JPH0248141B2 - - Google Patents
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- Publication number
- JPH0248141B2 JPH0248141B2 JP58143116A JP14311683A JPH0248141B2 JP H0248141 B2 JPH0248141 B2 JP H0248141B2 JP 58143116 A JP58143116 A JP 58143116A JP 14311683 A JP14311683 A JP 14311683A JP H0248141 B2 JPH0248141 B2 JP H0248141B2
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- semiconductor
- data
- temperature
- transient response
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】
技術分野
本発明は、半導体ダイオードの電流過渡応答特
性および静電容量過渡応答特性の観測に基づいて
半導体ダイオードを構成する半導体材料のキヤリ
ヤ捕獲中心を測定する半導体捕獲中心測定方法、
特に、観測データを実時間処理した結果に適応さ
せて観測条件を変化させることにより効率よく測
定を行ない得るようにした適応式半導体捕獲中心
測定方法に関するものである。Detailed Description of the Invention Technical Field The present invention relates to a semiconductor capture center measurement method for measuring the carrier capture center of a semiconductor material constituting a semiconductor diode based on the observation of current transient response characteristics and capacitance transient response characteristics of the semiconductor diode. Method,
In particular, the present invention relates to an adaptive semiconductor capture center measurement method that enables efficient measurement by changing observation conditions in accordance with the results of real-time processing of observation data.
従来技術
従来のこの種半導体捕獲中心測定方法として
は、半導体ダイオードに対して定常的に光照射や
高周波電圧印加を施した際に半導体ダイオードに
生起する発光現象や電気伝導現象を観測すること
によつてキヤリヤ捕獲中心を測定する方法ととも
に、半導体ダイオードに対して光パルスの照射や
電圧パルスの印加を行なつた際に半導体ダイオー
ドに生起する電流過渡現象および静電容量過渡現
象を観測することによつてキヤリヤ捕獲中心を測
定する方法が採られていた。Prior Art The conventional method for measuring this type of semiconductor capture center is to observe the light emission phenomenon and electrical conduction phenomenon that occur in a semiconductor diode when the semiconductor diode is regularly irradiated with light or a high frequency voltage is applied. In addition to the method of measuring the carrier capture center using a semiconductor diode, it is also possible to observe the current transient phenomenon and capacitance transient phenomenon that occur in a semiconductor diode when a light pulse is irradiated or a voltage pulse is applied to the semiconductor diode. The method used was to measure the center of carrier capture.
しかしながら、かかる従来の測定方法において
は、前者の方法については勿論のこと、後者の方
法についても、キヤリヤ捕獲中心のパラメータと
しての捕獲断面積、捕獲中心密度分布、捕獲エネ
ルギー準位を高感度にて測定し得る反面、観測条
件としての照射パルス光強度や印加パルス電圧
値、過渡応答信号のサンプリング時点および測定
環境温度の掃引速度に対して、上述した捕獲中心
パラメータの測定可能範囲および測定感度が強く
依存しているために、観測条件を有効適切に設定
するには高度の熟練を必要とした。 However, in such conventional measurement methods, not only the former method but also the latter method can measure the capture cross section, capture center density distribution, and capture energy level as parameters of the carrier capture center with high sensitivity. On the other hand, the measurable range and measurement sensitivity of the capture center parameters described above are strong against the observation conditions of the irradiation pulse light intensity, the applied pulse voltage value, the sampling time of the transient response signal, and the sweep speed of the measurement environment temperature. Because of this dependence, a high degree of skill was required to effectively and appropriately set observation conditions.
