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JPH0159358B2 - - Google Patents
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JPH0159358B2 - - Google Patents

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Publication number
JPH0159358B2
JPH0159358B2 JP9445882A JP9445882A JPH0159358B2 JP H0159358 B2 JPH0159358 B2 JP H0159358B2 JP 9445882 A JP9445882 A JP 9445882A JP 9445882 A JP9445882 A JP 9445882A JP H0159358 B2 JPH0159358 B2 JP H0159358B2
Authority
JP
Japan
Prior art keywords
corrosion
pattern
etched
etching
resistant film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9445882A
Other languages
Japanese (ja)
Other versions
JPS58210169A (en
Inventor
Takeshi Nishio
Chuichi Oono
Hiroyuki Shimogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyodo Printing Co Ltd
Original Assignee
Kyodo Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyodo Printing Co Ltd filed Critical Kyodo Printing Co Ltd
Priority to JP57094458A priority Critical patent/JPS58210169A/en
Publication of JPS58210169A publication Critical patent/JPS58210169A/en
Publication of JPH0159358B2 publication Critical patent/JPH0159358B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 この発明は、エツチング加工品の製造方法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an etched product.

金属板を耐食膜を使用して選択的にエツチング
して所定のパターンを得ることによつて製造され
る加工品は各種のものがあるが、金属導電板もそ
の様な加工品の一例である。金属導電板はリード
フレームとも称され、第1図に示すように、薄い
金属板をその不要部分を腐蝕除去して多数の細い
枝状の金属条2からなるパターンをもつもので、
この金属条2は後にウエハーチツプ搭載部分3上
のウエハーチツプとワイヤーボンデイング等の手
法で接続されるものである。この様な金属条2の
太さは数十ミクロン単位のものであり、かつパタ
ーンは通常1個の金属板について多数が形成され
るもので、全体として混みあつた状態を成すもの
であるにもかかわらず、寸法精度が極めて厳しく
要求されるものである。
There are various types of processed products that are manufactured by selectively etching a metal plate using a corrosion-resistant film to obtain a predetermined pattern, and metal conductive plates are one example of such processed products. . A metal conductive plate is also called a lead frame, and as shown in Figure 1, it has a pattern consisting of a large number of thin branch-like metal strips 2 made by removing unnecessary parts of a thin metal plate by corrosion.
This metal strip 2 is later connected to a wafer chip on the wafer chip mounting portion 3 by wire bonding or the like. The thickness of such metal strips 2 is on the order of several tens of microns, and a large number of patterns are usually formed on one metal plate, resulting in a crowded state as a whole. Regardless, extremely strict dimensional accuracy is required.

