JPS6113367B2 - - Google Patents
Info
- Publication number
- JPS6113367B2 JPS6113367B2 JP2172778A JP2172778A JPS6113367B2 JP S6113367 B2 JPS6113367 B2 JP S6113367B2 JP 2172778 A JP2172778 A JP 2172778A JP 2172778 A JP2172778 A JP 2172778A JP S6113367 B2 JPS6113367 B2 JP S6113367B2
- Authority
- JP
- Japan
- Prior art keywords
- dielectric
- silicone
- porcelain
- synthetic resin
- metal electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 32
- 229910052573 porcelain Inorganic materials 0.000 claims description 26
- 239000003985 ceramic capacitor Substances 0.000 claims description 17
- 229910052759 nickel Inorganic materials 0.000 claims description 17
- 239000000919 ceramic Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 229920003002 synthetic resin Polymers 0.000 claims description 16
- 239000000057 synthetic resin Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 229920001296 polysiloxane Polymers 0.000 claims description 12
- 229920002545 silicone oil Polymers 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000007772 electroless plating Methods 0.000 claims description 8
- 229920006268 silicone film Polymers 0.000 claims description 8
- 239000003990 capacitor Substances 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims 1
- 239000004447 silicone coating Substances 0.000 description 16
- 238000007747 plating Methods 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- 239000012190 activator Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- 241001460678 Napo <wasp> Species 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- NQXGLOVMOABDLI-UHFFFAOYSA-N sodium oxido(oxo)phosphanium Chemical compound [Na+].[O-][PH+]=O NQXGLOVMOABDLI-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
Description
【発明の詳細な説明】
本発明は、磁器コンデンサ及びその製造方法に
関し、更に詳細には、損失特性(Q特性)の改善
又は特性の安定化を図つた磁器コンデンサ及びそ
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic capacitor and a method of manufacturing the same, and more particularly to a magnetic capacitor that improves loss characteristics (Q characteristics) or stabilizes the characteristics and a method of manufacturing the same.
酸化チタン、チタン酸バリウム等の誘電体磁器
のコンデンサ電極は、主として銀焼付法又はニツ
ケルメツキ法によつて作られる。前者の銀焼付法
は、電気的特性及び半田付性が優れた電極を形成
することが出来るという長所を有する反面、量産
性が悪いという欠点、銀を使用するので高価にな
るという欠点、コンデンサに電圧を供給して使用
している間に湿気等の影響で磁器のクラツク等を
介して一方の電極の銀が他方の電極に移行する所
謂マイグレーシヨンが起るという欠点を有する。 Capacitor electrodes made of dielectric ceramics such as titanium oxide and barium titanate are mainly made by the silver baking method or the nickel plating method. The former silver baking method has the advantage of being able to form electrodes with excellent electrical properties and solderability, but has the disadvantage of poor mass production, the disadvantage of being expensive because it uses silver, and the disadvantage of being expensive for capacitors. It has a drawback that during use with voltage supplied, so-called migration occurs, in which silver from one electrode migrates to the other electrode through cracks in the porcelain due to the influence of moisture and the like.
これに対して後者のニツケルメツキ法は、量産
性が優れているという長所、低コスト化が可能で
あるという長所、マイグレーシヨンが生じないと
いう長所を有する反面、銀焼付法に比較してQ=
1/tanδが小さいという欠点を有する。 On the other hand, the latter nickel-metsuki method has the advantages of excellent mass production, low cost, and no migration, but compared to the silver baking method, Q =
It has the disadvantage that 1/tan δ is small.
そこで、本発明の目的はQを大きくすることが
可能であると共に、特性の劣化を防止することが
可能な磁器コンデンサ及びその製造方法を提供す
ることにある。 SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a ceramic capacitor that can increase Q and prevent deterioration of characteristics, and a method for manufacturing the same.
上記目的を達成するための本願の第1番目の発
明は、誘電体磁器と、該誘電体磁器の表面の全部
又は一部に密着された金属付着可能な誘電体合成
樹脂被膜と、該誘電体合成樹脂被膜上に設けられ
た一方の金属電極と、前記誘電体合成樹脂被膜又
は前記誘電体磁器の上に設けられた他方の金属電
極とを具備して構成されていることを特徴とする
磁器コンデンサに係わるものである。 The first invention of the present application to achieve the above object is to provide a dielectric ceramic, a dielectric synthetic resin coating that can adhere metal to all or a part of the surface of the dielectric ceramic, and Porcelain comprising one metal electrode provided on a synthetic resin coating and the other metal electrode provided on the dielectric synthetic resin coating or the dielectric porcelain. It is related to capacitors.
