JPS6148071B2 - - Google Patents
Info
- Publication number
- JPS6148071B2 JPS6148071B2 JP59136748A JP13674884A JPS6148071B2 JP S6148071 B2 JPS6148071 B2 JP S6148071B2 JP 59136748 A JP59136748 A JP 59136748A JP 13674884 A JP13674884 A JP 13674884A JP S6148071 B2 JPS6148071 B2 JP S6148071B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- nitrogen
- air
- rectification column
- nitrogen gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/044—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a single pressure main column system only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04636—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a hybrid air separation unit, e.g. combined process by cryogenic separation and non-cryogenic separation techniques
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/42—Nitrogen or special cases, e.g. multiple or low purity N2
- F25J2215/44—Ultra high purity nitrogen, i.e. generally less than 1 ppb impurities
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation Of Gases By Adsorption (AREA)
- Separation By Low-Temperature Treatments (AREA)
Description
【発明の詳細な説明】
〔技術分野〕
この発明は、高純度窒素ガス製造装置に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a high purity nitrogen gas production apparatus.
電子工業では極めて多量の窒素ガスが使用され
ているが、部品精度維持向上の観点から窒素ガス
の純度について厳しい要望をだしてきている。す
なわち、窒素ガスは、一般に、空気を原料とし、
これを圧縮機で圧縮したのち、吸着筒に入れて炭
酸ガスおよび水分を除去し、さらに熱交換器を通
して冷媒と熱交換させて冷却し、ついで精留塔で
深冷液化分離して製品窒素ガスを製造し、これを
前記の熱交換器を通して常温近傍に昇温させると
いる工程を経て製造されている。しかしながら、
このようにして製造される製品窒素ガスには、酸
素が不純分として混在しているため、これをその
まま使用することは不都合なことが多い。不純酸
素の除去方法としては、Pt触媒を使用し窒素ガ
ス中に微量の水素を添加して不純酸素と200℃程
度の温度雰囲気中で反応させ水として除去する方
法およびNi触媒を使用し、窒素ガス中の不純
酸素を200℃程度の温度雰囲気においてNi触媒と
接触させNi+1/2O2→NiOの反応を起こさせて除
去する方法がある。しかしながら、これらの方法
は、いずれも窒素ガスを高温にして触媒と接触さ
せなければならないため、その装置を、超低温系
である窒素ガス製造装置中には組み込めない。し
たがつて、窒素ガス製造装置とは別個に精製装置
を設置しなければならず、全体が大形になるとい
る欠点がある。そのうえ、前記の方法では、水
素の添加量の調整に高精度が要求され、不純酸素
量と丁度反応するだけの量の水素を添加しない
と、酸素が残存したり、また添加した水素が残存
して不純分となつてしまうため、操作に熟練を要
するという問題がある。また、前記の方法で
は、不純酸素との反応で生じたNiOの再生(NiO
+H2→Ni+H2O)をする必要が生じ、再生用H2
ガス設備が必要となつて精製費の上昇を招いてい
た。したがつて、これらの改善が強く望まれてい
た。
Extremely large amounts of nitrogen gas are used in the electronics industry, but strict requirements have been placed on the purity of nitrogen gas from the perspective of maintaining and improving component precision. In other words, nitrogen gas generally uses air as a raw material,
After compressing this in a compressor, it is put into an adsorption cylinder to remove carbon dioxide and moisture, and then passed through a heat exchanger to cool it by exchanging heat with a refrigerant, and then cryogenically liquefied and separated in a rectification tower to produce nitrogen gas. The product is manufactured through a process of manufacturing the product and raising the temperature of the product to around room temperature through the heat exchanger described above. however,
Since the product nitrogen gas produced in this way contains oxygen as an impurity, it is often inconvenient to use it as it is. Impure oxygen can be removed by adding a trace amount of hydrogen into nitrogen gas using a Pt catalyst and reacting with the impure oxygen in an atmosphere at a temperature of about 200°C to remove it as water, or by using a Ni catalyst to remove nitrogen gas. There is a method of removing impure oxygen in a gas by bringing it into contact with a Ni catalyst in an atmosphere at a temperature of about 200°C to cause a reaction of Ni+1/2O 2 →NiO. However, in all of these methods, the nitrogen gas must be heated to a high temperature and brought into contact with the catalyst, so the apparatus cannot be incorporated into a nitrogen gas production apparatus that is an ultra-low temperature system. Therefore, it is necessary to install a purification device separately from the nitrogen gas production device, which has the disadvantage that the entire device becomes large. Furthermore, the above method requires high precision in adjusting the amount of hydrogen added, and if the amount of hydrogen that is not added is just enough to react with the amount of impure oxygen, oxygen may remain or the added hydrogen may remain. There is a problem in that it requires skill to operate because it becomes an impurity. In addition, in the above method, regeneration of NiO produced by reaction with impure oxygen (NiO
+H 2 →Ni+H 2 O), H 2 for regeneration
Gas equipment was required, leading to an increase in refining costs. Therefore, these improvements have been strongly desired.
また、従来の窒素ガスの製造装置は、圧縮機で
圧縮された圧縮空気を冷却するための熱交換器の
冷媒冷却用に、膨脹タービンを用い、これを精留
塔内に溜る液体空気(深冷液化分離により低沸点
の窒素はガスとして取り出され、残部が酸素リツ
チな液体空気となつて溜る)から蒸発したガスの
圧力で駆動するようになつている。ところが、膨
脹タービンは回転速度が極めて大(数万回/分)
であつて負荷変動に対する追従運転が困難であ
り、特別に養成した運転員が必要である。また、
このものは高速回転するため機械構造上高精度が
要求され、かつ高価であり、機構が複雑なため特
別に養成した要員が必要という難点を有してい
る。すなわち、膨脹タービンは高速回転部を有す
るため、上記のような諸問題を生じるのであり、
このような高速回転部を有する膨脹タービンの除
去に対して強い要望があつた。 In addition, conventional nitrogen gas production equipment uses an expansion turbine to cool the refrigerant in the heat exchanger that cools the compressed air compressed by the compressor. Through cold liquefaction separation, low-boiling point nitrogen is extracted as a gas, and the remainder becomes oxygen-rich liquid air and accumulates.It is driven by the pressure of the evaporated gas. However, expansion turbines have extremely high rotational speeds (tens of thousands of rotations per minute).
