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JPS6227930B2 - - Google Patents
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JPS6227930B2 - - Google Patents

Info

Publication number
JPS6227930B2
JPS6227930B2 JP1365977A JP1365977A JPS6227930B2 JP S6227930 B2 JPS6227930 B2 JP S6227930B2 JP 1365977 A JP1365977 A JP 1365977A JP 1365977 A JP1365977 A JP 1365977A JP S6227930 B2 JPS6227930 B2 JP S6227930B2
Authority
JP
Japan
Prior art keywords
machining
frequency component
discharge
high frequency
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1365977A
Other languages
Japanese (ja)
Other versions
JPS5398598A (en
Inventor
Kyoshi Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP1365977A priority Critical patent/JPS5398598A/en
Publication of JPS5398598A publication Critical patent/JPS5398598A/en
Publication of JPS6227930B2 publication Critical patent/JPS6227930B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H1/00Electrical discharge machining, i.e. removing metal with a series of rapidly recurring electrical discharges between an electrode and a workpiece in the presence of a fluid dielectric
    • B23H1/02Electric circuits specially adapted therefor, e.g. power supply, control, preventing short circuits or other abnormal discharges
    • B23H1/024Detection of, and response to, abnormal gap conditions, e.g. short circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Description

【発明の詳細な説明】 本発明は電極と被加工体を対向した加工間隙に
加工パルスによる繰返し放電を行なつて加工する
放電加工(電蝕加工を含む)に於て、行なわれて
いる放電の状態が良いか悪いか、即ち加工間隙の
状態変化、その良、否を正確に検出し、判別する
こと、更にそれによつて加工状態を最良に制御す
ることを目的とする。
Detailed Description of the Invention The present invention is applicable to electric discharge machining (including electrolytic erosion machining) in which machining is performed by repeatedly generating electric discharge using machining pulses in the machining gap between an electrode and a workpiece facing each other. The purpose of this invention is to accurately detect and determine whether the state of the machining gap is good or bad, that is, the change in the state of the machining gap, and whether it is good or bad, and to thereby optimally control the machining state.

放電加工に於ては、間隙状態(放電状態)に応
じて加工パルスを制御したり、加工液の流速、電
導度の制御、加工屑が堆積したとき電極振動、電
極引上げによる洗浄作業、間隙長を加工に追従さ
せるためのサーボ制御等を最適に行なうことが必
要である。従来、加工間隙の状態、放電の良否等
を検出するのに間隙の電圧又は電流中に生ずる高
周波成分(振動成分)の存否を利用することが知
られている。高周波成分は第1図に電圧波形を示
すように、各パルス放電の直流成分の放電維持電
圧に高周波成分電圧△V(振幅)が重畳された形
をとる。VGは―パルス放電中の加工間隙の平均
電圧である。重畳された前記高周波成分電圧は通
常周波数が1MHz〜30MHz程度であり、一旦アー
ク状態が確立されると同時にこの高周波成分は消
え去るものである。勿論短絡によつても発生しな
い。従つて従来はこの周波数成分が有るか無いか
を検出し判別して、高周波成分が存在すれば良好
な放電であり、高周波成分が無ければ不良放電を
判定し、又これによつて加工状態の制御を行なう
ようにしていた。
In electrical discharge machining, machining pulses are controlled according to the gap state (discharge state), flow rate of machining fluid, control of electrical conductivity, electrode vibration when machining debris accumulates, cleaning work by pulling up the electrode, and gap length. It is necessary to optimally perform servo control, etc. to follow the machining. Conventionally, it has been known to utilize the presence or absence of a high frequency component (vibration component) generated in the voltage or current in the gap to detect the state of the machining gap, the quality of discharge, etc. As shown in the voltage waveform of FIG. 1, the high frequency component takes the form of a high frequency component voltage ΔV (amplitude) superimposed on the discharge sustaining voltage of the DC component of each pulse discharge. V G - is the average voltage of the machining gap during pulse discharge. The superimposed high frequency component voltage usually has a frequency of about 1 MHz to 30 MHz, and once an arc state is established, this high frequency component disappears. Of course, this does not occur even due to a short circuit. Therefore, in the past, the presence or absence of this frequency component was detected and determined, and if a high frequency component was present, it was determined that the discharge was good, and if there was no high frequency component, it was determined that it was a bad discharge, and based on this, it was determined that the discharge was bad. I was trying to control it.

