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JPH025818B2 - - Google Patents
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JPH025818B2 - - Google Patents

Info

Publication number
JPH025818B2
JPH025818B2 JP5404781A JP5404781A JPH025818B2 JP H025818 B2 JPH025818 B2 JP H025818B2 JP 5404781 A JP5404781 A JP 5404781A JP 5404781 A JP5404781 A JP 5404781A JP H025818 B2 JPH025818 B2 JP H025818B2
Authority
JP
Japan
Prior art keywords
crystal
shielding plate
sample
evaporation
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5404781A
Other languages
Japanese (ja)
Other versions
JPS57169084A (en
Inventor
Toshiki Suganuma
Toshio Hayashi
Yasuo Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP5404781A priority Critical patent/JPS57169084A/en
Publication of JPS57169084A publication Critical patent/JPS57169084A/en
Publication of JPH025818B2 publication Critical patent/JPH025818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

【発明の詳細な説明】 本発明は水晶振動子の真空蒸着装置、特に、複
数個の水晶片に同時に励振電極を設け、次いで、
1つ1つの水晶片に順次周波数調整を可能とした
真空蒸着装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum evaporation apparatus for a crystal resonator, in particular, to provide excitation electrodes on a plurality of crystal pieces at the same time, and then
The present invention relates to a vacuum evaporation device that allows frequency adjustment to be performed sequentially on each crystal piece.

一般に水晶振動子1は第1図に示すように所定
の角度に切り出した水晶片2の両面にクロム、
金、銀、アルミニユーム等の金属物質を真空蒸着
により2層、3層等の複数層に蒸着して、励振電
極3,3(一方は図示せず)および端子4,4を
形成し、この水晶片2を基台5に植設した導出端
子6,6と接続された保持部材7,7に挾持させ
た後、保持部材7,7と端子4,4とを導電性の
接着剤により接着し、水晶片2の振動エネルギー
を端子4,4、保持部材7,7、導出端子6,6
を介して外部へ取出すものである。
Generally, a crystal resonator 1 has a crystal piece 2 cut out at a predetermined angle, and chromium is coated on both sides of the crystal piece 2, as shown in FIG.
Excitation electrodes 3, 3 (one not shown) and terminals 4, 4 are formed by vacuum-depositing a metal material such as gold, silver, or aluminum into multiple layers such as two or three layers. After the piece 2 is held between the holding members 7, 7 connected to the lead-out terminals 6, 6 planted on the base 5, the holding members 7, 7 and the terminals 4, 4 are bonded with a conductive adhesive. , the vibration energy of the crystal piece 2 is transferred to the terminals 4, 4, the holding members 7, 7, and the lead-out terminals 6, 6.
It is taken out to the outside through.

ところで、前記した水晶振動子1の振動周波数
は水晶片2の厚み、大きさあるいは励振電極3,
3、端子4,4の質、量により決定するものであ
るが、水晶片2の厚みを正確に切り出すことが困
難なことから単に所定形状の水晶片2に、所定の
物質(クロム、金、銀、アルミニユーム)を所定
量、真空蒸着装置内で蒸着しただけでは予め定め
られた正確な周波数f0にて振動する水晶振動子を
得ることは困難なことであり、そのため、従来の
水晶振動子1は、一旦水晶片2に真空蒸着装置内
で励振電極3,3を2層ないし3層等に蒸着した
後、真空蒸着装置より取出し、前記したように保
持部材7,7に挾持させ、該水晶振動子1を第2
図あるいは第3図に示すように保管の都合上トレ
ー8,8′にその複数個(10〜15個)を収納し、
その後、以下に説明する方法により、水晶片2の
励振電極3,3上に更に微少量の物質を数回に分
けて蒸着し続け、蒸着により変化していく周波数
f1があらかじめ定められた周波数f0と等しくなる
点を求め、その蒸着を停止し、基準周波数f0を備
えた水晶振動子1を得るものである。
By the way, the vibration frequency of the crystal resonator 1 described above depends on the thickness and size of the crystal piece 2 or the excitation electrode 3,
3. This is determined by the quality and quantity of the terminals 4, 4, but since it is difficult to accurately cut out the thickness of the crystal piece 2, the crystal piece 2 of a predetermined shape is simply coated with a predetermined material (chromium, gold, gold, etc.). It is difficult to obtain a crystal resonator that vibrates at a predetermined accurate frequency f 0 by simply depositing a predetermined amount of silver (silver, aluminum) in a vacuum evaporation device. 1, once the excitation electrodes 3, 3 are deposited in two or three layers on the crystal piece 2 in a vacuum evaporation apparatus, and then taken out from the vacuum evaporation apparatus, held between the holding members 7, 7 as described above, and crystal oscillator 1
As shown in the figure or FIG.
After that, by the method described below, a minute amount of material is continued to be deposited on the excitation electrodes 3, 3 of the crystal piece 2 in several steps, and the frequency changes as a result of the deposition.
A point where f 1 becomes equal to a predetermined frequency f 0 is determined, and the vapor deposition is stopped to obtain a crystal resonator 1 having a reference frequency f 0 .

