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JPH0457746B2 - - Google Patents
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JPH0457746B2 - - Google Patents

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Publication number
JPH0457746B2
JPH0457746B2 JP290884A JP290884A JPH0457746B2 JP H0457746 B2 JPH0457746 B2 JP H0457746B2 JP 290884 A JP290884 A JP 290884A JP 290884 A JP290884 A JP 290884A JP H0457746 B2 JPH0457746 B2 JP H0457746B2
Authority
JP
Japan
Prior art keywords
bath
magnetic
plating bath
mol
4πms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP290884A
Other languages
Japanese (ja)
Other versions
JPS60149785A (en
Inventor
Fumio Goto
Tetsuya Aisaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP290884A priority Critical patent/JPS60149785A/en
Publication of JPS60149785A publication Critical patent/JPS60149785A/en
Publication of JPH0457746B2 publication Critical patent/JPH0457746B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は、磁気記録媒体の膜厚方向の磁化によ
つて記録を行う、いわゆる垂直記録に用いる磁気
記録媒体(磁性膜)を作製するめつき浴に関する
ものである。 (従来技術) 従来、一般の磁気デイスク装置、磁気テープ装
置などの磁気記録装置においては、基板上に形成
された磁気記録媒体にリング型磁気ヘツドによつ
て水平方向に磁化することにより記録を行なつて
いる。 しかし、水平磁化による記録には記録信号が短
波長になるに従い、即ち記録密度の増加に従つ
て、媒体内の反磁界が増大して残留磁化の減衰と
回転を生じ、再生出力が著しく減少するという欠
点が存在する。そこで、この問題解決のため短波
長になる程反磁界が小さくなる性質をもつ垂直記
録方式が提案され、この垂直記録に適した磁気記
録媒体としては、膜厚に垂直な方向に磁化容易軸
をもつCo−Crスパツタ膜が提案されている。そ
して、この垂直磁化記録方式は従来の水平方向の
磁化による記録方式に比べて高密度記録に優れて
いることが報告されている。(特開昭52−134706
号公報参照)。ところでCo−Cr膜をスパツタ法に
より作製する場合、真空系内で行うため量産性に
問題がある。 このためこの様な製造上の問題点を改善して量
産性に優れた無電解めつき法により、膜面に垂直
な方向に磁化容易軸をもつ磁気記録媒体を製造す
る無電解Co−Mn−Pめつき浴が見い出されてい
る(特願昭56−025833、(特公昭63−38432号)、
“無電解めつき浴”)。一般に膜面に垂直な方向に
磁化容易となる条件は、媒体の垂直異方性磁界
Hkと減磁界の最大値4πMs(Msは飽和磁化)の間
にHk>4πMsの関係またはHk/4πMs>1の関係
があるこである。垂直記録媒体においては必ずし
もこの条件を満たす必要はないが、Hk/4πMs
1であつても大きな値をもつ程垂直磁化容易の条
件に近づいているため媒体特性として好ましいと
いえる。実際に記録媒体を用いて記録密度特性を
測定した結果によつてもこの傾向が示されてい
る。例えば、電子通信学会技術研究報告、MR82
−22,1982年10月15日では種々の特性のCo−V
スパツタ媒体にリングヘツドを用いて垂直記録を
行ない、Hk/4πMs値が大きくなる程限界記録密
度D50(孤立波再生出力が1/2となる記録密度で、
媒体の記録密度の性能を表わす値)が増加するこ
と、またHk/4πMs値が0.5を下回るとD50が急激
に減少することを示している。この傾向は媒体の
種類、記録再生条件が異なる場合も同様の関係に
ある。しかし、前記無電解めつき浴においてはa
−Co六方晶(磁化容易軸)が基板に対して垂直
配向した磁性膜が得られるが、飽和磁化Msの低
下が少なく4πMsの値が非常に大きくなるため垂
直磁化記録の障碍となる。このためニツケルを共
析することにより(特願昭56−155706、(特公平
3−62794号)、“無電解めつき浴”)、またニツケ
ルに加えてレニウムを共析することにより(1982
年、金属表面技術協会、第66回学術講演大会講演
要旨集P,8〜9に掲載されためつき浴、以下
AT浴とよぶ)Msの低下がはかられている。 ところが、Co−Ni−Mn−P磁性膜にレニウム
を共析するために無電解めつき浴にレニウムイオ
ンを添加した場合、酒石酸ナトリウムを錯化剤と
して用いたAT浴においてはめつき浴が著しく不
安定となり、磁気特性の不均一、下地基板による
依存、再現性の劣化等を生じるという問題があつ
た。AT浴を用いて磁気記録体例えば磁気デイス
クを作製する場合、磁気特性の不均一のために一
周の再生出力波形(エンベロープ)の一様性の低
下を招き、磁気特性の再現性が劣り浴寿命が短い
ため一定力めつき浴から極く限られた少ない数量
しか得られない等の欠点があつた。また磁気特性
の基板依存性が大きくPd触媒を付与したポリイ
ミド基板上にくらべて金属基板を用いた場合
Hk/4πMsは大幅に減少するという問題があつ
た。 (発明の目的) 本発明の目的は、このような従来の問題を改善