However, it is difficult to follow load fluctuations, and specially trained operators are required. Also,
Since this device rotates at a high speed, it requires high precision in its mechanical structure, is expensive, and has the disadvantage of requiring specially trained personnel due to its complicated mechanism. In other words, since the expansion turbine has a high-speed rotating part, it causes various problems such as those mentioned above.
There has been a strong demand for the elimination of expansion turbines having such high-speed rotating parts.
この発明者は、このような要望に応えるため、
膨脹タービンを除去し、それに代えて外部から液
体窒素を寒冷として精留塔内に供給する窒素ガス
製造装置を開発し、すでに特許出願(特願昭58−
38050)している。この装置は、極めて高純度の
窒素ガスを製造しうるため、これまでのような精
製装置が全く不要になる。また、膨脹タービンを
除去しているため、それにもとづく弊害も全く生
じない。したがつて、電子工業向に最適である。
しかしながら、電子工業では、窒素ガス以外に、
酸素ガスも使用しており、1台の装置で窒素ガス
のみならず酸素ガスも製造しうるような装置の提
供が望まれてきている。 In order to meet such demands, this inventor
We have developed a nitrogen gas production device that removes the expansion turbine and instead supplies chilled liquid nitrogen from outside into the rectification column, and has already applied for a patent (patent application 1983-
38050). Since this device can produce nitrogen gas of extremely high purity, conventional purification equipment is completely unnecessary. Furthermore, since the expansion turbine is removed, there are no adverse effects caused by it. Therefore, it is most suitable for the electronic industry.
However, in the electronics industry, in addition to nitrogen gas,
Oxygen gas is also used, and it has been desired to provide a device that can produce not only nitrogen gas but also oxygen gas with one device.
この発明は、膨脹タービンや精製装置を用いる
ことなく高純度の窒素ガスを製造でき、かつ同時
に酸素ガスも製造しうる高純度窒素ガス製造装置
の提供をその目的とするものである。
An object of the present invention is to provide a high-purity nitrogen gas production apparatus that can produce high-purity nitrogen gas without using an expansion turbine or a purification device, and can also produce oxygen gas at the same time.
上記の目的を達成するため、この発明の高純度
窒素ガス製造装置は、外部より取り入れた空気を
圧縮する空気圧縮手段と、この空気圧縮手段によ
つて圧縮された圧縮空気中の炭酸ガスと水分とを
除去する除去手段と、この除去手段を経た圧縮空
気を超低温に冷却する熱交換手段と、この熱交換
手段により超低温に冷却された圧縮空気の一部を
液化して底部に溜め窒素のみを気体として上部側
から取り出す精留塔を備えた窒素ガス製造装置に
おいて、精留塔の上部に設けられた凝縮器内蔵型
の分縮器と、精留塔の底部の貯溜液体空気を上記
凝縮器冷却用の寒冷として上記分縮器中に導く液
体空気導入パイプと、上記分縮器中で生じた気化
液体空気を外部に放出する放出パイプと、精留塔
内で生成した窒素ガスの一部を上記凝縮器内に案
内する第1の還流液パイプと、上記凝縮器内で生
じた液化窒素を還流液として精留塔内に戻す第2
の還流液パイプと、装置外から液体窒素の供給を
受けこれを貯蔵する液体窒素貯蔵手段と、この液
体窒素貯蔵手段内の液体窒素を冷熱発生用膨脹器
からの発生冷熱に代え圧縮空気液化用の寒冷源と
して連続的に上記精留塔内に導く導入路と、上記
精留塔に対する上記液体窒素貯蔵手段からの液体
窒素の供給量を制御することにより上記分縮器内
の液体空気の液面を一定に制御する制御手段と、
上記精留塔から気体として取り出される窒素およ
び上記精留塔内において寒冷源としての作用を終
え気化した上記液体窒素を上記熱交換手段を経由
させその内部を通る圧縮空気と熱交換させること
により温度上昇させ製品窒素ガスとする窒素ガス
取出路と、窒素ガス選択吸着能を有する複数の吸
着筒と、上記複数の吸着筒の入口と上記分縮器に
おける放出パイプの出口とをそれぞれ連通させる
複数の流入路パイプと、上記複数の流入路パイプ
にそれぞれ設けられた複数の第1の開閉弁と、上
記複数の吸着筒の出口からそれぞれ延びる酸素ガ
ス取出路と、吸着筒の再生手段と、上記再生手段
と上記複数の吸着筒とを連通させる複数の再生路
と、上記複数の再生路にそれぞれ設けられた複数
の第2の開閉弁と、上記複数個の吸着筒のうちの
任意の吸着筒が吸着作動し残つた吸着筒が再生ま
たは休止するよう上記第1および第2の開閉弁の
開閉制御する開閉弁制御手段を備えるという構成
をとるものである。
In order to achieve the above object, the high purity nitrogen gas production apparatus of the present invention includes an air compression means for compressing air taken in from the outside, and carbon dioxide and moisture in the compressed air compressed by the air compression means. a heat exchange means for cooling the compressed air that has passed through the removal means to an ultra-low temperature, and a part of the compressed air cooled to an ultra-low temperature by the heat exchange means to be liquefied and stored at the bottom to produce only nitrogen. In a nitrogen gas production device equipped with a rectification column that extracts gas from the upper side, there is a partial condenser with a built-in condenser installed at the top of the rectification column, and liquid air stored at the bottom of the rectification column is transferred to the condenser. A liquid air introduction pipe that leads into the dephlegmator as cold air for cooling, a discharge pipe that discharges the vaporized liquid air generated in the dephlegmator to the outside, and a portion of the nitrogen gas generated in the rectification column. a first reflux liquid pipe that guides the liquefied nitrogen into the condenser, and a second reflux pipe that returns the liquefied nitrogen produced in the condenser to the rectification column as a reflux liquid.
