JPS5941845B2 - How to carve a pattern - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of carving a pattern by eroding the surface of a base material according to the pattern by sandblasting.

The surface of a molded product (hereinafter referred to as the base material) made of metals such as arsinium, zinc, and iron, synthetic resins such as polymethyl methacrylate, polystyrene, polyvinyl chloride, urea-formalin resin, and phenol resin, glass, stone, wood, etc. Erosion and engraving of patterns is often carried out when these base materials are used for decorative purposes.

As a method, the present inventors have already placed a photocurable resin on a base material, irradiated active light through the pattern, and then
We proposed a method in which the uncured resin is removed, and then the surface of the substrate is eroded by sandblasting to create a pattern on the substrate. This method is extremely superior in terms of work efficiency and work environment compared to conventional methods such as hand engraving, chemical etching, and sandblasting by pasting cut-out molds. This method is suitable for patterning a wide range of base materials as mentioned above, but when carving deep patterns on the base material, the photocurable resin must be resistant to erosion by sandblasting or relatively long. Must be able to withstand time sandblasting.

That is, when a normal photocurable resin is used, the resin is eroded by sandblasting, so it is necessary to increase the thickness of the resin layer depending on the depth of engraving. In this case, when the thickness of the resin layer becomes thicker than 5 mm, the time required for photocuring the resin layer becomes longer, and the light rays are incident obliquely from the light source, so the pattern becomes thicker. The inventors of the present invention have worked hard to find a way to solve this problem and to carve deep patterns on the base material by using a resin that is not easily eroded by sandblasting. It was found that it is better to use a photocrosslinkable resin that has an elongation of 100% or more and a tensile stress of 1 to 500: 9/1 when irradiated with elongates by 100% or more when irradiated with active light, and the tensile stress at 100% elongation is 1.
A photocrosslinkable resin composition that becomes an elastic body of ~500 to 9/1 is placed on a base material, and after irradiating active light through the pattern, the non-crosslinked resin is removed, and then the base material surface is sandblasted. This is a method of carving patterns into the base material by eroding it. The photocrosslinkable resin composition used in the present invention has an elongation of 100% or more upon irradiation with light, and a tensile stress of 1 at 100% elongation.
It becomes an elastic body of ~500k9/CIi.

Of these, the tensile stress at 100% elongation is 50 to 400k.
9/Cd is particularly preferable (elongation 1
The tensile stress at 00% is the load at 100% elongation divided by the cross-sectional area at 0% elongation. ). Such a resin composition is, for example, a resin composition whose main components are unvulcanized rubber, a photopolymerizable monomer, and a photosensitizer, and when irradiated with light, it has elasticity with the above-mentioned tensile modulus and elongation. I can give you something that will become your body.

Also, resin compositions used for rubber plates for photosensitive flexographic printing plates that become elastic bodies having the above-mentioned tensile modulus and elongation when irradiated with light can also be used. Examples of the unvulcanized rubber used as a component of the photocrosslinkable resin composition include polychloroprene, a copolymer of chloroprene and other vinyl monomers, and an acrylic ester and a chlorine- or bromine-containing vinyl monomer. A copolymer of 2-hydroxyethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-
Ethoxyethyl (meth)acrylate, Ethylene glycol di(meth)acrylate, Diethylene glycol di(meth)acrylate, Triethylene glycol di(meth)acrylate, Bisphenol A diglycidyl ether di(meth)acrylate, Resorcin diglycidyl ether di(meth)acrylate ) Acrylic esters or methacrylic esters such as acrylates are used as sensitizers such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether,
Benzoins such as benzoin butyl ether and benzoisoisobutyl ether, benzophenones such as benzophenone, 4-methylbenzophenone, and 4,4'-dimethylbenzophenone, and the like are used. The proportion of photopolymerizable monomer is
The total amount of unvulcanized rubber and photopolymerizable monomer is 100 parts by weight, and the ratio of the photosensitizer is 0.5 to 50 parts by weight.
It is used in a range of 5 to 5 parts by weight. In addition, thermal polymerization inhibitors, fillers, etc. are added as necessary. As a thermal polymerization inhibitor,
2,6-di-t-butyl p-cresol, hydroquinone, hydroquinone monomethyl ether, etc. from 0.05 to
Use 0.5 parts by weight. In the present invention, a method for carving a pattern on a base material is performed, for example, as follows. First, a photosensitive resin layer with a thickness of 0.1 to 5 mm is placed on a base material, depending on the depth of the pattern to be carved.

