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JPH053907B2 - - Google Patents
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JPH053907B2 - - Google Patents

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Publication number
JPH053907B2
JPH053907B2 JP59238288A JP23828884A JPH053907B2 JP H053907 B2 JPH053907 B2 JP H053907B2 JP 59238288 A JP59238288 A JP 59238288A JP 23828884 A JP23828884 A JP 23828884A JP H053907 B2 JPH053907 B2 JP H053907B2
Authority
JP
Japan
Prior art keywords
hydrochloric acid
aqueous solution
detection
gaseous
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59238288A
Other languages
Japanese (ja)
Other versions
JPS61117443A (en
Inventor
Tetsuya Iwao
Katsuji Morii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP23828884A priority Critical patent/JPS61117443A/en
Publication of JPS61117443A publication Critical patent/JPS61117443A/en
Publication of JPH053907B2 publication Critical patent/JPH053907B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はガス状水素化物の検出方法に関する。
詳しくは特定の方法で得られた酸化スズ素子の電
気抵抗の変化によつてガス状水素化物を検出する
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for detecting gaseous hydrides.
Specifically, the present invention relates to a method of detecting gaseous hydrides based on changes in electrical resistance of a tin oxide element obtained by a specific method.

〔従来の技術〕[Conventional technology]

近来の半導体工業の進歩に伴いシラン、ジシラ
ンなどのエピタキシヤル用ガスやジボラン、ホス
フイン、アルミン、ゲルマンなどのドーピング用
ガスの使用量が大幅に増大している。
With recent advances in the semiconductor industry, the usage of epitaxial gases such as silane and disilane, and doping gases such as diborane, phosphine, alumin, and germane has increased significantly.

これらのガス状水素化物は可燃性、自然性、毒
性など微量でも流出すると健康上保安上問題が生
ずるため、微量のガス状水素化物の検出方法の開
発が望まれている。
These gaseous hydrides are flammable, natural, and toxic, and if even a trace amount of these gaseous hydrides leak out, they pose a health and safety problem, so it is desired to develop a method for detecting trace amounts of gaseous hydrides.

これに対して定電位電解法、ガルバニル電池
法、IR法、UV法、化学発光法などが知られてい
るがいずれも高価であるとかメンテナンスが煩雑
でかつ経費がかかるとか、検出部が大型でしかも
脆弱であるとかの問題がある。一方酸化スズなど
の半導体検知素子はメタン、プロパン、エタノー
ル、アセトンなどの可燃性ガスに対しては感度が
良好であるものの上記ガス状水素化物に対しては
感度が不良である。これに対しては、特定の処理
を施した酸化スズがガス状水素化物の存在によつ
て熱伝導の変化を起こすことを利用した検知素子
が知られている(新コスモス電機株式会社技術資
料No.SK−2011)。
In contrast, known methods include constant potential electrolysis, galvanic cell method, IR method, UV method, and chemiluminescence method, but all of them are expensive, require complicated and costly maintenance, and have large detection units. Moreover, there is the problem of vulnerability. On the other hand, semiconductor sensing elements such as tin oxide have good sensitivity to flammable gases such as methane, propane, ethanol, and acetone, but have poor sensitivity to the above-mentioned gaseous hydrides. To deal with this, a sensing element is known that utilizes the fact that tin oxide, which has been subjected to a specific treatment, causes a change in thermal conductivity due to the presence of gaseous hydrides (New Cosmos Electric Co., Ltd. Technical Data No. .SK−2011).

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上述の半導体検知素子を利用する方法は検出装
置が簡単で耐久性に優れているが通常の可燃性ガ
ス用の検知素子では感度が不充分であり、又熱伝
導を利用する方法は、検知素子加熱用のヒーター
の抵抗を使用するものであり検知素子の製造が難
しいという問題があつた。
The above-mentioned method using a semiconductor detection element has a simple detection device and excellent durability, but the sensitivity is insufficient with a normal detection element for combustible gas, and the method using thermal conduction has a simple detection device and excellent durability. There was a problem in that the sensing element was difficult to manufacture because it used the resistance of the heater for heating.

本発明者らは上記問題を解決する方法について
鋭意検討した結果、ガス状水素化物の検知用とし
ては不適当とされた可燃性ガス用検知素子が、特
定の製造法で作られた酸化スズを用い特定の方法
で素子とされたものであればガス状水素化物用検
知素子として高感度でしかも選択性良く検知でき
さらには機械的強度も向上するという優れた性質
を有するものであることを見い出し本発明を完成
した。
As a result of intensive studies by the present inventors on ways to solve the above problems, it was found that the detection element for combustible gas, which was deemed unsuitable for detecting gaseous hydrides, uses tin oxide made by a specific manufacturing method. It was discovered that if the device is made into an element using a specific method, it can be used as a detection element for gaseous hydrides with high sensitivity and selectivity, and has excellent properties such as improved mechanical strength. The invention has been completed.

