JPH0211678B2 - - Google Patents
Info
- Publication number
- JPH0211678B2 JPH0211678B2 JP8223282A JP8223282A JPH0211678B2 JP H0211678 B2 JPH0211678 B2 JP H0211678B2 JP 8223282 A JP8223282 A JP 8223282A JP 8223282 A JP8223282 A JP 8223282A JP H0211678 B2 JPH0211678 B2 JP H0211678B2
- Authority
- JP
- Japan
- Prior art keywords
- solder
- nickel plating
- minutes
- bath
- copper plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 29
- 229910000679 solder Inorganic materials 0.000 claims description 28
- YUDBKSANIWMLCU-UHFFFAOYSA-N 3,4-dichlorophthalic acid Chemical compound OC(=O)C1=CC=C(Cl)C(Cl)=C1C(O)=O YUDBKSANIWMLCU-UHFFFAOYSA-N 0.000 claims description 6
- WZHHYIOUKQNLQM-UHFFFAOYSA-N 3,4,5,6-tetrachlorophthalic acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C(O)=O WZHHYIOUKQNLQM-UHFFFAOYSA-N 0.000 claims description 5
- 239000010953 base metal Substances 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 42
- 229910052759 nickel Inorganic materials 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 230000004907 flux Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 150000001879 copper Chemical class 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000004927 fusion Effects 0.000 description 3
- -1 phosphorus compound Chemical class 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
【発明の詳細な説明】 本発明はメツキ浴に関する。[Detailed description of the invention] The present invention relates to a plating bath.
さらに詳しくは、本発明ははんだ濡れ性の改善
されたニツケルメツキ浴に関する。 More specifically, the present invention relates to a nickel plating bath with improved solder wettability.
電子部品の端子に施されたメツキ部分にはんだ
を融着するが、そのメツキははんだ濡れ性の良い
事(はんだのかたまりやピンホールのない事)が
要求されている。はんだ濡れ性を向上させる方法
として、一般にはフラツクスが使用されている。
しかしメツキされた端子をフラツクス処理するこ
とは工程が増えるのみならず、フラツクスによる
端子以外の部分の汚損を起こすなど望ましいこと
ではない。 Solder is fused to the plating on the terminals of electronic components, but the plating must have good solder wettability (no solder lumps or pinholes). Flux is generally used as a method to improve solder wettability.
However, flux treatment of plated terminals not only increases the number of steps but also causes staining of parts other than the terminals due to the flux, which is not desirable.
例えば、はんだ濡れ性を改善した無電解ニツケ
ルメツキ法としてリン化合物又はホウ素化合物を
使用する方法があるが、これらの方法では必ずし
も十分なはんだ濡れ性は得られていない。 For example, there is a method of using a phosphorus compound or a boron compound as an electroless nickel plating method that improves solder wettability, but these methods do not necessarily provide sufficient solder wettability.
本発明はこれらの欠点のないニツケルメツキ浴
を提供することを目的とするものである。 The object of the present invention is to provide a nickel plating bath that does not have these drawbacks.
本発明はメツキ液1に対し、はんだの融点付
近で分解、昇華もしくは蒸気圧が高くなり母材金
属の表面を清浄にし、溶融はんだの濡れ性を向上
させるジクロルフタル酸及び/又はテトラクロル
フタル酸を0.1〜80g含有せしめてなるニツケル
メツキ浴に関する。 The present invention adds dichlorophthalic acid and/or tetrachlorophthalic acid to the plating liquid 1, which decomposes, sublimates, or has a high vapor pressure near the melting point of the solder, thereby cleaning the surface of the base metal and improving the wettability of the molten solder. It relates to a nickel metal bath containing 0.1 to 80 g.
さらに詳しくは、本発明はニツケルメツキ浴中
にはんだの融点付近で分解、昇華もしくは蒸気圧
が高くなり母材金属の表面を清浄にし、溶融はん
だの濡れ性を向上させるジクロルフタル酸及び/
又はテトラクロルフタル酸をメツキ液1に対
し、0.1〜80g含有させてニツケルメツキとフラ
ツクス効果を程する成分をメツキ被膜に析出もし
くは含有させ、従来別工程で行なつていたフラツ
クス工程を省き、端子以外の部分の汚損をなく
し、メツキに十分なはんだ濡れ性を付与しようと
するものである。 More specifically, the present invention provides dichlorophthalic acid and/or which decomposes, sublimates, or has a high vapor pressure near the melting point of the solder in a nickel plating bath, thereby cleaning the surface of the base metal and improving the wettability of the molten solder.
