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JPS647022B2 - - Google Patents
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JPS647022B2 - - Google Patents

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Publication number
JPS647022B2
JPS647022B2 JP56058203A JP5820381A JPS647022B2 JP S647022 B2 JPS647022 B2 JP S647022B2 JP 56058203 A JP56058203 A JP 56058203A JP 5820381 A JP5820381 A JP 5820381A JP S647022 B2 JPS647022 B2 JP S647022B2
Authority
JP
Japan
Prior art keywords
optical fiber
target
metal
vacuum chamber
spatter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56058203A
Other languages
Japanese (ja)
Other versions
JPS57175747A (en
Inventor
Yukio Komura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP56058203A priority Critical patent/JPS57175747A/en
Publication of JPS57175747A publication Critical patent/JPS57175747A/en
Publication of JPS647022B2 publication Critical patent/JPS647022B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 この発明はスパツタリングにより光フアイバの
表面を金属被覆するようにした方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for metallizing the surface of an optical fiber by sputtering.

光フアイバの機械的強度、耐熱性等を改善する
目的から、プラスチツク被覆に代えて金属被覆を
採用することはすでに実施されており、また、こ
の際の金属被覆手段としてスパツタリングの有効
性も検討されてきたが、問題は残つている。
For the purpose of improving the mechanical strength, heat resistance, etc. of optical fibers, the use of metal coatings instead of plastic coatings has already been implemented, and the effectiveness of sputtering as a metal coating method in this case has also been studied. However, the problem remains.

例えば、既知のスパツタリングでは所定真空度
とした雰囲気中でのガス放電により、陽イオンを
金属製のターゲツト(カソード)へ衝突させると
ともに、そのターゲツト原子をアノード側へ放出
させて当該ターゲツトから霧状の金属を発生させ
るようにしており、そしてターゲツトおよびアノ
ード間に所望の被着物を介在させることにより、
その被着物の表面に霧状の金属を被着させていた
が、こうした場合ではその霧状の金属の指向性が
ターゲツトからアノードに向う一方向だけに定ま
つてしまい、したがつて、この際の被着物が光フ
アイバである場合に、光フアイバ外周の一部にの
み金属被膜が厚く形成されてしまい、残部には殆
んど金属が被着されないといつた不本意な結果に
終つていた。
For example, in known sputtering, cations are collided with a metal target (cathode) by gas discharge in an atmosphere with a predetermined degree of vacuum, and the target atoms are ejected to the anode side to form a mist from the target. By generating metal and interposing a desired deposit between the target and the anode,
A mist of metal was deposited on the surface of the deposit, but in such cases, the directivity of the mist of metal was fixed in only one direction, from the target to the anode. When the deposit is an optical fiber, a thick metal coating is formed only on a part of the outer periphery of the optical fiber, and the remaining part is hardly coated with metal, which is an undesirable result. Ta.

また、従来の雰囲気真空度は例えば10-2
10-4torrで、残留ガスをAr、Kr、Xeで置換した
室内で、スパツタリングを行うので、ターゲツト
と光フアイバがプラズマにさらされ、光フアイバ
が温度の影響を受けやすいという問題があつた。
In addition, the conventional atmospheric vacuum degree is, for example, 10 -2 ~
Since sputtering was performed in a room at 10 -4 torr with residual gas replaced with Ar, Kr, and Xe, the target and optical fiber were exposed to plasma, which caused the problem that the optical fiber was easily affected by temperature.

また、真空度が低いために光フアイバ上の被覆
にArなどのガスを吸蔵したり、スパツタ室内壁
からの汚染を受けやすいという問題もあつた。
Furthermore, due to the low degree of vacuum, there were problems in that the coating on the optical fiber could absorb gases such as Ar, and was susceptible to contamination from the walls of the sputter chamber.

この発明は前記の問題点に着目して、紡糸後の
光フアイバを回転状態として高真空室に導き、イ
オン源からのイオンビームを、前記真空室内に設
けた所定の反射角に置かれたターゲツトに照射
し、このターゲツトからのスパツタ粒子を前記光
フアイバに被着するようにして、光フアイバに金
属被覆する方法を提案するものである。
This invention focuses on the above-mentioned problem, and the optical fiber after spinning is guided into a high vacuum chamber in a rotating state, and the ion beam from the ion source is directed to a target placed at a predetermined reflection angle provided in the vacuum chamber. The present invention proposes a method for coating an optical fiber with a metal by irradiating the target with spatter particles and depositing spatter particles on the optical fiber.

