JPH063766B2 - Superconducting coil manufacturing method - Google Patents
Superconducting coil manufacturing methodInfo
- Publication number
- JPH063766B2 JPH063766B2 JP62218538A JP21853887A JPH063766B2 JP H063766 B2 JPH063766 B2 JP H063766B2 JP 62218538 A JP62218538 A JP 62218538A JP 21853887 A JP21853887 A JP 21853887A JP H063766 B2 JPH063766 B2 JP H063766B2
- Authority
- JP
- Japan
- Prior art keywords
- superconducting
- oxide
- oxide superconducting
- thin film
- superconducting material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000463 material Substances 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 238000010030 laminating Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 30
- 239000010408 film Substances 0.000 description 15
- 239000010410 layer Substances 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000004146 energy storage Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y02E40/642—
Landscapes
- Superconductors And Manufacturing Methods Therefor (AREA)
Description
【発明の詳細な説明】 「発明の利用分野」 本発明は薄膜のセラミック系超電導(超伝導ともいう)
材料の作製方法に関する。本発明は、気体上に薄膜化し
て形成された材料に対し、レーザ光を選択的に照射して
除去し、残存部の酸化物超電導材料を用い超電導電子装
置好ましくは超電導コイル(エネルギー蓄積用またはマ
グネット用等に用いる)を作らんとするものである。DETAILED DESCRIPTION OF THE INVENTION “Field of Use of the Invention” The present invention relates to a thin film ceramic-based superconductivity (also called superconductivity).
The present invention relates to a method for manufacturing a material. The present invention is a superconducting device, preferably a superconducting coil (for energy storage or It is intended to be used for magnets, etc.).
「従来の技術」 従来、超電導材料はNb-Ge(例えばNb3Ge)の金属材料が用
いられている。この材料は金属であるため延性、展性を
高く有し、超電導マグネット用のコイル巻を行うことが
可能であった。"Background of the Invention" Conventionally, superconducting materials metallic material Nb-Ge (e.g. Nb 3 Ge) is used. Since this material is a metal, it has high ductility and malleability, and it was possible to perform coil winding for a superconducting magnet.
しかし、これらの金属材料を用いた超電導材料はTc(超
電導臨界温度を以下単にTcという)が小さく23Kまたは
それ以下しかない。これに対し、工業上の応用を考える
ならば、このTcが77K好ましくは室温またはそれ以上で
あるとさらに有効である。However, the superconducting material using these metal materials has a small Tc (superconducting critical temperature is hereinafter simply referred to as Tc) and is only 23K or lower. On the other hand, when considering industrial applications, it is more effective that the Tc is 77K, preferably room temperature or higher.
「従来の問題点」 このため、Tcの高い材料として金属ではなくセラミック
系材料、特に酸化物セラミック系材料が注目されてい
る。しかしこの注目されているセラミック系超電導材料
はTcが高いにもかかわらず、曲げ性、延性、展性にとぼ
しく、少し曲げてもわれてしまう。いわんや0.1〜30μ
mといった厚さの薄膜を円台状または円板状の基体上に
形成し、この薄膜の一部または全部を選択的に除去する
こととはまったく不可能であるとされていた。特にこれ
に半導体集積回路と同様のフォトリソグラフィ技術を用
い多層配線を行ったり、この薄膜超電導を用いて新しい
電子ディバイスを作ることはまったく不可能であった。“Conventional Problems” For this reason, ceramic-based materials, particularly oxide ceramic-based materials, are attracting attention as materials with high Tc, rather than metals. However, despite the high Tc, this ceramic superconducting material, which has been attracting attention, has poor bendability, ductility, and malleability, and even if it is bent a little. Iwanya 0.1-30μ
It has been considered completely impossible to form a thin film having a thickness of m on a disk-shaped or disk-shaped substrate and selectively remove a part or all of this thin film. In particular, it has been impossible at all to perform multi-layer wiring using the same photolithography technology as that for semiconductor integrated circuits or to make new electronic devices using this thin film superconductivity.