して膜面に垂直な方向に磁気記録するのに好まし
い特性を均一に有する磁気記録媒体を安定に製造
できる無電解めつき浴を提供することにある。 (発明の構成) 本発明による無電解めつき浴は、金属イオンと
して少なくともコバルトイオン、ニツケルイオ
ン、マンガンイオン、レニウムイオン、添加剤と
して少なくともこれら金属イオンの還元剤、PH緩
衝剤、PH調節剤を含む水溶液に、前記金属イオン
の錯化剤として少なくともマロン酸基、酒石酸基
およびタルトロン酸基が同時に加えられているこ
とを特徴としている。 (発明の構成に関する説明) 本発明者らは前述の問題を改善するためめつき
浴組成について詳細に検討した結果、次のことが
明らかとなつた。酒石酸ナトリウムを単独に錯化
剤としているAT浴においては、レニウム共析量
の増加が容易であるが、めつき膜中にレニウムお
よびニツケルを安定に適切量を共析することが困
難であり、均一な特性の膜を再現性よく得ること
ができない。Msが著しく減少するがHkの減少も
大きい。基板によつてはHk/4πMsが大幅に減少
する。他の錯化剤としてマロン酸ナトリウムを単
独に錯化剤として用いた場合レニウムを増加して
もHkは大きな値をもつが、Msはそれ程減少しな
い。このためHk/4πMsは小さな値をとる。そこ
で酒石酸、マロン酸両方を同時に含む浴を検討し
たが、両者の特徴を生かし好ましい磁気特性を得
ることが困難であつた。しかし、これに更にタル
トロン酸を加えた場合、マロン酸と酒石酸に有効
に作用し、適当な大きさのHkの値を保ちつつMs
の値を適度に減少させて好ましい磁気特性が得ら
れる。まためつき浴中にマロン酸、酒石酸、タル
トロン酸を同時に含むことにより、これら錯化剤
の相互作用により浴中金属イオン濃度が適切に調
節される結果、めつき浴の安定性に寄与すること
を見い出した。 本発明はかかる知見をもとになされたものであ
る。本発明によりめつき浴の金属イオンが適切に
調節され、めつき膜の組成が一定に保たれること
により、浴の安定化と膜特性の改善と均一化がは
かれる。 本発明において金属イオンとして用いられるコ
バルトイオン、ニツケルイオン、マンガンイオン
としては、コバルト、ニツケルあるいはマンガン
の硫酸塩、塩化塩、酢酸塩などの可溶性塩を無電
解めつき浴中に溶解することによつて供給され
る。コバルトイオンの濃度は、0.005〜1mol/
の範囲が用いられるが、好ましくは0.01〜
0.15mol/の範囲である。ニツケルイオンの濃
度は、0.001〜0.5mol/の範囲が用いられるが
好ましくは0.005〜0.20mol/の範囲である。マ
ンガンイオンの濃度は、0.003〜2mol/の範囲
が用いられるが好ましくは0.02〜0.2mol/の範
囲である。レニウムイオンは過レニウム酸カリ、
過レニウム酸アンモニウムなどの可溶性塩により
供給され、レニウムイオン濃度として0.0001〜
0.1mol/、好ましくは0.001〜0.05mol/の範
囲が用いられる。還元剤としては次亜リン酸塩が
普通に用いられるが、ヒドラジン塩類、ホウ水素
化物、ジメチルアミンボランまたはその誘導体等
も用いることができる。 PH緩衝剤としてはアンモニウム塩、炭酸塩、有
機酸塩などが使用され、0.01〜2mol/の範囲
の濃度が用いられる。 PH調節剤としては、PHの上昇にはアンモニウ
ム、水酸化ナトリウムなどのアルカリが用いら
れ、PHの降下には硫酸、塩酸などの酸が用いられ
る。錯化剤としてのマロン酸基は、マロン酸また
はマロン酸の可溶性塩によつて供給され、0.05〜
2.5mol/の範囲の濃度が用いられる。酒石酸
基は酒石酸または酒石酸の可溶性塩によつて供給
され、0.02〜1.5mol/の範囲の濃度が用いられ
る。タルトロン酸基はタルトロン酸またはタルト
ロン酸の可溶性塩によつて供給され、0.005〜
1.0mol/の範囲の濃度が用いられるが、好ま
しくは0.01〜0.3mol/の範囲である。特にタル
トロン酸は各金属イオンの安定した析出に顕著な
効果を有するため他の錯化剤にくらべて小量の添
加で十分な効果が得られることが特徴である。 また本発明の無電解めつき浴は、基板依存性が
少ないため金属または非金属の各種基板に適用で
きる。 以下、本発明による無電解めつき浴の特長を比
較例および実施例により説明する。 (比較例) アルミ合金基板内径100mm、外径210mm上に非磁
性Ni−P層をめつきし、その上に下記のめつき
浴およびめつき条件にて膜厚0.5μmのCo−Ni−
Mn−Re−P合金磁性膜を形成した。 めつき浴 (1) 硫酸コバルト 0.06mol/ 硫酸ニツケル 0.04mol/ 硫酸マンガン 0.03mol/ 過レニウム酸アンモニウム 0.003mol/ 次亜リン酸ナトリウム 0.2mol/ 硫酸アンモニウム 0.5mol/ 酒石酸ナトリウム 0.5mol/ めつき条件 めつき浴のPH9.2(室温にてNH4OHでPH調
節) めつき浴の温度80℃ 次にこの上に珪酸モノマーを回転塗布し、190
℃で数時間焼成して膜厚0.02μmの珪酸重合体を
主成分とする保護膜を形成した。 こうして得られた磁気デイスクを下記の条件で
記録再生特性の測定を行つたところ、D50
30KFRPIの値を得た。 測定条件 使用ヘツド Mn−Znフエライト・リングヘツド ヘツドギヤツプ長 0.3μm ヘツド浮上量 0.2μm しかし、一周の再生出力については最大値の1/
2以下になる部分が一周全体の25%以上もあり、
エンベロープの一様性において実用上問題があつ
た。エンベロープにおいて出力が最大となる部分
の媒体特性はHk/4πMs値として0.6であつたが、
出力が1/2となる箇所では0.5以下であり特性の不
均一が認められた。 めつき浴の寿命に関しては次の様にして検討を
行つた。一定のめつき液(容量100)において、
本比較例の前記手順と同様にして1日に20枚づつ
磁気デイスクのめつきを行ない、めつき枚数と磁
気特性の関係を調べた。金属塩および還元剤は、
各めつき日に各成分の消費量相当分を補充した。
めつき枚数20枚ごとのHk/4πMsの変化を第1図
に示す。めつき開始時のHk/4πMsの値は0.6で
あるが、めつき枚数が増加するに従つて減少し60