以下に、この発明の実施例を図面について説明
する。
Embodiments of the invention will be described below with reference to the drawings.

第1図はこの発明の方法をを実施する金属被覆
装置の一部縦断正面図で、1は真空室としてのス
パツタ槽で、真空ポンプによつて常時真空引きが
行われ、例えば10-5〜10-6torrという高い真空度
に保たれている。
FIG. 1 is a partially longitudinal front view of a metal coating apparatus for carrying out the method of the present invention, in which 1 is a sputtering tank as a vacuum chamber, which is constantly evacuated by a vacuum pump, for example 10 -5 ~ It is maintained at a high vacuum level of 10 -6 torr.

2はスパツタ槽1の上部に設けられた紡糸装置
の紡糸炉、3はCVD法などにより作られたコア
およびクラツドからなるガラス棒のプリフオーム
で、紡糸炉2において軟化点以上に加熱してその
外径を引落し、所望寸法の光フアイバ4を連続的
に得る。
2 is a spinning furnace of a spinning device installed above the sputtering tank 1, and 3 is a preform of a glass rod consisting of a core and a cladding made by a CVD method, etc., which is heated above its softening point in the spinning furnace 2 and then heated outside. The optical fiber 4 of desired size is continuously obtained by drawing down the diameter.

このようにして連続的に得られる光フアイバ4
は後述する金属被膜処理を受けて、スパツタ槽1
外に導出され、巻取ドラム5に巻き取られる。
Optical fiber 4 obtained continuously in this way
is subjected to the metal coating treatment described later, and then sputtered in the sputtering tank 1.
It is led out and wound up on the winding drum 5.

6はスパツタ槽1に付属したイオン源で、この
イオン源で発生したイオンビームBをスパツタ槽
1内の下部に向つて投射する。
Reference numeral 6 denotes an ion source attached to the sputtering tank 1, which projects the ion beam B generated by this ion source toward the lower part of the sputtering tank 1.

このイオンビームの投射方向には、例えば光フ
アイバ4に対して45゜の傾斜角で臨むターゲツト
7が配設され、このターゲツト7がイオンビーム
を受けてスパツタ粒子Sを光フアイバ4に付着さ
せる。
In the projection direction of the ion beam, a target 7 facing the optical fiber 4 at an angle of 45° is arranged, for example, and this target 7 receives the ion beam and causes spatter particles S to adhere to the optical fiber 4.

なお、8はスパツタ粒子Sにて金属被覆された
金属被覆光フアイバである。
Note that 8 is a metal-coated optical fiber coated with metal with sputter particles S.

前記プリフオーム3、紡糸炉2と巻取ドラム5
とはそれぞれ等速で回転するターンテーブルなど
の上に設けられ、これらのターンテーブルはモー
タによつて所定の回転速度で駆動される。
The preform 3, the spinning furnace 2 and the winding drum 5
are installed on turntables that rotate at a constant speed, and these turntables are driven by a motor at a predetermined rotational speed.

この発明の前記実施例では、紡糸炉2から溶融
された光フアイバ4が引落され、真直ぐに垂下す
るように巻取ドラム5にて巻取られるのである
が、その光フアイバ4がターゲツト7の付近を通
過するとき、イオンビームBによるターゲツト7
からのスパツタ粒子が光フアイバ4に付着する。
In the embodiment of the present invention, the optical fiber 4 molten is drawn down from the spinning furnace 2 and is wound up by the winding drum 5 so as to hang straight. When the ion beam B passes through the target 7
spatter particles from the fibers adhere to the optical fiber 4.

このとき光フアイバ4は回転しているので、金
属粒子がこれの周面に薄くしかも均等膜厚に被着
し、所期の金属被覆光フアイバ8が得られる。
Since the optical fiber 4 is rotating at this time, the metal particles are thinly and evenly coated on the circumferential surface of the optical fiber 4, and the desired metal-coated optical fiber 8 is obtained.

この実施方法によれば、光フアイバ4やターゲ
ツト7がプラズマ中に置かれないので、光フアイ
バ4を高温にさらしてこれを劣化するようなこと
がなくなるとともに、スパツタ槽1内真空圧が高
いので、スパツタ粒子に無用のガス分子が混入す
る可能性がなくなり、金属被膜の純度が高くな
る。
According to this implementation method, since the optical fiber 4 and the target 7 are not placed in the plasma, the optical fiber 4 is not exposed to high temperatures and deteriorates, and the vacuum pressure inside the sputtering tank 1 is high. , there is no possibility of unnecessary gas molecules being mixed into the spatter particles, and the purity of the metal coating is increased.

