JPS6131059B2 - - Google Patents
Info
- Publication number
- JPS6131059B2 JPS6131059B2 JP56188168A JP18816881A JPS6131059B2 JP S6131059 B2 JPS6131059 B2 JP S6131059B2 JP 56188168 A JP56188168 A JP 56188168A JP 18816881 A JP18816881 A JP 18816881A JP S6131059 B2 JPS6131059 B2 JP S6131059B2
- Authority
- JP
- Japan
- Prior art keywords
- boat
- quartz boat
- wall
- compound semiconductor
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
【発明の詳細な説明】
本発明は化合物半導体単結晶の製造方法に関す
るものである。従来一般的に採用されている製造
方法を第1図に示す。すなわち丸形反応容器1内
に丸形横型石英ボート2を配置し、横型石英ボー
ト2内に化合物半導体例えばGaAsの融液を収容
し、単結晶を製造するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a compound semiconductor single crystal. FIG. 1 shows a conventionally commonly used manufacturing method. That is, a round horizontal quartz boat 2 is arranged in a round reaction vessel 1, and a melt of a compound semiconductor such as GaAs is contained in the horizontal quartz boat 2 to produce a single crystal.
しかし、第1図のような丸形の石英ボートを用
いた場合、でき上がつた単結晶をウエハとして切
出したとき無駄な部分が多く生じ、単結晶の利用
率が低い。 However, when a round quartz boat as shown in FIG. 1 is used, there is a lot of waste when the single crystal is cut out as a wafer, resulting in a low utilization rate of the single crystal.
そこで、第2図に示すような角形の石英ボート
を利用することが提案されている。たしかに石英
ボートを角形にし、角形の単結晶が得られれば、
ウエハとしたときの利用率は高くなるが、現実に
は困難な問題があつた。すなわち化合物半導体の
融点はかなり高く例えばGaAsでは1238℃であ
り、この融液を得るためには1238℃以上の温度に
することが必要であること。また、反応容器は経
済的にかつ内圧に耐える構造が要求されるため、
必然的に内面は円形であること。 Therefore, it has been proposed to use a square quartz boat as shown in FIG. It is true that if a quartz boat is made into a square shape and a square single crystal is obtained,
When used as wafers, the utilization rate is high, but in reality there are difficult problems. In other words, the melting point of compound semiconductors is quite high; for example, GaAs is 1238°C, and in order to obtain this melt, it is necessary to raise the temperature to 1238°C or higher. In addition, the reaction vessel must be economical and have a structure that can withstand internal pressure.
The inner surface must necessarily be circular.
さらに、横型石英ボート2は1200℃程度で軟化
することであり、結果的には製造過程で石英ボー
ト2が反応容器1の内壁にもたれかかるように垂
れ下がり変形してしまう。 Furthermore, the horizontal quartz boat 2 softens at about 1200° C., and as a result, the quartz boat 2 sags and deforms as if leaning against the inner wall of the reaction vessel 1 during the manufacturing process.
この現象は第1図の場合にも見られたが、格別
取り上げるほどではなかつたのであるが、第2図
のような角形ボートの場合には、致命的と言える
ほど変形が著るしいのであつた。 This phenomenon was also observed in the case of Figure 1, but it was not enough to warrant special attention, but in the case of the square boat shown in Figure 2, the deformation was so significant that it could be considered fatal. Ta.
また、変形をしないような新たなボートの材
質、寸法、形状等を検討する案もあるが、丸形ボ
ートでも1回ないしはせいぜい10回までの単結晶
製造で使い捨てしているため、これらとの比較か
らあまり高価なボートでは多少特性が良好でも実
用的ではない。 There is also a plan to consider new materials, dimensions, shapes, etc. for boats that do not deform, but even round boats are disposable after one or at most 10 single crystal productions, so there is no need for these. Comparatively speaking, very expensive boats may have somewhat good characteristics but are not practical.
他方、単結晶ウエハは近年ますます大形のもの
が要望されており、角形ボートによる大形単結晶
製造が実現できれば大きな成果である。 On the other hand, there has been a demand for larger single crystal wafers in recent years, and it would be a great achievement if large single crystal production using a square boat could be realized.
