JPH061179B2 - Defect inspection method and apparatus - Google Patents
Defect inspection method and apparatusInfo
- Publication number
- JPH061179B2 JPH061179B2 JP60015340A JP1534085A JPH061179B2 JP H061179 B2 JPH061179 B2 JP H061179B2 JP 60015340 A JP60015340 A JP 60015340A JP 1534085 A JP1534085 A JP 1534085A JP H061179 B2 JPH061179 B2 JP H061179B2
- Authority
- JP
- Japan
- Prior art keywords
- image signal
- inspected
- light
- optical system
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は透明な被検査物体上の欠陥を検出する欠陥検査
方法及びその装置に係り、特に、被検査物体の微小凹凸
欠陥と該被検査物体表面上に付着した塵埃等の異物欠陥
とを明確に区別して検査する欠陥検査方法及びその装置
に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defect inspection method and apparatus for detecting a defect on a transparent object to be inspected, and more particularly to a minute unevenness defect of the object to be inspected and the object to be inspected. The present invention relates to a defect inspection method and apparatus for inspecting foreign matter defects such as dust adhering to the surface by clearly distinguishing them.
人間の目は、明暗の差や色の差を識別する能力はかなり
すぐれているが、ガラスのように透明な物体になると、
よほど大きい傷やよごれがつかないとこれを見分けるこ
とはできない。透明な物体の中にごくわずかに存在する
屈折率や厚さの差を測定する手段として、なまの細胞や
菌などのように透明で明暗や色調の差に乏しい物体を観
察するのに用いられる位相差顕微鏡がある。位相差顕微
鏡は例えば医学書院発行「生体の科学」第17巻6号(196
6年)における水平敏和の「位相差顕微鏡と干渉顕微
鏡」と題する文献において述べられている。The human eye has a great ability to discriminate light and dark differences and color differences, but when it becomes a transparent object like glass,
You can't tell this unless you have very large scratches or dirt. As a means to measure the difference in the refractive index and the thickness that exist in the transparent object very slightly, it is used for observing transparent objects such as raw cells and fungi that have little difference in brightness and color tone. There is a phase contrast microscope. The phase-contrast microscope is, for example, "Science of Living Body" Vol.
6th year) by Toshikazu Horizontal in the article entitled "Phase-contrast microscope and interference microscope".
第5図は位相差顕微鏡の原理構成図で、10は光源、11は
コレクタレンズ、12はリング状のスリット、13はコンデ
ンサレンズでありスリット12はコンデンサ13の前焦点位
置に配置されている。15は対物レンズであり、そしてス
リット12の像ができる対物レンズ15の後焦点位置に吸収
膜18を有する位相板16が配置されている。この吸収膜18
は回折光9に比べて著しく強度の大きな直接光(0次回
折光)8を減衰させ、回折光(高次回折光)9と直接光
8の強度バランスをとるものである。FIG. 5 is a principle configuration diagram of the phase contrast microscope. 10 is a light source, 11 is a collector lens, 12 is a ring-shaped slit, 13 is a condenser lens, and the slit 12 is arranged at the front focus position of the condenser 13. Reference numeral 15 denotes an objective lens, and a phase plate 16 having an absorption film 18 is arranged at the back focal position of the objective lens 15 capable of forming an image of the slit 12. This absorption film 18
Is to attenuate the direct light (0th-order diffracted light) 8 having a remarkably large intensity as compared with the diffracted light 9 to balance the intensity of the diffracted light (higher-order diffracted light) 9 and the direct light 8.
斯かる構成により、コンデンサレンズ13と対物レンズ15
の間に挿置された被検査物体14の透過率によって変調さ
れる直接光8を背景強度とし、被検査物体14の屈折率変
化あるいは厚みの変化という位相差に応じて振幅変調さ
れる回折光9に位相板16を用いて直接光と干渉するよう
に位相変化を与えると、被検査物体14による位相変化を
明暗コントラストで画像17において観察できる。With such a configuration, the condenser lens 13 and the objective lens 15
Diffracted light whose amplitude is modulated according to the phase difference of the refractive index change or the thickness change of the inspected object 14 with the direct light 8 modulated by the transmissivity of the inspected object 14 placed between When a phase change is applied to 9 by using the phase plate 16 so as to directly interfere with the light, the phase change due to the object 14 to be inspected can be observed in the image 17 with a contrast of light and dark.
前述したように、位相差顕微鏡を用いれば、透明物体中
にごくわずか存在する屈折率や厚さの差を明暗コントラ
ストとして観察することができるが、回折光9は試料上
のゴミ等の異物によっても生じるので、異物も明暗コン
トラストとして観察される。一方、位相差顕微鏡にはハ
ローと呼ばれる非常にコントラストの強い光輪が生じ、
観察される像は実像のイメージとは大きく異なったもの
となることが多い。従って、試料に存在する屈折率や厚
さの差として観察される凹凸欠陥と、表面に付着した塵
埃等の異物との識別は非常に困難である。As described above, if a phase contrast microscope is used, it is possible to observe the difference in the refractive index and the thickness, which are present in a transparent object, as a light and dark contrast, but the diffracted light 9 is caused by foreign matter such as dust on the sample. Since foreign matter also occurs, the foreign matter is also observed as light and dark contrast. On the other hand, a phase contrast microscope has a halo with a very high contrast called a halo,
The observed image is often very different from the real image. Therefore, it is very difficult to discriminate between the unevenness defects existing in the sample, which are observed as a difference in the refractive index and the thickness, and the foreign matter such as dust adhering to the surface.
