JPS6059998B2 - plating device - Google Patents
plating deviceInfo
- Publication number
- JPS6059998B2 JPS6059998B2 JP10079478A JP10079478A JPS6059998B2 JP S6059998 B2 JPS6059998 B2 JP S6059998B2 JP 10079478 A JP10079478 A JP 10079478A JP 10079478 A JP10079478 A JP 10079478A JP S6059998 B2 JPS6059998 B2 JP S6059998B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- nozzle
- plating solution
- opening
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 title claims description 106
- 239000007788 liquid Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 10
- 230000002265 prevention Effects 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 41
- 238000002347 injection Methods 0.000 description 16
- 239000007924 injection Substances 0.000 description 16
- 238000011084 recovery Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】
本発明はメッキ装置、特にメッキ液を上方より下方に噴
射fるようにしたメッキ装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plating apparatus, and particularly to a plating apparatus that sprays a plating solution from above to below.
被メッキ材のメッキ対象部分を区画露出させる開口部付
きのマスク体を利用し、その開口部へメッキ液を噴射す
るメッキ装置が最近注目され、主として金、銀その他貴
金属をメッキする装置として特に脚光を浴びている。Plating equipment that utilizes a mask body with openings that expose sections of the material to be plated and injects plating liquid into the openings has recently attracted attention, and is particularly popular as equipment for plating gold, silver, and other precious metals. is bathed in
そして、この様なメッキ装置では通常噴射したメッキ液
の回収が容易でしかもマスク体の開口部の液切りが確実
であると”いう理由でメッキ液は下方より上方へ噴射す
るようにしてあることが多い。前処理、後処理工程を含
むメッキ装置全体の自動化が要望されるとラック主体の
搬送機構とのかねあいでメッキ装置の要部例えば、ノズ
ル、押圧手段、被メッキ材を載置する部分等は被メッキ
材の下方に位置させぬ方がよい・・・・・・という問題
が生じる。In addition, in this kind of plating equipment, the plating solution is usually sprayed upward from the bottom because it is easy to recover the sprayed plating solution and it also ensures that the liquid drains from the opening of the mask body. When there is a demand for automation of the entire plating equipment including pre-treatment and post-treatment processes, important parts of the plating equipment such as the nozzle, pressing means, and the part on which the material to be plated is placed have to be replaced by the rack-based transport mechanism. etc., it is better not to position them below the material to be plated.
そこで、本発明は従来技術とは逆にメッキ装置の要部を
被メッキ材の上方に位置させメッキ液を上方より下方に
噴射するようにしたメッキ装置を提案するものであり、
しかも、このためマスク手段の開口部へ必然的に生ずる
メッキ液の残存という問題をエアーの噴射にて強制的に
排除することで解決したメッキ装置を提供せんとするも
のである。Therefore, the present invention proposes a plating apparatus in which the main parts of the plating apparatus are located above the material to be plated, and the plating liquid is sprayed from the top to the bottom, contrary to the prior art.
Moreover, it is an object of the present invention to provide a plating apparatus that solves the problem of residual plating solution that inevitably occurs in the opening of the mask means by forcibly removing it by jetting air.
即ち、本発明は具体的にはメッキ液を上方より下方へ噴
射するノズルを内部に備え、そのメツキ液噴射方向に開
口部付きのマスク手段を設けたメッキボックスに対して
、上記マスク手段の下面側にあつて被メッキ材を水平状
態に載置する受台を、少くとも片方が他方に対し密接・
離反自在に配したものであつて、上記メッキボックスに
はマスク手段の開口部の残存メッキ液を強制排除するエ
アーノズルが組合わせてあることを特徴とするメッキ装
置を提供せんとするものである。That is, the present invention specifically relates to a plating box that is equipped with a nozzle inside which sprays a plating solution from above to below, and is provided with a mask means having an opening in the direction in which the plating solution is sprayed. At least one side of the cradle on which the material to be plated is placed horizontally should be placed close to the other side.