本発明は斯かる状況に鑑み、製造過程で角形石
英ボートが変形を生じることのない化合物半導体
単結晶の製造方法を提供することを目的とする。 In view of this situation, the present invention aims to provide a method for manufacturing a compound semiconductor single crystal in which the prismatic quartz boat is not deformed during the manufacturing process.
本発明の構成を、一実施例を示す第3図を参照
して具体的に説明する。 The configuration of the present invention will be specifically explained with reference to FIG. 3 showing one embodiment.
第3図において、1は丸形反応容器であり、該
反応容器1内に角形の横型石英ボート2を配置
し、該横型石英ボート2内には化合物半導体融液
3を収容する。 In FIG. 3, reference numeral 1 denotes a round reaction vessel, within which a rectangular horizontal quartz boat 2 is arranged, and within the horizontal quartz boat 2 a compound semiconductor melt 3 is accommodated.
反応容器1の内壁と横型石英ボート2の外壁と
の間には断熱性変形防止具4を設ける。 A heat insulating deformation prevention device 4 is provided between the inner wall of the reaction vessel 1 and the outer wall of the horizontal quartz boat 2.
変形防止具4の構造は、使用するボートの寸法
形状に合わせた方が良いことは当然であり、例え
ば第2図に示すような角形ボートに対しては、ボ
ート開口端の広がりを防止するため特にボート両
側に変形防止手段を設け、さらに底壁の垂れ下が
りを防止するために、ボート下部にも変形防止手
段を設ける。 It goes without saying that the structure of the deformation prevention device 4 should be matched to the size and shape of the boat being used.For example, for a square boat as shown in Fig. 2, it is necessary to adjust the structure of the deformation prevention device 4 to prevent the opening end of the boat from widening. In particular, deformation prevention means are provided on both sides of the boat, and deformation prevention means are also provided at the bottom of the boat to prevent the bottom wall from sagging.
第3図はボートの側面及び底面の双方の変形を
防止するため、これを一体化したものである。 In Figure 3, the sides and bottom of the boat are integrated to prevent deformation of both sides.
材質としては耐熱性、純度、化学的安定性等の
理由から石英が最も便利であるが、上記特性を満
足している他の材質、例えばグラフアイト、窒化
ホウ素、アルミナ等でも良い。 Quartz is the most convenient material for reasons such as heat resistance, purity, and chemical stability, but other materials satisfying the above characteristics, such as graphite, boron nitride, alumina, etc., may also be used.
ただし、熱伝導率が10-2cal/cm・deg・sec以
下であることが望ましく、10-1cal/cm・deg・
sec以上の熱の良導体は回避する必要がある。こ
れは化合物半導体融液の上方と下方(側方)とで
熱伝導率に大きな差があると、得られる単結晶の
特性に悪い影響を及ぼすからであり、変形防止具
4は断熱性であることが単結晶の特性確保の上で
必要である。 However, it is desirable that the thermal conductivity is 10 -2 cal/cm・deg・sec or less, and 10 -1 cal/cm・deg・sec.
Good conductors of heat of sec or more must be avoided. This is because if there is a large difference in thermal conductivity between the upper part and the lower part (side) of the compound semiconductor melt, it will have a negative effect on the properties of the obtained single crystal, and the deformation prevention tool 4 has a heat insulating property. This is necessary to ensure the properties of the single crystal.
以下に本発明の実験例を用いて詳しく説明す
る。 The present invention will be explained in detail below using experimental examples.