Or, by adding 0.1 to 80 g of tetrachlorophthalic acid to 1 part of the plating solution, a component that has a flux effect with nickel plating can be precipitated or contained in the plating film, thereby eliminating the flux process, which was conventionally performed as a separate process, and making it possible to use other than terminals. The purpose is to eliminate contamination of the parts and provide sufficient solder wettability to the plating.
本発明になるニツケルメツキ浴は無電解、電解
のいずれのニツケルメツキ浴にも適用でき、また
還元剤、PH調整剤、緩衝剤、錯化剤、促進剤、安
定剤、改良剤などをメツキ浴中に添加することも
フラツクス効果を阻害しない限り何ら制限するも
のではない。 The nickel plating bath of the present invention can be applied to both electroless and electrolytic nickel plating baths, and reducing agents, PH adjusters, buffers, complexing agents, promoters, stabilizers, improvers, etc. can be added to the plating bath. There is no restriction on addition as long as it does not inhibit the flux effect.
ジクロルフタル酸及び/又はテトラクロルフタ
ル酸の含有量は、使用するメツキ液1に対し、
0.1〜80gとされ、この範囲から外れるとニツケ
ルメツキ浴の寿命が短かく、適正な厚さにフラツ
クスを付着することができない。 The content of dichlorophthalic acid and/or tetrachlorophthalic acid is as follows:
If the weight is outside this range, the life of the nickel plating bath will be short and the flux cannot be deposited to an appropriate thickness.
以下実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例 1
無電解ニツケルメツキ液(日本カニゼン製シユ
ーマニツケルメツキ液)1に蒸留水4を加え
て希釈し、これにフラツクス効果を程するジクロ
ルフタル酸25gを加えて無電解ニツケルメツキ浴
とした。Example 1 Electroless nickel plating solution (Schuman nickel plating solution manufactured by Nippon Kanisen) was diluted by adding 4 parts of distilled water, and 25 g of dichlorophthalic acid, which imparts a flux effect, was added to prepare an electroless nickel plating bath.
上記とは別に試薬1級35%の塩酸2に蒸留水
2を加えて酸処理浴とした。 Separately from the above, 2 parts of distilled water was added to 2 parts of 35% first class reagent hydrochloric acid to prepare an acid treatment bath.
さらに上記とは別にレツドシユーマ2に蒸留
水2を加えて活性化浴とした。次に大きさ10cm
角、厚さ1mmの銅板をアセトンで洗浄し、流水で
20分間水洗したのち前述の酸処理浴に2分間浸漬
し、次いで流水中で10分間水洗した。さらに前述
の活性化浴に10分間浸漬後流水中で5分間水洗し
て活性化処理した銅板とした。 Furthermore, in addition to the above, distilled water 2 was added to the red bath 2 to form an activation bath. Next size is 10cm
Clean a corner, 1mm thick copper plate with acetone and under running water.
After washing with water for 20 minutes, it was immersed in the aforementioned acid treatment bath for 2 minutes, and then washed with running water for 10 minutes. Further, the copper plate was immersed in the above-mentioned activation bath for 10 minutes and then washed in running water for 5 minutes to obtain an activated copper plate.
次に前述の無電解ニツケルメツキ浴を80℃に加
温し、さらにこの浴中に活性化処理した銅板を動
かしながら10分間浸漬後流水中で20分間水洗し、
次いでアセトン中に浸漬したのち乾燥してメツキ
処理した。 Next, the electroless nickel plating bath described above was heated to 80°C, and the activated copper plate was immersed in this bath for 10 minutes while moving, and then washed under running water for 20 minutes.
Next, it was immersed in acetone, dried and plated.
このメツキ処理した銅板の上に大きさ9cm角、
厚さ0.1mmの高温はんだ(鉛90重量%、錫10重量
%)をのせ水素雰囲気中で加熱し、この高温はん
だをリフロー(流延)した。加熱条件は10分間で
260℃に昇温後その温度で10分保持し、さらに5
分間で320℃に昇温後その温度で2分保持し、そ
の後強制的に80℃まで5分間で急冷した。はんだ
融着後の外観を観察したところ、はんだは銅板の
上面に均一に流延されており、はんだのかたまり
やピンホールは見られなかつた。 On top of this plated copper plate, a 9cm square
A 0.1 mm thick high-temperature solder (90% by weight lead, 10% by weight tin) was placed on it and heated in a hydrogen atmosphere, and this high-temperature solder was reflowed (cast). Heating conditions: 10 minutes
After raising the temperature to 260℃, hold it at that temperature for 10 minutes, and then heat it for another 5 minutes.