It is an object of the present invention to provide a plating apparatus characterized in that the plating box is arranged so as to be releasable, and the plating box is combined with an air nozzle for forcibly removing the remaining plating solution from the opening of the mask means. .
以下図面に基づいて詳細を説明する。Details will be explained below based on the drawings.
このメッキ装置は大別するとメッキボックスl、受台2
、メッキ液の供給路3、同回収路4そしてエアー供給路
5より構成される。メッキボックス1と受台2とは少く
ともいずれか片方が他方に対し密接・離反自在とされる
。第1図の具体例では図示せぬ圧力シリンダーにてメッ
キボックス1全体が下方へ、即ち受台2めがけて、押圧
・復元可能にしてある。ほS゛密閉状態のメツキボツク
,ス1の内部にはメッキ液Aを上方より下方へ噴射する
アノード付きのノズル6が備えられる。このノズル6の
全体をアノードとして形成してもよく、又ノズル6の一
部にアノードを取付けてもよい。更に、このノズル6は
エアーノズルと組合わせて一体化してもよく(第1図)
、又はこのノズル6aの内側にエアーノズル7を別途組
合わせて設けてもよい(第2図)。これらのエアーノズ
ルは後述するマスク手段の開口部の残存メッキ液を強制
的に排除するもので、本発明の大きな特色となるもので
ある。そして、ノズル6に到るメッキ液供給路3の一部
はエアー供給路の一部と共用にし、電磁弁8,9を介し
て共用部分の切換え使用をするようにできる(第1図)
。尚、エアーノズル7を別途設ける場合にはメッキ液の
供給路3aとエアー供給路5aは別途のものになる(第
2図)。メッキボックス1の下方、即ちメッキ液噴射方
向には開口部付きのマスク手段が設けられる。This plating equipment can be roughly divided into plating box 1, pedestal 2
, a plating solution supply path 3, a plating solution recovery path 4, and an air supply path 5. At least one of the plating box 1 and the pedestal 2 can be brought into close contact with or separated from the other. In the specific example shown in FIG. 1, the entire plating box 1 can be pressed and restored downward, that is, toward the pedestal 2, by a pressure cylinder (not shown). A nozzle 6 with an anode for spraying the plating solution A from above to below is provided inside the plating box 1 which is in a sealed state. The entire nozzle 6 may be formed as an anode, or the anode may be attached to a part of the nozzle 6. Furthermore, this nozzle 6 may be combined and integrated with an air nozzle (Fig. 1).
Alternatively, an air nozzle 7 may be separately provided in combination inside this nozzle 6a (FIG. 2). These air nozzles forcibly remove the remaining plating solution from the opening of the mask means, which will be described later, and are a major feature of the present invention. A part of the plating solution supply path 3 leading to the nozzle 6 can be shared with a part of the air supply path, and the shared portion can be switched for use via the solenoid valves 8 and 9 (Fig. 1).
. Incidentally, when the air nozzle 7 is provided separately, the plating solution supply path 3a and the air supply path 5a are provided separately (FIG. 2). A mask means with an opening is provided below the plating box 1, that is, in the plating solution injection direction.
図示の例で、このマスク手段はメッキボックスの底部と
その下面側に固定されているマスク体とに分けて示して
あるが、これは必ずしも分ける必要もなく、場合によつ
ては一体化したものでもよいことは勿論である。メッキ
ボックスの底部10には液噴射開口11が形成され且つ
液回収路4が底部10とメッキ液タンク12を接続する
ようにして設けられる。In the illustrated example, this mask means is shown separated into the bottom of the plating box and the mask body fixed to the lower surface thereof, but it is not necessarily necessary to separate them, and in some cases, they may be integrated. Of course, that's a good thing. A liquid injection opening 11 is formed in the bottom part 10 of the plating box, and a liquid recovery path 4 is provided to connect the bottom part 10 and the plating liquid tank 12.