第2図はこの発明におけるターゲツト7の他の
実施例を示す。
FIG. 2 shows another embodiment of the target 7 in this invention.

このターゲツト7aは光フアイバ4の回りを囲
む円弧状(または半円状)の金属板からなり、こ
のターゲツト7aの金属板面は光フアイバ4に対
し、どの位置に於いても例えば45゜の角度で対向
している。
This target 7a is made of an arcuate (or semicircular) metal plate that surrounds the optical fiber 4, and the metal plate surface of this target 7a is at an angle of, for example, 45° with respect to the optical fiber 4 at any position. are facing each other.

このターゲツト7aを用いてこの発明の方法を
実施すれば、スパツタ粒子Sの光フアイバ4に対
する付着量を多くして、被覆作業の効率化がはか
れる。
If the method of the present invention is carried out using this target 7a, the amount of sputtered particles S attached to the optical fiber 4 will be increased, and the efficiency of the coating operation will be improved.

次に、この発明の実施例をさらに具体的に説明
する。
Next, embodiments of the present invention will be described in more detail.

いま、カウフマン型のイオン源6を用いて約
300本のイオンビームを引き出し、このときのイ
オン電流密度を1±0.82mA/cm2、イオンビーム
の加速電圧を2KVとする。
Now, using Kaufmann type ion source 6, approximately
300 ion beams are extracted, with an ion current density of 1±0.82 mA/cm 2 and an ion beam acceleration voltage of 2 KV.

スパツタ槽1内の真空圧は10-5〜10-6torrとし
て、ターゲツト7aにAl、Cu、In、Ti、Ni等を
使用して、光フアイバ4を5〜8rpmで回転した
ところ、膜厚が50〜100Åで等厚の金属被膜が形
成された。
The vacuum pressure in the sputtering tank 1 was set at 10 -5 to 10 -6 torr, and the target 7a was made of Al, Cu, In, Ti, Ni, etc., and the optical fiber 4 was rotated at 5 to 8 rpm. A metal film of equal thickness was formed with a thickness of 50 to 100 Å.

この発明の他の具体的実施例として、真空圧
10-5〜10-6torrで、残存ガスをN2またはO2で置換
したスパツタ槽1において、ターゲツトをAl、
Si、Tiなどとして、99.99%の高純度のArのイオ
ンビームを3KVで加速したところ、光フアイバ
4上に極めて緻密な薄膜が形成された。
As another specific embodiment of this invention, vacuum pressure
At 10 -5 to 10 -6 torr, the target was Al,
When an ion beam of 99.99% high purity Ar as Si, Ti, etc. was accelerated at 3KV, an extremely dense thin film was formed on the optical fiber 4.

この場合において、膜厚をかせぐためにはこの
薄膜の上に電解メツキなどが施される場合があ
る。
In this case, electrolytic plating or the like may be applied on this thin film in order to increase the film thickness.

以上説明した通り、この発明は光フアイバ軸線
を軸心として回転している紡糸後の光フアイバを
真空室内に導き、該真空室内において光フアイバ
軸線と交差する方向のスパツタ粒子照射角度をも
つターゲツトには、イオン源からこの真空室内に
導かれたイオンビームを照射し、これにより発生
させたターゲツトからのスパツタ粒子を前記光フ
アイバの外周に被着させる光フアバの金属被覆方
法において、前記ターゲツトは光フアイバの回り
を囲む円弧状の金属板であり、そのスパツタ粒子
発生面と光フアイバとの挟角が45゜であることを
特徴とする。
As explained above, the present invention introduces a spun optical fiber, which is rotating around the optical fiber axis, into a vacuum chamber, and in the vacuum chamber, targets having a sputter particle irradiation angle in a direction intersecting the optical fiber axis. In this optical fiber metal coating method, an ion beam guided into the vacuum chamber from an ion source is irradiated, and spatter particles generated from the target are deposited on the outer periphery of the optical fiber. It is an arc-shaped metal plate that surrounds the fiber, and is characterized by an included angle of 45° between the spatter particle generation surface and the optical fiber.

