JPS6034266B2 - semiconductor equipment - Google Patents
semiconductor equipmentInfo
- Publication number
- JPS6034266B2 JPS6034266B2 JP8904076A JP8904076A JPS6034266B2 JP S6034266 B2 JPS6034266 B2 JP S6034266B2 JP 8904076 A JP8904076 A JP 8904076A JP 8904076 A JP8904076 A JP 8904076A JP S6034266 B2 JPS6034266 B2 JP S6034266B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- solderability
- semiconductor device
- present
- lead wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
【発明の詳細な説明】 本発明はリード線を改善した半導体装置に関する。[Detailed description of the invention] The present invention relates to a semiconductor device with improved lead wires.
近年、ダイオード型およびトランジスタ型半導体装置は
それぞれ改良されつつあるが本発明は特にリード線に着
目してなされたもので、リード線の強度、延性、はんだ
付け性、樹脂との接合性を向上せしめた好ましい半導体
装置を提供する。In recent years, diode-type and transistor-type semiconductor devices have been each improved, but the present invention was made with a particular focus on lead wires, and improves the strength, ductility, solderability, and bondability of lead wires with resin. A preferable semiconductor device is provided.
従来、半導体装置のリード線としては強度とくり返し曲
げ性の優れた純Niあるいは50Ni−Fe合金でなる
ものが主に用いられていた。しかしながらこのリード線
ははんだ付け性が好ましくない為、最近は銅を主体とす
るりード線が用いられてきている。銅を主体とするりー
ド線は、はんだ付ごナー性が良く、導電性も良好な為、
好ましいのであるが、半導体素子を樹脂でモールドする
半導体装置に用いた場合には次のような難点があった。Conventionally, lead wires for semiconductor devices have mainly been made of pure Ni or a 50Ni-Fe alloy, which has excellent strength and repeated bendability. However, since this lead wire has poor solderability, recently lead wires mainly made of copper have been used. Lead wires made mainly of copper have good solderability and good conductivity, so
Although this is preferable, when it is used in a semiconductor device in which a semiconductor element is molded with resin, there are the following difficulties.
すなわち一般の銅合金は熱伝導が大きい。In other words, common copper alloys have high thermal conductivity.
したがって樹脂でモールドした半導体装置を所定の個所
にはんだ付けする際、はんだ浴の熱がリード線を伝わり
易く、モールド部分の樹脂温度が過度に上昇する。その
為樹脂の接合力が弱くなるのと、リード線の膨張、収縮
とが相挨つて、リード線に外力が加わった場合リード線
がぐらつき以後の工程の支障となる。したがって本発明
の目的は銅を主体とするりード線の強度、くり返しまげ
性、はんだ付け性を損なうことなく、特に樹脂との接合
性を改善した優れた半導体装置を提供することである。Therefore, when a resin-molded semiconductor device is soldered to a predetermined location, the heat of the solder bath is likely to be transmitted through the lead wires, causing the resin temperature in the molded portion to rise excessively. Therefore, the bonding force of the resin becomes weak, and the expansion and contraction of the lead wire combine to cause the lead wire to wobble when an external force is applied to the lead wire, causing problems in subsequent steps. Therefore, an object of the present invention is to provide an excellent semiconductor device in which the bondability with resin is particularly improved without impairing the strength, repeatability, and solderability of lead wires mainly made of copper.
本発明に係る半導体装置は、リード線を重量%でMn8
〜15%、AI2〜5%残余を実質的にCuでなる銅合
金あるいはMn8〜15%、AI2〜5%、Si,W,
Bを単独または複合で0.001〜1.0%、残余を実
質的にCuでなる銅合金で形成したことを特徴とする。In the semiconductor device according to the present invention, the lead wire is Mn8 by weight%.
~15%, AI2~5%, the remainder being a copper alloy consisting essentially of Cu, or Mn8~15%, AI2~5%, Si, W,
It is characterized in that it is made of a copper alloy consisting of 0.001 to 1.0% of B alone or in combination, and the remainder substantially of Cu.
以下各成分の限定理由を述べる。Mn及びNは強度、延
性を向上させ余り多いと、ハンダ付性、加工性を劣化さ
せ、また導電率も低くなりすぎる。The reasons for limiting each component will be described below. Mn and N improve strength and ductility, but if they are present too much, solderability and workability deteriorate, and the electrical conductivity becomes too low.
また余り少ないと、導電率が高くなり、したがって熱伝
導も高く、強度、延性が低くなるので好ましくなく上記
範囲が望ましい。Si,Q,Bは強度、延性を向上させ
、結晶粒の粗大化を抑制するので、肌荒れをふせぎ、加
工性をよくする。またはんだ付け性も改良するが、多く
添加しても、そのわりに効果がなく、また少ないと効果
が得られないので上記範囲が望ましい。以下本発明装置
に係るリード線の実施例につき、詳細に説明する。On the other hand, if the amount is too small, the electrical conductivity will be high, and therefore the thermal conductivity will be high, and the strength and ductility will be low, so the above range is preferable. Si, Q, and B improve strength and ductility and suppress coarsening of crystal grains, so they prevent surface roughness and improve workability. It also improves solderability, but even if it is added in a large amount, there is no effect, and if it is added in a small amount, no effect can be obtained, so the above range is desirable. Embodiments of the lead wire according to the device of the present invention will be described in detail below.