尚上記発明における誘電体合成樹脂被膜はCH3
(メチル)基を有するシリコーンであることが望
ましく、例えば、信越化学株式会社製のシリコー
ンKF54,KF393,KS705F+PS3が望ましい。 The dielectric synthetic resin coating in the above invention is CH 3
A silicone having a (methyl) group is preferable, and for example, silicone KF54, KF393, and KS705F+PS3 manufactured by Shin-Etsu Chemical Co., Ltd. are preferable.
上記発明によれば、金属電極と磁器との間に誘
電体合成樹脂被膜が設けられるので、磁器表面の
凹凸に基づく空隙が磁器表面と電極との間に生じ
るようなことがなくなり、また磁器内部への酸又
はアルカリ等の溶液若しくは水分等の浸入が阻止
される。従つてQを大きくし且つ特性の劣化を阻
止することができる。 According to the above invention, since the dielectric synthetic resin coating is provided between the metal electrode and the porcelain, there is no possibility that a gap will be created between the porcelain surface and the electrode due to the unevenness of the porcelain surface, and the inside of the porcelain The infiltration of solutions such as acids or alkalis, or moisture, etc., is prevented. Therefore, Q can be increased and deterioration of characteristics can be prevented.
本願の第2番目の発明は、第1番目の発明に係
わる磁器コンデンサを製造する方法に係わるもの
であり、前記誘電体磁器にシリコーンを含浸させ
ること、前記シリコーンを100℃〜600℃の温度で
前記誘電体磁器に焼付けて前記誘電体合成樹脂被
膜としてのシリコーン被膜を形成すること、及び
前記一方の金属電極及び前記他方の金属電極を前
記シリコーン被膜上に無電解メツキ法で形成する
ことを含むことを特徴とするものである。 A second invention of the present application relates to a method for manufacturing a ceramic capacitor according to the first invention, which includes impregnating the dielectric ceramic with silicone and heating the silicone at a temperature of 100°C to 600°C. It includes baking the dielectric ceramic to form a silicone film as the dielectric synthetic resin film, and forming the one metal electrode and the other metal electrode on the silicone film by electroless plating. It is characterized by this.
上記本発明によれば、シリコーンを含浸させた
後に焼付けを行つてシリコーン被膜を形成し、し
かる後無電解メツキで電極を形成するので、磁器
コンデンサのコストの低減が可能であると共に、
無電解メツキ処理に使用される酸又はアルカリ等
の溶液が磁器内部に浸入するのを阻止することが
可能になり、Qの大きい磁器コンデンサを得るこ
とができる。 According to the present invention, a silicone film is formed by impregnating silicone and then baking, and then electrodes are formed by electroless plating, so it is possible to reduce the cost of a ceramic capacitor, and
It becomes possible to prevent a solution such as acid or alkali used in electroless plating from penetrating into the interior of the ceramic, and a ceramic capacitor with a large Q can be obtained.
以下、図面を参照して本発明の実施例を説明す
る。 Embodiments of the present invention will be described below with reference to the drawings.
実施例 1
まず、第1図Aに示す酸化チタンを主成分とす
る円板状誘電体磁器1を用意する。Example 1 First, a disc-shaped dielectric ceramic 1 whose main component is titanium oxide as shown in FIG. 1A is prepared.
次に構造式
(但しMeはメチル基、φはフエニル基、n及
びmは整数を示す)
を有すリシコーン・オイルKF54(信越化学工業
株式会社製)をキシレンで3%(シリコーン・オ
イル/キシレン×100=3%)に希釈したものに
第1図Aに示す誘電体磁器1を浸漬させる。この
際、10-2torrの真空中に誘電体磁器1を置いて真
空吸引し、しかる後、真空中にてシリコーン・オ
イルの希釈溶液に磁器1を浸漬し、シリコーン・
オイルを真空含浸させる。この結果、シリコー
ン・オイルは磁器1の表面に付着するのみなら
ず、磁器1の内部にも浸入する。次に、上記の真
空含浸が終了したものを遠心分離機に入れて、余
分なシリコーン・オイルを除去する。次にキシレ
ンを蒸発させるために空気中で150℃、30分の乾
燥処理を行つた後、空気中で500℃、30分の焼付
け処理を行つて第1図Bに示すように磁器1の表
面に誘電体合成樹脂被膜としてシリコーン被膜2
を約50〜100Åの厚さに形成する。第1図Bでは
細かく示されていないが、シリコーン・オイルが
磁器1の表面の凹部及び内部に浸入するために、
シリコーン被膜2は表面のみならず、表面の凹部
等にも形成される。 Then the structural formula (Me is a methyl group, φ is a phenyl group, n and m are integers) 3% silicone oil KF54 (manufactured by Shin-Etsu Chemical Co., Ltd.) in xylene (silicone oil/xylene x 100 = 3 %) dielectric ceramic 1 shown in FIG. At this time, the dielectric porcelain 1 is placed in a vacuum of 10 -2 torr and vacuum suction is applied, and then the porcelain 1 is immersed in a diluted solution of silicone oil in a vacuum.