The temperature was raised to 320°C for 2 minutes, held at that temperature for 2 minutes, and then rapidly cooled to 80°C for 5 minutes. When the appearance after solder fusion was observed, it was found that the solder was uniformly cast on the upper surface of the copper plate, and no solder lumps or pinholes were observed.
比較例 1
実施例1の活性化処理された銅板を無電解ニツ
ケルメツキ液(日本カニゼン製シユーマニツケル
メツキ液)にジクロルフタル酸を添加しないニツ
ケルメツキ浴で実施例1と同様の方法により、メ
ツキ処理した。Comparative Example 1 The activated copper plate of Example 1 was plated in the same manner as in Example 1 using a nickel plating bath in which dichlorophthalic acid was not added to an electroless nickel plating solution (Shermany nickel plating solution manufactured by Nippon Kanizen).
このメツキ処理した銅板を実施例1と同様の方
法及び条件で高温はんだを流延した。 High-temperature solder was cast on this plated copper plate using the same method and conditions as in Example 1.
はんだ融着後の外観を観察したところはんだは
均一に拡がらずひけが見られ、直径2〜3mmの円
板状のかたまりやピンホールができた。 When the appearance after solder fusion was observed, the solder did not spread uniformly and sink marks were observed, and disk-shaped lumps and pinholes with a diameter of 2 to 3 mm were formed.
実施例 2
硫酸ニツケル240g/、塩化ニツケル45g/
を4の蒸留水に溶解し無光沢ニツケルメツキ
液を作成し、次いでこの無光沢ニツケルメツキ液
にテトラクロルフタル酸25gを加えて電解ニツケ
ルメツキ浴とした。Example 2 Nickel sulfate 240g/, nickel chloride 45g/
was dissolved in distilled water from step 4 to prepare a matte nickel plating solution, and then 25 g of tetrachlorophthalic acid was added to this matte nickel plating solution to prepare an electrolytic nickel plating bath.
次に前述の電解ニツケルメツキ浴を50℃に加温
し、さらにこの浴中に実施例1の活性化処理され
た銅板を浸漬し動かしながら電流密度4A/dm2
で10分間メツキし、その後流水中で20分間水洗
し、次いでアセトンに浸漬したのち乾燥してメツ
キ処理した。 Next, the electrolytic nickel plating bath described above was heated to 50°C, and the activated copper plate of Example 1 was immersed in this bath, and while being moved, a current density of 4 A/dm 2 was applied.
It was plated for 10 minutes, then washed under running water for 20 minutes, then immersed in acetone, dried, and plated.
このメツキ処理した銅板を実施例1と同様の方
法及び条件で高温はんだを流延した。 High-temperature solder was cast on this plated copper plate using the same method and conditions as in Example 1.
はんだ融着後の外観を観察したところ、はんだ
は銅板の上面に均一に流延されており、はんだの
かたまりやピンホールは見られなかつた。 When the appearance after solder fusion was observed, the solder was uniformly cast on the upper surface of the copper plate, and no solder lumps or pinholes were observed.
本発明になるニツケルメツキ浴によれば、はん
だ流延に際してフラツクス効果が作用し、ひけな
どを抑制しはんだの濡れ性を著しく向上させるこ
とができる。 According to the nickel plating bath of the present invention, a flux effect acts during solder casting, suppressing sink marks and the like and significantly improving solder wettability.
Claims (1)
解、昇華もしくは蒸気圧が高くなり母材金属の表
面を清浄にし、溶融はんだの濡れ性を向上させる
ジクロルフタル酸及び/又はテトラクロルフタル
酸を0.1〜80g含有せしめてなるニツケルメツキ
浴。1 To the plating liquid 1, add 0.1 to 10% of dichlorophthalic acid and/or tetrachlorophthalic acid, which decomposes, sublimates, or has a high vapor pressure near the melting point of the solder, cleans the surface of the base metal, and improves the wettability of molten solder. Nikkelmetsuki bath containing 80g.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8223282A JPS58199886A (en) | 1982-05-14 | 1982-05-14 | Plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8223282A JPS58199886A (en) | 1982-05-14 | 1982-05-14 | Plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58199886A JPS58199886A (en) | 1983-11-21 |
| JPH0211678B2 true JPH0211678B2 (en) | 1990-03-15 |
Family
ID=13768655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8223282A Granted JPS58199886A (en) | 1982-05-14 | 1982-05-14 | Plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58199886A (en) |
-
1982
- 1982-05-14 JP JP8223282A patent/JPS58199886A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58199886A (en) | 1983-11-21 |
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