表1に示す成分組成のィンゴットを溶製し、700〜8
00ご0で熱間加工後、径7物の線材とした。これを、
酸洗後、冷間加伸線により径2側の線材とし、500〜
700こ0で焼純急冷後冷間伸線で径0.455柳の線
材とし300〜450qoで10分間加熱処理し試料と
した。この本発明試料及び一般試料についてくり返しま
げ性、ステイフネス及び導電率を表2に示す。また試料
を樹脂に埋め込んだ後、200〜300ooではんだ付
けを行ない、はんだ付け性を樹脂との接合状態を調べた
。その結果を表3に示す。くり返しまげ性は、45雌r
の荷重をかけ0.球で9000まげをくり返し行なし、
破断するまでの回数を示し、またはんだ付性、樹脂との
接合性は夫々100本の試料の不良数で示す。An ingot having the component composition shown in Table 1 was melted and 700 to 8
After hot working at 0.00 to 0.0, it was made into a wire rod with a diameter of 7. this,
After pickling, the wire rod is made into a wire rod with a diameter of 2 by cold drawing.
After sintering and quenching at 700 degrees centigrade, a willow wire rod with a diameter of 0.455 was prepared by cold wire drawing and heat treated at 300 to 450 qo for 10 minutes to prepare a sample. Table 2 shows the repeatability, stiffness, and electrical conductivity of the samples of the present invention and general samples. Further, after embedding the sample in resin, soldering was performed at 200 to 300 oo, and the state of bonding with the resin was examined for solderability. The results are shown in Table 3. Repeated curliness is 45 female r
Apply a load of 0. Repeatedly make 9,000 curls with the ball without a row,
The number of times until breakage is shown, and the solderability and bondability with resin are each shown as the number of failures in 100 samples.
表1
表2
表3
ここではんだ付け性の良否は、得られたりード線試料を
約230qoの4肥b−Snはんだに約5秒間浸し、は
んだのはがれがみられるものを不良とした。Table 1 Table 2 Table 3 Here, the quality of solderability was determined by immersing the obtained wire sample in approximately 230 qo of tetrafertility B-Sn solder for approximately 5 seconds, and those exhibiting peeling of the solder were judged to be defective.
また樹脂との接合性の良否はェポキシ樹脂にリード線試
料の一端を約5肌埋め込み、他端を上記条件ではんだ付
けした後リード線試料を角度90oに曲げ更に水平に約
90o回して、リード線試料が樹脂と離れ回転するもの
を不良とした。表3から明らかなように本発明装置の特
徴であるリード線は、はんだ付け性及び樹脂との接合性
において不良のものが全くなくこの点で従来のものと著
しく異なり、極めて優れたものである。In addition, to check the bondability with the resin, embed one end of the lead wire sample in the epoxy resin for about 5 inches, solder the other end under the above conditions, bend the lead wire sample at an angle of 90 degrees, and turn it horizontally about 90 degrees. Those where the wire sample separated from the resin and rotated were considered defective. As is clear from Table 3, the lead wire, which is a feature of the device of the present invention, has no defects in solderability or bondability with resin, and in this respect it is significantly different from conventional lead wires and is extremely superior. .
また表2によれば本発明に係るリード線はステイフネス
で示される強度、くり返しまげ回数で示される延性とも
好ましいものであり、導電率も、50Ni−Fe合金と
同等で実用上充分なものである。このようなりード線で
形成されたトランジスタ型半導体装置を実際に各種用途
に使用したところ、はんだ付けで取付けた際も極めて堅
牢で優れたものであった。Furthermore, according to Table 2, the lead wire according to the present invention has favorable strength as indicated by stiffness and ductility as indicated by the number of repeated bending, and its electrical conductivity is equivalent to that of 50Ni-Fe alloy, which is sufficient for practical use. . When a transistor-type semiconductor device formed with such diagonal wires was actually used for various purposes, it was found to be extremely robust and excellent even when attached by soldering.
以上述べたように本発明半導体装置は改良されたりード
線で形成された優れたものであり工業上の価値は高い。As described above, the semiconductor device of the present invention is an excellent device formed using improved wires and has high industrial value.
Claims (1)
的にCuでなる銅合金にてリード部を形成したことを特
徴とする半導体装置。 2 重量%でMn8〜15%、Al2〜5%Si,Ge
,Bを単独または複合で0.001〜1.0%、残余を
実質的にCuでなる銅合金にてリード部を形成したこと
を特徴とする半導体装置。[Scope of Claims] A semiconductor device characterized in that a lead portion is formed of a copper alloy consisting of 1% by weight of 8 to 15% Mn and 2 to 5% Al with the remainder being substantially Cu. 2% by weight Mn 8-15%, Al2-5% Si, Ge
, B alone or in combination of 0.001 to 1.0% and the remainder substantially Cu.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8904076A JPS6034266B2 (en) | 1976-07-28 | 1976-07-28 | semiconductor equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8904076A JPS6034266B2 (en) | 1976-07-28 | 1976-07-28 | semiconductor equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5315069A JPS5315069A (en) | 1978-02-10 |
| JPS6034266B2 true JPS6034266B2 (en) | 1985-08-07 |
Family
ID=13959768
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8904076A Expired JPS6034266B2 (en) | 1976-07-28 | 1976-07-28 | semiconductor equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6034266B2 (en) |
-
1976
- 1976-07-28 JP JP8904076A patent/JPS6034266B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5315069A (en) | 1978-02-10 |
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