一方、かかる高度の熟練を要せずに後者の方法
により半導体捕獲中心の測定を行ない得るように
するために、いわゆる計算機処理のもとに、照射
パルス光強度や印加パルス電圧値を広い範囲に亘
つて多段に変化させるとともに、過渡応答信号の
サンプリング時点を繰上げて多点サンプリングを
行なうことにより、所要の観測条件を洩れなく設
定して半導体捕獲中心の完壁な測定を期するよう
にした測定方法も、従来、知られているが、かか
る従来方法においては、捕獲中心パラメータの決
定には不要の大量のデータを測定して一旦記憶し
た後に膨大な量の演算処理を行なう必要があるの
で、測定および演算処理に多くの時間を要すると
ともに、測定データを一旦記憶するためめに膨大
な記憶容量の記憶装置を必要とする、という大き
い無駄が生ずる欠点があつた。 On the other hand, in order to be able to measure the semiconductor capture center using the latter method without requiring such a high degree of skill, the intensity of the irradiated pulsed light and the value of the applied pulse voltage are varied over a wide range based on so-called computer processing. By changing the temperature in multiple stages and performing multi-point sampling by moving the sampling point of the transient response signal forward, this measurement aims to set all the necessary observation conditions and ensure complete measurement centered on semiconductor capture. Methods are also conventionally known, but in such conventional methods, it is necessary to measure and once store a large amount of data that is unnecessary for determining the capture center parameter, and then perform a huge amount of arithmetic processing. This method has disadvantages in that it requires a lot of time for measurement and calculation processing, and also requires a storage device with a huge storage capacity to temporarily store the measurement data, resulting in a large amount of waste.
発明の要点
本発明の目的は、上述した従来の欠点を除去
し、高度の熟練を要することなく、データの測定
および処理に多大の時間を要することなく、さら
に、大容量の記憶装置を用いる要なく、迅速かつ
的確に捕獲中心パラメータを決定して効率よく半
導体材料のキヤリヤ捕獲中心を測定し得るように
した半導体捕獲中心測定方法、特に、自適適応式
の半導体捕獲中心測定方法を提供することにあ
る。SUMMARY OF THE INVENTION It is an object of the present invention to eliminate the above-mentioned drawbacks of the prior art, without requiring a high level of skill, without requiring a large amount of time for data measurement and processing, and without requiring the use of large-capacity storage devices. To provide a semiconductor trap center measuring method that can quickly and accurately determine the trap center parameters and efficiently measure the carrier trap center of a semiconductor material, and in particular, to provide a self-adaptive semiconductor trap center measuring method. be.
すなわち、本発明適応式半導体捕獲中心測定方
法は、半導体ダイオードの電流過渡応答特性およ
び静電容量過渡応答特性の少なくとも一方の観測
に基づいて前記半導体ダイオードを構成する半導
体材料のキヤリヤ捕獲中心を測定するにあたり、
前記観測を行なう観測条件のうち設定に時間を要
する温度掃引にほぼ遅れない速さで前記観測によ
るデータを処理した結果に適応させて、前記観測
条件とする温度掃引の速度、前記半導体ダイオー
ドに対する印加電圧の値および照射光パルスの強
度並びに過渡応答信号サンプリングの時点のうち
少なくとも一つの観測条件を前記観測によるデー
タにたたみ込み積分を施した結果が極値となるよ
うに変化させることを特徴とするものである。 That is, the adaptive semiconductor capture center measuring method of the present invention measures the carrier capture center of the semiconductor material constituting the semiconductor diode based on observation of at least one of the current transient response characteristics and capacitance transient response characteristics of the semiconductor diode. Hits the,
Among the observation conditions for performing the observation, the speed of the temperature sweep as the observation condition and the voltage applied to the semiconductor diode are adjusted based on the results of processing the data from the observation at a speed that is almost as fast as the temperature sweep that takes time to set. The method is characterized in that at least one observation condition among the voltage value, the intensity of the irradiated light pulse, and the time point of sampling the transient response signal is changed so that the result of applying convolution and integration to the data obtained from the observation becomes an extreme value. It is something.
実施例
以下に図面を参照して実施例につき本発明を詳
細に説明する。EXAMPLES The present invention will be explained in detail below using examples with reference to the drawings.