「問題を解決すべき手段」 本発明はかかる酸化物超電導材料の薄膜と、それを挟む
同一主成分を含む酸化物非超電導材料の層間分離膜とを
用いて電子ディバイス好ましくは超電導コイルを作らん
としたものである。"Means for Solving the Problem" The present invention does not form an electronic device, preferably a superconducting coil, using such a thin film of an oxide superconducting material and an interlayer separation film of an oxide non-superconducting material containing the same main component sandwiching the thin film. It is what
本発明は予め所望の形状を有する基体、例えば円筒状ま
たは円板状の基体の被形成面上に薄膜状に酸化物超電導
材料または酸化雰囲気でアニール後、超電導特性を有す
る出発材料(これらを合わせて以下酸化物超電導材料ま
たは単に超電導材料という)をスパッタ法、印刷法例え
ばスクリーン印刷法、スプレー法、電子ビーム蒸着法、
その他の方法により形成する。The present invention preliminarily anneals an oxide superconducting material or a starting material having superconducting properties in a thin film on a formation surface of a base having a desired shape, for example, a cylindrical or disc-shaped base, and a starting material having superconducting properties. Hereinafter referred to as oxide superconducting material or simply superconducting material) as a sputtering method, a printing method such as a screen printing method, a spray method, an electron beam evaporation method,
It is formed by another method.
例えばマグネトロンスパッタ法で基板温度650゜C、Ar
(酸素を20%混入)雰囲気で形成する。この時被形成面
上に酸化物超電導材料のab面(c面即ちc軸に垂直な面)
が平行になるように形成する。For example, magnetron sputtering method with substrate temperature 650 ° C, Ar
It is formed in an atmosphere containing 20% oxygen. At this time, the ab plane of the oxide superconducting material (the c plane, that is, the plane perpendicular to the c axis) on the formation surface
Are formed so that they are parallel to each other.
このため、基体上に被膜を形成する際、この被形成面に
垂直方向に磁界を加える。すると本発明に用いる変形ペ
ロブスカイト構造の酸化物超電導材料は電流の特に流れ
やすいab面に平行な面が被形成面に平行に構成される。
この磁界はスパッタ法で形成された膜を酸素中で850゜C,
8時間、4゜C/分の速度で徐冷中、400゜C,2時間のアニー
ルの間も加える。Therefore, when forming a coating film on a substrate, a magnetic field is applied to the surface to be formed in the vertical direction. Then, in the oxide superconducting material of the modified perovskite structure used in the present invention, the plane parallel to the ab plane where the current flows particularly easily is parallel to the formation surface.
This magnetic field is applied to the film formed by the sputtering method in oxygen at 850 ° C,
Add during annealing at 400 ° C for 2 hours during slow cooling at a rate of 4 ° C / min for 8 hours.
本発明はかかる酸化物超電導材料が昇華性を有し、エキ
シマレーザまたはYAGレーザによりスクライブ加工(切
断)が容易に行い得る材料であることを実験的に発見し
た。このため本発明はかかる形成された超電導薄膜に対
し、焼成前または焼成後に選択的にレーザ光を照射、さ
らに必要に応じ走査(スキャン)を加え、一定の領域、
例えば一定の巾を有する帯状にこの酸化物超電導材料を
除去する。するとこのレーザ照射により開溝が作られた
以外の部分のみ一定のTcを有する超電導薄膜の帯とする
ことができる。The present invention experimentally found that such an oxide superconducting material has a subliming property and can be easily scribed (cut) by an excimer laser or a YAG laser. For this reason, the present invention selectively irradiates the formed superconducting thin film with a laser beam before or after firing, and further scans (scans) as necessary to give a predetermined region,
For example, the oxide superconducting material is removed in a band shape having a certain width. Then, the band of the superconducting thin film having a constant Tc can be formed only in the portion other than the groove formed by the laser irradiation.
スパッタ法等で形成される膜は、ターゲットを調整し、
形成後の酸化物超電導材料が例えば、 (A1-xBx)yCuzOw但しx=0〜1好ましくは0.6〜0.7,y=
2.0〜4.0好ましくは2.5〜3.5,z=1.0〜4.0好ましくは
1.5〜3.5,w=4.0〜10.0好ましくは6〜8であって、A
は元素周期表IIIa族特にイットリウム(Y)またはランタ
ノイドより選ばれた1種類または複数種類の元素、Bは
元素周期表IIa族より選ばれた1種類または複数種類の
元素、Bは元素周期表IIa族より選ばれた1種類または
複数種類の元素、例えばバリウム(Ba)となるようにす
る。For the film formed by the sputtering method, adjust the target,
The oxide superconducting material after formation is, for example, (A 1-x Bx) yCuzOw, where x = 0 to 1 and preferably 0.6 to 0.7, y =
2.0-4.0, preferably 2.5-3.5, z = 1.0-4.0, preferably
1.5 to 3.5, w = 4.0 to 10.0, preferably 6 to 8,
Is one or more elements selected from Group IIIa of the Periodic Table of Elements, particularly yttrium (Y) or lanthanoid, B is one or more elements selected from Group IIa of the Periodic Table of Elements, and B is IIa of the Periodic Table of Elements. It is made to be one or more kinds of elements selected from the group, for example, barium (Ba).