しかしながら従前のように高周波成分の存否を
検出しただけではアーク放電か否かを判定できる
だけで、それが加工液の種類、特性の変化等に対
応して加工条件に適合したものであるか否か等を
これをもつて正確な判定をすることができなかつ
た。
However, by simply detecting the presence or absence of high-frequency components as in the past, it is only possible to determine whether or not there is an arc discharge. etc., it was not possible to make an accurate judgment based on this.

しかるにその後の研究によれば、同一加工条件
で放電加工する場でも、加工液の平均分子量に依
存性があり、それによつて高周波成分の発生、高
周波成分電圧の振幅が変化することがわかつた。
即ち分子量の小さい純水(分子量18)では高周波
成分電圧△Vは極めて小さく、ケロシン(分子量
200〜300)では△Vは大きく、更にスピンドル油
(分子量〜700)では更に大きい△Vが発生する。
However, subsequent research has revealed that even when electrical discharge machining is performed under the same machining conditions, there is a dependence on the average molecular weight of the machining fluid, which changes the generation of high-frequency components and the amplitude of the high-frequency component voltage.
In other words, in pure water with a small molecular weight (molecular weight 18), the high frequency component voltage △V is extremely small;
200 to 300), ΔV is large, and spindle oil (molecular weight ~700) produces an even larger ΔV.

本発明はかかる点に鑑みて提案されたものであ
る。即ち、加工液の分子量に依存して分子量が大
きくなるほど、放電によつて発生する高周波成分
電圧△Vが大きくなるから、この関係を考慮して
正常か否かを判別する必要があり、それによつて
正確な放電状態の判定、制御を行なえるようにし
たものである。
The present invention has been proposed in view of this point. In other words, it depends on the molecular weight of the machining fluid, and as the molecular weight increases, the high frequency component voltage △V generated by discharge increases, so it is necessary to consider this relationship to determine whether or not it is normal. This makes it possible to accurately determine and control the discharge state.