この様なリードフレームをエツチングにより形
成するには、金属板上の必要な部分に耐食膜を形
成し、これ以外の不要部分の金属を化学エツチン
グにより、除去する方法が一般的であるが、この
方法による場合は第2図に示すように、耐食膜の
形状を仮想線で示す必要なパターンに正確に一致
させても、エツチングにより実際に得られた製品
では、実線で示すように、金属条2のコーナーが
サイドエツチングで丸くなり、シヤープな角を作
ることが難しい。耐食膜を形成するための原版を
作成する場合は、従来は、第3図bに示すような
必要なパターン2を描くのに、第3図aに示すよ
うな不必要な部分を塗りつぶす方法(ハツチング
方法)や第4図bに示すような必要なパターン2
を描くのに第4図aに示すような輪郭を比較的太
い線で描く方法(太線輪郭法が取られている。さ
らに線幅精度や形状変化、特に前述のコーナー部
のサイドエツチングによる形状変化にたいして
は、第5図に示すセリフと呼ばれる特殊なパター
ン5をコーナー部に付加したり、あるいは第6図
に示すように、コーナー部分に架橋部6(昭和57
年特許出願公開第26169号公報参照)を作りサイ
ドエツチングによる形状変化を防止する等、原図
以外のパターンを付加することにより、問題を解
決することが試みられている。しかるに、ハツチ
ングの方法のより作成した原版を用いてエツチン
グ加工品を製造した場合には、パターンの密集し
た部分とパターンの疎となつている部分のサイド
エツチング量が著しく異なる結果、規格の製品を
作ることが難しく、原版上での補正が必要にな
り、作業が極めて煩雑である。しかも、エツチン
グする部分が多くなり、腐蝕液の疲労が大きい。
また、比較的太い線でパターンの輪郭を描く方法
(太線輪郭法)でも、パターン密集部分で輪郭線
が重なりあい、その結果、線幅が太くなり、サイ
ドエツチング量が多くなる。したがつてパターン
密集部分では特にコーナーが丸くなり易い傾向と
なる。また、セリフや架橋部等の原型に無い特殊
なパターンを付加することは原版作成が複雑とな
り、かつ、不必要な部分の線幅が異なるためにサ
イドエツチングの速度が変化し、線幅精度に影響
を与えることにならざるをえない。
To form such a lead frame by etching, a common method is to form a corrosion-resistant film on the necessary parts of the metal plate and remove the metal in unnecessary parts by chemical etching. As shown in Figure 2, when using this method, even if the shape of the corrosion-resistant film is made to exactly match the required pattern shown by the imaginary lines, in the product actually obtained by etching, as shown in the solid line, the metal strip The corners of 2 are rounded due to side etching, making it difficult to create sharp corners. When creating a master plate for forming a corrosion-resistant film, the conventional method is to draw the necessary pattern 2 as shown in Fig. 3b, and then fill in unnecessary parts as shown in Fig. 3a ( Hatching method) or the required pattern 2 as shown in Figure 4b.
In order to draw the outline shown in Figure 4a, a relatively thick line is used (thick line contour method is used).In addition, line width accuracy and shape changes, especially shape changes due to the side etching of the corners mentioned above, are taken. For this purpose, a special pattern 5 called a serif as shown in Fig. 5 is added to the corner part, or a bridge part 6 (Showa 57) is added to the corner part as shown in Fig. 6.
Attempts have been made to solve the problem by adding patterns other than the original, such as creating a pattern (see Patent Application Publication No. 26169, 2013) to prevent changes in shape due to side etching. However, when an etched product is manufactured using an original plate created by the hatching method, the amount of side etching in the densely patterned area and the sparsely patterned area differs markedly, making it difficult to produce a standard product. It is difficult to create, requires correction on the original plate, and is extremely complicated. Moreover, the number of parts to be etched increases, and the etchant becomes fatigued.
Furthermore, even in a method of drawing the outline of a pattern using relatively thick lines (thick line outline method), the outlines overlap in areas where the pattern is dense, resulting in thicker lines and a larger amount of side etching. Therefore, corners tend to become rounded particularly in areas with dense patterns. In addition, adding special patterns that are not present in the original, such as serifs and bridges, complicates the creation of the master plate, and the side etching speed changes because the line width of unnecessary parts differs, resulting in poor line width accuracy. It is bound to have an impact.

この様なことから、規格に基づいたシヤープな
必要パターンをもつ高品質のエツチング加工品を
容易に得ることができ、かつエツチングに際し
て、腐蝕液の疲労が著しく少なく、したがつて腐
蝕液の寿命を永くすることができて、経済的にも
有利なエツチング加工品の製造方法の開発が望ま
れている。
For this reason, it is possible to easily obtain high-quality etched products with sharp required patterns based on standards, and the fatigue of the etchant during etching is extremely low, thus extending the life of the etchant. It is desired to develop a method for manufacturing etched products that can be made for a long time and is economically advantageous.

この発明は上記のごとき事情に鑑みてなされた
ものであつて、規格に基づいたシヤープな必要な
パターンをもつ高品質のエツチング加工品を容易
に得ることができ、かつエツチングに際して、腐
蝕液の疲労が著しく少なく、したがつて腐蝕液の
寿命を永くすることができて、経済的にも有利な
エツチング加工品の製造方法を提供することを目
的とするものである。
This invention was made in view of the above circumstances, and it is possible to easily obtain a high-quality etched product having a sharp required pattern based on the standard, and to reduce fatigue of the etching solution during etching. It is an object of the present invention to provide an economically advantageous method for manufacturing etched products, which has a significantly lower amount of etchant and can therefore extend the life of the etchant.

この目的に対応して、この発明のエツチング加
工品の製造方法は、金属板を耐食膜を用いてエツ
チングして必要なパターンを得るエツチング加工
品の製造方法であつて、前記耐食膜を形成するた
めの原版を、必要なパターンの輪郭にサイドエツ
チングのオフセツト量を介して沿う耐食膜非形成
用の画線部を軸線によつて描きかつ前記画線部を
前記パターンのコーナー部もしくは隣合う前記画
線部が接近することとなる部分では不連続に描い
てなるものを使用することを特徴としている。
Corresponding to this object, the method for producing an etched product of the present invention is a method for producing an etched product in which a necessary pattern is obtained by etching a metal plate using a corrosion-resistant film, the method comprising: forming the corrosion-resistant film; On the original plate for printing, an image area for non-corrosion film formation that follows the outline of the required pattern through the offset amount of side etching is drawn along the axis line, and the image area is drawn at the corner of the pattern or the adjacent image area. It is characterized by the use of discontinuous drawings in areas where the drawing areas are close to each other.

