JPH0577307B2 - - Google Patents
Info
- Publication number
- JPH0577307B2 JPH0577307B2 JP6488087A JP6488087A JPH0577307B2 JP H0577307 B2 JPH0577307 B2 JP H0577307B2 JP 6488087 A JP6488087 A JP 6488087A JP 6488087 A JP6488087 A JP 6488087A JP H0577307 B2 JPH0577307 B2 JP H0577307B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating material
- bonding
- anode
- liquid
- anodic bonding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011810 insulating material Substances 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 11
- 239000011521 glass Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- -1 Li + Chemical class 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
Landscapes
- Measuring Fluid Pressure (AREA)
- Ceramic Products (AREA)
- Joining Of Glass To Other Materials (AREA)
- Pressure Sensors (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はセラミツクス、ガラスのような絶縁材
の表面に、金属やシリコン等を接合するために利
用される陽極接合方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an anodic bonding method used for bonding metal, silicon, etc. to the surface of an insulating material such as ceramics or glass.
(従来の技術)
例えば半導体圧力センサー等の製造工程におい
ては、ガラス等の絶縁材の表面にシリコンウエハ
ー等を接合するために陽極接合が行われている。
この陽極接合法は米国特許第3397278号明細書等
にも示されているとおり、ガラス等の絶縁材の片
面に接合しようとする金属やシリコンウエハー等
を陽極として接触させるとともに、絶縁材の反対
側の表面に金属製の陰極を接触させ、300〜400℃
の温度条件下で直流電圧を印加することにより陽
極と絶縁材とを接合させる方法である。ところが
陽極と絶縁材との接合面をいかに平滑に研摩して
も全面が同時に密着するものではなく、両者間の
通電はいくつかの接触点から開始されるので、ウ
エハー状の広い面積の陽極を絶縁体に接合する場
合には接合面に分散した複数箇所から接合が始ま
り順次その周囲に接合部が拡大して行くこととな
り、これらの接合部間に最後まで残された接合界
面部分に気泡が閉じ込められるという問題があつ
た。このような気泡は接合の進行につれて圧縮さ
れ、場合によつては陽極や絶縁材を破壊する程の
歪を生ずることがあつた。(Prior Art) For example, in the manufacturing process of semiconductor pressure sensors and the like, anodic bonding is performed to bond a silicon wafer or the like to the surface of an insulating material such as glass.
As shown in U.S. Patent No. 3,397,278, etc., this anodic bonding method involves contacting the metal or silicon wafer to be bonded to one side of an insulating material such as glass as an anode, and the other side of the insulating material. A metal cathode is brought into contact with the surface of the
This is a method of bonding an anode and an insulating material by applying a DC voltage under a temperature condition of . However, no matter how smooth the bonding surface between the anode and the insulating material is polished, the entire surface will not be in close contact with each other at the same time, and current conduction between the two starts from several contact points, so it is difficult to use an anode with a large wafer-like area. When bonding to an insulator, the bond starts from multiple locations distributed on the bonding surface and the bond gradually expands around the bonded area, causing air bubbles to form at the bonding interface that remains between these bonded areas until the end. There was a problem with being locked up. These bubbles are compressed as the bonding progresses, and in some cases may cause enough strain to destroy the anode or insulating material.
(発明が解決しようとする問題点)
本発明は上記のような従来の問題点を解決し、
ウエハー状の広い面積を持つ陽極を絶縁材に接合
する場合にも接合面に気泡を生ずることのない陽
極接合方法を目的として完成されたものである。(Problems to be solved by the invention) The present invention solves the conventional problems as described above,
This method was developed with the aim of creating an anodic bonding method that does not generate bubbles on the bonding surface even when bonding a wafer-like anode with a large area to an insulating material.
