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JPS631272B2 - - Google Patents
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JPS631272B2 - - Google Patents

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Publication number
JPS631272B2
JPS631272B2 JP56083228A JP8322881A JPS631272B2 JP S631272 B2 JPS631272 B2 JP S631272B2 JP 56083228 A JP56083228 A JP 56083228A JP 8322881 A JP8322881 A JP 8322881A JP S631272 B2 JPS631272 B2 JP S631272B2
Authority
JP
Japan
Prior art keywords
electrical conductivity
tan
sintered body
silicon nitride
discharge machining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56083228A
Other languages
Japanese (ja)
Other versions
JPS57200265A (en
Inventor
Takeshi Yoshioka
Akira Doi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP56083228A priority Critical patent/JPS57200265A/en
Publication of JPS57200265A publication Critical patent/JPS57200265A/en
Publication of JPS631272B2 publication Critical patent/JPS631272B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は放電加工により作製された窒化珪素部
材及びその製造法に関する。 窒化珪素(以下Si3N4と略する)焼結体は耐酸
化性に優れ熱膨張率が小さく、高温強度が高い材
料として注目され、近年このSi3N4焼結体をター
ビンエンジンのブレードやノズルあるいは熱交換
器部材などの高温構造材料として使用する為の研
究、開発が活発に行なわれている。しかしこの
Si3N4焼結体は通常粉末治金法によつて作られる
為、焼結体としては複雑形状を得ることは難し
く、寸法や面精度も精密なものは得難く、従つて
Si3N4焼結体を研削等の機械加工を加えて製品と
している。 しかし周知のようにこのSi3N4は高硬度物質で
ある為機械加工が困難であり、その加工に多大な
時間と労力を要すること及び比較的単純な形状に
しか機械加工できないこと、なおタービンブレー
ドの如き薄肉の部品については機械加工によつて
得ることは不可能であることなどのように加工技
術上の様々な制限がSi3N4の応用の拡大化の妨げ
となつてきた。又一般に複雑形状を製造する手段
の1つとして放電加工があることが知られている
が、従来からSi3N4は完全な絶縁体であつて放電
加工は行なえないと考えられてきた。 上記に鑑み、本発明はこのような問題点を解決
するため開発されたものであり、本願発明の要旨
は特許請求の範囲記載の通りにある。 以下詳細に本発明を詳述する。 本発明者らはSi3N4の放電加工を可能にする方
法を種々検討してきた。むろんSi3N4に電気伝導
性の物質を多量に添加すれば放電加工が可能とな
ることは容易に想像がつく。しかしこの場合添加
する物質及びその添加量によつてはSi3N4の性質
に大きな影響を与えてしまう。たとえば電気伝導
度の良いCuとかNi等の金属を添加した場合
Si3N4とは濡れ性が悪く焼結が充分には行なえ
ず、充分な強度が得られない。又一方Al2O3
Y2O3、MgO等の良く知られた添加物質を添加し
た場合では添加物質の電気伝導度が低い為電気伝
導度の向上はおこらず放電加工は不可能である。 そこで本発明者らはSi3N4の性質に大きな変化
を与えず電気伝導度を向上せしめる添加物質を検
討しa、a、a族元素の酸化物、炭化物、
窒化物、硼化物及びこれらの2種以上の化合物と
AIN、Al4C3より選ばれた1種以上を添加すれば
良いことに考え至つた。a、a、a族元素
の酸化物、炭化物、窒化物、硼化物は周知のごと
く高硬度物質で高温での強度低下も少ない物質で
あり、互いに広い組成範囲の固溶体を作り、その
固溶体の性質も各々と大差がない。AIN、Al4C3
も高温での強度低下が少ない。しかしこれ等の物
質は高温強度が高いとは言つてもSi3N4と比較す
ると低いレベルにあり、耐酸化性も劣る為これら
の物質を添加するとおのずからSi3N4の高温特性
は劣化する。それ故その添加量はより少ない側へ
制限すべきである。 本発明者らはこの点について実験を行なつたと
ころ驚くべきことにこれらの物質を体積比にして
0.5%以上を添加して焼結すればSi3N4焼結体の電
気伝導度が急激に上昇し10-3Ω-1cm-1以上となつ
て放電加工が可能であることを見い出した。第1
図にはSi3N4にTaNを添加した際の添加量による
電気伝導度の変化をAにて示す。 なお図中理論値Bは下記で表わされる
Maxwellの方程式に基づいて計算した。 θtptal=σSi3N4×〔σTaN+2σSi3N4−2VTaN(σSi
3N4
−σTaN)〕/〔σTaN−2σSi3N4+VTaN(σSi3N4
σTaN)〕 ただしσSi3N4はSi3N4の電気伝導度、σTaNはTaN
の電気伝導度、VTaNはTaNの容積比を示す。 なお本発明におけるSi3N4焼結体においては添
加物質は焼結後も第2相として分散した組織とな
るが、このようにSi3N4焼結体の電気伝導度が理
論値に比して極めて優れているのは以下の2通り
の理由によるものと考えられる。 (1) Si3N4のマトリクス(Matrix)中に分散され
た第2相粒子の全て又は1部がMatrixのSi3N4
粒子周囲に拡散及び反応して導電性の良い複合
相が形成されるが、この複合相が連続すること
によりSi3N4焼結体の導電性が向上する。 (2) Si3N4のMatrix中に分散された第2相粒子の
体積比が25%を越える場合にはその第2相粒子
同士が互いに接触することによりSi3N4焼結体
の導電性が向上する。 上記電気伝導性の理由のうち第2相粒子の体積
比が25%以下の場合には主として(1)のみの効果
が、なお体積比が25%を越える場合には(1)+(2)の
効果が考えられる。 尚この第2相粒子の好ましい添加量は体積比で
0.5%以上30%以下である。その理由は0.5%以下
の添加量ではSi3N4焼結体の電気伝導度が充分で
なく放電加工が行なえないこと、又30%以上の添
加量ではSi3N4焼結体の高温強度が急激に低下す
ることによる。 尚注意すべきはこの放電加工されるSi3N4焼結
体を製造するにあたり、Si3N4粉末及び添加物質
の平均粒子径は1.0μm以下であることが必要であ
る。何故なら平均粒子径が1.0μm以上であると混
合時に添加物質が均一に分散しにくく、従つて焼
結時に均一に導電性の複合相が充分形成されず
Si3N4焼結体の電気伝導度が向上しないからであ
る。 以下に本発明の実施例を示す。 実施例 1 Si3N4粉末(粒径0.8μm)に種々な体積比の
TaN及びTiC(いずれも粒径0.5μm)を添加後こ
れを充分混合した後、1700℃×30分200Kg/cm2
条件下で加圧焼結したSi3N4焼結体について電気
伝導度を測定し、かつ放電加工が可能か否かの判
定を行つた。これを第1表及び第2表に示す。な
お放電加工条件は加工電流0.2A、パルス幅1.2μS
である。
