JPS6144949B2 - - Google Patents
Info
- Publication number
- JPS6144949B2 JPS6144949B2 JP11598578A JP11598578A JPS6144949B2 JP S6144949 B2 JPS6144949 B2 JP S6144949B2 JP 11598578 A JP11598578 A JP 11598578A JP 11598578 A JP11598578 A JP 11598578A JP S6144949 B2 JPS6144949 B2 JP S6144949B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- titanium oxide
- tio
- tat
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 53
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 38
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 34
- 239000010409 thin film Substances 0.000 claims description 31
- -1 alkyl titanate Chemical compound 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000010931 gold Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 229910052709 silver Inorganic materials 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 15
- 229910052737 gold Inorganic materials 0.000 claims description 13
- 239000004332 silver Substances 0.000 claims description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 150000004706 metal oxides Chemical class 0.000 claims description 8
- 150000001414 amino alcohols Chemical class 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 29
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 238000000576 coating method Methods 0.000 description 12
- 238000002834 transmittance Methods 0.000 description 11
- 229910001316 Ag alloy Inorganic materials 0.000 description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 235000019441 ethanol Nutrition 0.000 description 7
- 229910001020 Au alloy Inorganic materials 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910003437 indium oxide Inorganic materials 0.000 description 5
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229910002696 Ag-Au Inorganic materials 0.000 description 1
- 229910017944 AgâCu Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000009920 chelation Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Chemically Coating (AREA)
- Inorganic Insulating Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
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The present invention relates to a method for treating a titanium oxide film, and more particularly to a method for treating a titanium oxide film formed from an alkyl titanate. Titanium oxide films are used as high refractive index dielectric films in various fields such as surface antireflection films for glass products, transparent conductive films, selective light transmitting films, insulating films for chemical capacitors, and surface modification films for organic base materials. It has been applied in Generally, methods for constructing titanium oxide films in this field include physical methods such as vacuum evaporation and sputtering, and chemical methods such as anodization, thermal oxidation, and coating with organic titanates. Targeted film forming means is a promising method in terms of ease of equipment and operation, and economical efficiency. By the way, when a titanium oxide film formed from such alkyl titanate is used as a component of a transparent conductive film, a selective light transmitting film, etc.,
Depending on the field of use, further improvement in visible light transmittance is required. The present inventor conducted intensive research to improve the drawbacks of such a titanium oxide film, and found that by treating it with a specific amino compound or amino alcohol compound, the visible light transmittance was greatly improved. The present invention was achieved by discovering that the infrared reflectance of the infrared rays does not decrease. That is, the present invention provides a titanium oxide film formed from 1 alkyl titanate according to the following general formulas () and (). [However, in the above two formulas, R represents a hydrogen atom or a methyl group, n is an integer of 1 to 5, and m is 1 to 3.
represents an integer. ] A method for treating a titanium oxide film, comprising contact treatment with at least one compound selected from the group consisting of amino compounds and aminoalcohol compounds represented by: 2. The processing method according to item 1 above, wherein the titanium oxide film is provided on at least one metal thin film and/or metal oxide thin film provided on the molded product substrate A, and 3. The titanium oxide film is formed The above is a transparent high refractive index dielectric thin film layer B provided on the object substrate A, and a high refractive index dielectric thin film layer D further provided on the metal thin film layer C containing silver and/or gold as a main component. Second
This is the processing method described in the section. The titanium oxide thin film layer in the method of the present invention is provided using a solution of a solute containing an alkyl titanate as a main component, usually an organic solvent solution. Examples of alkyl titanates include tetraalkyl titanates and/or condensates thereof. The alkyl group of the tetraalkyl titanate is not particularly limited, and examples thereof include ethyl, propyl, isopropyl, butyl, 2-ethylhexyl, stearyl, and the like, among which propyl and butyl are preferably used. These condensates are obtained by condensing two or more tetraalkyl titanates. For example, the expression [However, in the formula, R represents an alkyl group, and m is a positive integer. ] It is a compound represented by the following or a mixture thereof, and from the viewpoint of ease of handling, m is preferably 10 or less. In particular, dimers, tetramers, decamers, etc. of tetra-n-butyl titanate and tetrapropyl titanate are preferably used from the viewpoint of coatability. The titanium oxide thin film according to the present invention can be formed by dissolving a predetermined amount of the alkyl titanate in a solvent and applying a solution obtained on the molded substrate, followed by drying and heat treatment. The molded substrate used may be a molded product of a transparent organic polymer material; a molded product of an inorganic material such as glass or metal oxide; or a composite of both; however, depending on the industrial productivity. From this point of view, it is preferable to use an organic polymer substance, and in particular, a film-like material is preferable. In particular, polyethylene terephthalate film, nylon film, polycarbonate film, polyethylene film, etc. are practically preferred. The solvent used in the coating solution should have solute solubility and evaporability (preferably boiling point below 150â)
and inertness (does not inactivate the three-dimensional reticulation reaction by reacting with the solute). n-heptane, cyclohexane, toluene,
Hydrocarbons such as xylene, general-purpose solvents such as ethyl alcohol, isopropyl alcohol, butanol, or mixed solvents thereof are particularly preferred. In the present invention, since water plays an effective role in promoting three-dimensional reticulation of the coating film, a small amount of water may be present in the coating solution. In addition, in order to obtain stability of the coating solution, acetylacetone, acetoacetate, diacetone alcohol, lactic acid, glycolic acid, etc. should be added to the above solution.