本発明のレーザ光源は例えばYAGレーザ(波長1.06μ
m),エキシマレーザ(KrF,KrCl等),アルゴンガスレー
ザまたは窒素レーザを用いた。YAGレーザは円状のレー
ザビームを5〜100KHzの周波数で繰り返して照射するこ
とができ、そしてこの照射された部分のみの超電導材料
を昇華して除去させることができる。このレーザは寿命
が長く、工業的に低コストで使用できるが、赤外波長で
ありパルス巾が50n秒以上あるため、深さ方向の制御が
しにくい。The laser light source of the present invention is, for example, a YAG laser (wavelength 1.06μ
m), an excimer laser (KrF, KrCl, etc.), an argon gas laser or a nitrogen laser was used. The YAG laser can repeatedly irradiate a circular laser beam at a frequency of 5 to 100 KHz, and can sublimate and remove the superconducting material only in the irradiated portion. Although this laser has a long life and can be industrially used at low cost, it is difficult to control in the depth direction because it has an infrared wavelength and a pulse width of 50 ns or more.
またエキシマレーザを用いる場合は、パルス巾が20n秒
と小さいため、除去する領域の深さ方向の制御がより容
易となる。本発明はエキシマレーザを光学系でしぼるこ
とにより円(直径10〜100μm)のレーザビームを作る
ことができ、このレーザビームを酸化物超電導膜に照射
しつつ基体またはおよびレーザ光ビームを移動する。こ
の時所望の位置の酸化物超電導薄膜を昇華または飛翔化
して除去する。Further, when the excimer laser is used, the pulse width is as small as 20 nsec, so that it becomes easier to control the region to be removed in the depth direction. In the present invention, a circular (10 to 100 μm diameter) laser beam can be produced by squeezing an excimer laser with an optical system, and the substrate or the laser light beam is moved while irradiating the oxide superconducting film with this laser beam. At this time, the oxide superconducting thin film at a desired position is removed by sublimation or flying.
この酸化物超電導薄膜は熱伝導係数が比較的小さく、か
つ昇華性であるため、レーザ光の照射された部分のみを
選択的にかかる薄膜を完全に除去することができる。そ
してその端面の近傍においてすら銅および酸素原子の層
構造を有する分子配列を有する超電導材料とし得ること
が特徴である。Since this oxide superconducting thin film has a relatively small thermal conductivity and is sublimable, it is possible to completely remove the thin film selectively on only the portion irradiated with laser light. The superconducting material is characterized by being able to have a molecular arrangement having a layered structure of copper and oxygen atoms even near the end face thereof.
本発明はかくの如く基板の表面に形成されたセラミック
材料に対し選択的にレーザ光を照射しつつ、また必要に
応じて走査してその部分のみ酸化物の超電導材料を除去
すること、およびそ前後、この上面にこの酸化物超電導
材料と概略同一の熱膨張係数を有する酸化物非超電導材
料を電気的分離用の層間膜とするため、酸化物超電導材
料と同一元素を有する材料であって非超電導特性を有す
る材料を積層した。そしてさらにこの後、第2の酸化物
超電導薄膜を積層し、再び第1の酸化物超電導材料と同
様にレーザスクライブを行った。これを繰り返して多層
に捲かれたコイルを構成せしめた。The present invention thus selectively irradiates the ceramic material formed on the surface of the substrate with laser light and, if necessary, scans to remove the oxide superconducting material only in that portion, and Before and after this, since an oxide non-superconducting material having substantially the same thermal expansion coefficient as this oxide superconducting material is used as an interlayer film for electrical separation on the upper surface, a material having the same element as the oxide superconducting material A material having superconducting properties was laminated. Then, after this, a second oxide superconducting thin film was laminated, and laser scribing was performed again as in the case of the first oxide superconducting material. This was repeated to form a coil wound in multiple layers.