The present invention relates to a silicon nitride member manufactured by electric discharge machining and a method for manufacturing the same. Sintered silicon nitride (hereinafter abbreviated as Si 3 N 4 ) has attracted attention as a material with excellent oxidation resistance, low coefficient of thermal expansion, and high high - temperature strength. Research and development are being actively conducted to use it as a high-temperature structural material such as for heat exchangers, nozzles, and heat exchanger components. But this
Since Si 3 N 4 sintered bodies are usually made by powder metallurgy, it is difficult to obtain complex shapes for sintered bodies, and it is difficult to obtain precise dimensions and surface accuracy.
The product is made from a Si 3 N 4 sintered body that undergoes mechanical processing such as grinding. However, as is well known, Si 3 N 4 is a highly hard material that is difficult to machine, requiring a great deal of time and effort, and can only be machined into relatively simple shapes. Various limitations in processing technology have hindered the expansion of the applications of Si 3 N 4 , such as the impossibility of obtaining thin-walled parts such as blades by machining. Although it is generally known that electrical discharge machining is one of the means for manufacturing complex shapes, it has been conventionally believed that Si 3 N 4 is a perfect insulator and cannot be subjected to electrical discharge machining. In view of the above, the present invention was developed to solve such problems, and the gist of the present invention is as described in the claims. The present invention will be described in detail below. The present inventors have studied various methods to enable electric discharge machining of Si 3 N 4 . Of course, it is easy to imagine that electrical discharge machining becomes possible if a large amount of electrically conductive material is added to Si 3 N 4 . However, in this case, the properties of Si 3 N 4 will be greatly affected depending on the substance added and its amount. For example, when adding metals with good electrical conductivity such as Cu or Ni
Si 3 N 4 has poor wettability and cannot be sintered sufficiently, making it impossible to obtain sufficient strength. On the other hand, Al 2 O 3 ,
When well-known additives such as Y 2 O 3 and MgO are added, electrical conductivity does not improve because the additives have low electrical conductivity, making electrical discharge machining impossible. Therefore, the present inventors investigated additive substances that would improve the electrical conductivity without significantly changing the properties of Si 3 N 4 and added oxides, carbides, and
Nitride, boride and compounds of two or more of these
I came up with the idea that it would be good to add one or more selected from AIN and Al 4 C 3 . As is well known, the oxides, carbides, nitrides, and borides of Group A, A, and A elements are highly hard materials and have little strength loss at high temperatures.They form solid solutions with each other in a wide composition range, and the properties of the solid solutions There is no big difference between them. AIN , Al4C3
There is also little strength loss at high temperatures. However, although these materials have high high-temperature strength, they are at a low level compared to Si 3 N 4 , and their oxidation resistance is also inferior, so adding these materials will naturally deteriorate the high-temperature properties of Si 3 N 4 . . Therefore, the amount added should be limited to the smaller side. The inventors conducted experiments on this point and surprisingly found that the volume ratio of these substances was