It is also effective to add a known chelating agent such as an oxyacid. Particularly when the alcoholic solvent contains a small amount of water, the addition of the chelating agent is particularly effective in suppressing hydrolysis of the coating solution and improving coating properties and storage stability. The coating method is not particularly limited, and can be a general method, that is, applying a solution diluted with a solvent, or a general coating method such as a dipping method, a spray method, a spinner method, or a machine coating method such as gravure coating. I can do it. The amino compound used in the present invention has the general formula:
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[Formula] (wherein R is a hydrogen atom or a methyl group, n is 1 to 5), and amino alcohol is
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ã«èšãããIt is represented by the formula: (wherein R is the same as defined above and m is an integer of 1 to 3).
These compounds generally have the ability to strongly coordinate with various metals. In the present invention, the function of improving transmittance by treatment with such an amino compound is not clear, but when forming a titanium oxide layer by a network reaction of alkyl titanate, it is possible to It is thought that chelation of the amine or amino alcohol is involved. Preferably used amino compounds include ethylenediamine, diethyltriamine, triethylenetetramine, and tetraethylenepentamine, and aminoalcohols include ethanolamine, diethanolamine, and triethanolamine. Treatment methods with such amino compounds or amino alcohols generally include coating or spraying a solution of the compound dissolved in water or an organic solvent, or
It can also be done by immersing it in a solution. Of course, it is better to remove the excess amino compound and solvent by washing or drying after treatment. The organic solvent used for treatment may be any organic solvent as long as it dissolves the amino compound and can be easily removed by drying, washing, etc. after treatment. Suitable examples include methanol, ethanol, n-propanol, isopropanol,
Alcohols such as butanol, ethyl ether,
Chain and cyclic ethers such as propyl ether and tetrahydrofuran; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; esters such as ethyl acetate, butyl acetate and isobutyl acetate; carbonized halides such as methylene chloride, chloroform and carbon tetrachloride; Examples include hydrogen. Solution concentration is not particularly limited, but is generally 0.1%~
20%, preferably a range of 0.5% to 10% is used. If it is less than that, there is no treatment effect, and if it is more than that, there is no effect of increasing the concentration. Processing temperature is room temperature ~ 80â
â, preferably in the range of room temperature to 50 â is generally used. The method for treating a titanium oxide film of the present invention exhibits remarkable effects when the titanium oxide film defined by the present invention is applied to a transparent conductive film or a selectively transparent film. Examples of the light-transmissive film include those in which at least one thin film of metal or metal oxide is laminated on a molded substrate. For example, (a) molded product substrate/titanium oxide film; (b) molded product substrate/metal or metal oxide film/titanium oxide film; (c) molded product substrate/titanium oxide film/metal or metal oxide film (d) Examples include structures such as molded product substrate/metal oxide film/metal film/titanium oxide film. In the above configuration, if the titanium oxide film is exposed on the surface, the contact treatment may be performed as is, but if the titanium oxide film is inside, it is preferable to perform the contact treatment after the titanium oxide film is formed, and then further perform the contact treatment. It is preferable to form a film. Materials for the metal film used in each of the above configurations include gold, silver, copper, aluminum, nickel, palladium, etc. alone or an alloy of two or