なお、第3図示では水晶振動子1が個々の収納
台9を介してトレー8′に収納されている。
In addition, in the third illustration, the crystal resonators 1 are stored in a tray 8' via individual storage stands 9.

そして、周波数を調整する場合、トレー8,
8′上の水晶振動子1を1つづつ周波数を調整す
るための真空蒸着室(図示せず)内のターンテー
ブル10,10′に設けた端子挿入部11,11
あるいは収納台9の収納孔11′に入れ替え、そ
の後、ターンテーブル10,10′を間欠的に回
転し、蒸発源12,12′よりクロム、金、銀、
アルミニユーム等の物質を微少量、対向する水晶
振動子1の励振電極3上に蒸着し、その水晶振動
子1の周波数f1が基準周波数f0になるまで、数回
に分けて蒸着を行うものである。数回に分けて蒸
着を行うのは1度に蒸着を行うと、その途中で基
準周波数f0を越えてしまうのを防止するためで、
一般には2回目の蒸着は前記第1回目よりさらに
微少量で、また、3回目はさらに微少量の蒸着を
行うもので、この3回目の蒸着中に基準周波数f0
に到達するものが多いものである。
When adjusting the frequency, tray 8,
Terminal insertion parts 11, 11 provided on turntables 10, 10' in a vacuum deposition chamber (not shown) for adjusting the frequency of the crystal oscillators 1 on 8' one by one.
Alternatively, it is replaced with the storage hole 11' of the storage stand 9, and then the turntables 10, 10' are rotated intermittently to remove chromium, gold, silver, etc. from the evaporation sources 12, 12'.
A method in which a minute amount of a substance such as aluminum is deposited on the excitation electrode 3 of the opposing crystal oscillator 1, and the deposition is performed in several steps until the frequency f 1 of the crystal oscillator 1 becomes the reference frequency f 0 . It is. The reason why the evaporation is performed in several steps is to prevent the reference frequency f 0 from being exceeded in the middle of the evaporation if the evaporation is performed at once.
Generally, the second evaporation is performed in an even smaller amount than the first, and the third evaporation is performed in an even smaller amount, and during this third evaporation, the reference frequency f 0
Many of them reach this point.

また、基準周波数f0に到達したか否かは調整し
ようとする水晶振動子1の導出端子6,6を発振
回路(図示せず)に接続して発振させ、該発振回
路からの信号と別に基準周波数f0を発振する発振
器からの信号とのゼロビートを検出させればよい
ものである。
In addition, whether or not the reference frequency f 0 has been reached can be determined by connecting the lead-out terminals 6, 6 of the crystal resonator 1 to be adjusted to an oscillation circuit (not shown) and oscillating it, separately from the signal from the oscillation circuit. It is sufficient to detect the zero beat with respect to the signal from the oscillator that oscillates the reference frequency f 0 .

そして、調整後、真空蒸着室の真空状態を解除
し、水晶振動子1を再びトレー8,8′に収納し、
再び、他のトレー8,8′から他の水晶動子1を
取出し、同様の作業を行うものである。
After the adjustment, the vacuum state in the vacuum deposition chamber is released, and the crystal resonator 1 is stored in the trays 8 and 8' again.
Again, other crystal units 1 are taken out from other trays 8, 8' and the same operation is performed.

ところで、前記した従来の水晶振動子は、真空
蒸着室内に先ず、水晶片2に励振電極3,3を蒸
着するため収納および取出し、また、周波数調整
のため再び真空蒸着室(同一もしくは他の真空蒸
着室)内に収納し、取出す必要があるため、その
工程が複雑で、また、トレー8,8′に収納され
た水晶振動子を1つづつ取出し、真空蒸着室内の
ターンテーブル10,10′に蒸着し、調整後、
再びトレー8,8′に収納するものであるため、
作業能率が悪く、水晶振動子1の出入が多く、そ
の途中で水晶片2が破損してしまう等の欠点があ
つた。
By the way, the above-mentioned conventional crystal resonator is first stored and taken out in a vacuum deposition chamber in order to deposit the excitation electrodes 3, 3 on the crystal piece 2, and then returned to the vacuum deposition chamber (in the same or another vacuum chamber) for frequency adjustment. The process is complicated because the crystal resonators stored in the trays 8, 8' must be taken out one by one, and the turntables 10, 10' inside the vacuum deposition chamber must be taken out one by one. After adjustment,
Since it is to be stored in trays 8 and 8' again,
There were disadvantages such as poor working efficiency, the crystal resonator 1 being moved in and out a lot, and the crystal piece 2 being damaged during the movement.

本発明は、上記の欠点を解消するためになされ
たもので、複数の水晶片に複数の金属物質を順次
に真空蒸着する際の作業能率の向上および水晶片
の破損を防止できる水晶振動子の真空蒸着装置を
提供することを目的としている。
The present invention has been made in order to eliminate the above-mentioned drawbacks, and provides a crystal resonator that can improve work efficiency and prevent damage to crystal pieces when a plurality of metal substances are sequentially vacuum-deposited onto a plurality of crystal pieces. The purpose is to provide a vacuum evaporation device.