以下、この発明の詳細を一実施例を示す図面に
ついて説明する。
Hereinafter, details of the present invention will be explained with reference to the drawings showing one embodiment.

第7図において、11はエツチング加工品の一
例としてのリードフレームであり、リードフレー
ム11は金属板を耐食膜を用いてエツチングして
不要部分12を除去し、必要なパターンの金属条
13を形成したものである。耐食膜を形成するた
めの原版14は、第8図に示すように、必要なパ
ターンの金属条13の輪郭にサイドエツチングオ
フセツト量dを介して沿う耐食膜非形成用の画線
部15を200μm以下の細線によつて描く。ただ
し、画線部15は金属条13のコーナー部16に
対応する部分17、もしくは隣合う画線部15同
志が接近することとなる部分では不連続になつて
いる。
In FIG. 7, 11 is a lead frame as an example of an etched product, and the lead frame 11 is a metal plate that is etched using a corrosion-resistant film to remove unnecessary portions 12 and form metal strips 13 in the required pattern. This is what I did. As shown in FIG. 8, the original plate 14 for forming the corrosion-resistant film has an image area 15 for non-corrosion-resistant film formation that follows the outline of the metal strip 13 of the required pattern with a side etching offset amount d. Draw with a thin line of 200μm or less. However, the image portion 15 is discontinuous at a portion 17 corresponding to the corner portion 16 of the metal strip 13 or at a portion where adjacent image portions 15 come close to each other.

この様に構成された原版による耐食膜を使用し
て金属板をエツチングした場合にはその金属板は
第9図に示すように、画線部15に沿つて腐蝕部
18が形成されるが、その腐蝕部18はサイドエ
ツチングにより、画線部15よりも太くなり、そ
の結果、腐蝕部18の内側が金属条13の所望の
輪郭と一致し、また、画線部15の不連続部もサ
イドエツチングの結果、腐蝕部18は連続し、不
要部分12は腐蝕部18によつて必要な金属条1
3から切離されて脱落し、ついに所望の金属条1
3を得る。
When a metal plate is etched using the corrosion-resistant film formed by the master plate constructed in this way, a corroded area 18 is formed along the image area 15 on the metal plate as shown in FIG. The corroded portion 18 becomes thicker than the image area 15 due to side etching, and as a result, the inside of the corroded area 18 matches the desired contour of the metal strip 13, and the discontinuous portion of the image area 15 also forms on the side. As a result of etching, the corroded part 18 is continuous, and the unnecessary part 12 is replaced by the necessary metal strip 1 by the corroded part 18.
It is separated from 3 and falls off, and finally the desired metal strip 1
Get 3.

この様に、この発明のエツチング加工品の製造
方法では、所望の製品の形状を得るのにセリフや
架橋部のような、原版上で原図にはないパターン
を付加する必要がなく、原図パターンの一部を削
除することで実施ができるため、原版作成が極め
て容易である。また、規格に基づいたシヤープな
必要パターンをもつ高品質のエツチング加工品を
容易に得ることができる。しかもエツチングが細
い腐蝕部18の範囲のみで行なわれ、不要部分を
全部腐蝕除去させる必要がないから、腐蝕液の疲
労が著しく少なく、したがつて腐蝕液の寿命を永
くすることができて、経済的にも有利である。
In this way, in the method for manufacturing etched products of the present invention, it is not necessary to add patterns that are not on the original, such as serifs or bridges, on the original to obtain the desired product shape, and This can be done by deleting a part, so it is extremely easy to create an original version. Furthermore, it is possible to easily obtain high-quality etched products having sharp required patterns based on standards. Moreover, since etching is carried out only within the thin corroded area 18, and there is no need to remove all unnecessary parts, fatigue of the etchant is significantly reduced, and the life of the etchant can therefore be extended, making it economical. It is also advantageous.

