JPS629668B2 - - Google Patents
Info
- Publication number
- JPS629668B2 JPS629668B2 JP56022607A JP2260781A JPS629668B2 JP S629668 B2 JPS629668 B2 JP S629668B2 JP 56022607 A JP56022607 A JP 56022607A JP 2260781 A JP2260781 A JP 2260781A JP S629668 B2 JPS629668 B2 JP S629668B2
- Authority
- JP
- Japan
- Prior art keywords
- central axis
- evaporation
- base material
- cooling roller
- molten metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Thin Magnetic Films (AREA)
- Non-Insulated Conductors (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は高分子成形物等の可撓性基材上に単金
属、合金等の被膜を蒸着にて形成する方法の改良
に関するもので、特に機能素子として最近注目さ
れている。磁気記録媒体やエネルギー変換装置を
蒸着にて効率よく作るときにきわめて有効な方法
の提供を目的としている。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for forming a film of a single metal, an alloy, etc. on a flexible substrate such as a polymer molded product by vapor deposition, and in particular, it relates to a method for forming a film of a single metal, an alloy, etc. on a flexible substrate such as a polymer molded product. ing. The purpose is to provide an extremely effective method for efficiently manufacturing magnetic recording media and energy conversion devices by vapor deposition.
従来知られる連続、半連続の巻き取り蒸着機で
とられる蒸着方法においては、溶湯を入れる蒸発
容器が、基材の受け止める熱を効率よく伝達して
冷却する冷却ローラーに直下に配設されているこ
とから指向性について、特に言及されていなかつ
た。 In the vapor deposition method used in conventional continuous or semi-continuous winding vapor deposition machines, the evaporation container containing the molten metal is placed directly below a cooling roller that efficiently transfers the heat received by the base material to cool it. For this reason, there was no particular mention of directionality.
一般に知られるように、余弦法則が適用される
場合がほとんどで、しかも蒸着量の分布は対称で
あつた。 As is generally known, the law of cosines is applied in most cases, and the distribution of the amount of vapor deposited is symmetrical.
しかし、磁気テープの製造法で既に提供してい
るように、冷却ローラの中心軸と一致しない蒸発
源の配設が重要になつてきている。 However, as already provided in magnetic tape manufacturing methods, it has become important to provide an evaporation source that does not coincide with the central axis of the cooling roller.
本発明は、かかる配置関係において、所望の機
能を低下させることなく、かつ蒸着効率の著しい
向上を果せるものである。このことは、より長尺
の基材に目的とする被膜を形成することを容易に
するという利点を有している。 In this arrangement, the present invention can significantly improve vapor deposition efficiency without deteriorating desired functions. This has the advantage of making it easier to form a desired coating on a longer substrate.
以下、本発明の方法の詳細について、図面を用
いて詳細に述べる。 Hereinafter, details of the method of the present invention will be described in detail using the drawings.
真空容器１の内部は排気装置２によつて、
10-4Torr〜10-6Torrの範囲内の圧力に必要に応
じて保持される。あるいは目的により酸素等の反
応性気体を可変リーク弁（図示せず）の調節によ
り、導入し、所定の圧力を保持する。 The inside of the vacuum container 1 is vented by an exhaust device 2.
Hold as required to pressures in the range of 10 -4 Torr to 10 -6 Torr. Alternatively, depending on the purpose, a reactive gas such as oxygen is introduced by adjusting a variable leak valve (not shown) and a predetermined pressure is maintained.
冷却ローラー３の周側面に沿つて、ポリエステ
ルフイルム等の高分子成形物基材４が冷却ローラ
ー３の回転と同期して矢印Ａ方向へ移動搬送され
るよう構成される。なお、５は基材４の送り出し
軸であり、６はその巻き取り軸である。蒸発源７
の中心軸すなわち溶湯１２の液面の法線８と冷却
ローラー３の中心軸と交差する鉛直線９と一致し
ないように、すなわち従来の冷却ローラ３直下か
らずらした位置、好ましくは基材４が移動する方
向Ａに対抗する側に配設されている。しかし冷却
ローラー３の直下に蒸発源７を配設した場合にお
いても勿論本発明の効果は充分得られるものであ
ることはいうまでもない。 A molded polymer base material 4 such as a polyester film is moved and conveyed along the circumferential side of the cooling roller 3 in the direction of arrow A in synchronization with the rotation of the cooling roller 3 . Note that 5 is a feed shaft of the base material 4, and 6 is a winding shaft thereof. Evaporation source 7
In other words, the base material 4 is positioned so that it does not coincide with the vertical line 9 that intersects the central axis of the molten metal 12, that is, the normal 8 of the liquid surface of the molten metal 12, and the central axis of the cooling roller 3, that is, the position is shifted from directly below the conventional cooling roller 3, preferably the base material 4 is It is arranged on the side opposite to the moving direction A. However, it goes without saying that even when the evaporation source 7 is disposed directly below the cooling roller 3, the effects of the present invention can be sufficiently obtained.
