Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0346885B2 - - Google Patents
[go: Go Back, main page]

JPH0346885B2 - - Google Patents

Info

Publication number
JPH0346885B2
JPH0346885B2 JP29805085A JP29805085A JPH0346885B2 JP H0346885 B2 JPH0346885 B2 JP H0346885B2 JP 29805085 A JP29805085 A JP 29805085A JP 29805085 A JP29805085 A JP 29805085A JP H0346885 B2 JPH0346885 B2 JP H0346885B2
Authority
JP
Japan
Prior art keywords
film
stress
yoke
magnetic
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP29805085A
Other languages
Japanese (ja)
Other versions
JPS62154317A (en
Inventor
Tooru Kira
Koji Ootsuka
Kazuyoshi Imae
Mitsuhiko Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP29805085A priority Critical patent/JPS62154317A/en
Priority to DE19863644388 priority patent/DE3644388A1/en
Publication of JPS62154317A publication Critical patent/JPS62154317A/en
Priority to US07/688,701 priority patent/US5155644A/en
Publication of JPH0346885B2 publication Critical patent/JPH0346885B2/ja
Priority to US07/869,056 priority patent/US5225951A/en
Granted legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 <技術分野> 本発明は強磁性薄膜の磁気抵抗効果を応用した
磁気抵抗効果素子(以下MR素子と称す)を用い
て磁気記録媒体に記録された信号の検出を行なう
薄膜磁気ヘツドに関する。
[Detailed Description of the Invention] <Technical Field> The present invention detects signals recorded on a magnetic recording medium using a magnetoresistive element (hereinafter referred to as an MR element) that applies the magnetoresistive effect of a ferromagnetic thin film. Concerning thin film magnetic heads.

<従来技術> 強磁性薄膜の磁気抵抗効果を利用した薄膜磁気
ヘツドは、一般に多用されている巻線型磁気ヘツ
ドと比較して多くの利点を有することが知られて
いる。即ち上記薄膜磁気ヘツドは磁気記録媒体に
記録された磁化パターンから発生する信号磁界を
受け、これをMR素子の抵抗変化に基く電圧変化
として取り出すものであるため、磁気記録媒体の
移送速度に依存せずに信号を再生することがで
き、特に磁気記録媒体の移送速度が低い場合に巻
線型の磁気ヘツドよりも高出力の再生信号が得ら
れるという利点を備えている。実際の使用に際し
てはMR素子単体で薄膜磁気ヘツドを構成するよ
りもMR素子部をヘツド先端から離し、磁気記録
媒体にて発生した磁束をMR素子部まで導く磁束
導入路(ヨーク)を配置した第2図の如き構造の
通常ヨークタイプMRヘツド(以下MRヘツドと
称す)と呼ばれる薄膜磁気ヘツドの方が信号の分
解能の向上やMR素子の耐久性の向上の為に有効
であり、近年このタイプのヘツドが固定ヘツド・
デイジタルオーデイオ用再生ヘツドとして注目さ
れている(第8回日本応用磁気学会学術講演概要
集(1984)14PB−11「ヨークタイプMRヘツドの
再生特性」参照)。
<Prior Art> Thin-film magnetic heads that utilize the magnetoresistive effect of ferromagnetic thin films are known to have many advantages over commonly used wire-wound magnetic heads. In other words, the thin film magnetic head receives a signal magnetic field generated from a magnetization pattern recorded on a magnetic recording medium and extracts this as a voltage change based on a resistance change of the MR element, so it does not depend on the transfer speed of the magnetic recording medium. It has the advantage of being able to reproduce a signal without any movement, particularly when the transport speed of the magnetic recording medium is low, and that a higher output reproduction signal can be obtained than with a wire-wound magnetic head. In actual use, rather than constructing a thin-film magnetic head with a single MR element, the MR element is separated from the tip of the head, and a magnetic flux introducing path (yoke) is arranged to guide the magnetic flux generated in the magnetic recording medium to the MR element. A thin film magnetic head, usually called a yoke type MR head (hereinafter referred to as MR head), with the structure shown in Figure 2, is more effective in improving signal resolution and durability of the MR element, and in recent years this type of magnetic head has become more effective. The head is a fixed head.
It is attracting attention as a playback head for digital audio (see ``Reproduction Characteristics of Yoke Type MR Head'', 8th Japanese Society of Applied Magnetics, Abstracts of Academic Lectures (1984), 14PB-11).