画線部15と不連続部の配置は、第8図に示す
ものに限られないのはもち論であつて、第10図
から第14図に示すような各種の選択が可能であ
る。
It goes without saying that the arrangement of the image portion 15 and the discontinuous portion is not limited to that shown in FIG. 8, and various selections as shown in FIGS. 10 to 14 are possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はリードフレームの一例を示す拡大平面
図、第2図はリードフレームの金属条を示す拡大
平面図、第3図はハツチング法を示す説明図、第
4図は太線輪郭法を示す説明図、第5図はセリフ
を示す拡大平面図、第6図は架橋部を示す拡大平
面図、第7図はこの発明の一実施例に関わるリー
ドフレームを示す拡大平面部分図、第8図はこの
発明の一実施例に関わる耐食膜作成用原版を示す
拡大平面部分図、第9図はこの発明の一実施例に
関わるリードフレームのエツチング状態を示す拡
大平面図、第10図は他の実施例に関わる原版の
画線図を示す説明図、第11図は他の実施例に関
わる原版の画線部を示す説明図、第12図は他の
実施例に関わる原版の画線部を示す説明図、第1
3図は他の実施例に関わる原版の画線部を示す説
明図、及び第14図は他の実施例に関わる原版の
画線部を示す説明図である。 11…リードフレーム、12…不要部分、13
…金属条、14…原版、15…画線部、16…コ
ーナー部、17…対応部分、18…腐蝕部。
Fig. 1 is an enlarged plan view showing an example of a lead frame, Fig. 2 is an enlarged plan view showing metal strips of the lead frame, Fig. 3 is an illustration showing the hatching method, and Fig. 4 is an explanation showing the thick line contour method. 5 is an enlarged plan view showing serifs, FIG. 6 is an enlarged plan view showing a bridge portion, FIG. 7 is an enlarged partial plan view showing a lead frame related to an embodiment of the present invention, and FIG. FIG. 9 is an enlarged partial plan view showing an etched state of a lead frame in accordance with one embodiment of the present invention; FIG. An explanatory diagram showing a drawing diagram of an original plate related to the example, FIG. 11 is an explanatory diagram showing a drawing part of an original plate related to another embodiment, and FIG. 12 is an explanatory diagram showing a drawing part of an original plate related to another embodiment. Explanatory diagram, 1st
FIG. 3 is an explanatory diagram showing the image area of the original plate related to another embodiment, and FIG. 14 is an explanatory diagram showing the image area of the original plate related to another embodiment. 11... Lead frame, 12... Unnecessary part, 13
...metal strip, 14...original plate, 15...image area, 16...corner area, 17...corresponding area, 18...corroded area.

Claims (1)

【特許請求の範囲】[Claims] 1 金属板を耐食膜を用いてエツチングして必要
なパターンを得るエツチング加工品の製造方法で
あつて、前記耐食膜を形成するための原版を、必
要なパターンの輪郭にサイドエツチングのオフセ
ツト量を介して沿う耐食膜非形成用の画線部を細
線によつて描きかつ前記画線部を前記パターンの
コーナー部もしくは隣合う前記画線部が接近する
こととなる部分では不連続に描いてなるものを使
用することを特徴とするエツチング加工品の製造
方法。
1. A method for manufacturing an etched product in which a required pattern is obtained by etching a metal plate using a corrosion-resistant film, the original plate for forming the corrosion-resistant film being offset by side etching to the outline of the required pattern. The image area for non-corrosion film formation that runs through the pattern is drawn as a thin line, and the image area is drawn discontinuously at the corner part of the pattern or at the part where the adjacent image areas come close to each other. A method of manufacturing an etched product characterized by using etched products.
JP57094458A 1982-06-02 1982-06-02 Production of etched article Granted JPS58210169A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57094458A JPS58210169A (en) 1982-06-02 1982-06-02 Production of etched article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57094458A JPS58210169A (en) 1982-06-02 1982-06-02 Production of etched article

Publications (2)

Publication Number Publication Date
JPS58210169A JPS58210169A (en) 1983-12-07
JPH0159358B2 true JPH0159358B2 (en) 1989-12-15

Family

ID=14110819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57094458A Granted JPS58210169A (en) 1982-06-02 1982-06-02 Production of etched article

Country Status (1)

Country Link
JP (1) JPS58210169A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR8604254A (en) * 1985-09-30 1987-04-28 Emerson Electric Co SAFETY BREATHING PROCESS IN HERMETICALLY SEALED CONTAINER LID, SAFETY BREATHING MANUFACTURE PROCESS IN METAL COVERS FOR HERMETICALLY SEALED BATTERY CONTAINERS, HERMOTICALLY HERMITICALLY SEALED CONTAINER
JPS62151547U (en) * 1986-03-18 1987-09-25
JPH0438354Y2 (en) * 1986-03-18 1992-09-08
JPH0758396B2 (en) * 1988-10-17 1995-06-21 日立電線株式会社 Photo etching mask

Also Published As

Publication number Publication date
JPS58210169A (en) 1983-12-07

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