more, preferably gold, silver, or a main component of these. Gold, silver alone, or an alloy thereof is particularly preferred. Examples of metal oxides include titanium oxide, zirconium oxide, bismuth oxide, tin oxide, and indium oxide, with indium oxide and tin oxide being preferred, and indium oxide being particularly preferred. Therefore, preferred laminates to which the present invention is applied include the following, where the titanium oxide film formed from alkyl titanate is TiO 2 (TAT) and the molded substrate is Base. (a)-(1) Base/TiO 2 (TAT), (b)-(1) Base/Ag or Ag alloy/TiO 2 (TAT), (b)-(2) Base/Au or Au alloy/TiO 2 (TAT), (b)â(3) Base/Indium oxide/TiO 2
(TAT), (c)-(1) Base/TiO 2 (TAT)/Ag or Ag alloy, (c)-(2) Base/TiO 2 (TAT)/Au or Au alloy, (d)-(1 ) BaseïŒTiO 2 (TAT)ïŒAg or Ag alloyïŒTiO 2 (TAT) (d)â(2) BaseïŒTiO 2 (TAT)ïŒAu or Au alloyïŒTiO 2 (TAT), (d)â( 3) Base/TiO 2 /Ag or Ag alloy/TiO 2
(TAT), (d)â(4) Base/TiO 2 /Au or Au alloy/TiO 2
(TAT), (d)-(5) Base/TiO 2 (TAT)/Ag or Ag alloy/TiO 2 , (d)-(6) Base/TiO 2 (TAT)/Au or Au alloy/TiO 2 above In (d)-(1) to (d)-(6), molded product substrate A/
This corresponds to the structure of high refractive index dielectric thin film layer B/metal thin film layer C/high refractive index dielectric thin film layer D, but in this structure, high refractive index dielectric thin film B or D is formed by vacuum deposition, sputtering, etc. In addition to titanium oxide, zirconium oxide, bismuth oxide,
Examples include zinc sulfide, tin oxide, and indium oxide, and among these, titanium oxide is preferred. Among these films, the high refractive index dielectric thin films B and D have a thickness of 50 to 1000 Ã
, preferably 100 to 500 Ã
,
The metal thin film C has a thickness of 30 to 500 Ã
, preferably 50 to 200 Ã
. Among the various laminates mentioned above, the most preferable one is TiO 2 (TAT) as a high refractive index dielectric thin film layer B on a transparent molded substrate A, a metal or alloy thin film layer C, and a high refractive index dielectric. TiO2 as thin film layer D
(TAT), and it is preferable to apply the present invention to this multilayer laminate. A particularly preferable example of such a laminate is represented by (B)/(C)/(D) as follows. (d)â(7) TiO 2 (TAT)/Ag/TiO 2 (TAT) (d)â(8) TiO 2 (TAT)/Au/TiO 2 (TAT) (d)â(9) TiO 2 ( TAT)/Ag-Cu/ TiO2
(TAT) (d)â(10) TiO 2 (TAT)/AgâAu/TiO 2
(TAT) (d)-(11) TiO 2 (TAT)/AgS-containing Ag or Ag alloy/TiO 2 (TAT) According to the present invention, the above-mentioned laminate whose optical performance has been improved can further be protected on the surface. By adding a coating, its practicality can be further enhanced. The selective light transmitting laminate thus obtained can be used for freezing and refrigerating cases, windows of buildings and ordinary homes, greenhouses, etc. due to its excellent transmittance and heat ray reflecting ability. A more specific explanation of the present invention will be given below using Examples. In the Examples, the light transmittance is a value at a wavelength of 500 nm unless otherwise specified. The infrared reflectance is measured by attaching a reflectance measurement device to a Hitachi EPI-type infrared spectrometer and measuring the reflectance of a slide glass with a sufficiently thick layer of vacuum-deposited silver (approximately 3000 Ã
).
Measurements were made at 10ÎŒ unless otherwise specified as 100%. Examples 1 to 2 Transparent molded substrate A is a biaxially stretched polyethylene terephthalate film with a light transmittance of 86% and a film thickness of 50 ÎŒm, and a titanium oxide thin film layer with a thickness of 300 Ã
as layer B.
A thin film layer of silver and copper alloy (92% by weight, 8% by weight of copper) with a thickness of 170 Ã
as the C layer and a titanium oxide thin film layer with a thickness of 300 Ã
as the D layer were sequentially laminated,
A laminate having selective light transmittance was obtained. The titanium oxide thin film layer is made of 3 parts of tetrabutyl titanate and 97 parts of isopropyl alcohol.