第2図は従来のYMRヘツドのトラツク幅方向
に垂直な方向の断面図である。上側ヨーク7,8
は通常0.5〜1.0μm程度の膜厚のパーマロイ膜で
作製されており磁気記録媒体(磁気テープ)10
で発生した磁界をMR素子5に導くための磁路と
なる。MR素子5はパーマロイ蒸着膜で作製さ
れ、膜厚は300〓乃至500〓、長さはトラツク幅の
約50μmに設定されている。またMR素子5にバ
イアス磁界を印加すめにAl−Cuから成る導体4
が絶縁膜2,3間に配設されている。尚、3′も
絶縁膜である。ヘツドギヤツプ6は実際に使用さ
れる記録波長が最小0.5μm程度であるので0.2乃
至0.3μm程度に設定される。下側ヨーク1は高透
磁率磁性体から成り、一般には多結晶NiZnフエ
ライト基板や単結晶(又は多結晶)MnZnフエラ
イト基板が用いられる。トラツク幅は通常YMR
ヘツドが多トラツク構成となるため50μm程度に
設定される。
FIG. 2 is a cross-sectional view of a conventional YMR head in a direction perpendicular to the track width direction. Upper yoke 7, 8
is usually made of permalloy film with a film thickness of about 0.5 to 1.0 μm, and is used as a magnetic recording medium (magnetic tape) 10
This becomes a magnetic path for guiding the magnetic field generated in the MR element 5 to the MR element 5. The MR element 5 is made of a permalloy vapor-deposited film, and the film thickness is set to 300 to 500 μm, and the length is set to about 50 μm, which is the track width. In addition, a conductor 4 made of Al-Cu is used to apply a bias magnetic field to the MR element 5.
is arranged between the insulating films 2 and 3. Note that 3' is also an insulating film. The head gap 6 is set to about 0.2 to 0.3 μm since the minimum recording wavelength actually used is about 0.5 μm. The lower yoke 1 is made of a high permeability magnetic material, and generally a polycrystalline NiZn ferrite substrate or a single crystal (or polycrystalline) MnZn ferrite substrate is used. Track width is usually YMR
Since the head has a multi-track configuration, the thickness is set to about 50 μm.

上記の如くMR素子を構成した薄膜磁気ヘツド
において、MR素子5を作製する際にその磁化容
易軸はトラツク幅方向に選ばれている。又、バイ
アス磁場発生用の電流IB(以下バイアス電流IB
称す)を導体4(以下バイアス導体と称す)に流
すことにより、MR素子5部に所要のバイアス磁
場を与え、MR素子5の動作点を線型性の良い点
に移動させている。又、MR素子5のトラツク幅
方向にセンス電流ISを流し、磁気媒体10より発
生する信号磁場をMR素子5両端の電圧変化に変
換する。尚、このときMR素子5から得られる出
力信号の中には、MR素子5内部の磁区が不連続
に移動することに起因するバルク・ハウゼン・ノ
イズが含まれており、このノイズは上記YMRヘ
ツドの出力信号処理を行う上で極めて悪い影響を
与えることが知られている(上記第8回日本応用
磁気学会学術講演概要集(1984)14PB−11「ヨー
クタイプMRヘツドの再生特性」参照)。
In the thin film magnetic head configured as an MR element as described above, when the MR element 5 is manufactured, its axis of easy magnetization is selected to be in the track width direction. In addition, by passing a current I B (hereinafter referred to as bias current I B ) for generating a bias magnetic field through the conductor 4 (hereinafter referred to as bias conductor), a required bias magnetic field is applied to the MR element 5, and the MR element 5 is The operating point is moved to a point with good linearity. Furthermore, a sense current IS is caused to flow in the track width direction of the MR element 5, and the signal magnetic field generated by the magnetic medium 10 is converted into a voltage change across the MR element 5. Note that the output signal obtained from the MR element 5 at this time includes Bulkhausen noise caused by the discontinuous movement of the magnetic domain inside the MR element 5, and this noise is generated by the YMR head described above. It is known that this has an extremely negative effect on the output signal processing of the yoke type MR head (see the above-mentioned 8th Japanese Society of Applied Magnetics, Abstracts of Academic Lectures (1984), 14PB-11, "Reproduction Characteristics of Yoke Type MR Head").