第2図は、同一加工条件に於て、分子量の異な
る加工液を用いて放電加工した実験結果に基づい
て、検出した正常なパルス放電の間隙電圧をグラ
フしたものである。横軸は加工液の平均分子量
で、混合量比による加工液の分子量の平均値であ
る。縦軸が加工間隙電圧(波高値)Vmを示す。
図のようにパルス放電中の間隙電圧は、陽極降下
電圧Vaと陰極降下電圧Vcとの和Va+Vcの直流成
分電圧と高周波成分電圧△V(振幅)とがプラス
したものとなる。即ち、Vm=Va+Vc+△Vで高
周波成分電圧△Vが直流バイアスされて加工間隙
電圧Vmを形成する。高周波成分電圧△Vは周波
数が前記したように1〜30MHz程度であるが、こ
の電圧△Vは加工液の分子量に応じて増大する。
実験によれば、6mmφのCu電極で、SKD−11材
を放電加工するとき、τon=150μs、τoff=12
μs、Ip=10Aの加工条件で放電し、分子量の異
なる加工液に対応して各高周波成分電圧△Vを測
定したとき、分子量の小さい純水(分子量10〜
20)では正常な放電でも△V=1Vと極めて小さ
い、純水にポリエチレングリコール(分子量約
1000程度のもの)を混合して平均分子量を100と
した加工液では△V=5V、又平均分子量を300程
度とした加工液では△V=8V、更に平均分子量
を600程度にした場合は△V=10V程度になつ
た。又平均分子量200〜300のケロシンでは△V≒
8V、又平均分子量700程度のスピンドル油では△
V≒10Vであつた。又ポリビニールアルコール、
ゼラチン等を混合して平均分子量を変えたときも
前記ポリエチレングリコールの場合の△Vとほぼ
同程度であつた。これは陰極から放射する電子が
媒体の高分子に吸収されることにより放電がパル
ス化され易く高周波が発生するが、媒体が低分子
であると電子を吸収し妨害するものがなく、又電
子が多くなり過ぎると放電が持続してしまい高周
波成分の発生が少なくなると考えられている。又
これから媒体液に高分子量のものを用いても、加
工中にクラツキング、低分子化が行なわれれば、
高周波成分電圧は次第に低減し、遂にはアークに
達することがわかる。又、前記より加工液の種類
にかかわらず加工液の平均分子量に対応して高周
波成分電圧△Vが発生することがわかる。
FIG. 2 is a graph of the gap voltage of normal pulse discharge detected based on the experimental results of electric discharge machining using machining fluids with different molecular weights under the same machining conditions. The horizontal axis is the average molecular weight of the processing fluid, which is the average value of the molecular weight of the processing fluid depending on the mixing ratio. The vertical axis shows the machining gap voltage (peak value) Vm.
As shown in the figure, the gap voltage during the pulse discharge is the sum of the anode drop voltage Va and the cathode drop voltage Vc (Va+Vc) plus the DC component voltage and the high frequency component voltage ΔV (amplitude). That is, the high frequency component voltage ΔV is DC biased to form the machining gap voltage Vm with Vm=Va+Vc+ΔV. The high frequency component voltage ΔV has a frequency of about 1 to 30 MHz as described above, but this voltage ΔV increases depending on the molecular weight of the processing fluid.
According to experiments, when performing electrical discharge machining on SKD-11 material using a 6mmφ Cu electrode, τon = 150μs, τoff = 12
When electric discharge was performed under the machining conditions of μs, Ip = 10A, and each high frequency component voltage △V was measured corresponding to machining fluids with different molecular weights, pure water with a small molecular weight (molecular weight 10~
20), even during normal discharge, △V = 1V, which is extremely small.
For a processing fluid with an average molecular weight of 100 (approximately 1000), △V = 5V, for a processing fluid with an average molecular weight of approximately 300, △V = 8V, and when the average molecular weight is further increased to approximately 600, △ V=10V. Also, for kerosene with an average molecular weight of 200 to 300, △V≒
8V and spindle oil with an average molecular weight of about 700 △
V≒10V. Also polyvinyl alcohol,
Even when the average molecular weight was changed by mixing gelatin or the like, it was almost the same as ΔV in the case of polyethylene glycol. This is because the electrons emitted from the cathode are absorbed by the polymer in the medium, making the discharge easy to pulse and generate high frequencies. However, if the medium is a low molecule, there is nothing to absorb and interfere with the electrons, and the electrons are It is thought that if the number increases too much, the discharge will continue and the generation of high frequency components will decrease. Also, even if a high molecular weight medium is used in the future, if cracking or lower molecular weight occurs during processing,
It can be seen that the high frequency component voltage gradually decreases and finally reaches the arc. Further, it can be seen from the above that regardless of the type of machining fluid, a high frequency component voltage ΔV is generated corresponding to the average molecular weight of the machining fluid.

このように放電時に発生する高周波成分電圧は
加工液の平均分子量に依存するものであるから、
その良否の判別は加工液の分子量に対応した基準
値を設定して判別することにより、放電状態の検
出が正確にできることになる。
Since the high frequency component voltage generated during discharge is dependent on the average molecular weight of the machining fluid,
The discharge state can be accurately detected by setting a reference value corresponding to the molecular weight of the machining fluid to determine its quality.