It was discovered that if 0.5% or more is added and sintered, the electrical conductivity of the Si 3 N 4 sintered body increases rapidly to 10 -3 Ω -1 cm -1 or more, making electrical discharge machining possible. . 1st
In the figure, the change in electrical conductivity depending on the amount of TaN added to Si 3 N 4 is indicated by A. The theoretical value B in the figure is expressed as below.
Calculated based on Maxwell's equation. θ tptal = σ Si3N4 × [σ TaN +2σ Si3N4 −2V TaNSi
3N4
−σ TaN )]/[σ TaN −2σ Si3N4 +V TaNSi3N4
σ TaN )] However, σ Si3N4 is the electrical conductivity of Si 3 N 4 , and σ TaN is TaN
The electrical conductivity of V TaN indicates the volume ratio of TaN. In addition, in the Si 3 N 4 sintered body of the present invention, the additive substance becomes a dispersed structure as a second phase even after sintering, but the electrical conductivity of the Si 3 N 4 sintered body is in this way compared to the theoretical value. The reason why it is so excellent is thought to be due to the following two reasons. (1) All or part of the second phase particles dispersed in the Si 3 N 4 matrix are Si 3 N 4 of the Matrix.
A composite phase with good conductivity is formed by diffusion and reaction around the particles, and the continuity of this composite phase improves the conductivity of the Si 3 N 4 sintered body. (2) When the volume ratio of the second phase particles dispersed in the Si 3 N 4 matrix exceeds 25%, the conductivity of the Si 3 N 4 sintered body increases due to the contact between the second phase particles. Improves sex. Among the reasons for electrical conductivity mentioned above, when the volume ratio of the second phase particles is 25% or less, only (1) is the main effect, and when the volume ratio exceeds 25%, (1) + (2) This is considered to be the effect of The preferable addition amount of this second phase particle is expressed as a volume ratio.
It is 0.5% or more and 30% or less. The reason for this is that if the amount added is less than 0.5%, the electrical conductivity of the Si 3 N 4 sintered body is insufficient and electrical discharge machining cannot be performed, and if the amount added is more than 30%, the high temperature strength of the Si 3 N 4 sintered body is This is due to a sudden drop in It should be noted that in producing the Si 3 N 4 sintered body to be subjected to electrical discharge machining, the average particle size of the Si 3 N 4 powder and additive material must be 1.0 μm or less. This is because if the average particle size is 1.0 μm or more, it is difficult to disperse the additive material uniformly during mixing, and therefore a sufficiently uniform and conductive composite phase is not formed during sintering.
This is because the electrical conductivity of the Si 3 N 4 sintered body does not improve. Examples of the present invention are shown below. Example 1 Si 3 N 4 powder (particle size 0.8 μm) with various volume ratios
After adding TaN and TiC (both particle size 0.5 μm) and thoroughly mixing them, the electrical conductivity of the Si 3 N 4 sintered body was sintered under pressure at 200 kg/cm 2 at 1700°C for 30 minutes. were measured, and it was determined whether electrical discharge machining was possible. This is shown in Tables 1 and 2. The electrical discharge machining conditions are a machining current of 0.2A and a pulse width of 1.2μS.
It is.