Vacuum impregnation with oil. As a result, the silicone oil not only adheres to the surface of the porcelain 1 but also penetrates into the interior of the porcelain 1. Next, the vacuum-impregnated product is placed in a centrifuge to remove excess silicone oil. Next, in order to evaporate the xylene, a drying process was performed at 150°C for 30 minutes in the air, and then a baking process was performed at 500°C for 30 minutes in the air, resulting in the surface of the porcelain 1 as shown in Figure 1B. silicone coating 2 as a dielectric synthetic resin coating.
is formed to a thickness of approximately 50 to 100 Å. Although not shown in detail in FIG. 1B, since the silicone oil penetrates into the recesses and inside of the surface of the porcelain 1,
The silicone coating 2 is formed not only on the surface but also on the recesses and the like on the surface.
次にシリコーン被膜2を形成したものを、塩化
第1スズ(SnCl2)を含むセンシタイザ(増感
剤)に3〜5分間浸漬する。 Next, the silicone coating 2 formed thereon is immersed in a sensitizer containing stannous chloride (SnCl 2 ) for 3 to 5 minutes.
次に、増感処理したものを水にて洗浄し、しか
る後、塩化パラジウム(Pd Cl2)を1の水溶液
中に0.07〜0.4グラムの割合で含むアクチベータ
(活性剤)に、40〜60℃、3〜5分間浸漬して活
性化処理を行う。次に、水にて洗浄し、しかる後
80〜600℃の温度で5〜60分間熱処理を施す。こ
れにより、パラジウム膜がシリコーン被膜2に密
着する。 Next, the sensitized product was washed with water, and then added to an activator containing palladium chloride (Pd Cl 2 ) in an aqueous solution of 0.07 to 0.4 grams at 40 to 60°C. , perform the activation treatment by soaking for 3 to 5 minutes. Next, wash with water, and then
Heat treatment is performed at a temperature of 80 to 600°C for 5 to 60 minutes. This brings the palladium film into close contact with the silicone coating 2.
次に、次亜リン酸ソーダ(NaH2PO2)と硫酸ニ
ツケル(NiSO4)とを含む無電解メツキ液に前記
のセンシタイザ及びアクチベータによる処理が終
了したものを浸漬させ、2μm以上の膜厚のニツ
ケル層3を第1図Cに示す如く形成する。この無
電解メツキは次式のような化学変化でなされる。 Next, the plate that has been treated with the sensitizer and activator is immersed in an electroless plating solution containing sodium hypophosphite (NaH 2 PO 2 ) and nickel sulfate (NiSO 4 ) to form a film with a thickness of 2 μm or more. A nickel layer 3 is formed as shown in FIG. 1C. This electroless plating is performed by a chemical change as shown in the following formula.
NaH2PO2+H2O→NaH2PO3+H2
NaH2PO3+NiSO4→Ni +H2SO4+NaPO3
尚このとき前処理工程で被着されているパラジ
ウムは触媒として作用し、還示作用によりニツケ
ル層3が生成する。 NaH 2 PO 2 +H 2 O→NaH 2 PO 3 +H 2 NaH 2 PO 3 +NiSO 4 →Ni +H 2 SO 4 +NaPO 3At this time, palladium deposited in the pretreatment process acts as a catalyst and has a reducing effect. As a result, a nickel layer 3 is generated.