a reflux liquid pipe, a liquid nitrogen storage means for receiving and storing liquid nitrogen from outside the device, and a liquid nitrogen storage means for converting the liquid nitrogen in the liquid nitrogen storage means into cold heat generated from a cold heat generation expander to liquefy compressed air. The liquid air in the dephlegmator is controlled by an introduction path that continuously leads into the rectification column as a cooling source of the liquid air, and by controlling the amount of liquid nitrogen supplied to the rectification column from the liquid nitrogen storage means. a control means for controlling the surface constant;
The nitrogen taken out as a gas from the rectification column and the liquid nitrogen that has finished acting as a cold source and has been vaporized in the rectification column are passed through the heat exchange means and exchanged heat with the compressed air passing through the inside of the column. A nitrogen gas take-out passage for raising product nitrogen gas, a plurality of adsorption cylinders having a nitrogen gas selective adsorption capacity, and a plurality of adsorption cylinders that communicate the inlets of the plurality of adsorption cylinders and the outlet of the discharge pipe in the partial condenser, respectively. an inflow path pipe, a plurality of first on-off valves provided in each of the plurality of inflow path pipes, an oxygen gas extraction path extending from the outlet of each of the plurality of adsorption cylinders, a regeneration means for the adsorption cylinder, and the regeneration unit. a plurality of regeneration paths that communicate the means with the plurality of adsorption cylinders, a plurality of second on-off valves provided in each of the plurality of regeneration paths, and any one of the plurality of adsorption cylinders. The apparatus is configured to include on-off valve control means for controlling the opening and closing of the first and second on-off valves so that the remaining adsorption cylinders that have been adsorbed are regenerated or stopped.
つぎに、この発明を実施例にもとづいて説明す
る。 Next, the present invention will be explained based on examples.
第1図はこの発明の一実施例を示している。図
において、9は空気圧縮機、10はドレン分離
器、11はフロン冷却器、12は2個1組の吸着
筒である。吸着筒12は内部にモレキユラーシー
ブが充填されていて空気圧縮機9により圧縮され
た空気中のH2BOおよびCO2を吸着除去する作用
をする。13は熱交換器であり、吸着筒12によ
りH2OおよびCO2が吸着除去された圧縮空気が、
圧縮空気供給パイプ8を経て送り込まれる。ここ
に送り込まれた圧縮空気は、熱交換器13の熱交
換作用により超低温に冷却される。15は塔頂
に、凝縮器21a内蔵の分縮器21を備えた窒素
精留塔であり、熱交換器13により超低温に冷却
されパイプ17を経て送り込まれる圧縮空気をさ
らに冷却し、その一部を液化し液体空気18とし
て底部に溜め、窒素のみを気体状態で上部天井部
に溜めるようになつている。すなわち、上記精留
塔15は、天井板20の上側に分縮器21を備え
ている。23は装置外から液体窒素の供給を受け
これを貯蔵する液体窒素貯槽である。上記精留塔
15の上部には、上記液体窒素貯槽23から液体
窒素が導入路パイプ24aを介して直接送入され
るとともに、その上部に設けられた液体窒素溜め
21d内に上記分縮器21内の凝縮器21aで生
成した液体窒素が第2の還流液パイプ21cを通
つて流下供給され、この双方の液体窒素が溢流し
て精留塔15内を下方に流下し、精留塔15の底
部から上昇する圧縮空気と向流的に接触し冷却し
てその一部を液化するようになつている。この過
程で圧縮空気中の高沸点成分は液化されて精留塔
15の底部に溜り、低沸点成分の窒素ガスが精留
塔15の上部に溜る。また、上記分縮器21内に
は、先に述べたように凝縮器21aが配設されて
おり、精留塔15の上部に溜る窒素ガスの一部が
第1の還流液パイプ21bを介して送入される。
この分縮器21内は、精留塔15内よりも減圧状
態になつており、精留塔12の底部の貯留液体空
気(N250〜70%,O230〜50%)18が膨脹弁1
9a付きパイプ19を経て送り込まれ、気化して
内部温度を液体窒素の沸点以下の温度に冷却する
ようになつている。この冷却により、凝縮器21
a内に送入された窒素ガスが液化し、前記のよう
に精留塔15内の液体窒素溜め21d内に流下す
るのである。25は液面計であり、分縮器21内
の液体空気の液面に応じてバルブ26を制御し液
体窒素貯槽23からの液体窒素の供給量を制御す
る。27は精留塔15の上部に溜つた窒素ガスを
取り出す取出パイプで、超低温の液体ガスを熱交
換器13内に案内し、そこで送り込まれる圧縮空
気と熱交換させて常時にしメインパイプ28に送
り込む作用をする。この場合、精留塔15の最上
部には、窒素ガスとともに、沸点の低いHe(−
269℃),H2(−253℃)が溜りやすいため、取出
パイプ27は、精留塔15の最上部よりかなり下
側に開口しており、He,H2の混在しない純窒素
ガスのみを取り出すようになつている。29は分
縮器21内の不用気化液体空気を熱交換器13に
送り込む放出路パイプであり、29aはその保圧
弁である。40,41,42はそれぞれ内部に
N2を選択的に吸着する吸着剤(合成ゼオライ
ト:モレキユラーシーブ)が充填されている吸着
筒で、それぞれその入口が、弁40b,41b,
42bを備えた流入路40a,41a,42aを
介して上記放出路パイプ29の出口に接続されて
いる。44は真空ポンプで、吸引路43および弁
40c,41c,42cを介して上記吸着筒4
0,41,42の入口に接続されている。40
d,41d,42dは、それぞれ上記吸着筒4
0,41,42の出口に接続されている取出路
で、それぞれ弁40e,41e,42eを備えて
いる。これらの取出路40d,41d,42d
は、製品酸素ガス取出路45を介して緩衝タンク
46に接続されている。上記吸着筒40,41,
42は、そのなかの1個が吸着に使用され、その
間、残るものが真空ポンプ44の真空吸引による
再生作用を受け、ついで再生されたものの1個が
吸着に使用され、先に吸着作動をしていたものが
再生を受ける。上記各弁40b,40c,40
e,41b,41c,41e,42b,42c,
42eは、公知の弁制御手段(図示せず)により
開閉制御され、吸着筒40〜42の上記動作を実
現させる。上記吸着筒40〜42は上記動作を繰
り返して連続吸着作動するようになつている。な
お、30はバツクアツプ系ラインであり、空気圧
縮ラインが故障したときに液体窒素貯槽23内の
液体窒素を蒸発器31により蒸発させてメインパ
イプ28に送り込み、窒素ガスの供給がとだえる
ことのないようにする。32は不純物分析計であ
り、メインパイプ28に送り出される製品窒素ガ
スの純度を分析し、純度の低いときは、弁34,
34aを作動させて製品窒素ガスを矢印Bのよう
に外部に逃気する作用をする。また、一点鎖線は
真空保冷函であり、精留塔15等を収容して精製
効率の向上を図る。 FIG. 1 shows an embodiment of the invention. In the figure, 9 is an air compressor, 10 is a drain separator, 11 is a fluorocarbon cooler, and 12 is a set of two adsorption cylinders. The adsorption cylinder 12 is filled with a molecular sieve and functions to adsorb and remove H 2 BO and CO 2 in the air compressed by the air compressor 9. 13 is a heat exchanger, in which the compressed air from which H 2 O and CO 2 have been adsorbed and removed by the adsorption cylinder 12 is