枚めつきが終了した時点でのHk/4πMsの値は
0.5となり、更にめつき枚数が増加するとHk/
4πMsの値は更に減少した。記憶媒体として実用
上許容されるHk/4πMsの値を0.5以上とすれば、
前記めつき浴(1)から得られる磁気デイスクの数量
(以下浴寿命という)はめつき枚数60枚程度でし
かないことがわかる。 なおめつき浴(1)は、浴の安定性の点で最も好ま
しい組成を選択した。A−T浴においては過レニ
ウム酸アンモニウムおよび酒石酸ナトリウムの濃
度が、浴の安定性および磁気特性に最も影響す
る。過レニウム酸アンモニウムは、0.001mol/
以下ではMsが大きすぎ、0.008mol/以上で
はめつき速度が低下し均一な析出が極めて困難で
あり、0.003mol/が最も好ましかつた。酒石
酸ナトリウム濃度は0.25mol/以下では浴分解
を生じやすく、0.75mol/以上では均一な析出
が困難で浴寿命も短かくなり、安定性の点で
0.5mol/が最も好ましかつた。めつき浴(1)は
A−T浴の中で好適組成であるにもかかわらず、
本比較例で示された様に安定性、磁気特性の点で
問題があつた。 (実施例 1) 比較例と同様の手順で磁気デイスクを作製した
が、本実施例では下記のめつき浴を用いた。 めつき浴 (2) 硫酸コバルト 0.06mol/ 硫酸ニツケル 0.08mol/ 硫酸マンガン 0.03mol/ 過レニウム酸アンモニウム 0.003mol/ 次亜リン酸ナトリウム 0.2mol/ 硫酸アンモニウム 0.5mol/ マロン酸ナトリウム 0.3mol/ 酒石酸ナトリウム 0.2mol/ タルトロン酸 0.05mol/ こうして得られた磁気デイスクを比較例と同様
の条件で記録再生特性の測定を行つたところ、
D50=52KFRPIの値を値た。一周の再生出力につ
いては、最大値の90%以下になる部分はなく、実
用上十分良好なエンベロープを示した。デイスク
一面内の媒体特性も均一であり、平均値のHk/
4πMs=1.75に対し±0.05内のバラツキであつた。 めつき浴の寿命を比較例と同様にして検討した
結果、めつき枚数によるHk/4πMsの変化として
第2図が得られた。めつき開始時のHk/4πMsの
値は1.75であり、めつき枚数が増加するに従つて
減少するが、220枚めつきが終了した時点でも1.5
であり減少度合は少ない。その後は減少度合が増
すがHk/4πMsが0.5となるのはめつき枚数340枚
である。本実施例では錯化剤としてマロン酸ナト
リウム、酒石酸ナトリウムおよびタルトロン酸を
用いためつき浴を使用することにより、比較例に
くらべて媒体特性、記録密度特性が著しく良好か
つ均一な磁気デイスクを多数枚得ることができ
た。 (実施例 2) 比較例と同様の手順で磁気デイスクを作製した
が、本実施例では下記のめつき浴を用いた。 めつき浴 (3) 硫酸コバルト 0.06mol/ 硫酸ニツケル 0.10mol/ 硫酸マンガン 0.01mol/ 過レニウム酸アンモニウム 0.004mol/ 次亜リン酸ナトリウム 0.2mol/ 硫酸アンモニウム 0.4mol/ マロン酸ナトリウム
0.1,0.2,0.3,0.4,0.5,0.07mol/ 酒石酸ナトリウム 0.2mol/ タルトロン酸 0.10mol/ こうして得られた磁気デイスクのめつき開始時
のHk/4πMsの値と浴寿命(Hk/4πMsが0.5以
下となるめつき枚数)を第1表に示す。
(Field of Industrial Application) The present invention relates to a plating bath for producing a magnetic recording medium (magnetic film) used for so-called perpendicular recording, in which recording is performed by magnetization in the film thickness direction of the magnetic recording medium. (Prior Art) Conventionally, in magnetic recording devices such as general magnetic disk devices and magnetic tape devices, recording is performed by horizontally magnetizing a magnetic recording medium formed on a substrate using a ring-shaped magnetic head. It's summery. However, in recording using horizontal magnetization, as the wavelength of the recording signal becomes shorter, that is, as the recording density increases, the demagnetizing field within the medium increases, causing attenuation and rotation of the residual magnetization, resulting in a significant decrease in the reproduction output. There is a drawback. To solve this problem, a perpendicular recording method was proposed in which the demagnetizing field becomes smaller as the wavelength becomes shorter.A magnetic recording medium suitable for this perpendicular recording has an axis of easy magnetization perpendicular to the film thickness. A sputtered Co-Cr film has been proposed. It has been reported that this perpendicular magnetization recording method is superior to the conventional recording method using horizontal magnetization in high-density recording. (Unexamined Japanese Patent Publication No. 52-134706