以下図面の一実施例によつて本発明を説明す
る。第3図に於て、1は電極及び被加工体より形
成される加工間隙で、2のトランジスタ等のスイ
ツチ素子で電圧源をオン・オフスイツチングして
加工パルスを発生するパルス電源から加工パルス
が繰返供給され、放電加工される。3は加工間隙
1の加工パルスによる各放電時の電圧(又は電
流)を検出する検出回路、4は高域フイルタ回路
で、検出信号に含まれる高周波成分電圧△V(約
1〜30MHz)だけを通過させ出力する。5はフイ
ルタを通過した高周波出力△Vを増幅して比例し
た直流出力電圧に変える増幅器で、この出力を次
の比較回路6で比較判別する。比較回路6には加
工液の平均分子量の値に応じてプリセツト回路7
から比較基準信号が加えられている。この比較回
路は、例えばシユミツトを用いてもよい。シユミ
ツトの位相反転電圧をプリセツト回路7でプリセ
ツトするようにしてもよい。このプリセツト値
(比較基準値)は第2図に説明したように加工液
に分子量の小さい水を利用したときは△Vが小さ
いから、それに対応して小さく、ケロシン、スピ
ンドル油、その他の分子量の大きい液を使用した
ときは△Vに比例して大きい値に設定する。又分
子量の高い物質を添加して平均分子量を制御した
ときはその平均分子量の値に対応して設定するも
のとする。
The present invention will be explained below with reference to an embodiment of the drawings. In Figure 3, 1 is the machining gap formed by the electrode and the workpiece, and 2 is the machining pulse from a pulse power source that generates machining pulses by switching the voltage source on and off using a switch element such as a transistor. is repeatedly supplied and subjected to electrical discharge machining. 3 is a detection circuit that detects the voltage (or current) at each discharge caused by the machining pulse in the machining gap 1, and 4 is a high-pass filter circuit that detects only the high frequency component voltage △V (approximately 1 to 30 MHz) included in the detection signal. Pass through and output. Reference numeral 5 denotes an amplifier that amplifies the high frequency output ΔV that has passed through the filter and converts it into a proportional DC output voltage, and this output is compared and determined by the next comparison circuit 6. The comparison circuit 6 includes a preset circuit 7 according to the average molecular weight of the processing fluid.
A comparison reference signal is added from. This comparison circuit may use, for example, a Schmitt circuit. The Schmitt phase inversion voltage may be preset by the preset circuit 7. As explained in Fig. 2, this preset value (comparison reference value) is correspondingly small because △V is small when water with a small molecular weight is used as the machining fluid. When using a large liquid, set it to a large value in proportion to △V. Further, when the average molecular weight is controlled by adding a substance with a high molecular weight, the value shall be set in accordance with the value of the average molecular weight.

例えば、第2図を利用して、平均分子量20の
加工液を用いた加工では基準値を1V、分子量100
の加工液の場合は基準値を5V、分子量300の加工
液の場合は基準値を8V、分子量700の加工液の場
合は基準値を10Vというように各々加工液の分子
量に対応して最適値を設定する。
For example, using Figure 2, for processing using a processing fluid with an average molecular weight of 20, set the reference value to 1V and a molecular weight of 100.
For machining fluids with a molecular weight of 300, the standard value is 5V, for machining fluids with a molecular weight of 700, the standard value is 10V, and so on, depending on the molecular weight of the machining fluid. Set.

このようにして比較回路6にはプリセツト基準
信号と検出した増幅器5からの信号が加わり、比
較され、検出信号が設定値に等しいかそれ以上で
あると信号が出力するようにし、それをパルス回
路8でパルス変換する。即ち、このパルス回路8
の出力は所定の高周波成分を有する放電であり、
且つ高周波成分電圧△Vが或る設定値以上の良好
な放電(OK)であることを示す。9は前記の検
出判別信号を比較集合するためのアツプダウンカ
ウンタ、10は検出回路3の検出信号を所定パル
スに変換するパルス回路で、即ち間隙1に発生す
る全ての放電の発生数をパルス数に変える。11
は放電パルス数をカウントするプリセツトカウン
タで、放電数を所定のプリセツト数までカウント
し、全放電数に比例する信号を出力する。前記ア
ツプダウンカウンタ9には前記のOK信号と、こ
の全放電数に比例する信号とが加わり、例えば
OK信号でアツプカウントし、全放電数に比例す
る信号でダウンカウントするようにカウントす
る。勿論OK信号もプリセツトカウンタ(図示せ
ず)で或る設定プリセツト数まで集合してアツプ
ダウンカウンタ9に加えるようにしてもよいが、
通常の放電加工条件の加工に於てOK信号と放電
数信号に比例する信号をカウントするアツプダウ
ンカウンタ9のカウント数はある値に平衡するよ
うプリセツトカウンタで制御するようにする。
In this way, the preset reference signal and the detected signal from the amplifier 5 are added to the comparator circuit 6 and compared, and if the detected signal is equal to or greater than the set value, a signal is output, and the signal is sent to the pulse circuit. 8 to perform pulse conversion. That is, this pulse circuit 8
The output is a discharge with a predetermined high frequency component,
In addition, the high frequency component voltage ΔV is higher than a certain set value, indicating good discharge (OK). 9 is an up-down counter for comparing and collecting the detection discrimination signals, and 10 is a pulse circuit that converts the detection signal of the detection circuit 3 into a predetermined pulse; Change to 11
is a preset counter for counting the number of discharge pulses, which counts the number of discharges up to a predetermined preset number and outputs a signal proportional to the total number of discharges. The up-down counter 9 receives the OK signal and a signal proportional to the total number of discharges, for example.
It counts up with an OK signal and counts down with a signal proportional to the total number of discharges. Of course, the OK signals may also be collected up to a certain preset number by a preset counter (not shown) and added to the up-down counter 9.
During machining under normal electrical discharge machining conditions, the count number of the up-down counter 9, which counts signals proportional to the OK signal and the discharge number signal, is controlled by a preset counter so that it balances to a certain value.