第1図Cに示すニツケル層3が形成されたなら
ば、200〜400℃の温度で5〜60分間の熱処理を施
す。この熱処理は大気中又は中性雰囲気(アルゴ
ン又は炭酸ガス)中で行う。加熱時間が5〜60分
間の範囲であれば、熱処理の効果が得られるが、
好ましくは30〜40分間行う。勿論熱処理を60分以
上してもよいが、熱処理の効果が殆んど向上しな
いので、時間のロスとなる。 Once the nickel layer 3 shown in FIG. 1C is formed, heat treatment is performed at a temperature of 200 to 400°C for 5 to 60 minutes. This heat treatment is performed in the air or in a neutral atmosphere (argon or carbon dioxide gas). If the heating time is in the range of 5 to 60 minutes, the effect of heat treatment can be obtained, but
Preferably it is carried out for 30 to 40 minutes. Of course, the heat treatment may be performed for 60 minutes or more, but the effect of the heat treatment is hardly improved, resulting in a loss of time.
次に、シリコーン被膜2及びニツケル層3を有
する円板状磁器1の外周面を研摩し、少なくとも
外周面のニツケル層3を除去し、第1図Dに示す
如く上面に一方の金属電極4を形成し、下面に他
方の金属電極5を形成する。一対の金属電極4,
5は勿論第1図Cのニツケル層3が残存したもの
である。 Next, the outer peripheral surface of the disk-shaped porcelain 1 having the silicone coating 2 and the nickel layer 3 is polished to remove at least the nickel layer 3 on the outer peripheral surface, and one metal electrode 4 is placed on the upper surface as shown in FIG. 1D. The other metal electrode 5 is formed on the lower surface. a pair of metal electrodes 4,
5 is, of course, what remains of the nickel layer 3 of FIG. 1C.
しかる後、必要に応じてリード線等の端子部材
(図示せず)を一対の金属電極4,5に夫々接着
し、素子を完成させる。 Thereafter, terminal members (not shown) such as lead wires are bonded to the pair of metal electrodes 4 and 5, respectively, as necessary, to complete the device.
これにより、Q=1/tanδ=2300を有し且つ特性
劣化の少ない磁器コンデンサを得ることが出来
た。 As a result, it was possible to obtain a ceramic capacitor having Q=1/tan δ=2300 and with little characteristic deterioration.
比較のために、第1図におけるシリコーン被膜
2を設けない他は、第1図と全く同じ構造の磁器
コンデンサを全く同じ方法で作つてQを求めたと
ころ、Q=200であつた。従つて、本発明によれ
ば、Qを10倍程度大きくすることができる。この
ようにQが大幅に上昇する理由は必ずしも明確で
ないが、ニツケルメツキによつて一対の金属電極
4,5を形成する際に使用される酸又はアルカリ
等の溶液が誘電体磁器1の内部に浸透するのが、
シリコーン被膜2によつて阻止されるためと思わ
れる。この場合、シリコーン被膜2は第2図に説
明的に拡大図示するように磁器1の表面の凹部6
及び微小クラツク等に浸入し、酸又はアルカリ溶
液又は水分等が磁器1に浸入又は付着するのを有
効的に阻止するのに対し、ニツケルメツキ層を磁
器1の表面に直接に設ける場合にはニツケルが凹
部6に十分に入り込むのが難しいのみならず、酸
又はアルカリ溶液が磁器内部及び凹部6に浸入し
てQを低下させるので、両者の間に大幅なQの差
が生じるものと思われる。 For comparison, a ceramic capacitor having the same structure as in FIG. 1 except that the silicone film 2 in FIG. 1 was not provided was made in exactly the same manner and Q was determined, and Q=200. Therefore, according to the present invention, Q can be increased by about 10 times. The reason why Q increases significantly in this way is not necessarily clear, but the acid or alkali solution used when forming the pair of metal electrodes 4 and 5 by nickel plating penetrates into the inside of the dielectric ceramic 1. What you do is
This seems to be because the silicone coating 2 prevents this. In this case, the silicone coating 2 is applied to the recesses 6 on the surface of the porcelain 1, as shown in an enlarged view in FIG.
In contrast, when a nickel plating layer is provided directly on the surface of the porcelain 1, nickel is Not only is it difficult to sufficiently penetrate into the recess 6, but also the acid or alkaline solution penetrates into the inside of the porcelain and into the recess 6 and lowers the Q, so it is thought that a large difference in Q occurs between the two.