バルク・ハウゼン・ノイズは前記したように
MR素子5内部の磁区の移動に起因するものであ
るが、そもそもMR素子5内部に磁区が発生し不
連続に移動する原因としては、MR素子5内部の
磁気異方性の乱れ(以下、異方性分散と称す)が
挙げられる。MR素子5は第3図の平面図中の符
号K−K′で示すようにそのトラツク幅方向に磁
化容易軸を持つように成膜されるが、種々の外的
要因の影響により薄膜磁気ヘツド完成時にはこの
一軸異方性は乱される。この外的要因としては、
ヘツド製作工程における熱履歴等によりMR素子
5の膜自身が劣化し異方性分散が増大すること
や、MR素子5の膜に外部より応力が加わり、
MR素子5の膜の逆磁歪効果により応力誘起の磁
気異方性がMR素子膜の中に発生した成膜時の一
軸異方性を乱すことなどが挙げられる。
As mentioned above, Barkhausen noise is
This is caused by the movement of the magnetic domain inside the MR element 5, but the reason why the magnetic domain is generated inside the MR element 5 and moves discontinuously is due to disturbance of magnetic anisotropy (hereinafter referred to as anomaly) inside the MR element 5. (referred to as tropic dispersion). The MR element 5 is formed so as to have an axis of easy magnetization in the track width direction, as shown by K-K' in the plan view of FIG. When completed, this uniaxial anisotropy is disturbed. This external factor is
The film of the MR element 5 itself may deteriorate due to thermal history during the head manufacturing process, increasing anisotropic dispersion, or stress may be applied to the film of the MR element 5 from the outside.
For example, stress-induced magnetic anisotropy due to the inverse magnetostrictive effect of the film of the MR element 5 disturbs the uniaxial anisotropy generated in the MR element film during film formation.

MR素子5の膜に加わる外部からの応力として
はMR素子5の上に積層される薄膜である第3図
に示すギヤツプ用絶縁膜3′、第1のヨーク膜7、
第2のヨーク膜8において発生する内部応力の反
作用としてMR素子5に加わる力が考えられる。
ここで、上記したいずれの膜も内部応力は等方的
と考えられるので、ギヤツプ用絶縁膜3′のよう
にMR素子5の上に一様に被着されている膜では
MR素子5に加わる応力は等方的と考えられ、従
つてこれを基にしてMR素子5には、応力誘起の
磁気異方性は発生しないと考えられる。しかし、
ヨーク膜7,8のようにMR素子5近傍において
パターン化されて被着されている膜からは、MR
素子5に異方的な応力が加わる為、これを原因と
する応力誘起の磁気異方性がMR素子5において
発生する。この現象を第4図に示す。第4図にお
いて第1、第2のヨーク膜7,8の内部応力を圧
縮応力δYとするMR素子5には図中のδMR,δ′MR
示す応力が発生し、ここでMR素子部の磁歪定数
λSが負であると、応力誘起の磁気異方性はトラツ
ク(成膜時のMR素子の異方性の方向)と垂直な
方向に発生する。従つて異方性の向きが2軸にな
り成膜時の磁気異方性が乱され異方性分散が増大
し、バルク・ハウゼン・ノイズの原因となる。こ
のように、ヨーク膜の内部応力はMR素子部に応
力誘起の異方性を発生させるため、ヘツド特性に
有害な影響を与えるが、ヨーク膜を内部応力が零
の状態で成膜することは、現実的には困難であ
る。すなわち、ヨーク材としては、Fe−Al−Si
−合金、Ni−Fe合金等がもちいられるが、スパ
ツタ、蒸着、メツキ等の成膜方法の何れの方法を
用いても固有の内部応力を有し、ヨーク材として
要求される磁気特性を十分保ちつつ内部応力を小
さくすることは不可能であつた。
External stresses applied to the film of the MR element 5 include the gap insulating film 3' shown in FIG. 3, which is a thin film laminated on the MR element 5, the first yoke film 7,
A force applied to the MR element 5 can be considered as a reaction to the internal stress generated in the second yoke film 8.
Here, since the internal stress of any of the above-mentioned films is considered to be isotropic, a film uniformly deposited on the MR element 5 like the gap insulating film 3'
The stress applied to the MR element 5 is considered to be isotropic, and based on this, it is considered that stress-induced magnetic anisotropy does not occur in the MR element 5. but,
MR is removed from films that are patterned and deposited near the MR element 5, such as the yoke films 7 and 8.
Since anisotropic stress is applied to the element 5, stress-induced magnetic anisotropy occurs in the MR element 5 due to this stress. This phenomenon is shown in FIG. In FIG. 4, the MR element 5 in which the internal stress of the first and second yoke films 7 and 8 is a compressive stress δ Y generates stresses shown as δ MR and δ' MR in the figure, and here the MR element When the magnetostriction constant λ S of the film is negative, stress-induced magnetic anisotropy occurs in a direction perpendicular to the track (direction of anisotropy of the MR element during film formation). Therefore, the direction of the anisotropy becomes biaxial, which disturbs the magnetic anisotropy during film formation, increases anisotropic dispersion, and causes Bulkhausen noise. In this way, the internal stress of the yoke film causes stress-induced anisotropy in the MR element, which has a detrimental effect on the head characteristics, but it is impossible to form the yoke film with zero internal stress. , which is difficult in reality. In other words, Fe-Al-Si is used as the yoke material.
-Alloys, Ni-Fe alloys, etc. are used, but they have inherent internal stress no matter which film formation method is used, such as sputtering, vapor deposition, plating, etc., and they maintain sufficient magnetic properties required as a yoke material. However, it was impossible to reduce the internal stress.