The compressed air is fed through the compressed air supply pipe 8. The compressed air sent here is cooled to an extremely low temperature by the heat exchange action of the heat exchanger 13. 15 is a nitrogen rectification column equipped with a demultiplexer 21 with a built-in condenser 21a at the top of the column, which further cools the compressed air cooled to an ultra-low temperature by the heat exchanger 13 and sent through the pipe 17, and a part of it is is liquefied and stored in the bottom as liquid air 18, while only nitrogen is stored in a gaseous state in the upper ceiling. That is, the rectification column 15 is equipped with a dephlegmator 21 above the ceiling plate 20. 23 is a liquid nitrogen storage tank that receives liquid nitrogen from outside the apparatus and stores it. Liquid nitrogen is directly fed into the upper part of the rectification column 15 from the liquid nitrogen storage tank 23 through the introduction pipe 24a, and the demultiplexer 21 is fed into the liquid nitrogen reservoir 21d provided at the upper part. The liquid nitrogen produced in the condenser 21a is supplied downstream through the second reflux liquid pipe 21c, and both liquid nitrogens overflow and flow downward in the rectification column 15. It comes into contact with compressed air rising from the bottom in a countercurrent manner, cools it, and liquefies a portion of it. In this process, the high boiling point components in the compressed air are liquefied and accumulate at the bottom of the rectification column 15, and the low boiling point components, nitrogen gas, accumulate at the top of the rectification column 15. Further, as mentioned above, the condenser 21a is disposed inside the dephlegmator 21, and a part of the nitrogen gas accumulated in the upper part of the rectification column 15 is passed through the first reflux liquid pipe 21b. will be sent.
The inside of this dephlegmator 21 is in a lower pressure state than the inside of the rectifying column 15, and the liquid air (N 2 50-70%, O 2 30-50%) 18 stored at the bottom of the rectifying column 12 expands. Valve 1
It is fed through a pipe 19 with 9a and is vaporized to cool the internal temperature to a temperature below the boiling point of liquid nitrogen. Due to this cooling, the condenser 21
The nitrogen gas fed into the tank a is liquefied and flows down into the liquid nitrogen reservoir 21d in the rectification column 15 as described above. A liquid level gauge 25 controls a valve 26 according to the level of liquid air in the decentralizer 21 to control the amount of liquid nitrogen supplied from the liquid nitrogen storage tank 23 . Reference numeral 27 is a take-out pipe for taking out the nitrogen gas accumulated in the upper part of the rectification column 15, which guides the ultra-low temperature liquid gas into the heat exchanger 13, where it exchanges heat with the compressed air sent there, and is constantly sent to the main pipe 28. act. In this case, at the top of the rectification column 15, He (-
269°C) and H 2 (-253°C) tend to accumulate, the take-out pipe 27 is opened well below the top of the rectification column 15 to allow only pure nitrogen gas without He and H 2 to be mixed. It's supposed to be taken out. Reference numeral 29 is a discharge path pipe that sends the waste vaporized liquid air in the dephlegmator 21 to the heat exchanger 13, and 29a is its pressure holding valve. 40, 41, 42 are inside each
It is an adsorption column filled with an adsorbent (synthetic zeolite: molecular sieve) that selectively adsorbs N2 , and its inlets are connected to valves 40b, 41b,
It is connected to the outlet of the discharge pipe 29 through inflow passages 40a, 41a, 42a with 42b. 44 is a vacuum pump, which connects the adsorption cylinder 4 through a suction path 43 and valves 40c, 41c, and 42c.
It is connected to the entrances of 0, 41, and 42. 40
d, 41d, and 42d are the adsorption cylinders 4, respectively.
0, 41, and 42, and are provided with valves 40e, 41e, and 42e, respectively. These outlet paths 40d, 41d, 42d
is connected to a buffer tank 46 via a product oxygen gas extraction path 45. The adsorption cylinders 40, 41,
42, one of them is used for adsorption, while the remaining one is subjected to the regeneration action by vacuum suction of the vacuum pump 44, and then one of the regenerated ones is used for adsorption, and first performs the adsorption operation. What was previously used will be reborn. Each of the above valves 40b, 40c, 40
e, 41b, 41c, 41e, 42b, 42c,
42e is controlled to open and close by a known valve control means (not shown), thereby realizing the above operations of the adsorption cylinders 40 to 42. The suction cylinders 40 to 42 repeat the above operations to perform continuous suction operation. In addition, 30 is a backup system line, and when the air compression line breaks down, the liquid nitrogen in the liquid nitrogen storage tank 23 is evaporated by the evaporator 31 and sent to the main pipe 28, thereby preventing the supply of nitrogen gas from being interrupted. Make sure not to. 32 is an impurity analyzer, which analyzes the purity of the product nitrogen gas sent to the main pipe 28, and when the purity is low, valves 34,
34a is activated to release the product nitrogen gas to the outside as indicated by arrow B. Furthermore, the dashed line indicates a vacuum cooling box, which accommodates the rectification column 15 and the like to improve purification efficiency.