本発明において、基体材料としてアルミナ、YSZ(イット
リア・スタビライズド・ジルコン)、酸化マグネシウム
(MgO),窒化珪素、窒化アルミニウム、ジルコニア、イッ
トリア、チタン酸ストロンチウム(SrTiO3)、石英ガラス
を用いた。また金属等の基体上に酸化物非超電導薄膜を
形成して複合基体を用いてもよい。In the present invention, as the base material, alumina, YSZ (yttria stabilized zircon), magnesium oxide
(MgO), silicon nitride, aluminum nitride, zirconia, yttria, strontium titanate (SrTiO 3 ) and quartz glass were used. Alternatively, a composite substrate may be used by forming an oxide non-superconducting thin film on a substrate such as metal.
「作用」 従来、金属超電導材料を用いる場合、その工程としてま
ず線材とする。そしてこれを所定の基体にまいてゆくこ
とによりコイルを構成せしめた。[Operation] Conventionally, when a metal superconducting material is used, a wire is first used as the process. The coil was constructed by spreading this on a predetermined substrate.
しかし、本発明の酸化物超電導体を用いるコイルに関し
ては、最終形状を有する基体、例えば円型または円筒状
(ボビン)構造を用いる。この基体上に帯状に超電導を熱
処理の後、超電導を呈すべき酸化物超電導材料を膜状に
形成する。そしてこの膜に対し選択的にレーザスクライ
ブを行うことにより他部の残存した領域により帯状のコ
イルを構成せしめる。さらにその上面に酸化物超電導材
料と同一元素を有する酸化物非超電導材料を同一方法で
形成する。さらにこの酸化物非超電導材料の連結部にて
連結しつつ、第2の酸化物超電導薄膜を形成する。そし
てこの薄膜に対し、第2のレーザスクライブを行う。酸
化物超電導材料のアニールはこれをすべての工程を行っ
た後に行っても、またそれぞれの工程毎にで行ってもよ
い。However, with respect to the coil using the oxide superconductor of the present invention, a substrate having a final shape, for example, a circular or cylindrical shape
(Bobbin) structure is used. After band-shaped superconducting heat treatment is performed on this substrate, an oxide superconducting material that exhibits superconducting properties is formed into a film. Then, by selectively performing laser scribing on this film, a strip-shaped coil is formed by the remaining region of the other portion. Further, an oxide non-superconducting material having the same element as the oxide superconducting material is formed on the upper surface by the same method. Further, the second oxide superconducting thin film is formed while connecting at the connecting portion of the oxide non-superconducting material. Then, second laser scribing is performed on this thin film. Annealing of the oxide superconducting material may be performed after performing all the steps, or may be performed in each step.
以下に実施例に従って本発明を説明する。The present invention will be described below with reference to examples.
「実施例1」 第1図は本発明の実施例を示す。Example 1 FIG. 1 shows an example of the present invention.
第1図(A)において、基体(1)はセラミック材料(1)上に
酸化物非超電導薄膜(1′)を形成したものを用いた。す
るとその上面には酸化物超電導薄膜と同程度(±50%以
内)の熱膨張係数の差を作ることができる。この差が大
きすぎるとアニール後応力歪を有し、超電導を呈する温
度が小さく、また膜に生ずるクラックにより超電導が観
察されなくなってしまう。この実施例では円板状を有す
る基体(1)上に、スパッタ法または印刷法例えばスクリ
ーン印刷法により0.1〜50μm例えば20μmの厚さに酸
化物超電導薄膜(2)を形成した。In FIG. 1 (A), the substrate (1) used was one in which an oxide non-superconducting thin film (1 ') was formed on a ceramic material (1). Then, it is possible to make a difference in the coefficient of thermal expansion on the upper surface to the same extent (within ± 50%) as that of the oxide superconducting thin film. If this difference is too large, there is stress strain after annealing, the temperature at which superconductivity is exhibited is low, and cracks that occur in the film prevent superconductivity from being observed. In this example, an oxide superconducting thin film (2) having a thickness of 0.1 to 50 μm, for example 20 μm, was formed on a disk-shaped substrate (1) by a sputtering method or a printing method such as a screen printing method.
