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JPS6030104B2 - semiconductor equipment - Google Patents
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JPS6030104B2 - semiconductor equipment - Google Patents

semiconductor equipment

Info

Publication number
JPS6030104B2
JPS6030104B2 JP8903976A JP8903976A JPS6030104B2 JP S6030104 B2 JPS6030104 B2 JP S6030104B2 JP 8903976 A JP8903976 A JP 8903976A JP 8903976 A JP8903976 A JP 8903976A JP S6030104 B2 JPS6030104 B2 JP S6030104B2
Authority
JP
Japan
Prior art keywords
resin
solderability
lead wire
semiconductor device
lead wires
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8903976A
Other languages
Japanese (ja)
Other versions
JPS5315068A (en
Inventor
晴香 待鳥
光一 手島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8903976A priority Critical patent/JPS6030104B2/en
Publication of JPS5315068A publication Critical patent/JPS5315068A/en
Publication of JPS6030104B2 publication Critical patent/JPS6030104B2/en
Expired legal-status Critical Current

Links

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 本発明はリード線を改善した半導体装置に関する。[Detailed description of the invention] The present invention relates to a semiconductor device with improved lead wires.

近年、ダイオード型およびトランジスタ型半導体装置は
それぞれ改良されつつあるが本発明は特にリード線に着
目してなされたもので、リード線の強度、延性、はんだ
付け性、樹脂との接合性を向上せしめた好ましい半導体
装置を提供する。
In recent years, diode-type and transistor-type semiconductor devices have been each improved, but the present invention was made with a particular focus on lead wires, and improves the strength, ductility, solderability, and bondability of lead wires with resin. A preferable semiconductor device is provided.

従来、半導体装置のリード線としては強度とくり返し曲
げ性の優れた純Niあるいは50Ni−Fe合金でなる
ものが主に用いられていた。しかしながらこのリード線
ははんだ付け性が好ましくない為、最近は銅を主体とす
るりード線が用いられてきている。銅を主体とするりー
ド線は、はんだ付け性が良く、導電性も良好な為、好ま
しいものであるが、半導体素子を樹脂でモールドする半
導体装置に用いた場合には次のような難点があった。
Conventionally, lead wires for semiconductor devices have mainly been made of pure Ni or a 50Ni-Fe alloy, which has excellent strength and repeated bendability. However, since this lead wire has poor solderability, recently lead wires mainly made of copper have been used. Lead wires made mainly of copper are preferable because they have good solderability and good conductivity, but when used in semiconductor devices in which semiconductor elements are molded with resin, they have the following disadvantages. there were.

すなわち一般の銅合金は熱伝導が大きい。In other words, common copper alloys have high thermal conductivity.

したがって樹脂でモールドした半導体装置を所定の個所
にはんだ付けする際、はんだ浴の熱がリード線を伝わり
易く、モールド部分の樹脂温度が過度に上昇する。その
為樹脂の接合力が弱くなるのと、リード線の膨張、収縮
とが相俊って、リード線に外力が加わった場合リード線
がぐらつき以後の工程の支障となる。したがって本発明
の目的は、銅を主体とするりード線の強度、くり返しま
げ性、はんだ付け性を損なうことなく、特に樹脂との接
合性を改善した優れた半導体装置を提供することである
Therefore, when a resin-molded semiconductor device is soldered to a predetermined location, the heat of the solder bath is likely to be transmitted through the lead wires, causing the resin temperature in the molded portion to rise excessively. Therefore, the bonding force of the resin becomes weak, and the expansion and contraction of the lead wire combine to cause the lead wire to wobble when an external force is applied to the lead wire, causing problems in subsequent steps. Therefore, an object of the present invention is to provide an excellent semiconductor device in which the bondability with resin is particularly improved without impairing the strength, repeatability, and solderability of lead wires mainly made of copper.

本発明に係る半導体装置は、リード線を重量%でAI
8〜13%、好ましくは9〜12%、Nj5〜10%好
ましくは6〜9%残余を実質的に、Cuでなる銅合金に
て形成したことを特徴とする。
In the semiconductor device according to the present invention, the lead wire has an AI content of % by weight.
8 to 13%, preferably 9 to 12%, Nj 5 to 10%, preferably 6 to 9%, the remainder being substantially made of a copper alloy made of Cu.

以下各成分の限定理由を述べる。The reasons for limiting each component will be described below.