この装置は、つぎのようにして製品窒素ガスお
よび酸素ガスを製造する。すなわち、空気圧縮機
9により空気を圧縮し、ドレン分離器10により
圧縮された空気中の水分を除去してフロン冷却器
11により冷却し、その状態で吸着筒12に送り
込み、空気中のH2OおよびCO2を吸着除去する。
ついで、H2O,CO2が吸着除去された圧縮空気を
熱交換器13に送り込んで超低温に冷却し、その
状態で精留塔15の下部内に投入する。ついで、
この投入圧縮空気を、液体窒素貯槽23から精留
塔15内に送り込まれた液体窒素および液体窒素
溜め21dからの溢流液体窒素と接触させて冷却
し、その一部を液化して精留塔15の底部に液体
空気18として溜める。この過程において、窒素
と酸素の沸点の差(酸素の沸点−183℃、窒素の
沸点−196℃)により、圧縮空気中の高沸点成分
である酸素が液化し、窒素が気体のまま残る。つ
いで、この気体のまま残つた窒素を取出パイプ2
7から取り出して熱交換器13に送り込み、常温
近くまで昇温させメインパイプ28から製品窒素
ガスとして送り出す。この場合、液体窒素貯槽2
3から供給された液体窒素は、圧縮空気液化用の
寒冷源として作用し、それ自身は気化して取出パ
イプ27から製品窒素ガスの一部として取り出さ
れる。他方、精留塔15の下部に溜つた液体空気
18は、分縮器21内に送り込まれて凝縮器21
aを冷却したのち気化して不用気化液体空気とな
り、パイプ29を経て熱交換器13内に送入され
て昇温し、その状態で吸着筒40,41,42の
うちの任意の吸着筒に送り込まれ、そこで窒素ガ
スを吸着除去され酸素ガスとなつて緩衝タンク4
6に送り込まれる。この場合、吸着筒40,4
1,42のなかの任意の1個が吸着作動し、残る
ものはその間真空ポンプ44の真空再生作用を受
け、つぎに吸着作動した吸着筒が再生にまわり、
再生済みのものの1個が吸着作動にはいるという
ように、各弁40b〜42b,40c〜42c,
40e〜42eが弁制御手段により制御される。
このようにして、高純度の窒素ガスと酸素ガスが
1台の装置により同時に得られるようになる。こ
の場合、得られる製品窒素ガスと製品酸素ガスの
普率(体積比)は、ほぼ10:1となる。 This device produces product nitrogen gas and oxygen gas as follows. That is, air is compressed by the air compressor 9, water in the compressed air is removed by the drain separator 10, and cooled by the fluorocarbon cooler 11. In this state, the air is sent to the adsorption column 12, and the H 2 in the air is removed. Adsorbs and removes O and CO2 .
Next, the compressed air from which H 2 O and CO 2 have been adsorbed and removed is sent to the heat exchanger 13 to be cooled to an ultra-low temperature, and in this state is introduced into the lower part of the rectification column 15 . Then,
This input compressed air is cooled by contacting with the liquid nitrogen sent into the rectification column 15 from the liquid nitrogen storage tank 23 and the overflow liquid nitrogen from the liquid nitrogen reservoir 21d, and a part of it is liquefied to form the rectification column. It is stored as liquid air 18 at the bottom of 15. In this process, due to the difference in the boiling points of nitrogen and oxygen (boiling point of oxygen -183°C, boiling point of nitrogen -196°C), oxygen, which is a high boiling point component in compressed air, liquefies, leaving nitrogen as a gas. Next, remove the nitrogen remaining in this gaseous state through pipe 2.
7 and sent to the heat exchanger 13, heated to near room temperature, and sent out from the main pipe 28 as a product nitrogen gas. In this case, liquid nitrogen storage tank 2
The liquid nitrogen supplied from 3 acts as a cold source for liquefying compressed air, and is itself vaporized and taken out from the take-out pipe 27 as a part of the product nitrogen gas. On the other hand, the liquid air 18 accumulated in the lower part of the rectification column 15 is sent into the dephlegmator 21 and
After cooling the air, it is vaporized to become waste vaporized liquid air, which is fed into the heat exchanger 13 through the pipe 29 and raised in temperature. There, the nitrogen gas is adsorbed and removed and becomes oxygen gas, which is then sent to the buffer tank 4.
sent to 6. In this case, the adsorption cylinders 40, 4
Any one of the cylinders 1 and 42 is activated for adsorption, while the remaining ones are subjected to the vacuum regeneration action of the vacuum pump 44, and then the adsorption column that has activated adsorption starts regeneration.
Each valve 40b to 42b, 40c to 42c, and one of the regenerated valves enters the adsorption operation.
40e to 42e are controlled by valve control means.
In this way, high purity nitrogen gas and oxygen gas can be obtained simultaneously using one device. In this case, the ratio (volume ratio) of the product nitrogen gas and product oxygen gas obtained is approximately 10:1.
この窒素ガス製造装置は、上記のように膨脹タ
ービンを用いず、高純度の製品窒素ガスを製造し
うるものであり、膨脹タービンに起因する前記弊
害を全く生じず、しかも精製装置を不要化しう
る。特に、この高純度窒素ガス製造装置は、精留
塔15の上部に凝縮器21a内蔵型の分縮器21
を設け、上記凝縮器21a内へ精留塔15内の窒
素ガスの一部を常時案内して液化するため、凝縮
器21a内へ液化窒素が所定量溜まつたのちはそ
れ以降生成する液化窒素が還流液として常時精留
塔15内に戻るようになる。したがつて、凝縮器
21aからの還流液の流下供給の断続に起因する
製品純度のばらつき(還流液の流下の中断により
上部精留棚では液がなくなりガスの吹抜け現象を
招いて製品純度が下がり、流下の再開時には一定
純度に戻る)を生じず、常時安定した純度の製品
窒素ガスを供給することができる。しかもこの装
置では、製品窒素ガスの需要量に変動が生じても
液面計25のような制御手段がバルブ26の開度
等を制御し精留塔15に対する液体窒素の供給量
を制御することにより分縮器21内の液体空気の
液面を一定に制御するため、需要量の変動に迅速
に対応でき、かつこのときにも先に述べた理由に
より純度ばらつきを生じない。すなわち、製品窒
素ガスの需要量が多くなると、生成窒素ガスの殆
どが取出パイプ27から作り出され、凝縮器21
aに送られる窒素ガスの量が少なくなつて凝縮器
21aで生成される還流液量が少なくなり、その
結果、精留塔底部の貯溜液体空気18の量が減少
し、そこから送られる液体空気の量が減少するた
め分縮器21における液体空気の液面が下がる。
これにより液面計25が作動し精留塔15に対す
る液体窒素の供給量を増加させ、この気化により
迅速に製品窒素ガスを製造し需要量の増大に素早
く対応する。そして、この液体窒素の供給量の増
加により精留塔底部の貯溜液体空気量が増大しそ
れに伴つて分縮器21内の液面が回復すると、液
面計25によつて精留塔15に対する液体窒素の
供給量が適正に減少制御される。製品窒素ガスの
需要量が少なくなると、上記とは逆に、分縮器2
1内の液面が上昇するため、液面計25が作動し
て精留塔15に対する液体窒素の供給量を減少さ
せ液体窒素の過剰供給にもとづく不合理を排除す
る。このように、この装置は、純度のばらつきを
生じることなく迅速かつ合理的に需要量の変動に
対応できるのである。そのうえ、この装置は、精
留塔を経由し不純の極めて少なくなつている酸素
リツチな不要液体空気を対象として酸素ガスを製
造するものであり、1台の装置で高純度の酸素ガ
スと窒素ガスを効率よく製造することができる。 As mentioned above, this nitrogen gas production device can produce high-purity product nitrogen gas without using an expansion turbine, and does not have any of the above-mentioned disadvantages caused by expansion turbines, and can eliminate the need for a purification device. . In particular, this high-purity nitrogen gas production apparatus has a demultiplexer 21 with a built-in condenser 21a in the upper part of the rectification column 15.