まず、本発明方法により電圧印加・静電容量過
渡応答測定型に構成した半導体捕獲中心測定装置
の構成例を第1図に示す。図示の構成による半導
体捕獲中心測定装置は、クライオスタツト11内
に設置した半導体ダイオード試料12に関する測
定データを、主制御部1、前置制御部4およびア
ナログ信号計測制御部6により制御するとともに
演算処理するようにしたものである。すなわち、
図示の構成におけるアナログ信号計測制御部6
は、前置制御部4からの制御信号に従い、内部の
アナログ・デイジタル変換器7を動作させて、ク
ライオスタツト11内に固定して設置した半導体
ダイオード試料12に印加すべき電圧パルス信号
を発生させるとともに、クライオスタツト11内
の測定環境温度を制御するためのヒータ13に供
給する温度制御信号を発生させる。また、同じく
前置制御部4からの制御信号に従い、アナログ・
デイジタル変換器8を動作させて、半導体ダイオ
ード試料12からの静電容量過渡応答信号を、周
知の静電容量測定器10を介してサンプリングす
るとともに、クライオスタツト11内の測定環境
温度を、感温部をクライオスタツト11内に導入
した周知の熱電対温度計9を介して測定する。さ
らに、印加パルス電圧値、温度制御用信号強度お
よび過渡応答サンプリング終了時点も前置制御部
4からの制御信号によつて決定され、静電容量測
定データおよび温度測定データを前置制御部4に
供給する。 First, FIG. 1 shows an example of the configuration of a semiconductor trap center measuring device constructed as a voltage application/capacitance transient response measurement type according to the method of the present invention. The semiconductor capture center measuring device with the illustrated configuration controls measurement data regarding a semiconductor diode sample 12 installed in a cryostat 11 by a main control section 1, a precontrol section 4, and an analog signal measurement control section 6, and also performs arithmetic processing. It was designed to do so. That is,
Analog signal measurement control section 6 in the illustrated configuration
operates the internal analog-to-digital converter 7 in accordance with the control signal from the precontrol unit 4 to generate a voltage pulse signal to be applied to the semiconductor diode sample 12 fixedly installed in the cryostat 11. At the same time, a temperature control signal is generated to be supplied to the heater 13 for controlling the measured environmental temperature inside the cryostat 11. Also, according to the control signal from the front control section 4, the analog
The digital converter 8 is operated to sample the capacitance transient response signal from the semiconductor diode sample 12 via the well-known capacitance measuring device 10, and the measurement environment temperature inside the cryostat 11 is measured using a temperature sensor. The temperature is measured via a well-known thermocouple thermometer 9 introduced into the cryostat 11. Furthermore, the applied pulse voltage value, the temperature control signal strength, and the end point of transient response sampling are also determined by the control signal from the precontrol unit 4, and the capacitance measurement data and temperature measurement data are sent to the precontrol unit 4. supply
一方、図示の構成における前置制御部4は、主
制御部1からの制御信号に従い、アナログ信号計
測制御部6に対して、指示された電圧値に対応し
た印加パルス電圧発生用制御信号および指示され
た温度制御ヒータ電流に対応した温度制御信号を
順次に送出する。また、アナログ信号計測制御部
6から供給されて来る静電容量測定データおよび
温度測定データを、各指定電圧値および各サンプ
リング時点毎に加算平均したうえで、内部の記憶
装置5に一時記憶する。なお、印加電圧の繰返し
発生回数およびサンプリングデータの加算平均回
数は主制御部1からの制御信号によつて与えら
れ、指定された繰返し測定の終了時点において、
静電容量測定データおよび温度測定データの各加
算平均結果を主制御部1に対して送出する。 On the other hand, in accordance with the control signal from the main control section 1, the precontrol section 4 in the illustrated configuration sends a control signal and instructions for generating an applied pulse voltage corresponding to the instructed voltage value to the analog signal measurement control section 6. Temperature control signals corresponding to the temperature control heater currents are sequentially sent out. Furthermore, the capacitance measurement data and temperature measurement data supplied from the analog signal measurement control section 6 are averaged for each specified voltage value and each sampling time, and then temporarily stored in the internal storage device 5. Note that the number of times the applied voltage is repeated and the number of times the sampled data is averaged is given by a control signal from the main controller 1, and at the end of the specified repeated measurement,
The average results of the capacitance measurement data and temperature measurement data are sent to the main control unit 1.
