JPH053906B2 - - Google Patents
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- JPH053906B2 JPH053906B2 JP59237461A JP23746184A JPH053906B2 JP H053906 B2 JPH053906 B2 JP H053906B2 JP 59237461 A JP59237461 A JP 59237461A JP 23746184 A JP23746184 A JP 23746184A JP H053906 B2 JPH053906 B2 JP H053906B2
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- present
- aqueous solution
- gaseous
- gaseous hydrides
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
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- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
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- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
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- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はガス状水素化物の検出方法に関する。
詳しくは特定の方法で得られた参加スズ素子の電
気抵抗の変化によつてガス状水素化物を検出する
方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for detecting gaseous hydrides.
In particular, the present invention relates to a method for detecting gaseous hydrides by a change in the electrical resistance of a participating tin element obtained by a specific method.
近年の半導体工業の進歩に伴いシラン、ジシラ
ンなどのエピタキシヤル用ガスやジボラン、ホス
フイン、アルミン、ゲルマンなどのドーピング用
ガスの使用量が大幅に増大している。
With the progress of the semiconductor industry in recent years, the usage of epitaxial gases such as silane and disilane, and doping gases such as diborane, phosphine, aluminium, and germane has increased significantly.
これらのガス状水素化物は可燃性、自然性、毒
性など微量でも流出すると健康上保安上問題が生
ずるため、微量のガス状水素化物の検出方法の開
発が望まれている。 These gaseous hydrides are flammable, natural, and toxic, and if even a trace amount of these gaseous hydrides leak out, they pose a health and safety problem, so it is desired to develop a method for detecting trace amounts of gaseous hydrides.
これに対して定電位電解法、ガルバニル電池
法、IR法、UV法、化学発光法などが知られてい
るがいずれも高価であるとかメンテナンスが煩雑
でかつ経費がかかるとか、検出部が大型でしかも
脆弱であるとかの問題がある。一方酸化スズなど
の半導体検知素子はメタン、プロパン、エタノー
ル、アセトンなどの可熱性ガスに対しては感度が
良好であるものの上記ガス状水素化物に対しては
感度が不良である。これに対しては特定の処理を
施こした酸化スズがガス状水素化物の存在によつ
て熱伝導の変化をおこすことを利用した検知素子
が知られている(新コスモス電機株式会社技術資
料No.SK−2011)。 In contrast, known methods include constant potential electrolysis, galvanic cell method, IR method, UV method, and chemiluminescence method, but all of them are expensive, require complicated and costly maintenance, and have large detection units. Moreover, there is the problem of vulnerability. On the other hand, semiconductor sensing elements such as tin oxide have good sensitivity to heatable gases such as methane, propane, ethanol, and acetone, but have poor sensitivity to the above-mentioned gaseous hydrides. For this purpose, a detection element is known that utilizes the fact that tin oxide, which has been subjected to a specific treatment, causes a change in thermal conductivity due to the presence of gaseous hydrides (New Cosmos Electric Co., Ltd. Technical Data No. .SK−2011).
上述の半導体検知素子を利用する方法は検知装
置が簡単で耐久性に優れているが通常の可熱性ガ
ス用の検知素子では感度が不充分であり、又熱伝
導を利用する方法は、検知素子加熱用のヒーター
の抵抗を使用するものであり検知素子の製造が難
かしいという問題があつた。
The above-mentioned method using a semiconductor detection element has a simple detection device and excellent durability, but the sensitivity is insufficient with a normal detection element for hot gas, and the method using thermal conduction has a simple detection device. There was a problem in that the sensing element was difficult to manufacture because it used the resistance of the heater for heating.