<発明の目的> ここで本発明の目的は、上記のMR素子特性に
有害な影響を与えるヨーク膜の内部応力を打ち消
し若しくは低減し、バルク・ハウゼン・ノイズの
少ないYMRヘツドを提供することにある。
<Object of the Invention> The object of the present invention is to provide a YMR head with less Bulkhausen noise by canceling out or reducing the internal stress of the yoke film that has a detrimental effect on the above-mentioned MR element characteristics. .

<実施例> 第1図は本発明に係る薄膜磁気ヘツドの一実施
例を示すもので、トラツク幅方向に垂直な面にお
ける断面図を示している。同図で第2図と同一部
分は同一符号で示す。
<Embodiment> FIG. 1 shows an embodiment of a thin film magnetic head according to the present invention, and shows a sectional view taken in a plane perpendicular to the track width direction. In this figure, the same parts as in FIG. 2 are designated by the same reference numerals.

第1図において1は高透磁率基板であり、例え
ばNi−Znフエライト基板が使用される。5は
MR素子部であり、Ni−Fe、Ni−Co等の強磁性
薄膜で形成される。尚、これらの膜は有限な値の
磁歪定数を有する。ギヤツプ部絶縁膜6を被着加
工した後に、ヨーク膜7,8(例えばNi−Fe膜)
をスパツタリングで成膜すると、そのヨーク膜
7,8の内部応力は一般に強い圧縮応力となる。
従つて、MR素子部5に加わる応力を打ち消すた
めに、引つ張り応力を有する上記ヨーク膜7,8
に対する応力キヤンセル膜9をヨーク膜7,8上
に積層した後に、イオンミリング法などのエツチ
ング法により、ヨーク膜7,8及び応力キヤンセ
ル膜9を二層同時に所定のヨーク形状に加工す
る。上記応力キヤンセル膜9としてはNi−Feの
蒸着膜を使用した。
In FIG. 1, reference numeral 1 indicates a high magnetic permeability substrate, for example, a Ni--Zn ferrite substrate is used. 5 is
This is the MR element part and is made of a ferromagnetic thin film such as Ni-Fe or Ni-Co. Note that these films have a magnetostriction constant of a finite value. After applying the gap part insulating film 6, yoke films 7 and 8 (for example, Ni-Fe film) are applied.
When the yoke films 7 and 8 are formed by sputtering, the internal stress of the yoke films 7 and 8 generally becomes strong compressive stress.
Therefore, in order to cancel the stress applied to the MR element section 5, the yoke films 7 and 8 having tensile stress are used.
After stacking the stress cancel film 9 on the yoke films 7 and 8, the yoke films 7 and 8 and the stress cancel film 9 are simultaneously processed into a predetermined yoke shape by etching such as ion milling. As the stress cancel film 9, a deposited Ni-Fe film was used.