(see publication). By the way, when a Co--Cr film is produced by sputtering, there is a problem in mass production because it is carried out in a vacuum system. For this reason, electroless Co-Mn- which manufactures a magnetic recording medium with an axis of easy magnetization perpendicular to the film surface by an electroless plating method that improves these manufacturing problems and is excellent in mass production. P-metal baths have been discovered (Patent Application No. 1983-025833, (Special Publication No. 38432-1981)),
“Electroless plating bath”). Generally, the condition for easy magnetization in the direction perpendicular to the film surface is the perpendicular anisotropic magnetic field of the medium.
There is a relationship between Hk and the maximum value 4πMs of the demagnetizing field (Ms is saturation magnetization) of Hk>4πMs or Hk/4πMs>1. Although it is not necessary to satisfy this condition for perpendicular recording media, Hk/4πMs
Even if it is 1, the larger the value, the closer it is to the conditions for easy perpendicular magnetization, so it can be said that it is preferable as a medium characteristic. This tendency is also shown by the results of measuring recording density characteristics using actual recording media. For example, IEICE technical research report, MR82
-22, October 15, 1982, Co-V with various characteristics
Perpendicular recording is performed on a sputtering medium using a ring head.
This shows that the value representing the recording density performance of the medium) increases, and that D 50 decreases rapidly when the Hk/4πMs value falls below 0.5. This tendency holds true even when the types of media and recording/reproducing conditions are different. However, in the electroless plating bath, a
Although a magnetic film in which -Co hexagonal crystals (easy axis of magnetization) are oriented perpendicular to the substrate can be obtained, the saturation magnetization Ms decreases little and the value of 4πMs becomes extremely large, which becomes an obstacle to perpendicular magnetization recording. For this purpose, by eutectoiding nickel (Japanese Patent Application 1982-155706, (Patent Publication No. 3-62794), "Electroless Plating Bath"), and by eutectoiding rhenium in addition to nickel (1982
The following is a bath published in Abstracts of the 66th Academic Conference of the Metal Surface Technology Association, P. 8-9 in 2013.