is provided, and in order to constantly guide a part of the nitrogen gas in the rectification column 15 into the condenser 21a and liquefy it, after a predetermined amount of liquefied nitrogen has accumulated in the condenser 21a, the liquefied nitrogen generated thereafter is constantly returned to the rectification column 15 as a reflux liquid. Therefore, variations in product purity due to intermittent supply of reflux liquid from the condenser 21a (interruption of flow of reflux liquid causes liquid to run out in the upper rectifying shelf, causing gas blow-by phenomenon and reducing product purity). , the purity returns to a constant level when the flow resumes), and product nitrogen gas of stable purity can be supplied at all times. Moreover, in this device, even if the demand for product nitrogen gas fluctuates, the control means such as the liquid level gauge 25 controls the opening degree of the valve 26, etc., and controls the amount of liquid nitrogen supplied to the rectification column 15. Since the liquid level of the liquid air in the dephlegmator 21 is controlled to be constant, fluctuations in demand can be quickly responded to, and also at this time, variations in purity do not occur for the reasons mentioned above. In other words, when the demand for product nitrogen gas increases, most of the produced nitrogen gas is produced from the take-out pipe 27 and the condenser 21
As the amount of nitrogen gas sent to a decreases, the amount of reflux liquid generated in the condenser 21a decreases, and as a result, the amount of liquid air 18 stored at the bottom of the rectification column decreases, and the amount of liquid air sent from there decreases. Since the amount of liquid air decreases, the level of liquid air in the dephlegmator 21 decreases.
As a result, the liquid level gauge 25 is activated to increase the amount of liquid nitrogen supplied to the rectification column 15, and by vaporizing the liquid nitrogen, product nitrogen gas is quickly produced to quickly respond to an increase in demand. When the amount of liquid air stored at the bottom of the rectification column increases due to the increase in the supply amount of liquid nitrogen, and the liquid level in the dephlegmator 21 recovers, the liquid level gauge 25 detects the amount of liquid air stored in the rectification column 15. The supply amount of liquid nitrogen is appropriately controlled to decrease. When the demand for product nitrogen gas decreases, contrary to the above, the decentralizer 2
Since the liquid level in the distillation column 1 rises, the liquid level gauge 25 operates to reduce the amount of liquid nitrogen supplied to the rectification column 15 to eliminate unreasonableness due to excessive supply of liquid nitrogen. In this way, this device can quickly and rationally respond to changes in demand without causing variations in purity. Furthermore, this device produces oxygen gas from unnecessary oxygen-rich liquid air that has been passed through a rectification column and has extremely low impurities. can be manufactured efficiently.
なお、第1図の液体精留塔に代えて第2図に示
すような製造の精留塔を用いてもよい。すなわ
ち、この精留塔15は、多数のパイプ20aが植
設された仕切板20によつて分縮器部21が塔部
15と区切られており、この分縮器部21内に液
体窒素貯槽23から液体窒素が供給され、パイプ
19から塔部15内に供給された圧縮空気を、仕
切板20のパイプ20a内で冷却して酸素分を液
化し、窒素を気体の状態で分縮器部21の頂部よ
り取り出すようになつている。この場合は、前記
実施例では異なり、精留塔15の底部に溜まる液
体空気18が、酸素ガスの原料として用いられ、
熱交換器13で昇温され気化した状態で任意の吸
着筒40,41,42に供給される。 Incidentally, instead of the liquid rectification column shown in FIG. 1, a rectification column manufactured as shown in FIG. 2 may be used. That is, in this rectification column 15, a dephlegmator part 21 is separated from the column part 15 by a partition plate 20 in which a large number of pipes 20a are installed, and a liquid nitrogen storage tank is provided in the dephlegmator part 21. Liquid nitrogen is supplied from pipe 23, and compressed air supplied from pipe 19 into tower section 15 is cooled within pipe 20a of partition plate 20 to liquefy the oxygen content, and the nitrogen is passed in a gaseous state to the dephlegmator section. It is designed to be taken out from the top of 21. In this case, unlike the previous embodiment, the liquid air 18 accumulated at the bottom of the rectification column 15 is used as a raw material for oxygen gas,
It is heated in the heat exchanger 13 and supplied to any adsorption column 40, 41, 42 in a vaporized state.