これに対し、図示の構成における主制御部1
は、半導体ダイオード試料12に対する印加電圧
系列、温度制御ヒータ電流、過渡応答信号サンプ
リング終了時点、並びに、印加電圧の繰返し発生
回数およびサンプリングデータの加算平均回数を
指示する制御信号を前置制御部4に対して送出
し、各印加パルスおよび各サンプリング時点毎に
加算平均した静電容量測定データおよび温度測定
データを前置制御部4から受取る。それら受取つ
た各データは、主制御部1内の記憶装置3に格納
し、次に前置制御部4に対する測定制御信号を発
生させるために、内部の処理・判定機構2によ
り、データ測定のための観測諸条件設定の速度、
特に設定に最も時間を要する測定環境温度掃引の
速度に遅れない速度で処理する、いわゆる実時間
処理を施す。その実時間データ処理・判定機構2
は、アナログ信号計測制御部6および前置制御部
4を順次に介して送られて来る測定データに基づ
き、さらに多種類の測定条件を設定してさらに精
密な測定を行なう必要があるか否かを判定し、必
要と判定した場合には、測定環境温度の掃引速度
を低下させ、印加パルス電圧の種類を増加させ、
さらに、過渡応答信号サンプリングの終了時点を
繰下げて測定条件を微細に変化させるように制御
する。これとは反対に、精密な測定を行なう必要
がないと判定した場合には、測定環境温度の掃引
速度を上昇させ、印加パルス電圧の種類を1種類
のみに削減し、さらに、過渡応答信号サンプリン
グの終了時点を繰上げて測定条件を大まかに変化
させるように制御する。したがつて、測定環境温
度を一回掃引するだけで、必要な観測条件をすべ
て設定した状態で所望のデータ測定を完結するこ
とができる。 In contrast, the main control unit 1 in the illustrated configuration
sends control signals to the precontrol unit 4 instructing the applied voltage series to the semiconductor diode sample 12, the temperature control heater current, the end point of transient response signal sampling, the number of times the applied voltage is repeated, and the number of times the sampling data is averaged. From the precontrol unit 4, capacitance measurement data and temperature measurement data are transmitted and averaged for each applied pulse and each sampling time point. Each of the received data is stored in the storage device 3 in the main control unit 1, and then processed by the internal processing/judgment mechanism 2 for data measurement in order to generate a measurement control signal for the front control unit 4. speed of setting observation conditions,
In particular, so-called real-time processing is performed at a speed that does not lag behind the speed of the measurement environment temperature sweep, which requires the most time to set. Its real-time data processing/judgment mechanism 2
The question is whether it is necessary to set more types of measurement conditions and perform more precise measurements based on the measurement data sent sequentially through the analog signal measurement control section 6 and pre-control section 4. If it is determined that it is necessary, reduce the sweep speed of the measured environmental temperature, increase the type of applied pulse voltage,
Furthermore, control is performed so that the end point of transient response signal sampling is postponed to minutely change the measurement conditions. On the other hand, if it is determined that there is no need to perform precise measurements, the sweep speed of the measurement environment temperature is increased, the types of applied pulse voltages are reduced to only one type, and the transient response signal sampling is performed. The measurement conditions are controlled to be roughly changed by moving the end point of the measurement forward. Therefore, by simply sweeping the measurement environment temperature once, desired data measurement can be completed with all necessary observation conditions set.
しかして、実時間データ処理・判定機構2にお
ける上述した精密測定要否の判定は、測定データ
に対してたたみ込み積分を施した結果が極値、す
なわち、極大値もしくは極小値を呈する領域内に
あるか否かを判定基準として行なうのが好適であ
る。そのたたみ込み積分における重み係数Aiは、
典型的過渡応答信号振幅について、例えば、測定
環境温度に対するデータ系列Siおよび測定環境温
度Tを用いたつぎの各式に従い、主制御部1内に
て行なう演算処理の結果として自動的に発生す
る。+N
〓i=-N
Ai(bi+c)=0 (b,c:任意の数)+N
〓i=-N
Aid/dTSi=0+N
〓i=-N
Ai 2→最小+N
〓i=-N
Ai・Si=1
上述の各式により与えられる重み係数Aiを用い
てたたみ込み積分を測定データに施した結果が極
値となる温度の近傍の環境温度にて、半導体材料
のキヤリヤ捕獲中心に関する有用なデータを測定
し得ることが、例えば本発明者らの執筆に係る研
究資料によつて知られている。 Therefore, the above-mentioned determination of whether precision measurement is necessary or not in the real-time data processing/judgment mechanism 2 is based on the fact that the result of applying convolution to the measurement data is an extreme value, that is, within a region where the maximum value or the minimum value is present. It is preferable to use the presence or absence as a criterion for determination. The weighting coefficient A i in the convolution integral is
The typical transient response signal amplitude is automatically generated as a result of arithmetic processing performed within the main control unit 1, for example, according to the following formulas using the data series S i for the measured environmental temperature and the measured environmental temperature T. . +N 〓 i=-N A i (b i +c)=0 (b, c: arbitrary numbers) +N 〓 i=-N A i d/dTS i =0 +N 〓 i=-N A i 2 →Minimum +N 〓 i=-N A i・S i = 1 Environment near the temperature where the result of applying convolution to the measured data using the weighting coefficient A i given by each formula above is an extreme value It is known, for example from research documents written by the inventors, that useful data regarding carrier capture centers in semiconductor materials can be determined at temperature.
