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JPS6149594B2 - - Google Patents
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JPS6149594B2 - - Google Patents

Info

Publication number
JPS6149594B2
JPS6149594B2 JP59136750A JP13675084A JPS6149594B2 JP S6149594 B2 JPS6149594 B2 JP S6149594B2 JP 59136750 A JP59136750 A JP 59136750A JP 13675084 A JP13675084 A JP 13675084A JP S6149594 B2 JPS6149594 B2 JP S6149594B2
Authority
JP
Japan
Prior art keywords
nitrogen gas
nitrogen
liquid
rectification column
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59136750A
Other languages
Japanese (ja)
Other versions
JPS6115070A (en
Inventor
Akira Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Sanso Co Ltd
Original Assignee
Daido Sanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Sanso Co Ltd filed Critical Daido Sanso Co Ltd
Priority to JP13675084A priority Critical patent/JPS6115070A/en
Publication of JPS6115070A publication Critical patent/JPS6115070A/en
Publication of JPS6149594B2 publication Critical patent/JPS6149594B2/ja
Granted legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04636Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a hybrid air separation unit, e.g. combined process by cryogenic separation and non-cryogenic separation techniques
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04248Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
    • F25J3/04254Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
    • F25J3/0426The cryogenic component does not participate in the fractionation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/50Processes or apparatus using separation by rectification using multiple (re-)boiler-condensers at different heights of the column
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/74Refluxing the column with at least a part of the partially condensed overhead gas
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00Processes or apparatus using other separation and/or other processing means
    • F25J2205/60Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2210/00Processes characterised by the type or other details of the feed stream
    • F25J2210/42Nitrogen
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00Processes characterised by the type or other details of the product stream
    • F25J2215/42Nitrogen or special cases, e.g. multiple or low purity N2
    • F25J2215/44Ultra high purity nitrogen, i.e. generally less than 1 ppb impurities
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00Processes characterised by the type or other details of the product stream
    • F25J2215/50Oxygen or special cases, e.g. isotope-mixtures or low purity O2

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Description

【発明の詳細な説明】 〔技術分野〕 この発明は、高純度窒素ガス製造装置に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a high purity nitrogen gas production apparatus.

〔背景技術〕[Background technology]

電子工業では極めて多量の窒素ガスが使用され
ているが、部品精度維持向上の観点から窒素ガス
の純度について厳しい要望をだしてきている。す
なわち、窒素ガスは、一般に、空気を原料とし、
これを圧縮機で圧縮したのち、吸着筒に入れて炭
酸ガスおよび水分を除去し、さらに熱交換器を通
して冷媒と熱交換させて冷却し、ついで精留塔で
深冷液化分離して製品窒素ガスを製造し、これを
前記の熱交換器を通して常温近傍に昇温させると
いう工程を経て製造されている。しかしながら、
このようにして製造される製微窒素ガスには、酸
素が不純分として混在しているため、これをその
まま使用することは不都合なことが多い。不純酸
素の除去方法としては、pt触媒を使用し窒素ガ
ス中に微量の水素を添加して不純酸素と200℃程
度の温度雰囲気中で反応させ水として除去する方
法およびNi触媒を使用し、窒素ガス中の不純
酸素を200℃程度の温度雰囲気においてNi触媒と
接触させNi+1/202→NiOの反応を起こさせて
除去する方法がある。しかしながら、これらの方
法は、いずれも窒素ガスを高温にして触媒と接触
させなければならないため、その装置を、超低温
系である窒素ガス製造装置中には組み込めない。
したがつて、窒素ガス製造装置とは別個に精製装
置を設置しなければならず、全体が大形になると
いう欠点がある。そのうえ、前記の方法では、
水素の添加量の調整に高精度が要求され、不純酸
素量と丁度反応するだけの量の水素を添加しない
と、酸素が残存したり、また添加した水素が残存
して不純分となつてしまうため、操作に熟練を要
するという問題がある。また、前記の方法で
は、不純酸素との反応で生じたNiOの再生(NiO
+H2→Ni+H2O)をする必要が生じ、再生用H2
ガス設備が必要となつて精製費の上昇を招いてい
た。したがつて、これらの改善が強く望まれてい
た。
Extremely large amounts of nitrogen gas are used in the electronics industry, but strict requirements have been placed on the purity of nitrogen gas from the perspective of maintaining and improving component precision. In other words, nitrogen gas generally uses air as a raw material,
After compressing this in a compressor, it is put into an adsorption cylinder to remove carbon dioxide and moisture, and then passed through a heat exchanger to cool it by exchanging heat with a refrigerant, and then cryogenically liquefied and separated in a rectification tower to produce nitrogen gas. It is manufactured through the process of producing a liquid and raising the temperature to near room temperature through the heat exchanger described above. however,
Since the fine nitrogen gas produced in this way contains oxygen as an impurity, it is often inconvenient to use it as it is. Impure oxygen can be removed by adding a small amount of hydrogen into nitrogen gas using a PT catalyst and reacting with impure oxygen in an atmosphere at a temperature of about 200°C to remove it as water, or by using a Ni catalyst to remove nitrogen gas. There is a method of removing impure oxygen in a gas by bringing it into contact with a Ni catalyst in an atmosphere at a temperature of about 200°C to cause a reaction of Ni + 1/20 2 → NiO. However, in all of these methods, the nitrogen gas must be heated to a high temperature and brought into contact with the catalyst, so the apparatus cannot be incorporated into a nitrogen gas production apparatus that is an ultra-low temperature system.
Therefore, it is necessary to install a purification device separately from the nitrogen gas production device, which has the drawback of increasing the overall size. Moreover, in the above method,
High precision is required to adjust the amount of hydrogen added, and if you do not add just enough hydrogen to react with the amount of impure oxygen, oxygen may remain or the added hydrogen may remain and become an impurity. Therefore, there is a problem in that the operation requires skill. In addition, in the above method, regeneration of NiO produced by reaction with impure oxygen (NiO
+H 2 →Ni+H 2 O), H 2 for regeneration
Gas equipment was required, leading to an increase in refining costs. Therefore, these improvements have been strongly desired.