本発明者らは上記問題を解決する方法について
鋭意検討した結果、ガス状水素化物の検知用とし
ては不適当とされた可燃性ガス用検知素子が、特
定の製造法で作られた酸化スズを用いた特定の方
法で素子とされたものであれば、ガス状水素化物
用検知素子として高感度でしかも選択性良く、検
知できるという優れた性質を有するものであるこ
とを見い出し本発明を完成した。 As a result of intensive studies by the present inventors on ways to solve the above problems, it was found that the detection element for combustible gas, which was deemed unsuitable for detecting gaseous hydrides, uses tin oxide made by a specific manufacturing method. The present invention was completed by discovering that if the device is made into an element using the specific method used, it has the excellent properties of being able to detect gaseous hydrides with high sensitivity and selectivity. .
本発明の目的は高純度でガス状水素化物を検知
する方法を提供することにある。
It is an object of the present invention to provide a method for detecting gaseous hydrides with high purity.
即ち本発明は四塩化スズ水溶液を硝酸、アンモ
ニウム共存下にアンモニアで中和して得た沈澱生
成物を400〜700℃で仮焼し次いで素子形状に成形
し500〜700℃で加熱焼結して得た素子の電気抵抗
の変化を検知することを特徴とするガス状水素化
物の検出方法である。
That is, in the present invention, a precipitated product obtained by neutralizing an aqueous tin tetrachloride solution with ammonia in the coexistence of nitric acid and ammonium is calcined at 400 to 700°C, then formed into an element shape, and heated and sintered at 500 to 700°C. This is a method for detecting gaseous hydrides, which is characterized by detecting a change in electrical resistance of an element obtained by the method.
本発明において対象とするガス状水素化物とし
ては、ケイ素、ホウ素、リン、ゲルアニウム、ヒ
素の水素化物でありモノシラン、ジシラン、ボラ
ン、ジボラン等のごときモノ体、ジ体のみならず
他のガスで希釈されていても良く、さらにガス状
であればそれ以上のポリ体であつてもよい。 The gaseous hydrides targeted in the present invention include hydrides of silicon, boron, phosphorus, germanium, and arsenic, which are diluted with not only mono- and di-forms such as monosilane, disilane, borane, and diborane, but also with other gases. Furthermore, as long as it is gaseous, it may be a higher polyester.
以下に本発明で使用する検知素子の製法につい
て詳述する。 The method for manufacturing the sensing element used in the present invention will be described in detail below.
本発明の素子は以下の3つの工程で作られる。 The device of the present invention is manufactured through the following three steps.
(イ) 四塩化錫水溶液を硝酸アンモニウム共存下に
アンモニアで中和して沈澱生成物を得る工程、
(ロ) 沈澱生成物を400〜700℃で仮焼する工程、
(ハ) 仮焼して得た粉体を素子形状に成形し、500
〜700℃で加熱焼結して検知素子を作成する工
程、である。(a) a step of neutralizing an aqueous tin tetrachloride solution with ammonia in the coexistence of ammonium nitrate to obtain a precipitated product; (b) a step of calcining the precipitated product at 400 to 700°C; (c) a step of calcining the precipitated product. The powder was molded into an element shape, and 500
This is the process of creating a sensing element by heating and sintering at ~700°C.
(イ)の工程は、四塩化錫水溶液を硝酸アンモニウ
ム共存下にアンモニアで中和して、β錫酸
(〔H2SnO3〕5)を主成分とする白色沈澱を製造す
る工程である。 Step (a) is a step in which a tin tetrachloride aqueous solution is neutralized with ammonia in the coexistence of ammonium nitrate to produce a white precipitate containing β-stannic acid ([H 2 SnO 3 ] 5 ) as a main component.
アンモニアはSnCl4水溶液中にガスで吹き込ん
でもよいし液安として供給してもよいが、操作の
容易性の点で水溶液の形で供給するのが好まし
い。 Ammonia may be blown into the SnCl 4 aqueous solution as a gas or may be supplied as a liquid solution, but from the viewpoint of ease of operation, it is preferable to supply it in the form of an aqueous solution.