本発明方法により上述したように構成した半導
体捕獲中心測定装置においては、半導体ダイオー
ド試料を設置した測定環境温度を、ある温度設定
値から他の温度測定値まで掃引しながら、印加パ
ルス電圧値に対する静電容量の過渡応答を測定す
る際に、キヤリヤ捕獲中心に関する測定データと
して、捕獲中心密度分布、捕獲断面積および捕獲
エネルギー準位についての有用なデータを測定し
得る可能性のある限られた範囲の測定環境温度に
おいてのみ、温度掃引の速度を低下させ、印加パ
ルス電圧の種類を増加させ、さらに、過渡応答信
号サンプリングの終了時点を繰下げて測定条件を
微細に変化させ、高感度の精密測定を効率よく行
なうことができる。 In the semiconductor capture center measurement device configured as described above according to the method of the present invention, the temperature of the measurement environment in which the semiconductor diode sample is installed is swept from a certain temperature setting value to another temperature measurement value, and the static When measuring the capacitance transient response, a limited range of potentially useful data on the capture center density distribution, capture cross section, and capture energy level can be measured as measured data on the carrier capture center. Only at the measurement environment temperature, the temperature sweep speed is reduced, the types of applied pulse voltages are increased, and the end point of transient response signal sampling is postponed to minutely change the measurement conditions, making highly sensitive and precise measurements more efficient. can do well.
その結果として、本発明測定方法によれば、測
定データの演算処理に要するメモリの容量を大幅
に削減することができる。すなわち、従来の測定
方法においては、例えば、30種類の印加パルス電
圧値および20点のデータサンプリング時点につい
て、80〓から380〓までの温度範囲における1〓
の温度間隔にて得た測定データを記憶するのに、
30×20×(380−80)/1=180K語
だけのメモリ容量を必要とした。これに対して、
本発明測定方法においては、通常は、1種類の印
加パルス電圧値および2点のデータサンプリング
時点についてのみ上述したと同様の温度掃引を行
なつて得た測定データにたたみ込み積分を施した
結果、有用な測定データが得られると判定した温
度の近傍の温度領域についてのみ、データサンプ
リング時点を20点に増加させ、印加パルス電圧値
は1種類のままとして、温度掃引を行ない、さら
にその温度領域内の1種類の温度のみに絞つて印
加パルス電圧値を30種類に増加させ、なお、デー
タサンプリング時点は2点のみとする。その結
果、測定によつて検出し得る半導体のキヤリヤ捕
獲中心の種類をN種類とし、データサンプリング
時点を20点として温度掃引を行なう温度範囲を±
20〓とすると、1×2×(380−80)+N×(1×20
×40+30×2×1)語だけのメモリ容量にて測定
データの演算処理を行ない得ることになる。しか
して、半導体捕獲中心の種類の数Nは通常1〜5
程度であり、したがつて、本発明測定方法におい
て測定データの演算処理に要するメモリ容量は、
わずかに1460〜4900語となり、従来に比して大幅
に減少する。 As a result, according to the measurement method of the present invention, the memory capacity required for arithmetic processing of measurement data can be significantly reduced. That is, in the conventional measurement method, for example, 1〓 in the temperature range from 80〓 to 380〓 for 30 kinds of applied pulse voltage values and 20 data sampling points.
