JPH058342B2 - - Google Patents
Info
- Publication number
- JPH058342B2 JPH058342B2 JP61152906A JP15290686A JPH058342B2 JP H058342 B2 JPH058342 B2 JP H058342B2 JP 61152906 A JP61152906 A JP 61152906A JP 15290686 A JP15290686 A JP 15290686A JP H058342 B2 JPH058342 B2 JP H058342B2
- Authority
- JP
- Japan
- Prior art keywords
- vibration
- foundation
- air
- room
- proof
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 238000009434 installation Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ventilation (AREA)
- Vibration Prevention Devices (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は防振基礎構造に係り、特に半導体製造
工場等のクリーンルームに備えられる防振基礎構
造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a vibration-proof basic structure, and particularly to a vibration-proof basic structure provided in a clean room such as a semiconductor manufacturing factory.
半導体製造は無塵環境を必要とするため、その
製造は通常クリーンルーム内で行われる。一般
に、クリーンルームは、天井面に取付けられた複
数のHEPA（高性能）フイルタを通して清浄エア
をクリーンルーム室内に吹き出し、又室内のエア
を通気構造を有するグレーチング床面から吸い込
んで再び天井面のHEPAフイルタを通すエア循
環方式を採用され、清浄エアが室内に於いてダウ
ンフローされる。
Semiconductor manufacturing requires a dust-free environment, so the manufacturing is usually performed in a clean room. Generally, in a clean room, clean air is blown into the clean room through multiple HEPA (high performance) filters installed on the ceiling, and the air inside the room is sucked in through the grating floor, which has a ventilation structure, and then passed through the HEPA filters on the ceiling again. An air circulation system is adopted to allow clean air to flow down into the room.
又クリーンルーム等においては各種の半導体製
造装置が設置され、この半導体製造装置の中には
高微細化によるLSIプロセスにおけるアライナ、
EB及びステツパー等のように極端に振動を嫌う
装置がある。従つてこのような振動を嫌う半導体
製造装置においては防振基礎構造上に設置する必
要がある。 In addition, various semiconductor manufacturing equipment is installed in clean rooms, etc., and some of these semiconductor manufacturing equipment include aligners,
There are devices such as EB and Steppers that are extremely sensitive to vibration. Therefore, in semiconductor manufacturing equipment that dislikes such vibrations, it is necessary to install it on a vibration-proof basic structure.
ところで、このように防振基礎を設置した床面
部分には、通気構造になつているグレーチングを
施すことができない。このため、層流化された清
浄エアの気流が防振基礎の上方及び、その周辺で
乱れ、エアの滞留域となる不具合がある。 By the way, it is not possible to apply a grating which has a ventilation structure to the floor surface part where the vibration-proof foundation is installed in this way. For this reason, there is a problem in that the laminar flow of clean air is disturbed above and around the vibration isolation foundation, resulting in an air stagnation area.
本発明はこのような事情に鑑みて成されたもの
で、クリーンルーム内で清浄エアの気流が防振基
礎の設置によつて乱れることがない防振基礎構造
を提供することを目的としている。
The present invention was made in view of the above circumstances, and an object of the present invention is to provide a vibration-isolating foundation structure in which the flow of clean air in a clean room is not disturbed by the installation of the vibration-isolating foundation.
本発明は前記目的を達成するために、基礎床
と、基礎床の上方に敷設される床面との間に床下
チヤンバを形成し、天井面から吹き出されたエア
を床下チヤンバ内に吸気し、エアのダウンフロー
を生じさせる室内に備えられる防振基礎に於い
て、前記防振基礎を基礎床に設置して防振基礎の
上面を前記室内に配置し、防振基礎の上面に前記
チヤンバと連通する複数の透孔を形成し、透孔か
ら室内エアを通気することを特徴とする。
In order to achieve the above object, the present invention forms an underfloor chamber between a foundation floor and a floor surface laid above the foundation floor, and sucks air blown from the ceiling surface into the underfloor chamber, In a vibration-proof foundation installed in a room that generates a downflow of air, the vibration-proof foundation is installed on the foundation floor, the top surface of the vibration-proof foundation is placed in the room, and the chamber and the vibration-proof foundation are placed on the top surface of the vibration-proof foundation. It is characterized by forming a plurality of communicating through holes and ventilating room air through the through holes.
以下添付図面に従つて本発明に係る防振基礎構
造の好ましい実施例を詳説する。第１図は本発明
に係る防振基礎構造が設けられたクリーンルーム
の断面図である。第１図に示すようにクリーンル
ーム１０の天井室１２は、右側面に導入口１４が
設けられ、循環エアはこの導入口１４を通つて天
井室１２に供給される。又、天井室１２には、複
数のHEPAフイルタ１６…が配置され、天井室
１２のエアは、HEPAフイルタ１６を通つて室
内２０に送られる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the vibration-proof foundation structure according to the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a sectional view of a clean room equipped with a vibration-proof foundation structure according to the present invention. As shown in FIG. 1, the ceiling chamber 12 of the clean room 10 is provided with an inlet 14 on the right side, and circulating air is supplied to the ceiling chamber 12 through this inlet 14. Further, a plurality of HEPA filters 16 are arranged in the ceiling chamber 12, and the air in the ceiling chamber 12 is sent to the indoor room 20 through the HEPA filters 16.