それを酸素雰囲気で加熱処理を行った。500〜1000゜C例
えば900゜Cで15時間行った。かくして超電導セラミック
膜を形成させた。さらにこの後、エキシマレーザ(254n
m)(4)をレーザスクライブを行うために照射した。この
レーザ光を第1図では左端より中央部に走査(11)し、か
つ円板状基体を回転(12)した。かくして開溝(3)を作製
した。レーザ光はピーク出力は106〜108W/秒であっ
た。これを強くしすぎると基体(1)をも損傷させてしま
うため注意を要する。It was heat-treated in an oxygen atmosphere. It was carried out at 500 to 1000 ° C, for example 900 ° C for 15 hours. Thus, a superconducting ceramic film was formed. After this, the excimer laser (254n
m) (4) was irradiated for laser scribing. In FIG. 1, this laser beam was scanned from the left end toward the center (11), and the disc-shaped substrate was rotated (12). Thus, the open groove (3) was prepared. The laser light had a peak output of 10 6 to 10 8 W / sec. If this is made too strong, the substrate (1) will also be damaged, so care must be taken.
第1図(B)は第1図(A)の1層配線の後、これらの全面に
酸化物非超電導薄膜(6)を形成し、さらに第2の酸化物
超電導薄膜(7)を積層した。第1図(A)のA-A′の断面に
対応する。In FIG. 1 (B), after the single-layer wiring of FIG. 1 (A), an oxide non-superconducting thin film (6) is formed on the entire surface thereof, and a second oxide superconducting thin film (7) is further laminated. . It corresponds to the cross section of AA ′ in FIG. 1 (A).
図面より明らかな如く、第1の酸化物超電導薄膜は帯状
に(5-1),(5-2)・・・として残存してコイルを構成す
る。そして連結部(8)にて第2の酸化物超電導薄膜をレ
ーザスクライブしたコイル(7-1),(7-2)・・・に連結し
ている。As is clear from the drawing, the first oxide superconducting thin film remains in the form of strips (5-1), (5-2) ... And constitutes a coil. The second oxide superconducting thin film is connected to the laser-scribed coils (7-1), (7-2) ... At the connecting portion (8).
かくして円板状に帯状線を配線し、かつその多層まきが
可能となった。Thus, it becomes possible to wire the strip-shaped wire in a disc shape and to perform the multi-layer winding.
第1、第2の帯状の超電導薄膜の上または下に銀等の金
属を設けた多層膜としてもよい。A multi-layer film in which a metal such as silver is provided on or under the first and second strip-shaped superconducting thin films may be used.
「実施例2」 第2図は本発明の他の実施例を示す。Second Embodiment FIG. 2 shows another embodiment of the present invention.
図面において基体(1)は円筒状(ボビン形状)を有す
る。ここに実施例1と同様に膜状に酸化物超電導材料
(2)を形成する。In the drawing, the substrate (1) has a cylindrical shape (bobbin shape). Here, as in Example 1, a film-shaped oxide superconducting material was formed.
Form (2).
この作製はスパッタ装置でこの円筒基体(1)を矢印(12)
に示す如くに回転しつつディポジッションすればよい。This production was performed by using a sputter device.
The deposit may be made while rotating as shown in FIG.
次にこれら膜を熱アニールさせた後、この膜にYAGレー
ザ(3)ビーム(径50μm)を照射しつつ、このレーザ光を
(11)の方向に徐々に移す。同時に円筒状基体(1)を矢印
(12)の方向に回転させる。するとこの円筒状基体に対し
一本の連続した帯状のスクライブライン(3)を構成させ
ることができる。この開溝によりそれぞれの酸化物超電
導材料が帯状に(5-1),(5-2)として形成され、それぞれ
は電気的に分離されて、超電導領域を構成させ得る。こ
こではこの超電導領域はコイル状を有し、実質的に超電
導マグネットコイルを構成させることができた。Next, after annealing these films by thermal annealing, while irradiating this film with a YAG laser (3) beam (diameter 50 μm),
Gradually move in the direction of (11). Simultaneously with the arrow on the cylindrical substrate (1)
Rotate in the direction of (12). Then, one continuous strip-shaped scribe line (3) can be formed on this cylindrical substrate. By this groove, each oxide superconducting material is formed into a band shape as (5-1) and (5-2), and each is electrically separated to form a superconducting region. Here, this superconducting region had a coil shape, and a superconducting magnet coil could be substantially constituted.