Nは強度の向上に寄与するが上記の範囲より少ないとそ
の効果がなく、又余り多いとCu2AIによりもろくな
り加工性が悪いので上記範囲が良い。Niは共析反応の
速度を低下させる働きがあり材料に延性を与えるが少な
いとその効果がなく、また余り多く添加しても量の割に
効果がなく上記範囲が良い。以下本発明実施例について
説明する。表1に示す成分組成のィンゴットを溶製し、
700〜800ooで熱間加工後冷間加工で、0.45
50の線材とし、500〜700ooで焼鈍し試料とし
た。これらの試料のステイフネス、くり返しまげ性、及
び電気伝導度を表2に示す。また試料を樹脂に埋め込ん
だ後はんだ付けを行ない、はんだ付け性と、樹脂との接
合状態を調べた。その結果を表3に示す。くり返しまげ
性は、45雌rの荷重をかけ0.駅で900まげをくり
返し行なし、破断するまでの回数を示し、またはんだ付
性、樹脂との接合性は夫々100本の試料の不良数で示
す。
N contributes to improving the strength, but if it is less than the above range, it will not have that effect, and if it is too much, it will become brittle due to Cu2AI and have poor workability, so the above range is preferable. Ni has the function of reducing the rate of eutectoid reaction and imparts ductility to the material, but if it is too little, it will not have that effect, and if it is added too much, it will not be effective considering the amount, so the above range is preferable. Examples of the present invention will be described below. An ingot having the component composition shown in Table 1 was melted,
0.45 by cold working after hot working at 700~800oo
The wire rod was made into a wire rod of 50 mm, and was annealed at 500 to 700 oo to prepare a sample. Table 2 shows the stiffness, repeatability, and electrical conductivity of these samples. In addition, after embedding the sample in resin, soldering was performed to examine solderability and the state of bonding with the resin. The results are shown in Table 3. The repeatability was determined by applying a load of 45 mm. The number of times the test piece was repeated 900 times at the station until it broke is shown as the number of times it broke, and the solderability and bondability with resin are each shown as the number of defects out of 100 samples.

・ 表2 表3 ここではんだ付け性の良否は、得られたりード線試料を
約230oの4岬b−Snはんだに約5秒間浸し、はん
だのはがれがみられるものを不良とした。
- Table 2 Table 3 Here, the quality of solderability was determined by immersing the obtained lead wire sample in 4-Misaki B-Sn solder at about 230° for about 5 seconds, and those with peeling of the solder being judged as defective.

また樹脂との接合性の良否はェポキシ樹脂にリード線試
料の一端を約5肋埋め込み、他端を上記条件ではんだ付
けした後、リード線試料を角度約90oに曲げ更に水平
に約900回して、リード線試料が樹脂と離れ回転する
ものを不良とした。表3から明らかなように本発明装置
の特徴であるリード線は、はんだ付け性及び樹脂との接
合性において不良のものが全くなくこの点で従来のもの
と著しく異なり、極めて優れたものである。また表2に
よれば本発明に係るIJード線はステイフネスで示され
る強度、くり返しまげ回数で示される延性とも好ましい
ものであり、導電率も、50Ni−Fe合金と同様で実
用上充分なものである。このようなりード線で形成され
た半導体装置を実際に各種用途に使用したところ、はん
だ付けで取付けた際も極めて堅牢で優れたものであった
In addition, to check the bondability with the resin, embed one end of the lead wire sample in the epoxy resin for about 5 ribs, solder the other end under the above conditions, bend the lead wire sample at an angle of about 90 degrees, and then horizontally turn it about 900 times. Those in which the lead wire sample separated from the resin and rotated were considered defective. As is clear from Table 3, the lead wire, which is a feature of the device of the present invention, has no defects in solderability or bondability with resin, and in this respect it is significantly different from conventional lead wires and is extremely superior. . Furthermore, according to Table 2, the IJ cord wire according to the present invention has preferable strength as shown by stiffness and ductility as shown by the number of repeated bending, and its electrical conductivity is similar to that of 50Ni-Fe alloy, which is sufficient for practical use. It is. When semiconductor devices formed with such diagonal wires were actually used for various purposes, they were extremely robust and excellent even when attached by soldering.

Claims (1)

【特許請求の範囲】 1 重量%でAl8〜13%、Ni5〜10%残余を実
質的にCuでなる銅合金にてリード部を形成したことを
特徴とする半導体装置。 2 Alが9〜12%である特許請求の範囲第1項に記
載の半導体装置。 3 Niが6〜9%である特許請求の範囲第1項乃至第
2項のいづれかに記載の半導体装置。
[Scope of Claims] A semiconductor device characterized in that a lead portion is formed of a copper alloy consisting of 1% by weight of 8 to 13% Al and 5 to 10% Ni with the remainder substantially Cu. 2. The semiconductor device according to claim 1, wherein Al is 9 to 12%. 3. The semiconductor device according to claim 1, wherein Ni is 6 to 9%.
JP8903976A 1976-07-28 1976-07-28 semiconductor equipment Expired JPS6030104B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8903976A JPS6030104B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8903976A JPS6030104B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Publications (2)

Publication Number Publication Date
JPS5315068A JPS5315068A (en) 1978-02-10
JPS6030104B2 true JPS6030104B2 (en) 1985-07-15

Family

ID=13959740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8903976A Expired JPS6030104B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Country Status (1)

Country Link
JP (1) JPS6030104B2 (en)

Also Published As

Publication number Publication date
JPS5315068A (en) 1978-02-10

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