Coat a solution consisting of 3 parts with a bar coater at 120â.
Heat and set for a minute. The metal thin film layer was formed by vacuum deposition using a resistance heating method using a silver-copper alloy (70% silver, 30% copper). The content of butyl groups contained in the titanium oxide thin film layer was determined to be 4.5% by the mass fragment graphics method (Mass No. 56). The visible light transmittance (0.5Ό) of the obtained film is
The infrared reflectance of 4Ό, 6Ό and 10Ό was 98%, 97% and 98%, respectively. The obtained film was heated to 20°C and 50°C in an ethylenediamine 0.5 mol/isopropanol solution.
Each sample was immersed in a 0.3 mol triethanolamine/isopropanol solution for 10 minutes, then thoroughly washed with water and dried to observe changes in optical properties. Table 1 shows the results.
I wrote it down.
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éé
æ§ãæããç©å±€äœãæ¯èŒã®ããã«20âïŒ50âã«èš
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åŠ
ç¹æ§ã®å€åã衚ïŒã«èšããã[Table] Comparative Examples 1 to 2 For comparison, a laminate with selective light transmittance formed in the same manner as in Example 1 was immersed in water and isopropanol set at 20°C and 50°C for 10 minutes, and the optical properties were measured. The changes are shown in Table 2.
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åŠçç¹æ§ã®åäžã¯
ã¿ãããªãã€ãã
宿œäŸ ïŒãïŒ
éå±èè局ãåã170â«ã®éïŒéåéïŒéïŒ
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ïŒé93ééïŒ
ïŒã§æ§æãã以å€ã¯å®æœäŸïŒ
ãšåæ§ã®æ¹æ³ã§éžæå
ééæ§ç©å±€äœãåŸããéïŒ
éåéãããªãéå±èèå±€ã¯éïŒéåéïŒéïŒé
éïŒ
ïŒé93ééïŒ
ïŒãã¿ãŒã²ãããšããäœæž©ãã°
ãããã³ã¹ãã¿ãªã³ã°ã§èšããã
åŸããããã€ã«ã ã®å¯èŠå
ééçã¯77ïŒ
ã§ãã
èµ€å€åå°çã¯95ïŒ
ã§ãã€ãã
åŸããããã€ã«ã ã20âïŒ50âã«èšå®ãããšã
ã¬ã³ãžã¢ãã³0.5molïŒã€ãœãããããŒã«æº¶æ¶²ïŒ
ããªãšãã¬ã³ããã©ãã³0.3molïŒãšã¿ããŒã«æº¶
æ¶²ã«10åéæµžæŒ¬ããã®åŸããæ°ŽæŽããã®ã¡ä¹Ÿç¥ã
ããŠå
åŠç¹æ§ã®å€åãèŠããçµæã衚ïŒã«èšã
ãã[Table] As seen in Comparative Examples 1 and 2, when treated simply with water or alcohol, no improvement in optical properties was observed. Examples 3 to 4 Metal thin film layer C was made of gold and silver alloy (gold 7) with a thickness of 170 Ã
.
Example 1 except that the composition was composed of silver (93% by weight)
A selective light transmitting laminate was obtained in the same manner as above. Money,
The metal thin film layer made of a silver alloy was formed by low-temperature magnetron sputtering targeting gold and a silver alloy (7% by weight of gold, 93% by weight of silver). The visible light transmittance of the obtained film was 77% and the infrared reflectance was 95%. The obtained film was heated to 20â and 50â in ethylenediamine 0.5mol/isopropanol solution.
It was immersed in a 0.3 mol triethylenetetramine/ethanol solution for 10 minutes, then thoroughly washed with water, and then dried to observe changes in optical properties. The results are shown in Table 3.
ã衚ã
æ¯èŒäŸ ïŒãïŒ
宿œäŸïŒãšåæ§ã®æ¹æ³ã§åœ¢æãããéžæå
éé
æ§ãæããç©å±€äœãæ¯èŒã®ããã«ã20âïŒ50âã«
èšå®ãããšã¿ããŒã«ïŒã€ãœãããããŒã«ã«10åé
浞挬ãå
åŠç¹æ§ã®å€åãèŠãã
çµæã衚ïŒã«èšãã[Table] Comparative Examples 3 to 4 For comparison, a laminate with selective light transmittance formed in the same manner as in Example 3 was immersed in ethanol and isopropanol set at 20°C and 50°C for 10 minutes. I saw a change in characteristics. The results are shown in Table 4.