１０は蒸発源７からの蒸気流の一部分をさえぎ
るためのマスクであり、磁気テープの製造におい
て高い保磁力を得る場合よく使用されるものであ
るが、これは必ずしも不可欠な要素ではない。１
１は回転ローラーである。図では蒸発源７を模式
的に示してある。すなわち、溶湯１２は蒸発容器
１３内で高温に保持されている。本発明で特に重
要な点は溶湯１２の液面の法線８と、蒸気流の指
向性の中心軸１４もしくは同１５とが一致してい
ないということである。すなわち、それらのなす
角度βが零でない点にある。ここでいう蒸気流の
指向性の中心軸とは蒸気流の単位立体角当りの蒸
気流密度が最大である方向を意味している。な
お、蒸気流の分布が対称であれば中心軸と一致す
る。 Reference numeral 10 designates a mask for blocking a portion of the vapor flow from the evaporation source 7, and is often used when obtaining a high coercive force in the manufacture of magnetic tapes, but this is not necessarily an essential element. 1
1 is a rotating roller. In the figure, the evaporation source 7 is schematically shown. That is, the molten metal 12 is maintained at a high temperature within the evaporation container 13. A particularly important point in the present invention is that the normal 8 to the liquid surface of the molten metal 12 does not coincide with the central axis 14 or 15 of the directivity of the vapor flow. That is, the angle β formed by them is not zero. The central axis of directivity of the steam flow herein means the direction in which the steam flow density per unit solid angle of the steam flow is maximum. Note that if the distribution of steam flow is symmetrical, it will coincide with the central axis.
角βは、基材４の移動方向Ａに対しそれを追い
かける側になる。 The angle β is on the side that follows the moving direction A of the base material 4.
また、角βを変えた時、蒸着効率のみに注目す
ればβが60゜になるまでその効果が認められるも
のの、前記した磁気テープの保磁力について注目
してみると、β＝10゜〜40゜の範囲で同一保磁力
比較で蒸着効率がβ＝０゜の場合の1.3倍〜1.8倍
に増大する効果を有しているものである。 Furthermore, when changing the angle β, if we focus only on the deposition efficiency, the effect is observed until β reaches 60°, but if we pay attention to the coercive force of the magnetic tape mentioned above, we find that β = 10° to 40°. This has the effect of increasing the deposition efficiency by 1.3 to 1.8 times compared to the case where β=0° in the same coercive force in the range of 0°.
また、角β側においても蒸着できるため、高価
な材料を使用する場合、その使用効率上従来スパ
ツタが主な被膜形成法であつたが、本発明の方法
は、マスクなしとすることにより蒸着効率70％以
上を達成することができ、スパツタ法に充分競合
し得る効率のよい方法である。 In addition, since vapor deposition can be performed even on the angle β side, when using expensive materials, conventional sputtering was the main film forming method in terms of usage efficiency, but the method of the present invention improves vapor deposition efficiency by not using a mask. It is an efficient method that can achieve over 70% and can fully compete with the sputtering method.
これらの効果をもたらす蒸発源７を得るには、
たとえば蒸発容器１３を誘導加熱源で構成し、容
器１３を傾斜させかつ、煙突効果のでるような構
成にしてやればよい。 To obtain the evaporation source 7 that brings these effects,
For example, the evaporation container 13 may be constructed with an induction heating source, and the container 13 may be tilted to create a chimney effect.