加工間隙1に繰返し発生する各パルス放電は、
高周波成分を含むもの、アーク・短絡等種々含ま
れ、これらの全放電数はパルス回路10及びプリ
セツトカウンタ11で検出されてアツプダウンカ
ウンタ9に加わる。一方高周波成分を含むものは
フイルタ4によつて分けられ、更に使用する加工
液によつて発生する高周波成分電圧が所定以上の
ものか否かが比較回路6で弁別される。即ち例え
ば加工液として高い分子量のものを用いたにも拘
わらず、低分子量液を用いたときの高周波成分電
圧しか発生しないときは、これを良好な放電、
OK放電とはしない、というように弁別するもの
で、高周波成分電圧が検出されてもアーク放電に
なる一歩手前のような放電は弁別して除去され、
設定された加工液、加工条件に於て正常と認めら
れた放電のみがアツプダウンカウンタ9に加わ
る。アツプダウンカウンタ9のカウントは全放電
発生数に対するOK放電数の比を表示するが、
OK放電が前記のように厳密な弁別に基づいて、
その放電数をカウントしたものであるから、カウ
ンタ9の出力は極めて正確な放電状態、加工状態
を検出検知することができる。アツプダウンカウ
ンタ9はOK信号でアツプカウントするからカウ
ント数が増加するときは放電状態は良好であり、
カウント数が減少するときは放電状態が悪いこと
を示す。カウンタ9の出力は表示装置で表示して
もよく、この信号を利用して加工条件制御をして
もよい。図示する回路12は加工パルス電源2の
制御回路で、加工パルスのパルス幅τon、休止
幅τoff、繰返周波数F等を制御するが、放電状
態の正確な検出によつて制御が行なわれるもので
あるから、常に適正な制御が行なわれる。
Each pulse discharge that repeatedly occurs in machining gap 1 is
Various types of discharges are included, such as those containing high frequency components, arcs and short circuits, and the total number of these discharges is detected by the pulse circuit 10 and the preset counter 11 and added to the up-down counter 9. On the other hand, those containing high frequency components are separated by a filter 4, and further, a comparator circuit 6 discriminates whether the high frequency component voltage generated by the working fluid used is higher than a predetermined value. That is, for example, if a high molecular weight machining fluid is used, but only the high frequency component voltage is generated when a low molecular weight fluid is used, this can be considered as a good discharge,
This system distinguishes discharges that are one step away from becoming arc discharges even if high-frequency component voltages are detected and eliminates them.
Only discharges recognized as normal under the set machining fluid and machining conditions are applied to the up-down counter 9. The count of the up-down counter 9 displays the ratio of the number of OK discharges to the total number of discharges,
OK discharge is based on strict discrimination as mentioned above.
Since the number of discharges is counted, the output of the counter 9 allows extremely accurate detection of the discharge state and machining state. The up-down counter 9 counts up in response to the OK signal, so when the count increases, the discharge condition is good.
When the count number decreases, it indicates that the discharge condition is poor. The output of the counter 9 may be displayed on a display device, and this signal may be used to control processing conditions. The illustrated circuit 12 is a control circuit for the machining pulse power source 2, and controls the pulse width τon, pause width τoff, repetition frequency F, etc. of the machining pulse, but the control is performed by accurate detection of the discharge state. Therefore, appropriate control is always performed.