また、従来の窒素ガスの製造装置は、圧縮機で
圧縮された圧縮空気を冷却するための熱交換器の
冷媒冷却用に、膨脹タービンを用い、これを精留
塔内に溜る液体空気(深冷液化分離により低沸点
の窒素はガスとして取り出され、残部が酸素リツ
チな液体空気となつて溜る)から蒸発したガスの
圧力で駆動するようになつている。ところが、膨
脹ターピンは回転速度が極めて大(数万回/分)
であつて負荷変動に対する追従運転が困難であ
り、特別に養成した運転員が必要である。また、
このものは高速回転するため機械構造上高精度が
要求され、かつ高価であり、機構が複雑なため特
別に養成した要員が必要という難点を有してい
る。すなわち、膨脹タービンは高速回転部を有す
るため、上記のような諸問題を生じるのであり、
このような高速回転部を有する膨脹タービンの除
去に対して強い要望があつた。
In addition, conventional nitrogen gas production equipment uses an expansion turbine to cool the refrigerant in the heat exchanger that cools the compressed air compressed by the compressor. Through cold liquefaction separation, low-boiling point nitrogen is extracted as a gas, and the remainder becomes oxygen-rich liquid air and accumulates.It is driven by the pressure of the evaporated gas. However, the rotation speed of the expansion turpin is extremely high (tens of thousands of times per minute).
However, it is difficult to follow load fluctuations, and specially trained operators are required. Also,
Since this device rotates at a high speed, it requires high precision in its mechanical structure, is expensive, and has the disadvantage of requiring specially trained personnel due to its complicated mechanism. In other words, since the expansion turbine has a high-speed rotating part, it causes the problems mentioned above.
There has been a strong desire to eliminate expansion turbines having such high-speed rotating parts.

この発明者は、このような要望に応えるため、
膨脹タービンを除去し、それに代えて外部から寒
冷として液体窒素を熱交換器のような熱交換手段
内に供給する窒素ガス製造装置を開発し、すでに
特許出願(特願昭58―4760)している。この装置
は、極めて高純度の窒素ガスを製造しうるため、
これまでのような精製装置が全く不要になる。ま
た、膨脹タービンを除去しているため、それにも
とづく弊害も全く生じない。したがつて、電子工
業向に最適である。しかしながら、電子工業で
は、窒素ガス以外に、酸素ガスも使用しており、
1台の装置で窒素ガスのみならず酸素ガスも製造
しうるような装置の提供が望まれてきている。
In order to meet such demands, this inventor
We have developed a nitrogen gas production device that eliminates the expansion turbine and instead supplies externally cooled liquid nitrogen into a heat exchanger such as a heat exchanger, and has already applied for a patent (patent application 1986-4760). There is. This equipment can produce extremely high purity nitrogen gas, so
The conventional purification equipment is completely unnecessary. Furthermore, since the expansion turbine is removed, there are no adverse effects caused by it. Therefore, it is most suitable for the electronic industry. However, in the electronics industry, oxygen gas is also used in addition to nitrogen gas.
It has been desired to provide an apparatus that can produce not only nitrogen gas but also oxygen gas with one apparatus.

〔発明の目的〕[Purpose of the invention]

この発明は、膨脹タービンや精製装置を用いる
ことなく高純度の窒素ガスを製造でき、かつ同時
に酸素ガスも製造しうる高純度窒素ガス製造装置
の提供をその目的とするものである。
An object of the present invention is to provide a high-purity nitrogen gas production apparatus that can produce high-purity nitrogen gas without using an expansion turbine or a purification device, and can also produce oxygen gas at the same time.

〔発明の開示〕[Disclosure of the invention]

上記の目的を達成するため、この発明の高純度
窒素ガス製造装置は、外部より取り入れた空気を
圧縮する空気圧縮手段と、この空気圧縮手段によ
つて圧縮された圧縮空気中の炭酸ガスと水分とを
除去する除去手段と、この除去手段を経た圧縮空
気を超低温に冷却する熱交換手段と、この熱交換
手段により超低温に冷却された圧縮空気の一部を
液化して底部に溜め窒素のみを気体として上部側
から取り出す精留塔を備えた窒素ガス製造装置に
おいて、精留塔の上部に設けられた凝縮器内蔵型
の分縮器と、精留塔の底部の貯溜液体空気を上記
凝縮器冷却用の寒冷として上記分縮器中に導く液
体空気導入パイプと、上記分縮器中で生じた気化
液体空気を外部に放出する放出パイプと、精留塔
内で生成した窒素ガスの一部を上記凝縮器内に案
内する第1の還流液パイプと、上記凝縮器内で生
じた液化窒素を還流液として精留塔内に戻す第2
の還流液パイプと、装置外から液体窒素の供給を
受けこれを貯蔵する液体窒素貯蔵手段と、この液
体窒素貯蔵手段内の液体窒素を冷熱発生用膨脹器
からの発生冷熱に代え連続的に上記熱交換手段に
導く導入路と、上記精留塔内で生成した窒素ガス
を製品窒素ガスとして取り出す窒素ガス取出路
と、上記熱交換手段内において寒冷としての作用
を終え気化した液体窒素を上記窒素ガス取出路に
導き製品窒素ガスに合流させる導出路と、上記熱
交換手段に対する上記液体窒素貯蔵手段からの液
体窒素の供給量を制御することにより上記導出路
を通る窒素ガスの温度を一定に制御する制御手段
と、窒素ガス選択吸着能を有する複数の吸着筒
と、上記複数の吸着筒の入口と上記分縮器におけ
る放出パイプのの出口とをそれぞれ連通させる複
数の流入路パイプと、上記複数の流入路パイプに
それぞれ設けられた複数の第1の開閉弁と、上記
複数の吸着筒の出口からそれぞれ延びる酸素ガス
取出路と、吸着筒の再生手段と、上記再生手段と
上記複数の吸着筒とをそれぞれ連通させる複数の
再生路と、上記複数の再生路にそれぞれ設けられ
た複数の第2の開閉弁と、上記複数個の吸着筒の
うちの任意の吸着筒が吸着作動し残つた吸着筒が
再生または休止するよう上記第1および第2の開
閉弁の開閉制御する開閉弁制御手段を備えるとい
う構成をとるものである。
In order to achieve the above object, the high purity nitrogen gas production apparatus of the present invention includes an air compression means for compressing air taken in from the outside, and carbon dioxide and moisture in the compressed air compressed by the air compression means. a heat exchange means for cooling the compressed air that has passed through the removal means to an ultra-low temperature, and a part of the compressed air cooled to an ultra-low temperature by the heat exchange means to be liquefied and stored at the bottom to produce only nitrogen. In a nitrogen gas production device equipped with a rectification column that extracts gas from the upper side, there is a partial condenser with a built-in condenser installed at the top of the rectification column, and liquid air stored at the bottom of the rectification column is transferred to the condenser. A liquid air introduction pipe that leads into the dephlegmator as cold air for cooling, a discharge pipe that discharges the vaporized liquid air generated in the dephlegmator to the outside, and a portion of the nitrogen gas generated in the rectification column. a first reflux liquid pipe that guides the liquefied nitrogen into the condenser, and a second reflux pipe that returns the liquefied nitrogen produced in the condenser to the rectification column as a reflux liquid.
a reflux liquid pipe, a liquid nitrogen storage means for receiving and storing liquid nitrogen from outside the apparatus, and a liquid nitrogen storage means for replacing the liquid nitrogen in the liquid nitrogen storage means with the cold heat generated from the cold heat generation expander and continuously supplying the above liquid nitrogen. an inlet passage leading to the heat exchange means; a nitrogen gas take-out passage for taking out the nitrogen gas produced in the rectification column as product nitrogen gas; Controlling the temperature of the nitrogen gas passing through the derivation path to a constant level by controlling the supply amount of liquid nitrogen from the liquid nitrogen storage means to the heat exchange means and the derivation path that leads to the gas take-out path and joins the product nitrogen gas. a plurality of adsorption cylinders having a nitrogen gas selective adsorption capacity; a plurality of inlet pipes that communicate the inlets of the plurality of adsorption cylinders with the outlet of the discharge pipe in the demultiplexer; a plurality of first on-off valves respectively provided in the inlet pipes of the plurality of adsorption cylinders; an oxygen gas extraction path extending from the outlet of the plurality of adsorption cylinders; a regeneration means for the adsorption cylinder; and the regeneration means and the plurality of adsorption cylinders. a plurality of regeneration paths each communicating with the plurality of regeneration paths, a plurality of second on-off valves provided in each of the plurality of regeneration paths, and an adsorption cylinder remaining after the adsorption operation of any one of the plurality of adsorption cylinders. The apparatus is configured to include an on-off valve control means for controlling the opening and closing of the first and second on-off valves so that the cylinder is regenerated or stopped.