この為、従来では位相差顕微鏡で凹凸欠陥や異物に基づ
く画像を得た後、例えば位相差顕微鏡からスリットを除
去して位相差顕微鏡を透過照明顕微鏡として用い、前記
画像が異物によるものであるか否かを肉眼で再確認して
いた。従って、被検査物体の検査に時間がかかり、また
検査の自動化を図る上で障害となっていた。Therefore, conventionally, after obtaining an image based on uneven defects and foreign matter with a phase contrast microscope, for example, using a phase contrast microscope as a transmission illumination microscope by removing the slit from the phase contrast microscope, whether the image is due to foreign matter. It was reconfirmed with the naked eye whether or not. Therefore, it takes a long time to inspect the object to be inspected, which is an obstacle to the automation of the inspection.
本発明の目的は、上記した従来方法の欠点をなくし、被
検査物体の微小凹凸欠陥と被検査物体表面上に付着した
塵埃等の異物欠陥とを高感度で、しかも明確に弁別して
検査できるようにした欠陥検査方法及びその装置を提供
することにある。An object of the present invention is to eliminate the above-mentioned drawbacks of the conventional method, and to detect the minute unevenness defect of the object to be inspected and the foreign matter defect such as dust adhering on the surface of the object to be inspected with high sensitivity and clearly discriminating. To provide a defect inspection method and an apparatus therefor.
本発明は、上記目的を達成するため、位相差顕微鏡だけ
では被検査物体の微小凹凸欠陥と被検査物体表面上の異
物欠陥とを明確に弁別して検査できないことに着目し、
同心状で互いに異なる波長を有する第1および第2の照
明光束を被検査物体にほぼ垂直に照明し、該第1の照明
光束によって照明された被検査物体から得られる被検査
物体の厚さ若しくは屈折率に基づく位相差量に応じて振
幅変調された高次回折光と前記第2の照明光束によって
照明された被検査物体表面からの反射率若しくは透過率
によって振幅変調された光との各々を、対物レンズと該
対物レンズの光軸に対して同心状の位相板及び吸収膜並
びに中心透過部とで構成された位相差顕微鏡検出光学系
を通して結像させて波長によって分離し、該分離して結
像された高次回折光像を第1の光電手段で受光して被検
査物体の厚さ若しくは屈折率に応じた濃淡画像信号を検
出し、該検出された濃淡画像信号を2値化手段で第1の
2値化画像信号に変換し、前記分離されて結像された反
射率若しくは透過率によって振幅変調された光像を第2
の光電変換手段で受光して異物の画像信号を検出し、該
検出された異物の画像信号を2値化手段で第2の2値化
画像信号に変換し、前記変換された第1の2値化画像信
号と第2の2値化画像信号とを比較して被検査物体の微
小凹凸欠陥と被検査物体表面上の異物欠陥とを弁別して
検出することを特徴とする欠陥検査方法である。The present invention, in order to achieve the above object, focusing on the fact that it is not possible to inspect by clearly discriminating the minute unevenness defect of the inspection object and the foreign matter defect on the inspection object surface only by the phase contrast microscope,
The thickness of the object to be inspected obtained by illuminating the object to be inspected with the first and second illumination light beams having concentric and different wavelengths substantially perpendicularly, and obtaining the object from the object to be inspected illuminated by the first illumination light beam or Each of the high-order diffracted light amplitude-modulated according to the phase difference amount based on the refractive index and the light amplitude-modulated by the reflectance or the transmittance from the surface of the object to be inspected illuminated by the second illumination light flux, An image is formed through a phase-contrast microscope detection optical system composed of an objective lens, a phase plate and an absorption film that are concentric with respect to the optical axis of the objective lens, and a central transmission portion, and the images are separated by wavelength, and the separated and combined. The imaged higher-order diffracted light image is received by the first photoelectric means to detect a grayscale image signal corresponding to the thickness or refractive index of the object to be inspected, and the detected grayscale image signal is converted to a second value by the binarizing means. For binary image signal of 1 Conversion, and said isolated by optical image that has been amplitude-modulated by the imaging reflectance or transmittance second
The photoelectric conversion means detects light to detect an image signal of a foreign matter, the binarizing means converts the detected image signal of the foreign matter into a second binarized image signal, and the converted first two A defect inspection method characterized by comparing a binarized image signal with a second binarized image signal to discriminately detect a fine unevenness defect of an inspected object and a foreign matter defect on the surface of the inspected object. .
また、本発明は、同心状で互いに異なる波長を有する第
1および第2の照明光束を被検査物体にほぼ垂直に照明
する照明手段と、対物レンズと該対物レンズの光軸に対
して同心状の位相板及び吸収膜並びに中心透過部とで構
成され、前記照明手段により第1の照明光束によって照
明された被検査物体から得られる被検査物体の厚さ若し
くは屈折率に基づく位相差量に応じて振幅変調された高
次回折光と前記照明手段により第2の照明光束によって
照明された被検査物体表面からの反射率若しくは透過率
によって振幅変調された光との各々を前記対物レンズと
前記位相板及び吸収膜並びに中心透過部とを通して結像
させる位相顕微鏡検出光学系と、該位相差顕微鏡検出光
学系によって結像される高次回折光と反射率若しくは透
過率によって振幅変調された光とを波長によって分離す
る分離光学系と、前記分離光学系で分離され、前記位相
差顕微鏡検出光学系で結像された高次回折光像を受光し
て被検査物体の厚さ若しくは屈折率に応じた濃淡画像信
号を検出する第1の光電変換手段と、前記分離光学系で
分離され、前記位相差顕微鏡検出光学系で結像された反
射率若しくは透過率によって振幅変調された光像を受光
して被検査物体表面上の異物の画像信号を検出する第2
の光電変換手段と、前記第1の光電変換手段で検出され
た濃淡画像信号を所望の閾値で2値化して第1の2値化
画像信号に変換する第1の2値化手段と、前記第2の光
電変換手段で検出された異物の画像信号を所望の閾値で
2値化して第2の2値化画像信号に変換する第2の2値
化手段と、前記第1の2値化手段で得られる第1の2値
化画像信号と前記第2の2値化手段で得られる第2の2
値化画像信号とを比較して被検査物体の微小凹凸欠陥と
被検査物体表面上の異物欠陥とを弁別して検出する欠陥
検出手段とを備えたことを特徴とする欠陥検査装置であ
る。Further, according to the present invention, an illuminating means for illuminating an object to be inspected with first and second illuminating light fluxes which are concentric and have mutually different wavelengths, and an objective lens and a concentric optical axis of the objective lens. According to the phase difference amount based on the thickness or the refractive index of the inspected object obtained from the inspected object illuminated by the first illumination light flux by the illuminating means. Of the high-order diffracted light amplitude-modulated by the illumination means and the light amplitude-modulated by the reflectance or the transmittance from the surface of the object to be inspected illuminated by the second illumination light flux by the illumination means. And a phase microscope detection optical system for forming an image through the absorption film and the central transmission portion, and an amplitude due to the higher order diffracted light and the reflectance or the transmittance formed by the phase difference microscope detection optical system. Separation optical system for separating modulated light by wavelength, and the thickness of the object to be inspected by receiving the high-order diffracted light image separated by the separation optical system and formed by the phase contrast microscope detection optical system. First photoelectric conversion means for detecting a grayscale image signal corresponding to a refractive index, and light separated by the separation optical system and amplitude-modulated by the reflectance or the transmittance imaged by the phase difference microscope detection optical system. Second, which receives an image and detects an image signal of a foreign matter on the surface of an object to be inspected
And a first binarizing unit that binarizes the grayscale image signal detected by the first photoelectric converting unit with a desired threshold value and converts the binarized image signal into a first binarized image signal. Second binarization means for binarizing the image signal of the foreign matter detected by the second photoelectric conversion means with a desired threshold value and converting it into a second binarized image signal; and the first binarization. A first binarized image signal obtained by means and a second binarized image signal obtained by the second binarization means.
A defect inspection apparatus comprising: a defect detection unit that compares a binarized image signal with each other to discriminate and detect a minute unevenness defect of an inspection object and a foreign matter defect on the surface of the inspection object.
以下、本発明の一実施例を第1図乃至第4図に基づき説
明する。An embodiment of the present invention will be described below with reference to FIGS. 1 to 4.
第1図は本発明の第1実施例に係る欠陥検査装置の原理
構成図で、第5図に示す部材と同一部材には同一符号を
付してある。FIG. 1 is a principle configuration diagram of a defect inspection apparatus according to the first embodiment of the present invention, and the same members as those shown in FIG. 5 are designated by the same reference numerals.
本実施例に係る欠陥検査装置では、コレクタレンズ11と
コンデンサレンズ13との間に介挿するスリットとして、
第2図に示すようなフィルタ12′は円状の緑色フィルタ
20と、該フィルタ20の外周に配置されたリング状の赤色
フィルタから構成してある。そして、位相板16と像面17
の間の光路中に、赤色光を透過し、緑色光を反射するダ
イクロイックミラー22を配置し、緑色光の像を像面23に
結像させるよりにしてある。つまり、本実施例の欠陥検
査装置は、赤色光で位相差顕微鏡による像を得、緑色光
で透過照明顕微鏡による像を得るようになっている。In the defect inspection apparatus according to the present embodiment, as the slit inserted between the collector lens 11 and the condenser lens 13,
The filter 12 'shown in FIG. 2 is a circular green filter.
20 and a ring-shaped red filter arranged on the outer periphery of the filter 20. Then, the phase plate 16 and the image plane 17
A dichroic mirror 22 that transmits red light and reflects green light is arranged in the optical path between the two, and an image of green light is formed on the image plane 23. That is, the defect inspection apparatus of this embodiment is adapted to obtain an image by a phase contrast microscope with red light and an image with a transmission illumination microscope with green light.
斯かる構成により、透過照明光源10より発せられ、フィ
ルタ12′の赤色フィルタ21を通過した赤色光25は、コレ
クタレンズ13を通って被検査物体14を照明する。この赤
色照明光25によって、被検査物体14から、被検査物体14
の透過率によって主として振幅変調される直接光8と、
被検査物体14の厚さあるいは屈折率に応じて振幅変調を
受け、かつλ/4の位相変化を生じた回折光9が発せられ
る。直接光8は、位相板16によってλ/4あるいは−λ/4
の位相変化を受け、吸収膜18によって減衰させられて、
回折光9と干渉できるように変換される。直接光8と回
折光9は共に赤色であるので、ダイクロイックミラー22
を透過し、像面17に被検査物体14の位相差量に応じた濃
淡画像を形成する。With such a configuration, the red light 25 emitted from the transmissive illumination light source 10 and passing through the red filter 21 of the filter 12 'passes through the collector lens 13 and illuminates the inspected object 14. The red illumination light 25 causes the object 14 to be inspected
Direct light 8 whose amplitude is mainly modulated by the transmittance of
Diffracted light 9 which is amplitude-modulated according to the thickness or refractive index of the object 14 to be inspected and has a phase change of λ / 4 is emitted. The direct light 8 is converted into λ / 4 or −λ / 4 by the phase plate 16.
Is absorbed by the absorption film 18,
It is converted so that it can interfere with the diffracted light 9. Since both the direct light 8 and the diffracted light 9 are red, the dichroic mirror 22
And a grayscale image corresponding to the phase difference amount of the inspection object 14 is formed on the image surface 17.
一方、照明光源10より発せられ、フィルタ12の緑色フィ
ルタ20を通過する緑色光24は、コンデンサレンズ13を通
って被検査試料14を照明する。この緑色光24によって被
検査物体14から、被検査物体14の透過率によって主とし
て振幅変調される光線26が発せられる。光線26は対物レ
ンズ15、位相板16及び吸収膜18を通過する。位相板16に
よる位相変化は光線26の振幅変調特性を何ら変化させな
いし、また、吸収膜18は微小であるので、光電26に大き
な影響を与えない。従って、光線26は通常の通過照明光
学系によって得られる光線とほぼ同一となる。この光線
26は、ダイクロイックミラー22によって反射され、像画
23に透過照明検出像、即ちゴミの像を形成する。On the other hand, the green light 24 emitted from the illumination light source 10 and passing through the green filter 20 of the filter 12 passes through the condenser lens 13 and illuminates the sample 14 to be inspected. The green light 24 causes the inspected object 14 to emit a light beam 26 whose amplitude is mainly modulated by the transmittance of the inspected object 14. The light ray 26 passes through the objective lens 15, the phase plate 16 and the absorbing film 18. The phase change by the phase plate 16 does not change the amplitude modulation characteristic of the light ray 26 at all, and the absorption film 18 is minute, so that it does not significantly affect the photoelectric 26. Therefore, the light ray 26 is almost the same as the light ray obtained by a normal passing illumination optical system. This ray
26 is reflected by the dichroic mirror 22, and the image
A transmitted illumination detection image, that is, a dust image is formed on 23.
そして、第3図に示すように、像面17及び像面23に光電
変換素子、たとえばテレビカメラ27,28をそれぞれ配置
し、電気信号29,30を2値化回路31,32でそれぞれ2値
化し、2値化回路31,32の出力をそれぞれV1,V2とし
て判定回路33を用いて以下の判定を行なえば、自動的に
欠陥検出出力VD,VAが得られる。Then, as shown in FIG. 3, photoelectric conversion elements such as television cameras 27 and 28 are arranged on the image plane 17 and the image plane 23, respectively, and the electric signals 29 and 30 are binarized by the binarization circuits 31 and 32, respectively. Then, if the outputs of the binarization circuits 31 and 32 are set to V 1 and V 2 , respectively, and the following determination is performed using the determination circuit 33, the defect detection outputs V D and V A are automatically obtained.
V1,V2それぞれの信号は、2値化後検出信号有りとな
った場合1、無しとなった場合0として VD=V1・▲2▼ VA=V1・V2 として求める。信号V1は、凹凸欠陥またはゴミ等が有
りの場合に1となり、信号V2はゴミ等が有る場合に1
となる。従って、信号VDが1のときそれは凹凸欠陥と
判定でき、信号VAが1のときゴミであると判定でき
る。V 1, V 2 each signal, when it becomes that there is binarized after detection signal 1 is obtained as V D = V 1 · ▲ 2 ▼ V A = V 1 · V 2 0 when a no. The signal V 1 is 1 when there are uneven defects or dust, and the signal V 2 is 1 when dust is present.
Becomes Therefore, when the signal V D is 1, it can be determined that it is an irregular defect, and when the signal V A is 1, it can be determined that it is dust.
尚、第1図に示すダイクロイックミラー22をプリズムあ
るいはハーフミラーに替え、フィルタ12′を使用せずに
第5図のスリット12を用いて、像面17の前に赤色のフィ
ルタ、像面23の前面に緑色のフィルタを配置したもので
よいことは勿論である。また、ダイクロイックミラー2
2、像面23を用いずに、赤色光と緑色光による両像を像
面17に結像させた場合、カラーテレビカメラでこれ等を
受像して分離すればよい。In addition, the dichroic mirror 22 shown in FIG. 1 is replaced with a prism or a half mirror, and the slit 12 of FIG. 5 is used without using the filter 12 ′. Needless to say, a green filter may be arranged on the front surface. Also, dichroic mirror 2
2. When both images of red light and green light are formed on the image surface 17 without using the image surface 23, these may be received and separated by a color television camera.
本実施例によれば、単一の光源を用いて位相差顕微鏡に
よる観察像と透過照明顕微鏡による観察像とを同時に得
ることができ、被検査物体上の微小な凹凸等による欠陥
と、埃等の異物の識別を容易に行なうことができるとい
う効果がある。また、第1図のスリット12′の中央部20
を通過する光を利用するので、光源の有効利用が図れる
という効果がある。また、通常、市販されている位相差
用対物レンズは、第1図において、対物レンズ15と位相
板16及び吸収膜18が一体となっているが、本実施例によ
れば、調整困難な対物レンズを全く改造することなしに
市販のものを用いることができるという効果がある。According to the present embodiment, it is possible to obtain an observation image by a phase contrast microscope and an observation image by a transmission illumination microscope at the same time using a single light source. There is an effect that the foreign matter can be easily identified. Also, the central portion 20 of the slit 12 'in FIG.
Since the light that passes through is used, there is an effect that the light source can be effectively used. Further, in a commercially available phase difference objective lens, the objective lens 15, the phase plate 16 and the absorption film 18 are usually integrated in FIG. 1, but according to this embodiment, it is difficult to adjust the objective lens. There is an effect that a commercially available product can be used without modifying the lens at all.
第4図は本発明の第2の実施例に係る欠陥検査装置の原
理構成図で、第5図に示す部材と同一部材には同一符号
を付してある。本実施例では、位相差顕微鏡光学系に落
射照明顕微鏡光学系を一体に組み込み、赤色光で位相差
顕微鏡による像を得、緑色光で落射照明顕微鏡による像
を得るようにしてある。FIG. 4 is a principle block diagram of the defect inspection apparatus according to the second embodiment of the present invention, in which the same members as those shown in FIG. 5 are designated by the same reference numerals. In the present embodiment, the epi-illumination microscope optical system is integrally incorporated in the phase-contrast microscope optical system so that an image obtained by the phase-contrast microscope is obtained by red light and an image obtained by the epi-illumination microscope is obtained by green light.
第4図において、34は落射照明用光源、38,40は赤色フ
ィルタ、35,41はハーフミラー、36はリレーレンズ、37
は緑色フィルタ、39は像面である。In FIG. 4, 34 is a light source for epi-illumination, 38 and 40 are red filters, 35 and 41 are half mirrors, 36 is a relay lens, 37
Is a green filter, and 39 is an image plane.
赤色光で位相差顕微鏡による像を得る原理は前述した第
1実施例と同様であるため省略する。落射照明顕微鏡光
学系では、光源34からの照明光は、ハーフミラー41、リ
レーレンズ36を通過した後、緑色フィルタ37により緑色
光のみ透過される。この緑色光は、ハーフミラー35、位
相板16、対物レンズ15を通して被検査物体14を照明す
る。被検査物体14表面上のゴミ等の情報を含む反射光
は、前述と同じ光路を逆に進んでハーフミラー41に到
り、該ハーフミラー41で反射されて像面39に結像され
る。The principle of obtaining an image by a phase contrast microscope with red light is the same as that of the first embodiment described above, and will be omitted. In the epi-illumination microscope optical system, the illumination light from the light source 34 passes through the half mirror 41 and the relay lens 36, and then only the green light is transmitted by the green filter 37. This green light illuminates the inspected object 14 through the half mirror 35, the phase plate 16 and the objective lens 15. Reflected light containing information such as dust on the surface of the object 14 to be inspected travels in the same optical path as described above in the reverse direction, reaches the half mirror 41, is reflected by the half mirror 41, and is imaged on the image plane 39.
像面17と39の夫々の像による信号を、第3図で説明した
と同様に処理すると、凹凸欠陥のみの検出信号を得るこ
とができる。By processing the signals of the respective images on the image planes 17 and 39 in the same manner as described with reference to FIG. 3, it is possible to obtain the detection signal of only the uneven defects.
尚、この第2実施例においても、赤色フィルタ40、リレ
ーレンズ36、ハーフミラー41、像面39を廃止し、落射照
明顕微鏡による像を像面17上に結像させ、この像と位相
差顕微鏡による像とをカラーテレビカメラで分離するよ
うにしてもよいことは勿論である。Also in this second embodiment, the red filter 40, the relay lens 36, the half mirror 41, and the image plane 39 are eliminated, and an image obtained by the epi-illumination microscope is formed on the image plane 17, and this image and the phase contrast microscope are used. Needless to say, the color image may be separated from the image by the color television camera.
以上の各実施例では、赤色フィルタ、緑色フィルタ等を
用いたが、これは他の組み合わせでもよく、要は、位相
差光学顕微鏡による像と透過照明顕微鏡等他の顕微鏡に
よる像とを分離できるものであればよい。In each of the above embodiments, the red filter, the green filter and the like were used, but this may be another combination, that is, an image obtained by a phase contrast optical microscope and an image obtained by another microscope such as a transmission illumination microscope can be separated. If
以上説明したとおり、本発明によれば、同心状で互いに
異なる波長を有する第1および第2の照明光束を被検査
物体にほぼ垂直に照明し、位相差量に応じて振幅変調さ
れた高次回折光と反射率若しくは透過率によって振幅変
調された光との各々を位相差顕微鏡検出光学系を通して
結像させて波長によって分離し、該分離されて結像され
た位相差量に応じて振幅変調された高次回折光像と反射
率若しくは透過率によって振幅変調された光像との各々
を第1及び第2の光電変換手段で受光して被検査物体の
厚さ若しくは屈折率に応じた濃淡画像信号および異物の
画像信号を検出し、該検出された濃淡画像信号および異
物の画像信号の各々を2値化手段で第1および第2の2
値化画像信号に変換し、前記変換された第1の2値化画
像信号と第2の2値化画像信号とを比較して被検査物体
の微小凹凸欠陥と被検査物体表面上の異物欠陥とを弁別
して検出するように構成したので、位相差顕微鏡のみで
は識別不可能な被検査物体の微小凹凸欠陥を、欠陥の形
状に影響を受けることなく、被検査物体上に付着した塵
埃等の異物欠陥と高感度で、しかも明確に弁別して検査
することができる効果を奏する。As described above, according to the present invention, the first and second illumination light fluxes having concentric and different wavelengths are illuminated substantially perpendicularly to the object to be inspected, and the high-order amplitude modulation is performed according to the phase difference amount. Each of the folded light and the light amplitude-modulated by the reflectance or the transmittance is imaged through a phase-contrast microscope detection optical system, separated by wavelength, and amplitude-modulated according to the amount of the phase difference separated and imaged. A high-order diffracted light image and a light image amplitude-modulated by reflectance or transmittance are received by the first and second photoelectric conversion means, and a grayscale image signal corresponding to the thickness or refractive index of the object to be inspected. And the image signal of the foreign matter is detected, and the detected grayscale image signal and the image signal of the foreign matter are respectively detected by the binarizing means.
The image data is converted into a binarized image signal, and the converted first binarized image signal and second binarized image signal are compared with each other to detect minute unevenness defects of the inspection object and foreign matter defects on the surface of the inspection object. Since it is configured to detect by discriminating between and, the minute unevenness defect of the inspected object that cannot be identified only by the phase contrast microscope, without being affected by the shape of the defect, such as dust attached to the inspected object It has the effect of being highly sensitive to foreign matter defects and capable of being clearly discriminated and inspected.
第1図は本発明の第1実施例に係る欠陥検査装置の原理
構成図、第2図は第1図に示すフィルタの構成図、第3
図は映像信号処理回路図、第4図は本発明の第2実施例
に係る欠陥検査装置の原料構成図、第5図は一般の位相
差顕微鏡の原理構成図である。 10…透過照明光源、11…コレクタレンズ、12…スリッ
ト、12′…フィルタ、13…コンデンサレンズ、14…被検
査試料、15…レンズ、16…位相板、18…吸収膜、22…ダ
イクロイックミラー、17,23,39…像面、34…落射照明
光源、35,41…ハーフミラー、37…緑色フィルタ、38,
40…赤色フィルタ。FIG. 1 is a principle block diagram of the defect inspection apparatus according to the first embodiment of the present invention, FIG. 2 is a block diagram of the filter shown in FIG. 1, and FIG.
FIG. 4 is a video signal processing circuit diagram, FIG. 4 is a raw material configuration diagram of a defect inspection apparatus according to a second embodiment of the present invention, and FIG. 5 is a principle configuration diagram of a general phase contrast microscope. 10 ... Transmitted illumination light source, 11 ... Collector lens, 12 ... Slit, 12 '... Filter, 13 ... Condenser lens, 14 ... Inspected sample, 15 ... Lens, 16 ... Phase plate, 18 ... Absorption film, 22 ... Dichroic mirror, 17, 23, 39 ... Image plane, 34 ... Epi-illumination light source, 35, 41 ... Half mirror, 37 ... Green filter, 38,
40 ... Red filter.
Claims (2)
よび第2の照明光束を被検査物体にほぼ垂直に照明し、
該第1の照明光束によつて照明された被検査物体から得
られる被検査物体の厚さ若しくは屈折率に基づく位相差
量に応じて振幅変調された高次回折光と前記第2の照明
光束によって照明された被検査物体表面からの反射率若
しくは透過率によって振幅変調された光との各々を、対
物レンズと該対物レンズの光軸に対して同心状の位相板
及び吸収膜並びに中心透過部とで構成された位相差顕微
鏡検出光学系を通して結像させて波長によって分離し、
該分離して結像された高次回折光像を第1の光電変換手
段で受光して被検査物体の厚さ若しくは屈折率に応じた
濃淡画像信号を検出し、該検出された濃淡画像信号を2
値化手段で第1の2値化画像信号に変換し、前記分離さ
れて結像された反射率若しくは透過率によって振幅変調
された光像を第2の光電変換手段で受光して異物の画像
信号を検出し、該検出された異物の画像信号を2値化手
段で第2の2値化画像信号に変換し、前記変換された第
1の2値化画像信号と第2の2値化画像信号とを比較し
て被検査物体の微小凹凸欠陥と被検査物体表面上の異物
欠陥とを弁別して検出することを特徴とする欠陥検査方
法。1. An object to be inspected is illuminated substantially vertically with first and second illumination light beams having concentric and different wavelengths from each other,
The high-order diffracted light amplitude-modulated according to the phase difference amount based on the thickness or the refractive index of the object to be inspected obtained from the object to be inspected illuminated by the first illumination light beam and the second illumination light beam. An objective lens, a phase plate and an absorption film concentric with respect to the optical axis of the objective lens, and a central transmitting portion are provided for each of the light whose amplitude is modulated by the reflectance or the transmittance from the illuminated surface of the object to be inspected. Imaged through the phase-contrast microscope detection optical system composed of and separated by wavelength,
The separated high-order diffracted light image is received by the first photoelectric conversion means to detect a grayscale image signal corresponding to the thickness or the refractive index of the object to be inspected, and the detected grayscale image signal is detected. Two
An image of the foreign matter is obtained by converting the first binarized image signal into a first binarized image signal by the binarizing means, and receiving the separated optical image amplitude-modulated by the reflectance or the transmissivity by the second photoelectric conversion means. A signal is detected, the detected image signal of the foreign matter is converted into a second binarized image signal by a binarizing means, and the converted first binarized image signal and second binarized image signal. A defect inspection method, which compares the image signals with each other to discriminate and detect a fine unevenness defect of an inspection object and a foreign matter defect on the surface of the inspection object.
よび第2の照明光束を被検査物体にほぼ垂直に照明する
照明手段と、対物レンズと該対物レンズの光軸に対して
同心状の位相板及び吸収膜並びに中心透過部とで構成さ
れ、前記照明手段により第1の照明光束によって照明さ
れた被検査物体から得られる被検査物体の厚さ若しくは
屈折率に基づく位相差量に応じて振幅変調された高次回
折光と前記照明手段により第2の照明光束によって照明
された被検査物体表面からの反射率若しくは透過率によ
って振幅変調された光との各々を前記対物レンズと前記
位相板及び吸収膜並びに中心透過部とを通して結像させ
る位相差顕微鏡検出光学系と、該位相差顕微鏡検出光学
系によって結像される高次回折光と反射率若しくは透過
率によって振幅変調された光とを波長によって分離する
分離光学系と、前記分離光学系で分離され、前記位相差
顕微鏡検出光学系で結像された高次回折光像を受光して
被検査物体の厚さ若しくは屈折率に応じた濃淡画像信号
を検出する第1の光電変換手段と、前記分離光学系で分
離され、前記位相差顕微鏡検出光学系で結像された反射
率若しくは透過率によって振幅変調された光像を受光し
て被検査物体表面上の異物の画像信号を検出する第2の
光電変換手段と、前記第1の光電変換手段で検出された
濃淡画像信号を所望の閾値で2値化して第1の2値化画
像信号に変換する第1の2値化手段と、前記第2の光電
変換手段で検出された異物の画像信号を所望の閾値で2
値化して第2の2値化画像信号に変換する第2の2値化
手段と、前記第1の2値化手段で得られる第1の2値化
画像信号と前記第2の2値化手段で得られる第2の2値
化画像信号とを比較して被検査物体の微小凹凸欠陥と被
検査物体表面上の異物欠陥とを弁別して検出する欠陥検
出手段とを備えたことを特徴とする欠陥検査装置。2. An illuminating means for illuminating an object to be inspected with first and second illuminating light beams which are concentric and have mutually different wavelengths, and an objective lens and a concentric optical axis of the objective lens. Depending on the phase difference amount based on the thickness or the refractive index of the object to be inspected obtained from the object to be inspected, which is composed of the phase plate, the absorbing film, and the central transmitting portion, and is illuminated by the first illumination light flux by the illuminating means. The high-order diffracted light that has been amplitude-modulated and the light that has been amplitude-modulated by the reflectance or the transmittance from the surface of the object to be inspected illuminated by the second illumination light flux by the illumination means are provided with the objective lens, the phase plate, and A phase-contrast microscope detection optical system that forms an image through the absorption film and the central transmission