液噴射開口11は下方が縮径するような傾斜面を有し、
その上縁13に飛散メッキ液の逆入防止手段が形成され
る。第1図と第3図の具体例では突起体14が逆入防止
手段として示され、又第4図の具体例では底部10bの
面が液噴射開口の上縁13bより低い位置にあり上縁1
3b部分を恰も突出させた状態にしこれを前記の逆入防
止手段としている。更に、これら飛散メッキ液の逆入防
止手段14,13bに、上方への飛散付着液を液噴射開
口以外の所へ誘導・滴下させる手段を組合わせることも
可能で、第3図ではこのためにメッキ液噴射とエアー噴
射兼用のノズル6bを設けた遮蔽板15の下面を傾斜面
16とし、且つ最下端17が液噴射開口11a以外の所
の上方に位置決めしてある。マスク体18はメッキ液噴
射開口11に連通させる開口部19を有しメッキボック
スの底部10下面に固定される。The liquid injection opening 11 has an inclined surface whose diameter decreases at the bottom,
A means for preventing backflow of splashed plating liquid is formed on the upper edge 13 thereof. In the specific example of FIGS. 1 and 3, the protrusion 14 is shown as a backflow prevention means, and in the specific example of FIG. 1
The portion 3b is made to protrude and serves as the above-mentioned reverse entry prevention means. Furthermore, it is also possible to combine the means 14 and 13b for preventing the splashed plating liquid from coming back in with a means for guiding and dropping the spattered liquid upward to a location other than the liquid injection opening, and in FIG. The lower surface of the shielding plate 15 provided with the nozzle 6b for both plating liquid injection and air injection is an inclined surface 16, and the lowermost end 17 is positioned above the part other than the liquid injection opening 11a. The mask body 18 has an opening 19 communicating with the plating solution spray opening 11 and is fixed to the lower surface of the bottom 10 of the plating box.
この開口部19は被メッキ材20の所望メッキ対象部分
を区画露出するもので、このためメッキボックス1及び
/又は受台2の押圧・復元移動によりマスク体18が被
メッキ材20に密着・離反させられる。第3図の拡大図
で示せば、18aがマスク体で19aがその開口部そし
て20aが被メッキ材である。受台2の上面には被メッ
キ材20を載置するためのそしてマスク体18と受台2
間て被メッキ材を押圧状態下て挾持する際被メッキ材2
0を傷つけぬためのクッション材兼用の裏側マスク体2
1が設けてあり、受台2は図示せぬ圧力シリンダーBで
可動とするか、又はメッキボックス1のみ可動として受
台2を固定とするか任意である。This opening 19 exposes a desired plating target portion of the material 20 to be plated, and therefore, the mask body 18 comes into close contact with and separates from the material 20 to be plated by pressing and restoring the plating box 1 and/or the pedestal 2. I am made to do so. In the enlarged view of FIG. 3, 18a is a mask body, 19a is an opening thereof, and 20a is a material to be plated. On the upper surface of the pedestal 2 are a mask body 18 for placing the material to be plated 20 and the pedestal 2.
When holding the material to be plated under pressure, the material to be plated 2
Backside mask body 2 that doubles as a cushioning material to prevent damage to 0
1 is provided, and the pedestal 2 may be made movable by a pressure cylinder B (not shown), or only the plating box 1 may be movable and the pedestal 2 may be fixed.
尚、メッキ液タンク12はエアーノズルより噴射されメ
ッキ液回収路4を通つて流入するエアーを適宜の手段を
介し排気できるようにしてあり、・メッキボックス1が
可動の場合上記回収路4との接続は回収路4自体を伸縮
可能とするか或は回収路4がバイブ状のようなときには
その下端を可動にして受止めるようにする。The plating solution tank 12 is designed to exhaust air, which is injected from an air nozzle and flows in through the plating solution recovery path 4, through appropriate means; The connection is made so that the recovery channel 4 itself is expandable and retractable, or when the recovery channel 4 is in the form of a vibrator, its lower end is movable to receive it.