第1図の薄膜磁気ヘツドに働く応力の様子を第
5図に示す。図中、δYはヨーク膜7,8である
Ni−Feスパツタ膜の圧縮応力であり、δCは応力
キヤンセル膜9であるNi−Fe蒸着膜の引つ張り
応力である。ここでMR素子部5に加わる応力は
(δY−δC)に比例するため、δYδCに選べばMR素
子部5に加わる応力を著しく低減することが可能
である。
FIG. 5 shows the state of stress acting on the thin film magnetic head of FIG. 1. In the figure, δ Y is the yoke membranes 7 and 8.
δ C is the compressive stress of the Ni-Fe sputtered film, and δ C is the tensile stress of the Ni-Fe vapor deposited film, which is the stress cancel film 9. Here, the stress applied to the MR element portion 5 is proportional to (δ Y −δ C ), so if δ Y δ C is selected, the stress applied to the MR element portion 5 can be significantly reduced.

本実施例において使用したヨーク膜7,8の
Ni−Feスパツタ膜の内部応力は約−7×
109dyne/cm2であり、応力キヤンセル膜9のNi−
Fe蒸着膜の内部応力は約+15×109dyne/cm2であ
つた。従つて、NiFeスパツタ膜の1/2の膜厚の
Ni−Fe蒸着膜を積層することによりヨーク膜7,
8と応力キヤンセル膜9の2層膜からMR素子部
5に加わる応力を著しく低減できた。この様子を
第6図に示す。同図はトラツク幅方向と垂直な面
における断面図であり、ヨーク膜7,8に、その
1/2の膜厚の応力キヤンセル膜9を積層すること
により、全体として応力がキヤンセルされた状態
を示す。
The yoke films 7 and 8 used in this example
The internal stress of the Ni-Fe sputtered film is approximately -7×
10 9 dyne/cm 2 , and the Ni-
The internal stress of the Fe deposited film was approximately +15×10 9 dyne/cm 2 . Therefore, the film thickness is 1/2 that of NiFe sputtered film.
By laminating Ni-Fe vapor deposited films, the yoke film 7,
The stress applied to the MR element portion 5 from the two-layer film of the MR element 8 and the stress cancel film 9 could be significantly reduced. This situation is shown in FIG. This figure is a cross-sectional view taken in a plane perpendicular to the track width direction, and shows a state in which stress is canceled as a whole by laminating a stress canceling film 9 with a thickness of 1/2 on the yoke films 7 and 8. show.

第7図に一つの基板上に本発明に係る薄膜磁気
ヘツドと従来の薄膜磁気ヘツドの両方を並設した
例を示す。同図で各チツプは、それぞれ20トラツ
クのヘツドから構成される。このうち、斜線を付
した8チツプは、本発明に係る薄膜磁気ヘツド構
造とし、残り8チツプを従来の薄膜磁気ヘツド構
造とし、同一基板によつて試作した。この様にし
た場合、本発明に係るヘツド(8チツプ)のトラ
ツク(20×8=160トラツク)中バルク・ハウゼ
ン・ノイズの出現したトラツクは、87トラツク/
160トラツクであり、一方従来の構造のヘツド
(8チツプ)のトラツクについては140トラツク/
160トラツクであつた。この様に、本発明に係る
薄膜磁気ヘツドではバルク・ハウゼン・ノイズの
顕著な低減効果が得られた。
FIG. 7 shows an example in which both a thin film magnetic head according to the present invention and a conventional thin film magnetic head are arranged side by side on one substrate. In the figure, each chip consists of 20 track heads. Of these, 8 chips marked with diagonal lines have a thin film magnetic head structure according to the present invention, and the remaining 8 chips have a conventional thin film magnetic head structure, which were prototyped using the same substrate. In this case, among the tracks (20 x 8 = 160 tracks) of the head (8 chips) according to the present invention, the number of tracks where Bulkhausen noise appeared is 87/
160 tracks, while for tracks with conventional head structure (8 chips), 140 tracks/
It was 160 trucks. As described above, the thin film magnetic head according to the present invention has a remarkable effect of reducing Bulkhausen noise.