〔発明の目的〕 本発明の目的は高感度でガス状水素化物を検知
する方法を提供することにある。
[Object of the Invention] An object of the present invention is to provide a method for detecting gaseous hydrides with high sensitivity.

〔問題点を解決するための手段〕[Means for solving problems]

即ち本発明は四塩化スズ(SnCl4)水溶液を硝
酸アンモニウム(NH4NO3)共存下にアンモニ
ア(NH3)で中和して得た沈澱生成物を400〜
700℃で仮焼して、粉末を得て、該粉末を塩酸と
接触させて後素子形状に成形し、500〜700℃で加
熱焼結して得た素子の電気抵抗の変化を検知する
ことを特徴とするガス状水素化物の検出方法であ
る。
That is, the present invention uses a precipitated product obtained by neutralizing an aqueous solution of tin tetrachloride (SnCl 4 ) with ammonia (NH 3 ) in the coexistence of ammonium nitrate (NH 4 NO 3 ).
Calcining at 700°C to obtain powder, contacting the powder with hydrochloric acid, forming it into an element shape, heating and sintering at 500 to 700°C, and detecting changes in electrical resistance of the obtained element. A method for detecting gaseous hydrides is characterized by:

本発明において対象とするガス状水素化物とし
てはケイ素、ホウ素、リン、ゲルアニウム、ヒ素
の水素化物でありモノシラン、ジシラン、ボラ
ン、ジボランのごときモノ体、ジ体のみならず他
のガスで希釈されていても良く、さらにガス状で
あればそれ以上のポリ体をも含有する。
The gaseous hydrides targeted in the present invention include hydrides of silicon, boron, phosphorus, germanium, and arsenic, which are diluted with not only mono- and di-forms such as monosilane, disilane, borane, and diborane, but also other gases. Furthermore, if it is in a gaseous state, it may also contain a larger amount of poly.

又本発明における特徴の一つは仮焼した酸化錫
からなる粉末をさらに塩酸と接触処理することに
ある。この操作によってガス状水素化物の検知感
度が大幅に改良される。この酸化錫からなる粉末
を塩酸で処理する方法は例えば特公昭50−26239
ですでに知られておりその方法をそのまま適用す
ることができる。
One of the features of the present invention is that the calcined tin oxide powder is further contacted with hydrochloric acid. This operation greatly improves the detection sensitivity of gaseous hydrides. For example, a method of treating powder made of tin oxide with hydrochloric acid is disclosed in Japanese Patent Publication No. 50-26239.
This method is already known and can be applied as is.

本発明の方法においては塩酸と接触させるべき
酸化錫粉末をいかなる製造法で形成するかという
ことである。
In the method of the present invention, the question is how to form the tin oxide powder to be brought into contact with hydrochloric acid.

例えば、四塩化錫をアンモニアで中和して得た
ような通常の酸化錫に塩酸と接触する処理を行つ
ても、素子の機械的強度の目安とされる硬度の向
上はさして起らないが、本発明のように四塩化錫
を硝酸アンモニウムの存在下にアンモニアで中和
して得た酸化錫の場合には、驚くべきことに、塩
酸と接触させることにより予想を越えた硬度の向
上が起るのである。
For example, even if ordinary tin oxide, such as that obtained by neutralizing tin tetrachloride with ammonia, is treated by contacting it with hydrochloric acid, the hardness, which is a measure of the mechanical strength of an element, does not improve much. In the case of tin oxide obtained by neutralizing tin tetrachloride with ammonia in the presence of ammonium nitrate as in the present invention, surprisingly, an unexpected improvement in hardness occurs when brought into contact with hydrochloric acid. It is.

以下に本発明を詳述する。 The present invention will be explained in detail below.

本発明の素子は以下の四つの工程を経て製造さ
れる。
The device of the present invention is manufactured through the following four steps.

(イ) 四塩化錫水溶液を硝酸アンモニウム共存下に
アンモニアで中和して沈澱生成物を得る工程、 (ロ) 沈澱生成物を400〜700℃で仮焼する工程、 (ハ) 仮焼して得た粉末を塩酸と接触させる工程、 (ニ) 塩酸と接触させた後、粉末を素子形状に成形
し、500〜700℃で加熱焼結して検知素子を製作
する工程、である。
(a) a step of neutralizing an aqueous tin tetrachloride solution with ammonia in the coexistence of ammonium nitrate to obtain a precipitated product; (b) a step of calcining the precipitated product at 400 to 700°C; (c) a step of calcining the precipitated product. (iv) After contacting with hydrochloric acid, the powder is molded into an element shape and heated and sintered at 500 to 700°C to produce a sensing element.