つぎに、この発明を実施例にもとづいて説明す
る。
Next, the present invention will be explained based on examples.

第3図はこの発明の一実施例を示している。図
において、9は空気圧縮機、10はドレン分離
器、11はフロン冷却器、12は2個1組の吸着
筒である。吸着筒12は内部にモレキユラーシー
ブが充填されていて空気圧縮機9により圧縮され
た空気中のH2OおよびCO2を吸着除去する作用を
する。13は熱交換器であり、吸着筒12により
H2OおよびCO2が吸着除去された圧縮空気が、圧
縮空気供給パイプ8を経て送り込まれる。23は
装置外から液体窒素の供給を受けこれを貯蔵する
液体窒素貯槽である。この液体窒素貯槽23は、
内部の液体窒素を導入路パイプ24aを経て熱交
換器13へ送り込み、熱交換器13内に送り込ま
れた圧縮空気と熱交換さ、圧縮空気を超低温に冷
却する一方、液体窒素を上記熱交換器13で気化
させるようになつている。熱交換器13によつて
気化された液体窒素は、導出路パイプ24bを経
て製品窒素ガス送出用のメインパイプ28内に送
り込まれるようになつている。15は塔頂に、凝
縮器21a内蔵の分縮器21を備えた窒素精留塔
であり、熱交換器13により超低温に冷却されパ
イプ17を経て送り込まれる圧縮空気をさらに冷
却し、その一部を液化し液体空気18として底部
に溜め、窒素のみを気体状態で上部天井部に溜め
るようになつている。20は天井板である。より
詳しく述べると、上記分縮器21内の凝縮器21
aには、精留塔15の上部に溜る窒素ガスの一部
が第1の還流液パイプ21bを介して送入され
る。この分縮器21内は、精留塔15内よりも減
圧状態になつており、精留塔15の底部の貯留液
体空気(N250〜70%、O230〜50%)18が膨脹
弁19a付きパイプ19を経て送り込まれ、気化
して内部温度を液体窒素の沸点以下の温度に冷却
するようになつている。この冷却により、凝縮器
21a内に送入された窒素ガスが液化する。精留
塔15の上部側の部分には、上記分縮器21の凝
縮器21aで生成した液体窒素が第2の還流液パ
イプ21cを通つて流下供給され、液体窒素溜め
21dを経て精留塔15内を下方に流下し、精留
塔15の底部から上昇する圧縮空気と向流的に接
触し冷却してその一部を液化するようになつてい
る。この過程で圧縮空気中の高沸点成分(酸素
分)は液化されて精留塔15の底部に溜り、低沸
点成分である窒素が精留塔15の上部に気体の状
態で溜る。27は精留塔15の上部天井部に溜つ
た窒素ガスを取り出す取出パイプで、超低温の窒
素ガスを熱交換器13内に案内し、そこに送り込
まれる圧縮空気と熱交換させて常温にしメインパ
イプ28に送り込む作用をする。この場合、精留
塔15内における最上部には、窒素ガスととも
に、沸点の低いHe(−269℃)、H2(−253℃)が
溜りやすいため、取出パイプ27は、精留塔15
の最上部より下側に開口しており、He,H2の混
在しない純窒素ガスのみを製品窒素ガスとして取
り出すようになつている。29は分縮器21内の
不用気化液体空気を熱交換器13に送り込む放出
路パイプであり、29aはその保圧弁である。4
0,41,42はそれぞれ内部にN2を選択的に
吸着する吸着剤(合成ゼオライト:モレキユラー
シーブ)が充填されている吸着筒で、それぞれそ
の入口が、弁40b,41b,42bを備えた流
入路40a,41a,42aを介して上記放出路
パイプ29の出口に接続されている。44は真空
ポンプで、吸引路43および弁40c,41c,
42cを介して上記吸着筒40,41,42の入
口に接続されている。40d,41d,42d
は、それぞれ上記吸着筒40,41,42の出口
に接続されている取出路で、それぞれ弁40e,
41e,42eを備えている。これらの取出路4
0d,41d,42dは、製品酸素ガス取出路4
5を介して緩衝タンク46に接続されている。上
記吸着筒40,41,42は、そのなかの1個が
吸着に使用され、その間残るものが真空ポンプ4
4の真空吸引による再生作用を受け、ついで再生
されたものの1個が吸着に使用され、先に吸着作
動をしていたものが再生作用を受ける。上記各弁
40b,40c,40e,41b,41c,41
e,42b,42c,42eは、公知の弁制御手
段(図示せず)により開閉制御され、吸着筒40
〜42の上記動作を実現させる。上記吸着筒40
〜42は上記動作を燥り返して連続吸着作動する
ようになつている。なお、30はバツクアツプ系
ラインであり、空気圧縮ラインが故障したときに
液体窒素貯槽23内の液体窒素を蒸発器31によ
り蒸発させてメインパイプ28に送り込み、窒素
ガスの供給がとだえることのないようにする。3
2は不純物分析計であり、メインパイプ28に送
り出される製品窒素ガスの純度を分析し、純度の
低いときは、弁34,34aを作動せて製品窒素
ガスを矢印Bのように外部に逃気する作用をす
る。50は、導出路パイプ24bに設けられた温
度センサで、導出路パイプ24bを通過する窒素
ガスの温度を検出し、その検出温度で導入路パイ
プ24aに設けられた弁51を制御して熱交換器
13に供給される液体窒素量を制御し、導出路パ
イプ24bを通過する窒素ガスの温度を一定に保
つようにする。これより、熱交換器13を経由し
て精留塔15内に導入される原料圧縮空気の温度
が一定に保たれ常時安定した精留がされるように
なり、製品窒素ガス純度の安定化効果ならびに液
体窒素消費の高効率化効果が得られるようにな
る。また、一点鎖線は真空保冷函であり、精留塔
15等を収容して精製効率の向上を図る。
FIG. 3 shows an embodiment of the invention. In the figure, 9 is an air compressor, 10 is a drain separator, 11 is a fluorocarbon cooler, and 12 is a set of two adsorption cylinders. The adsorption column 12 is filled with a molecular sieve and functions to adsorb and remove H 2 O and CO 2 from the air compressed by the air compressor 9. 13 is a heat exchanger, and the adsorption cylinder 12
The compressed air from which H 2 O and CO 2 have been adsorbed and removed is sent through the compressed air supply pipe 8 . 23 is a liquid nitrogen storage tank that receives liquid nitrogen from outside the apparatus and stores it. This liquid nitrogen storage tank 23 is
The liquid nitrogen inside is sent to the heat exchanger 13 through the inlet pipe 24a, where it is heat exchanged with the compressed air sent into the heat exchanger 13, cooling the compressed air to an ultra-low temperature, while the liquid nitrogen is transferred to the heat exchanger 13. It is supposed to be vaporized at 13. The liquid nitrogen vaporized by the heat exchanger 13 is sent into the main pipe 28 for delivering product nitrogen gas via the outlet pipe 24b. 15 is a nitrogen rectification column equipped with a demultiplexer 21 with a built-in condenser 21a at the top of the column, which further cools the compressed air cooled to an ultra-low temperature by the heat exchanger 13 and sent through the pipe 17, and a part of it is is liquefied and stored in the bottom as liquid air 18, while only nitrogen is stored in a gaseous state in the upper ceiling. 20 is a ceiling board. To explain in more detail, the condenser 21 in the demultiplexer 21