〔実験例〕
結晶成長炉は横型石英ボートを収容し、かかる
ボート内でGaAs融液を生成せしめる高温炉及び
As圧力を制御する低温炉とからなる二温度帯式
を用いた。横型石英ボートは第3図に示すように
横断面角形形状のものであり、開口端の幅が60
mm、深さ30mm、全長280mmであり、肉厚は全体が
ほぼ等しく2mmである。ボート外周には変形防止
具として内壁形状が横型石英ボート外壁形状とほ
ぼ等しく、外壁形状が反応容器内壁形状とほぼ等
しい石英製のものを設置した。石英ボートと変形
防止具の熱圧着を防止するための石英ボートおよ
び変形防止具の双方をサンドブラスト処理した。
石英反応容器の一端に、Ga800gとドーパントと
してのSi160mgと種結晶を設置した上記形状の石
英ボートを上記したボートの変形防止具の中に入
れ、設置する。他端にAs880gを入れ、5×
10-6torr以下で真空引きした後封じ切つて上記電
気炉内に設置した。低温炉は約610℃に保ち、石
英反応容器内のAsの圧力を1atmに保つ。高温炉
は1200℃付近でGaAs合成反応を行ない、さらに
昇温して種結晶部分1238℃GaAs融液中の成長軸
方向における温度勾配を0.5℃/cmに調整した
後、種付けを行ない1.7℃/hrの速度で降温、20
時間で全体を固化させた。その後約100℃/hrの
速度で室温まで冷却し、結晶を取り出した。以上
の結果長さ280mmのGaAs単結晶1640gが得られ
た。成長後ボートを取り出して見たところ全く変
形は起らなかつた。[Experiment example] The crystal growth furnace accommodates a horizontal quartz boat, and a high-temperature furnace and a GaAs melt are produced in the boat.
A two-temperature zone system consisting of a low-temperature furnace to control the As pressure was used. The horizontal quartz boat has a rectangular cross section as shown in Figure 3, and the width of the opening end is 60 mm.
mm, depth 30mm, total length 280mm, and the wall thickness is approximately equal throughout, 2mm. On the outer periphery of the boat, a quartz device was installed as a deformation prevention device whose inner wall shape was almost the same as the outer wall shape of the horizontal quartz boat and whose outer wall shape was almost the same as the inner wall shape of the reaction vessel. Both the quartz boat and the deformation prevention device were sandblasted to prevent thermal compression bonding between the quartz boat and the deformation prevention device.
A quartz boat having the shape described above, in which 800 g of Ga, 160 mg of Si as a dopant, and a seed crystal are installed at one end of the quartz reaction vessel, is placed in the deformation prevention tool of the boat described above. Put 880g of As into the other end, 5x
After evacuating to 10 -6 torr or less, it was sealed and placed in the electric furnace. The low temperature furnace is maintained at approximately 610°C, and the As pressure in the quartz reaction vessel is maintained at 1 atm. The high-temperature furnace performs the GaAs synthesis reaction at around 1200℃, and then further raises the temperature to adjust the temperature gradient in the growth axis direction of the seed crystal to 1238℃ to 0.5℃/cm, and then performs seeding to 1.7℃/cm. Cooling down at a rate of 20 hr
The whole thing solidified in time. Thereafter, it was cooled to room temperature at a rate of about 100°C/hr, and the crystals were taken out. As a result of the above, 1640 g of GaAs single crystal with a length of 280 mm was obtained. When I took out the boat after it had grown and looked at it, no deformation had occurred at all.
電気炉、ボート形状、原料設置量、成長条件は
実験例と同じにし、ボート変形防止具を設置しな
いでGaAs結晶を成長させたところ、1回の成長
でボート開口端の幅は約10mm広がり、ボート底壁
は、ボート長手方向の中央部で約10mm垂れ下がつ
た。
The electric furnace, boat shape, amount of raw materials installed, and growth conditions were the same as in the experimental example, and when GaAs crystal was grown without installing a boat deformation prevention device, the width of the boat opening widened by about 10 mm in one growth. The bottom wall of the boat sagged approximately 10 mm at the center of the boat's longitudinal direction.
この結果得られた結晶は途中から多結晶化し、
目的の単結晶が得られなかつた。また、当然のこ
とながら、このボートの2回目以降の使用は不可
能であつた。 The resulting crystal becomes polycrystalline from the middle,
The desired single crystal could not be obtained. Also, as a matter of course, it was impossible to use this boat a second time or later.
なお、本発明についてこれまでボートのうち特
に融液が位置する部分の変形防止についてのみ説
明したが、ボート底面より高い位置に底面外壁を
有する種結晶台の周囲にも変形防止具を用いるこ
とを妨げるものではない。 Although the present invention has been described so far only to prevent deformation of the part of the boat where the melt is located, it is also possible to use the deformation prevention device around the seed crystal stand, which has an outer bottom wall at a position higher than the bottom of the boat. It's not a hindrance.