次に作用を説明する。Next, the action will be explained.
受台2のクッション材兼ノ用の裏側マスク体21上に被
メッキ材20を水平状態に載置し、メッキボックス1を
下降せしめ、マスク体18を被メッキ材20へ密着せし
める。次いでメッキ液供給路3よりメッキ液Aを圧送し
アノード兼用ノズル6より下方へ噴射する。所定の電解
メッキ処理の後電磁弁8,9を操作し、エアー供給路5
よりエアーを圧送し同じくノズル6より噴射させる。す
ると、マスク体の開口部19及びメッキボックス底部1
0のメッキ液噴射開口11内に残存するメッキ液はエア
ー噴射で吹飛ばされそこより強制的に排除される。そし
てこの排除されたメッキ液は回収路4を介してメッキ液
タンク12へ戻り、エアーは同じく同タンク12で適宜
排出される。上述のエアー噴射が行なわれると、残存メ
ッキ液は吹飛ばされ逆入防止手段〔突起体14又は上縁
13b〕を超えて底部10,10bに至るのでメッキ液
噴射開口11や開口部19内に逆入することがない。又
上方に飛散し例えばノズルのある遮蔽板15の下面に付
着したメッキ液はその傾斜面16によつてメッキ液噴射
開口11a及び開口部19aの上方部分以外の所に誘導
されるので両開口に滴下することもない(第3図)。勿
論、ノズル6bよりのエアー噴射が圧力大で且つ所望時
間行なわれれば、エアーの反射流が遮蔽板15の下面に
も強く作用するので飛散メッキ液は下面に付着しないか
或は付着したとしても、そこからも、吹飛ばされて直接
回収路4に入込む場合が多いと考えられる。更に、アノ
ード兼用のメッキ液ノズル6aの口径が大サイズの場合
、内側にエアーノズル7を設けるので(第2図)、エア
ー供給路5aから圧送されたエアーはこのや)小径のエ
アーノズル7より噴射され上記の場合と同様に残存する
メッキ液を完全に飛散せしめる。この様にして、残存メ
ッキ液が皆無となつた状態で、マスク体18を被メッキ
材20より離反させメッキ処理済みの被メッキ材をそこ
より取出せばよい。以上説明した如く、本発明に拠れば
マスク手段にて所望メッキ対象部分が区画露出された被
メッキ材に対しメッキ装置の要部を上方に位置させ、上
方より下方へメッキ液を噴射して施こしメッキ処理する
ので従来のメッキ装置の要部を下方に位置させ上向けに
メッキ液を噴射するメッキ装置に比べて、メッキ装置全
体の自動化の要望に応じ易くスペースの有効利用が十分
為し得るものであり、しかも下向き噴射で一番問題視さ
れるマスク手段の開口部の残存メッキ液はメッキ液とエ
アー噴射兼用のノズル或いは兼用ではないにしてもほS
゛同一位置に配置されたエアーノズルより噴射されるエ
アーにて強制的に残存する場所から排除されるので、マ
スク手段より離反させた被メッキ材上へメッキ液が滲み
出したり漏出したりする恐れもない。The material to be plated 20 is placed horizontally on the back side mask body 21 which also serves as a cushioning material of the pedestal 2, and the plating box 1 is lowered to bring the mask body 18 into close contact with the material to be plated 20. Next, the plating solution A is pumped through the plating solution supply path 3 and sprayed downward from the anode nozzle 6. After the predetermined electrolytic plating process, operate the solenoid valves 8 and 9 to open the air supply path 5.