A part of the nitrogen gas accumulated in the upper part of the rectification column 15 is fed into the column a through the first reflux pipe 21b. The inside of this dephlegmator 21 is in a lower pressure state than the inside of the rectification column 15, and the liquid air (N 2 50-70%, O 2 30-50%) 18 stored at the bottom of the rectification column 15 expands. It is fed through a pipe 19 with a valve 19a, and is vaporized to cool the internal temperature to a temperature below the boiling point of liquid nitrogen. Due to this cooling, the nitrogen gas fed into the condenser 21a is liquefied. The liquid nitrogen generated in the condenser 21a of the demultiplexer 21 is supplied to the upper part of the rectification column 15 through a second reflux pipe 21c, and is supplied to the rectification column via the liquid nitrogen reservoir 21d. The air flows downward in the rectification column 15, contacts the compressed air rising from the bottom of the rectification column 15 in a countercurrent manner, cools it, and partially liquefies it. In this process, the high boiling point component (oxygen component) in the compressed air is liquefied and accumulates at the bottom of the rectification column 15, and the low boiling point component, nitrogen, accumulates in the upper part of the rectification column 15 in a gaseous state. Reference numeral 27 denotes an extraction pipe for taking out the nitrogen gas accumulated in the upper ceiling of the rectification column 15, which guides the ultra-low temperature nitrogen gas into the heat exchanger 13 and exchanges heat with the compressed air sent there to bring it to room temperature. 28. In this case, He (-269°C) and H 2 (-253°C), which have low boiling points, tend to accumulate at the top of the rectifying column 15 along with nitrogen gas.
The opening is opened below the top of the tank, and only pure nitrogen gas without He or H 2 mixed therein can be taken out as product nitrogen gas. 29 is a discharge path pipe that sends the waste vaporized liquid air in the dephlegmator 21 to the heat exchanger 13, and 29a is its pressure holding valve. 4
0, 41, and 42 are adsorption cylinders each filled with an adsorbent (synthetic zeolite: molecular sieve) that selectively adsorbs N2 , and each inlet thereof is equipped with valves 40b, 41b, and 42b. It is connected to the outlet of the discharge pipe 29 via inflow channels 40a, 41a, and 42a. 44 is a vacuum pump, which includes a suction path 43 and valves 40c, 41c,
It is connected to the inlets of the adsorption cylinders 40, 41, and 42 via 42c. 40d, 41d, 42d
are take-out passages connected to the outlets of the adsorption cylinders 40, 41, 42, respectively, and valves 40e, 40, respectively.
41e and 42e. These outlets 4
0d, 41d, 42d are product oxygen gas extraction passages 4
5 to a buffer tank 46. One of the adsorption cylinders 40, 41, 42 is used for adsorption, and the remaining one is the vacuum pump 4.
4, one of the regenerated pieces is used for adsorption, and the one that was previously performing the adsorption operation is subjected to the regeneration effect. Each of the above valves 40b, 40c, 40e, 41b, 41c, 41
e, 42b, 42c, and 42e are controlled to open and close by known valve control means (not shown), and the adsorption cylinder 40
The above operations of ~42 are realized. The above adsorption cylinder 40
42 repeats the above operation and performs continuous suction operation. In addition, 30 is a backup system line, and when the air compression line breaks down, the liquid nitrogen in the liquid nitrogen storage tank 23 is evaporated by the evaporator 31 and sent to the main pipe 28, thereby preventing the supply of nitrogen gas from being interrupted. Make sure not to. 3
2 is an impurity analyzer that analyzes the purity of the product nitrogen gas sent to the main pipe 28, and when the purity is low, operates valves 34 and 34a to release the product nitrogen gas to the outside as shown by arrow B. have the effect of Reference numeral 50 denotes a temperature sensor provided in the outlet pipe 24b, which detects the temperature of the nitrogen gas passing through the outlet pipe 24b, and controls the valve 51 provided in the inlet pipe 24a based on the detected temperature to perform heat exchange. The amount of liquid nitrogen supplied to the vessel 13 is controlled to keep the temperature of the nitrogen gas passing through the outlet pipe 24b constant. As a result, the temperature of the raw material compressed air introduced into the rectification column 15 via the heat exchanger 13 is kept constant, and stable rectification is performed at all times, resulting in a stabilizing effect on the purity of the product nitrogen gas. In addition, the effect of increasing the efficiency of liquid nitrogen consumption can be obtained. Furthermore, the dashed line indicates a vacuum cooling box, which accommodates the rectification column 15 and the like to improve purification efficiency.

