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JPH054825B2 - - Google Patents
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JPH054825B2 - - Google Patents

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Publication number
JPH054825B2
JPH054825B2 JP61239513A JP23951386A JPH054825B2 JP H054825 B2 JPH054825 B2 JP H054825B2 JP 61239513 A JP61239513 A JP 61239513A JP 23951386 A JP23951386 A JP 23951386A JP H054825 B2 JPH054825 B2 JP H054825B2
Authority
JP
Japan
Prior art keywords
film
cds
cdte
electrode
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61239513A
Other languages
Japanese (ja)
Other versions
JPS6393172A (en
Inventor
Naoki Suyama
Takeshi Hibino
Jutaro Kita
Mikio Murozono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61239513A priority Critical patent/JPS6393172A/en
Publication of JPS6393172A publication Critical patent/JPS6393172A/en
Publication of JPH054825B2 publication Critical patent/JPH054825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials

Landscapes

  • Photovoltaic Devices (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は太陽電池、特に室内民生用機器の電源
として使用可能な印刷型の薄膜CdS/CdTe構造
の光起電力素子に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a photovoltaic device having a printed thin film CdS/CdTe structure that can be used as a solar cell, particularly as a power source for indoor consumer equipment.

従来の技術 最近、低価格の太陽電池を製造するために種々
の製造方法による光起電力素子の開発が活発に行
われている。その中で、CdS/CdTe構造の光起
電力素子の製造方法の一つとしてスクリーン印刷
とベルトコンベア炉による焼成を利用した製造方
法がある。この方法の特徴は、製造工程が簡単で
量産性に富み、安価な太陽電池が得られることで
ある。
BACKGROUND OF THE INVENTION Recently, photovoltaic elements have been actively developed using various manufacturing methods in order to manufacture low-cost solar cells. Among them, one of the methods for manufacturing photovoltaic elements having a CdS/CdTe structure is a manufacturing method using screen printing and firing in a belt conveyor furnace. This method is characterized by a simple manufacturing process, high productivity in mass production, and the ability to obtain inexpensive solar cells.

以下図面を参照しながら、上述した従来の
CdS/CdTe構造の光起電力素子の一例について
説明する。
With reference to the drawings below, the conventional
An example of a photovoltaic device having a CdS/CdTe structure will be described.

第2図A〜Dは、スクリーン印刷、ベルト炉焼
成法によつて作製された太陽電池の平面図及び断
面図である。
FIGS. 2A to 2D are a plan view and a cross-sectional view of a solar cell manufactured by screen printing and belt furnace firing.

まず、ガラス基板などの透明基板1にスクリー
ン印刷によりCdS層を塗布し、ベルトコンベア炉
にて焼成することによりCdS焼結膜2を製造す
る。次に、このCdS焼結膜2上に同じくスクリー
ン印刷法で所望パターンのCdTe層を塗布し、ベ
ルトコンベア炉で焼成することによりCdTe焼結
膜3を形成する。この上に、CdTe焼結膜3をp
型化すると同時にCdTe焼結膜3とオーミツク接
触するカーボンペーストを所望のパターンで印刷
し、熱処理を行うことによりカーボン膜4を得、
CdS/CdTeヘテロ接合を形成する。更にCdS焼
結膜2とオーミツク接触するAgIn電極5とカー
ボン膜4上のAg電極6をスクリーン印刷、コン
ベア炉焼成法によつて形成し、太陽電池素子を製
造していた。
First, a CdS sintered film 2 is manufactured by applying a CdS layer to a transparent substrate 1 such as a glass substrate by screen printing and firing it in a belt conveyor furnace. Next, a CdTe layer with a desired pattern is applied onto this CdS sintered film 2 by the same screen printing method and fired in a belt conveyor furnace to form a CdTe sintered film 3. On top of this, a CdTe sintered film 3 is placed.
At the same time as molding, a carbon paste that is in ohmic contact with the CdTe sintered film 3 is printed in a desired pattern, and a carbon film 4 is obtained by heat treatment.
Form a CdS/CdTe heterojunction. Further, an AgIn electrode 5 in ohmic contact with the CdS sintered film 2 and an Ag electrode 6 on the carbon film 4 were formed by screen printing and conveyor furnace firing to produce a solar cell element.