A memory capacity of 30 x 20 x (380 - 80)/1 = 180K words was required to store the measurement data obtained at temperature intervals of . On the contrary,
In the measurement method of the present invention, usually, as a result of performing convolution integration on measurement data obtained by performing the same temperature sweep as described above only for one type of applied pulse voltage value and two data sampling points, Only in the temperature range near the temperature where useful measurement data can be obtained, the number of data sampling points is increased to 20 points, the applied pulse voltage value remains at one type, and temperature sweep is performed. The applied pulse voltage value is increased to 30 types by focusing on only one type of temperature, and the data sampling time point is only 2 points. As a result, the number of types of semiconductor carrier capture centers that can be detected by measurement is N types, and the temperature range in which the temperature sweep is performed is ±
20〓, then 1×2×(380-80)+N×(1×20
This means that the measurement data can be processed with a memory capacity of only 40+30×2×1) words. Therefore, the number N of semiconductor trapping-centered types is usually 1 to 5.
Therefore, the memory capacity required for arithmetic processing of measurement data in the measurement method of the present invention is
It will only be 1,460 to 4,900 words, which is a significant decrease compared to the previous version.
一方、本発明方法による半導体捕獲中心の高感
度測定における信号対ノイズ比の改善効果につい
ては、上述のように測定データの演算処理に必要
とするメモリ容量が大幅に減少するということ
は、同一測定時間内にて、一つの印加パルス電圧
値、一つのサンプリング時点および一つの温度に
関して、これだけ多数回の測定データを収集し得
ることを意味している。すなわち、必ずしも各測
定点について一様に測定データ収集の回数を増加
させるだけには留まらないが、かかる測定データ
収集回数の増加により、概略、√1801460〜
√1804900すなわち11〜6倍程度に測定値の
信号対ノイズ比が改善されることになる。 On the other hand, regarding the effect of improving the signal-to-noise ratio in high-sensitivity measurements centered on semiconductor capture using the method of the present invention, as mentioned above, the memory capacity required for arithmetic processing of measurement data is significantly reduced. This means that measurement data can be collected a large number of times for one applied pulse voltage value, one sampling time point, and one temperature within a period of time. In other words, although it is not necessarily limited to uniformly increasing the number of measurement data collections for each measurement point, by increasing the number of measurement data collections, approximately √1801460 ~
The signal-to-noise ratio of the measured value is improved by √1804900, that is, about 11 to 6 times.
なお、以上の説明においては、電圧印加・静電
容量過渡応答測定型にした構成例について述べた
が、第1図示の構成例における静電容量測定器1
0を周知慣用の電流計に置換したうえで、電圧パ
ルスにより駆動する光変調器を介し、光パルスに
よつて半導体ダイオード試料12を照射するよう
に変更を施せば、第1図示の構成による測定装置
を光照射・電流過渡応答測定型に構成することも
できる。 In the above explanation, an example of the configuration of voltage application/capacitance transient response measurement type was described, but the capacitance measuring device 1 in the configuration example shown in the first figure
If 0 is replaced with a well-known and commonly used ammeter and the semiconductor diode sample 12 is modified to be irradiated with a light pulse through an optical modulator driven by a voltage pulse, measurements can be made using the configuration shown in Figure 1. The device can also be configured to perform light irradiation and current transient response measurement.
効 果
以上の説明から明らかなように、本発明によれ
ば、半導体ダイオードの電流過渡応答特性および
静電容量過渡応答特性を観測することによつて半
導体のキヤリヤ捕獲中心を測定するに当り、進行
中の測定データに対してたたみ込み積分を施す実
時間データ処理の過程を付加し、そのデータ処理
の結果に適応させて照射光パルスあるいは印加電
圧パルスの強度、過渡応答信号サンプリングの周
期および測定環境温度の掃引速度を有効適切に変
化させることにより、1回の測定環境温度掃引で
所要の測定を完結し得るおよび測定感度の向上を
達成し、極めて効率よく的確な測定を行ない得
る、という顕著な効果が得られる。Effects As is clear from the above explanation, according to the present invention, when measuring the carrier capture center of a semiconductor by observing the current transient response characteristics and capacitance transient response characteristics of the semiconductor diode, A real-time data processing process is added to perform convolution and integration on the measured data, and the intensity of the irradiated light pulse or applied voltage pulse, the period of transient response signal sampling, and the measurement environment are adjusted based on the results of the data processing. By effectively and appropriately changing the temperature sweep speed, it is possible to complete the required measurement with a single measurement environment temperature sweep, and the measurement sensitivity can be improved, making it possible to perform extremely efficient and accurate measurements. Effects can be obtained.