又、基礎床２８には複数の支柱３０，３０…が
立設され、これ等の支柱３０によつて床面用グレ
ーチング３２が敷設され、室内２０のエアは、こ
のグレーチング３２を通つて床下チヤンバ３４に
吸い込まれる。チヤンバ３４の右側面には吸気口
３６が設けられ、吸気口３６は吸気ダクト３８を
介して空気調和機４０に外気導入ダクト４２と共
に接続され、この空気調和機４０でミキシングさ
れた空調空気は送風機４４により、送気ダクト４
６を介して天井室１２に再び供給される。 Moreover, a plurality of columns 30, 30... are erected on the foundation floor 28, and a floor grating 32 is laid by these columns 30, and the air in the room 20 is passed through the grating 32 to the underfloor chamber. It gets sucked into 34. An intake port 36 is provided on the right side of the chamber 34, and the intake port 36 is connected to an air conditioner 40 together with an outside air introduction duct 42 via an intake duct 38, and the conditioned air mixed in the air conditioner 40 is sent to a blower. 44, the air supply duct 4
6 to the ceiling chamber 12 again.
チヤンバ３４には防振基礎５０が設けられ、防
振基礎５０上には極端に振動を嫌うステツパー装
置５２が設けられる。第２図及び第３図に示すよ
うに防振基礎５０は装置５２が載置される矩形状
の架台５４と、架台を支持する支柱５６…とから
成る。架台５４には上面から下面に貫通される複
数の透孔５８…が形成される。支柱５６は基礎床
２８の一部を立設させて形成される。 A vibration-proof foundation 50 is provided in the chamber 34, and a stepper device 52, which is extremely sensitive to vibration, is provided on the vibration-proof foundation 50. As shown in FIGS. 2 and 3, the anti-vibration foundation 50 consists of a rectangular pedestal 54 on which the device 52 is placed, and columns 56 that support the pedestal. A plurality of through holes 58 are formed in the pedestal 54, passing through from the upper surface to the lower surface. The pillar 56 is formed by standing a part of the foundation floor 28 upright.
前記の如く構成された本発明に係る防振基礎構
造によれば、天井室１２の高性能フイルタ１６を
通つて清浄エアが室内に２０に吹き出される。清
浄エアは下降流となつて床面のグレーチング３２
を通り、床下チヤンバ３４内に吸い込まれる。こ
れにより室内２０は清浄エアの一定のダウンフロ
ーが生じる。この場合に於いて、防振基礎５０の
架台５４が設けられた上方のエアは、透孔１８を
通つ床下チヤンバ３４内に吸い込まれる。これに
より室内の層流化された清浄エアの気流は従来の
ように防振基礎５０の上方及びその周辺で乱れる
虞が少なく、装置５２の設置部分を除いて略一定
のダウンフローが得られ、エアの滞留域を生じる
虞がない。 According to the vibration-proof basic structure according to the present invention configured as described above, clean air is blown into the room through the high-performance filter 16 in the ceiling room 12. The clean air flows downward and hits the grating 32 on the floor.
and is sucked into the underfloor chamber 34. This creates a constant downflow of clean air in the room 20. In this case, the air above the mount 54 of the vibration-proof foundation 50 is sucked into the underfloor chamber 34 through the through hole 18. As a result, there is less risk that the laminar airflow of clean air in the room will be disturbed above and around the vibration-proof foundation 50 unlike in the conventional case, and a substantially constant downflow can be obtained except for the area where the device 52 is installed. There is no risk of creating an air stagnation area.
第４図は、防振基礎構造の第２実施例を示す断
面図である。第４図に示すように防振基礎７０は
コンクリート基礎床２８の一部が高台にして形成
され、防振基礎７０の内部は中空部７２が形成さ
れる。中空部７２と上面７０Ａとの間には複数の
透孔７４が設けられる。又中空部７２は連通孔７
６を介して送風機７８と連通され、中空部７２内
のエアは強制的に送風機７８によつてチヤンバ３
４内に排出されている。 FIG. 4 is a sectional view showing a second embodiment of the vibration-proof foundation structure. As shown in FIG. 4, the anti-vibration foundation 70 is formed by making a part of the concrete foundation floor 28 elevated, and a hollow portion 72 is formed inside the anti-vibration foundation 70. A plurality of through holes 74 are provided between the hollow portion 72 and the upper surface 70A. Also, the hollow part 72 is the communication hole 7
6, the air inside the hollow part 72 is forced to flow into the chamber 3 through the blower 78.