ここで使用するSnCl4水溶液の濃度は20〜40wt
%、水溶液で加える場合のNH3使用液の濃度は、
10〜30wt%、NH4NO3使用液の濃度は5〜30wt
%が、それぞれ好ましい。 The concentration of SnCl 4 aqueous solution used here is 20~40wt
%, the concentration of the NH 3 working solution when added as an aqueous solution is:
10~ 30wt %, concentration of NH4NO3 used liquid is 5~30wt
% is preferable.
NH3水溶液とNH4NO3水溶液は、前もつて混
合して加えても、各別に加えても良い。ただしそ
の場合NH4NO3水溶液を先に加えて後NH3水溶
液を加える必要がある。 The NH 3 aqueous solution and the NH 4 NO 3 aqueous solution may be mixed in advance and added, or may be added separately. However, in that case, it is necessary to add the NH 4 NO 3 aqueous solution first and then add the NH 3 aqueous solution.
中和点のPHは、6.5〜7.5であるが、より好まし
くは、6.8〜7.0である。 The pH of the neutralization point is 6.5 to 7.5, more preferably 6.8 to 7.0.
(ロ)の工程は、(イ)の工程で作られた白色沈澱を、
仮焼して、酸化スズ(SnO2)を製造する工程で
ある。 In step (b), the white precipitate produced in step (b) is
This is the process of producing tin oxide (SnO 2 ) by calcining.
この仮焼温度は、400〜700℃が好ましい。 This calcination temperature is preferably 400 to 700°C.
400℃以下未満では、四塩化スズ(SnCl4)の
残存率が高く、吸湿性が大で、特性が不安定であ
る。また700℃を越えると活性点がなくなつてし
まうせいか通常のSnO2性能と大差なくなつてし
まう。 At temperatures below 400°C, the residual rate of tin tetrachloride (SnCl 4 ) is high, hygroscopicity is large, and the properties are unstable. Furthermore, when the temperature exceeds 700°C, the performance is not much different from that of normal SnO 2 , probably because there are no active sites.
なお、公知技術(特公昭51−25159号)におい
ては、仮焼温度を500〜700℃としているが、本発
明の目的のためには、500℃以上である必要はな
く、400℃以上で充分良好な素子を作ることがで
きる。 In addition, in the known technology (Japanese Patent Publication No. 51-25159), the calcination temperature is set at 500 to 700°C, but for the purpose of the present invention, the temperature does not need to be 500°C or higher, and 400°C or higher is sufficient. Good elements can be made.
(ロ)の工程で作られる、SnO2は決して純粋な
SnO2ではなく、Cl原子、水酸基等が残存してお
り、また比表面積、細孔などの表面構造も特異的
であり、これらがガス状水素化物を高感度かつ迅
速に検出しうる性質をSnO2に与えるものと思わ
れる。 The SnO 2 produced in step (b) is never pure.
Instead of SnO2 , Cl atoms, hydroxyl groups, etc. remain, and the surface structure such as specific surface area and pores is also unique. It seems to be given to 2 .
(ハ)の工程は、素子を製作する工程である。 The step (c) is a step of manufacturing an element.
上記(ロ)で作られたSnO2を適当な大きさの素子
形状に成型する。 The SnO 2 produced in (b) above is molded into an element shape of an appropriate size.
この場合、素子の形も大きさも任意であるが、
好ましい大きさは、1mm角〜5mm角程度である。 In this case, the shape and size of the element can be arbitrary, but
The preferred size is approximately 1 mm square to 5 mm square.
そして素子の電気抵抗変化に応じて流れる電流
変化を測定するための1対の電極と素子を加熱す
るヒーターを具備する。一方の電極がヒーターを
兼ねていてもよい。電極の材質はPtやPd−Ir等
が用いられる。 The device is equipped with a pair of electrodes for measuring changes in current flowing in response to changes in electrical resistance of the element, and a heater for heating the element. One electrode may also serve as a heater. The material used for the electrodes is Pt, Pd-Ir, or the like.