尚、加工間隙に繰返される各放電の検出回路3
による検出は1パルス放電時間中の全時間を検出
してもよいが、放電の始め、中頃、終り時にチエ
ツクするようにしてもよい。この場合、高周波成
分は、放電柱の圧力、温度が時間的に変化し、媒
体の温度による分解によつて分子量が変化するの
で、放電の始め、約15μsec以内程度に時間を定
めて検出し判別することが高精度な検出を可能な
らしめる。
In addition, the detection circuit 3 of each electric discharge repeated in the machining gap
The detection may be performed over the entire period of one pulse discharge time, but it may also be checked at the beginning, middle, and end of the discharge. In this case, the pressure and temperature of the discharge column change over time, and the molecular weight of the high-frequency component changes due to decomposition due to the temperature of the medium, so the high-frequency component is detected and determined at a fixed time within about 15 μsec at the beginning of the discharge. This makes highly accurate detection possible.

又検出信号は高周波成分を含む信号電圧を検出
し、この検出信号電圧を判別するようにしてもよ
い。
Alternatively, the detection signal may be a signal voltage containing a high frequency component, and this detection signal voltage may be discriminated.

又このように高周波成分電圧又はこれを含む信
号電圧の検出によつて、放電状態、加工状態の良
否を判別するための論理回路は、前記のように
OK信号と全放電数信号との比を利用する以外、
OK信号とOK以外の放電信号との比、差、又は
OK信号、OK以外の信号等の計数時間信号との
比、又はOK信号とアーク・短絡信号との比、
差、その他諸種の論理回路構成を利用することが
できる。
In addition, the logic circuit for determining the quality of the discharge state and machining state by detecting the high frequency component voltage or the signal voltage including the high frequency component voltage is as described above.
In addition to using the ratio between the OK signal and the total discharge number signal,
Ratio, difference, or
The ratio of the OK signal, a signal other than OK, etc. to the counting time signal, or the ratio of the OK signal to the arc/short circuit signal,
difference, and various other logic circuit configurations can be used.

そしてこの高周波成分電圧又は高周波成分を含
む信号電圧の検出による放電状態の判別に基づい
て、例えば媒体液の分子量が減少したことにより
高周波成分電圧△Vが所定値以下に低減したと
き、休止時間τoffを制御して媒体液の回復を計
るときは、τoffを少なくとも10-4〜2×10-4sec
(100μs)の休止制御をする。これは放電応答、
即ち放電で振動を有するような放電を起こさせる
ためのイオン、電子モビリテイーに基づく時間を
必要とし、これが丁度前記10-4〜2×10-4sec程
度であるからである。
Based on the discrimination of the discharge state by detecting this high frequency component voltage or signal voltage including a high frequency component, when the high frequency component voltage △V is reduced to a predetermined value or less due to a decrease in the molecular weight of the medium liquid, for example, the pause time τoff is determined. When measuring the recovery of the medium by controlling the
(100μs) pause control. This is the discharge response,
That is, a time based on ion and electron mobility is required to cause a discharge with vibration, and this time is approximately 10 -4 to 2×10 -4 sec.

又、検出、判別した信号に基づいて、加工液の
分子量の制御、例えばペース液に対して高分子量
の溶液添加制御、添加量の制御を行なつてもよ
く、加工液の噴流速度、流量制御、又電極の振動
制御、振動数、振幅制御、電極のレシプロ運動制
御、サーボ制御等を行なつてもよく、最適に行な
うことができる。
Furthermore, based on the detected and discriminated signals, the molecular weight of the machining fluid may be controlled, for example, the addition of a high molecular weight solution to the pace fluid and the amount of addition may be controlled, and the jet velocity and flow rate of the machining fluid may be controlled. Further, vibration control, frequency and amplitude control of the electrodes, reciprocating motion control of the electrodes, servo control, etc. may be performed, and can be carried out optimally.