It is discharged within 4.
前記の如く構成された本発明に係る防振基礎構
造によれば、防振基礎７０の上方の清浄エアは透
孔７４より強制的に吸引されることとなり、室内
２０の清浄エアの気流は防振基礎７０上において
も略均一なダウンフローとなる。 According to the vibration-proof foundation structure according to the present invention configured as described above, the clean air above the vibration-proof foundation 70 is forcibly sucked through the through hole 74, and the flow of clean air in the room 20 is prevented. The downflow is substantially uniform even on the shaking foundation 70.
以上説明したように本発明に係る防振基礎構造
によれば、エアのダウンフローが行われる室内に
設けられる防振基礎の上面に透孔を形成し透孔を
介して室内のエアを吸い込むようにしたので、室
内のエアの気流が防振基礎の設置によつて乱され
る虞れがない。
As explained above, according to the anti-vibration foundation structure according to the present invention, a through hole is formed on the upper surface of the anti-vibration foundation provided in a room where air downflow is performed, and indoor air is sucked through the through hole. Therefore, there is no risk that the air flow in the room will be disturbed by the installation of the vibration-proof foundation.
第１図は本発明に係る防振基礎構造が設けられ
たクリーンルームの断面図、第２図は本発明に係
る防振基礎構造の断面図、第３図は本発明に係る
防振基礎構造の上面図、第４図は本発明に係る防
振基礎構造の第２実施例を示した断面図である。
１０……クリーンルーム、１６……HEPAフ
イルタ、２０……クリーンルーム室内、５０……
防振基礎、５２……ステツパー装置、５４……架
台、５６……支柱、５８……透孔。
FIG. 1 is a cross-sectional view of a clean room equipped with a vibration-proof foundation structure according to the present invention, FIG. 2 is a cross-sectional view of a vibration-proof foundation structure according to the present invention, and FIG. 3 is a cross-sectional view of a vibration-proof foundation structure according to the present invention. The top view and FIG. 4 are cross-sectional views showing a second embodiment of the vibration-proof foundation structure according to the present invention. 10...Clean room, 16...HEPA filter, 20...Clean room interior, 50...
Anti-vibration foundation, 52...stepper device, 54...frame, 56...support column, 58...through hole.
Claims (1)
チング床との間に床下チヤンバを形成し、天井面
から吹き出されたエアをグレーチング床を介して
床下チヤンバ内に吸気し、エアのダウンフローを
生じさせる室内に備えられる防振基礎構造に於い
て、前記防振基礎構造は、基礎床の一部から立設
された支柱と、支柱によつて支持されグレーチン
グ床と分離して前記室内に配置した架台と、から
成り、前記架台には室内と前記床下チヤンバと連
通する複数の透孔を形成し、透孔から室内エアを
通気することを特徴とする防振基礎構造。 ２ 前記架台の内部を中空部に形成し、該中空部
を前記透孔を介して室内と連通させると共に、中
空部内のエアを吸引して床下チヤンバに排気する
吸気フアンを設けることを特徴とする特許請求の
範囲第１項記載の防振基礎構造。[Claims] 1. An underfloor chamber is formed between the foundation floor and a grating floor laid above the foundation floor, and air blown from the ceiling is sucked into the underfloor chamber through the grating floor. , in a vibration-proof foundation structure installed in a room that generates a downflow of air, the vibration-proof foundation structure has pillars erected from a part of the foundation floor, and is supported by the pillars and separated from the grating floor. a pedestal placed in the room, wherein the pedestal has a plurality of through holes communicating with the room and the underfloor chamber, and indoor air is ventilated through the through holes. . 2. The inside of the pedestal is formed into a hollow part, and the hollow part is communicated with the room through the through hole, and an intake fan is provided for sucking air in the hollow part and exhausting it to the underfloor chamber. A vibration-proof foundation structure according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61152906A JPS6314025A (en) | 1986-06-30 | 1986-06-30 | Anti-vibration basic structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61152906A JPS6314025A (en) | 1986-06-30 | 1986-06-30 | Anti-vibration basic structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6314025A JPS6314025A (en) | 1988-01-21 |
| JPH058342B2 true JPH058342B2 (en) | 1993-02-01 |
Family
ID=15550722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61152906A Granted JPS6314025A (en) | 1986-06-30 | 1986-06-30 | Anti-vibration basic structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6314025A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0746870Y2 (en) * | 1990-03-29 | 1995-10-25 | 三機工業株式会社 | Precision equipment support structure in clean room |
-
1986
- 1986-06-30 JP JP61152906A patent/JPS6314025A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6314025A (en) | 1988-01-21 |
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