(問題点を解決するための手段)
本発明は絶縁材の両表面に陽極と陰極とを接触
させ直流電圧を印加して絶縁材と陽極とを接合さ
せる陽極接合方法において、陰極として液体を用
い、、絶縁材の表面と液体との接触面を順次拡径
させながら直流電圧を印加することにより、陽極
と絶縁材との接合界面を中心から外側に向つて移
動させつつ接合を行わせることを特徴とするもの
である。(Means for Solving the Problems) The present invention uses a liquid as the cathode in an anodic bonding method in which an anode and a cathode are brought into contact with both surfaces of an insulating material and a DC voltage is applied to bond the insulating material and the anode. By applying a DC voltage while sequentially expanding the diameter of the contact surface between the surface of the insulating material and the liquid, the bonding interface between the anode and the insulating material is moved outward from the center and the bonding is performed. This is a characteristic feature.
(実施例)
次に本発明を図示の実施例によつて更に詳細に
説明すると、1はガラス、セラミツクスのような
絶縁材であり、2は絶縁材1の片面に接触させた
陽極である。半導体圧力センサーの製造の場合に
おいては絶縁材1はガラス、陽極2はシリコンウ
エハーであり、陽極2はリード線3を介して200
〜2000V程度の直流電源4のプラス側に接続され
ている。5は絶縁材1の反対側の表面からわずか
に離れた位置に保持された金属製の平板であり、
その中心孔に接続されたパイプ6から陰極として
作用する液体7が供給される。陽極接合を行うに
際してはヒータ8によつて全体が300〜400℃に加
熱されるので、ここで用いる液体としてはこの程
度の温度で安定した液体であり、かつ電気伝導性
に優れた液体であることが必要であり、例えば
KNO3、NaNO3等のアルカリ塩を用いることが
好ましい。(Embodiments) Next, the present invention will be explained in more detail with reference to the illustrated embodiments. Reference numeral 1 is an insulating material such as glass or ceramics, and 2 is an anode that is in contact with one side of the insulating material 1. In the case of manufacturing a semiconductor pressure sensor, the insulating material 1 is glass and the anode 2 is a silicon wafer.
It is connected to the positive side of the DC power supply 4 of ~2000V. 5 is a metal flat plate held at a position slightly apart from the opposite surface of the insulating material 1;
A liquid 7 which acts as a cathode is supplied from a pipe 6 connected to the central hole. When performing anodic bonding, the entire body is heated to 300 to 400°C by the heater 8, so the liquid used here is a liquid that is stable at this temperature and has excellent electrical conductivity. For example,
It is preferable to use an alkali salt such as KNO 3 or NaNO 3 .
本発明の方法により陽極接合を行うには、全体
を300〜400℃程度に加熱したうえ、平板5の中心
付近にまず液体7を供給する。この結果、絶縁材
1の中心部分のみに直流電圧が印加され、この部
分の絶縁材1の内部でLi+、Na+、K+等の正イオ
ンが陰極5側を向き、O2-等の負イオンが陽極2
側を向く分極現象が生じて、このO2-イオンが陽
極2の例えばSi+イオンと化学結合し、絶縁材1
の中心部において陽極2が接合される。このよう
にして陽極接合を行いながら液体7の供給を続け
れば、絶縁材1の表面と液体7との接触面は順次
拡径して行くので、最初に陽極接合が行われた外
側の部分で同様に陽極接合が進行し、絶縁材1と
陽極2との接合界面は中心から外側に向つて移動
することとなる。このようにして液体7の供給を
続けながら直流電圧を印加すれば、陽極2と絶縁
材1との接合界面が次第に外側に向つて移動しつ
つ全体の接合が行われるので、陽極2と絶縁材1
との間に接合界面に囲まれた部分が生ずるおそれ
がない。このため本発明によれば接合面に気泡を
生ずることなく陽極接合を行うことができる。な
お上記の実施例では平板5を用いて液体7を供給
したが、第1図と上下を逆向きにした場合には必
ずしも平板5を用いる必要はない。 To carry out anodic bonding by the method of the present invention, the whole is heated to about 300 to 400° C., and then liquid 7 is first supplied near the center of flat plate 5. As a result, a DC voltage is applied only to the central part of the insulating material 1, and inside this part of the insulating material 1, positive ions such as Li + , Na + , K +, etc. face the cathode 5 side, and O 2- , etc. Negative ions are anode 2
A polarization phenomenon toward the side occurs, and this O 2- ion chemically bonds with, for example, Si + ions of the anode 2, and the insulating material 1
The anode 2 is joined at the center of the . If the liquid 7 is continued to be supplied while performing anodic bonding in this way, the contact surface between the surface of the insulating material 1 and the liquid 7 will gradually expand, so that the outer part where the anodic bonding was first performed will Similarly, the anodic bonding progresses, and the bonding interface between the insulating material 1 and the anode 2 moves outward from the center. In this way, by applying a DC voltage while continuing to supply the liquid 7, the bonding interface between the anode 2 and the insulating material 1 gradually moves outward and the entire bonding is performed, so that the anode 2 and the insulating material 1
There is no risk of a portion surrounded by the bonding interface occurring between the two. Therefore, according to the present invention, anodic bonding can be performed without producing bubbles on the bonding surfaces. In the above embodiment, the liquid 7 was supplied using the flat plate 5, but it is not necessarily necessary to use the flat plate 5 if the orientation is reversed from that in FIG.