かかる構成を特徴とするこの発明の方法では、
従来例のように、光フアイバがプラズマにさられ
て、その特性が劣化するといつた欠点がなく、光
フアイバへの金属被膜を薄く均一にでき、かつ、
その金属被膜にガスの不純物を吸収させないこと
により当該金属被膜の純度を高めることができる
ばかりか、以下のような効果も得られる。
In the method of this invention characterized by such a configuration,
Unlike conventional methods, the optical fiber does not suffer from deterioration of its characteristics due to exposure to plasma, and the metal coating on the optical fiber can be made thin and uniform, and
By not allowing the metal coating to absorb gas impurities, not only can the purity of the metal coating be increased, but also the following effects can be obtained.

すなわち、この発明の場合、スパツタ手段によ
る光フアイバへの金属被覆に際し、ターゲツトを
光フアイバの回りを囲む円弧状の金属板とし、そ
のスパツタ粒子発生面と光フアイバとの挟角を
45゜としているから、光フアイバの周囲からその
外周に向けて、かつ、光フアイバ軸線と直交して
スパツタ粒子が集中的に照射されるようになり、
したがつて、光フアイバに対する金属付着量が飛
躍的に向上し、金属被覆作業そのものも効率よく
行なえる。
That is, in the case of the present invention, when coating an optical fiber with metal by sputtering means, the target is an arc-shaped metal plate surrounding the optical fiber, and the included angle between the spatter particle generation surface and the optical fiber is
Since it is set at 45 degrees, the spatter particles are intensively irradiated from the periphery of the optical fiber toward its outer periphery and perpendicular to the optical fiber axis.
Therefore, the amount of metal deposited on the optical fiber is dramatically improved, and the metal coating work itself can be performed efficiently.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の方法を示す金属被覆装置の
一部縦断正面図、第2図はターゲツトの他の実施
例を示す斜視図である。 1……スパツタ槽(真空室)、4……光フアイ
バ、6……イオン源、7,7a……ターゲツト。
FIG. 1 is a partially longitudinal front view of a metal coating apparatus showing the method of the present invention, and FIG. 2 is a perspective view showing another embodiment of the target. 1... Sputter tank (vacuum chamber), 4... Optical fiber, 6... Ion source, 7, 7a... Target.

Claims (1)

【特許請求の範囲】[Claims] 1 光フアイバ軸線を軸心として回転している紡
糸後の光フアイバを真空室内に導き、該真空室内
において光フアイバ軸線と交差する方向のスパツ
タ粒子照射角度をもつターゲツトには、イオン源
からこの真空室内に導かれたイオンビームを照射
し、これにより発生させたターゲツトからのスパ
ツタ粒子を前記光フアイバの外周に被着させる光
フアイバの金属被覆方法において、前記ターゲツ
トは光フアイバの回りを囲む円弧状の金属板であ
り、そのスパツタ粒子発生面と光フアイバとの挟
角が45゜であることを特徴とする光フアイバの金
属被覆方法。
1. The spun optical fiber, which is rotating around the optical fiber axis, is introduced into a vacuum chamber, and in the vacuum chamber, a target having a sputter particle irradiation angle in a direction that crosses the optical fiber axis is In a metal coating method for an optical fiber, in which an ion beam guided into a room is irradiated and spatter particles generated from a target are coated on the outer periphery of the optical fiber, the target is formed in an arc shape surrounding the optical fiber. A method for coating an optical fiber with metal, characterized in that the included angle between the spatter particle generation surface and the optical fiber is 45°.
JP56058203A 1981-04-17 1981-04-17 Coating method of optical fiber with metal Granted JPS57175747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56058203A JPS57175747A (en) 1981-04-17 1981-04-17 Coating method of optical fiber with metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56058203A JPS57175747A (en) 1981-04-17 1981-04-17 Coating method of optical fiber with metal

Publications (2)

Publication Number Publication Date
JPS57175747A JPS57175747A (en) 1982-10-28
JPS647022B2 true JPS647022B2 (en) 1989-02-07

Family

ID=13077468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56058203A Granted JPS57175747A (en) 1981-04-17 1981-04-17 Coating method of optical fiber with metal

Country Status (1)

Country Link
JP (1) JPS57175747A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5168842A (en) * 1974-12-12 1976-06-14 Sumitomo Electric Industries
JPS51109397A (en) * 1975-03-24 1976-09-28 Sumitomo Electric Industries Garasusenino hifukuhoho
JPS52140480A (en) * 1976-05-20 1977-11-24 Nippon Telegr & Teleph Corp <Ntt> Sputtering evaporation apparatus by ion beam

Also Published As

Publication number Publication date
JPS57175747A (en) 1982-10-28

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