【表】【table】

【表】 実施例 2 Si3N4粉末(粒径0.8μm)に種々の容積比の
HfN及びTaC(いずれも粒径0.5μm)を添加し、
充分に混合した後1700℃窒素分圧5Kg/cm2下で焼
結したSi3N4焼結体について1000℃における抗析
強度を測定した。それを第3表及び第4表に示
す。尚この抗折強度は10mmspan、荷重速度0.5
mm/minの条件下で測定したものである。
[Table] Example 2 Si 3 N 4 powder (particle size 0.8 μm) with various volume ratios
Add HfN and TaC (both particle size 0.5 μm),
After thorough mixing, the Si 3 N 4 sintered body was sintered at 1700°C under a nitrogen partial pressure of 5 kg/cm 2 , and the anti-stress strength at 1000°C was measured. It is shown in Tables 3 and 4. The bending strength is 10mmspan, and the loading rate is 0.5.
Measured under mm/min conditions.

【表】【table】

【表】 実施例 3 Si3N4粉末に種々の添加物を容積比にして3%
添加し充分に混合した後1700℃×30分 200Kg/
cm2の条件下で加圧焼結して得たSi3N4焼結体の
各々について電気伝導度を測定し放電加工可能か
否かの調査を行なつた。その結果を第5表に示
す。
[Table] Example 3 Various additives added to Si 3 N 4 powder at 3% volume ratio
After adding and mixing thoroughly, 1700℃ x 30 minutes 200Kg/
The electrical conductivity of each Si 3 N 4 sintered body obtained by pressure sintering under cm 2 conditions was measured to investigate whether electrical discharge machining was possible. The results are shown in Table 5.

【表】 実施例 4 Si3N4粉末及び添加粒子各々の平均粒子径を変
化させて焼結を行ないその焼結体の電気伝導度及
び放電加工性の有無を調査した。それを第6表に
示す。
[Table] Example 4 Sintering was performed while changing the average particle diameter of the Si 3 N 4 powder and additive particles, and the electrical conductivity and electrical discharge machinability of the sintered bodies were investigated. It is shown in Table 6.

【表】【table】 【図面の簡単な説明】[Brief explanation of the drawing]

第1図はTaN添加によるSi3N4焼結体の電気伝
導度の変化を示す図を例示している。 A……実測値、B……理論値。
FIG. 1 illustrates a diagram showing a change in electrical conductivity of a Si 3 N 4 sintered body due to the addition of TaN. A...actual value, B...theoretical value.

Claims (1)

【特許請求の範囲】 1 容積比にして0.5〜30%のa、a、a
族元素の酸化物、窒化物、炭化物、硼化物及びこ
れらの2種以上の化合物とAlN、Al4C3から選ば
れた1種以上を添加し、その電気伝導度を
10-3Ω-1cm-1以上にした放電加工可能な窒化珪素
部材。 2 容積比にして0.5〜30%のa、a、a
族元素の酸化物、窒化物、炭化物、硼化物及びこ
れらの2種以上の化合物とAlN、Al4C3から選ば
れた1種以上を添加し、その電気伝導度を
10-3Ω-1cm-1以上にした放電加工可能な窒化珪素
部材を製造するにあたり、窒化珪素及び添加物質
はその平均粒径が1μm以下の粉末であることを
特徴とする窒化珪素部材の製造法。
[Claims] 1. 0.5 to 30% a, a, a by volume
By adding oxides, nitrides, carbides, borides, and compounds of two or more of these elements and one or more selected from AlN and Al 4 C 3 , the electrical conductivity can be increased.
Silicon nitride parts that can be electrically discharged to a resistance of 10 -3 Ω -1 cm -1 or higher. 2 0.5 to 30% a, a, a by volume
By adding oxides, nitrides, carbides, borides, and compounds of two or more of these elements and one or more selected from AlN and Al 4 C 3 , the electrical conductivity can be increased.
In manufacturing a silicon nitride member that can be electrically discharge-machined to a resistance of 10 -3 Ω -1 cm -1 or more, the silicon nitride member is characterized in that the silicon nitride and additives are powders with an average particle size of 1 μm or less. Manufacturing method.
JP56083228A 1981-05-31 1981-05-31 Silicon nitrogen member and manufacture Granted JPS57200265A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56083228A JPS57200265A (en) 1981-05-31 1981-05-31 Silicon nitrogen member and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56083228A JPS57200265A (en) 1981-05-31 1981-05-31 Silicon nitrogen member and manufacture

Publications (2)

Publication Number Publication Date
JPS57200265A JPS57200265A (en) 1982-12-08
JPS631272B2 true JPS631272B2 (en) 1988-01-12

Family

ID=13796455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56083228A Granted JPS57200265A (en) 1981-05-31 1981-05-31 Silicon nitrogen member and manufacture

Country Status (1)

Country Link
JP (1) JPS57200265A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033265A (en) * 1983-07-27 1985-02-20 株式会社日立製作所 Silicon carbide electroconductive ceramics
JPS63233077A (en) * 1986-11-14 1988-09-28 日立金属株式会社 Silicon nitride base composite sintered body
JP2556888B2 (en) * 1987-12-24 1996-11-27 日立金属株式会社 Ceramics conductive material with less variation in electrical resistivity
US7132061B2 (en) 2001-01-22 2006-11-07 Sumitomo Electric Industries, Ltd. Electroconductive silicon nitride based composite sintered body and method for preparation thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS523648B2 (en) * 1972-12-27 1977-01-29
JPS5128105A (en) * 1974-09-04 1976-03-09 Tatsuro Kuratomi
JPS6048475B2 (en) * 1978-03-17 1985-10-28 旭硝子株式会社 Silicon nitride hot press sintered body and its manufacturing method
JPS55116677A (en) * 1979-02-27 1980-09-08 Ngk Insulators Ltd Manufacture of silicon nitride sintered body

Also Published As

Publication number Publication date
JPS57200265A (en) 1982-12-08

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