以下、本発明の1実施例を図面に基づいて詳細
に説明する。第7図は水晶片2を基台5に取付け
た状態を示す正面図である。図から明らかなよう
に、この状態では水晶片2の両面には励振電極
3,3および端子4,4は設けてなく、単に保持
部材7,7に仮止めされた状態である。同図にお
いて20はマスクで、該マスクは基台5に嵌合さ
れており、また、その正面および裏面には蒸着を
許容するための孔21,21が設けてある。な
お、6,6は導出端子である。なお、この状態を
試料と称す。第8図は真空蒸着室22の部分断側
面図である。23は真空蒸着室22の定盤で、該
定盤23上には複数本の支持柱24……が設けて
ある。支持柱24……には後述する上板および下
板の位置決め用の段部24a…,24b…が設け
てある。26は上板で、前記支持柱24……の段
部24b……に位置し、ナツト25……により支
持柱24に取付けられている。27は上板26の
中心下部に保持されたモータ、28はモータ27
の回転軸、29は回転軸28に取付けられた伝達
軸で、該伝達軸29は太径部29aと細径部29
bとを備え、細径部29bの先端はナツト30と
噛合できるようにネジ部が設けてある。31は前
記伝達軸29の細径部29bに取付けられた第1
の蒸着物遮蔽板で、該蒸着物遮蔽板31は特に第
9図示の平面図から明らかなようにその中心部に
取付孔31aが設けてあり、該取付孔31aから
等距離に且つ、等間隔に蒸着を許容するための孔
32a〜32fが複数個(実施例では6個)が設
けてあり、さらに、孔32aと孔32fとの中間
には周波数調整孔33が設けてある。なお、調整
孔33も取付孔31aから等距離の位置に設けて
ある。34は蒸着物遮蔽板31に設けた係止片で
ある。35は第2の蒸着物遮蔽板で、該蒸着物遮
蔽板35は特に第10図示の平面図から明らかな
ように、伝達軸29の細径部29bに強嵌合によ
り取付けられるべき取付孔35aが設けてあり、
前記第1の蒸着物遮蔽板31に設けた孔32a〜
32fに対応する位置に孔36a〜36fが設け
てあるも、調整孔33と対応する孔は設けてな
い。そして、前記第1の蒸着物遮蔽板31は伝達
軸29に対し回転可能に、また、第2の蒸着物遮
蔽板35は伝達軸29に対し、回転不能に取付け
られるものであるが、その取付けについて、第8
図で説明すると、先ず、細径部29bにコイルバ
ネ37を挿入し、次に、第1の蒸着物遮蔽板31
を挿入する。この時、取付孔31aは細径部29
bより大径としてあるため遊嵌された状態となつ
ている。次に、フエルト等より成る摩擦板38を
挿入し、その後、第2の蒸着物遮蔽板35を細径
部29bに強嵌合し、ナツト30を噛合すれば、
第1の蒸着物遮蔽板31はコイルバネ37の弾力
により摩擦板38を介して適度に第2の蒸着物遮
蔽板35に弾圧されているため、第1の蒸着物遮
蔽板31は一定以上のトルクが加わらない限り空
転することなく伝達軸29の回転に伴なつて回転
することができるものである。39は上板26の
下部に設けた試料(水晶片2等)取付部材で、該
試料取付部材39は特に第11図示の平面図より
明らかなように円筒形を成し、前記第2の蒸着物
遮蔽板35に設けた孔36a〜36fと同等数の
取付部40a〜40fか等間隔に且つ先端部が下
方に傾斜して設けてある。そして、取付部40a
〜40fに前記第7図に示した試料を取付けるも
のである。その詳細を第12図を用いて説明する
と、同図に示すように取付部40aには導出端子
挿入孔41aが設けてあり、該挿入孔41aに試
料の導出端子6,6を挿入すると、導出端子6,
6に取付部40aに設けた孔42aより挿入孔4
1a内に進出する検知片43が導出端子6,6と
接触するものである。44は下板で、該下板44
は支持柱24の段部24a……上に位置決め固定
されている。45は定盤23上に設けたモータ
で、モータ45の回転軸45aは前記下板44の
孔44aより上方へ突出し、その先端には回転式
テーブル46が取付けてある。また、回転式テー
ブル46の回転中心は前記伝達軸29の回転中心
より偏心した位置になるようにしてある。そし
て、回転式テーブル46上には第8図、第13図
に示すように蒸発源となるべき複数個の受皿4
7,48(実施例では2種類)が積置してあり、
回転式テーブル46を回転させ、受皿47あるい
は48を所定位置に定位した時、その定位位置が
第8図に示すように伝達軸29の真下に定位する
ようにしてある。従つて、第8図に1点鎖線に示
したように各試料(水晶片2)に対する入射角α
は伝達軸より等角度、すなわち、蒸着すべき金属
を収納した受皿は各試料に対して等位置に定位す
ることになるものである。受皿47,48はタン
グステン、モリブデン等より成り、一方の受皿4
7は金属物質としてクロム49が、また、他方の
受皿48には金50が収納してある。従つて、本
実施例における水晶片2の表面にはクロム49と
金50の2層蒸着となるようにセツトされてい
る。51は電極で、該電極51は上下動可能に設
けられ、回転式テーブル46が回転し、所定位置
に定位した時、上昇し、所定の受皿を通電させ、
受皿内の金属例えばクロム49を蒸発させるもの
である。52は電極51を上昇あるいは下降する
ためのソレノイドプランジヤーで、該ソレノイド
プランジヤー52に設けたプランジヤー53の往
復運動により電極51を上下動させる。すなわ
ち、プランジヤー53の先端にはカム面53aが
設けてあり、該カム面53aが電極51に設けた
ピン51aを押圧するためである。54は第1の
蒸着物遮蔽板31に設けた係止片34と係合して
第1の蒸着物遮蔽板31をコイルバネ37の弾力
に抗して回転させるための可動部材で、該可動部
材54は下板44の下面に設けたソレノイドプラ
ンジヤー55により可動するものである。なお、
56……は検知片43……と接続したリード線で
ある。57は取外しが可能なカバーである。
Hereinafter, one embodiment of the present invention will be described in detail based on the drawings. FIG. 7 is a front view showing the state in which the crystal piece 2 is attached to the base 5. As shown in FIG. As is clear from the figure, in this state, the excitation electrodes 3, 3 and terminals 4, 4 are not provided on both surfaces of the crystal piece 2, and are merely temporarily fixed to the holding members 7, 7. In the figure, 20 is a mask, which is fitted onto the base 5, and holes 21, 21 are provided on the front and back surfaces of the mask to allow vapor deposition. Note that 6 and 6 are lead-out terminals. Note that this state is referred to as a sample. FIG. 8 is a partially sectional side view of the vacuum deposition chamber 22. 23 is a surface plate of the vacuum deposition chamber 22, and a plurality of support columns 24 are provided on the surface plate 23. The support columns 24... are provided with stepped portions 24a..., 24b... for positioning an upper plate and a lower plate, which will be described later. Reference numeral 26 denotes an upper plate, which is located at the step portion 24b of the support column 24, and is attached to the support column 24 with nuts 25. 27 is a motor held at the lower center of the upper plate 26; 28 is a motor 27;
29 is a transmission shaft attached to the rotation shaft 28, and the transmission shaft 29 has a large diameter part 29a and a small diameter part 29.
b, and a threaded portion is provided at the tip of the narrow diameter portion 29b so as to be able to engage with the nut 30. 31 is a first portion attached to the narrow diameter portion 29b of the transmission shaft 29;
As is particularly clear from the plan view shown in FIG. 9, the deposition shielding plate 31 is provided with a mounting hole 31a in its center, and holes are provided at equal distances and intervals from the mounting hole 31a. A plurality of holes 32a to 32f (six holes in the embodiment) are provided to allow vapor deposition, and a frequency adjustment hole 33 is provided between the holes 32a and 32f. Note that the adjustment hole 33 is also provided at a position equidistant from the attachment hole 31a. 34 is a locking piece provided on the deposit shielding plate 31. Reference numeral 35 designates a second deposit shielding plate, and as is particularly clear from the plan view shown in FIG. is provided,
Holes 32a~ provided in the first vapor deposit shielding plate 31
Although holes 36a to 36f are provided at positions corresponding to hole 32f, no hole corresponding to adjustment hole 33 is provided. The first vapor deposit shielding plate 31 is rotatably mounted to the transmission shaft 29, and the second vapor deposit shielding plate 35 is non-rotatably mounted to the transmission shaft 29. About, No. 8
To explain with a diagram, first, the coil spring 37 is inserted into the narrow diameter portion 29b, and then the first vapor deposit shielding plate 31 is inserted.
Insert. At this time, the mounting hole 31a is attached to the small diameter portion 29.
Since it has a larger diameter than b, it is loosely fitted. Next, a friction plate 38 made of felt or the like is inserted, and then the second deposit shielding plate 35 is tightly fitted into the narrow diameter portion 29b, and the nut 30 is engaged.
Since the first vapor deposit shielding plate 31 is moderately pressed against the second vapor deposit shielding plate 35 via the friction plate 38 due to the elasticity of the coil spring 37, the first vapor deposit shielding plate 31 is applied with a torque exceeding a certain level. It is possible to rotate with the rotation of the transmission shaft 29 without idling as long as the rotation is not applied. Reference numeral 39 denotes a sample (crystal piece 2, etc.) mounting member provided at the lower part of the upper plate 26, and the sample mounting member 39 has a cylindrical shape, as is particularly clear from the plan view shown in Figure 11, and is used for the second vapor deposition. Attachment portions 40a to 40f, the number of which is equal to the number of holes 36a to 36f provided in the object shielding plate 35, are provided at equal intervals and with their tips inclined downward. And the mounting part 40a
The sample shown in FIG. 7 is attached to 40f. The details will be explained using FIG. 12. As shown in the figure, the mounting portion 40a is provided with a lead-out terminal insertion hole 41a, and when the lead-out terminals 6, 6 of the sample are inserted into the insertion hole 41a, the lead-out terminals 6, 6 are inserted into the insertion hole 41a. terminal 6,
6, the insertion hole 4 is inserted through the hole 42a provided in the mounting portion 40a.
The detection piece 43 extending into the inside 1a comes into contact with the lead-out terminals 6, 6. 44 is a lower plate;
is positioned and fixed on the step portion 24a of the support column 24. Reference numeral 45 denotes a motor provided on the surface plate 23. A rotating shaft 45a of the motor 45 projects upward from the hole 44a of the lower plate 44, and a rotary table 46 is attached to the tip thereof. Further, the center of rotation of the rotary table 46 is located eccentrically from the center of rotation of the transmission shaft 29. As shown in FIGS. 8 and 13, a plurality of saucers 4 are placed on the rotary table 46 to serve as evaporation sources.
7, 48 (two types in the example) are stacked,
When the rotary table 46 is rotated and the saucer 47 or 48 is positioned at a predetermined position, the position is positioned directly below the transmission shaft 29 as shown in FIG. Therefore, as shown by the dashed line in FIG. 8, the incident angle α for each sample (crystal piece 2) is
are at equal angles from the transmission axis, that is, the saucers containing the metal to be deposited are positioned at the same position with respect to each sample. The saucers 47 and 48 are made of tungsten, molybdenum, etc.
7 contains chromium 49 as a metal substance, and the other saucer 48 contains gold 50. Therefore, two layers of chromium 49 and gold 50 are deposited on the surface of the crystal piece 2 in this embodiment. Reference numeral 51 denotes an electrode, and the electrode 51 is provided to be movable up and down, and when the rotary table 46 rotates and is positioned at a predetermined position, it rises and energizes a predetermined saucer.
This evaporates metal such as chromium 49 in the saucer. Reference numeral 52 denotes a solenoid plunger for raising or lowering the electrode 51, and the electrode 51 is moved up and down by the reciprocating motion of a plunger 53 provided on the solenoid plunger 52. That is, a cam surface 53a is provided at the tip of the plunger 53, and the cam surface 53a presses a pin 51a provided on the electrode 51. Reference numeral 54 denotes a movable member that engages with the locking piece 34 provided on the first vapor deposit shielding plate 31 to rotate the first vapor deposit shielding plate 31 against the elasticity of the coil spring 37; 54 is movable by a solenoid plunger 55 provided on the lower surface of the lower plate 44. In addition,
56... are lead wires connected to the detection pieces 43.... 57 is a removable cover.