以上の何れの制御も、検出した高周波成分電圧
を媒体加工液の分子量に対応する基準レベルで判
別し、この判別出力により加工間隙の状態を検出
し、又これによつて各部制御をするから、加工状
態の検出精度が高く、常に最適な制御ができる効
果がある。
In any of the above controls, the detected high-frequency component voltage is discriminated at a reference level corresponding to the molecular weight of the medium processing fluid, the state of the machining gap is detected based on the output of this discrimination, and each part is controlled based on this. The detection accuracy of the machining state is high, and the effect is that optimal control can be performed at all times.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は放電電圧波形説明図、第2図は媒体分
子量に対応する間隙電圧(波高値)の変化状態説
明グラフ、第3図は本発明の一実施例回路構成図
である。 △V……高周波成分電圧、1……加工間隙、2
……加工パルス電源、3……検出回路、4……フ
イルタ回路、5……増幅器、6……比較回路、7
……プリセツト回路、8……パルス回路、9……
アツプダウンカウンタ、10……パルス回路、1
1……プリセツトカウンタ、12……制御回路。
FIG. 1 is an explanatory diagram of a discharge voltage waveform, FIG. 2 is an explanatory graph of changes in the gap voltage (peak value) corresponding to the molecular weight of the medium, and FIG. 3 is a circuit configuration diagram of an embodiment of the present invention. △V...High frequency component voltage, 1...Machining gap, 2
...Processing pulse power supply, 3...Detection circuit, 4...Filter circuit, 5...Amplifier, 6...Comparison circuit, 7
...Preset circuit, 8...Pulse circuit, 9...
Up-down counter, 10...Pulse circuit, 1
1... Preset counter, 12... Control circuit.

Claims (1)

【特許請求の範囲】 1 加工液が供給される加工間隙に繰返してパル
ス放電を行なつて加工し、且つ該パルス放電に存
在する、若しくは含まれる高周波成分電圧又は高
周波成分を含む信号電圧を検出して放電状態若し
くは加工間隙の状態を監視しながら加工するよう
にした放電加工方法に於て、前記検出した高周波
成分電圧又は高周波成分を含む信号電圧を前記媒
体加工液の分子量に対応して設定した基準レベル
で判別し、該判別によつて放電状態若しくは加工
間隙の状態を検出することを特徴とする放電加工
方法。 2 高周波成分電圧又は高周波成分を含む信号電
圧の検出は放電開始後15μs以内に検出すること
を特徴とする特許請求の範囲第1項に記載の放電
加工方法。 3 高周波成分電圧又は高周波成分を含む検出信
号電圧の判別は放電開始後15μs以内に判別する
ことを特徴とする特許請求の範囲第1項に記載の
放電加工方法。
[Scope of Claims] 1 Machining by repeatedly applying pulse discharge to a machining gap to which machining fluid is supplied, and detecting a high frequency component voltage or a signal voltage containing a high frequency component present or included in the pulse discharge. In the electric discharge machining method in which machining is performed while monitoring the electric discharge state or the state of the machining gap, the detected high frequency component voltage or the signal voltage containing the high frequency component is set in accordance with the molecular weight of the medium machining fluid. A discharge machining method characterized in that a discharge state or a machining gap state is detected based on the determination based on the reference level. 2. The electric discharge machining method according to claim 1, wherein the high frequency component voltage or the signal voltage containing the high frequency component is detected within 15 μs after the start of electric discharge. 3. The electric discharge machining method according to claim 1, wherein the high frequency component voltage or the detection signal voltage containing the high frequency component is determined within 15 μs after the start of electric discharge.
JP1365977A 1977-02-09 1977-02-09 Diacharge working Granted JPS5398598A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1365977A JPS5398598A (en) 1977-02-09 1977-02-09 Diacharge working

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1365977A JPS5398598A (en) 1977-02-09 1977-02-09 Diacharge working

Publications (2)

Publication Number Publication Date
JPS5398598A JPS5398598A (en) 1978-08-29
JPS6227930B2 true JPS6227930B2 (en) 1987-06-17

Family

ID=11839319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1365977A Granted JPS5398598A (en) 1977-02-09 1977-02-09 Diacharge working

Country Status (1)

Country Link
JP (1) JPS5398598A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3293416B2 (en) * 1994-08-09 2002-06-17 三菱電機株式会社 Discharge state detection device for electric discharge machine

Also Published As

Publication number Publication date
JPS5398598A (en) 1978-08-29

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