この装置は、つぎのようにして製品窒素ガスお
よび酸素ガスを製造する。すなわち、空気圧縮機
9により空気を圧縮し、ドレイン分離器10によ
り圧縮された空気中の水分を除去してフロン冷却
器11により冷却し、その状態で吸着筒12に送
り込み、空気中のH2OおよびCO2を吸着除去す
る。ついで、H2O,CO2が吸着除去された圧縮空
気を熱交換器13に送り込んで液体窒素貯槽23
から供給された液体窒素の冷熱によつて超低温に
冷却し、その状態で精留塔15の下部内に投入す
る。ついで、この投入圧縮空気を、凝縮器21a
から液体窒素溜め21dに供給されそこから溢流
する液体窒素と接触せて冷却し、その一部を液化
して精留塔15の底部に溜める。この過程におい
て、窒素と酸素の沸点の差(酸素の沸点−183
℃、窒素の沸点−196℃)により、圧縮空気中の
高沸点成分である酸素が液化し、窒素が気体のま
ま残る。ついで、この気体のまま残つた窒素を取
出パイプ27から取り出して熱交換器13に送り
込み、常温近くまで昇温させメインパイプ28か
ら製品窒素ガスとして送り出す。この場合、液体
窒素貯槽23からの液体窒素は、熱交換器13の
寒冷源として作用し、それ自身は気化し導出路パ
イプ24bを経て取出パイプ27から製品窒素ガ
スの一部として取り出される。他方、精留塔15
の下部に溜つた液体空気18は、分縮器21内に
送り込まれて凝縮器21aを冷却したのち気化し
て不用気化液体空気となり、放出パイプ29を経
て熱交換器13内に送入されて昇温し、その状態
で吸着筒40,41,42のうちの任意の吸着筒
に送り込まれ、そこで窒素ガスを吸着除去され酸
素ガスとなつて緩衝タンク46に送り込まれる。
この場合、吸着筒40,41,42のなかの任意
の1個が吸着作動し、残るものはその間真空ポン
プ44の真空再生作用を受け、つぎに吸着作動し
た吸着筒が再生にまわり、再生済みのものの1個
が吸着作動にはいるというように、各弁40b〜
42b,40c〜42c,40e〜42eが弁制
御手段により制御される。このようにして、高純
度の窒素ガスと酸素ガスが1台の装置により同時
に得られるようになる。この場合、得られる製品
窒素ガスと製品酸素ガスの比率(体積比)は、ほ
ぼ10:1となる。
This device produces product nitrogen gas and oxygen gas as follows. That is, air is compressed by the air compressor 9, water in the compressed air is removed by the drain separator 10, and cooled by the fluorocarbon cooler 11. In this state, the air is sent to the adsorption cylinder 12, and the H 2 in the air is removed. Adsorbs and removes O and CO2 . Next, the compressed air from which H 2 O and CO 2 have been adsorbed and removed is sent to the heat exchanger 13 and transferred to the liquid nitrogen storage tank 23.
It is cooled to an ultra-low temperature by the cold heat of liquid nitrogen supplied from the reactor, and in that state is charged into the lower part of the rectification column 15. Then, this input compressed air is sent to the condenser 21a.
It is supplied to the liquid nitrogen reservoir 21d from the liquid nitrogen reservoir 21d and is cooled by contacting with the liquid nitrogen overflowing therefrom, and a part of it is liquefied and stored at the bottom of the rectification column 15. In this process, the difference between the boiling points of nitrogen and oxygen (boiling point of oxygen - 183
℃, the boiling point of nitrogen - 196℃), oxygen, a high-boiling component in compressed air, liquefies, leaving nitrogen as a gas. Next, the remaining gaseous nitrogen is taken out from the extraction pipe 27 and sent to the heat exchanger 13, where it is heated to near normal temperature and sent out from the main pipe 28 as a product nitrogen gas. In this case, the liquid nitrogen from the liquid nitrogen storage tank 23 acts as a cold source for the heat exchanger 13, and is vaporized and taken out from the take-out pipe 27 as part of the product nitrogen gas via the outlet pipe 24b. On the other hand, the rectification column 15
The liquid air 18 accumulated in the lower part of the air is sent into the demultiplexer 21 to cool the condenser 21a, and then vaporized to become waste vaporized liquid air, which is then sent into the heat exchanger 13 through the discharge pipe 29. The temperature is raised, and in that state, the gas is sent to any one of the adsorption cylinders 40, 41, and 42, where the nitrogen gas is adsorbed and removed, and the gas is turned into oxygen gas and sent to the buffer tank 46.
In this case, any one of the adsorption cylinders 40, 41, and 42 is activated for adsorption, and the remaining ones are subjected to the vacuum regeneration action of the vacuum pump 44 during that time, and then the adsorption cylinder that is activated for adsorption starts regeneration, and the regenerated Each valve 40b~
42b, 40c to 42c, and 40e to 42e are controlled by valve control means. In this way, high purity nitrogen gas and oxygen gas can be obtained simultaneously using one device. In this case, the ratio (volume ratio) of the product nitrogen gas to the product oxygen gas obtained is approximately 10:1.