次に、本発明の動作について説明すると、先
ず、カバー57を取外し、試料取付部材39の取
付部40a〜40fに試料を取付けると共に、回
転式テーブル46上の受皿47,48に蒸着用金
属であるクロム49と金50とをそれぞれの受皿
47,48に収納すると共に可動部材54を可動
させて第1の蒸着物遮蔽板31に設けた孔32a
〜32fが第14図に示すように第2の蒸着物遮
蔽板35に設けた孔36a〜36fと対応するよ
うに操作すると共にモータ27を若干回転させ、
各孔32a〜32fが取付部40a〜40fに取
付けられた試料と対応する位置に定位させる。ま
た、回転式テーブル46も回転させてクロム49
を収納した受皿47が伝達軸29の真下に定位す
るようにセツトし、その後、カバー57を被せ
て、真空蒸着室内部を真空状態にする。そして、
ソレノイドプランジヤー52を操作して、電極5
1を上昇させ、受皿47を通電すると、クロム4
9が蒸発し、孔32a〜32f(36a〜36f)
および各試料に設けたマスク20の孔21より各
試料(各水晶片2)が同時に金属蒸着(クロム蒸
着)される。所定量のクロム蒸着が終了すると、
再びソレノイドプランジヤー52を操作して、電
極51を降下させる。そして、モータ45を回転
させ、回転式テーブル46を半回転し、今度は金
50を収納した受皿48が伝達軸29に真下に定
位するようにセツトし、再び、電極51を上昇さ
せて、受皿48を通電すると、受皿48内の金5
0が蒸発し、各試料の前記クロム蒸着上にさらに
金が蒸着する。そして、全蒸着が終了した後、特
に図示してないが取付部40a〜40fを半回転
させるか、一旦、真空状態を解除して、カバー5
7を取外し、試料を半回転して取付け、再びカバ
ー57被せ、真空状態と成し、また、回転式テー
ブル46を再び半回転し、クロム49を収納した
受皿47を再び伝達軸29の真下に定位するよう
にセツトし、前記同様先ずクロム蒸着を、次い
で、回転式テーブル46を半回転して金蒸着を行
うことにより、収納された各試料は同時に励振電
極3,3となるべく基礎蒸着が終了する。蒸着す
べき金属を収納した受皿47,48を常に伝達軸
29の真下に定位するようにセツトしたのは蒸着
源(受皿)と各試料とが等位置になるようにした
もので、これにより複数層に金属を蒸着する際の
蒸着ムラが防止できるものである。
Next, to explain the operation of the present invention, first, the cover 57 is removed, the sample is attached to the attachment parts 40a to 40f of the sample attachment member 39, and the metal for evaporation is placed on the saucers 47 and 48 on the rotary table 46. A hole 32a is formed in the first vapor deposit shielding plate 31 by storing chromium 49 and gold 50 in respective trays 47 and 48 and moving the movable member 54.
32f correspond to the holes 36a to 36f provided in the second vapor deposit shielding plate 35 as shown in FIG. 14, and the motor 27 is slightly rotated.
Each of the holes 32a to 32f is positioned at a position corresponding to the sample attached to the attachment parts 40a to 40f. In addition, the rotary table 46 is also rotated so that the chrome 49
The tray 47 containing the evaporation chamber is set so as to be positioned directly below the transmission shaft 29, and then the cover 57 is placed on the chamber to evacuate the inside of the vacuum evaporation chamber. and,
By operating the solenoid plunger 52, the electrode 5
1 is raised and the saucer 47 is energized, chromium 4
9 evaporates, holes 32a to 32f (36a to 36f)
Each sample (each crystal piece 2) is simultaneously metal-deposited (chromium-deposited) through the hole 21 of the mask 20 provided in each sample. When the specified amount of chromium deposition is completed,
The solenoid plunger 52 is operated again to lower the electrode 51. Then, the motor 45 is rotated, the rotary table 46 is rotated half a turn, this time the saucer 48 containing the gold 50 is set so as to be positioned directly below the transmission shaft 29, the electrode 51 is raised again, and the saucer When 48 is energized, the gold 5 in the saucer 48
0 evaporates and more gold is deposited on top of the chromium deposit on each sample. After all vapor deposition is completed, although not particularly shown in the drawings, the mounting parts 40a to 40f are rotated half a turn, or the vacuum state is once released, and the cover 5 is
7 is removed, the sample is turned half a turn and attached, the cover 57 is covered again to create a vacuum state, the rotary table 46 is turned half a turn again, and the saucer 47 containing the chromium 49 is placed directly under the transmission shaft 29 again. By setting it in a fixed position and performing chromium vapor deposition as described above, then gold vapor deposition by turning the rotary table 46 half a turn, the basic vapor deposition of each housed sample is simultaneously completed to become the excitation electrodes 3, 3. do. The saucers 47 and 48 containing the metal to be evaporated are always positioned directly below the transmission shaft 29 so that the evaporation source (the saucer) and each sample are at the same position. It is possible to prevent uneven deposition when metal is deposited on a layer.