(called AT bath) is designed to reduce Ms. However, when rhenium ions are added to the electroless plating bath in order to eutectoid rhenium on the Co-Ni-Mn-P magnetic film, the plating bath becomes significantly unstable in the AT bath using sodium tartrate as a complexing agent. However, there were problems such as non-uniformity of magnetic properties, dependence on the underlying substrate, and deterioration of reproducibility. When producing a magnetic recording medium such as a magnetic disk using an AT bath, the uniformity of the reproduction output waveform (envelope) for one round decreases due to the non-uniformity of the magnetic properties, resulting in poor reproducibility of the magnetic properties and the lifespan of the bath. Because of the short length, there were drawbacks such as the fact that only a very limited amount could be obtained from a constant force plating bath. Also, the magnetic properties are more dependent on the substrate when using a metal substrate than on a polyimide substrate coated with a Pd catalyst.
There was a problem that Hk/4πMs decreased significantly. (Objective of the Invention) The object of the present invention is to improve the above conventional problems and to provide an electroless medium that can stably produce a magnetic recording medium having uniform properties suitable for magnetic recording in a direction perpendicular to the film surface. The purpose is to provide a soaking bath. (Structure of the Invention) The electroless plating bath according to the present invention contains at least cobalt ions, nickel ions, manganese ions, and rhenium ions as metal ions, and at least a reducing agent for these metal ions, a PH buffer, and a PH regulator as additives. It is characterized in that at least a malonic acid group, a tartaric acid group, and a tartronic acid group are simultaneously added to the aqueous solution containing the metal ion as a complexing agent. (Description of the Structure of the Invention) The present inventors conducted a detailed study on the plating bath composition in order to improve the above-mentioned problems, and as a result, the following became clear. In an AT bath that uses sodium tartrate as the sole complexing agent, it is easy to increase the amount of rhenium eutectoid, but it is difficult to stably eutectoid the appropriate amount of rhenium and nickel into the plated film. It is not possible to obtain a film with uniform characteristics with good reproducibility. Although Ms decreases significantly, Hk also decreases significantly. Depending on the substrate, Hk/4πMs decreases significantly. When sodium malonate is used alone as another complexing agent, Hk has a large value even if rhenium is increased, but Ms does not decrease much. Therefore, Hk/4πMs takes a small value. Therefore, a bath containing both tartaric acid and malonic acid was considered, but it was difficult to take advantage of the characteristics of both to obtain desirable magnetic properties. However, when tartronic acid is further added to this, it acts effectively on malonic acid and tartaric acid, and Ms.
Preferred magnetic properties can be obtained by appropriately reducing the value of . In addition, by simultaneously containing malonic acid, tartaric acid, and tartronic acid in the plating bath, the metal ion concentration in the bath is appropriately adjusted through the interaction of these complexing agents, which contributes to the stability of the plating bath. I found out. The present invention has been made based on this knowledge. According to the present invention, the metal ions in the plating bath are appropriately adjusted and the composition of the plating film is kept constant, thereby stabilizing the bath and improving and making the film properties uniform. Cobalt ions, nickel ions, and manganese ions used as metal ions in the present invention can be obtained by dissolving soluble salts of cobalt, nickel, or manganese such as sulfates, chlorides, and acetates in an electroless plating bath. supplied. The concentration of cobalt ion is 0.005 to 1 mol/
is used, preferably 0.01 to
It is in the range of 0.15 mol/. The concentration of nickel ions used is in the range of 0.001 to 0.5 mol/, preferably in the range of 0.005 to 0.20 mol/. The concentration of manganese ions is preferably in the range of 0.003 to 2 mol/, but preferably in the range of 0.02 to 0.2 mol/. Rhenium ion is potassium perrhenate,
Provided by soluble salts such as ammonium perrhenate, rhenium ion concentrations range from 0.0001 to
A range of 0.1 mol/, preferably 0.001 to 0.05 mol/ is used. Hypophosphites are commonly used as reducing agents, but hydrazine salts, borohydrides, dimethylamine borane or derivatives thereof, etc. can also be used. Ammonium salts, carbonates, organic acid salts, etc. are used as the PH buffer, and the concentration ranges from 0.01 to 2 mol/. As a pH regulator, an alkali such as ammonium or sodium hydroxide is used to increase the pH, and an acid such as sulfuric acid or hydrochloric acid is used to decrease the pH. The malonic acid group as a complexing agent is supplied by malonic acid or a soluble salt of malonic acid, with a range of 0.05 to
Concentrations in the range 2.5 mol/are used. The tartaric acid groups are provided by tartaric acid or soluble salts of tartaric acid, and concentrations in the range of 0.02 to 1.5 mol/l are used. The tartronic acid group is supplied by tartronic acid or a soluble salt of tartronic acid, and
Concentrations in the range 1.0 mol/are used, preferably in the range 0.01-0.3 mol/. In particular, tartronic acid has a remarkable effect on the stable precipitation of each metal ion, and is therefore characterized in that a sufficient effect can be obtained by adding a small amount compared to other complexing agents. Further, the electroless plating bath of the present invention has little dependence on the substrate, so it can be applied to various metal or non-metal substrates. Hereinafter, the features of the electroless plating bath according to the present invention will be explained using comparative examples and examples. (Comparative example) A non-magnetic Ni-P layer was plated on an aluminum alloy substrate with an inner diameter of 100 mm and an outer diameter of 210 mm, and a Co-Ni layer with a thickness of 0.5 μm was applied on top of the non-magnetic Ni-P layer using the following plating bath and plating conditions.