上記複数の膜の重ね合せにおいて、CdS焼結膜
2及びAgIn電極5、すなわちマイナス電極と、
カーボン膜4およびAg電極6、すなわちプラス
電極とが接触すると、短絡し、光電特性が低下す
る。一方、光起電流発生部分は、CdS膜2とカー
ボン膜4が印刷されたCdTe膜3とのかさなりあ
つた部分である。この部分を有効受光面積と呼
ぶ。有効受光面積をできるだけ広く、なおかつ、
上記短絡を防ぐ印刷パターンとして、従来CdTe
膜3の大きさはCdS膜2と等しいかもしくは小さ
くし、カーボン膜4はCdTe膜3よりも小さく設
計されていた。
In the stacking of the plurality of films, the CdS sintered film 2 and the AgIn electrode 5, that is, the negative electrode,
When the carbon film 4 and the Ag electrode 6, ie, the positive electrode, come into contact, a short circuit occurs and the photoelectric characteristics deteriorate. On the other hand, the photovoltaic current generating portion is a portion where the CdS film 2 and the CdTe film 3 on which the carbon film 4 is printed overlap. This portion is called the effective light-receiving area. The effective light-receiving area is as wide as possible, and
Traditionally, CdTe was used as a printing pattern to prevent the above short circuit.
The size of the film 3 was designed to be equal to or smaller than the CdS film 2, and the carbon film 4 was designed to be smaller than the CdTe film 3.

発明が解決しようとする問題点 しかしながら上記のような、印刷パターン構成
では、印刷時のパターンずれ等によつてCdS膜2
にカーボン膜3が接触する可能性がある。その防
止方法としてカーボン膜4をCdTe膜3よりも大
幅に小さくする方法があるが、前述した有効受光
面積がそれにともない低下する。すなわち、ガラ
ス基板面積当りの光起電力特性が低下する。
Problems to be Solved by the Invention However, in the above-mentioned printing pattern configuration, the CdS film 2
There is a possibility that the carbon film 3 comes into contact with the carbon film 3. One way to prevent this is to make the carbon film 4 much smaller than the CdTe film 3, but the above-mentioned effective light-receiving area decreases accordingly. That is, the photovoltaic power characteristics per area of the glass substrate are reduced.

本発明は上記問題点に鑑み、光電変換に寄与す
る有効受光面積の減少を起こすことなく、CdS膜
2とカーボン膜4との印刷ずれ及びカーボン膜の
にじみ出しによる接触を防止し、リーク電流を大
幅に低下させた光起電力素子を提供するものであ
る。
In view of the above problems, the present invention prevents contact between the CdS film 2 and the carbon film 4 due to printing misalignment and oozing of the carbon film, and reduces leakage current without causing a decrease in the effective light-receiving area that contributes to photoelectric conversion. The present invention provides a photovoltaic element with significantly reduced energy consumption.

問題点を解決するための手段 上記の問題点を解決するために本発明の光起電
力素子は、第2の膜であるCdTe膜が、第1の膜
であるCdS膜の電極部分以外をすべて覆い、さら
に第3の膜であるカーボン膜が第2の膜である
CdTe膜をはみ出さず、かつ第1の膜であるCdS
膜に対応させてこれと同等以上の大きさにしたも
のである。
Means for Solving the Problems In order to solve the above problems, in the photovoltaic device of the present invention, the CdTe film, which is the second film, covers all of the CdS film, which is the first film, except for the electrode portion. cover, and a third film, a carbon film, is a second film.
CdS that does not protrude from the CdTe film and is the first film
It is made to be equivalent to or larger than this to correspond to the membrane.

作 用 本発明は上記した構成によつて第1の膜である
n型半導体膜CdSが第2の膜であるp型半導体膜
で覆われているため、第3の膜であるカーボン膜
の印刷ずれやにじみ出しによるCdS膜とカーボン
膜との接触が大幅に減少し、特性歩留が向上す
る。またp−n接合界面がCdS電極部分を除く素
子周辺に露出しないため、界面再結合電流も低下
して信頼性が向上する。さらに有効受光面積も増
大し特性も向上する。これらにより室内等の低照
度下においては、リーク電流の減少は大幅な特性
向上につながる。
Effect The present invention has the above-described structure in which the n-type semiconductor film CdS, which is the first film, is covered with the p-type semiconductor film, which is the second film, so that printing of the carbon film, which is the third film, is possible. Contact between the CdS film and carbon film due to shearing or oozing is greatly reduced, improving the characteristic yield. Furthermore, since the p-n junction interface is not exposed around the device except for the CdS electrode portion, the interfacial recombination current is also reduced and reliability is improved. Furthermore, the effective light-receiving area is increased and the characteristics are also improved. As a result, under low illuminance conditions such as indoors, a reduction in leakage current leads to a significant improvement in characteristics.

実施例 以下本発明の一実施例の光起電力素子につい
て、図面を参照しながら説明する。第1図Aは本
発明の実施例における光起電力素子の平面図、同
B,C,DにAのB−B′線、C−C′線、D−
D′線に沿つた各断面図を示すものである。
Embodiment A photovoltaic device according to an embodiment of the present invention will be described below with reference to the drawings. FIG. 1A is a plan view of a photovoltaic device according to an embodiment of the present invention, and B, C, and D of FIG.
Each cross-sectional view taken along line D' is shown.