素子を製作するためには、(ロ)のSnO2に、水や
ポリビニールアルコール水溶液等の液体粘結剤や
シリカゾルやガラスフリツト等加熱後、成型体に
残つて、形状を維持する焼結助剤が添加される。
さらには、素子の強度維持やガス濃度変化に対す
る応答特性をよくするためのアルミナ、シリカア
ルミナ、マグネシア等の無機助剤を添加するケー
スもある。 In order to manufacture the element, (b) SnO 2 must be combined with a liquid binder such as water or polyvinyl alcohol aqueous solution, or a sintering aid that remains in the molded body and maintains its shape after heating, such as silica sol or glass frit. is added.
Furthermore, in some cases, inorganic auxiliaries such as alumina, silica alumina, and magnesia are added to maintain the strength of the element and improve response characteristics to changes in gas concentration.
また必要に応じ、検出ガスの選択性や高感度化
等を目的として、白金(Pt)、パラジウム(Pd)、
金(Au)、アンチモン(Sb)等の金属の酸化物
やハロゲン化物が添加される。 If necessary, platinum (Pt), palladium (Pd),
Metal oxides and halides such as gold (Au) and antimony (Sb) are added.
これらの好ましい添加量は、各々以下の通りで
ある。 The preferable addition amounts of these are as follows.
液体粘結剤は、充分な混合が行えかつ素子成型
が簡単に行なえるに必要な量であればよい。 The liquid binder may be used in an amount necessary to achieve sufficient mixing and to facilitate device molding.
焼結助剤は、少なすぎると効果がなくなり、多
すぎると、SnO2粒子をカバーして、特性の発現
を防げるので、一般に0.01〜5wt%、好ましくは
0.1〜1wt%である。 The sintering aid is generally 0.01 to 5wt%, preferably 0.01 to 5wt%, because if it is too small, it will be ineffective, and if it is too large, it will cover the SnO 2 particles and prevent the development of properties.
It is 0.1-1wt%.
無機助剤は多すぎるとむしろ成型しにくくなる
ので、0〜10wt%の範囲が良い。 If the amount of inorganic auxiliary agent is too large, it will actually become difficult to mold, so a range of 0 to 10 wt% is preferable.
触媒は、少ないと効果がなく、多すぎると高価
なので、0.001〜1wt%が好ましい。 The catalyst is preferably 0.001 to 1 wt% since it is ineffective if it is too small and expensive if it is too large.
次に焼結温度は、500〜700℃が好ましい。 Next, the sintering temperature is preferably 500 to 700°C.
500℃未満では、液体粘結剤が残存したり、焼
結効果が充分でなく好ましくない。また700℃を
越えると(ロ)の工程で得られた特性が失なわれてし
まう。 If it is less than 500°C, the liquid binder may remain or the sintering effect will not be sufficient, which is not preferable. Furthermore, if the temperature exceeds 700°C, the properties obtained in step (b) will be lost.
本発明を実施する場合においては、(イ)(ロ)(ハ)の工
程をそれぞれ経て、ガス検知素子を製作すること
が必須である。 When carrying out the present invention, it is essential to manufacture a gas detection element through the steps (a), (b), and (c), respectively.
例えば、(イ)の工程でNH4NO3の添加を省略し
て、中和を行つて得た白色粉末を用いて、(ロ)(ハ)の
工程を経由して素子を製作しても、ガス状水素化
合物検出感度は非常に悪いものしか得られない。 For example, it is possible to omit the addition of NH 4 NO 3 in step (a) and use the white powder obtained by neutralization to manufacture an element through steps (b) and (c). , only very poor detection sensitivity for gaseous hydrogen compounds can be obtained.
また(イ)の工程で、NH3かわりに、NaOH、
KOH、CaOH等のアルカリ金属、アルカリ土類
金属の水酸化物を用いて中和を行い、得られた白
色粉末を用いて(ロ)(ハ)の工程を経て素子を製作して
も、可燃性ガスの検出感度は、同様にきわめて悪
い。 Also, in step (a), instead of NH3 , NaOH,
Even if an element is manufactured through steps (B) and (C) using the white powder obtained by neutralization using hydroxides of alkali metals and alkaline earth metals such as KOH and CaOH, it is still flammable. The detection sensitivity for sexual gases is also extremely poor.