この実施例はかかる工程の後これら全体を酸素中で焼成
し、(A1-xBx)yCuzOwの一般式で示される酸化物超電導材
料に変成した。そして超電導マグネットとさせることが
できた。このコイルの始点と終点とを超電導線で連結す
ることにより、エネルギ蓄積装置とすることが可能であ
る。In this example, after these steps, the whole of them was baked in oxygen to be transformed into an oxide superconducting material represented by the general formula of (A 1-x Bx) yCuzOw. And I was able to make it a superconducting magnet. An energy storage device can be obtained by connecting the start point and the end point of this coil with a superconducting wire.
第2図(B)は第2図(A)のA-A′の断面図に対応する。第
2図(A)は図面の複雑化を避けるため1層目のみを示し
た。本発明はこれを多層化せしめたものである。第2図
(B)において、酸化物非超電導薄膜(1′)を有する基体
(19上に、第2図(A)に示した如くにして酸化物超電導材
料を帯状に形成する。さらにこれら全体を同一元素を有
する酸化物非超電導薄膜を同じスパッタ法で形成する。
連結部(8)で開穴を行った後、これら全体に第2の酸化
物超電導薄膜を形成する。さらに第1の超電導薄膜と同
様にレーザスクライブをして帯状に(7-1),(7-2)・・・
を作る。さらに第2の酸化物超電導薄膜(6′)を形成
し、さらに第3の酸化物超電導材料を(8′)にて連結
し、帯状に形成した。外部取り出しは(10),(11)で行っ
ている。これを繰り返し行うことにより、3層だけでは
なく任意の多層とすることができる。FIG. 2 (B) corresponds to the cross-sectional view of AA ′ in FIG. 2 (A). FIG. 2 (A) shows only the first layer in order to avoid complication of the drawing. The present invention has a multilayer structure. Fig. 2
In (B), a substrate having an oxide non-superconducting thin film (1 ')
(The oxide superconducting material is formed in a band shape on 19 as shown in FIG. 2A. Further, an oxide non-superconducting thin film containing the same element is formed on the whole by the same sputtering method.
After making a hole in the connecting part (8), a second oxide superconducting thin film is formed on all of them. Further, like the first superconducting thin film, laser scribing is performed to form strips (7-1), (7-2) ...
make. Further, a second oxide superconducting thin film (6 ') was formed, and further a third oxide superconducting material was connected at (8') to form a strip shape. External extraction is done in (10) and (11). By repeating this, it is possible to form not only three layers but also arbitrary layers.
その他は実施例1と同様である。Others are the same as in the first embodiment.
「効果」 本発明によりこれまでまったく不可能とされていた酸化
物超電導材料を実質的にコイル状に基体上に選択的に残
存させることが可能となった。"Effect" The present invention makes it possible to selectively leave the oxide superconducting material, which has been heretofore impossible at all, substantially in the form of a coil on the substrate.
かくして、曲げるとすぐわれてしまうセラミックス超電
導材料をして導線、電極または超電導素子を構成させる
ためのアイソレイションをして膜状または帯状に作るこ
とができた。Thus, the ceramic superconducting material that would be easily bent can be isolated to form a conductor, an electrode or a superconducting element, and can be formed into a film or strip.
本発明において超電導薄膜を形成した後、公知のフォト
リソグラフィ技術を用い、所定のパターニングをし、超
電導素子または超電導配線としてもよい。しかしこの工
程中で用いる液体により劣化しやすいため、本発明の方
法が優れている。In the present invention, after forming the superconducting thin film, a known photolithography technique may be used to perform predetermined patterning to obtain a superconducting element or a superconducting wiring. However, the method of the present invention is excellent because it easily deteriorates depending on the liquid used in this step.
本発明の超電導材料はセラミック材料であればなんでも
よい。The superconducting material of the present invention may be any ceramic material.