アルカリ含有量0.3重量%以下のバリウム硼硅
酸ガラス基板1上にスクリーン印刷法でCdS粉末
に融剤として10重量%のCdCl2粉末を添加した
CdSペーストを用いて、第1図に示す用に基板1
周辺に余白を残してCdS層を塗布し、120℃で60
分乾燥後、アルミナ製の焼成容器に入れベルト式
焼成炉にて焼成温度690℃で約1時間焼成して
CdS焼結膜2を形成した。このCdS焼成膜2上に
Cd粉末とTe粉末に、0.5重量%のCdCl2粉末を添
加したCdTe印刷ペーストを用いて、スクリーン
印刷法で、CdS膜2の電極部分以外をCdS膜2の
側面と基板にいたるまですべて覆うパターンの
CdTe層を塗布し、乾燥後、アルミナ製の焼成容
器に入れベルト式焼成炉にて焼成温度580℃で1
時間焼成した。この様に形成されたCdTe焼結膜
3上に適量のアクセプター不純物を添加したカー
ボンペーストを用いて、スクリーン印刷法で、図
に示す様に、CdTe膜3よりははみ出さず、かつ
CdS膜2に対応させてこの膜と同等かもしくは大
きくなるパターンでカーボン層を塗布した。その
後N2雰囲気中において400℃で30分間熱処理する
ことによりカーボン膜4を形成し、この際にカー
ボン中に含まれるアクセプター不純物をCdTe膜
中に拡散させた。次にCdS焼結膜2上に20重量%
のIn粉末を含むAgペーストを用い、CdTe膜3で
覆われていないCdS膜電極部分に所定のパターン
のAgIn電極5を形成し、これを乾燥後、200℃で
40分熱処理することによりCdS焼結膜に対してオ
ーミツク電極を形成した。また、カーボン膜4上
にもAgペーストを塗布し、150℃で30分乾燥する
ことによりAg電極6を形成した。
On a barium borosilicate glass substrate 1 with an alkali content of 0.3% by weight or less, 10% by weight of CdCl 2 powder was added as a flux to CdS powder by screen printing method.
Using CdS paste, prepare the substrate 1 as shown in Figure 1.
Apply a CdS layer leaving a margin around the periphery and heat at 120℃ for 60 minutes.
After drying for several minutes, put it in an alumina firing container and fire it in a belt-type firing furnace at a firing temperature of 690℃ for about 1 hour.
A CdS sintered film 2 was formed. On this CdS fired film 2
Using a CdTe printing paste made by adding 0.5% by weight of CdCl 2 powder to Cd powder and Te powder, a pattern is created that covers everything except the electrode part of the CdS film 2, including the side surfaces of the CdS film 2 and the substrate. of
After coating the CdTe layer and drying, place it in an alumina firing container and fire it in a belt-type firing furnace at a temperature of 580°C.
Baked for an hour. Using a screen printing method, a carbon paste containing an appropriate amount of acceptor impurities was applied to the CdTe sintered film 3 formed in this way, so that it did not protrude beyond the CdTe film 3 as shown in the figure.
In correspondence with CdS film 2, a carbon layer was applied in a pattern that was equal to or larger than this film. Thereafter, a carbon film 4 was formed by heat treatment at 400° C. for 30 minutes in an N 2 atmosphere, and at this time, acceptor impurities contained in the carbon were diffused into the CdTe film. Next, 20% by weight was applied onto the CdS sintered film 2.
Using Ag paste containing In powder of
An ohmic electrode was formed on the CdS sintered film by heat treatment for 40 minutes. Further, Ag paste was also applied on the carbon film 4 and dried at 150° C. for 30 minutes to form an Ag electrode 6.

以上のように本実施例によれば、CdTe膜が
CdS膜の電極部以外をすべて覆つていることによ
つて、カーボン膜及びAg電極とCdS膜とを接触
が防止でき、リーク電流の減少による光起電力特
性の向上が図れる。また、量産時の印刷位置ずれ
及びペーストにじみ出しによる短絡が減少して生
産歩留が向上する。さらにカーボン膜の大きさを
CdS膜と同等以上にすることによつて従来よりも
有効受光面積を増加でき、光電変換特性も向上す
る。
As described above, according to this example, the CdTe film
By covering everything except the electrode portion of the CdS film, contact between the carbon film and Ag electrode and the CdS film can be prevented, and photovoltaic characteristics can be improved by reducing leakage current. In addition, short circuits due to printing misalignment and paste oozing during mass production are reduced, improving production yield. Furthermore, the size of the carbon film
By making it equal to or higher than the CdS film, the effective light-receiving area can be increased compared to the conventional one, and the photoelectric conversion characteristics can also be improved.

発明の効果 以上のように本発明は、第2の膜であるCdTe
膜が、第1の膜であるCdS膜の電極部分以外をす
べて覆つており、さらに第3の膜であるカーボン
膜がCdTe膜をはみ出さず、かつCdS膜に対応し
て同膜と同等以上である構造とすることにより、
リーク電流の減少と有効受光面積の向上により特
性が向上し、加えて量産時の生産歩留をも向上さ
せることができる。
Effects of the Invention As described above, the present invention provides a CdTe film as a second film.
The film covers everything except the electrode part of the CdS film, which is the first film, and the carbon film, which is the third film, does not protrude from the CdTe film and is equivalent to or better than the CdS film. By having a structure that is
Characteristics are improved by reducing leakage current and increasing the effective light-receiving area, and in addition, production yield during mass production can also be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図Aは本発明の実施例における光起電力素
子の平面図、同図B,C,DはAのB−B′線、
C−C′線、D−D′線に沿つた各断面図、第2図A
は従来の光起電力素子の平面図、同図B,C,D
は、AのB−B′線、C−C′線、D−D′線に沿つ
た各断面図である。 1……ガラス基板、2……CdS膜、3……
CdTe膜、4……カーボン膜、5……AgIn電極、
6……Ag電極。
FIG. 1A is a plan view of a photovoltaic device according to an embodiment of the present invention, and FIG. 1B, C, and D are lines BB' of A;
Cross-sectional views along lines C-C' and D-D', Figure 2A
are plan views of conventional photovoltaic elements;
These are cross-sectional views taken along lines B-B', C-C', and D-D' of A. 1...Glass substrate, 2...CdS film, 3...
CdTe film, 4... Carbon film, 5... AgIn electrode,
6...Ag electrode.

Claims (1)

【特許請求の範囲】 1 基板上に構成されたCdSもしくはCd、Sを
含むn型化合物半導体からなる第1の膜と、この
第1の膜上に形成されたCdTeもしくはCd、Te
を含む化合物半導体からなる第2の膜と、この第
2の膜をp型化するために第2の膜上に形成され
た第3の膜と、これらのn型、p型両膜に付着形
成された電極とからなる焼結膜型CdS/CdTe光
起電力素子において、第2の膜が第1の膜の電極
部分以外を第1の膜の側面と基板にいたるまです
べて覆つており、第3の膜が第2の膜をはみ出さ
ず、かつ、第1の膜の電極以外で第1の膜と同等
以上の大きさであることを特徴とする光起電力素
子。 2 第3の膜が導電性炭素を主成分とし、第2の
膜に対してアクセプター不純物として働く元素を
添加したペーストを印刷し焼成したものである特
許請求の範囲第1項記載の光起電力素子。
[Claims] 1. A first film made of an n-type compound semiconductor containing CdS or Cd, S formed on a substrate, and CdTe or Cd, Te formed on this first film.
a second film made of a compound semiconductor containing In a sintered film type CdS/CdTe photovoltaic device consisting of a formed electrode, the second film covers everything except the electrode part of the first film, including the side surface of the first film and the substrate. 3. A photovoltaic element characterized in that the film of No. 3 does not protrude from the second film and has a size equal to or larger than that of the first film other than the electrodes of the first film. 2. The photovoltaic power according to claim 1, wherein the third film is obtained by printing and firing a paste containing conductive carbon as a main component and adding an element that acts as an acceptor impurity to the second film. element.
JP61239513A 1986-10-08 1986-10-08 Photovoltaic element Granted JPS6393172A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61239513A JPS6393172A (en) 1986-10-08 1986-10-08 Photovoltaic element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61239513A JPS6393172A (en) 1986-10-08 1986-10-08 Photovoltaic element

Publications (2)

Publication Number Publication Date
JPS6393172A JPS6393172A (en) 1988-04-23
JPH054825B2 true JPH054825B2 (en) 1993-01-20

Family

ID=17045913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61239513A Granted JPS6393172A (en) 1986-10-08 1986-10-08 Photovoltaic element

Country Status (1)

Country Link
JP (1) JPS6393172A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01293577A (en) * 1988-05-20 1989-11-27 Sumitomo Metal Ind Ltd Manufacture of photoelectromotive force element

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA804528B (en) * 1979-08-22 1981-07-29 Ses Inc Electrode for photovoltaic cell
JPS57166083A (en) * 1981-04-07 1982-10-13 Ricoh Co Ltd Thin film type photoelectric conversion element

Also Published As

Publication number Publication date
JPS6393172A (en) 1988-04-23

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