Air is fed under pressure and is also injected from the nozzle 6. Then, the opening 19 of the mask body and the bottom part 1 of the plating box
The plating solution remaining in the plating solution injection opening 11 of No. 0 is blown off by air jet and forcibly removed from there. The removed plating solution then returns to the plating solution tank 12 via the recovery path 4, and the air is also appropriately discharged from the same tank 12. When the above-mentioned air injection is performed, the remaining plating solution is blown away and reaches the bottom portions 10 and 10b beyond the backflow prevention means [protrusion 14 or upper edge 13b], so that it does not enter the plating solution injection opening 11 or the opening 19. There is no reverse entry. Furthermore, the plating solution that has been scattered upward and attached to the lower surface of the shielding plate 15 where the nozzle is located, for example, is guided by the inclined surface 16 to a location other than the upper part of the plating solution injection opening 11a and the opening 19a, so that it is not applied to both openings. There is no dripping (Figure 3). Of course, if the air is jetted from the nozzle 6b at a high pressure and for a desired period of time, the reflected flow of air will strongly act on the lower surface of the shielding plate 15, so that the scattered plating solution will not adhere to the lower surface, or even if it does, it will not adhere to the lower surface. , it is thought that there are many cases where the debris is blown away and directly enters the recovery path 4. Furthermore, if the diameter of the plating solution nozzle 6a that also serves as an anode is large, an air nozzle 7 is provided inside (Fig. 2), so that the air pumped from the air supply path 5a is transferred from the small-diameter air nozzle 7. The remaining plating solution is completely scattered as in the case above. In this way, when there is no remaining plating solution, the mask body 18 is separated from the material to be plated 20 and the plated material which has been plated is taken out from there. As explained above, according to the present invention, the main part of the plating apparatus is positioned above the exposed material to be plated, and the desired part to be plated is divided by the mask means, and the plating solution is sprayed from above to below. Because it performs strain plating, compared to conventional plating equipment in which the main parts are located below and the plating solution is sprayed upward, it is easier to meet the demands for automation of the entire plating equipment and space can be used effectively. Furthermore, the remaining plating solution in the opening of the mask means, which is the most problematic issue with downward spraying, is caused by a nozzle that is used for both plating solution and air spraying, or even if it is not used for both, it is
゛Since the plating solution is forcibly removed from the remaining area by the air jetted from the air nozzle located at the same position, there is a risk that the plating solution may seep or leak onto the plated material that is separated from the mask means. Nor.
更に、エアー噴射で一度マスク手段の開口部具体的には
マスク体の開口部なり底部のメッキ液噴射開口なりから
飛散させられた残存メッキ液は逆入防止手段及び上方の
遮蔽板の傾斜下面にて再び元の所へ戻ることもないので
、完全に残存メッキ液の液切りが達成でき、メッキ部分
と非メッキ部分との境界のスツキリした仕上良好なメッ
キ処理が期待でき、又、メッキ液のドラツグアウト(持
ち出し)量を皆無にできる。Furthermore, the remaining plating solution once scattered through the opening of the mask means by air injection, specifically the opening of the mask body or the plating solution injection opening at the bottom, is sprayed onto the backflow prevention means and the inclined lower surface of the upper shielding plate. Since the remaining plating solution does not return to its original place, the remaining plating solution can be completely drained, and a good plating process with a smooth finish at the boundary between the plated and non-plated areas can be expected. The amount of drag out can be completely eliminated.
第1図は本発明に係るメッキ装置の要部断面図、第2図
はメッキ液噴射ノズルとエアー噴射ノズル変形例を示す
部分拡大断面図、第3図は飛散メッキ液の逆入防止手段
その他を示す遮蔽板並びにメッキボックス底部の部分拡
大断面図そして第4図は逆入防止手段の変形例を示す底
部の部分断面図である。
図中、1・・・・・・メッキボックス、2・・・・・・
受台、3・・・・・メッキ液供給路、4・・・・・・メ
ッキ液回収路、5・・エアー供給路、6・・・・・アノ
ード兼用ノズル、10,10b・・・・・・メッキボッ
クスの底部、11,11a・・・・・・メッキ液噴射開
口、14・・・・・突起体、15・・・・・遮蔽板、1
6・・・・・・傾斜下面、18,18一a・・・・・・
マスク体、19,19a・・・・・・開口部、20,2
0a・・・・・・被メッキ材。Fig. 1 is a sectional view of the main parts of the plating apparatus according to the present invention, Fig. 2 is a partially enlarged sectional view showing a modification of the plating liquid injection nozzle and the air injection nozzle, and Fig. 3 is a means for preventing backflow of scattered plating liquid, etc. FIG. 4 is a partially enlarged sectional view of the bottom of the shielding plate and the plating box showing a modified example of the reverse entry prevention means. In the figure, 1... plating box, 2...