最近進歩のいちぢるしい電子ビーム蒸発源にお
いても電子ビームを効果的に集束し、電力密度を
大きくとれば、ビームの入射方向に傾いた蒸気分
布を得ることができる。すなわち、同軸型のピア
ス型電子銃を所定の角度で配設すればよく、磁場
による偏向技術を組み合わせて利用することも可
能である。 Even in the recently advanced and clumsy electron beam evaporation sources, if the electron beam is effectively focused and the power density is increased, a vapor distribution tilted in the direction of incidence of the beam can be obtained. That is, it is sufficient to arrange a coaxial pierce-type electron gun at a predetermined angle, and it is also possible to use a combination of deflection technology using a magnetic field.
なお、60゜＞β＞40゜の範囲であつても、従来
法に対する改善効果は充分認められ、本発明の範
囲である。 Incidentally, even in the range of 60°>β>40°, the improvement effect over the conventional method is sufficiently recognized and is within the scope of the present invention.
蒸着した金属は、前述のほかに、Fe、Ni、
Ti、Ge、Al、Pt、Au、Sn、Ag、Cu、Zn等につ
いても抵抗値、光学特性等に優れた特性を有する
ことが蒸着効率とあわせ確認できた。合金類では
Ni−Cr、Ni−Fe、Fe−Bi、Au−Ag−Cu等につ
いても効果のあることを確認した。本発明は勿
論、酸素中でのIn蒸着により、透明電導膜In2O3
等の酸化物を得る場合についてもその効果は大き
く、本発明の工業的有価値性はきわめておきい。 In addition to the above, the deposited metals include Fe, Ni,
It was confirmed that Ti, Ge, Al, Pt, Au, Sn, Ag, Cu, Zn, etc. also have excellent resistance values, optical properties, etc., as well as vapor deposition efficiency. In alloys
It was confirmed that Ni-Cr, Ni-Fe, Fe-Bi, Au-Ag-Cu, etc. are also effective. Of course, the present invention can form a transparent conductive film In 2 O 3 by vapor deposition of In in oxygen.
The effect is also great when obtaining oxides such as oxides, and the industrial value of the present invention is extremely high.
図は本発明にかかる真空蒸着法を実施するため
の装置の要部概念図である。
１……真空容器、２……排気装置、３……冷却
ローラー、４……高分子成形物基材、７……蒸発
源、８……溶湯１２の液面に立てた法線、１３…
…蒸発容器、１４，１５……蒸気流の指向性の中
心軸。
The figure is a conceptual diagram of the main parts of an apparatus for carrying out the vacuum evaporation method according to the present invention. DESCRIPTION OF SYMBOLS 1... Vacuum container, 2... Exhaust device, 3... Cooling roller, 4... Polymer molded product base material, 7... Evaporation source, 8... Normal line erected on the liquid surface of molten metal 12, 13...
...Evaporation vessel, 14, 15... Central axis of directivity of vapor flow.
Claims (1)
する側にずらした蒸発容器内の溶湯にたてた法線
に対して、蒸発蒸気流の指向性の中心軸の方向
が、移動する基材を追いかける側に傾いた状態で
前記基材上に蒸着をすることを特徴とする真空蒸
着方法。1. The central axis of the evaporative vapor flow is aligned with the direction of the directional central axis of the evaporated vapor flow relative to the normal line drawn to the molten metal in the evaporation container, with the central axis of the cooling roller shifted to the side opposite to the moving direction of the base material. A vacuum evaporation method characterized in that the evaporation is performed on the base material in a state where the material is tilted toward the chasing side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56022607A JPS57137462A (en) | 1981-02-17 | 1981-02-17 | Vacuum depositing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56022607A JPS57137462A (en) | 1981-02-17 | 1981-02-17 | Vacuum depositing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57137462A JPS57137462A (en) | 1982-08-25 |
| JPS629668B2 true JPS629668B2 (en) | 1987-03-02 |
Family
ID=12087524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56022607A Granted JPS57137462A (en) | 1981-02-17 | 1981-02-17 | Vacuum depositing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57137462A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1197806B (en) * | 1986-08-01 | 1988-12-06 | Metalvuoto Films Spa | Method and appts. for mfr. of metallised films for capacitors |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5836413B2 (en) * | 1978-04-25 | 1983-08-09 | 松下電器産業株式会社 | Magnetic recording medium manufacturing method and its manufacturing device |
| JPS6014409B2 (en) * | 1978-07-10 | 1985-04-13 | 松下電器産業株式会社 | Method for manufacturing magnetic recording media |
-
1981
- 1981-02-17 JP JP56022607A patent/JPS57137462A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57137462A (en) | 1982-08-25 |
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