Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6226096B2 - - Google Patents
[go: Go Back, main page]

JPS6226096B2 - - Google Patents

Info

Publication number
JPS6226096B2
JPS6226096B2 JP16784879A JP16784879A JPS6226096B2 JP S6226096 B2 JPS6226096 B2 JP S6226096B2 JP 16784879 A JP16784879 A JP 16784879A JP 16784879 A JP16784879 A JP 16784879A JP S6226096 B2 JPS6226096 B2 JP S6226096B2
Authority
JP
Japan
Prior art keywords
magnetic
magnetic storage
storage body
condenser
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16784879A
Other languages
Japanese (ja)
Other versions
JPS5690426A (en
Inventor
Masahiro Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16784879A priority Critical patent/JPS5690426A/en
Priority to US06/192,566 priority patent/US4380558A/en
Priority to DE19803050525 priority patent/DE3050525C2/en
Priority to DE19803050791 priority patent/DE3050791C2/en
Priority to DE3037168A priority patent/DE3037168C2/en
Publication of JPS5690426A publication Critical patent/JPS5690426A/en
Publication of JPS6226096B2 publication Critical patent/JPS6226096B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 本発明は磁気デイスク装置、磁気ドラム装置な
どの磁気的記憶装置に用いられる磁気記憶体の製
造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a magnetic storage body used in a magnetic storage device such as a magnetic disk device or a magnetic drum device.

一般に記録再生磁気ヘツド(以下ヘツドと呼
ぶ)と磁気記憶体とを構成部とする磁気記憶装置
の記録再生方法には次のような方法がある。すな
わち操作開始時にヘツドと磁気記憶体面とを接触
状態でセツトした後、前記磁気記憶体に所要の回
転を与えることにより前記ヘツドと前記磁気記憶
体面との間に空気層分の空間を作り、この状態で
記録再生をする方法である(コンタクト・スター
ト・ストツプ方式。以下CSS方式と呼ぶ)。この
方法では操作終了時に磁気記憶体の回転が止ま
り、この時ヘツドと磁気記憶体面は操作開始時と
同様に接触摩擦状態にある。
In general, there are the following methods for recording and reproducing a magnetic storage device comprising a recording and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body. That is, after the head and the magnetic storage surface are set in contact at the start of operation, a space corresponding to an air layer is created between the head and the magnetic storage surface by giving the magnetic storage the required rotation, and this This is a method of recording and reproducing in the current state (contact start-stop method, hereinafter referred to as CSS method). In this method, at the end of the operation, the magnetic storage body stops rotating, and at this time the head and the magnetic storage body surface are in a frictional state of contact, as at the beginning of the operation.

これらの接触摩擦状態におけるヘツドと磁気記
憶体の間に生じる摩擦力は、ヘツドおよび磁気記
憶体を摩耗させついにはヘツドおよび金属磁性薄
膜媒体に傷を生じさせることがある。また前記接
触摩擦状態においてヘツドのわずかな姿勢の変化
がヘツドにかゝる荷重を不均一にさせヘツドおよ
び磁気記憶体表面に傷を作ることもある。
The frictional force generated between the head and the magnetic storage material under these contact friction conditions may wear out the head and the magnetic storage material, and may eventually cause scratches on the head and the metal magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head may cause the load on the head to become uneven, causing scratches on the surface of the head and the magnetic storage body.

また更に記録再生中に突発的にヘツドが磁気記
憶体に接触しヘツドと磁気記憶体間に大きな摩擦
力が働き、ヘツドおよび磁気記憶体が破壊される
ことがしばしば起こる。この様なヘツドと磁気記
憶体との接触摩擦、被覆摩耗および接触破壊から
ヘツドおよび磁気記憶体を保護するために磁気記
憶体の表面に保護膜を被覆することが必要であ
る。
Furthermore, during recording and reproducing, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, often resulting in destruction of the head and the magnetic storage body. In order to protect the head and the magnetic memory from such contact friction, coating wear and contact breakage between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film.

