JPS5937240B2 - How to carve a pattern - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of carving a pattern by eroding the surface of a base material according to the pattern by sandblasting.

It corrodes the surface of molded products (hereinafter referred to as base materials) made of metals such as aluminum, zinc, and iron, synthetic resins such as polymethyl methacrylate, polystyrene, polyvinyl chloride, urea-formalin resin, glass, stone, wood, etc. Carving patterns is often performed when these base materials are used for decorative purposes.

As a method, the present inventors have already installed a photocurable resin on a base material, irradiated active light through the pattern, and then
We proposed a method to remove the uncured resin and then erode the surface of the base material by sandblasting to create a pattern on the base material, but this method is different from conventional hand engraving, chemical etching,
Compared to methods such as attaching cut-out molds and sandblasting, this method is extremely superior in terms of work efficiency and work environment.

This method is suitable for carving patterns on a wide range of base materials as mentioned above, but when carving deep patterns on base materials, the photocurable resin must be resistant to erosion by sandblasting or relatively long. It must be able to withstand time sandblasting.

That is, when a normal photocurable resin is used, the resin is eroded by sandblasting, so it is necessary to increase the thickness of the resin layer depending on the depth of engraving.

In this case, if the thickness of the resin layer becomes thicker than 5 mm, the time required for photo-curing the resin layer becomes longer, and the light rays are incident obliquely from the light source, so the pattern becomes thicker. This is going to become a problem.

The present inventors have solved these problems and have conducted extensive studies on a method that can carve deep patterns on a base material by using a resin that is not easily eroded by sandblasting, and as a result, has arrived at the present invention.

That is, the present invention improves the tensile modulus from 1 to 1 by irradiation with actinic light.
A photocrosslinkable resin composition that becomes an elastic body of 100 kg/cr/l is placed on a base material, and after irradiating active light through the pattern, the non-crosslinked resin is removed, and then the surface of the base material is eroded by sandblasting. This is a method of carving a pattern on the base material.

The photocrosslinkable resin composition used in the present invention becomes an elastic body with a tensile modulus of 1 to 100 kg/('77!) upon irradiation with light.

If the elastic modulus becomes larger than 100 kg/m, erosion due to sandblasting becomes large, which is not preferable.

Examples of such resin compositions include those consisting of polychloroprene/photopolymerizable monomer/photosensitizer, acrylic acid ester-chlorine-containing vinyl monomer copolymer/photopolymerizable monomer/photosensitizer, etc. Those consisting of a sensitizer, liquid double-terminated vinyl polybutadiene or butadiene-acrylonitrile copolymer/photopolymerizable monomer/photosensitizer, liquid double-terminated vinyl polyester/photopolymerizable monomer/ Solid or liquid resin compositions consisting of unvulcanized rubber, photopolymerizable monomers, and photosensitizers, which become elastic when irradiated with light.

In addition, resin compositions used for photosensitive flexographic printing plates can also be used.

Examples of the photopolymerizable monomer used as a component of the photocrosslinkable resin composition include 2-hydroxyethyl (meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and triethylene glycol di(meth)acrylate. (meth)acrylate, bisphenol A diglycidyl ether di(meth)acrylate, resorcin diglycidyl ether di(meth)acrylate, etc., and the sensitizers include pentwin methyl ether, benzoin ethyl ether, pentwin isopropyl ether, pentwin butyl ether. , benzoin isobutyl ether, benzophenone, etc.

The proportion of the photopolymerizable monomer is 5 to 40 parts by weight based on 100 parts by weight of the total of the unvulcanized rubber and the photopolymerizable monomer, and the proportion of the photosensitizer is 0.5 to 5 parts by weight. Use within the range of parts by weight.

In addition, 0.05 to 0.5 parts by weight of a thermal polymerization inhibitor is added if necessary.

As a thermal polymerization inhibitor, 2.・6-di-t-butyl-p
-Cresol, hydroquinone, hydroquinone 7-methyl ether, etc. are used.

In the present invention, a method for carving a pattern on a base material is performed, for example, as follows.

First, 0.1 to 5 mtr depending on the depth of the pattern carved on the base material.
A photosensitive resin layer of t is arranged.

The method is to prepare a sheet of 0.1 to 5 mm in solid form and stick it to the base material using adhesive, or to place adhesive on the back of the sheet in advance and use this as a base material. This is done by pasting it on the material.

If the resin is liquid, for example, a spacer with a thickness of 0.1 to 5 mm is placed on the base material depending on the depth of engraving, the resin is poured, and a transparent film of 10 to 20 μm (polyester, polypropylene, cellophane) is placed on top of the spacer. etc.), and move a roller or the like from above while pressing it against the spacer.