(イ)の工程は、SnCl4水溶液を硝酸アンモニウム
共存下にNH3で中和してβ錫酸(〔H2SnO35
を主成分とする白色沈澱を製造する工程である。
In the step (a), a SnCl 4 aqueous solution is neutralized with NH 3 in the coexistence of ammonium nitrate to form β-stannic acid ([H 2 SnO 3 ] 5 ).
This is a process to produce a white precipitate whose main component is

なお、アンモニアはSnCl4水溶液にガスで吹き
込んでもよいし液安として供給してもよいが、操
作の容易性の点で水溶液の形で供給するのが好ま
しい。
Note that ammonia may be blown into the SnCl 4 aqueous solution as a gas or may be supplied as a liquid solution, but from the viewpoint of ease of operation, it is preferable to supply it in the form of an aqueous solution.

ここで使用するSnCl4水溶液の濃度は20〜40wt
%、水溶液の場合はNH3水溶液の濃度は10〜
30wt%、NH4NO3水溶液の濃度は5〜30wt%が
それぞれ好ましい。
The concentration of SnCl 4 aqueous solution used here is 20~40wt
%, for aqueous solution the concentration of NH3 aqueous solution is 10 ~
The concentration of the NH 4 NO 3 aqueous solution is preferably 30 wt% and 5 to 30 wt%, respectively.

NH3水溶液とNH4NO3水溶液は、前もつて混
合して加えても、各別に加えても良い。ただしそ
の場合NH4NO3水溶液を先に加えて後NH3水溶
液を加える必要がある。
The NH 3 aqueous solution and the NH 4 NO 3 aqueous solution may be mixed in advance and added, or may be added separately. However, in that case, it is necessary to add the NH 4 NO 3 aqueous solution first and then add the NH 3 aqueous solution.

中和点のPHは、6.5〜7.5であるが、より好まし
くは6.8〜7.0である。
The pH of the neutralization point is 6.5 to 7.5, more preferably 6.8 to 7.0.

(ロ)の工程は、(イ)の工程で作られた白色沈澱を、
仮焼してSnO2を製造する工程である。
In step (b), the white precipitate produced in step (b) is
This is the process of producing SnO 2 by calcining.

この仮焼温度は、400〜700℃が好ましい。 This calcination temperature is preferably 400 to 700°C.

400℃未満では、SnCl4の残存率が高く、吸湿
性が大で特性が不安定である。また700℃を越え
ると活性点がなくなつてしまうせいか通常の
SnO2の性能と大差なくなつてしまう。
Below 400°C, the residual rate of SnCl 4 is high, hygroscopicity is large, and the properties are unstable. Also, if the temperature exceeds 700℃, the active sites disappear, so the normal
The performance is not much different from that of SnO 2 .

特公昭51−25159号では、仮焼温度を500〜700
℃としているが、本発明の目的のためには、500
℃以上である必要はなく、400℃以上で充分良好
な素子を作ることができる。
In Special Publication No. 51-25159, the calcination temperature was set at 500 to 700.
℃, but for the purposes of this invention, 500
The temperature does not need to be higher than 400°C, and a sufficiently good element can be produced at a temperature of 400°C or higher.

(ロ)の工程で作られるSnO2は決して純粋なSnO2
ではなく、Cl原子、水酸基等が残存しており、ま
た比表面積、細孔などの表面構造も特異的であ
り、これらがガス状水素化物を高感度かつ迅速に
検出しうる性質をSnO2に与えるものと思われる。
The SnO 2 produced in step (b) is never pure SnO 2
Rather, Cl atoms, hydroxyl groups, etc. remain, and the surface structure such as specific surface area and pores is also unique . It seems to be given.

(ハ)の工程は、(ロ)の工程で得られた仮焼後の粉末
を塩酸と接触させる工程である。
Step (c) is a step in which the calcined powder obtained in step (b) is brought into contact with hydrochloric acid.

塩酸の濃度は10wt%〜30wt%水溶液が好まし
い。
The concentration of hydrochloric acid is preferably 10 wt% to 30 wt% aqueous solution.

塩酸の温度は室温から60℃の範囲が好ましい。 The temperature of hydrochloric acid is preferably in the range of room temperature to 60°C.

塩酸と仮焼した粉末の接触方法は、通常用いら
れる固体と液体の接触方法のどのような方法を用
いても良い。典型的な例としては、塩酸に仮焼し
た粉末を撹拌しつつ混合添加し、一定時間放置後
過して(ニ)の工程に使用したり、風乾して後(ニ)の
工程に用いたりする。
The method for contacting the calcined powder with hydrochloric acid may be any commonly used method for contacting solids and liquids. Typical examples include mixing and adding calcined powder to hydrochloric acid while stirring, leaving it for a certain period of time and using it in step (d), or air-drying it and using it in the next step (d). do.