また(イ)(ロ)の工程を省略した市販SnO2を入手し、
微粉砕して(ハ)の工程を経て、ガス検知素子を製作
しても、ガス状水素化物の検出感度は殆ど無い。 In addition, we obtained commercially available SnO 2 that omitted steps (a) and (b),
Even if a gas detection element is produced by pulverizing it and going through the step (c), there is almost no detection sensitivity for gaseous hydrides.
さて(イ)(ロ)(ハ)の工程を経て製作されたガス検知素
子は、ガス状水素化物検出に用いられる時は、温
度100〜500℃の範囲で用いられる。 Now, when the gas detection element manufactured through the steps (a), (b), and (c) is used for gaseous hydride detection, it is used at a temperature in the range of 100 to 500°C.
半導体工場では、ガス状水素化物の1つモノシ
ラン希釈ガス、水素と共に使用される場合が多
い。このような状態でモノシランだけを選択的に
検出することは非常に重要であるが従来の素子で
は選択的検出は困難であつた。 In semiconductor factories, monosilane, a gaseous hydride, is often used in conjunction with diluent gas and hydrogen. It is very important to selectively detect only monosilane in such a state, but selective detection has been difficult with conventional elements.
本発明の素子を使用すればそのような場合に
は、素子温度を100〜200℃に設定して使用すれば
よい。SnO2等、酸化物半導体を用いた検知素子
は、H2エチルアルコール、プロパン等の可燃性
ガスに対しては、素子温度が高温になるほど検出
感度が高くなり、逆に素子温度が低くなると検出
感度が低くなる性質を有するところ、本発明の検
知素子は特にこの性質が強く、素子温度が低くな
ると全く検出感度がなくなるからである。一方、
ガス状水素化物、例えば、モノシランに対しては
驚くべきことに低い素子温度の範囲で検出感度の
ピークがあるのである。 In such a case, the element of the present invention may be used by setting the element temperature to 100 to 200°C. Sensing elements using oxide semiconductors such as SnO 2 have higher detection sensitivity for flammable gases such as H 2 ethyl alcohol and propane, and the higher the element temperature, the higher the detection sensitivity. This is because the sensing element of the present invention has a property of decreasing sensitivity, and this property is particularly strong, and when the element temperature becomes low, there is no detection sensitivity at all. on the other hand,
Surprisingly, for gaseous hydrides such as monosilane, there is a peak in detection sensitivity in the range of low element temperatures.
またモノシランは、不活性ガス例えばN2、
Ar、H2等O2以外のガス中で使用される。したが
つて不活性ガス中のモノシランを検出することも
重要である。 Monosilane can also be used with inert gases such as N 2 ,
Used in gases other than O 2 such as Ar, H 2 etc. Therefore, it is also important to detect monosilane in inert gas.
通常SnO2等酸化物半導体を用いた検知素子は、
空気中即ちO2存在下では可燃性ガスに対する検
出感度は高いが不活性ガス中では、検出感度は低
い。 Normally, sensing elements using oxide semiconductors such as SnO2 are
The detection sensitivity for combustible gases is high in air, that is, in the presence of O 2 , but the detection sensitivity is low in inert gases.
ところが、本発明の検知素子は、ガス状水素化
物に対して、驚くべきことに不活性ガス中でも空
気中と同レベルの高い検出感度を示すのである。 However, the sensing element of the present invention surprisingly exhibits a high detection sensitivity for gaseous hydrides even in inert gas at the same level as in air.
本発明の検知素子は、ガス状水素化物の濃度に
対応して素子の電気抵抗が変化する。そこで、そ
の変化を利用して、素子と電源、そして警報手段
又は制御回路を含む回路を構成し、ガス状水素化
物を検出する。 In the sensing element of the present invention, the electrical resistance of the element changes depending on the concentration of gaseous hydride. Therefore, by utilizing this change, a circuit including an element, a power source, and an alarm means or a control circuit is configured to detect gaseous hydrides.