実施例 2
第1図におけるシリコーン被膜2を形成するに
当つてのシリコーン・オイルの希釈度とQとの関
係を調べるために、キシレンによる希釈率のみを
0.2%から50%まで変化させ、実施例1と同様な
構造及び方法で磁器コンデンサを作り、Qを測定
したところ、第3図に示す関係が得られた。この
第3図は横軸に希釈率を示し、縦軸にQを示すも
のである。この結果から明らかなように1〜10%
の範囲でQが2000以上又はその近傍となり、また
0.2%以上から効果が現われる。Example 2 In order to investigate the relationship between the dilution degree of silicone oil and Q when forming the silicone coating 2 in FIG. 1, only the dilution rate with xylene was used.
When the Q was varied from 0.2% to 50%, a ceramic capacitor was manufactured using the same structure and method as in Example 1, and the Q was measured, and the relationship shown in FIG. 3 was obtained. In FIG. 3, the horizontal axis shows the dilution rate, and the vertical axis shows Q. As is clear from this result, 1-10%
Q is 2000 or more or around 2000 in the range of
Effects appear from 0.2% or higher.
実施例 3
第1図のシリコーン被膜2を形成する際の焼付
温度とQとの関係を調べるために、焼付温度を室
温〜600℃まで変化させて多数の磁器コンデンサ
を作り、Qを測定した。但し、実施例1における
焼付温度を変えた他は、構造及び方法を実施例1
と全く同じにして磁器コンデンサを作つた。第4
図はこの結果を示すものである。この第4図から
明らかなように、100℃〜600℃で500以上のQを
得ることが可能となり、300〜550℃の範囲で2000
以上のQを得ることが可能となる。従つて100〜
600℃の範囲でシリコーンの焼付を行うことが望
ましく、300〜550℃で焼付を行うことが一層望ま
しい。尚600℃を越えるとシリコーンが変質して
好ましい結果を得ることが難しくなり、100℃未
満になると、Qの大幅な上昇が望めなくなる。Example 3 In order to investigate the relationship between the baking temperature and Q when forming the silicone coating 2 shown in FIG. 1, a large number of ceramic capacitors were made by varying the baking temperature from room temperature to 600° C., and Q was measured. However, except for changing the baking temperature in Example 1, the structure and method were the same as in Example 1.
I made a porcelain capacitor in exactly the same way. Fourth
The figure shows this result. As is clear from Fig. 4, it is possible to obtain a Q of more than 500 in the range of 100 to 600 °C, and a Q of 2000 in the range of 300 to 550 °C.
It becomes possible to obtain the above Q. Therefore 100~
It is desirable to bake the silicone at a temperature in the range of 600°C, and it is more desirable to bake the silicone at a temperature of 300 to 550°C. If the temperature exceeds 600°C, the quality of the silicone changes, making it difficult to obtain favorable results, and if the temperature exceeds 100°C, a significant increase in Q cannot be expected.
実施例 4
前述の実施例1と同様に第5図Aに示すような
円板状誘電体磁器1を用意し、これに実施例1と
同様な方法でシリコーン被膜2を形成する。次
に、実施例1と同様にセンシタイザによる処理、
及びアクチベータによる処理を行つて、80〜600
℃の温度で5〜60分間の熱処理を施し、シリコー
ン被膜2の上にパラジウム膜を形成する。次に、
第5図Cに示すように電極を形成しない側面に耐
メツキ性被膜11を形成する。次に、実施例1と
同じ無電解メツキ法で第5図Dに示すようにニツ
ケル層による一対の金属電極4,5を形成する。
この場合、耐メツキ性被膜11を形成する前にメ
ツキの前処理が行われているので、耐メツキ性被
膜11が形成されていない部分のみにニツケル層
3が形成される。これにより、実施例1と同様に
Qが2000以上の磁器コンデンサを得ることが出来
る。Example 4 Similarly to Example 1 described above, a disk-shaped dielectric ceramic 1 as shown in FIG. 5A is prepared, and a silicone coating 2 is formed thereon in the same manner as in Example 1. Next, as in Example 1, processing using a sensitizer,
and treatment with an activator, 80 to 600
A palladium film is formed on the silicone film 2 by heat treatment at a temperature of 5 to 60 minutes. next,
As shown in FIG. 5C, a plating-resistant coating 11 is formed on the side surface on which no electrode is formed. Next, a pair of metal electrodes 4 and 5 made of nickel layers are formed using the same electroless plating method as in Example 1, as shown in FIG. 5D.