A Mn-Re-P alloy magnetic film was formed. Plating bath (1) Cobalt sulfate 0.06mol/ Nickel sulfate 0.04mol/ Manganese sulfate 0.03mol/ Ammonium perrhenate 0.003mol/ Sodium hypophosphite 0.2mol/ Ammonium sulfate 0.5mol/ Sodium tartrate 0.5mol/ Plating conditions Plating Bath PH9.2 (PH adjusted with NH 4 OH at room temperature) Plating bath temperature 80℃ Next, spin-coat silicic acid monomer on top of this,
C. for several hours to form a protective film with a thickness of 0.02 μm mainly composed of a silicic acid polymer. When the recording and reproducing characteristics of the thus obtained magnetic disk were measured under the following conditions, D 50 =
Obtained a value of 30KFRPI. Measurement conditions Head used Mn-Zn ferrite ring head Head gap length 0.3μm Head flying height 0.2μm However, the playback output for one revolution is 1/1 of the maximum value.
There are more than 25% of the entire cycle where the value is 2 or less.
There was a practical problem with the uniformity of the envelope. The medium characteristic of the part of the envelope where the output is maximum was Hk/4πMs value of 0.6,
At the point where the output was 1/2, it was less than 0.5, indicating non-uniformity of characteristics. The life of the plating bath was investigated as follows. At a constant plating solution (volume 100),
Twenty magnetic disks were plated per day in the same manner as in the procedure described above for this comparative example, and the relationship between the number of plated disks and the magnetic properties was investigated. Metal salts and reducing agents are
Each ingredient was replenished in an amount equivalent to the consumed amount on each plating day.
Figure 1 shows the change in Hk/4πMs for every 20 plated sheets. The value of Hk/4πMs at the start of plating is 0.6, but decreases as the number of sheets plated increases to 60
The value of Hk/4πMs at the end of plating is
0.5, and as the number of plated sheets increases further, Hk/
The value of 4πMs decreased further. If the value of Hk/4πMs that is practically acceptable as a storage medium is 0.5 or more,
It can be seen that the number of magnetic disks obtained from the plating bath (1) (hereinafter referred to as bath life) is only about 60 plated disks. The composition of the makeup bath (1) was selected to be the most preferable in terms of bath stability. In AT baths, the concentrations of ammonium perrhenate and sodium tartrate most affect the stability and magnetic properties of the bath. Ammonium perrhenate is 0.001mol/
If it is below, Ms is too large, and if it is 0.008 mol/ or more, the plating rate decreases and uniform precipitation is extremely difficult, so 0.003 mol/ is most preferred. If the concentration of sodium tartrate is less than 0.25 mol/, bath decomposition will easily occur, and if it is more than 0.75 mol/, uniform precipitation will be difficult and the bath life will be shortened, resulting in poor stability.
0.5 mol/was most preferred. Although the plating bath (1) has a preferable composition among the A-T baths,
As shown in this comparative example, there were problems with stability and magnetic properties. (Example 1) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (2) Cobalt sulfate 0.06mol / Nickel sulfate 0.08mol / Manganese sulfate 0.03mol / Ammonium perrhenate 0.003mol / Sodium hypophosphite 0.2mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate 0.2mol / Tartronic acid 0.05 mol / The recording and reproducing characteristics of the thus obtained magnetic disk were measured under the same conditions as in the comparative example.
