Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5950466B2 - Improved patterning method - Google Patents
[go: Go Back, main page]

JPS5950466B2 - Improved patterning method - Google Patents

Improved patterning method

Info

Publication number
JPS5950466B2
JPS5950466B2 JP14591876A JP14591876A JPS5950466B2 JP S5950466 B2 JPS5950466 B2 JP S5950466B2 JP 14591876 A JP14591876 A JP 14591876A JP 14591876 A JP14591876 A JP 14591876A JP S5950466 B2 JPS5950466 B2 JP S5950466B2
Authority
JP
Japan
Prior art keywords
base material
pattern
resin
sandblasting
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14591876A
Other languages
Japanese (ja)
Other versions
JPS5369260A (en
Inventor
武蔵 左納
晴夫 井上
秋弘 古田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP14591876A priority Critical patent/JPS5950466B2/en
Publication of JPS5369260A publication Critical patent/JPS5369260A/en
Publication of JPS5950466B2 publication Critical patent/JPS5950466B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Printing Methods (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Description

【発明の詳細な説明】 本発明は、サンドブラストによつて図柄に応じて基材表
面を浸蝕して基材に模様をつける方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of imparting a pattern to a substrate by eroding the surface of the substrate according to the pattern by sandblasting.

アルミニウム、亜鉛、鉄等の金属、ポリメチルメタクリ
レート、ポリスチレン、ポリ塩化ビニル、尿素一ホルマ
リン樹脂、フェノール樹脂等の合成樹脂、ガラス、石、
木材等で成る成形物(以下基材と称する)の表面を浸蝕
して模様をつけることは、これら基材を装飾用途に用い
る場合に度々行なわれているところである。
Metals such as aluminum, zinc, iron, etc., synthetic resins such as polymethyl methacrylate, polystyrene, polyvinyl chloride, urea-formalin resin, phenolic resin, glass, stone,
The surface of molded articles (hereinafter referred to as base materials) made of wood or the like is often etched to create patterns when these base materials are used for decorative purposes.

その方法としてすでに本発明者らは、基材上に光硬化性
樹脂を配置せしめ、図柄を通して活性光を照射した後、
非硬化部樹脂を除去し、次いでサンドブラストによつて
基材表面を浸蝕して基材に模様をつける方法を提案した
As a method for this, the present inventors have already placed a photocurable resin on a base material, irradiated active light through the pattern, and then
We proposed a method in which the uncured resin is removed, and then the surface of the substrate is eroded by sandblasting to create a pattern on the substrate.

この方法は従来の手彫り、薬品によるエッチング、切り
抜き型を貼りつけてサンドブラストする方法等に比べ、
作業能率、作業環境等の点で非常に優れているものであ
る。本発明者らは、この方法のさらに改良を目指し鋭意
検討した結果、さらに作業能率を向上し、コスト軽減で
きる方法を見い出し本発明に到つた。
This method is more effective than traditional methods such as hand engraving, chemical etching, and pasting cutouts and sandblasting.
It is extremely superior in terms of work efficiency, work environment, etc. As a result of intensive studies aimed at further improving this method, the present inventors have discovered a method that can further improve work efficiency and reduce costs, resulting in the present invention.

すなわち本発明は、基材上に固体状光架橋性樹脂組成物
を配置せしめ、図柄を通して活性光を照射した後、サン
ドブラストによつて非架橋部樹脂の除去およびその部分
の基材の浸蝕を行なつて基材に模様をつける方法である
。本発明に用いる固体状光架橋性樹脂としては、活性光
によつて架橋した部分が非架橋部に比ベサンドブラスト
に対しより浸蝕されにくいものでなければならない。
That is, in the present invention, a solid photocrosslinkable resin composition is placed on a base material, active light is irradiated through the pattern, and then the non-crosslinked resin is removed by sandblasting and the base material in that area is eroded. This is a method of creating a pattern on the base material. The solid photocrosslinkable resin used in the present invention must be such that the portion crosslinked by active light is more resistant to corrosion by sand blasting than the non-crosslinked portion.

すなわち、架橋部はサンドブラストにより非架橋部が除
去され、ついでその部分の基材が浸蝕される間サンドブ
ラストに耐えることが必要である。このような樹脂とし
ては、例えば未加硫ゴム、光重合性単量体、光増感剤を
含み、活性光線の照射によつてゴム状弾性体となるもの
、フレキソ版やゴム版用として市販されている光架橋性
樹脂等をあげることができる。本発明において基材に模
様をつける手順を次に記す。
That is, the crosslinked portion must be able to withstand sandblasting while the non-crosslinked portion is removed by sandblasting and the substrate in that area is then eroded. Such resins include, for example, those containing unvulcanized rubber, photopolymerizable monomers, and photosensitizers, which become rubber-like elastic bodies when irradiated with actinic rays, and those commercially available for use in flexo plates and rubber plates. Examples include photocrosslinkable resins. The procedure for applying a pattern to a base material in the present invention will be described below.

まず基材上に浸蝕したい深さに応じて0.1〜5用型の
光架橋性樹脂層を配する。その方法は、あらかじめ0.
1〜5型用の光架橋性樹脂シートを作製し、これを基材
に貼りつけることによつて行う。この場合必要ならば接
着剤を用いる。ついで、この樹脂層の上に所定の図柄の
ホトマスクを重ねて密着させ、活性光線を照射する。活
性光線源としては、高圧水銀灯、紫外線螢光灯、カーボ
ンアーク灯、太陽光線などを用いる。かくして基材上に
架橋部と非架橋部(画線部)を有する樹脂層が配せられ
る。ついで、このものを画線部に沿つてサンドブラスト
して非架橋部樹脂の除去およびその部分の基材の浸蝕を
行う。
First, a 0.1 to 5 type photocrosslinkable resin layer is placed on the substrate depending on the desired depth of corrosion. The method is as follows: 0.
This is carried out by producing a photocrosslinkable resin sheet for types 1 to 5 and attaching it to a base material. In this case, use adhesive if necessary. Next, a photomask with a predetermined pattern is placed on top of this resin layer and brought into close contact with the resin layer, and actinic light is irradiated thereon. As the active light source, a high-pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, sunlight, etc. are used. In this way, a resin layer having crosslinked portions and non-crosslinked portions (printed portions) is disposed on the base material. Next, this product is sandblasted along the image area to remove the resin in the non-crosslinked area and erode the base material in that area.

サンドブラスト条件は、基材の種類、浸蝕の深さ、樹脂
層の厚さによつて変つてくるが、30〜500メツシユ
のアランダムやカーボランダムを1〜50cmの距離か
ら1〜 8kg/Cm2の加圧空気と共に吹きつけるこ
とによつて行なわれる。か<して模様の入つた基材が得
られる。
Sandblasting conditions vary depending on the type of substrate, the depth of erosion, and the thickness of the resin layer, but 30 to 500 meshes of alundum or carborundum are sandblasted at 1 to 8 kg/cm2 from a distance of 1 to 50 cm. This is done by blowing with pressurized air. In this way, a patterned base material is obtained.

樹脂層は必要に応じて剥離する。本発明の特長は非架橋
部樹脂の除去をサンドブラストにより行いその部分の基
材の浸蝕と兼ねて行う点にある。
The resin layer is peeled off as necessary. The feature of the present invention is that the non-crosslinked resin is removed by sandblasting, which also serves as erosion of the base material in that area.

従つて、設備、工程の大幅な簡略化および模様づけに要
する時間の短縮が可能である。本発明の方法は、これら
の点を生かして各種基.材の模様づけに広く用いること
ができる。
Therefore, it is possible to significantly simplify the equipment and process and shorten the time required for patterning. The method of the present invention takes advantage of these points and can be applied to various bases. It can be widely used for patterning wood.

次に実施例をあげて、本発明を具体的に説明するが、実
施例によつて本発明が限定されるものではない。
Next, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to the Examples.