In this case, since the plating pretreatment is performed before forming the plating-resistant coating 11, the nickel layer 3 is formed only on the portion where the plating-resistant coating 11 is not formed. As a result, a ceramic capacitor having a Q of 2000 or more can be obtained as in Example 1.
以上、本発明の実施例について述べたが、本発
明は上述の実施例に限定されるものではなく、更
に変形可能なものである。例えば、第1図Cにお
けるニツケル層3をエツチングによつて選択的に
除去して、第6図に示す如くシリコーン被膜2が
全周に残存したものを形成してもよい。また第5
図Dにおける耐メツキ性被膜11を除去して第6
図に示すような構造としてもよい。また第7図に
示すような円筒形磁器1aに第1の実施例と同様
な方法でシリコーン被膜2及び一対の金属電極
4,5を設ける場合にも適用可能である。また第
8図に示す如く貫通孔12を有する板状磁器1b
に実施例1と同様にシリコーン被膜2及び一対の
金属電極4,5を設け、リード線13を結合する
ものにも適用可能である。この他種々の構造の磁
器コンデンに適用可能である。また、実施例では
KF54のシリコーン・オイルを使用したが、これ
と同様にCH3(メチル)基を有する信越化学工業
株式会社製のシリコーン・オイルKF393、及びゴ
ム状膜を得ることが出来るKS705F+PS3も使用
することが出来る。勿論この種のシリコーンに限
ることなく、金属を被着させることが可能である
と共に酸又はアルカリの溶液及び水分等の磁器内
部へ浸入を阻止することが可能である他の合成樹
脂であつてもよい。また無電解メツキによつて形
成した金属電極4,5の上に半田メツキ層等を形
成してもよい。またシリコーン被膜2を全体に設
けることが望ましいが、一方の金属電極4の下の
みに設け、他方の金属電極5の下に設けない場合
でもある程度の効果を得ることができる。また金
属電極4,5をニツケル以外の金属で形成する場
合にも適用可能である。 Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and can be further modified. For example, the nickel layer 3 in FIG. 1C may be selectively removed by etching to form a silicone coating 2 remaining around the entire circumference as shown in FIG. Also the fifth
After removing the plating-resistant coating 11 in Figure D, the sixth
A structure as shown in the figure may be used. It is also applicable to the case where a silicone coating 2 and a pair of metal electrodes 4, 5 are provided on a cylindrical ceramic 1a as shown in FIG. 7 in the same manner as in the first embodiment. Further, as shown in FIG. 8, a plate-shaped porcelain 1b having a through hole 12
It is also applicable to a structure in which a silicone coating 2 and a pair of metal electrodes 4 and 5 are provided in the same way as in Example 1, and lead wires 13 are connected. It is also applicable to porcelain condensers of various other structures. Also, in the example
KF54 silicone oil was used, but silicone oil KF393 manufactured by Shin-Etsu Chemical Co., Ltd., which similarly has a CH 3 (methyl) group, and KS705F+PS3, which can produce a rubbery film, can also be used. . Of course, it is not limited to this type of silicone, and may be any other synthetic resin that can be coated with metal and can also prevent acid or alkaline solutions and moisture from entering the interior of the porcelain. good. Further, a solder plating layer or the like may be formed on the metal electrodes 4 and 5 formed by electroless plating. Although it is desirable to provide the silicone coating 2 over the entire surface, a certain degree of effect can be obtained even if the silicone coating 2 is provided only under one metal electrode 4 and not under the other metal electrode 5. Further, the present invention is also applicable to cases where the metal electrodes 4 and 5 are formed of metals other than nickel.
第1図は本発明の実施例に係わる磁器コンデン
サを工程順に示す断面図、第2図は電極部分の拡
大断面図、第3図は実施例2におけるシリコー
ン・オイルの希釈率とQとの関係を示すグラフ、
第4図は実施例3における焼付温度とQとの関係
を示すグラフ、第5図は実施例4に係わる磁器コ
ンデンサを工程順に示す断面図、第6図、第7
図、及び第8図は変形例を夫々示す断面図であ
る。
尚図面に用いられている符号において、1は誘
電体磁器、2はシリコーン被膜、3はニツケル
層、4は一方の金属電極、5は他方の金属電極で
ある。
Fig. 1 is a sectional view showing a ceramic capacitor according to an embodiment of the present invention in order of process, Fig. 2 is an enlarged sectional view of an electrode portion, and Fig. 3 is a relationship between the dilution rate of silicone oil and Q in Embodiment 2. A graph showing,
FIG. 4 is a graph showing the relationship between baking temperature and Q in Example 3, FIG. 5 is a sectional view showing the ceramic capacitor according to Example 4 in the order of steps,
8 and 8 are cross-sectional views showing modified examples, respectively. In the symbols used in the drawings, 1 is a dielectric ceramic, 2 is a silicone coating, 3 is a nickel layer, 4 is one metal electrode, and 5 is the other metal electrode.