次に、試料(水晶片2)の両面に基礎蒸着後の
周波数調整について説明する。先ず、基礎蒸着が
終了したら、ソレノイドプランジヤー55により
可動部材54を可動させ、第1の蒸着物遮蔽板3
1をコイルバネ37の弾力に抗して若干回転さ
せ、第1の蒸着物遮蔽板31に設けた調整孔33
が第15図に示すように第2の蒸着物遮蔽板35
に設けた孔の1つ例えば36fと対応させる。従
つて、第2の蒸着物遮蔽板35に設けた他の孔3
6a〜36eは第1の蒸着物遮蔽板31により閉
鎖状態となり、また、第1の蒸着物遮蔽板31に
設けた孔32a〜32fは第2の蒸着物遮蔽板3
5により閉鎖状態となる。従つて、両蒸着物遮蔽
板31,35には調整孔33,36fの部分のみ
が開孔した状態となり、この調整孔33を順次1
つ1つの試料に対応させ周波数調整を行うもので
ある。
Next, frequency adjustment after basic vapor deposition on both sides of the sample (crystal blank 2) will be explained. First, when the basic vapor deposition is completed, the movable member 54 is moved by the solenoid plunger 55, and the first vapor deposition shielding plate 3 is moved.
1 is slightly rotated against the elasticity of the coil spring 37, and the adjustment hole 33 provided in the first vapor deposit shielding plate 31 is opened.
As shown in FIG.
This corresponds to one of the holes provided in, for example, 36f. Therefore, the other holes 3 provided in the second vapor deposit shielding plate 35
6a to 36e are closed by the first vapor deposit shielding plate 31, and the holes 32a to 32f provided in the first vapor deposit shielding plate 31 are closed by the second vapor deposit shielding plate 3.
5, it becomes a closed state. Therefore, only the adjustment holes 33 and 36f are opened in both the deposit shielding plates 31 and 35, and the adjustment holes 33 are opened one after another.
The frequency is adjusted according to each sample.