(発明の効果)
本発明は以上の説明からも明らかなように、陰
極として液体を用い、絶縁材と液体との接触面を
順次拡径させることにより接合界面を中心から外
側に向つて移動させつつ接合を行わせることがで
きるので、接合面に気泡を生ずるおそれなく陽極
接合を完了することができる。従つて本発明はウ
エハー状の広い面積の陽極を絶縁材に接合するの
に特に好適なものであり、業界に寄与するところ
は極めて大きいものである。(Effects of the Invention) As is clear from the above description, the present invention uses a liquid as a cathode and gradually expands the diameter of the contact surface between the insulating material and the liquid, thereby moving the bonding interface outward from the center. Since the bonding can be performed while the bonding process is being performed, the anodic bonding can be completed without the risk of creating bubbles on the bonding surfaces. Therefore, the present invention is particularly suitable for bonding a wafer-like wide-area anode to an insulating material, and will greatly contribute to the industry.
第1図は本発明の陽極接合方法を説明する断面
図、第2図はその底面図である。
1:絶縁材、2:陽極、7:液体。
FIG. 1 is a sectional view illustrating the anodic bonding method of the present invention, and FIG. 2 is a bottom view thereof. 1: Insulating material, 2: Anode, 7: Liquid.
Claims (1)
流電圧を印加して絶縁材と陽極とを接合させる陽
極接合方法において、陰極として液体を用い、絶
縁材1の表面と液体7との接触面を順次拡径させ
ながら直流電圧を印加することにより、陽極2と
絶縁材1との接合界面を中心から外側に向つて移
動させつつ接合を行わせることを特徴とする陽極
接合方法。1 In an anodic bonding method in which an anode and a cathode are brought into contact with both surfaces of an insulating material and a DC voltage is applied to join the insulating material and the anode, a liquid is used as the cathode, and the surface of the insulating material 1 is brought into contact with the liquid 7. An anodic bonding method characterized by performing bonding while moving the bonding interface between the anode 2 and the insulating material 1 outward from the center by applying a DC voltage while sequentially expanding the diameter of the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6488087A JPS63229865A (en) | 1987-03-19 | 1987-03-19 | Anodic bonding method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6488087A JPS63229865A (en) | 1987-03-19 | 1987-03-19 | Anodic bonding method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63229865A JPS63229865A (en) | 1988-09-26 |
| JPH0577307B2 true JPH0577307B2 (en) | 1993-10-26 |
Family
ID=13270873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6488087A Granted JPS63229865A (en) | 1987-03-19 | 1987-03-19 | Anodic bonding method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63229865A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03233429A (en) * | 1990-02-08 | 1991-10-17 | Mitsubishi Electric Corp | Production of liquid crystal display element |
| JP2519635B2 (en) * | 1992-08-20 | 1996-07-31 | 石塚硝子株式会社 | Anodic bonding method |
-
1987
- 1987-03-19 JP JP6488087A patent/JPS63229865A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63229865A (en) | 1988-09-26 |
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