第1図、第2図は本発明の酸化物超電導材料を用いた超
電導コイルの実施例を示す。 1・・・基板 2・・・酸化物超電導材料 3・・・開溝 4・・・レーザ光 5・・・超電導を呈する領域 6,9・層間分離膜 7・・・第2の酸化物超電導材料1 and 2 show examples of superconducting coils using the oxide superconducting material of the present invention. DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Oxide superconducting material 3 ... Open groove 4 ... Laser light 5 ... Region which exhibits superconductivity 6,9 / Interlayer separation film 7 ... Second oxide superconductivity material
Claims (3)
る工程と、 該材料上に第1の酸化物超電導材料を帯状に設ける工程
と、 該材料上に非超電導特性を有する材料を積層して設ける
工程と、 該材料上に前記帯状に設けられた第1の酸化物超電導材
料の一端部に連結して第2の酸化物超電導材料を帯状に
積層して設ける工程と、 を有した超電導コイルの作製方法であって、 前記酸化物超電導材料を帯状に設ける方法として、レー
ザ光によって前記酸化物超電導材料の一部を除去する方
法を用い、 前記非超電導特性を有する材料として、前記酸化物超電
導材料を構成する元素を含む材料を用いることを特徴と
する超電導コイルの作製方法。1. A step of providing a material having non-superconducting properties on a substrate, a step of providing a band-shaped first oxide superconducting material on the material, and laminating a material having non-superconducting properties on the material. And a step of stacking a second oxide superconducting material on the material so as to be connected to one end of the first oxide superconducting material provided in the shape of a strip and stacking the second oxide superconducting material in a strip shape. A method of manufacturing a coil, wherein a method of removing a part of the oxide superconducting material by laser light is used as a method of providing the oxide superconducting material in a strip shape, and the oxide having a non-superconducting property is used. A method for producing a superconducting coil, which comprises using a material containing an element constituting a superconducting material.
電導材料と非超電導特性を有する材料との熱膨張係数の
比を概略±50%以内とすことを特徴とする超電導コイル
の作製方法。2. The method for producing a superconducting coil according to claim 1, wherein the ratio of the thermal expansion coefficients of the oxide superconducting material and the material having non-superconducting properties is approximately within ± 50%. .
した第2の酸化物超電導材料を設ける工程と、 を複数回行なうことによって、多層に積層された超電導
コイルを形成することを特徴とする超電導コイルの作製
方法。3. The method according to claim 1, wherein a step of providing a first oxide superconducting material, a step of providing a material having non-superconducting properties on the material, and the first oxidation on the material. A step of providing a second oxide superconducting material connected to one end of the superconducting material, and a superconducting coil laminated in multiple layers is formed by performing a plurality of times.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62218538A JPH063766B2 (en) | 1987-08-31 | 1987-08-31 | Superconducting coil manufacturing method |
| US07/236,925 US5079222A (en) | 1987-08-31 | 1988-08-26 | Superconducting ceramic circuits and manufacturing method for the same |
| EP88308048A EP0306287B1 (en) | 1987-08-31 | 1988-08-31 | Superconducting ceramic circuits and manufacturing method for the same |
| DE3854754T DE3854754T2 (en) | 1987-08-31 | 1988-08-31 | Ceramic superconducting circuits and process for their manufacture. |
| US07/757,993 US5225394A (en) | 1987-08-31 | 1991-09-12 | Method for manufacturing high Tc superconducting circuits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62218538A JPH063766B2 (en) | 1987-08-31 | 1987-08-31 | Superconducting coil manufacturing method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3094818A Division JPH04297003A (en) | 1991-04-01 | 1991-04-01 | Substrate for manufacturing superconducting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6459906A JPS6459906A (en) | 1989-03-07 |
| JPH063766B2 true JPH063766B2 (en) | 1994-01-12 |
Family
ID=16721498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62218538A Expired - Lifetime JPH063766B2 (en) | 1987-08-31 | 1987-08-31 | Superconducting coil manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH063766B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS496448A (en) * | 1972-02-22 | 1974-01-21 | ||
| JPS6161555A (en) * | 1984-08-31 | 1986-03-29 | Norinosuke Kojima | Automatic message method using dial telephone |
| JPS6175509A (en) * | 1984-09-20 | 1986-04-17 | Fujitsu Ltd | Thin film coil |
| JPS61225807A (en) * | 1985-03-29 | 1986-10-07 | Kobe Steel Ltd | Manufacture of superconductive coil |
-
1987
- 1987-08-31 JP JP62218538A patent/JPH063766B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6459906A (en) | 1989-03-07 |
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