本発明の検知素子を用いて具体的に検出装置を
構成する一例を示す。 An example of specifically configuring a detection device using the detection element of the present invention will be shown.
素子と電源と固定抵抗を直列に接続し、素子に
10Vていどの定電圧を負荷する。素子のヒーター
に適当な電圧を負荷し、素子温度を一定に保つ。
固定抵抗の両端の出力をとり出し、増幅器に接続
してベル、発光ダイオード等の警報手段を動作さ
せるか、リレー等の制御回路を動作させる。 Connect the element, power supply, and fixed resistor in series, and
Load a constant voltage such as 10V. Apply an appropriate voltage to the element heater to keep the element temperature constant.
The output from both ends of the fixed resistor is taken out and connected to an amplifier to operate alarm means such as a bell or light emitting diode, or to operate a control circuit such as a relay.
ガス状水素化物の恕限度は、例えばSiH4(モノ
シラン)5ppm、B2H60.1ppm、PH30.3ppm、
AsH30.05ppmである。 The limits for gaseous hydrides are, for example, SiH 4 (monosilane) 5ppm, B 2 H 6 0.1ppm, PH 3 0.3ppm,
AsH3 is 0.05ppm.
前述したように、可燃性ガス検知用に普及して
いるSnO2の酸化物半導体が、ガス濃度に対応し
て抵抗値変化を起す性質を利用した検出方法にお
いて、従来の方法により製作された素子では、上
記恕限度を満たす検出感度を得ることはもちろん
その近くの検出感度を得ることも不可能であつ
た。 As mentioned above, in a detection method that utilizes the property of SnO 2 oxide semiconductor, which is widely used for combustible gas detection, to cause a change in resistance value in response to gas concentration, elements manufactured using conventional methods are used. In this case, it has been impossible to obtain a detection sensitivity that satisfies the above-mentioned limit, let alone a detection sensitivity that is close to it.
ところが、驚くべきことに本発明の方法で製作
した素子を用いると、恕限度を越えるか又は実用
上充分なほどの非常な高感度を得ることができ
る。 However, surprisingly, when using the device manufactured by the method of the present invention, it is possible to obtain a very high sensitivity that exceeds the limit or is sufficient for practical use.
本発明の方法においては、用いられる検出素子
が非常に安価に製作でき、かつ耐久性もあり、メ
ンテナンスも簡単である。しかもガス状水素化物
に対し従来の製法のものにない高い検出感度を有
している。 In the method of the present invention, the detection element used can be manufactured at a very low cost, is durable, and easy to maintain. Moreover, it has a high detection sensitivity for gaseous hydrides that is not found in conventional production methods.
またガス検知素子を用いた回路も簡単にできる
ので、全体の装置も従来実用化された方法に比較
してはるかに安価に製作できる。 Furthermore, since the circuit using the gas detection element can be easily constructed, the entire device can be manufactured at a much lower cost than conventional methods.
本発明の方法は、作業環境や高圧ガス設備での
漏洩ガス状水素化物の連続モニター検出やスポツ
ト検出に好適に適用できる。又半導体製造装置か
らの廃ガス中の残存ガス状水素化物量の測定も可
能である。 The method of the present invention can be suitably applied to continuous monitoring and spot detection of leaked gaseous hydrides in work environments and high-pressure gas equipment. It is also possible to measure the amount of gaseous hydrides remaining in waste gas from semiconductor manufacturing equipment.
以下に実施例により、本発明を詳細に説明する
がこれらはあくまで例示であり本発明の技術的範
囲は、それらに拘束されるものではない。 The present invention will be described in detail below with reference to Examples, but these are merely illustrative and the technical scope of the present invention is not restricted thereto.