The method is to use a solid material with a thickness of 0.1 to 5 mm in advance.
This is done by creating a sheet and attaching it to the base material. In this case, use adhesive if necessary. If the resin is liquid, the thickness may vary depending on the depth of engraving on the base material, for example.
．． This can be done by placing a 1-5mm spacer, pouring the resin, covering it with a 10-20μ transparent film (polyester, polypropylene, cellophane, etc.), and pressing a roller, etc. against the spacer while moving. . Next, a photomask of a predetermined pattern is placed on top of this resin layer and brought into close contact (in the case of a liquid, through a transparent film of 10 to 20 μm), and actinic rays are irradiated. As the active light source, a high-pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, sunlight, etc. are used. The irradiation conditions are such that the elongation is 100% or more due to photocrosslinking, and the tensile stress at 100% elongation is 1 to 500 k9/C7l, preferably 50 to 400.
kg/~. Once the irradiation is complete, the areas through which light does not pass (uncrosslinked areas) are removed. This can be done by using a solvent for solid products, and by wiping with a solvent, paper, cloth, etc. for liquid products. The resin of the present invention is thus patterned on the substrate and eroded by sandblasting.

The blasting conditions in this case vary depending on the resin layer thickness, but 30 to 500 meshes of alundum, carborundum, etc. are sprayed with air at a pressure of 1 to 8 kg from a distance of 1 to 50 CTrL. It is done by folding. After blasting, a patterned substrate is obtained by peeling off the resin layer. When the force method of the present invention is used, since the resin becomes an elastic body through photo-crosslinking, it is less likely to be eroded or abraded by sandblasting and can withstand sandblasting for a relatively long period of time.

As a result, it has become possible to engrave clear and deep patterns on the base material. The method of the present invention can be widely used to carve patterns on various base materials by taking advantage of these points.

Next, a concrete explanation will be given using examples. Example 1 and Comparative Example 1 A 1 mm thick layer of the composition shown in the following table was placed on a 50 mm stone slab, and after being irradiated with ultraviolet fluorescent lamps (20 W x 10) for 10 minutes, a penetration test was conducted by sandblasting. and obtained the following results.

Example 2 The resin composition A of Example 1 was press-molded to a thickness of 1.0
A sheet of mm was obtained.

This was pasted onto a stone plate with a thickness of 50 mm. Layer a photomask on top of this, and then apply an ultraviolet fluorescent lamp (20W x
10 tubes) were irradiated for 10 minutes. Thereafter, the portions that were not irradiated with ultraviolet rays were washed out using trichlene, and a resin layer having a pattern corresponding to the pattern of the photomask was obtained. Add 30 mesh of carborundum to these at 6k9/
C! It was sandblasted by blowing with air at a pressure of i. After blasting, the resin layer was peeled off to obtain a stone plate carved with a pattern corresponding to the design. Example 3 The resin composition A of Example 1 was press-molded to obtain a sheet with a thickness of 0.7 mm.

Claims (1)

[Claims] 1. Elongation of 100% or more by irradiation with actinic light, elongation of 10
A photocrosslinkable resin composition that becomes an elastic body with a tensile stress of 1 to 500 kg/cm^2 at 0% is placed on a base material, and after irradiating active light through the pattern, the non-crosslinked resin is removed, Then, the surface of the base material is eroded by sandblasting to carve a pattern on the base material. 2. The photocrosslinkable resin composition contains an unvulcanized rubber, a photopolymerizable monomer, and a photosensitizer, and has an elongation of 100% or more upon irradiation with actinic light, and a tensile stress of 1 to 500 kg/1 at the time of 100% elongation.
2. The method according to claim 1, wherein the elastic body has a diameter of cm^2.