この発明の高純度液体ガス製造装置は、膨脹タ
ービンを用いず、それに代えて何ら回転部をもた
ない液体窒素貯槽を用いるため、装置全体として
回転部がなくなり故障が全く生じない。しかも膨
脹タービンは高価であるのに対して液体窒素貯槽
は安価であり、また特別な要員も不要になる。そ
のうえ、膨脹タービン(窒素精留塔内に溜る液体
空気から蒸発したガスの圧力で駆動する)は、回
転速度が極めて大(数万回/分)であるため、負
荷変動(製品窒素ガスの取出量の変化)に対する
きめ細かな追従運転が困難である。したがつて、
製品窒素ガスの取出量の変化に応じて膨脹タービ
ンに対する液体空気の供給量を正確に変化させ、
窒素ガス製造原料である圧縮空気を常時一定温度
に冷却することが困難であり、その結果、得られ
る製品窒素ガスの純度がばらつき、頻繁に低純度
のものがつくりだされ全体的に製品窒素ガスの純
度が低くなつていた。この装置は、それに代えて
液体窒素貯槽を用い、供給量のきめ細かい調節が
可能な液体窒素を圧縮空気の寒冷源として用いる
ため、負荷変動に対するきめ細かな追従が可能と
なり、純度が安定していて極めて高い窒素ガスを
製造しうるようになる。したがつて、従来の精製
装置が不要となる。特に、この装置は、精留塔の
上部に凝縮器内蔵型の分縮器を設け、この分縮器
内の凝縮器へ精留塔で生成した窒素ガスの一部を
常時導入して液化還流液化し、還流液が常時精留
塔内で戻るようにすると同時に、制御手段によつ
て上記精留塔に対する液体窒素貯蔵手段からの液
体窒素の供給量を制御して分縮器の液面を一定に
保つようにするため、負荷変動に対して極めて迅
速に対応でき、その際、製品窒素ガスの純度ばら
つきを生じないのである。しかも、この装置は、
窒素ガス採取後のものであつて精留塔等を経由す
ることによりCO2,H2O等の不純分が除かれてい
る酸素リツチな廃ガス(不用気化液体空気)を窒
素精留塔から吸着筒に供給して酸素ガスを製造す
るため、効率よく酸素ガスを得ることができる。
このように、この発明の装置は、1台の装置で高
純度の窒素ガスと酸素ガスとを効率よく製造する
ことができるため、電子工業向けに最適である。
The high-purity liquid gas production apparatus of the present invention does not use an expansion turbine, but instead uses a liquid nitrogen storage tank that does not have any rotating parts, so the apparatus as a whole does not have any rotating parts, and no failure occurs at all. Furthermore, while expansion turbines are expensive, liquid nitrogen storage tanks are inexpensive and do not require special personnel. Furthermore, the expansion turbine (which is driven by the pressure of the gas evaporated from the liquid air accumulated in the nitrogen rectification column) has an extremely high rotational speed (tens of thousands of rotations/minute), so load fluctuations (removal of product nitrogen gas) It is difficult to perform fine-grained follow-up operation for changes in quantity. Therefore,
Accurately changes the amount of liquid air supplied to the expansion turbine according to changes in the amount of product nitrogen gas extracted,
It is difficult to constantly cool the compressed air, which is the raw material for nitrogen gas production, to a constant temperature, and as a result, the purity of the product nitrogen gas obtained varies, and low-purity products are frequently produced, resulting in the overall production of nitrogen gas purity was decreasing. This device uses a liquid nitrogen storage tank instead, and uses liquid nitrogen, whose supply amount can be finely adjusted, as the cooling source for the compressed air, making it possible to closely follow load fluctuations, and with extremely stable purity. It becomes possible to produce high nitrogen gas. Therefore, conventional purification equipment is not required. In particular, this equipment is equipped with a fractionator with a built-in condenser at the top of the fractionator, and a portion of the nitrogen gas generated in the fractionator is constantly introduced into the condenser inside the fractionator to liquefy and reflux it. At the same time, the control means controls the amount of liquid nitrogen supplied from the liquid nitrogen storage means to the rectification tower to maintain the liquid level in the dephlegmator. Since it is kept constant, it is possible to respond extremely quickly to load fluctuations, and in this case, there is no variation in the purity of the product nitrogen gas. Moreover, this device
Oxygen-rich waste gas (waste vaporized liquid air) from which impurities such as CO 2 and H 2 O have been removed by passing through a rectification tower etc. after nitrogen gas collection is passed from the nitrogen rectification tower. Since oxygen gas is produced by supplying it to the adsorption cylinder, oxygen gas can be obtained efficiently.
As described above, the apparatus of the present invention is ideal for use in the electronics industry because it can efficiently produce high-purity nitrogen gas and oxygen gas with one apparatus.
第1図はこの発明の一実施例の構成図、第2図
は精留塔の変形例の構成図である。
9……空気圧縮機、12……吸着筒、13……
熱交換器、15……窒素精留塔、17……パイ
プ、18……液体空気、21……分縮器、21a
……凝縮器、21d……液体窒素溜め、23……
液体窒素貯槽、24a……導入路パイプ、27…
…取出パイプ、28……メインパイプ、29……
放出路パイプ、40,41,42……吸着筒、4
4……真空ポンプ、45……製品酸素ガス取出
路。
FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a block diagram of a modified example of a rectification column. 9... Air compressor, 12... Adsorption cylinder, 13...
Heat exchanger, 15...Nitrogen rectification column, 17...Pipe, 18...Liquid air, 21...Decentralizer, 21a
...Condenser, 21d...Liquid nitrogen reservoir, 23...
Liquid nitrogen storage tank, 24a...Introduction pipe, 27...
...Takeout pipe, 28...Main pipe, 29...
Discharge pipe, 40, 41, 42... adsorption cylinder, 4
4...Vacuum pump, 45...Product oxygen gas extraction path.