従来より種々の保護膜が提案されているが、前
記接触摩擦、接触摩耗又は接触破壊に対し有効な
保護膜として硬度が高くかつ量産性に優れたポリ
珪酸が既に提案されている(特開昭52−20804号
公報参照)。それによつても前記接触摩擦などの
現象に対して磁気記憶体を保護することができる
が、上記接触摩擦などの現象に対する信頼性は高
ければ高い程望ましく、常に信頼性の向上が望ま
れている。
Various protective films have been proposed in the past, and polysilicic acid, which has high hardness and is easy to mass-produce, has already been proposed as a protective film that is effective against contact friction, contact wear, and contact breakage (Japanese Patent Application Laid-Open No. 52-20804). Although this also protects the magnetic memory against phenomena such as the contact friction, the higher the reliability with respect to such phenomena as the contact friction, the more desirable it is, and improvements in reliability are always desired. .

本発明の目的は上記接触摩擦などの現象に対し
てより良く金属磁性薄膜媒体を保護する保護膜を
有しかつ量産性に優れた磁気記憶体の製造方法を
提供することにある。
An object of the present invention is to provide a method for manufacturing a magnetic memory body that has a protective film that better protects a metal magnetic thin film medium against phenomena such as the above-mentioned contact friction and is excellent in mass production.

すなわち本発明の磁気記憶体の製造方法は、金
属磁性媒体の上に塗布したポリ珪酸に焦光器を用
いてレーザー光を照射して焼成することを特徴と
している。
That is, the method for manufacturing a magnetic memory according to the present invention is characterized in that polysilicate coated on a metal magnetic medium is irradiated with laser light using a focuser and fired.

次に図面を参照して本発明を詳細に説明する。 Next, the present invention will be explained in detail with reference to the drawings.

第1図及び第2図は磁気記憶体および焦光器の
断面図である。
FIGS. 1 and 2 are cross-sectional views of a magnetic memory and a focusing device.

図において磁気記憶体の基盤1としてアルミ合
金が軽くて加工性が良く安価なことから最も良く
用いられるが、場合によつてはチタン合金が用い
られることもある。基盤表面は機械加工により小
さなうねり(円周方向で50μm以下半径方向で
100μm以下)を有する面に仕上げられる。
In the figure, aluminum alloy is most often used as the base 1 of the magnetic memory body because it is light, easy to work with, and inexpensive, but titanium alloy may be used in some cases. The surface of the base is machined to create small undulations (less than 50 μm in the circumferential direction and in the radial direction).
100μm or less).

次にこの基盤1の上に下地体2としてニツケル
−燐合金がめつきにより被覆され、この下地体2
の表面は機械的研磨により表面粗さ0.03μm
(Rmax)以下に鏡面仕上げされる。
Next, a nickel-phosphorus alloy is coated on this base 1 as a base body 2 by plating, and this base body 2
The surface has a surface roughness of 0.03μm by mechanical polishing.
Mirror finish is achieved below (Rmax).

次に上記下地体2の鏡面研磨面上に金属磁性媒
体3としてコバルト−ニツケル−燐合金がめつき
により被覆されこの金属磁性媒体3の上に保護膜
4として前に引用した特開昭52−20804号に示さ
れたポリ珪酸4が回転塗布法により被覆される。
次にこのポリ珪酸4を被覆した磁気記憶体の表面
に波長9μm〜11μmの炭酸ガスレーザー光を照
射して上記ポリ珪酸膜4を焼成硬化する。
Next, a cobalt-nickel-phosphorus alloy is coated on the mirror-polished surface of the base body 2 as a metal magnetic medium 3 by plating, and a protective film 4 is formed on the metal magnetic medium 3 in Japanese Patent Application Laid-Open No. 52-20804 cited earlier. The polysilicic acid 4 shown in No. 1 is coated by a spin coating method.
Next, the surface of the magnetic memory body coated with this polysilicate film 4 is irradiated with carbon dioxide laser light having a wavelength of 9 μm to 11 μm to harden the polysilicate film 4 by firing.

レーザ光照射方法として第1図及び第2図に示
したのは、本発明における2つの例である。
The laser beam irradiation methods shown in FIGS. 1 and 2 are two examples of the present invention.

第1図の場合、レーザ光6は凸レンズ7によつ
て絞られ、回転楕円鏡からなる集光器5の一方の
焦点Fに照射され、この時レーザー光はポリ珪酸
膜4に吸収されてポリ珪酸膜4は焼成、硬化され
る。
In the case of FIG. 1, the laser beam 6 is condensed by a convex lens 7 and irradiated onto one focal point F of a condenser 5 made of a spheroidal mirror. At this time, the laser beam is absorbed by the polysilicate film 4 and The silicic acid film 4 is fired and hardened.

ポリ珪酸膜に吸収されなかつたレーザー光は金
属磁性媒体3により反射されて、集光器内面でさ
らに反射された後、集光器5の他の焦点F′を通
つて集光器内面でさらに反射された後、再び焦点
Fに集光されポリ珪酸膜4を焼成硬化する。
The laser light that is not absorbed by the polysilicate film is reflected by the metal magnetic medium 3, further reflected on the inner surface of the condenser, and then further reflected on the inner surface of the condenser through another focal point F' of the condenser 5. After being reflected, the light is focused again on the focal point F, and the polysilicate film 4 is fired and hardened.

前記集光器による反射回数は多ければ多い程レ
ーザー光の吸収エネルギー密度を高めることがで
きるが、上記反射回数は集光器として用いた回転
楕円鏡の回転軸をレーザー光の入射面外方向に傾
けることにより多くすることが出来る。傾き角は
収束レーザー光の収束角程度が望ましい。
The greater the number of reflections by the condenser, the higher the absorption energy density of the laser beam. You can increase it by tilting it. The inclination angle is preferably about the same as the convergence angle of the convergent laser beam.

また前記集光器は第2図のように回転楕円鏡の
両方の焦点を金属磁性媒体表面に置くことも可能
である。この場合は一方の焦点を金属磁性媒体表
面に置く方法に比べ反射回数は半分になるが同時
に2個所のポリ珪酸膜を焼成することが出来る。
この構成の場合には、一方の焦点でポリ珪酸膜に
吸収されなかつたレーザー光は反射されて他方の
焦点でポリ珪酸膜を焼成硬化する。
Further, the condenser can also have both focal points of the spheroidal mirror placed on the surface of the metal magnetic medium as shown in FIG. In this case, the number of reflections is halved compared to the method in which one focal point is placed on the surface of the metal magnetic medium, but the polysilicate film can be fired at two locations at the same time.
In the case of this configuration, the laser beam that is not absorbed by the polysilicate film at one focus is reflected and the polysilicate film is fired and hardened at the other focus.

第1図、第2図いずれの場合でも、磁気記憶体
の広い面積に互つてその保護膜を焼成硬化する場
合には磁気記憶体を面内方向で回転させるなどし
て、焼成硬化する場所を順次移動してゆけばよ
い。
In either case of Fig. 1 or Fig. 2, when baking and hardening the protective film over a wide area of the magnetic storage body, the area to be baked and hardened is adjusted by rotating the magnetic storage body in the in-plane direction. You can move in sequence.

ポリ珪酸は、波長4〜50μmの範囲では光の吸
収が大きくなり、赤外線スペクトルによると特に
9〜10μmの範囲に大きな吸収があり、波長9〜
11μmの炭酸ガスレーザーをよく吸収することが
分る。
Polysilicic acid has a large absorption of light in the wavelength range of 4 to 50 μm, and according to the infrared spectrum, it has a particularly large absorption in the 9 to 10 μm range;
It can be seen that the 11 μm carbon dioxide laser is well absorbed.

炭酸ガスレーザー光によるポリ珪酸の焼成法は
上記に示した様なポリ珪酸のレーザー光の吸収に
よる熱硬化以外に下地体2として用いられるニツ
ケル−燐合金を帯磁させたりあるいは金属磁性媒
体3として用いられるコバルト−ニツケル−燐合
金の磁気特性を損なうことがないことも優れた特
徴の1つであるが、レーザー光のエネルギー密度
が高い程上記効果が著るしい。すなわち、ポリ珪
酸膜と金属磁性媒体または下地体との温度勾配を
高くかつポリ珪酸膜の焼成温度を高く焼成時間を
短かくすることが出来る。すなわち本発明で示さ
れた集光器を用いてレーザー光の吸収エネルギー
密度(ポリ珪酸に吸収されるレーザー光のエネル
ギー密度)を高めることにより下地体の帯磁また
は金属磁性媒体の磁気特性の劣化なしにより硬
く、ヘツドとの接触摩擦に対して優れたポリ珪酸
膜を形成することが出来る。
In addition to thermal curing of polysilicic acid by absorption of laser light as described above, the method of firing polysilicic acid using carbon dioxide laser light is also used to magnetize the nickel-phosphorus alloy used as the base body 2 or to use it as the metal magnetic medium 3. One of the excellent features is that the magnetic properties of the cobalt-nickel-phosphorus alloy produced are not impaired, but the higher the energy density of the laser beam, the more remarkable the above effect becomes. That is, it is possible to increase the temperature gradient between the polysilicate film and the metal magnetic medium or the base body, increase the firing temperature of the polysilicate film, and shorten the firing time. In other words, by increasing the absorption energy density of laser light (the energy density of laser light absorbed by polysilicate) using the condenser shown in the present invention, there is no magnetization of the substrate or deterioration of the magnetic properties of the metal magnetic medium. It is possible to form a polysilicate film that is harder and has excellent resistance to contact friction with the head.

次に実施例および比較例により本発明の磁気記
憶体の製造方法を詳細に説明する。
Next, the method for manufacturing the magnetic storage body of the present invention will be explained in detail with reference to Examples and Comparative Examples.

実施例 1 基盤1として施盤加工および熱矯正によつて十
分小さなうねり(円周方向で50μm以下、半径方
向で10μm以下)をもつた面に仕上げられたデイ
スク状アルミニウム合金盤上に下地体2としてニ
ツケル−燐合金を約50μmの厚さにめつきしこの
ニツケル−燐めつき膜を表面粗さ0.02μm
(Rmax)厚さ30μmまで鏡面研磨仕上げした。
Example 1 As the substrate 1, a disc-shaped aluminum alloy plate whose surface was finished with sufficiently small waviness (50 μm or less in the circumferential direction and 10 μm or less in the radial direction) by lathe machining and thermal straightening was used as the base body 2. The nickel-phosphorus alloy is plated to a thickness of about 50 μm, and the nickel-phosphorus plating film has a surface roughness of 0.02 μm.
(Rmax) Mirror polished to a thickness of 30μm.

次にこのニツケル−燐めつき膜の上に磁性媒体
3としてコバルト−ニツケル−燐合金を0.05μm
の厚さにめつきした。このコバルト−ニツケル−
燐めつき膜の上にテトラヒドロキシシランの2%
n−ブチルアルコール溶液を0.1μmの厚さに塗
布、乾燥後、200℃30分焼成してポリ珪酸にし、
保護膜とした。
Next, on this nickel-phosphorus plating film, a cobalt-nickel-phosphorus alloy with a thickness of 0.05 μm was coated as a magnetic medium 3.
I was impressed by the thickness. This cobalt - nickel -
2% of tetrahydroxysilane on top of phosphor plated film
Apply n-butyl alcohol solution to a thickness of 0.1 μm, dry, and bake at 200°C for 30 minutes to make polysilicic acid.
It was used as a protective film.

次に回転楕円鏡からなる集光器の一方の焦点を
第1図のように金属磁性媒体表面に合わせてこの
焦点に出力250W、ビーム直径1cmの連続発振炭
酸ガスレーザーをスポツト径0.1mmに絞つて照射
してポリ珪酸を焼成し、磁気デイスクを作つた。
Next, one focus of the condenser consisting of a spheroidal mirror is aligned with the surface of the metal magnetic medium as shown in Figure 1, and a continuous wave carbon dioxide laser with an output of 250 W and a beam diameter of 1 cm is focused to a spot diameter of 0.1 mm. The polysilicic acid was fired by irradiation and a magnetic disk was made.

実施例 2 実施例1と同様にして但し光源として出力
500W、ビーム直径1cmの炭酸ガスレーザーと、
集光器として2つの焦点を金属磁性媒体表面に合
わせた第2図に示した回転楕円鏡を用いて磁気デ
イスクを作つた。
Example 2 Same as Example 1, but output as a light source
500W, carbon dioxide laser with a beam diameter of 1cm,
A magnetic disk was fabricated using a spheroidal mirror shown in FIG. 2 with two focal points aligned with the surface of a metal magnetic medium as a condenser.

比較例 実施例1と同様にして、但し集光器を用いずに
ポリ珪酸膜を照射焼成し磁気デイスクを作つた。
Comparative Example A magnetic disk was produced in the same manner as in Example 1, except that a polysilicate film was irradiated and fired without using a condenser.

実施例1、2および比較例で示した各磁気デイ
スクを用いて0.03Rサフアイア針による引掻試験
を行なつたところ、比較例は140gの荷重でポリ
珪酸表面に引掻傷が生じたが、実施例1、2は
160gの荷重まで引掻傷は生じなかつた。
When a scratch test with a 0.03R sapphire needle was performed using each of the magnetic disks shown in Examples 1 and 2 and the comparative example, scratches occurred on the polysilicate surface in the comparative example under a load of 140 g. Examples 1 and 2
No scratches occurred up to a load of 160 g.

なお実施例、比較例共に研磨特性およびニツケ
ル−燐膜の帯磁はなく、磁気ヘツドとの3万回の
CSS試験においても全く異常はなかつた。
It should be noted that in both Examples and Comparative Examples, there was no polishing property and no magnetization of the nickel-phosphorous film, and after 30,000 times with a magnetic head.
There were no abnormalities at all in the CSS test.

また一面当りの照射時間は直径14インチのデイ
スクの場合、数分以下であつたが、比較例の場合
は10数分を要した。また集光器を用いた場合、比
較例と同程度の引掻強度を得るには出力50Wの光
源で十分であつた。
Further, the irradiation time per surface was several minutes or less in the case of a disk with a diameter of 14 inches, but in the case of the comparative example, it required more than 10 minutes. Furthermore, when a light concentrator was used, a light source with an output of 50 W was sufficient to obtain the same scratch strength as the comparative example.

以上のことから本発明の磁気記憶体の製造方法
によつて製造した磁気デイスクは、より優れた信
頼性と量産性を有していることが分つた。
From the above, it was found that the magnetic disk manufactured by the method for manufacturing a magnetic storage body of the present invention has superior reliability and mass productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は、それぞれ本発明の実施例
を示す図で、磁気記憶体、集光器及びレンズの断
面図を表わしている。 図において、1は基盤、2は下地体、3は磁性
媒体、4は保護膜、5は集光器、6はレーザー
光、7はレンズ、FおよびF′は集光器の焦点で
ある。
FIG. 1 and FIG. 2 are diagrams showing embodiments of the present invention, respectively, and show cross-sectional views of a magnetic storage body, a condenser, and a lens. In the figure, 1 is a base, 2 is a base, 3 is a magnetic medium, 4 is a protective film, 5 is a condenser, 6 is a laser beam, 7 is a lens, and F and F' are the focal points of the condenser.

Claims (1)

【特許請求の範囲】 1 鏡面研磨された下地体の上に磁性媒体を被覆
し、該磁性媒体の上にポリ珪酸を被覆した後、レ
ーザー光を照射して該ポリ珪酸を焼成する磁気記
憶体の製造方法において、集光器を用いてレーザ
ー光を照射することを特徴とする磁気記憶体の製
造方法。 2 集光器が回転楕円鏡である特許請求の範囲第
1項に記載の磁気記憶体の製造方法。 3 回転楕円鏡の2つの焦点の内、一方の焦点を
磁性媒体表面に設けた特許請求の範囲第2項に記
載の磁気記憶体の製造方法。 4 回転楕円鏡の2つの焦点を磁性媒体表面に設
けた特許請求の範囲第2項に記載の磁気記憶体の
製造方法。 5 回転楕円鏡の回転軸が入射面内に含まれない
特許請求の範囲第3項に記載の磁気記憶体の製造
方法。
[Claims] 1. A magnetic storage body in which a mirror-polished base body is coated with a magnetic medium, the magnetic medium is coated with polysilicic acid, and the polysilicic acid is fired by irradiating laser light. A method for manufacturing a magnetic memory body, comprising irradiating a laser beam using a condenser. 2. The method for manufacturing a magnetic storage body according to claim 1, wherein the condenser is a spheroidal mirror. 3. The method of manufacturing a magnetic storage body according to claim 2, wherein one of the two focal points of the spheroidal mirror is provided on the surface of the magnetic medium. 4. The method of manufacturing a magnetic storage body according to claim 2, wherein two focal points of the spheroidal mirror are provided on the surface of the magnetic medium. 5. The method of manufacturing a magnetic storage body according to claim 3, wherein the rotation axis of the spheroidal mirror is not included in the plane of incidence.
JP16784879A 1979-10-02 1979-12-24 Production of magnetic storage material Granted JPS5690426A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP16784879A JPS5690426A (en) 1979-12-24 1979-12-24 Production of magnetic storage material
US06/192,566 US4380558A (en) 1979-10-02 1980-09-30 Process for manufacturing a protective polysilicate layer of a record member by a laser beam and a magnetic record member suitably manufactured thereby
DE19803050525 DE3050525C2 (en) 1979-10-02 1980-10-01 Protective poly:silicate coating prodn. on magnetic recording material - by applying tetra:hydroxy-silane, precure and laser irradiation to complete cure
DE19803050791 DE3050791C2 (en) 1979-10-02 1980-10-01 Process for the simultaneous production of two magnetic recording media
DE3037168A DE3037168C2 (en) 1979-10-02 1980-10-01 Process for the production of a magnetic recording medium by means of laser radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16784879A JPS5690426A (en) 1979-12-24 1979-12-24 Production of magnetic storage material

Publications (2)

Publication Number Publication Date
JPS5690426A JPS5690426A (en) 1981-07-22
JPS6226096B2 true JPS6226096B2 (en) 1987-06-06

Family

ID=15857201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16784879A Granted JPS5690426A (en) 1979-10-02 1979-12-24 Production of magnetic storage material

Country Status (1)

Country Link
JP (1) JPS5690426A (en)

Also Published As

Publication number Publication date
JPS5690426A (en) 1981-07-22

Similar Documents

Publication Publication Date Title
JPH0118500B2 (en)
JPS63249933A (en) magnetic disk media
JPS63153747A (en) Production of optical recording medium
JPWO1998021718A1 (en) Optical information recording medium and its manufacturing method
US4380558A (en) Process for manufacturing a protective polysilicate layer of a record member by a laser beam and a magnetic record member suitably manufactured thereby
JPS6226096B2 (en)
JPS6216452B2 (en)
JPS6226095B2 (en)
JPS639302B2 (en)
JPS6250884B2 (en)
JP3146917B2 (en) Manufacturing method of magnetic recording medium
JPS639301B2 (en)
JP2002092969A (en) Method of manufacturing optical disk and optical disk
JP3298792B2 (en) Optical recording medium initialization method
JPS58194131A (en) Manufacture of magnetic storage body
JPH0215922B2 (en)
JP2856131B2 (en) Method for forming protrusions on magnetic recording medium and magnetic recording medium
JPH07225943A (en) Magnetic recording medium
JPS6329339A (en) information carrier disk
JPS62128021A (en) Magnetic disk substrate
JP2002032933A (en) Information recording medium and method of manufacturing the same
JPH01273244A (en) Production of optical disk
JPS61258351A (en) Optical disk
JPS5940336A (en) Information recording medium
JP2005004950A (en) Optical information recording medium and manufacturing method thereof