anelva Corp Magnetic recording medium
JPH0679377B2 (en) * 1985-02-22 1994-10-05 日本電気株式会社 Magnetic recording medium and manufacturing method thereof

Also Published As

Publication number Publication date
JPS53106101A (en) 1978-09-14

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