また別の例として適当量の塩酸を使用して、仮
焼した粉末と混合してペースト状とし、そのまま
(ニ)の工程に使用しても良い。
Another example is using an appropriate amount of hydrochloric acid, mixing it with the calcined powder to make a paste, and leaving it as is.
It may be used in the step (d).

この塩酸との接触処理により、SnO2表面に
HClの関与する表面構造や組成の変化が起りガス
状水素化物に対する検出感度の向上や素子製作工
程での焼結による素子の硬度向上が起るものと思
われる。
This contact treatment with hydrochloric acid causes the SnO2 surface to
It is thought that changes in the surface structure and composition caused by HCl occur, resulting in improved detection sensitivity for gaseous hydrides and improved hardness of the device due to sintering during the device fabrication process.

(ニ)の工程は、素子を製作する工程である。 Step (d) is a step of manufacturing an element.

上記(ロ)で作られたSnO2を適当な大きさの素子
形状に成型する。
The SnO 2 produced in (b) above is molded into an element shape of an appropriate size.

この場合、素子の形も大きさも任意であるが、
好ましい大きさは1mm角〜5mm角程度である。
In this case, the shape and size of the element can be arbitrary, but
The preferred size is about 1 mm square to 5 mm square.

そして素子の電気抵抗変化に応じて流れる電流
変化を測定するための1対の電極と素子を加熱す
るヒーターを具備する。一方の電極がヒーターを
兼ねていてもよい。電極の材質はPtやPd−Ir等
が用いられる。
The device is equipped with a pair of electrodes for measuring changes in current flowing in response to changes in electrical resistance of the element, and a heater for heating the element. One electrode may also serve as a heater. The material used for the electrodes is Pt, Pd-Ir, or the like.

素子を製作するためには、(ロ)のSnO2に水やポ
リビニールアルコール水溶液等の液体粘結剤やシ
リカゾルやガラスフリツト等加熱後、成型体に残
つて形状を維持する焼結助剤が添加される。さら
には、素子の強度維持やガス濃度変化に対する応
答特性をよくするためのアルミナ、ミリカアルミ
ナ、マグネシア等の無機助剤を添加するケースも
ある。
In order to manufacture the element, a liquid binder such as water or an aqueous polyvinyl alcohol solution, or a sintering aid that remains in the molded body and maintains its shape after heating is added to the SnO 2 in (b), such as silica sol or glass frit. be done. Furthermore, in some cases, inorganic auxiliaries such as alumina, milica alumina, and magnesia are added to maintain the strength of the element and improve response characteristics to changes in gas concentration.

また必要に応じ、検出ガスの選択性や高感度化
等を目的として、白金(Pt)、パラジウム(Pd)、
金(Au)、アンチモン(Sb)等の金属の酸化物
やハロゲン化物が添加される。
If necessary, platinum (Pt), palladium (Pd),
Metal oxides and halides such as gold (Au) and antimony (Sb) are added.

これらの好ましい添加量は、各々以下の通りで
ある。
The preferable addition amounts of these are as follows.

液体粘結剤は、充分な混合が行えかつ素子成型
が簡単に行なえるに必要な量であればよい。
The liquid binder may be used in an amount necessary to achieve sufficient mixing and to facilitate device molding.

焼結助剤は、少なすぎると効果がなくなり、多
すぎるとSnO2粒子をカバーして特性の発現を防
げるので、一般に0.01〜5wt%、好ましくは0.1〜
1wt%である。
If the sintering aid is too small, it will be ineffective, and if it is too large, it will cover the SnO 2 particles and prevent the development of properties, so it is generally 0.01-5wt%, preferably 0.1-5wt%.
It is 1wt%.

無機助剤は多すぎるとむしろ成型しにくくなる
ので、0〜10wt%の範囲が良い。
If the amount of inorganic auxiliary agent is too large, it will actually become difficult to mold, so a range of 0 to 10 wt% is preferable.

触媒は、少ないと効果がなく、多すぎると高価
なので、0.001〜1wt%が好ましい。
The catalyst is preferably 0.001 to 1 wt% since it is ineffective if it is too small and expensive if it is too large.

次に焼結温度は、500〜700℃が好ましい。 Next, the sintering temperature is preferably 500 to 700°C.

500未満では、液体粘結剤が残存したり焼結効
果が充分でなく好ましくない。また700℃を越え
ると、(ロ)と(ハ)の工程で得られた特性が失なわれて
しまう。
If it is less than 500, the liquid binder remains or the sintering effect is not sufficient, which is not preferable. Furthermore, if the temperature exceeds 700°C, the properties obtained in steps (b) and (c) will be lost.

さて本発明を実施する場合においては、(イ)(ロ)(ハ)
(ニ)の工程をそれぞれ経て、ガス検知素子を製作す
ることが必須である。
Now, when carrying out the present invention, (a), (b), and (c)
It is essential to manufacture the gas detection element through each of the steps (d).