Next, a photomask with a predetermined pattern is placed on top of this resin layer and brought into close contact with the resin layer (in the case of a liquid, through a transparent film of 10 to 20 μm), and actinic rays are irradiated.

As the active light source, a high-pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, sunlight, etc. are used.

Once the irradiation is complete, the areas through which the light did not pass (uncrosslinked areas) are removed.

This can be done by using a solvent for solid products, and by wiping with a solvent, paper, cloth, etc. for liquid products.

Thus, the pattern on the base material made of the resin of the present invention is eroded by sandblasting.

The blasting conditions in this case vary depending on the resin layer thickness, but 30 to 500 meshes of alundum, carborundum, etc. are
This is done by blowing with air at a pressure of l.

After blasting, a patterned base material is obtained by peeling off the resin layer.

When the method of the present invention is used, since the resin becomes an elastic body through photo-crosslinking, it is less likely to be eroded or abraded by sandblasting (it can withstand sandblasting for a longer period of time than resins with high elastic modulus).

As a result, it has become possible to engrave clear and deep patterns on the base material.

The method of the present invention can be widely used to carve patterns on various base materials by taking advantage of these points.

Next, a concrete explanation will be given using examples.

Example 1 and Comparative Example 1 A 1 mm thick layer of the composition shown in the following table was placed on a 50 ii thick stone plate, and a penetration test was conducted by sandblasting, and the following results were obtained.

Example 2 90 parts of polychloroprene, 10 parts of triethylene glycol dimethacrylate, 1 part of benzophenone, and 0.1 part of 2,6-di-t-butyl-p-cresol were blended by roll kneading, and this was pressed to give a thickness. A 1.5 mm sheet was obtained.

This was pasted onto a 50mm thick stone plate using adhesive.

A photomask is placed on top of this, and an ultraviolet fluorescent lamp (
20W x 10 lines) was irradiated for 10 minutes.

Thereafter, the portions that had not been irradiated with ultraviolet rays were washed out using xylene, and a resin layer having a pattern corresponding to the pattern on the photomask was obtained.

Using 30 mesh carborundum, 6 kg/
Sandblasted at a pressure of cr/l.

After blasting, the resin layer was peeled off to obtain a board with a pattern corresponding to the design.

The depth of the pattern was 1 cnL with a line width of 2 cIIL.

Further, during the blasting, there was no damage due to erosion or abrasion of the resin layer.

The physical properties of the photocrosslinked resin layer used in this example were a tensile modulus of 14 kg/cr/l and an elongation at break of 720.

Example 3 Hycar VTBN (manufactured by Ube Industries, liquid NBR) 7
0 parts of 2-hydroxyethyl acrylate, 1 part of benzoin isopropyl ether, and 0.1 part of 2,6-di-t-butyl-p-cresol were mixed to obtain a liquid resin composition.

A 1 mm spacer is placed on both ends of a 5 mm thick aluminum alloy plate, and resin is cast onto this to form a 12μ
A 1 mm thick resin layer was obtained by covering the resin with a polyester film and moving a roller while pressing the spacer onto the film.

Place a photomask on top of this and use an ultraviolet fluorescent lamp (20W).
x10) was irradiated for 10 minutes.

Thereafter, the portions that were not exposed to ultraviolet rays were removed by wiping with paper.

Using 50 mesh alundum, 3kg/cr
Sandblasted at a pressure of /l.

After blasting, when the resin layer was peeled off, an aluminum alloy plate with a pattern corresponding to the design was obtained.

The depth of the pattern was 0°17 ILm as a line with a width of IC1rL.

Further, during blasting, there was no damage due to erosive wear of the resin layer.

The physical properties of the photocrosslinked resin layer used in this example were a tensile modulus of 27 kg/crL and an elongation at break of 63.

Claims (1)

[Claims] 1. Tensile modulus of elasticity of 1 to 100 kg/1 by irradiation with actinic light.
A photocrosslinkable resin composition that becomes an elastic body of cr/l is placed on a base material, and after irradiating active light through the pattern, the non-crosslinked resin is removed, and then the surface of the base material is eroded by sandblasting to form a base material. A method of carving patterns into wood. 2. Claims: The photocrosslinkable resin composition is composed of unvulcanized rubber, a photopolymerizable monomer, and a photosensitizer, and becomes an elastic body with a tensile modulus of 1 to 100 ky/m upon irradiation with actinic light. The method described in paragraph 1.