以上の説明から明らかなように、本発明の製造
方法によれば、横型石英ボートの変形をほぼ完全
に防止でき、従つて安価な厚い肉厚の石英ボート
でも繰り返し実用でき、しかも融液との反応等に
より石英ボートが消耗したときは、変形防止具は
そのままとして石英ボートのみを交換すれば良く
極めて経済的である。また、従来変形が著しく問
題のあつた角形石英ボートの使用が可能となり、
大サイズ単結晶の製造が容易になるものである。 As is clear from the above explanation, according to the manufacturing method of the present invention, deformation of horizontal quartz boats can be almost completely prevented, and even inexpensive thick-walled quartz boats can be used repeatedly. When the quartz boat is worn out due to a reaction or the like, it is only necessary to replace the quartz boat while leaving the deformation prevention device as is, which is extremely economical. In addition, it is now possible to use square quartz boats, which previously had problems with deformation.
This facilitates the production of large-sized single crystals.
なお、本発明は角形石英ボートの実用化を目的
としたものであるが、角形とは言えないまでも底
面の平坦なボートは従来同様の問題をかかえてお
り、これらに対して本発明は有効なものである。 Although the present invention is intended to put square quartz boats into practical use, boats with flat bottoms, although not square, have the same problems as conventional boats, and the present invention is effective against these. It is something.
第1図及び第2図は従来の化合物半導体単結晶
の製造方法を示す横断面図であり、第3図は本発
明の一実施例を示す横断面図である。
1……反応容器、2……横型石英ボート、3…
…化合物半導体融液、4……変形防止具。
1 and 2 are cross-sectional views showing a conventional compound semiconductor single crystal manufacturing method, and FIG. 3 is a cross-sectional view showing an embodiment of the present invention. 1...Reaction vessel, 2...Horizontal quartz boat, 3...
...Compound semiconductor melt, 4...Deformation prevention tool.
Claims (1)
置して該横型石英ボート内に収容した化合物半導
体融液から単結晶を得る方法において、前記石英
ボートとして底面が平担なボートを用い、前記反
応容器内壁と前記石英ボート外壁との間に、前記
石英ボートの変形を防止するための断熱性変形防
止具を前記石英ボート外壁の全面と接するように
設けることを特徴とする化合物半導体単結晶の製
造方法。 2 前記横型石英ボートの内壁横断面形状が概略
台形であることを特徴とする第1項記載の化合物
半導体結晶の製造方法。[Scope of Claims] 1. A method for obtaining a single crystal from a compound semiconductor melt contained in a horizontal quartz boat by disposing a horizontal quartz boat in a reaction vessel having a circular cross section, wherein the quartz boat has a flat bottom surface. A boat is used, and a heat insulating deformation prevention device for preventing deformation of the quartz boat is provided between the inner wall of the reaction vessel and the outer wall of the quartz boat so as to be in contact with the entire surface of the outer wall of the quartz boat. A method for manufacturing compound semiconductor single crystals. 2. The method for manufacturing a compound semiconductor crystal according to item 1, wherein the cross-sectional shape of the inner wall of the horizontal quartz boat is approximately trapezoidal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18816881A JPS5891095A (en) | 1981-11-24 | 1981-11-24 | Method for manufacturing compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18816881A JPS5891095A (en) | 1981-11-24 | 1981-11-24 | Method for manufacturing compound semiconductor single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5891095A JPS5891095A (en) | 1983-05-30 |
| JPS6131059B2 true JPS6131059B2 (en) | 1986-07-17 |
Family
ID=16218936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18816881A Granted JPS5891095A (en) | 1981-11-24 | 1981-11-24 | Method for manufacturing compound semiconductor single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5891095A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6147077U (en) * | 1984-08-31 | 1986-03-29 | 日立電線株式会社 | Gallium arsenide single crystal production equipment |
| JPH0761916B2 (en) * | 1986-05-26 | 1995-07-05 | 住友電気工業株式会社 | Crystal growth boat |
| JP2760819B2 (en) * | 1988-11-19 | 1998-06-04 | 三菱化学株式会社 | Method and apparatus for manufacturing compound semiconductor by boat growth method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57200297A (en) * | 1981-06-02 | 1982-12-08 | Sumitomo Electric Ind Ltd | Preparation of gaas single crystal with low dislocation density |
-
1981
- 1981-11-24 JP JP18816881A patent/JPS5891095A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5891095A (en) | 1983-05-30 |
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