ã衚ã
衚ïŒã«èŠãããæ§ã«ãšã¿ããŒã«ïŒã€ãœãããã
ãŒã«ã§åŠçããã ãã§ã¯å
åŠç¹æ§ã«äœãæå¹ãªå¹
æã¯èŠãããªãã€ãã[Table] As shown in Table 4, treatment with ethanol and isopropanol alone did not have any effective effect on optical properties.
Claims (1)
ã³èãäžèšäžè¬åŒïŒïŒåã³ïŒïŒ ãäœãäžèšïŒåŒäžãïŒ²ã¯æ°ŽçŽ åååã¯ã¡ãã«åº
ã衚ãããïœã¯ïŒãïŒã®æŽæ°ïŒïœã¯ïŒãïŒã®æŽæ°
ã衚ãããã ã§è¡šããããã¢ããååç©åã³ã¢ããã¢ã«ã³ãŒ
ã«ååç©ãããªã矀ããéžã°ããå°ãªããšãïŒçš®
ã®ååç©ã§æ¥è§ŠåŠçããããšãç¹åŸŽãšããé žåã
ã¿ã³èã®åŠçæ¹æ³ã ïŒ è©²é žåãã¿ã³èãæåç©åºæ¿ïŒ¡äžã«èšããã
ãå°ãªããšãäžå±€ã®éå±èèåã³ïŒåã¯éå±é žå
ç©èèäžã«èšããããŠããç¹èš±è«æ±ã®ç¯å²ç¬¬ïŒé
èšèŒã®åŠçæ¹æ³ã ïŒ è©²é žåãã¿ã³èãæåç©åºæ¿ïŒ¡äžã«èšããã
ãéæé«å±æçèªé»äœèè局ïŒéåã³ïŒåã¯é
ãäž»æåãšããéå±èè局ã®äžã«æŽã«èšããã
ãé«å±æçèªé»äœèè局ã§ããç¹èš±è«æ±ã®ç¯å²
第ïŒé èšèŒã®åŠçæ¹æ³ã[Claims] 1. A titanium oxide film formed from an alkyl titanate is formed by the following general formulas () and (). [However, in the above two formulas, R represents a hydrogen atom or a methyl group, n represents an integer of 1 to 5, and m represents an integer of 1 to 3. ] A method for treating a titanium oxide film, comprising contact treatment with at least one compound selected from the group consisting of amino compounds and aminoalcohol compounds represented by: 2. The processing method according to claim 1, wherein the titanium oxide film is provided on at least one metal thin film and/or metal oxide thin film provided on the molded product substrate A. 3. A transparent high refractive index dielectric thin film layer B on which the titanium oxide film is provided on the molded product substrate A, and a high refractive index dielectric film further provided on the metal thin film layer C containing silver and/or gold as a main component. The treatment method according to claim 2, wherein the body thin film layer D is a body thin film layer D.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11598578A JPS5542265A (en) | 1978-09-22 | 1978-09-22 | Titanium oxide film treating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11598578A JPS5542265A (en) | 1978-09-22 | 1978-09-22 | Titanium oxide film treating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5542265A JPS5542265A (en) | 1980-03-25 |
| JPS6144949B2 true JPS6144949B2 (en) | 1986-10-06 |
Family
ID=14676014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11598578A Granted JPS5542265A (en) | 1978-09-22 | 1978-09-22 | Titanium oxide film treating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5542265A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57188929U (en) * | 1981-05-25 | 1982-11-30 | ||
| JP2824749B2 (en) * | 1994-07-15 | 1998-11-18 | ç³åç£æ¥æ ªåŒäŒç€Ÿ | Surface-modified titanium oxide film, method for producing the same, and photoelectric conversion element using the same |
| JP4620990B2 (en) * | 2004-09-17 | 2011-01-26 | åœç«å€§åŠæ³äººäº¬éœå€§åŠ | Metal oxide nanocrystal and method for producing the same |
| WO2009104695A1 (en) * | 2008-02-22 | 2009-08-27 | äœåååŠæ ªåŒäŒç€Ÿ | Method for producing transparent conductive substrate |
-
1978
- 1978-09-22 JP JP11598578A patent/JPS5542265A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5542265A (en) | 1980-03-25 |
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