ここで、以上の実施例においてはヨーク膜7,
8としてスパツタリング法で成膜したNi−Fe膜
を用い、応力キヤンセル膜9,9として蒸着法で
成膜したNi−Fe膜を用いた例を示したが、この
逆の組み合わせでもよく、更にこれ以外にもヨー
ク膜7,8及び応力キヤンセル膜9,9の組み合
わせとして種々のものを使用可能である。
Here, in the above embodiment, the yoke film 7,
An example was shown in which a Ni-Fe film formed by a sputtering method was used as the film 8, and a Ni-Fe film formed by a vapor deposition method was used as the stress cancel film 9, but the reverse combination may also be used. In addition, various combinations of the yoke films 7, 8 and the stress cancel films 9, 9 can be used.

即ちヨーク膜7,8として、Ni−Fe膜(圧縮
応力)、Fe−Al−Si蒸着膜(引つ張り応力)、Fe
−Al−Siスパツタ膜(圧縮若しくは引つ張り応
力)、CoにSi、B、P等の反金属あるいはZr、
Ti、Nb、Ta、Hf、W等の金属を10〜20%程度
含有させてなるアモルフアス蒸着膜(引つ張り応
力)、CoにSi、B、P等に反金属あるいはZr、
Ti、Nb、Ta、Hf、W等の遷移金属を10〜20%
程度含有させてなるアモルフアススパツタ膜(圧
縮応力)が適用可能であり、一方応力キヤンセル
膜9,9として上記ヨーク膜7,8の適用可能な
膜以外にW、Ti、Ta、Zr、Nb、Hf等の金属蒸
着膜(引つ張り応力)、W、Ti、Ta、Zr、Nb、
Hf等の金属スパツタ膜(圧縮応力)、SiO2
Al2O3、Si3N4等の絶縁物スパツタ膜(圧縮応力)
が適用可能である。但し互いに応力の向きが反対
のものを選択する必要があることは言うまでもな
い。
That is, as the yoke films 7 and 8, Ni-Fe film (compressive stress), Fe-Al-Si vapor deposited film (tensile stress), Fe
-Al-Si sputtered film (compressive or tensile stress), anti-metal such as Si, B, P or Zr on Co,
Amorphous amorphous vapor deposited film (tensile stress) containing about 10 to 20% of metals such as Ti, Nb, Ta, Hf, W, etc., Si in Co, antimetal or Zr in B, P, etc.
10-20% transition metals such as Ti, Nb, Ta, Hf, W, etc.
An amorphous sputtered film (compressive stress) containing a certain amount of stress can be applied.On the other hand, in addition to the films to which the yoke films 7 and 8 can be applied as the stress cancel films 9 and 9, W, Ti, Ta, Zr, and Nb can be used. , metal vapor deposition film (tensile stress) such as Hf, W, Ti, Ta, Zr, Nb,
Metal spatter film (compressive stress) such as Hf, SiO 2 ,
Insulator sputtered film such as Al 2 O 3 , Si 3 N 4 (compressive stress)
is applicable. However, it goes without saying that it is necessary to select materials whose stress directions are opposite to each other.

<発明の効果> 以上説明した如く本発明によれば、MR素子部
における応力誘起の磁気異方性の発生を低減する
ことが可能になり、その結果、バルク・ハウゼ
ン・ノイズの少ない低雑音のYMRヘツドを実現
することができるため、磁気媒体からの信号を忠
実に再生できる利点がある。
<Effects of the Invention> As explained above, according to the present invention, it is possible to reduce the occurrence of stress-induced magnetic anisotropy in the MR element section, and as a result, it is possible to reduce the occurrence of stress-induced magnetic anisotropy in the MR element section, and as a result, it is possible to reduce the occurrence of stress-induced magnetic anisotropy in the MR element section. Since it is possible to implement a YMR head, it has the advantage of faithfully reproducing signals from magnetic media.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る薄膜磁気ヘツドの一実施
例の断面図、第2図は従来のYMRヘツドの断面
図、第3図はその平面図、第4図はその応力の作
用を示す説明図、第5図、第6図は本発明に係る
薄膜磁気ヘツドの応力の作用を示す説明図、第7
図は基板の平面図を示す。 図中、1:高透磁率基板、5:MR素子部、
6:ギヤツプ部絶縁膜、7,8:ヨーク膜、9:
応力キヤンセル膜。
Fig. 1 is a cross-sectional view of an embodiment of the thin film magnetic head according to the present invention, Fig. 2 is a cross-sectional view of a conventional YMR head, Fig. 3 is a plan view thereof, and Fig. 4 is an explanation showing the effect of stress. 5 and 6 are explanatory diagrams showing the effect of stress on the thin film magnetic head according to the present invention, and FIG.
The figure shows a top view of the substrate. In the figure, 1: high magnetic permeability substrate, 5: MR element part,
6: Gap part insulating film, 7, 8: Yoke film, 9:
Stress canceling membrane.