すなわち、調整孔33を先ず取付部40fに取
付けられた試料と対応させ、回転式テーブル46
の金50を収納した受皿を通電させ、金50を微
少量蒸発させると、金は調整孔33、マスク20
の孔21を通過して、前記基礎メツキ(励振電
極)上に蒸着する。この時、水晶片2の励振電極
は保持部材7,7、導出端子6,6より検知片4
3を介してリード線56に導出され、該リード線
56を発振回路(図示せず)に接続して発振さ
せ、該発振回路からの信号と別に基準周波数f0
発振する発振器からの信号とにより、従来例と同
様、数回の微調整を行い、ゼロビートを検出させ
1つの試料の調整を終了させる。1つの試料の調
整が終了したら、モータ27を所定量回転し、2
つの蒸着物遮蔽板31,35を同時に回転させ、
調整孔33が次の試料と対応するようにし、前記
同様の調整を行う。そして、モータ27を略1回
転させることにより全部の試料の周波数調整が終
了する。終了後、真空状態を解除し、カバー57
を取外し、各試料を取外せば、水晶片2には励振
電極3,3と周波数調整が終了したものが誕生す
ることになる。
That is, first, the adjustment hole 33 is made to correspond to the sample attached to the attachment part 40f, and then the rotary table 46
When the saucer containing the gold 50 of
It passes through the hole 21 and is deposited on the base plating (excitation electrode). At this time, the excitation electrode of the crystal piece 2 is connected to the detection piece 4 from the holding members 7, 7 and the lead-out terminals 6, 6.
3 to a lead wire 56, the lead wire 56 is connected to an oscillation circuit (not shown) for oscillation, and a signal from an oscillator that oscillates a reference frequency f 0 separately from the signal from the oscillation circuit. As in the conventional example, fine adjustments are made several times, zero beat is detected, and the adjustment of one sample is completed. After completing the adjustment of one sample, rotate the motor 27 by a predetermined amount, and
Rotating the two vapor deposition shielding plates 31 and 35 at the same time,
The adjustment hole 33 is made to correspond to the next sample, and the same adjustment as described above is performed. Then, by rotating the motor 27 approximately once, frequency adjustment for all samples is completed. After finishing, release the vacuum state and close the cover 57.
When the crystal blank 2 is removed and each sample is removed, a crystal piece 2 with excitation electrodes 3 and frequency adjustment completed will be created.