The value of D 50 = 52KFRPI was calculated. Regarding the playback output for one round, there was no part where the playback output was less than 90% of the maximum value, indicating a sufficiently good envelope for practical use. The media characteristics within one surface of the disk are also uniform, and the average value Hk/
The variation was within ±0.05 for 4πMs=1.75. As a result of examining the life of the plating bath in the same manner as in the comparative example, Figure 2 was obtained as the change in Hk/4πMs depending on the number of plated sheets. The value of Hk/4πMs at the start of plating is 1.75, and decreases as the number of sheets plated increases, but it is still 1.5 at the end of plating 220 sheets.
Therefore, the degree of decrease is small. After that, the degree of decrease increases, but Hk/4πMs becomes 0.5 when the number of sheets plated is 340. In this example, by using a aging bath using sodium malonate, sodium tartrate, and tartronic acid as complexing agents, a large number of magnetic disks with significantly better and more uniform medium characteristics and recording density characteristics than in the comparative example were produced. I was able to get it. (Example 2) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (3) Cobalt sulfate 0.06mol / Nickel sulfate 0.10mol / Manganese sulfate 0.01mol / Ammonium perrhenate 0.004mol / Sodium hypophosphite 0.2mol / Ammonium sulfate 0.4mol / Sodium malonate
0.1, 0.2, 0.3, 0.4, 0.5, 0.07 mol / Sodium tartrate 0.2 mol / Tartronic acid 0.10 mol / Value of Hk/4πMs at the start of plating of the thus obtained magnetic disk and bath life (Hk/4πMs is 0.5 or less) Table 1 shows the number of plated sheets.

【表】 比較例にくらべて本実施例では、媒体特性およ
び浴寿命が著しく改善され、また得られた磁気デ
イスクの記録密度特性も良好かつ均一であつた。 (実施例 3) 比較例と同様の手順で磁気デイスクを作製した
が、本実施例では下記のめつき浴を用いた。 めつき浴 (4) 硫酸コバルト 0.07mol/ 硫酸ニツケル 0.12mol/ 硫酸マンガン 0.04mol/ 過レニウム酸アンモニウム 0.005mol/ 次亜リン酸ナトリウム 0.25mol/ 硫酸アンモニウム 0.5mol/ マロン酸ナトリウム 0.3mol/ 酒石酸ナトリウム
0.1,0.2,0.3,0.4,0.5,0.6mol/ タルトロン酸 0.04mol/ こうして得られた磁気デイスクのめつき開始時
のHk/4πMsの値と浴寿命を第2表に示す。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform. (Example 3) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (4) Cobalt sulfate 0.07mol / Nickel sulfate 0.12mol / Manganese sulfate 0.04mol / Ammonium perrhenate 0.005mol / Sodium hypophosphite 0.25mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate
0.1, 0.2, 0.3, 0.4, 0.5, 0.6 mol/ tartronic acid 0.04 mol/ Table 2 shows the value of Hk/4πMs at the start of plating and the bath life of the magnetic disk thus obtained.

【表】 比較例にくらべて本実施例では、媒体特性およ
び浴寿命が著しく改善され、また得られた磁気デ
イスクの記録密度特性も良好かつ均一であつた。 (実施例 4) 比較例と同様の手順で磁気デイスクを作製した
が、本実施例では下記のめつき浴を用いた。 めつき浴 (5) 硫酸コバルト 0.07mol/ 硫酸ニツケル 0.09mol/ 硫酸マンガン 0.02mol/ 過レニウム酸アンモニウム 0.004mol/ 次亜リン酸ナトリウム 0.20mol/ 硫酸アンモニウム 0.5mol/ マロン酸ナトリウム 0.3mol/ 酒石酸ナトリウム 0.2mol/ タルトロン酸
0,0.01,0.02,0.03,0.05,0.07,0.09,
0.15mol/ こうして得られた磁気デイスクのめつき開始時
のHk/4πMsの値と浴寿命を第3表に示す。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform. (Example 4) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (5) Cobalt sulfate 0.07mol / Nickel sulfate 0.09mol / Manganese sulfate 0.02mol / Ammonium perrhenate 0.004mol / Sodium hypophosphite 0.20mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate 0.2mol / Tartronic acid 0, 0.01, 0.02, 0.03, 0.05, 0.07, 0.09,
0.15 mol/ Table 3 shows the value of Hk/4πMs at the start of plating and the bath life of the magnetic disk thus obtained.