cradle, 3... plating liquid supply path, 4... plating liquid recovery path, 5... air supply path, 6... anode nozzle, 10, 10b... ... Bottom of plating box, 11, 11a ... Plating liquid injection opening, 14 ... Protrusion, 15 ... Shielding plate, 1
6... Slanted lower surface, 18, 18-a...
Mask body, 19, 19a... Opening, 20, 2
0a... Material to be plated.
Claims (1)
備え、そのメッキ液噴射方向に開口部付きのマスク手段
を設けたメッキボックスに対して、上記マスク手段の下
面側にあつて被メッキ材を水平状態に載置する受台を、
少くとも片方が他方に対し密接・離反自在に配したもの
であつて、上記メッキボックスにはマスク手段の開口部
の残存メッキ液を強制排除するエアーノズルが組合わせ
てあることを特徴とするメッキ装置。 2 上記メッキボックスの底部には強制排除された飛散
メッキ液がマスク手段の開口部に逆入するのを防止する
逆入防止手段が設けてある、特許請求の範囲第1項記載
のメッキ装置。 3 上記ノズルはエアーノズルと組合わせ一体化されて
おり、このノズルに到るメッキ液供給路の一部はエアー
供給路の一部と共用にされ電磁弁を介してメッキ液とエ
アーの供給切換が行なわれるものである、特許請求の範
囲第1項記載のメッキ装置。 4 上記ノズルはマスク手段の開口部の残存メッキ液を
強制排除するエアーノズルを別途組合わせ設けたもので
ある、特許請求の範囲第1項記載のメッキ装置。[Scope of Claims] 1. For a plating box that is equipped with a nozzle inside which sprays a plating solution from above to below and is provided with a mask means with an opening in the direction in which the plating solution is sprayed, a plating box is provided on the lower surface side of the mask means. The pedestal on which the material to be plated is placed horizontally is
At least one side of the plating box is arranged so as to be close to or separate from the other, and the plating box is combined with an air nozzle for forcibly removing residual plating solution from the opening of the mask means. Device. 2. The plating apparatus according to claim 1, wherein a backflow prevention means is provided at the bottom of the plating box to prevent the forcibly removed scattered plating liquid from backflowing into the opening of the mask means. 3 The above nozzle is integrated with an air nozzle, and a part of the plating liquid supply path leading to this nozzle is shared with a part of the air supply path, and the supply of plating liquid and air is switched via a solenoid valve. 2. The plating apparatus according to claim 1, wherein the plating apparatus performs the following steps. 4. The plating apparatus according to claim 1, wherein the nozzle is additionally provided with an air nozzle for forcibly removing residual plating solution from the opening of the mask means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10079478A JPS6059998B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10079478A JPS6059998B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5528340A JPS5528340A (en) | 1980-02-28 |
| JPS6059998B2 true JPS6059998B2 (en) | 1985-12-27 |
Family
ID=14283324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10079478A Expired JPS6059998B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6059998B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0762270B2 (en) * | 1985-06-17 | 1995-07-05 | 株式会社日立製作所 | Partial plating method |
| JPH01180995A (en) * | 1988-01-11 | 1989-07-18 | Union Tool Kk | Marking method |
-
1978
- 1978-08-18 JP JP10079478A patent/JPS6059998B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5528340A (en) | 1980-02-28 |
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