この窒素ガス製造装置は、上記のように膨脹タ
ービンを用いず、高純度の製品窒素ガスを製造し
うるものであり、膨脹タービンに起因する前記弊
害を全く生じず、しかも精製装置を不要化しう
る。特に、この高純度窒素ガス製造装置は、精留
塔15の上部に凝縮器21a内蔵型の分縮器21
を設け、上記凝縮器21a内へ精留塔15内で生
成した窒素ガスの一部を常時案内して液化するた
め、凝縮器21a内へ液化窒素が所定量溜まつた
のちはそれ以降生成する液化窒素が還流液として
常時精留塔15内に戻るようになる。したがつ
て、凝縮器21aからの還流液の流下供給の断続
に起因する製品純度のばらつき(還流液の流下の
中断により上部精留棚では液がなくなりガスの吹
抜け現象を招いて製品純度が下がり、流下の再開
時には一定純度に戻る)を生じず、常時安定した
純度の製品窒素ガスを供給することができる。し
かもこの装置では、導出路パイプ24bに設けた
温度センサ50でパイプ51を制御し、熱交換手
器13内に供給される液体窒素の量を制御して導
出路パイプ24bを通過する窒素ガスの温度を一
定に保つため、熱交換器13を経由して精留塔1
5へ導入される原料圧縮空気の温度が常時一定に
保たれて安定精留を実現できるのであり、これも
製品窒素ガスの純度の安定化に大きく寄与してい
る。そのうえ、この装置は、精留塔15を経由し
不純分の極めて少なくなつている酸素リツチな不
用液体空気を対象として酸素ガスを製造するもの
であり、1台の装置で高純度の酸素ガスと窒素ガ
スを効率よく製造することができる。
As mentioned above, this nitrogen gas production device can produce high-purity product nitrogen gas without using an expansion turbine, and does not have any of the above-mentioned disadvantages caused by expansion turbines, and can eliminate the need for a purification device. . In particular, this high-purity nitrogen gas production apparatus has a demultiplexer 21 with a built-in condenser 21a in the upper part of the rectification column 15.
A part of the nitrogen gas generated in the rectification column 15 is constantly guided into the condenser 21a and liquefied, so that after a predetermined amount of liquefied nitrogen has accumulated in the condenser 21a, it is no longer produced. The liquefied nitrogen constantly returns to the rectification column 15 as a reflux liquid. Therefore, variations in product purity due to intermittent supply of reflux liquid from the condenser 21a (interruption of flow of reflux liquid causes liquid to run out in the upper rectifying shelf, causing gas blow-by phenomenon and reducing product purity). , the purity returns to a constant level when the flow resumes), and product nitrogen gas of stable purity can be supplied at all times. Furthermore, in this device, the pipe 51 is controlled by a temperature sensor 50 provided on the outlet pipe 24b, and the amount of liquid nitrogen supplied into the heat exchanger 13 is controlled, so that the amount of nitrogen gas passing through the outlet pipe 24b is controlled. In order to keep the temperature constant, the rectification column 1 is passed through a heat exchanger 13.
The temperature of the raw material compressed air introduced into 5 is kept constant at all times, making it possible to achieve stable rectification, which also greatly contributes to stabilizing the purity of the product nitrogen gas. Furthermore, this device produces oxygen gas from waste oxygen-rich liquid air that has passed through the rectification column 15 and has extremely low impurities, and can produce high-purity oxygen gas with one device. Nitrogen gas can be efficiently produced.

なお第3図の窒素精留塔に代えて第2図に示す
ような構造の精留塔を用いてもよい。すなわち、
この精留塔15は、多数のパイプ20aが植設さ
れた仕切板20によつて分縮器部21が塔部22
と区切られており、この分縮器部21内に液体窒
素貯槽23から液体窒素が供給され、パイプ19
から精留塔15内に供給された圧縮空気を、仕切
板20のパイプ20a内で冷却して酸素分を液化
し、窒素を気体の状態で分縮器部21の頂部より
取り出すようになつている。この場合は、前記実
施例とは異なり、精留塔15の塔部22の底部に
溜まる液体空気18が、酸素ガスの原料として用
いられ、熱交換器13で昇温され気化した状態で
任意の吸着筒40,41,42に供給される。
Note that a rectification column having a structure as shown in FIG. 2 may be used instead of the nitrogen rectification column shown in FIG. 3. That is,
This rectification column 15 has a partition plate 20 in which a large number of pipes 20a are installed, so that a dephlegmator section 21 is connected to a column section 22.
Liquid nitrogen is supplied from the liquid nitrogen storage tank 23 into this decentralizer section 21, and the pipe 19
The compressed air supplied into the rectification column 15 is cooled in the pipe 20a of the partition plate 20 to liquefy the oxygen content, and nitrogen is taken out in a gaseous state from the top of the dephlegmator section 21. There is. In this case, unlike the embodiment described above, the liquid air 18 accumulated at the bottom of the column section 22 of the rectification column 15 is used as a raw material for oxygen gas, heated in the heat exchanger 13, and vaporized into any desired state. It is supplied to adsorption cylinders 40, 41, and 42.

また、場合によつては、第1図に示すように、
温度センサ50を除いてもよい。
In some cases, as shown in Figure 1,
Temperature sensor 50 may be omitted.

