JPS6049437B2 - How to create designs by etching - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for creating patterns on the surface of substrates such as glass, ceramics, plastics, metals, wood, stone, leather, etc. by etching.

Conventionally, as a method of creating designs on the surface of a substrate by etching, paper, combs, etc. are pasted on the surface of the substrate, cut out with a cutter knife, etc., and this is used as a protective film for sandblasting, jetting processing such as liquid honing, or chemical processing. method is known.

However, in these methods, the protective film is usually created manually, and if the pattern is complex and thin, creating the protective film requires a lot of time and effort.

In order to solve these problems, a method of creating an engraved pattern using a photographic pattern using a photosensitive resin as a protective film has been proposed (Japanese Patent Publication No. 35681/1983). This method involves applying a resin to the surface of the base material, irradiating it with actinic rays through a patterned film, photosensitive curing or insolubilization, and dissolving and removing the unexposed areas to create a pattern, which is then processed. be. In this method, the pattern can be created reliably by light irradiation, but it is time-consuming and involves applying resin to each base material, exposing it to light through a film, and dissolving and removing the unexposed areas, and it also requires large bases. Even when creating a pattern on a part of a piece of material, a large base material must be moved, which poses a problem in that the work is difficult and labor intensive. The inventors of the present invention have conducted intensive studies to solve these problems, and have found that by converting photosensitive resin into ink and performing screen printing, these problems can be solved at once, and the work can be performed easily and mass production is possible. I found out.

That is, the present invention is a pattern creation method characterized by forming a pattern of liquid photocurable resin on a base material by a screen printing method, irradiating the pattern with actinic light, and then etching the base material using solid powder. .

In general, screen printing is a useful printing method that can be applied to various substrates, and can be applied not only to flat surfaces but also to curved surfaces.

The liquid photocurable resin used in the method of the present invention is one that is cured by irradiation with actinic rays, and any resin that exhibits fluidity at the time of screen J printing may be used. Of course, a liquid photosensitive resin can also be used.

Further, additives such as inorganic solid powders and colorants, or diluents such as solvents and monomers may be added depending on the case. i In the method of the present invention, the thickness of the liquid photocurable resin layer formed on the substrate depends on the blasting conditions (ejection pressure,
Sand hardness, material, particle size, blasting time) are selected. Usually 100μ or more, preferably 150μ or more,
The thickness is 2TI0n or less. In order to obtain such a thickness using the screen printing method, the conventional liquid drying type polyvinyl alcohol screen printing plate must have a film thickness of 50 mm.
μ or less, and it is necessary to repeat printing several times.
The present inventors proposed it earlier (Japanese Patent Application Laid-Open No. 52-18882)
If a thick stencil is used, the desired thickness can be printed with one squeegee operation, which is effective when carrying out the present invention. After forming a layer of photocurable resin with a desired thickness by screen printing, it is irradiated with active light and cured. The irradiation time can be appropriately selected depending on the type of light source, its intensity, and the distance from the light source, but from the point of view of work efficiency, it is desirable to make it as short as possible, and the optimum time for the resin to adhere to the base material is selected. As a light source of active light, a high-pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, sunlight, etc. are used.

The atmosphere during the irradiation may be air, but depending on the photocurable resin used, it is desirable to carry out the irradiation under an inert gas atmosphere, such as nitrogen, argon, etc., or a carbon dioxide atmosphere.

Further, it is desirable to irradiate actinic rays as soon as possible after printing in order to make the design clearer.

After curing the resin, the substrate is etched using solid powder, and either dry or wet blasting can be used. The fine sand used for sandblasting is from 30. Alundum, carborundum, glass beads, etc. with a particle size of 500 mesh are used and are blown with air at a pressure of 1 to 7 k9/Clt from a distance of 5 to 50 cm from the substrate.

What resin was used as a protective film after sandblasting? It may be peeled off or left as is and used as part of the pattern.

The liquid photocurable resin composition used in the method of the present invention is a conventionally known liquid photosensitive resin, but the viscosity and fluidity are adjusted to make it suitable for screen printing.
Viscosity and fluidity can be adjusted by dissolving polymers with good compatibility, by mixing solid particles such as silica, magnesium oxide, calcium carbonate, etc., or by adding solvents or monomers. can. Furthermore, dyes and pigments can also be added for the purpose of coloring. Colored items make the work easier as the images are easier to distinguish when sandblasting.
A feature of the present invention is that a liquid photocurable resin is made into ink, printed on a substrate, and cured by irradiation with active light to form a protective film against sandblasting. This method has the advantage that a protective film can be formed in a shorter time than conventional methods using solvent-dried or two-component ink as a protective film, and does not require heating. Therefore, it can also be used for thermoplastics and heat-sensitive substrates. Furthermore, an advantage of using a liquid photocurable resin is that there is no need to worry about clogging of the screen printing plate, and printing can be performed continuously or at the same rate even after a long pause.

As described above, by using the method of the present invention, it has become possible to pattern large quantities of the same pattern in a short time.

EXAMPLES Next, the method of the present invention will be specifically explained using Examples, but the present invention is not limited thereto.

Example 1 Silica powder and pigment were added to a liquid photosensitive resin consisting of unsaturated polyester, 2-hydroxyethyl methacrylate, and benzoyl isobutyl ether, and the mixture was uniformly kneaded to prepare a composition for screen printing.

On the other hand, a screen printing plate with a film thickness of 250 μm having a cut-out pattern of a floral pattern was prepared, and the above composition was screen printed one after another on a glass plate using this plate, and immediately placed under a 2KW high pressure mercury lamp. It was irradiated for 1 minute.

A cured resin with the same floral pattern as the printing plate was obtained on the glass plate. This material was used as a protective film and 200-mesh diamond sand was sprayed with air at a pressure of 2 kg/d for sandblasting. After blasting, the hardened resin was peeled off to obtain a ground glass plate with a transparent flower pattern. Example 2 Screen printing was carried out on a cylindrical glass cup in the same manner as in Example 1 except that a screen printing plate with white letters ゜゜S゛ was used, and then placed under a 2KW high pressure mercury lamp. The resin was cured by irradiation.

Claims (1)

[Claims] 1 A pattern characterized by forming a pattern of liquid photocurable resin on a base material by screen printing, irradiating it with actinic rays to form a protective film, and then etching the base material using solid powder. How to make.