実施例 1
四塩化錫300gと硝酸アルミニウム5gを水1
に溶解する。Example 1 300g of tin tetrachloride and 5g of aluminum nitrate in 1 part of water
dissolve in
一方、水1当り硝酸アンモニア150gとアン
モニア150gを溶解した水溶液を用意し、PH6.8に
なるまで撹拌しつつ滴下する。大量の白色沈澱を
別し、1回水洗した後、400℃にて仮焼する。 On the other hand, prepare an aqueous solution in which 150 g of ammonia nitrate and 150 g of ammonia are dissolved per 1 water, and add dropwise to the solution while stirring until the pH reaches 6.8. A large amount of white precipitate is separated, washed once with water, and then calcined at 400°C.
得られた仮焼物に塩化パラジウム(PdCl2)
0.1wt%、シリカゾル0.1wt%、さらに2%ポリビ
ニールアルコール水溶液適当量を加え、充分撹拌
し混合してペーストにする。 Palladium chloride (PdCl 2 ) is added to the resulting calcined product.
Add 0.1wt% silica sol, 0.1wt% silica sol, and an appropriate amount of 2% polyvinyl alcohol aqueous solution, stir thoroughly and mix to form a paste.
このペーストを、両端に電極を有するアルミナ
製担体に塗布し、1晩風乾する。 This paste is applied to an alumina carrier with electrodes at both ends and air-dried overnight.
しかるのち600℃、2hr焼成して素子を作る。 Afterwards, it is baked at 600℃ for 2 hours to make the element.
担体両端にある電極の一方はヒーターを兼ねて
おりこの素子と電源と固定抵抗を直列に結んだ回
路を構成し、出力は固定抵抗の両端からとり出す
ようにする。 One of the electrodes at both ends of the carrier also serves as a heater, and a circuit is formed in which this element, a power source, and a fixed resistor are connected in series, and the output is taken out from both ends of the fixed resistor.
素子温度を170℃に設定して、モノシランの検
出を行つた。結果は、素子の空気中での抵抗
(Va)とモノシランを検出した時の抵抗(Vg)
の比抵抗変化率(Va/Vg)で表示する。 Monosilane was detected with the element temperature set at 170°C. The results are the resistance of the element in air (Va) and the resistance when monosilane is detected (Vg).
Displayed as the rate of change in specific resistance (Va/Vg).
結果は第1図に示す。 The results are shown in Figure 1.
モノシランの恕限度5ppmより低い濃度まで充
分に検出できることがわかる。 It can be seen that concentrations lower than the monosilane limit of 5 ppm can be detected satisfactorily.
実施例 2
四塩化スズ300gと硝酸アルミニウム5gを水
1に溶解する。Example 2 300 g of tin tetrachloride and 5 g of aluminum nitrate are dissolved in 1 part of water.
一方、水1当り硝酸アンモニア100gとアン
モニア150gを溶解した水溶液を用意し、PH6.5に
なるまで、撹拌しつつ滴下する。大量の白色沈澱
を別し、1回水洗した後、500℃にて仮焼する。 On the other hand, prepare an aqueous solution in which 100 g of ammonia nitrate and 150 g of ammonia are dissolved per 1 water, and add dropwise while stirring until the pH reaches 6.5. A large amount of white precipitate is separated, washed once with water, and then calcined at 500°C.
得られた仮焼物に塩化パラジウム(PdCl2)
0.5wt%、ガラスフリツト0.1wt%さらに2%ポリ
ビニールアルコール水溶液適当量を加え、充分撹
拌し混合してペーストにする。 Palladium chloride (PdCl 2 ) is added to the resulting calcined product.
Add 0.5wt% glass frit, 0.1wt% glass frit, and an appropriate amount of 2% polyvinyl alcohol aqueous solution, stir thoroughly and mix to form a paste.
このペーストを両端に電極を有するアルミナ担
体に塗布し、1晩風乾する。 This paste is applied to an alumina support with electrodes at both ends and air-dried overnight.
しかるのち650℃、2hr焼成して素子を作る。 Afterwards, it is baked at 650℃ for 2 hours to make the element.