Claims (1)
手段と、この空気圧縮手段によつて圧縮された圧
縮空気中の炭酸ガスと水分とを除去する除去手段
と、この除去手段を経た圧縮空気を超低温に冷却
する熱交換手段と、この熱交換手段により超低温
に冷却された圧縮空気の一部を液化して底部に溜
め窒素のみを気体として上部側から取り出す精留
塔を備えた窒素ガス製造装置において、精留塔の
上部に設けられた凝縮器内蔵型の分縮器と、精留
塔の底部の貯溜液体空気を上記凝縮器冷却用の寒
冷として上記分縮器中に導く液体空気導入パイプ
と、上記分縮器中で生じた気化液体空気を外部に
放出する放出パイプと、精留塔内で生成した窒素
ガスの一部を上記凝縮器内に案内する第1の還流
液パイプと、上記凝縮器内で生じた液化窒素を還
流液として精留塔内に戻す第2の還流液パイプ
と、装置外から液体窒素の供給を受けこれを貯蔵
する液体窒素貯蔵手段と、この液体窒素貯蔵手段
内の液体窒素を冷熱発生用膨脹器からの発生冷熱
に代え圧縮空気液化用の寒冷源として連続的に上
記精留塔内に導く導入路と、上記精留塔に対する
上記液体窒素貯蔵手段からの液体窒素の供給量を
制御することにより上記分縮器内の液体空気の液
面を一定に制御する制御手段と、上記精留塔から
気体として取り出される窒素および上記精留塔内
において寒冷源としての作用を終え気化した上記
液体窒素を上記熱交換手段を経由させその内部を
通る圧縮空気と熱交換させることにより温度上昇
させ製品窒素ガスとする窒素ガス取出路と、窒素
ガス選択吸着能を有する複数の吸着筒と、上記複
数の吸着筒の入口と上記分縮器における放出パイ
プの出口とをそれぞれ連通させる複数の流入路パ
イプと、上記複数の流入路パイプにそれぞれ設け
られた複数の第1の開閉弁と、上記複数の吸着筒
の出口からそれぞれ延びる酸素ガス取出路と、吸
着筒の再生手段と、上記再生手段と上記複数の吸
着筒とを連通させる複数の再生路と、上記複数の
再生路にそれぞれ設けられた複数の第2の開閉弁
と、上記複数個の吸着筒のうちの任意の吸着筒が
吸着作動し残つた吸着筒が再生または休止するよ
う上記第1および第2の開閉弁の開閉制御する開
閉弁制御手段を備えたことを特徴とする高純度窒
素ガス製造装置。1. Air compression means for compressing air taken in from the outside, removal means for removing carbon dioxide and moisture from the compressed air compressed by this air compression means, and cooling the compressed air that has passed through this removal means to an ultra-low temperature. In a nitrogen gas production device equipped with a cooling heat exchange means and a rectification column that liquefies a part of the compressed air cooled to an ultra-low temperature by the heat exchange means and stores it at the bottom and extracts only nitrogen as a gas from the upper side, a condenser with a built-in condenser installed in the upper part of the rectification column; a liquid air introduction pipe that guides the liquid air stored at the bottom of the rectification column into the condenser as cold air for cooling the condenser; a discharge pipe for discharging the vaporized liquid air produced in the fractionator to the outside; a first reflux pipe for guiding a portion of the nitrogen gas produced in the rectification column into the condenser; A second reflux liquid pipe that returns the liquefied nitrogen produced in the vessel as a reflux liquid into the rectification column, a liquid nitrogen storage means for receiving and storing liquid nitrogen from outside the apparatus, and a liquid nitrogen storage means inside the liquid nitrogen storage means. an introduction path for continuously introducing liquid nitrogen into the rectification column as a cold source for liquefying compressed air in place of the cold heat generated from the cold heat generation expander; A control means for controlling the level of liquid air in the dephlegmator to a constant level by controlling the amount of nitrogen supplied; a nitrogen gas extraction path for increasing the temperature of the vaporized liquid nitrogen through the heat exchange means and exchanging heat with the compressed air passing through the heat exchange means to produce a product nitrogen gas; , a plurality of inlet pipes that communicate the inlets of the plurality of adsorption cylinders and the outlet of the discharge pipe in the demultiplexer, and a plurality of first inflow pipes provided in each of the plurality of inflow pipes. an on-off valve, an oxygen gas extraction path extending from the outlet of the plurality of adsorption cylinders, a regeneration means for the adsorption cylinder, a plurality of regeneration paths that communicate the regeneration means with the plurality of adsorption cylinders, and the plurality of regeneration cylinders. A plurality of second opening/closing valves provided respectively in the passages and the first and second opening/closing valves are operated so that any one of the plurality of adsorption cylinders is activated for adsorption and the remaining adsorption cylinder is regenerated or stopped. A high-purity nitrogen gas production device characterized by comprising an on-off valve control means for controlling the opening and closing of a valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59136748A JPS6115068A (en) | 1984-07-02 | 1984-07-02 | Production unit for high-purity nitrogen gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59136748A JPS6115068A (en) | 1984-07-02 | 1984-07-02 | Production unit for high-purity nitrogen gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6115068A JPS6115068A (en) | 1986-01-23 |
| JPS6148071B2 true JPS6148071B2 (en) | 1986-10-22 |
Family
ID=15182582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59136748A Granted JPS6115068A (en) | 1984-07-02 | 1984-07-02 | Production unit for high-purity nitrogen gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6115068A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3432052B2 (en) * | 1994-09-02 | 2003-07-28 | キヤノン株式会社 | Ink jet recording device |
| EP3640571A1 (en) * | 2018-10-18 | 2020-04-22 | Linde Aktiengesellschaft | Method and installation for the production of an oxygen-rich air product |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4940071A (en) * | 1972-08-17 | 1974-04-15 | ||
| GB1463075A (en) * | 1973-04-13 | 1977-02-02 | Cryoplants Ltd | Air separation |
| JPS5935169B2 (en) * | 1974-10-02 | 1984-08-27 | 株式会社東芝 | capacitor |
| DE2542468A1 (en) * | 1975-09-24 | 1977-04-07 | Bayer Ag | HERBICIDAL AGENT |
| JPS5814628B2 (en) * | 1975-09-30 | 1983-03-19 | 横河電機株式会社 | RELENO |
| JPS5514351A (en) * | 1978-07-14 | 1980-01-31 | Aisin Warner Ltd | Controller of automatic change gear |
| JPS5525344A (en) * | 1978-08-11 | 1980-02-23 | Tokyo Electric Co Ltd | Ribbon cassette case |
| JPS5579972A (en) * | 1978-12-11 | 1980-06-16 | Hitachi Ltd | Operation control of nitrogen production system |
| JPS5864478A (en) * | 1981-10-15 | 1983-04-16 | 日本酸素株式会社 | Device for manufacturing nitrogen having high purity |
-
1984
- 1984-07-02 JP JP59136748A patent/JPS6115068A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6115068A (en) | 1986-01-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |