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JPH061183B2 - Defect inspection method and apparatus - Google Patents
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JPH061183B2 - Defect inspection method and apparatus - Google Patents

Defect inspection method and apparatus

Info

Publication number
JPH061183B2
JPH061183B2 JP60219041A JP21904185A JPH061183B2 JP H061183 B2 JPH061183 B2 JP H061183B2 JP 60219041 A JP60219041 A JP 60219041A JP 21904185 A JP21904185 A JP 21904185A JP H061183 B2 JPH061183 B2 JP H061183B2
Authority
JP
Japan
Prior art keywords
inspected
image signal
light
optical system
diffracted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60219041A
Other languages
Japanese (ja)
Other versions
JPS6279335A (en
Inventor
秀明 土井
靖彦 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60219041A priority Critical patent/JPH061183B2/en
Publication of JPS6279335A publication Critical patent/JPS6279335A/en
Publication of JPH061183B2 publication Critical patent/JPH061183B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、被検査物自体の微小な凹凸や屈折率の不均一
性等の欠陥を塵埃等の異物から弁別して検出するのに好
適な欠陥検査方法及びその装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention is suitable for detecting defects such as minute unevenness of the object to be inspected and nonuniformity of refractive index by discriminating from foreign matter such as dust. An inspection method and an apparatus thereof.

〔発明の背景〕[Background of the Invention]

明暗の差や色の差を識別する人間の目の能力はかなりす
ぐれているが、ガラスのように透明な物体になると、よ
ほど大きな傷や汚れでないとこれを見分けることはでき
ない。透明な物体の中にごくわずか存在する屈折率や厚
さの差を観察する手段として、なまの細胞や菌などのよ
うに透明で明暗や色調の差に乏しい物体を観察するのに
用いられる位相差顕微鏡がある。位相差顕微鏡は、例え
ば医学書院発行「生体の科学」第17巻6号(1966年)に
おける水平敏和の「位相差顕微鏡と干渉顕微鏡」と題す
る文献において述べられている。位相差顕微鏡の原理を
第3図により説明する。
The human eye's ability to discern light and dark differences and color differences is quite good, but if it becomes a transparent object like glass, it cannot be distinguished unless it is a very large scratch or stain. As a means of observing the very small difference in refractive index and thickness in a transparent object, it is used to observe objects such as raw cells and fungi that are transparent and have little difference in brightness and color tone. There is a phase contrast microscope. The phase-contrast microscope is described, for example, in the literature entitled "Phase-contrast microscope and interference microscope" by Toshikazu Horizontal in "Science of Living Body" Vol. The principle of the phase contrast microscope will be described with reference to FIG.

第3図において、10は光源、11はコレクタレンズ、15は
対物レンズである。コンデンサレンズ13の前焦点位置に
環状のスリット12が置かれ、このスリット12の像ができ
る対物レンズ15の後焦点位置に環状の吸収膜18及び位相
板16が置かれる。吸収膜18は、回折光9に比べて著しく
強度の大きな直接光8を減衰させ、回折光と直接光の強
度バランスをとっている。直接光8は、被検査物体14の
透過率によって変調される。一方、回折光9は、被検査
物体14の屈折率変化あるいは厚みの変化によって変調さ
れる。直接光8と回折光9は、互いに位相がπ/2ずれて
いるので、このままではたがいに干渉することはない。
しかし、回折光9の光路上に位相板16を設け回折光の位
相を直接光と干渉するように変化させているので、直接
光8を背景強度として、被検査物体14による回折光を明
暗コントラストとして像面17で観察できる。すなわち、
被検査物体の屈折率変化や厚みの変化という位相量変化
を明暗コントラストで観察できる。
In FIG. 3, 10 is a light source, 11 is a collector lens, and 15 is an objective lens. An annular slit 12 is placed at the front focal position of the condenser lens 13, and an annular absorption film 18 and a phase plate 16 are placed at the rear focal position of the objective lens 15 where an image of the slit 12 can be formed. The absorption film 18 attenuates the direct light 8 having a significantly higher intensity than the diffracted light 9 and balances the intensity of the diffracted light and the direct light. The direct light 8 is modulated by the transmittance of the inspected object 14. On the other hand, the diffracted light 9 is modulated by the change in the refractive index or the change in the thickness of the inspected object 14. Since the direct light 8 and the diffracted light 9 are out of phase with each other by π / 2, they do not interfere with each other as they are.
However, since the phase plate 16 is provided on the optical path of the diffracted light 9 and the phase of the diffracted light is changed so as to interfere with the direct light, the direct light 8 is used as the background intensity and the diffracted light by the inspected object 14 is contrasted with light and dark. Can be observed on the image plane 17. That is,
It is possible to observe the change in the phase amount such as the change in the refractive index and the change in the thickness of the object to be inspected with the light-dark contrast.

しかし、この明暗コントラストは、被検査物の表面に塵
埃等の異物が存在していても生ずる。従って、位相差顕
微鏡は被検査物自体の凹凸等の欠陥と異物とを検出でき
るが、欠陥と異物とを弁別することができない。このた
め、従来は、位相差顕微鏡によって被検査物の像を得た
後、第3図のスリット12を除去して得られる通過照明顕
微鏡を用いて被検査物を再検鏡し、異物による像を確認
している。
However, this light-dark contrast occurs even if foreign matter such as dust is present on the surface of the inspection object. Therefore, the phase contrast microscope can detect defects such as unevenness of the inspection object itself and the foreign matter, but cannot distinguish the defect and the foreign matter. Therefore, conventionally, after an image of the object to be inspected is obtained by a phase contrast microscope, the object to be inspected is re-inspected using a passage illumination microscope obtained by removing the slit 12 in FIG. I'm confirming.

しかるに、上記通過照明顕微鏡による異物の像の確認は
困難であり、しかも、検鏡を少なくとも2回行なうた
め、検査に時間がかかるという不都合がある。
However, it is difficult to confirm the image of the foreign matter with the above-mentioned transmission illumination microscope, and moreover, the inspection is performed at least twice, so that the inspection takes time.

〔発明の目的〕[Object of the Invention]

本発明の目的は、上記従来技術の課題を解決すべく、被
検査物体自体に存在する微小凹凸や屈折率不均一性の欠
陥と被検査物体表面に付着した異物欠陥とを高感度で且
つ明確に弁別して検査できるようにした欠陥検査方法及
びその装置を提供することにある。
The object of the present invention is to solve the above-mentioned problems of the prior art with high sensitivity and clearness of fine irregularities and refractive index non-uniformity defects existing in the inspected object itself and foreign matter defects adhering to the inspected object surface. (EN) Provided are a defect inspection method and an apparatus therefor capable of discriminating and inspecting.

〔発明の概要〕[Outline of Invention]

被検査物表面上の異物をコントラストよく検出する手段
として、第4図に例示するような斜方照明顕微鏡があ
る。この斜方照明顕微鏡では、光源20を被検査物体22に
対して浅い照明角度になるように配置し、被検査物体22
上に凹凸がないときの照明光23の反射光27が、対物レン
ズ21に直接入射しないようにしている。そして、被検査
物体22上に異物26などが存在すると、回折光24を生じ、
像面25でコントラストよく異物26の像を検出することが
できる。
As a means for detecting foreign matter on the surface of the object to be inspected with good contrast, there is an oblique illumination microscope as illustrated in FIG. In this oblique illumination microscope, the light source 20 is arranged so as to have a shallow illumination angle with respect to the inspection object 22 and
The reflected light 27 of the illumination light 23 when there is no unevenness is prevented from directly entering the objective lens 21. Then, when a foreign matter 26 or the like exists on the inspected object 22, diffracted light 24 is generated,
The image of the foreign matter 26 can be detected with good contrast on the image plane 25.

即ち、本発明は、上記目的を達成するために、位相差顕
微鏡だけでは被検査物体自体に存在する微小凹凸や屈折
率不均一性の欠陥と被検査物体表面に付着した異物欠陥
とを高感度で、且つ明確に弁別して検査できないことに
着目して、第1の照明光束を被検査物体にほぼ垂直に照
明し、更に前記第1の光束と異なる波長の第2の光束を
前記被検査物体の表面に斜め方向から照明し、前記第1
の照明光束によって照明された被検査物体から得られる
位相差量に応じて振幅変調された回折光と前記第2の照
明光束によって斜め方向から照明された被検査物体の表
面からの回折反射光との各々を、対物レンズと位相板及
び吸収膜並びに中心透過部とで構成された位相差顕微鏡
検出光学系を通して結像させて波長によって分離し、該
分離して結像された回折光像を第1の光電変換手段で受
光して被検査物体の厚さ若しくは屈折率に応じた濃淡画
像信号を検出し、該検出された濃淡画像信号を2値化手
段で第1の2値化画像信号に変換し、前記分離されて結
像された回折反射光像を第2の光電変換手段で受光して
被検査物体の表面上の異物の画像信号を検出し、該検出
された異物の画像信号を2値化手段で第2の2値化画像
信号に変換し、前記変換された第1の2値化画像信号と
第2の2値化画像信号とを比較して被検査物体の微小凹
凸や屈折率不均一性の欠陥と被検査物体の表面上の異物
欠陥とを弁別して検出することを特徴とする欠陥検査方
法である。
That is, in order to achieve the above object, the present invention provides a high sensitivity to a fine unevenness or a defect of refractive index nonuniformity existing in the inspected object itself and a foreign matter defect adhering to the inspected object surface only by the phase contrast microscope. In addition, focusing on the fact that it cannot be clearly discriminated and inspected, the first illumination luminous flux is illuminated substantially perpendicularly to the inspected object, and the second luminous flux having a wavelength different from the first luminous flux is further inspected. Illuminate the surface of the
Diffracted light amplitude-modulated according to the amount of phase difference obtained from the object to be inspected illuminated by the illumination luminous flux, and diffracted reflected light from the surface of the object to be inspected illuminated obliquely by the second illumination luminous flux. Each of them is imaged through a phase-contrast microscope detection optical system composed of an objective lens, a phase plate, an absorption film, and a central transmission part, and separated by wavelength, and the diffracted light image formed by the separation is The photoelectric conversion means 1 receives the grayscale image signal according to the thickness or the refractive index of the object to be inspected, and the detected grayscale image signal is converted into the first binarized image signal by the binarization means. The separated and imaged diffracted reflected light image is received by the second photoelectric conversion means to detect the image signal of the foreign matter on the surface of the object to be inspected, and the detected image signal of the foreign matter is detected. The second binarization means converts the second binarized image signal, The converted first binarized image signal and the second binarized image signal are compared with each other to find fine irregularities or defects of refractive index nonuniformity of the inspection object and foreign matter defects on the surface of the inspection object. It is a defect inspection method characterized by discriminating and detecting.

また、本発明は、第1の照明光束を被検査物体にほぼ垂
直に照明し、更に前記第1の光束と異なる波長の第2の
光束を前記被検査物体の表面に斜め方向から照明する照
明手段と、対物レンズと位相板及び吸収膜並びに中心透
過部とで構成され、前記照明手段により第1の照明光束
によって照明された被検査物体から得られる位相差量に
応じて振幅変調された回折光と前記照明手段により第2
の照明光束によって斜め方向から照明された被検査物体
の表面からの回折反射光との各々を、前記対物レンズと
前記位相板及び吸収膜並びに中心透過部とを通して結像
させる位相差顕微鏡検出光学系と、該位相差顕微鏡検出
光学系によって結像される回折光と回折反射光とを波長
によって分離する分離光学系と、前記分離光学系で分離
され、前記位相差顕微鏡検出光学系で結像された回折光
像を受光して被検査物体の厚さ若しくは屈折率に応じた
濃淡画像信号を検出する第1の光電変換手段と、前記分
離光学系で分離され、前記位相差顕微鏡検出光学系で結
像された回折反射光像を受光して被検査物体の表面上の
異物の画像信号を検出する第2の光電変換手段と、前記
第1の光電変換手段で検出された濃淡画像信号を所望の
閾値で2値化して第1の2値化画像信号に変換する第1
の2値化手段と、前記第2の光電変換手段で検出された
異物の画像信号を所望の閾値で2値化して第2の2値化
画像信号に変換する第2の2値化手段と、前記第1の2
値化手段で得られる第1の2値化画像信号と前記第2の
2値化手段で得られる第2の2値化画像信号とを比較し
て被検査物体の微小凹凸や屈折率不均一性の欠陥と被検
査物体の表面上の異物欠陥とを弁別して検出する欠陥検
出手段とを備えたことを特徴とする欠陥検査装置であ
る。
Further, according to the present invention, the first illumination light beam illuminates the object to be inspected substantially perpendicularly, and further the second light beam having a wavelength different from the first light beam illuminates the surface of the object to be inspected from an oblique direction. Means, an objective lens, a phase plate, an absorption film, and a central transmission part, and the amplitude is modulated according to the phase difference amount obtained from the object to be inspected illuminated by the first illumination light beam by the illumination means. Second by light and said lighting means
Of the diffracted and reflected light from the surface of the object to be inspected, which is illuminated in an oblique direction by the illuminating light flux, is imaged through the objective lens, the phase plate, the absorbing film, and the central transmitting portion. And a separation optical system for separating the diffracted light and the diffracted reflected light imaged by the phase contrast microscope detection optical system by wavelength, and separated by the separation optical system and imaged by the phase difference microscope detection optical system. First photoelectric conversion means for receiving a diffracted light image to detect a grayscale image signal corresponding to the thickness or refractive index of the object to be inspected, and the separation optical system for separation, and the phase difference microscope detection optical system for separation. Second photoelectric conversion means for detecting the image signal of the foreign matter on the surface of the object to be inspected by receiving the image of the diffracted reflected light that has been formed, and the grayscale image signal detected by the first photoelectric conversion means are desired. Binarize with the threshold of First be converted into one binary image signal
And a second binarizing unit that binarizes the image signal of the foreign matter detected by the second photoelectric conversion unit with a desired threshold value and converts the image signal into a second binarized image signal. , The first two
The first binarized image signal obtained by the binarizing means and the second binarized image signal obtained by the second binarizing means are compared with each other to form minute unevenness or uneven refractive index of the object to be inspected. A defect inspection apparatus comprising: a defect detection unit that discriminates and detects a defect of a property and a defect of a foreign substance on the surface of an object to be inspected.

〔発明の実施例〕Example of Invention

以下、本発明の一実施例を第1図及び第2図を参照して
説明する。尚、第3図に示す構成要素と同一のものには
同一符号を付して説明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. The same components as those shown in FIG. 3 are designated by the same reference numerals in the following description.

第1図において、コレクタレンズ11と環状のスリット12
との間に、ある波長の光のみを透過する光学フィルタ30
を介装し、像面17の前に光学フィルタ30と同一特性の光
学フィルタ31を配置してある。その他の位相差顕微鏡と
しての構成は第3図のものと同じである。
In FIG. 1, collector lens 11 and annular slit 12
An optical filter 30 that transmits only a certain wavelength of light between
And an optical filter 31 having the same characteristics as the optical filter 30 is disposed in front of the image plane 17. The other structure of the phase contrast microscope is the same as that of FIG.

この位相差顕微鏡光学系の一部に一体に組み込んだ斜方
照明顕微鏡の照明光源32は、被検査物14に対して浅い照
明角度をとるように配置し、照明光源32と被検査物14と
の間に、前記フィルタ30とは別の波長の光を透過する光
学フィルタ33を介装してある。そして、前記光学フィル
タ31の前にハーフミラー34を配置し、ハーフミラー34か
らの反射光を前記光学フィルタ33と同一特性の光学フィ
ルタ35を通して像面36に結像させるようにしてある。
The illumination light source 32 of the oblique illumination microscope integrally incorporated in a part of the phase contrast microscope optical system is arranged so as to have a shallow illumination angle with respect to the inspection object 14, and the illumination light source 32 and the inspection object 14 are provided. An optical filter 33 that transmits light having a wavelength different from that of the filter 30 is interposed between the two. Then, a half mirror 34 is arranged in front of the optical filter 31, and reflected light from the half mirror 34 is focused on an image plane 36 through an optical filter 35 having the same characteristics as the optical filter 33.

位相顕微鏡の照明光源10からの照明光は、コレクタレン
ズ11、フィルタ30、スリット12を通過してコンデンサレ
ンズ13によって被検査物体14を照明する。コンデンサレ
ンズ13の前焦点位置に配置されたスリット12の像は、対
物レンズ15の後焦点位置に置かれた吸収膜18で結像する
ので、被検査物体14を通過してくる直接光37は減衰を受
け、かつ、位相板16によって回折光38と可干渉となり、
位相差顕微鏡による検出像の背景光となる。
Illumination light from the illumination light source 10 of the phase microscope passes through the collector lens 11, the filter 30, and the slit 12 and illuminates the inspected object 14 by the condenser lens 13. The image of the slit 12 arranged at the front focus position of the condenser lens 13 forms an image on the absorption film 18 placed at the rear focus position of the objective lens 15, so that the direct light 37 passing through the inspected object 14 is Attenuated, and becomes coherent with the diffracted light 38 by the phase plate 16,
It becomes the background light of the image detected by the phase contrast microscope.

一方、斜方照明顕微鏡における照明光源32の照明光39に
よる被検査物体14上の異物等による回折光40は、対物レ
ンズ15、ハーフミラー34を経て像面36に斜方照明検微鏡
像を形成する。この回折光40は、吸収膜18の位置では結
像せず、吸収膜18による影響はほとんどない。
On the other hand, the diffracted light 40 due to foreign matter on the object 14 to be inspected by the illumination light 39 of the illumination light source 32 in the oblique illumination microscope forms an oblique illumination microscopic image on the image plane 36 through the objective lens 15 and the half mirror 34. To do. The diffracted light 40 does not form an image at the position of the absorption film 18 and is hardly affected by the absorption film 18.

このように、フィルタ30と31,33と35を用いているの
で、位相差顕微鏡と斜方照明顕微鏡による被検査物体1
4の像を同時に得ることができる。フィルタとしては多
層薄膜フィルタ,色ガラスフィルタ等が使用できる。
As described above, since the filters 30 and 31, and 33 and 35 are used, the object 1 to be inspected by the phase contrast microscope and the oblique illumination microscope 1
4 images can be obtained at the same time. As the filter, a multilayer thin film filter, a colored glass filter or the like can be used.

位相差顕微鏡によれば、被検査物体14の微小凹凸、屈折
率の不均一の様子、被検査物体上の異物がコントラスト
よく検出される。一方、斜方照明顕微鏡によれば、主と
して被検査物体14上の異物がコントラストよく検出され
る。斜方照明顕微鏡では、被検査物体14に大きな段差等
がある場合、これを検出することが可能であるが、微小
な凹凸、とりわけ、ゆるやかに変化する傾斜を検出する
ことは困難である。しかし、位相差顕微鏡では、これも
検出可能である。よって、位相差顕微鏡による検出像と
斜方照明顕微鏡による検出像とを比較することにより、
異物を弁別でき、被検査物自体の欠陥のみを識別でき
る。つまり、両検出像に共に検出されていればそれは異
物と判断でき、位相差顕微鏡による像のみに検出されて
いれば、欠陥であると判断できる。
According to the phase contrast microscope, minute irregularities of the object 14 to be inspected, the state of nonuniform refractive index, and the foreign matter on the object to be inspected are detected with good contrast. On the other hand, according to the oblique illumination microscope, the foreign matter on the inspected object 14 is mainly detected with good contrast. The oblique illumination microscope can detect a large step or the like on the object 14 to be inspected, but it is difficult to detect minute unevenness, especially a gradually changing inclination. However, this can also be detected with a phase contrast microscope. Therefore, by comparing the image detected by the phase contrast microscope and the image detected by the oblique illumination microscope,
Foreign substances can be discriminated and only defects of the inspection object itself can be identified. In other words, if both detected images are detected together, it can be judged as a foreign substance, and if detected only in the image obtained by the phase contrast microscope, it can be judged as a defect.

第2図は欠陥判別装置のブロックである。第1図の像面
17,36に結像した被検査物の夫々の像を光電変換素子等
のテレビカメラ51,52で電気信号に変換する。そして、
次に2値化回路55,56で2値化し、得られた2値化出力
V1,V2を判定回路57で次のように判定する。
FIG. 2 is a block diagram of the defect discriminating apparatus. Image plane of Fig. 1
The respective images of the object to be inspected formed on 17 and 36 are converted into electric signals by the television cameras 51 and 52 such as photoelectric conversion elements. And
Next, the binarization circuits 55 and 56 binarize, and the obtained binarized outputs V1 and V2 are determined by the determination circuit 57 as follows.

D=V12A=V1・V2 ここで、VDは欠陥有りを示す信号、VAは異物有りの信
号であり、V1,V2は、検出信号が有りの場合1,無し
の場合0とする。
V D = V 1 .2 V A = V 1 .V 2 where V D is a signal indicating that there is a defect, V A is a signal indicating that there is a foreign substance, and V 1 and V 2 are when there is a detection signal. 1, 0 if none

尚、第1図において、対物レンズ15、吸収膜18、位相板
16は、一体となって位相差顕微鏡用対物レンズとして通
常市販されているが、本実施例によれば、調整困難な対
物レンズを全く改装なしに市販のものを用いることがで
きる。また、光電変換素子として、たとえばカラーテレ
ビカメラ等を用いれば、ハーフミラー34、フィルタ31,
35が不要になることは勿論である。
In FIG. 1, the objective lens 15, the absorption film 18, the phase plate
Although 16 is generally commercially available as an objective lens for a phase contrast microscope, according to the present embodiment, an objective lens that is difficult to adjust can be used without any remodeling. If a color television camera or the like is used as the photoelectric conversion element, the half mirror 34, the filter 31,
Of course, 35 is unnecessary.

以上の実施例は、透過形の位相差顕微鏡を用いて説明し
てきたが、透過形に限らず落射形を用いてもよい。落射
形を用いれば、被検査物体が透明でなくとも検査できる
という効果がある。
Although the above embodiments have been described by using the transmission type phase contrast microscope, the reflection type is not limited to the transmission type and may be the reflection type. The use of the epi-illumination type has the effect that the object to be inspected can be inspected even if it is not transparent.

この様に、被検査物自体の欠陥と異物との像を同時に得
ることができ、しかも両者の区別が容易なため、欠陥検
査装置の自動化を容易に達成できる。
Thus, the image of the defect and the foreign matter of the inspection object itself can be obtained at the same time, and the two can be easily distinguished, so that the automation of the defect inspection apparatus can be easily achieved.

〔発明の効果〕〔The invention's effect〕

本発明によれば、第1の照明光束を被検査物体にほぼ垂
直に照明し、更に前記第1の光束と異なる波長の第2の
光束を前記被検査物体の表面に斜め方向から照明し、前
記第1の照明光束によって照明された被検査物体から得
られる位相差量に応じて振幅変調された回折光と前記第
2の照明光束によって斜め方向から照明された被検査物
体の表面からの回折反射光との各々を、位相差顕微鏡検
出光学系を通して結像させて波長によって分離し、該分
離して結像された回折光像と回折反射光像との各々を第
1および第2の光電変換手段で受光して被検査物体の厚
さ若しくは屈折率に応じた濃淡画像信号と被検査物体の
表面上の異物の画像信号とを検出し、該検出された濃淡
画像信号および異物の画像信号を2値化手段で第1およ
び第2の2値化画像信号に変換し、前記変換された第1
の2値化画像信号と第2の2値化画像信号とを比較して
被検査物体の微小凹凸や屈折率不均一性の欠陥と被検査
物体の表面上の異物欠陥とを弁別して検出するように構
成したので、異物欠陥を被検査物体の屈折率や反射率に
全く影響を受けることなく弁別して検査でき、しかも位
相差顕微鏡だけでは識別不可能な被検査物体上の微小凹
凸や屈折率不均一性の欠点と該被検査物体の表面上に付
着した塵埃等の異物欠陥とを高感度で、しかも明確に弁
別して検査することができる効果を奏する。
According to the present invention, the first illumination light beam is illuminated substantially perpendicularly to the object to be inspected, and the second light beam having a wavelength different from that of the first light beam is illuminated to the surface of the object to be inspected from an oblique direction. Diffraction light whose amplitude is modulated according to the amount of phase difference obtained from the object to be inspected illuminated by the first illumination light beam and diffraction from the surface of the object to be inspected illuminated obliquely by the second illumination light beam. Each of the reflected light is imaged through a phase-contrast microscope detection optical system and separated by wavelength, and the separated and imaged diffracted light image and diffracted reflected light image are respectively separated into first and second photoelectric The converting means receives the light and shade image signal according to the thickness or refractive index of the object to be inspected and the image signal of the foreign matter on the surface of the object to be inspected, and detects the gray image signal and the image signal of the foreign matter. The first and second binarized images by the binarizing means. Into a signal, which is the converted first
And the second binary image signal are compared with each other to detect the minute irregularities of the object to be inspected or the defect of non-uniformity of refractive index and the foreign matter defect on the surface of the object to be inspected. With this configuration, foreign matter defects can be discriminated and inspected without being affected by the refractive index or reflectance of the inspected object at all, and minute irregularities and refractive index on the inspected object that cannot be identified only by a phase contrast microscope. This has the effect of inspecting defects of non-uniformity and foreign matter defects such as dust adhering to the surface of the object to be inspected with high sensitivity and clearly discriminating.

【図面の簡単な説明】第1図は本考案の一実施例に係る
欠陥検査装置の構成図、第2図は欠陥判別装置のブロッ
ク図、第3図は位相差顕微鏡の構成図、第4図は斜方照
明顕微鏡の構成図である。 10,32…光源、11,13,15…レンズ、12…スリット、14
…被検査物、17,36…像面、30,31,33,35…フィル
タ。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram of a defect inspection apparatus according to an embodiment of the present invention, FIG. 2 is a block diagram of a defect discrimination apparatus, FIG. 3 is a block diagram of a phase contrast microscope, and FIG. The figure is a block diagram of an oblique illumination microscope. 10, 32 ... Light source, 11, 13, 15 ... Lens, 12 ... Slit, 14
… Inspected object, 17,36… Image plane, 30, 31, 33, 35… Filter.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】第1の照明光束を被検査物体にほぼ垂直に
照明し、更に前記第1の光束と異なる波長の第2の光束
を前記被検査物体の表面に斜め方向から照明し、前記第
1の照明光束によって照明された被検査物体から得られ
る位相差量に応じて振幅変調された回折光と前記第2の
照明光束によって斜め方向から照明された被検査物体の
表面からの回折反射光との各々を、対物レンズと位相板
及び吸収膜並びに中心透過部とで構成された位相差顕微
鏡検出光学系を通して結像させて波長によって分離し、
該分離して結像された回折光像を第1の光電変換手段で
受光して被検査物体の厚さ若しくは屈折率に応じた濃淡
画像信号を検出し、該検出された濃淡画像信号を2値化
手段で第1の2値化画像信号に変換し、前記分離されて
結像された回折反射光像を第2の光電変換手段で受光し
て被検査物体の表面上の異物の画像信号を検出し、該検
出された異物の画像信号を2値化手段で第2の2値化画
像信号に変換し、前記変換された第1の2値化画像信号
と第2の2値化画像信号とを比較して被検査物体の微小
凹凸や屈折率不均一性の欠陥と被検査物体の表面上の異
物欠陥とを弁別して検出することを特徴とする欠陥検査
方法。
1. An object to be inspected is illuminated with a first illumination light beam substantially perpendicularly, and a second light beam having a wavelength different from that of the first light beam is illuminated onto the surface of the object to be inspected from an oblique direction. Diffraction light amplitude-modulated according to the amount of phase difference obtained from the object to be inspected illuminated by the first illumination light beam and diffraction reflection from the surface of the object to be inspected illuminated obliquely by the second illumination light beam. Each of the light is imaged through a phase contrast microscope detection optical system composed of an objective lens, a phase plate, an absorption film, and a central transmission part, and separated by wavelength.
The separated photoelectrically formed diffracted light image is received by the first photoelectric conversion means to detect a grayscale image signal according to the thickness or the refractive index of the object to be inspected, and the detected grayscale image signal is An image signal of a foreign substance on the surface of the object to be inspected is converted by the binarizing means into a first binarized image signal, and the separated and imaged diffracted reflected light image is received by the second photoelectric conversion means. Is detected, the detected image signal of the foreign matter is converted into a second binarized image signal by the binarizing means, and the converted first binarized image signal and second binarized image are converted. A defect inspecting method, which compares a signal with a signal to detect a fine unevenness or a non-uniformity in refractive index of an inspected object and a foreign matter defect on a surface of the inspected object.
【請求項2】第1の照明光束を被検査物体にほぼ垂直に
照明し、更に前記第1の光束と異なる波長の第2の光束
を前記被検査物体の表面に斜め方向から照明する照明手
段と、対物レンズと位相板及び吸収膜並びに中心透過部
とで構成され、前記照明手段により第1の照明光束によ
って照明された被検査物体から得られる位相差量に応じ
て振幅変調された回折光と前記照明手段により第2の照
明光束によって斜め方向から照明された被検査物体の表
面からの回折反射光との各々を、前記対物レンズと前記
位相板及び吸収膜並びに中心透過部とを通して結像させ
る位相差顕微鏡検出光学系と、該位相差顕微鏡検出光学
系によって結像される回折光と回折反射光とを波長によ
って分離する分離光学系と、前記分離光学系で分離さ
れ、前記位相差顕微鏡検出光学系で結像された回折光像
を受光して被検査物体の厚さ若しくは屈折率に応じた濃
淡画像信号を検出する第1の光電変換手段と、前記分離
光学系で分離され、前記位相差顕微鏡検出光学系で結像
された回折反射光像を受光して被検査物体の表面上の異
物の画像信号を検出する第2の光電変換手段と、前記第
1の光電変換手段で検出された濃淡画像信号を所望の閾
値で2値化して第1の2値化画像信号に変換する第1の
2値化手段と、前記第2の光電変換手段で検出された異
物の画像信号を所望の閾値で2値化して第2の2値化画
像信号に変換する第2の2値化手段と、前記第1の2値
化手段で得られる第1の2値化画像信号と前記第2の2
値化手段で得られる第2の2値化画像信号とを比較して
被検査物体の微小凹凸や屈折率不均一性の欠陥と被検査
物体の表面上の異物欠陥とを弁別して検出する欠陥検出
手段とを備えたことを特徴とする欠陥検査装置。
2. An illuminating means for illuminating an object to be inspected substantially vertically with a first illuminating light beam and illuminating a surface of the object to be inspected with a second light beam having a wavelength different from that of the first light beam from an oblique direction. And an objective lens, a phase plate, an absorption film, and a central transmission part, and the diffracted light amplitude-modulated according to the amount of phase difference obtained from the object to be inspected illuminated by the first illumination light flux by the illumination means. And the diffracted and reflected light from the surface of the object to be inspected, which is illuminated by the second illumination light flux by the illumination means in an oblique direction, through the objective lens, the phase plate, the absorption film, and the central transmission portion. A phase difference microscope detection optical system, a separation optical system for separating the diffracted light and the diffracted reflected light imaged by the phase difference microscope detection optical system according to wavelength, and the phase difference microscope separated by the separation optical system. First photoelectric conversion means for receiving a diffracted light image formed by the detection optical system and detecting a grayscale image signal according to the thickness or refractive index of the object to be inspected, and separated by the separation optical system, Second photoelectric conversion means for detecting the image signal of the foreign matter on the surface of the object to be inspected by receiving the diffracted and reflected light image formed by the phase difference microscope detection optical system, and detected by the first photoelectric conversion means. A first binarizing unit that binarizes the generated grayscale image signal with a desired threshold value and converts the binarized image signal into a first binarized image signal, and an image signal of the foreign matter detected by the second photoelectric conversion unit. Second binarizing means for binarizing with a desired threshold value and converting into a second binarizing image signal; a first binarizing image signal obtained by the first binarizing means; 2 of 2
Defects that are detected by comparing the second binarized image signal obtained by the binarizing means to discriminate between fine irregularities of the object to be inspected and defects of uneven refractive index and foreign matter defects on the surface of the object to be inspected. A defect inspection apparatus comprising: a detection unit.
JP60219041A 1985-10-03 1985-10-03 Defect inspection method and apparatus Expired - Lifetime JPH061183B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60219041A JPH061183B2 (en) 1985-10-03 1985-10-03 Defect inspection method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60219041A JPH061183B2 (en) 1985-10-03 1985-10-03 Defect inspection method and apparatus

Publications (2)

Publication Number Publication Date
JPS6279335A JPS6279335A (en) 1987-04-11
JPH061183B2 true JPH061183B2 (en) 1994-01-05

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Publication number Priority date Publication date Assignee Title
JP4842442B2 (en) * 2001-01-24 2011-12-21 住友化学株式会社 Convergent light phase contrast microscope apparatus and converging light phase contrast microscope observation method
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