part, and an amplitude change due to the higher-order diffracted light imaged by the phase-contrast microscope detection optical system and the reflectance or the transmittance. The separation optical system for separating the separated light according to the wavelength, and the thickness or refraction of the object to be inspected by receiving the high-order diffracted light image separated by the separation optical system and formed by the phase difference microscope detection optical system. A first photoelectric conversion means for detecting a grayscale image signal according to the ratio, and an optical image separated by the separation optical system and amplitude-modulated by the reflectance or the transmittance formed by the phase difference microscope detection optical system. Second photoelectric conversion means for receiving the light to detect the image signal of the foreign matter on the surface of the object to be inspected, and the grayscale image signal detected by the first photoelectric conversion means are binarized with a desired threshold value to obtain a first First binarizing means for converting into a binary image signal, and the image signal of the foreign matter detected by the second photoelectric converting means is set to 2 with a desired threshold value.
Second binarizing means for binarizing and converting to a second binarized image signal; first binarized image signal and second binarization obtained by the first binarizing means; A defect detection means for comparing the second binary image signal obtained by the means to discriminate between the minute unevenness defect of the inspection object and the foreign matter defect on the surface of the inspection object. Defect inspection device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015340A JPH061179B2 (en) | 1985-01-31 | 1985-01-31 | Defect inspection method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015340A JPH061179B2 (en) | 1985-01-31 | 1985-01-31 | Defect inspection method and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61175513A JPS61175513A (en) | 1986-08-07 |
| JPH061179B2 true JPH061179B2 (en) | 1994-01-05 |
Family
ID=11886057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60015340A Expired - Lifetime JPH061179B2 (en) | 1985-01-31 | 1985-01-31 | Defect inspection method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH061179B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6435418A (en) * | 1987-07-30 | 1989-02-06 | Matsushita Electric Industrial Co Ltd | Method for evaluating liquid crystal orientational capacity of oriented film |
| JP2963890B2 (en) | 1998-03-09 | 1999-10-18 | 株式会社スーパーシリコン研究所 | Wafer optical shape measuring instrument |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767844A (en) * | 1980-10-15 | 1982-04-24 | Nippon Kogaku Kk <Nikon> | Surface inspecting device |
| JPS5990813A (en) * | 1982-11-15 | 1984-05-25 | Nippon Kogaku Kk <Nikon> | Projection type microscope |
-
1985
- 1985-01-31 JP JP60015340A patent/JPH061179B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61175513A (en) | 1986-08-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6346966B1 (en) | Image acquisition system for machine vision applications | |
| US5805278A (en) | Particle detection method and apparatus | |
| US4650326A (en) | Apparatus for inspecting bottles | |
| EP0028774B1 (en) | Apparatus for detecting defects in a periodic pattern | |
| US5659390A (en) | Method and apparatus for detecting particles on a surface of a semiconductor wafer having repetitive patterns | |
| US5141303A (en) | Method and apparatus for discriminating eye fundus blood vessels | |
| JPH01187437A (en) | Defect inspection equipment and defect inspection method | |
| JPH07117496B2 (en) | Surface inspection method | |
| US4402612A (en) | Apparatus for detecting foreign particles in a liquid | |
| US5907396A (en) | Optical detection system for detecting defects and/or particles on a substrate | |
| JPH0562696B2 (en) | ||
| EP0264427A1 (en) | Method and apparatus for identifying particulate matter | |
| JPH10176995A (en) | Transparent object inspection method and apparatus | |
| JPH05296937A (en) | Foreign matter inspecting device | |
| JPH061179B2 (en) | Defect inspection method and apparatus | |
| CA1168467A (en) | Apparatus for automatically detecting and evaluating the characteristics of prints | |
| JPS58120106A (en) | Detecting device for focal point | |
| JPH061183B2 (en) | Defect inspection method and apparatus | |
| JP3390931B2 (en) | Inspection method for colored pattern defects | |
| JPH0562684B2 (en) | ||
| JPH0682373A (en) | Defect inspection method | |
| JPS60169743A (en) | Defect detecting method of surface of article | |
| JP4680545B2 (en) | Appearance inspection method and appearance inspection apparatus | |
| JPH061178B2 (en) | Defect inspection method and apparatus | |
| JP2801916B2 (en) | Defect inspection equipment |