〔発明の効果〕〔Effect of the invention〕

この発明の高純度窒素ガス製造装置は、膨脹タ
ービンを用いず、それに代えて何ら回転部をもた
ない液体窒素貯槽を用いるため、装置全体として
回転部がなくなり故障が全く生じない。しかも膨
脹タービンは高価であるのに対して液体窒素貯槽
は安価であり、また特別な要員も不要になる。そ
のうえ、膨脹タービン(窒素精留塔内に溜る液体
空気から蒸発したガスの圧力で駆動する)は、回
転速度が極めて大(数万回/分)であるため、負
荷変動(製品窒素ガスの取出量の変化)に対する
きめ細かな追従運転が困難である。したがつて、
製品窒素ガスの取出量の変化に応じて膨脹タービ
ンに対する液体空気の供給量を正確に変化させ、
窒素ガス製造原料である圧縮空気を常時一定温度
に冷却することが困難であり、その結果、得られ
る製品窒素ガスの純度がばらつき、頻繁に低純度
のものがつくりだされ全体的に製品窒素ガスの純
度が低くなつていた。この装置は、それに代えて
液体窒素貯槽を用い、供給量のきめ細かい調節が
可能な液体窒素を熱交換器の寒冷源として用いる
ため、負荷変動に対するきめ細かな追従が可能と
なり、純度が安定していて極めて堺い窒素ガスを
製造しうるようになる。したがつて、従来の精製
装置が不要となる。特に、この装置は、精留塔の
上部に凝縮器内蔵型の分縮器を設け、この分縮器
内の凝縮器へ精留塔内で生成した窒素ガスの一部
を常時導入して液化還流液化し、還流液が常時精
留塔内へ戻るようにすると同時に、制御手段によ
つて上記熱交換手段に対する液体窒素貯蔵手段か
らの液体窒素の供給量を制御して上記導出路を通
る窒素ガスの温度を一定に保つようにするため、
製品窒素ガスの純度ばらつきを生じないのであ
る。しかも、この装置は、窒素ガス採取後のもの
であつて精留塔等を経由することによりCO2
H2O等の不純分が除かれている酸素リツチな廃ガ
ス(不用気化液体空気)を窒素精留塔から吸着筒
に供給して酸素ガスを製造するため、効率よく酸
素ガスを得ることができる。このように、この発
明の装置は、1台の装置で高純度の窒素ガスと酸
素ガスとを効率よく製造することができるため、
電子工業向けに最適である。
The high-purity nitrogen gas production apparatus of the present invention does not use an expansion turbine and instead uses a liquid nitrogen storage tank that does not have any rotating parts, so the apparatus as a whole does not have any rotating parts and does not have any trouble. Furthermore, while expansion turbines are expensive, liquid nitrogen storage tanks are inexpensive and do not require special personnel. Furthermore, the expansion turbine (which is driven by the pressure of the gas evaporated from the liquid air accumulated in the nitrogen rectification column) has an extremely high rotational speed (tens of thousands of rotations/minute), so load fluctuations (removal of product nitrogen gas) It is difficult to perform fine-grained follow-up operation for changes in quantity. Therefore,
Accurately changes the amount of liquid air supplied to the expansion turbine according to changes in the amount of product nitrogen gas extracted,
It is difficult to constantly cool the compressed air, which is the raw material for nitrogen gas production, to a constant temperature, and as a result, the purity of the product nitrogen gas obtained varies, and low-purity products are frequently produced, resulting in the overall production of nitrogen gas purity was decreasing. This device uses a liquid nitrogen storage tank instead, and uses liquid nitrogen, whose supply amount can be finely adjusted, as the cooling source for the heat exchanger, making it possible to closely follow load fluctuations and maintain stable purity. It becomes possible to produce extremely strong nitrogen gas. Therefore, conventional purification equipment is not required. In particular, this equipment is equipped with a fractionator with a built-in condenser at the top of the fractionator, and a portion of the nitrogen gas generated in the fractionator is constantly introduced into the condenser inside the fractionator to liquefy it. The reflux liquid is liquefied, and the reflux liquid is constantly returned to the rectification column, and at the same time, the amount of liquid nitrogen supplied from the liquid nitrogen storage means to the heat exchange means is controlled by the control means, so that the nitrogen passing through the derivation path is controlled by the control means. In order to keep the gas temperature constant,
There is no variation in the purity of the product nitrogen gas. Moreover, this device is a device that collects nitrogen gas and then passes it through a rectification column, etc. to remove CO 2 ,
Oxygen gas is produced by supplying oxygen-rich waste gas (waste vaporized liquid air) from which impurities such as H 2 O have been removed from the nitrogen rectification column to the adsorption column, making it possible to efficiently obtain oxygen gas. can. As described above, the device of the present invention can efficiently produce high-purity nitrogen gas and oxygen gas with one device, so
Ideal for the electronic industry.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例から温度センサを
除いた例の構成図、第2図はその精留塔の変形例
の説明図、第3図はこの発明の一実施例の構成図
である。 9……空気圧縮機、12……吸着筒、13……
熱交換器、15……窒素精留塔、17……パイ
プ、18……液体空気、21……分縮器部、21
a……凝縮器、21b……第1の還流液パイプ、
21c……第2の還流液パイプ、21d……液体
窒素溜め、23……液体窒素貯槽、24a……導
入路パイプ、24b……導出路パイプ、27……
取出パイプ、28……メインパイプ、29……放
出路パイプ、40,41,42……吸着筒、44
……真空ポンプ、45……製品酸素ガス取出路、
50……温度センサ、51……弁。
Fig. 1 is a block diagram of an embodiment of the present invention without the temperature sensor, Fig. 2 is an explanatory diagram of a modification of the rectification column, and Fig. 3 is a block diagram of an embodiment of the present invention. be. 9... Air compressor, 12... Adsorption cylinder, 13...
Heat exchanger, 15...Nitrogen rectification column, 17...Pipe, 18...Liquid air, 21...Different condenser section, 21
a... Condenser, 21b... First reflux pipe,
21c... Second reflux liquid pipe, 21d... Liquid nitrogen reservoir, 23... Liquid nitrogen storage tank, 24a... Inlet pipe, 24b... Outlet pipe, 27...
Take-out pipe, 28...Main pipe, 29...Discharge path pipe, 40, 41, 42...Adsorption cylinder, 44
...Vacuum pump, 45...Product oxygen gas extraction path,
50...Temperature sensor, 51...Valve.