Claims (1)
た金属付着可能な誘電体合成樹脂被膜と、 該誘電体合成樹脂被膜上に設けられた一方の金
属電極と、 前記誘電体合成樹脂被膜又は前記誘電体磁器の
上に設けられた他方の金属電極と を具備して構成されていることも特徴とする磁器
コンデンサ。 2 前記誘導体合成樹脂被膜は、CH2基(メチル
基)を有するシリコーン被膜である特許請求の範
囲第1項記載の磁器コンデンサ。 3 前記一方の金属電極はニツケル電極であり、
前記他方の金属電極もニツケル電極である特許請
求の範囲第1項又は第2項記載の磁器コンデン
サ。 4 誘電体磁器と、該誘電体磁器の表面の全部又
は一部に固着された金属付着可能な誘電体合成樹
脂被膜と、該誘電体合成樹脂被膜上に設けられた
一方の金属電極と、前記誘電体合成樹脂被膜又は
前記誘電体磁器の上に設けられた他方の金属電極
とを具備する磁器コンデンサを製造する方法であ
つて、 前記誘電体磁器にシリコーンを含浸させるこ
と、 前記シリコーンを100℃〜600℃温度で前記誘電
体磁器に焼付けて前記誘電体合成樹脂被膜として
のシリコーン被膜を形成すること、及び 前記一方の金属電極及び前記他方の金属電極を
前記シリコーン被膜上に無電解メツキ法で形成す
ること を含むことを特徴とする磁器コンデンサの製造方
法。 5 前記シリコーンは溶剤によつて1〜10%に希
釈されたシリコーン・オイルである特許請求の範
囲第4項記載の磁器コンデンサの製造方法。[Scope of Claims] 1. Dielectric porcelain, a dielectric synthetic resin coating that is adhered to all or part of the surface of the dielectric porcelain and is capable of metal attachment, and one side provided on the dielectric synthetic resin coating. A ceramic capacitor comprising: a metal electrode; and the other metal electrode provided on the dielectric synthetic resin coating or the dielectric ceramic. 2. The ceramic capacitor according to claim 1, wherein the derivative synthetic resin film is a silicone film having CH 2 groups (methyl groups). 3. The one metal electrode is a nickel electrode,
3. The ceramic capacitor according to claim 1, wherein said other metal electrode is also a nickel electrode. 4. Dielectric ceramic, a dielectric synthetic resin coating to which metal can be attached, which is fixed to all or a part of the surface of the dielectric ceramic, one metal electrode provided on the dielectric synthetic resin coating, and the above-mentioned A method for manufacturing a ceramic capacitor comprising a dielectric synthetic resin coating or the other metal electrode provided on the dielectric porcelain, comprising: impregnating the dielectric porcelain with silicone; and heating the silicone at 100°C. baking the dielectric ceramic at a temperature of ~600°C to form a silicone film as the dielectric synthetic resin film; and applying the one metal electrode and the other metal electrode onto the silicone film by electroless plating. A method of manufacturing a ceramic capacitor, the method comprising: forming a ceramic capacitor. 5. The method of manufacturing a porcelain capacitor according to claim 4, wherein the silicone is silicone oil diluted to 1 to 10% with a solvent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2172778A JPS54114749A (en) | 1978-02-27 | 1978-02-27 | Ceramic capacitor and method of producing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2172778A JPS54114749A (en) | 1978-02-27 | 1978-02-27 | Ceramic capacitor and method of producing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54114749A JPS54114749A (en) | 1979-09-07 |
| JPS6113367B2 true JPS6113367B2 (en) | 1986-04-12 |
Family
ID=12063097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2172778A Granted JPS54114749A (en) | 1978-02-27 | 1978-02-27 | Ceramic capacitor and method of producing same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54114749A (en) |
-
1978
- 1978-02-27 JP JP2172778A patent/JPS54114749A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54114749A (en) | 1979-09-07 |
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