なお、前記両蒸着物遮蔽板31,35には6つ
の孔32a〜32f,36a〜36fを、また、
試料取付部材39には6つの取付部40a〜40
fを設けたが、必ずしも6つに限定されることな
く、個数については設計上の任意のことである。
In addition, six holes 32a to 32f, 36a to 36f are provided in both the deposit shielding plates 31 and 35, and
The sample mounting member 39 has six mounting parts 40a to 40.
f is provided, but the number is not necessarily limited to six, and the number is arbitrary in terms of design.

また、回転式テーブル46上には2つの受皿4
7,48を積置したが必ずしも2つに限定される
ことなく3、4〜10種類と積置することにより2
〜10層あるいはそれ以上に蒸着することができる
ものである。
In addition, two saucers 4 are placed on the rotary table 46.
7, 48, but it is not necessarily limited to 2, but by stacking 3, 4 to 10 types, 2
~10 layers or more can be deposited.

さらに、調整孔33は第1の蒸着物遮蔽板31
に設けたが、反対に第2の蒸着物遮蔽板35に設
けてもよいものである。
Further, the adjustment hole 33 is connected to the first vapor deposit shielding plate 31.
However, on the contrary, it may be provided on the second vapor deposit shielding plate 35.

以上述べたように本発明によれば、蒸発源と各
水晶片との間を等距離にして、複数種類の金属に
よる蒸発源を順次移動可能に配置できるから、同
時に多数の水晶片に均等に励振電極用の基礎蒸着
を能率良く行なうことができ、しかも蒸着物の種
類が多い場合でも蒸着膜にズレを生じることがな
い水晶振動子の真空蒸着装置が提供される。
As described above, according to the present invention, the evaporation sources made of a plurality of metals can be arranged movably in sequence by keeping the distance between the evaporation source and each crystal piece equal, so that the evaporation sources can be distributed evenly to a large number of crystal pieces at the same time. Provided is a vacuum evaporation device for a crystal oscillator that can efficiently perform basic evaporation for an excitation electrode and does not cause misalignment of the evaporated film even when there are many types of evaporated materials.