以下実施例1と同様にして回路を構成し、チツ
ソ中のモノシランガスを検定した。 Thereafter, a circuit was constructed in the same manner as in Example 1, and monosilane gas in the chisel was assayed.
素子温度は250℃に設定した。 The element temperature was set at 250°C.
結果を第2図に示す。 The results are shown in Figure 2.
モノシランの恕限度5ppmより充分低い濃度ま
で測定できることがわかる。 It can be seen that it is possible to measure concentrations well below the 5 ppm limit for monosilane.
本発明の方法がガス状水素化物の検出方法とし
てきわめて高感度なものである理由は不明である
が、実質的に酸素の存在しない条件でも高感度で
あることから、素子に何らかの形でガス状水素化
物が吸着及び/又は反応し感度よく素子の電気伝
導度を変化させるためと推定できる。
The reason why the method of the present invention is extremely sensitive as a method for detecting gaseous hydrides is unknown, but since it is highly sensitive even under conditions where substantially no oxygen exists, It is presumed that this is because the hydride adsorbs and/or reacts and changes the electrical conductivity of the element with high sensitivity.
本発明の方法を採用することで安価でしかも高
感度でガス状水素化物を検知することができ工業
的に極めて価値がある。
By employing the method of the present invention, gaseous hydrides can be detected at low cost and with high sensitivity, making it extremely valuable industrially.
第1図および第2図は抵抗変化率とガス濃度の
関係を示すグラフである。
FIGS. 1 and 2 are graphs showing the relationship between resistance change rate and gas concentration.
Claims (1)
にアンモニアで中和して得た沈澱生成物を400〜
700℃で仮焼し次いで素子形状に成形し500〜700
℃で加熱焼結して得た素子の電気抵抗の変化を検
知することを特徴とするガス状水素化物の検出方
法。1. A precipitated product obtained by neutralizing an aqueous solution of tin tetrachloride with ammonia in the coexistence of ammonium nitrate,
Calcinate at 700℃ and then form into an element shape with a temperature of 500 to 700℃.
A method for detecting gaseous hydrides characterized by detecting changes in electrical resistance of an element obtained by heating and sintering at °C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23746184A JPS61116651A (en) | 1984-11-13 | 1984-11-13 | Detection of gaseous hydride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23746184A JPS61116651A (en) | 1984-11-13 | 1984-11-13 | Detection of gaseous hydride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116651A JPS61116651A (en) | 1986-06-04 |
| JPH053906B2 true JPH053906B2 (en) | 1993-01-18 |
Family
ID=17015678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23746184A Granted JPS61116651A (en) | 1984-11-13 | 1984-11-13 | Detection of gaseous hydride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61116651A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03287057A (en) * | 1990-04-04 | 1991-12-17 | Fuji Electric Co Ltd | Production of gas sensor |
| CN1304297C (en) * | 2004-04-29 | 2007-03-14 | 上海交通大学 | Process for preparing nano-crystalline SnO2 powder |
| JP7634354B2 (en) * | 2020-10-14 | 2025-02-21 | 大阪瓦斯株式会社 | Temperature control method for gas detection device and temperature control device for gas detection device |
| JP7638078B2 (en) * | 2020-10-14 | 2025-03-03 | 大阪瓦斯株式会社 | Temperature control method for gas detection device and temperature control device for gas detection device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5125159A (en) * | 1974-08-27 | 1976-03-01 | Mitsui Shipbuilding Eng | Yoatsuoryoshita ekimenreberukeisokuhoho |
| JPS59131152A (en) * | 1983-01-16 | 1984-07-27 | Esutetsuku:Kk | reducing gas sensor |
| JPS61116650A (en) * | 1984-11-09 | 1986-06-04 | Esutetsuku:Kk | Planar type reducing gas sensor |
-
1984
- 1984-11-13 JP JP23746184A patent/JPS61116651A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61116651A (en) | 1986-06-04 |
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