実施例 ポリクロロプレン(昭和ネオプレン社製、昭和ネオプレ
ンW)60部、トリエチレングリコールジメタクリレー
ト40部、シリカ粉末印本アエロジル社製、アエロジル
8300)8部、ベンゾインイソブチルエーテル1部、
2・6−ジ一t−ブチル−p=クレゾール0.1部をロ
ール練りにより配合し、これをプレスして厚さ0.7m
mのシートを得た。
Examples 60 parts of polychloroprene (manufactured by Showa Neoprene Co., Ltd., Showa Neoprene W), 40 parts of triethylene glycol dimethacrylate, 8 parts of Silica Powder Printing Co., Ltd., Aerosil 8300), 1 part of benzoin isobutyl ether,
0.1 part of 2,6-di-t-butyl-p=cresol was blended by roll kneading, and this was pressed to a thickness of 0.7 m.
m sheets were obtained.

Claims (1)

【特許請求の範囲】[Claims] 1 基材上に未加硫ゴム、光重合性単量体および光増感
剤を含む固体状光架橋性樹脂組成物を配置せしめ、図柄
を通して活性光を照射した後、サンドブラストによつて
非架橋部樹脂の除去およびその部分の基材の浸蝕を行な
つて基材に模様をつける方法。
1 A solid photocrosslinkable resin composition containing an unvulcanized rubber, a photopolymerizable monomer, and a photosensitizer is placed on a base material, and after irradiating active light through the pattern, non-crosslinking is performed by sandblasting. A method of creating a pattern on a base material by removing resin and eroding the base material in that area.
JP14591876A 1976-12-03 1976-12-03 Improved patterning method Expired JPS5950466B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14591876A JPS5950466B2 (en) 1976-12-03 1976-12-03 Improved patterning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14591876A JPS5950466B2 (en) 1976-12-03 1976-12-03 Improved patterning method

Publications (2)

Publication Number Publication Date
JPS5369260A JPS5369260A (en) 1978-06-20
JPS5950466B2 true JPS5950466B2 (en) 1984-12-08

Family

ID=15396077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14591876A Expired JPS5950466B2 (en) 1976-12-03 1976-12-03 Improved patterning method

Country Status (1)

Country Link
JP (1) JPS5950466B2 (en)

Also Published As

Publication number Publication date
JPS5369260A (en) 1978-06-20

Similar Documents

Publication Publication Date Title
TWI445470B (en) Method of improving print performance in flexographic printing plates
JPS597948A (en) Formation of image
US4430416A (en) Transfer element for sandblast carving
US5427890B1 (en) Photo-sensitive laminate film for use in making the mask comprising a supporting sheet an image mask protection layer which is water insoluble and a water soluble mask forming composition
WO1999003684A8 (en) The production of microstructures for use in assays
EP0130559B1 (en) A method of producing a pattern-engraved article by sandblasting
CA1260266A (en) Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method
JPH04202677A (en) Formation of resist pattern
JPS5950466B2 (en) Improved patterning method
JPS6446702A (en) Production of antidazzle filter
JPS5937240B2 (en) How to carve a pattern
JPS6049437B2 (en) How to create designs by etching
KR940007799B1 (en) Transfer convex plate and transfer method by the transfer convex plate
JPH0420179B2 (en)
JPS5596270A (en) Engraving method using sand blast
JPH0158201B2 (en)
JPS6020862A (en) Step-carving method by sand blast
JPH11311864A (en) Dry process method for developing and stripping photoriesist
KR100407292B1 (en) Surface treatment method of object
JPS5866663A (en) Sandblast stepwise-engraving processing method
CN104093750A (en) Laser engraveable compositions for relief image printing elements
JP3239192B2 (en) Manufacturing method of special shape emboss
JPH05337830A (en) Liquid for forming protecting mask and carving method
JPS63182889A (en) Manufacture of printed wiring
JP3148312B2 (en) Masking sheet for sandblasting and method for producing the same