また、2枚の遮蔽板を組合せて各水晶片への金
属物質の蒸着を適宜に遮蔽することにより、水晶
振動子の電極形成と周波数調整とが同一の真空蒸
着室の中で、真空破壊することなしに、連続して
実行されるから、水晶片の破損を防止して、かつ
作業能率の高い蒸着を可能にする。
In addition, by combining two shielding plates to appropriately shield the deposition of metal substances on each crystal piece, the electrode formation and frequency adjustment of the crystal resonator can be performed in the same vacuum deposition chamber, and the vacuum can be broken. Since the process is performed continuously without any problems, damage to the crystal piece can be prevented and vapor deposition can be performed with high work efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は水晶振動子1の正面図、第2図〜第6
図は周波数調整の従来例を示し、第2図は第1の
トレー8を示し、イ図は正面図、ロ図は側面図、
第3図は第2のトレー8′を示し、イ図は正面図、
ロ図は側面図、第4図は調整装置の正面図、第5
図は同平面図、第6図は他形状の調整装置の平面
図、第7図〜第15図は本発明の実施例を示し、
第7図は試料の正面図、第8図は真空蒸着室22
の部分断側面図、第9図は第1の蒸着物遮蔽板3
1の平面図、第10図は第2の蒸着物遮蔽板35
の平面図、第11図は試料取付部材39の平面
図、第12図は取付部40aに試料を取付けた状
態を示す部分断側面図、第13図は回転式テーブ
ル46の平面図、第14図は基礎メツキ状態を示
す蒸着物遮蔽板31,35の平面図、第15図は
周波数調整状態を示す蒸着物遮蔽板31,35の
平面図である。 1……水晶振動子、2……水晶片、3,3……
励振電極、22……真空蒸着室、31……蒸着物
遮蔽板、32a〜32f……孔、33……調整
孔、35……蒸着物遮蔽板、36a〜36f……
孔、39……試料取付部材、40a〜40f……
取付部、46……回転式テーブル、47,48…
…受皿(蒸発源)。
Figure 1 is a front view of the crystal resonator 1, Figures 2 to 6
The figure shows a conventional example of frequency adjustment, Figure 2 shows the first tray 8, Figure A is a front view, Figure B is a side view,
Figure 3 shows the second tray 8', Figure A is a front view;
Figure B is a side view, Figure 4 is a front view of the adjustment device, Figure 5 is a front view of the adjustment device,
The figure is a plan view of the same, FIG. 6 is a plan view of an adjusting device of other shapes, and FIGS. 7 to 15 show embodiments of the present invention.
Figure 7 is a front view of the sample, Figure 8 is the vacuum deposition chamber 22.
FIG. 9 is a partially sectional side view of the first vapor deposit shielding plate 3.
1, and FIG. 10 is a plan view of the second vapor deposit shielding plate 35.
11 is a plan view of the sample attachment member 39, FIG. 12 is a partially sectional side view showing a state in which a sample is attached to the attachment part 40a, FIG. 13 is a plan view of the rotary table 46, and FIG. 15 is a plan view of the deposit shielding plates 31, 35 showing the basic plating state, and FIG. 15 is a plan view of the deposit shielding plates 31, 35 showing the frequency adjustment state. 1...Crystal resonator, 2...Crystal piece, 3,3...
Excitation electrode, 22... Vacuum deposition chamber, 31... Deposit shielding plate, 32a-32f... Hole, 33... Adjustment hole, 35... Deposit shielding plate, 36a-36f...
Hole, 39... Sample mounting member, 40a to 40f...
Mounting part, 46... Rotary table, 47, 48...
...Saucer (evaporation source).

Claims (1)

【特許請求の範囲】[Claims] 1 真空蒸着室と、この真空蒸着室内の所定位置
に選択的に移動可能に設けられそれぞれ金属物質
を貯留した複数の蒸発源と、上記所定位置に定位
した蒸発源に接触して通電加熱し上記金属物質を
蒸発させる電極と、上記所定位置に定位した蒸発
源から等距離の円周上に等間隔に配設した複数の
水晶片と、各水晶片と上記蒸発源との間に配設さ
れ各水晶片に対応する所定位置にそれぞれ開口部
を有する固定遮蔽板と、この遮蔽板に対して回転
可能に設けられ各開口部を同時に開閉するととも
に特定の開口部のみを開口する調整孔を有する回
転遮蔽板とを具備してなることを特徴とする水晶
振動子の真空蒸着装置。
1. A vacuum evaporation chamber, a plurality of evaporation sources that are selectively movable at predetermined positions in the vacuum evaporation chamber and each store a metal substance; an electrode for evaporating a metallic substance; a plurality of crystal pieces arranged at equal intervals on a circumference equidistant from the evaporation source positioned at the predetermined position; and a plurality of crystal pieces arranged between each crystal piece and the evaporation source. It has a fixed shielding plate that has openings at predetermined positions corresponding to each crystal piece, and an adjustment hole that is rotatably provided with respect to the shielding plate and opens and closes each opening simultaneously and opens only a specific opening. 1. A vacuum evaporation apparatus for a crystal resonator, comprising: a rotating shield plate.
JP5404781A 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator Granted JPS57169084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5404781A JPS57169084A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5404781A JPS57169084A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Publications (2)

Publication Number Publication Date
JPS57169084A JPS57169084A (en) 1982-10-18
JPH025818B2 true JPH025818B2 (en) 1990-02-06

Family

ID=12959685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5404781A Granted JPS57169084A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Country Status (1)

Country Link
JP (1) JPS57169084A (en)

Also Published As

Publication number Publication date
JPS57169084A (en) 1982-10-18

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