Claims (1)

【特許請求の範囲】[Claims] 1 外部より取り入れた空気を圧縮する空気圧縮
手段と、この空気圧縮手段によつて圧縮された圧
縮空気中の炭酸ガスと水分とを除去する除去手段
と、この除去手段を経た圧縮空気を超低温に冷却
する熱交換手段と、この熱交換手段により超低温
に冷却された圧縮空気の一部を液化して底部に溜
め窒素のみを気体として上部側から取り出す精留
塔を備えた窒素ガス製造装置において、精留塔の
上部に設けられた凝縮器内蔵型の分縮器と、精留
塔の底部の貯溜液体空気を上記凝縮器冷却用の寒
冷として上記分縮器中に導く液体空気導入パイプ
と、上記分縮器中で生じた気化液体空気を外部に
放出する放出パイプと、精留塔内で生成した窒素
ガスの一部を上記凝縮器内に案内する第1の還流
液パイプと、上記凝縮器内で生じた液化窒素を還
流液として精留塔内に戻す第2の還流液パイプ
と、装置外から液体窒素の供給を受けこれを貯蔵
する液体窒素貯蔵手段と、この液体窒素貯蔵手段
内の液体窒素を冷熱発生用膨脹器からの発生冷熱
に代え連続的に上記熱交換手段に導く導入路と、
上記精留塔内で発生した窒素ガスを製品窒素ガス
として取り出す窒素ガス取出路と、上記熱交換手
段内において寒冷としての作用を終え気化した液
体窒素を上記窒素ガス取出路に導き製品窒素ガス
に合流させる導出路と、上記熱交換手段に対する
上記液体窒素貯蔵手段からの液体窒素の供給量を
制御することにより上記導出路を通る窒素ガスの
温度を一定に制御する制御手段と、窒素ガス選択
吸着能を有する複数の吸着筒と、上記複数の吸着
筒の入口と上記分縮器における放出パイプの出口
とをそれぞれ連通させる複数の流入路パイプと、
上記複数の流入路パイプにそれぞれ設けられた複
数の第1の開閉弁と、上記複数の吸着筒の出口か
らそれぞれ延びる酸素ガス取出路と、吸着筒の再
生手段と、上記再生手段と上記複数の吸着筒とを
それぞれ連通させる複数の再生路と、上記複数の
再生路にそれぞれ設けられた複数の第2の開閉弁
と、上記複数個の吸着筒のうちの任意の吸着筒が
吸着作動し残つた吸着筒が再生または休止するよ
う上記第1および第2の開閉弁の開閉制御する開
閉弁制御手段を備えたことを特徴とする高純度窒
素ガス製造装置。
1. Air compression means for compressing air taken in from the outside, removal means for removing carbon dioxide and moisture from the compressed air compressed by this air compression means, and cooling the compressed air that has passed through this removal means to an ultra-low temperature. In a nitrogen gas production device equipped with a cooling heat exchange means and a rectification column that liquefies a part of the compressed air cooled to an ultra-low temperature by the heat exchange means and stores it at the bottom and extracts only nitrogen as a gas from the upper side, a condenser with a built-in condenser installed in the upper part of the rectification column; a liquid air introduction pipe that guides the liquid air stored at the bottom of the rectification column into the condenser as cold air for cooling the condenser; a discharge pipe for discharging the vaporized liquid air produced in the fractionator to the outside; a first reflux pipe for guiding a portion of the nitrogen gas produced in the rectification column into the condenser; A second reflux liquid pipe that returns the liquefied nitrogen produced in the vessel as a reflux liquid into the rectification column, a liquid nitrogen storage means for receiving and storing liquid nitrogen from outside the apparatus, and a liquid nitrogen storage means inside the liquid nitrogen storage means. an introduction path that continuously leads the liquid nitrogen into the heat exchange means to replace the cold heat generated from the cold heat generating expander;
A nitrogen gas take-off passage for taking out the nitrogen gas generated in the rectification column as product nitrogen gas; and a nitrogen gas take-off passage for guiding the liquid nitrogen that has finished cooling and vaporized in the heat exchange means to the nitrogen gas take-off passage and converting it into product nitrogen gas. a control means for controlling the temperature of the nitrogen gas passing through the outlet path to a constant level by controlling the amount of liquid nitrogen supplied from the liquid nitrogen storage means to the heat exchange means; and a nitrogen gas selective adsorption device. a plurality of inlet pipes that communicate the inlets of the plurality of adsorption columns and the outlet of the discharge pipe in the demultiplexer, respectively;
A plurality of first on-off valves provided in each of the plurality of inlet pipes, an oxygen gas extraction path extending from the outlet of the plurality of adsorption cylinders, a regeneration means for the adsorption cylinder, a regeneration means and the plurality of A plurality of regeneration paths each communicating with the adsorption cylinders, a plurality of second on-off valves provided in each of the plurality of regeneration paths, and an arbitrary adsorption cylinder among the plurality of adsorption cylinders are activated to adsorb and A high-purity nitrogen gas production apparatus comprising an on-off valve control means for controlling the opening and closing of the first and second on-off valves so that the ivy adsorption column is regenerated or stopped.
JP13675084A 1984-07-02 1984-07-02 Production unit for high-purity nitrogen gas Granted JPS6115070A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13675084A JPS6115070A (en) 1984-07-02 1984-07-02 Production unit for high-purity nitrogen gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13675084A JPS6115070A (en) 1984-07-02 1984-07-02 Production unit for high-purity nitrogen gas

Publications (2)

Publication Number Publication Date
JPS6115070A JPS6115070A (en) 1986-01-23
JPS6149594B2 true JPS6149594B2 (en) 1986-10-30

Family

ID=15182629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13675084A Granted JPS6115070A (en) 1984-07-02 1984-07-02 Production unit for high-purity nitrogen gas

Country Status (1)

Country Link
JP (1) JPS6115070A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01227601A (en) * 1988-03-08 1989-09-11 Toyota Autom Loom Works Ltd Maximum speed controller for battery vehicle
JPH02246788A (en) * 1989-03-16 1990-10-02 Mitsutoyo Corp Speed detecting circuit and speed controller for dc motor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1463075A (en) * 1973-04-13 1977-02-02 Cryoplants Ltd Air separation
DE2542468A1 (en) * 1975-09-24 1977-04-07 Bayer Ag HERBICIDAL AGENT
JPS5525344A (en) * 1978-08-11 1980-02-23 Tokyo Electric Co Ltd Ribbon cassette case

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01227601A (en) * 1988-03-08 1989-09-11 Toyota Autom Loom Works Ltd Maximum speed controller for battery vehicle
JPH02246788A (en) * 1989-03-16 1990-10-02 Mitsutoyo Corp Speed detecting circuit and speed controller for dc motor

Also Published As

Publication number Publication date
JPS6115070A (en) 1986-01-23

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