例えば、(イ)の工程で、NH4NO3の添加を省略
して中和を行つて得た白色粉末を用いて、(ロ)(ハ)(ニ)
の工程を経由して素子を製作しても、ガス状水素
化物の検出感度は低いものしか得られない。
For example, using the white powder obtained by neutralizing without adding NH 4 NO 3 in step (a), (b) (c) (d)
Even if the device is manufactured through the above process, only a low detection sensitivity for gaseous hydrides can be obtained.

また(イ)の工程で、NH3のかわりにNaOH、
KOH、CaOH等のアルカリ金属、アルカリ土類
金属の水酸化物を用いて中和を行い、得られた白
色粉末を用いて、(ロ)(ハ)(ニ)の工程を経て素子を製作
しても、可燃性ガスの検出感度は同様にきわめて
悪い。
Also, in step (a), instead of NH3 , NaOH,
Neutralize using hydroxides of alkali metals and alkaline earth metals such as KOH and CaOH, and use the resulting white powder to manufacture devices through steps (b), (c), and (d). However, the detection sensitivity for combustible gases is also extremely poor.

また(イ)(ロ)の工程を省略した市販SnO2を入手し、
微粉砕して(ハ)(ニ)の工程を経てガス検知素子を製作
しても、ガス状水素化物の検出感度は非常に低
い。
In addition, we obtained commercially available SnO 2 that omitted steps (a) and (b),
Even if a gas detection element is produced by finely pulverizing it and going through the steps (c) and (d), the detection sensitivity of gaseous hydrides is very low.

さて(イ)(ロ)(ハ)(ニ)の工程を経て製作されたガス検

素子は、ガス状水素化物検出に用いられる時は、
温度100〜500℃の範囲で用いられる。
Now, when the gas detection element manufactured through the steps (a), (b), (c), and (d) is used for gaseous hydride detection,
Used at temperatures ranging from 100 to 500°C.

半導体工場では、ガス状水素化物の1つモノシ
ランが希釈ガス、水素と共に使用される場合が多
い。このような状態でモノシランだけを選択的に
検出することは非常に重要である。
In semiconductor factories, monosilane, a gaseous hydride, is often used together with a diluent gas, hydrogen. It is very important to selectively detect only monosilane under such conditions.

そのような場合には、素子温度を100〜200℃に
設定して使用すればよい。SnO2等酸化物半導体
を用いた検知素子は、H2エチルアルコール、プ
ロパン等の可燃性ガスに対しては、素子温度が高
温になるほど検出感度が高くなり、逆に素子温度
が低くなると検出感度が低くなる性質を有すると
ころ、本発明の検知素子は特にこの性質が強く、
素子温度が低くなると全く検出感度がなくなるか
らである。一方、ガス状水素化物例えば、モノシ
ランに対しては驚くべきことに、低い素子温度の
範囲で検出感度のピークがあるのである。
In such a case, the element temperature may be set at 100 to 200°C. Sensing elements using oxide semiconductors such as SnO2 have higher detection sensitivity for flammable gases such as H2ethyl alcohol and propane, and the higher the element temperature, the higher the detection sensitivity.Conversely, the lower the element temperature, the lower the detection sensitivity. The sensing element of the present invention has a property that this property is low, and the sensing element of the present invention has this property particularly strongly.
This is because when the element temperature becomes low, there is no detection sensitivity at all. On the other hand, surprisingly, for gaseous hydrides such as monosilane, there is a detection sensitivity peak in the low element temperature range.

またモノシランは、不活性ガス例えば、N2
Ar2、H2等O2以外のガス中で使用される。した
がつて不活性ガス中のモノシランを検出すること
も重要である。
Monosilane can also be used with inert gases such as N 2 ,
Used in gases other than O 2 such as Ar 2 and H 2 . Therefore, it is also important to detect monosilane in inert gas.

通常SnO2等酸化物半導体を用いた検知素子は、
空気中即ちO2存在下では可燃性ガスに対する検
出感度は高いが不活性ガス中では検出感度は低
い。
Normally, sensing elements using oxide semiconductors such as SnO2 are
The detection sensitivity for combustible gases is high in air, that is, in the presence of O 2 , but the detection sensitivity is low in inert gases.

ところが、本発明の検知素子は、ガス状水素化
物に対して、驚くべきことに、不活性ガス中でも
空気中と同じレベルの高い検出感度を示すのであ
る。
However, the sensing element of the present invention surprisingly exhibits high detection sensitivity for gaseous hydrides even in an inert gas at the same level as in air.

本発明の検知素子は、ガス状水素化物の濃度に
対応して素子の電気抵抗が変化する。そこで、そ
の変化を利用して、素子と電源、そして警報手段
又は制御回路を含む回路を構成しガス状水素化物
を検出する。
In the sensing element of the present invention, the electrical resistance of the element changes depending on the concentration of gaseous hydride. Therefore, by utilizing this change, a circuit including an element, a power source, and an alarm means or a control circuit is configured to detect gaseous hydride.

本発明の検知素子を用いて具体的に検出装置を
構成する一例を示す。
An example of specifically configuring a detection device using the detection element of the present invention will be shown.

素子と電源と固定抵抗を直列に接続し、素子に
10Vていどの定電圧を負荷する。素子のヒーター
に適当な電圧を負荷し、素子温度を一定に保つ。
固定抵抗の両端の出力をとり出し、増幅器に接続
してベル、発光ダイオード等の警報手段を動作さ
せるか、リレー等の制御回路を動作させる。
Connect the element, power supply, and fixed resistor in series, and
Load a constant voltage such as 10V. Apply an appropriate voltage to the element heater to keep the element temperature constant.
The output from both ends of the fixed resistor is taken out and connected to an amplifier to operate alarm means such as a bell or light emitting diode, or to operate a control circuit such as a relay.

ガス状水素化物の恕限度は、例えば、SiH4(モ
ノシラン)5ppm、B2H60.1ppm、PH30.3ppm、
AsH30.05ppmである。
The limits for gaseous hydrides are, for example, SiH 4 (monosilane) 5ppm, B 2 H 6 0.1ppm, PH 3 0.3ppm,
AsH3 is 0.05ppm.

前述したように、可燃性ガス検知用に普及して
いるSnO2等の酸化物半導体が、ガス濃度に対応
して抵抗値変化を起す性質を利用した検出方法に
おいて、従来の方法により製作された素子では、
上記恕限度を満たす検出感度を得ることはもちろ
んその近くの検出感度を得ることも不可能であつ
た。
As mentioned above, oxide semiconductors such as SnO 2 , which are popular for flammable gas detection, are fabricated using conventional methods in detection methods that utilize the property of causing resistance value changes in response to gas concentration. In Motoko,
It has been impossible to obtain a detection sensitivity that satisfies the above-mentioned limit, or even close to it.

ところが、驚くべきことに本発明の方法で製作
した素子を用いると、恕限度を越えるか又は、実
用上充分なほどの非常な高感度を得ることができ
る。
However, surprisingly, when using the device manufactured by the method of the present invention, it is possible to obtain extremely high sensitivity that exceeds the limit or is sufficient for practical use.

本発明の素子は、本発明者らがすでに提案して
いる方法に塩酸と接触させる工程を加えることに
よつて、ガス状水素化物の検知感度が一段と向上
するばかりでなく、従来の知見では予想しえない
ほど大きな素子硬度の向上が起る。その結果、素
子の機械的強度、耐久性がはるかに向上したので
ある。
By adding a step of contacting with hydrochloric acid to the method already proposed by the present inventors, the device of the present invention not only further improves the detection sensitivity of gaseous hydrides, but also has a An incredibly large improvement in element hardness occurs. As a result, the mechanical strength and durability of the device have been significantly improved.

本発明の方法では、用いられる検出素子が非常
に安価に製作でき、かつ耐久性もありメンテナン
スも簡単である。そしてガス状水素化物に対し従
来の製法のものにない高い検出感度を有してい
る。
In the method of the present invention, the detection element used can be manufactured at a very low cost, is durable, and easy to maintain. It also has a high detection sensitivity for gaseous hydrides that is not found in conventional production methods.

そのガス検知素子を用いた回路も簡単にできる
ので、全体の装置も、従来実用化された方法に比
較してはるかに安価に製作できる。
Since the circuit using the gas detection element can be easily constructed, the entire device can be manufactured at a much lower cost than conventional methods.

本発明の方法は、作業環境や高圧ガス設備での
ろうえいガス状水素化物の連続モニター検出やス
ポツト検出に適用できる。又、半導体製造装置か
らの廃ガス中の残存ガス状水素化物量の測定も可
能である。
The method of the present invention can be applied to continuous monitoring and spot detection of waxy gaseous hydrides in work environments and high pressure gas equipment. It is also possible to measure the amount of gaseous hydride remaining in waste gas from semiconductor manufacturing equipment.

以下に実施例により詳細に説明するが、本発明
の範囲はそれに拘束されるものではない。
Examples will be described in detail below, but the scope of the present invention is not limited thereto.

実施例 1 SnCl4300gと硝酸アルミニウム5gを水1
に溶解する。
Example 1 300 g of SnCl 4 and 5 g of aluminum nitrate were added to 1 part of water.
dissolve in

一方水1当りNH4NO3150gとNH3170gを
溶解した水溶液を用意し、PH7.0になるまで撹拌
しつつ滴下する。大量の白色沈澱を別し、1回
水洗した後、400℃にて仮焼する。
On the other hand, prepare an aqueous solution in which 150 g of NH 4 NO 3 and 170 g of NH 3 are dissolved per 1 portion of water, and add dropwise to the solution while stirring until the pH reaches 7.0. A large amount of white precipitate is separated, washed once with water, and then calcined at 400°C.

仮焼後の粉末を27%塩酸に撹拌しつつ混合し、
30分撹拌を続けてペースト状にする。
Mix the calcined powder with 27% hydrochloric acid while stirring,
Continue stirring for 30 minutes to form a paste.

できたペーストに塩化パラジウム(PdCl2
0.1wt%、シリカゾル0.1wt%、さらに2%ポリビ
ニールアルコール水溶液適当量を加え充分撹拌し
混合する。
Add palladium chloride (PdCl 2 ) to the resulting paste.
Add 0.1 wt% silica sol, 0.1 wt% silica sol, and an appropriate amount of a 2% polyvinyl alcohol aqueous solution, and stir thoroughly to mix.

このペーストを、両端に電極を有するアルミナ
製担体に塗布し、1晩風乾する。
This paste is applied to an alumina carrier with electrodes at both ends and air-dried overnight.

しかるのち600℃、2hr焼成して素子を作る。 Afterwards, it is baked at 600℃ for 2 hours to make the element.

この素子と電源と固定抵抗を直列に結んだ回路
を構成し、出力は固定抵抗の両端からとり出すよ
うにする。
A circuit is constructed in which this element, a power supply, and a fixed resistor are connected in series, and the output is taken out from both ends of the fixed resistor.

素子温度を170℃に設定してモノシランの検出
を行つた。結果は、素子の空気中での抵抗(Va)
とモノシランを検出した時の抵抗(Vg)の比、
抵抗変化率(Va/Vg)で表示する。
Monosilane was detected with the element temperature set at 170°C. The result is the resistance of the element in air (Va)
and the resistance (Vg) when monosilane is detected,
Displayed as resistance change rate (Va/Vg).

結果は第1図に示す。 The results are shown in Figure 1.

モノシランの恕限度5ppmより低い濃度まで充
分に検出できることがわかる。
It can be seen that concentrations lower than the monosilane limit of 5 ppm can be detected satisfactorily.

また木屋式硬度計で測定して硬度は200gであ
つた。
The hardness was 200g when measured using a Kiya hardness tester.

比較例 1 実施例1の操作中、仮焼後の粉末を27%の塩酸
と接触させる操作を除いて、そのほかは実施例1
と同様に行つた。
Comparative Example 1 During the operation of Example 1, except for the operation of contacting the calcined powder with 27% hydrochloric acid, the other steps were as in Example 1.
I went in the same way.

即ち、仮焼後の粉末は2%ポリビニールアルコ
ール水溶液適当量でペーストにして添加物を加え
以後実施例1と同様に行つた。
That is, the powder after calcination was made into a paste with an appropriate amount of 2% aqueous polyvinyl alcohol solution, and additives were added thereto, and the same procedure as in Example 1 was carried out.

結果は、SiH4濃度10ppmで抵抗変化率は7で
あつた。
As a result, the resistance change rate was 7 at a SiH 4 concentration of 10 ppm.

また木屋式硬度計で測定した硬度は20gであつ
た。
Moreover, the hardness measured with a Kiya type hardness meter was 20 g.

比較例 2 中和に用いるアンモニア水溶液に、NH4NO3
を添加する操作を除いて、そのほかは実施例1と
同様に行つた。
Comparative Example 2 NH 4 NO 3 was added to the ammonia aqueous solution used for neutralization.
The same procedure as in Example 1 was carried out except for the addition of .

結果は、SiH4濃度10ppmで抵抗変化率は1.4で
あつた。
As a result, the resistance change rate was 1.4 at a SiH 4 concentration of 10 ppm.

また木屋式硬度計で測定した硬度は40gであつ
た。
The hardness measured using a Kiya hardness tester was 40g.

実施例 2 SnCl4300gと硝酸アルミニウム5gを水1
に溶解する。
Example 2 300 g of SnCl 4 and 5 g of aluminum nitrate were added to 1 part of water.
dissolve in

一方水1当りNH4NO3100gとNH3150gを
溶解した水溶液を用意し、PH7.0になるまで撹拌
しつつ滴下する。大量の白色沈澱を別し、1回
水洗した後、500℃にて仮焼する。
On the other hand, prepare an aqueous solution in which 100 g of NH 4 NO 3 and 150 g of NH 3 are dissolved per 1 portion of water, and add dropwise to the solution while stirring until the pH reaches 7.0. A large amount of white precipitate is separated, washed once with water, and then calcined at 500°C.

仮焼後の粉末を25%塩酸に撹拌しつつ混合し、
1時間撹拌を続けしかるのち過する。
Mix the calcined powder with 25% hydrochloric acid while stirring,
Continue stirring for 1 hour and then age.

得られたケーキに塩化パラジウム(PdCl2
0.5wt%、ガラスフリツト0.1wt%さらに2%ポリ
ビニールアルコール水溶液適当量を加え、充分撹
拌し混合してペーストにする。
Add palladium chloride (PdCl 2 ) to the resulting cake
Add 0.5wt% glass frit, 0.1wt% glass frit, and an appropriate amount of 2% polyvinyl alcohol aqueous solution, stir thoroughly and mix to form a paste.

このペーストを両端に電極を有するアルミナ担
体に塗布し1晩風乾する。
This paste is applied to an alumina support having electrodes at both ends and air-dried overnight.

しかるのち600℃、2hr焼成して素子を作る。 Afterwards, it is baked at 600℃ for 2 hours to make the element.

以下実施例1と同様にして回路を構成い、チツ
ソ中のモノシランガスを検定した。
Thereafter, a circuit was constructed in the same manner as in Example 1, and the monosilane gas in the chitso was tested.

素子温度は250℃に設定した。 The element temperature was set at 250°C.

結果を第2図に示す。 The results are shown in Figure 2.

モノシランの恕限度5ppmより充分低い濃度ま
で測定できる。
It can measure concentrations well below the 5ppm limit for monosilane.

また木屋式硬度計で測定した硬度は250gであ
つた。
The hardness measured using a Kiya hardness tester was 250g.

〔作用効果〕[Effect]

本発明の方法がガス状水素化物の検出方法とし
てきわめて高感度である理由は不明であるが、実
質的に酸素の存在しない条件でも高感度であるこ
とから素子に何らかの形でガス状水素化物が吸着
及び/又は反応し、感度よく素子の電気伝導度を
変化させるためと推定できる。
The reason why the method of the present invention is extremely sensitive as a method for detecting gaseous hydrides is unknown, but it is highly sensitive even under conditions where substantially no oxygen exists, so gaseous hydrides may be detected in some form in the element. It is presumed that this is because it adsorbs and/or reacts and changes the electrical conductivity of the element with good sensitivity.

〔産業上の利用可能性〕[Industrial applicability]

本発明の方法を採用することで安価でしかも高
感度でガス状水素化物を検知することができ工業
的に極めて価値がある。
By employing the method of the present invention, gaseous hydrides can be detected at low cost and with high sensitivity, making it extremely valuable industrially.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は抵抗変化率とガス濃度の
関係を示すグラフである。
FIGS. 1 and 2 are graphs showing the relationship between resistance change rate and gas concentration.

Claims (1)

【特許請求の範囲】[Claims] 1 四塩化錫水溶液を硝酸アンモニウム共存下に
アンモニアで中和して得た沈澱生成物を400〜700
℃で仮焼して粉末を得て該粉末を塩酸と接触させ
て後、素子形状に成形し、500〜700℃で加熱焼結
して得た素子の電気抵抗の変化を検知することを
特徴とするガス状水素化物の検出方法。
1. A precipitated product obtained by neutralizing a tin tetrachloride aqueous solution with ammonia in the coexistence of ammonium nitrate is 400 to 700
It is characterized by detecting changes in the electrical resistance of the obtained element by calcining it at ℃ to obtain a powder, contacting the powder with hydrochloric acid, molding it into an element shape, and heating and sintering it at 500 to 700 ℃. A method for detecting gaseous hydrides.
JP23828884A 1984-11-14 1984-11-14 Detection of gaseous hydride Granted JPS61117443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23828884A JPS61117443A (en) 1984-11-14 1984-11-14 Detection of gaseous hydride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23828884A JPS61117443A (en) 1984-11-14 1984-11-14 Detection of gaseous hydride

Publications (2)

Publication Number Publication Date
JPS61117443A JPS61117443A (en) 1986-06-04
JPH053907B2 true JPH053907B2 (en) 1993-01-18

Family

ID=17027959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23828884A Granted JPS61117443A (en) 1984-11-14 1984-11-14 Detection of gaseous hydride

Country Status (1)

Country Link
JP (1) JPS61117443A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0572163A (en) * 1990-11-30 1993-03-23 Mitsui Mining Co Ltd Semiconductor type gas sensor
JP4996171B2 (en) * 2006-08-21 2012-08-08 エフアイエス株式会社 Hydrogen gas sensor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1401918A (en) * 1973-03-07 1975-08-06 Staples Dev Ltd Suction attachment means for supporting articles upon road vehicles
JPS5125159A (en) * 1974-08-27 1976-03-01 Mitsui Shipbuilding Eng Yoatsuoryoshita ekimenreberukeisokuhoho
JPS59131152A (en) * 1983-01-16 1984-07-27 Esutetsuku:Kk reducing gas sensor

Also Published As

Publication number Publication date
JPS61117443A (en) 1986-06-04

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