【表】 比較例にくらべて本実施例では、媒体特性およ
び浴寿命が著しく改善され、また得られた磁気デ
イスクの記録密度特性も良好かつ均一であつた。
タルトロン酸を添加することにより特性が著しく
改善され、タルトロン酸の顕著な効果が示され
た。 (発明の効果) 以上、比較例および実施例で示された様に本発
明によれば、磁性膜を作製するめつき浴におい
て、金属イオンとして少なくともコバルトイオ
ン、ニツケルイオン、マンガンイオン、レニウム
イオン、添加剤として少なくともこれら金属イオ
ンの還元剤、PH緩衝剤、PH調節剤を含む水溶液に
前記金属イオンの錯化剤として少なくともマロン
酸基、酒石酸基およびコハク酸基を同時に含むこ
とにより、垂直記録媒体として優れた特性を均一
に有する磁気記録体を安定に多数得ることができ
る。 なお実施例では金属イオンとしてコバルトイオ
ン、ニツケルイオン、マンガンイオン、レニウム
イオンのみを、添加剤として還元剤、PH緩衝剤、
PH調節剤のみを、錯化剤としてマロン酸基、酒石
酸基、タルトロン酸基のみを含むめつき浴につい
て述べたが、本発明の目的効果を損わない範囲に
おいて、光沢剤、励起剤、平滑剤、応力緩和剤、
ピンホール防止剤等として前記以外の金属イオ
ン、添加剤および錯化剤を加えることも可能であ
る。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform.
The properties were significantly improved by adding tartronic acid, demonstrating the remarkable effect of tartronic acid. (Effects of the Invention) As shown above in the comparative examples and examples, according to the present invention, at least cobalt ions, nickel ions, manganese ions, and rhenium ions are added as metal ions in the plating bath for producing magnetic films. By simultaneously containing at least a malonic acid group, a tartaric acid group, and a succinic acid group as a complexing agent for the metal ions in an aqueous solution containing at least a reducing agent for these metal ions, a PH buffer, and a PH regulator as agents, it is possible to use a perpendicular recording medium. A large number of magnetic recording bodies having uniformly excellent properties can be stably obtained. In the examples, only cobalt ions, nickel ions, manganese ions, and rhenium ions were used as metal ions, and reducing agents, PH buffers, and additives were used as additives.
Although a plating bath containing only a PH regulator, a malonic acid group, a tartaric acid group, and a tartronic acid group as a complexing agent has been described, brighteners, stimulants, smoothing agents, etc. agent, stress reliever,
It is also possible to add metal ions, additives, and complexing agents other than those mentioned above as pinhole inhibitors and the like.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、比較例のめつき浴を用いて磁気デイ
スクを作製した場合のめつき枚数によるHk/
4πMsの変化を示す図であり、第2図は、実施例
1のめつき浴を用いた場合の同様の図である。
Figure 1 shows Hk/ by the number of plated disks when magnetic disks were manufactured using the plating bath of the comparative example.
FIG. 2 is a diagram showing changes in 4πMs, and FIG. 2 is a similar diagram when the plating bath of Example 1 is used.

【特許請求の範囲】[Claims]

1 複数本の結束した鋼管を複数の処理槽に順次
浸漬して所望の表面処理を行うに際し、 (a) 前記複数の処理槽を集約かつ近接して配置
し、結束した鋼管はこれら処理槽間を所定の経
路に沿つて移動すること、 (b) 結束した鋼管は各槽位置で所定時間浸漬され
てから引き上げられ液切りのため傾動されるこ
と、 (c) 上記鋼管の移動、上下動及び傾動は、旋回か
つ昇降可能で少なくとも1つのフツクに滑落防
止押えを有する複数の鋼管保持用L形フツクを
自動操作することによつて行われること、 からなることを特徴とする鋼管の表面処理方法。
1. When a plurality of bundled steel pipes are sequentially immersed in a plurality of treatment tanks to perform the desired surface treatment, (a) the plurality of treatment tanks are placed together and close together, and the bundled steel pipes are placed between these treatment tanks. (b) The bundled steel pipes are immersed for a predetermined time in each tank position, then lifted and tilted to drain the liquid; (c) The steel pipes are moved, vertically moved and A method for surface treatment of steel pipes, characterized in that the tilting is performed by automatically operating a plurality of L-shaped steel pipe holding hooks that can be rotated and raised and lowered, and at least one of the hooks has a slip-preventing foot. .

JP290884A 1984-01-11 1984-01-11 Electroless plating bath Granted JPS60149785A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP290884A JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP290884A JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Publications (2)

Publication Number Publication Date
JPS60149785A JPS60149785A (en) 1985-08-07
JPH0457746B2 true JPH0457746B2 (en) 1992-09-14

Family

ID=11542452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP290884A Granted JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Country Status (1)

Country Link
JP (1) JPS60149785A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10784045B2 (en) 2015-09-15 2020-09-22 International Business Machines Corporation Laminated magnetic materials for on-chip magnetic inductors/transformers
EP3409815B1 (en) * 2017-06-02 2020-08-05 ATOTECH Deutschland GmbH Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits

Also Published As

Publication number Publication date
JPS60149785A (en) 1985-08-07

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