第1図は本発明方法を実施する自動適応式半導
体捕獲中心測定装置の構成例を示すブロツク線図
である。
1……主制御部、2……実時間データ処理・判
定機構、3……測定データ記憶装置、4……前置
制御部、5……加算平均用記憶装置、6……アナ
ログ信号計測制御部、7……デイジタル・アナロ
グ変換器、8……アナログ・デイジタル変換器、
9……熱電対温度計、10……静電容量測定器、
11……クライオスタツト、12……半導体ダイ
オード試料、13……ヒータ。
FIG. 1 is a block diagram showing an example of the configuration of an automatically adaptive semiconductor capture center measuring apparatus for implementing the method of the present invention. DESCRIPTION OF SYMBOLS 1... Main control unit, 2... Real-time data processing/judgment mechanism, 3... Measured data storage device, 4... Pre-control unit, 5... Storage device for averaging, 6... Analog signal measurement control Section 7... Digital-to-analog converter, 8... Analog-to-digital converter,
9...Thermocouple thermometer, 10...Capacitance measuring device,
11... Cryostat, 12... Semiconductor diode sample, 13... Heater.
Claims (1)
静電容量過渡応答特性の少なくとも一方の観測に
基づいて前記半導体ダイオードを構成する半導体
材料のキヤリヤ捕獲中心を測定するにあたり、前
記観測を行なう観測条件のうち設定に時間を要す
る温度掃引にほぼ遅れない速さで前記観測による
データを処理した結果に適応させて、前記観測条
件とする温度掃引の速度、前記半導体ダイオード
に対する印加電圧の値および照射光パルスの強度
並びに過渡応答信号サンプリングの時点のうち少
なくとも一つの観測条件を前記観測によるデータ
にたたみ込み積分を施した結果が極値となるよう
に変化させることを特徴とする適応式半導体捕獲
中心測定方法。1. When measuring the carrier capture center of the semiconductor material constituting the semiconductor diode based on the observation of at least one of the current transient response characteristics and the capacitance transient response characteristics of the semiconductor diode, the observation conditions for the above observation are set. The speed of the temperature sweep, the value of the voltage applied to the semiconductor diode, the intensity of the irradiated light pulse, and 1. An adaptive semiconductor capture center measuring method, characterized in that at least one observation condition among transient response signal sampling points is changed so that the result of convolving and integrating the observation data becomes an extreme value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58143116A JPS6034028A (en) | 1983-08-06 | 1983-08-06 | Adaptive measurement of semiconductor trapping center |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58143116A JPS6034028A (en) | 1983-08-06 | 1983-08-06 | Adaptive measurement of semiconductor trapping center |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6034028A JPS6034028A (en) | 1985-02-21 |
| JPH0248141B2 true JPH0248141B2 (en) | 1990-10-24 |
Family
ID=15331285
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58143116A Granted JPS6034028A (en) | 1983-08-06 | 1983-08-06 | Adaptive measurement of semiconductor trapping center |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6034028A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0693476B2 (en) * | 1986-11-11 | 1994-11-16 | 財団法人半導体研究振興会 | Crystal defect evaluation apparatus and evaluation method by constant volume method |
| JPS63140544A (en) * | 1986-12-01 | 1988-06-13 | Semiconductor Res Found | Photocapacitance measuring equipment by constant capacity method and measuring method |
| JPS63313831A (en) * | 1986-12-26 | 1988-12-21 | Jiesu:Kk | Automatic ally measuring device for photocapacitance |
| JPS6423545A (en) * | 1987-07-17 | 1989-01-26 | Semiconductor Res Found | Device for measuring light irradiation |
| JPH01166533A (en) * | 1987-12-22 | 1989-06-30 | Semiconductor Res Found | Device for measurement of photocapacitance |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756939A (en) * | 1980-09-22 | 1982-04-05 | Toshiba Corp | Measuring device for boundary level of semiconductor |
| JPS5948542B2 (en) * | 1980-11-14 | 1984-11-27 | 工業技術院長 | Method for measuring deep impurity levels in semiconductors |
-
1983
- 1983-08-06 JP JP58143116A patent/JPS6034028A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6034028A (en) | 1985-02-21 |
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