Claims (1)

【特許請求の範囲】[Claims] 1 磁気抵抗効果素子上に磁束を導く為のヨーク
膜パターンが被覆され、該ヨーク膜パターン上に
該ヨーク膜内部に発生する応力を打ち消し若しく
は低減せしめる応力キヤンセル膜が被覆されてな
ることを特徴とする薄膜磁気ヘツド。
1. A magnetoresistive element is coated with a yoke film pattern for guiding magnetic flux, and the yoke film pattern is covered with a stress cancel film that cancels out or reduces stress generated inside the yoke film. thin film magnetic head.
JP29805085A 1985-12-27 1985-12-27 Thin film magnetic head Granted JPS62154317A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP29805085A JPS62154317A (en) 1985-12-27 1985-12-27 Thin film magnetic head
DE19863644388 DE3644388A1 (en) 1985-12-27 1986-12-24 Thin-film yoke-type magnetic head
US07/688,701 US5155644A (en) 1985-12-27 1991-04-22 Yoke thin film magnetic head constructed to avoid Barkhausen noises
US07/869,056 US5225951A (en) 1985-12-27 1992-04-16 Thin film magnetic head with reduced internal stresses

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29805085A JPS62154317A (en) 1985-12-27 1985-12-27 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS62154317A JPS62154317A (en) 1987-07-09
JPH0346885B2 true JPH0346885B2 (en) 1991-07-17

Family

ID=17854482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29805085A Granted JPS62154317A (en) 1985-12-27 1985-12-27 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS62154317A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940002769A (en) * 1992-07-20 1994-02-19 다니엘 에이. 네펠라 Thin film magnetic head
US20130288078A1 (en) * 2012-04-30 2013-10-31 Seagate Technology Llc Thin Film with Reduced Stress Anisotropy

Also Published As

Publication number Publication date
JPS62154317A (en) 1987-07-09

Similar Documents

Publication Publication Date Title
JPH0684145A (en) Magnetoresistance reading transducer
JPH0473201B2 (en)
JPH0572644B2 (en)
JP3208906B2 (en) Magnetoresistive magnetic head
JPH0346885B2 (en)
US5959809A (en) Magnetoresistive head and method of manufacturing the same and magnetic recording apparatus
JPH11175925A (en) Magnetoresistive element and magnetic recording / reproducing device
JPS61134913A (en) Magnetoresistive thin film head
JP2614203B2 (en) Magnetoresistance head
JP3475868B2 (en) Magnetoresistive thin-film magnetic head
JPH0473210B2 (en)
JP2718242B2 (en) Magnetoresistive head
JPH0447890B2 (en)
JPS63129511A (en) Magnetoresistance effect type thin film magnetic head
JPH0498608A (en) Magnetic head
JPS5987616A (en) Magnetic thin film head
JPH07320235A (en) Magnetoresistive head and method of manufacturing the same
JPS61248214A (en) Thin film magnetic head
JP3008910B2 (en) Magnetoresistive element, magnetoresistive head and magnetic recording / reproducing apparatus using the same
JPH07107732B2 (en) Magnetoresistive thin film head
JP3180778B2 (en) Spin valve type magnetoresistive head
JPH06325327A (en) Magnetoresistive thin film magnetic head
JP2000311314A (en) Thin film magnetic head of yoke magnetic resistance effect type
JPH05151534A (en) Combined thin-film magnetic head
JPS61134912A (en) thin film magnetic head

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees